Talk:Passivation (chemistry)

message: Passivation of stainless steel is another use of this term.  This article describes the process, which should be described here.--Joel 20:23, 26 April 2006 (UTC)
replies: text: It's the same definition of the term, producing a passive oxide coating on the part, just different process for different material. But yes, it should be documented here.--Yannick (talk) 16:03, 13 June 2009 (UTC)
thread_title:  Another definition... 

message: Though I'm not qualified to write it, there is a separate meaning of passivation not addressed here.  It is essentially this: in the Java Computer Programming language, bits of programming functionality are written in objects called Enterprise Java Beans (EJBs).  EJBs can be loaded into the computer's memory to do some work.  Over time this fills the computer's memory.  In order to conserve memory, the current state (data) of the EJB can be written to a database or file.  Once this state information is "backed up" to disk, the computer memory that held the data can be freed up for other use.
In this context, passivation is the process of taking the EJB's state information and moving it to persistent storage ("serializing" it).
I don't know if a disambiguation page is called for, but if you Google "Java passivation" plenty of hits with definitions will come up. Jebbo 14:40, 28 June 2006 (UTC)
thread_title:  Java Programming Passivation? 

message: I don't understand the ins and outs of aluminium alloying sufficiently to edit the page, but the section on the need to anodise aluminium in salt water environments is incorrect. Aluminium 5083, and other marine grades (see the article on "Aluminium") do not need to be anodised, and will not corrode in a salt water environment unless brought into direct contact with mild steel, bronze or another material further up the saltwater galvanic table. My understanding is that this is because of the exclusion from marine grade alloys of materials prone to interact galvanically with aluminium, such as copper. Aluminium alloy is an increasingly widespread shipbuilding material and while anodising is sometimes used for window frames, it is not used for hull structure.
Expert input is needed here to correct this section.
CMillican, 26th March 2007 —The preceding unsigned comment was added by CMillican (talk • contribs) 15:41, 26 March 2007 (UTC)
thread_title:  Aluminium does not corrode in salt water 

message: CMillican wrote  Aluminium does not corrode in salt water  As stated, this heading is incorrect. The text is probably right -- there are aluminium alloys that are suitable for marine applications, when properly used. (Proper use means, for example, keeping aluminium parts electrically separated from contact with other metals.) But the section heading of this talk page, as CMillican provided it, is an inaccurate generalization. Here's what could have been said: "Some aluminium alloys are suitable for exposure to salt water." Oaklandguy (talk) 21:19, 23 July 2020 (UTC)
thread_title:  Correction to the heading used by CMillican 

message: It would be nice if someone could address how different passivation processes affect the electrical properties.  e.g. black anodize insulates, gold iridite finish conducts.  (That exhausts my understanding of this topic, so, no I will not be  writing that section.)  Or is the iridite finish not considered passivation?  Or does passivation imply insulation, and anything that conducts is therefore not passivation?  Further explanation, please.  —Preceding unsigned comment added by 216.70.247.242 (talk) 19:26, 27 November 2007 (UTC)
replies: text: I know nothing about the process you are describing above, but from your short description it sounds like a new article should be made for it and a disambiguation link added to point to it. Feel free to be bold and start the article. If you do start it let me know and I can add the appropriate dab links. Wizard191 (talk) 23:21, 4 March 2009 (UTC)
thread_title:  Electrical Properties 

message: The surface passivation history is all wrong. Fits of all Atalla did not invent surface passivation. According to Bo lojek: "the idea to passivate the semiconductor surface was known since the first junction transistor", page 119. The refs given here do not say that Atalla invented surface passivation. Ross Basset in his book To Digital Age, explain the surface passivation problems in great details. Attala, picking up Frosch and Derick technique, demonstrated that silicon dioxide was extremely effective in eliminating one important class of surface states(page 23). This gave hope that surface state problems could be metigated. This, together with invention of Integrated circuit made MOS transistor somewhat promising(page 13). However the problem of surface states were not resolved by Atalla, and it will take many years and the work of people like Deal, Grove and Snow for surface state problem to be resolve.
Also there are several sources misrepresentations. For one the claim that "The surface passivation process, also known as the Atalla passivation technique,[12", is failed varification, there is nothing there about Attala process on page 66. the claim that " For the surface passivation process, he developed the method of thermal oxidation, which was a breakthrough in silicon semiconductor technology", again Huff does not say that he developed thermal oxidation, rather that he developed "completly new kind of silicon surface" by thermal oxidation.
And the claim "surface passivation process developed by Atalla's team "blazed the trail" that led to the development of the silicon integrated circuit". Sah was talking about stabilizing silicon surface by silicon dioxide, he never said that Atalla invented surface passivation.
Finally the claim that "Atalla's surface passivation method was the basis for several important inventions in 1959: the MOSFET (MOS transistor) by Atalla and Dawon Kahng at Bell Labs, the planar process by Jean Hoerni at Fairchild Semiconductor, and the monolithic integrated circuit chip by Robert Noyce at Fairchild in 1959.[22][23][21][24] " is simply incorrect and is not back up by refs. Robert Noyce used, among other things, planar process of Hoerni to invent IC, but not Atalla work on passivation. Hoerni's planar process was partially based on Atalla work, as Lojek and Basett say, but that doesn't mean it itself was basis to invention of IC.
I am going to remove history of surface passivation, and when I have time I'll rewrite it more neutrally. DMKR2005 (talk) 22:30, 11 February 2021 (UTC)
replies: text: By the way the claim that "in the late 1950s, Atalla further discovered that the formation of a thermally grown SiO2 layer greatly reduced the concentration of electronic states at the silicon surface" and " and discovered the important quality of SiO2 films to preserve the electrical characteristics of p–n junctions and prevent these electrical characteristics from deteriorating by the gaseous ambient environment" are the same thing, just said a little bit differently. DMKR2005 (talk) 22:50, 11 February 2021 (UTC)
replies: text:  Thanks  for trimming the undue and misleading Atalla material on many articles. Si already has its own modest section here that can be expanded with anything appropriate for this article. For readers interested in the FET gate aspect, this can link to more detailed articles such as Thermal oxidation and Gate oxide (which itself has undue Atalla promotion currently). The subject of passiviation to eliminate charge traps and surface states for electronics is a different subject than the corrosion and chemistry focus of this article, but could be kept in short form under Si. I encourage you to go ahead and cut, or just offer your opinion about whether anything should be kept of the current lede last paragraph, and the "Surface passivation" section under "History". –MadeOfAtoms (talk) 18:36, 20 June 2022 (UTC)
replies: text:  Thanks . I am taking a small break from Wikipedia. Once I am back I'll continue clean up. There is a lot of work to do. DMKR2005 (talk) 23:17, 20 June 2022 (UTC)
thread_title:  Surface passivation history