Talk:Photolithography

message: Contact printing is something that should be discussed a bit further. I am thinking maybe it can get its own article. This form of photolithography has a lot in common with nanoimprint lithography.Guiding light 17:10, 31 January 2006 (UTC)
thread_title:  Contact printing 

message: EUV sources and materials for lithography currently operate at a central peak wavelength of 13.5 nm, although the spectrum should range from 5 to 50 nm (source). Guiding light 04:31, 7 January 2006 (UTC)
thread_title:  What is EUV 

message: If I wanted to write a section on the use of photolithography in the creation of finescale accessories for model kits (typically called photoetching in the hobby), should I start a new page to handle that topic? It would not be a very long section, so I'm concerned with creating a needless content fork. --Agamemnon2 14:33, 2 June 2007 (UTC)
thread_title:  The use of photoetch components in scale models 

message: Lithography means 'to write in stone'.
But does photolithography mean 'to write in a wafer'? Or just 'to write in resist'? In the current definition etching is part of lithography. In that case the lift-off process does not use lithography (there is no etching). Also, the resolution of photolithography is determined not by diffraction but (also) by chemical etching processes. 169000 web pages contain "photolithography and etching". I think one should consider removing etching from the definition of photolithography and mentioning / referring to it. Same for stripping. Mhesselb (talk) 19:41, 9 March 2008 (UTC)
replies: text: I agree. I also noticed this discrepancy when I found that patterning redirects to this page.  I was surprised I didn't get a disambiguation page, but even beyond that, the concept of patterning is much broader than just photolithography.  Etching is certainly a separate step from litho, although together they might make up one patterning scheme.  But patterning should also include things like contact printing, mentioned above, and other types of "soft lithography".  Maybe even inkjet printing...  There is a lot of work to be done on a lot of the microprocessing articles.  I wish I had more time, but I'm going to take a look at this when I get a chance. Lone Skeptic (talk) 19:02, 5 August 2008 (UTC)
thread_title:  Definition 

message: The "analogy with photographic developer" is better illustrated by preferential etching of a film (layer) since the developer completely removes an area of the photoresist rather than simply changes the opacity of the material as it does in a photographic emulsion.  —Preceding unsigned comment added by 74.10.115.69 (talk) 00:01, 27 August 2008 (UTC)
thread_title:  Photoresist Develop 

message: Is nano-scale sculpture carving considered a form of photolithograhpy? --Ramu50 (talk) 21:13, 16 September 2008 (UTC)
replies: text: Any reference that shows what you mean by "nano-scale sculpture carving"? --DrTorstenHenning (talk) 10:35, 17 September 2008 (UTC)
replies: text: You win! The reference of the Nature paper describing this work would be interesting. Plantsurfer (talk) 19:47, 17 September 2008 (UTC)
replies: text:  There is already a Wikipedia article on stereolithography, which appears to be the method by which the two samples were made. I would not call it carving since that implies the use of a sharp tool to remove material around the final product. --DrTorstenHenning (talk) 21:50, 17 September 2008 (UTC)
replies: text:  The bull, at least, is not what is described in the article on stereolithography, as it is produced with a subtractive, not additive process.  —Preceding unsigned comment added by 204.227.241.18 (talk) 15:33, 12 October 2009 (UTC)
thread_title:  question 

message: Optical Lithography Introduction — IBM site with lithography-related articles
the article has been moved to an IEEE site  — Preceding unsigned comment added by Koknat (talk • contribs) 14:53, 8 April 2011 (UTC)
thread_title:  External Links 

message: This article glosses over a key step in the lithographic process - creating the pattern that is then projected onto the photoresist in UV prior to etching. If anyone could add this information, it would add greatly to this article. Quodfui (talk) 13:40, 16 November 2013 (UTC)
thread_title:  Patterning in Photoresist 

message: The intro to this section contradicts its source. The line "Current state-of-the-art photolithography tools use deep ultraviolet (DUV) light from excimer lasers with wavelengths of 248 and 193 nm" probably comes from the line in the source "Nowadays a state-of-the-art 193 nm light source, such as the Cymer XLR 600ix..." however this appears to be referencing the state of the art of 193 nm lasers, not state of the art lithography, as the article later states "During that time period, the source wavelength progressed from 436 nm down to 193 nm and now to 13.5 nm"
It’s unclear where the reference to 50nm feature size comes from as it is not mentioned in the source. The source also suggests that lithography would be used "to support high-volume manufacturing starting in the 2012-2013 timeframe." Implying a much smaller minimum feature size than 50nm.
The line "over the past 20 years" is also unclear, past 20 years from when? User:31.185.58.188 08:45, 20 July 2020 (UTC)
thread_title:  Resolution in projection systems