baber/WOPTO huggingface dataset:
Patent KR-20000022318-A (KR)
Title: Method of manufacturing a semiconductor device with a multilayer wiring.
Inventor: WEBSTER MARIAN NELIA
IPC: H01L23/522
Filed: 1998-03-16
Abstract: PURPOSE: A method of manufacturing a semiconductor device is provided for a multilayer wiring with aluminum conductor tracks which are insulated from one another by insulating layers,with contact windows of 0.5 mu m or smaller and with aspect ratios above1 CONSTITUTION: An aluminum conductor track provided on a surface of a semiconductor body is covered with a layer of insulating material, whereupon a contact window with a wall reaching down to the conductor track is formed in theis insulating layer. A conductive intermediate later and an aluminum layer are provided on this wall, whereupon a heat treatment is carried out such that aluminum grows from the conductor track into the contact window. A conductive intermediate later of titanium is provided on the wall of the contact window. A very thin, closed aluminum later, which remains closed also during the heat treatment, can be formed on this titanium layer, which can be provided on the wall with a small thickness.
Patent KR-20000022509-A (KR)
Title: Medical laser guidance apparatus
Inventor: MASON WILLIAM
IPC: A61B17/00
Filed: 1997-06-26
Abstract: PURPOSE: A medical laser guidance apparatus is provided to apply laser light to the retin of the eye. CONSTITUTION: A laser guidance apparatus comprises a retin an image obtaining means for obtaining the image of a retin a. Template generating means generates a reference template on the retin an image, and target position receiving means receives data related to at least one target point to which light is to be applied based upon the received reference data. A retin an image display displays the required retin an image, and reference data receiving means receives, from an operator, data relating to a treatment to be performed. Current retin a position detecting means acquires a current retin an image, and laser light application means directs and applies laser light to a retin a.
Patent KR-19990072276-A (KR)
Title: 쌍을이룬전기커넥터조립체
IPC: H01R13/66
Filed: 1999-01-16
Abstract: 전기 커넥터 조립체는 다수의 단자를 장착하고 외부 도전성 쉘을 포함하는 전기 커넥터를 포함한다.  유전성 인서트는 전기 커넥터용 리셉터클을 형성한다.  외부 차폐 쉘은 유전성 인서트의 주요부를 둘러싼다.  전기 소자는 유전성 인서트에 의해 둘러싸이고 커넥터의 외부 도전성 쉘과 외부 차폐 쉘 사이에 전기 결합을 이루도록 이들 사이에 접촉 상태로 유지된다.
Patent KR-19990068215-A (KR)
Title: 고로의 송풍트와이어
IPC: C21B7/16
Filed: 1999-01-29
Abstract: 트와이어 외주면의 Cu 온도가 그 융점보다 높게 과열되지 않도록 하므로써 트와이어 손상을 방지하고 장기간 사용에 견딜수 있는 고로의 송풍트와이어를 제조하기 위한 것으로, 이 트와이어는 트와이어 몸체의 냉각실 2와 트와이어 노우즈의 냉각실 3을 갖는 트와이어 트렁크로 구성된다. 
     또한 고로안으로 돌출되는 부위의 외주면의 전체중 적어도 상반부 또는 외주면의 전면부를 제외한 전체를 고로에서 용탕금속온도와 Cu 융점보다도 높은 융점을 갖는 재료로 만들어지는 각층 5로 피복한다. 더우기, 고로속으로 트와이어를 삽입할 때에 받는 기계적충격으로 부터 트와이어를 보호하기 위하여 금속제 쟈켓 4가 각층의 바깥쪽 위로 부착된다.
Patent KR-20000059326-A (KR)
Inventor: JIN CHEOL GEUN
IPC: C09D17/00
Filed: 1999-03-02
Abstract: PURPOSE: A photochromic coating material is provided, which becomes chromatic to block the light when it is exposed to the UV light and becomes transparent when it is screened to the UV light. CONSTITUTION: The photochromic coating material comprises a coating forming agent; a solvent; and 10-40 wt% of a photochromic compound as a dye. Preferably the photochromic compound is included in the coating material as in the form of a microcapsule.
Patent KR-20000059884-A (KR)
Title: Automatic air cleaner
Inventor: KIM YONG JIN
IPC: B01D46/00
Filed: 1999-03-09
Abstract: PURPOSE: An air-purifying apparatus is provided, which can remove dust particles and contaminated gas by an interaction between UV photocatalyst and pulse corona plasma. CONSTITUTION: The air-purifying apparatus(100) comprises a duct(110) having an inlet(80) and an outlet(90), a filter(10) for filtering large size particles, a plasma discharging part(20) to charge electrically small size particles and decompose the contaminated gas using discharge of pulse corona, a dust collection part(30), a high voltage supplying device(70) to supply high voltage to the dust collection part(30) and the plasma discharging part(20), a water cleaning part(40) to clean the dust collected in the dust collection part(30), an UV photocatalyst part(55) to oxidize and eliminate the contaminated gas, wherein the UV photocatalyst part(55) comprises a pair of mesh plates(50) and an UV lamp(60) that is installed between the pair of mesh plates(50).
