Complex sentence: After the photoresist is removed following the hardmask pattern transfer, a second layer of photoresist is coated onto the sample and this layer undergoes a second exposure, imaging features in between the features patterned in the hardmask layer.
Split into simpler sentences: After the photoresist is removed following the hardmask pattern transfer, a second layer of photoresist is coated onto the sample. This second layer undergoes a second exposure, imaging features in between the features patterned in the hardmask layer.