Patent KR-20000060935-A (KR)
Title: Fan clutch for internal combustion engine
Inventor: NOH GYEONG DEOK
IPC: F01P7/08
Filed: 1999-03-22
Abstract: PURPOSE: A fan clutch is provided to achieve an improved cooling/heating performance by increasing an amount of slip in a high temperature area. CONSTITUTION: A fan clutch comprises a temperature sensing bulb(42) arranged in a storage chamber(27) of a case(6) installed to a pulley shaft interlinked with a pump shaft of an engine, a diaphragm unit(44) connected to the temperature sensing bulb so as to variably react to the temperature, a rod(46) connected to the diaphragm and which is arranged to move vertically by being supported by a resilient member(S1) within a guide groove(52) of the case, a lock rod(48) supported by a resilient member(S2) within the guide groove perpendicularly to an end of the rod and which moves horizontally, and a coupling groove(50) formed at a side surface of a rotor(8) so as to allow the lock rod to directly coupled to the case and rotate integrally with the case.
Patent KR-20000061966-A (KR)
Inventor: LEE CHANG JIN
IPC: D21H21/14
Filed: 1999-03-29
Abstract: PURPOSE: A wallpaper using mugwort is provided to remove bad smell with the deodorization of the mugwort so indoor air keeps fresh. CONSTITUTION: A wallpaper is made by mixing or adding mugwort, processed mugwort or pulverized mugwort from the beginning. The mugwort ingredients are inserted between the wallpaper or added on the wallpaper to remove bad smell with the deodorization. The mugwort ingredients are also used for a pattern on the wallpaper. Thereby, the wallpaper keeps indoor air fresh and is good for health.
Patent KR-20000066195-A (KR)
Inventor: KIM JEONG SU
IPC: H04B1/7085
Filed: 1999-04-14
Abstract: PURPOSE: A synchronous obtaining device in a communication system is provided to quickly obtain a reliable synchronization by not performing a multiplying calculation and integral calculation about PN code phase, widely searches a phase interval in an integrator having a short integral period, and then precisely searches a phase interval in an integrator having a long integral period. CONSTITUTION: A received PN code signal is multiplied by a reference phase PN code, is multiplied by 1/2 chip-delayed rate PN code centering around the PN code, and is multiplied by 1/2 chip rapid early PN code. The signal wherein the PN code signal and the rate/early PN code are multiplied is integral-calculated during a predetermined short time, thereby calculating a rate correlation value and early correlation value. If the rate correlation value is higher than the early correlation value, a clock of PN code generator(20) is generated by 1/4 chip until the rate correlation value is smaller than the early correlation value. If the rate correlation value is smaller than the early correlation value, the clock of PN code generator(20) returns to a previous clock, thereby activating a comparator. The comparator(24) compares a calculated correlation value with a threshold value. If the correlation value is smaller than the threshold value, the clock of PN code generator is delayed by 1/8 chip until the correlation value is higher than the threshold value. If the correlation value is higher than the threshold value, PN code phase having the correlation value at that time, thereby adjusting a synchronization of the PN code. Thereby, a rapid synchronization detection time is made, and a reliable synchronization is obtained.
Patent KR-20000066267-A (KR)
Inventor: PARK SANG BEOM
IPC: G11C11/401
Filed: 1999-04-15
Abstract: PURPOSE: An internal voltage generator for preventing current consumption of a semiconductor device is provided which minimizes the current consumption of a low power semiconductor device, by reducing a self refresh current of the whole circuit by disabling the operation of a voltage detection part of the internal voltage generator during self refresh operation. CONSTITUTION: An internal voltage generator for preventing current consumption of a semiconductor device reduces a self refresh current of the whole circuit by disabling the operation of a voltage detection part of an internal voltage generator during self refresh operation. The voltage detection circuit of the internal voltage generator comprises: a first voltage sensing part(101) detecting the difference between an external power source voltage and a second reference voltage; a second voltage sensing part(102) turned on in response to a first reference voltage to compare the external power source; a voltage supplying part(103) supplying an external voltage in response to an output of the first voltage sensing part(101); a voltage dropping part(104) which drops the external power source to a fixed potential in response to the first reference voltage, being connected to the voltage supplying part(105); an output part(105) which supplies the external power source or the internal power source, being connected to an output node between the voltage supplying part(103) and a voltage dropping part(104); and a current consumption preventing part(106) disabling the circuit operation in response to a self refresh enable signal.
Patent KR-19990083365-A (KR)
IPC: H01J37/304
Filed: 1999-04-21
Abstract: 광 노광 장치의 노광 조건이나 노광하는 패턴의 특징에 따라 변화하는 변형에 맞추어 묘화를 행할 수 있고, 광 노광 장치와 전자빔 묘화 장치 또는 광 노광 장치끼리의 고정밀도의 정합 묘화를 가능하게 한다. 
     노광 조건이나 노광하는 패턴의 특징에 따라 변하는 패턴 형상의 기준 패턴 노광을 행하고, 노광된 패턴을 파선으로 표시한 미세 영역으로 분할하고(a), 각 영역에 있어서, 패턴의 특징량 fx, fy를 산출한다(b).  보정량은, 패턴의 특징량과 노광 필드내의 위치를 파라미터로 하여 구할 수 있다(화살표와 파선 참조; c).  다른 노광 장치로 반도체 소자상에 다음 반도체 소자 패턴층을 형성할 때, 형상의 변화를 근거하여 형성하는 패턴 형상을 동일하게 변화시킨다.
Patent KR-20000066878-A (KR)
Inventor: LIM SEONG BIN
IPC: H01M10/48
Filed: 1999-04-21
Abstract: PURPOSE: A method for generating data monitoring and controlling a charging and a discharging status of a secondary battery is provided to generate correct data by determining a charging status as a mean voltage value of a secondary battery. CONSTITUTION: A method for generating data monitoring and controlling a charging and a discharging status of a secondary battery comprises the steps of: obtaining updating a mean voltage value of a secondary battery for a predetermined period; selecting and executing any one of a charging mode, a discharging mode, and a self-discharging mode according a current value of the secondary battery; and starting a discharging mode. The process for performing discharging mode comprises the steps of: obtaining a discharging efficiency corresponding to a temperature of the secondary battery; obtaining a discharging capacity according to the passage of time; updating the discharging capacity to full charging necessary capacity of a current period; and updating the reference charging capacity of the current period to the full charging necessary capacity.
Patent KR-20010001392-A (KR)
Inventor: AN BYEONG YEOL
IPC: F04B49/00
Filed: 1999-06-03
Abstract: PURPOSE: A pump and compressor is provided to achieve an improved suction and compression efficiency. CONSTITUTION: A rotation transmission device of unequal speed is installed to a shaft rotating at a constant speed. Utilizing a rotational force having such an unequal rotation ratio, compression time and expansion time, or compression speed and expansion speed are set to be different from each other, to thereby improve overall compression and suction efficiency. A compressor and a pump have time period for compression process longer or shorter than that for suction process, to thereby improve efficiency or obtain desired operational characteristics. To make the time period for compression process longer or shorter than that for suction process, a rotation transmission device having unequal speed is employed. Alternatively, a crank shaft is arranged to be spaced apart from a cylinder shaft, so that the rotation angle of the crank shaft when a piston is at a suction state, and the rotation angle of the crank shaft when the piston is at a compression state, differ from each other.
Patent KR-20000006118-A (KR)
Inventor: GOBAYASIDAKAAKI
IPC: H01L21/60
Filed: 1999-06-11
Abstract: PURPOSE: A semiconductor device having base barrier film for solder bump and manufacturing method thereof are provided to alleviate the stress applied to a base barrier film by isotopic etching and to enhance reliability. CONSTITUTION: The semiconductor device having base barrier film for solder bump comprises: a solder bump(5); a top wiring layer(1); and a base barrier film(4) presented between the top wiring layer and the solder bump and having circular flat shape patterned by the isotopic etching, and the manufacturing method thereof comprises: a step forming a base barrier film on a top wiring layer; a step patterning the base barrier film into a circular or a polygon shape except a triangle and a rectangular; and a step forming a solder bump.
Patent KR-20010002247-A (KR)
Inventor: LEE YONG IN
IPC: B32B37/12
Filed: 1999-06-12
Abstract: PURPOSE: An improved production method of polarizing film is disclosed to eliminate troubles of known solvent type adhesives used in the preparation of polarizing film by using non-solvent type cross-link adhesives. CONSTITUTION: A production method of polarizing film is performed by producing a polarizing film plate consisting of a PVA(Poly Vinyl Alcohol) film both sides being CTA(Cellulose Triacetate) films as protection layers and a PE(Polyester) protection film, applying cross-linking adhesives activated by the radiation of energy beam such as EB(Electron beam) or UV ray onto either side of the CTA film layers and radiating EB toward the applied films to activate the cross-link process of the adhesives to form an adhesive layer. The cross-link process is successfully complete by radiating, for example, UV ray for 1-100 seconds.
Patent KR-20010003152-A (KR)
Inventor: CHA JIN GI
IPC: A61Q5/04
Filed: 1999-06-21
Abstract: PURPOSE: A composition for permanent wave containing alkylglucoside(a nonionic surfactant) and/or alkoxydiglycol(a solvent) is provided, which can forms stable and elastic curl within short time, improves maintenance, and is less irritable to hair and head skin, so which increases reliability of product. CONSTITUTION: A process for the preparation of composition for permanent wave comprises: pouring 60% thioglycolic acid(or L-cystein hydrochloride), hydrolized collagen, disodium ethylene diamine tetra-acetate, glycerin, cetyl triammonium chloride, nonoxynol-12, octyl glucoside(a kind of alkylglucoside, 0.1-15wt.% based on the total weight of the composition), ethoxy diglycol(a kind of alkoxydiglycol, 0.1-15wt.% based on the total weight of the composition) to distilled water, and mixing and adding perfume; adding 28% liquid ammonia to the compound to control pH to be 8.5-9.5 to get a reduction agent of a permanent wave product; pouring sodium perbromide and sodium phosphate to distilled water, and dissolving and adding phosphoric acid to control pH to be 4.0-6.5 to get an oxidation agent of a permanent wave product.
Patent KR-20000006416-A (KR)
Title: Polishin Apparatus
Inventor: SGIYAMA MITHO
IPC: B24B37/00
Filed: 1999-06-24
Abstract: PURPOSE: A polishing device polishes a workpiece by using a simple unit, and performs a preliminary cleaning. CONSTITUTION: The polishing device includes a platen(2) rotated by a main motor(21); a carrier(3) which maintains a wafer(W), and presses the wafer about a polishing pad(20) of a platen(2) while rotating; a slurry provider(5) for providing a slurry(S) to a polishing pad(20) of the platen(2); and a clean water provider(6) for providing a clean water(R) to the polishing pad(20). Thereby, a second polishing device(200) is not needed, and an installation cost is reduced.
Patent KR-20010004720-A (KR)
Inventor: LEE JEONG HO
IPC: H01L21/28
Filed: 1999-06-29
Abstract: PURPOSE: A method for fabricating a surface channel PMOS transistor with a high performance is provided to improve electrical characteristics of the transistor. CONSTITUTION: The first silicon layer(24), a silicon germanium layer(25) and the second silicon layer(26) are formed in a stack on a silicon substrate(21). Next, a gate oxide(27) and a gate polysilicon pattern(28) are formed thereon. The polysilicon pattern(28) is then etched through a gate spacer(29), which leads to a residual polysilicon pattern(28a). Here, exposed portions of the second silicon layer(26) are removed, too. Thereafter, by a selective epi-silicon growing, an epi-silicon germanium layer(30) and a poly-silicon germanium layer(31) are formed on the exposed silicon germanium layer(25) and on the residual polysilicon pattern(28a), respectively. Then, a titanium silicon layer(32) is formed thereon. As a result, a buried/elevated junction region(100) of stacked layers(24,25,30,32), the epi-silicon germanium elevated channel(200) of stacked layers(24,25,26), and a gate electrode(300) of stacked layers(28a,31,32) are formed.
Patent KR-20000011407-A (KR)
Inventor: MITANI KUYOSI
IPC: H01L21/762
Filed: 1999-07-01
Abstract: PURPOSE: An SOI wafer production method and an SOI wafer produced in this way is produced to improve the uniformity of the thickness of SOI layer by minimizing the impact of the thickness deviation of the oxide film formed on the bond wafer. CONSTITUTION: The SOI wafer is produced in the process of: step 1, to prepare a bond wafer(2) and a base wafer(1) a supporting substrate and forming at least an oxide film on the bond wafer, and injecting hydrogen ion or a rare gas ion through the oxide film so that a fine bubble layer may be formed in the bond wafer part; step 2, to have the ion injected part and the surface of the base wafer stick together tight, and to thermo treat the bond wafer. Therefore a control is made so that the thickness deviation of the oxide film formed on the bond wafer is smaller than the depth deviation of an ion injection and the uniformity of the thickness of the SOI layer is improved.
Patent KR-20010009722-A (KR)
Inventor: KIM TAE YEONG
IPC: H01L21/027
Filed: 1999-07-13
Abstract: PURPOSE: A wafer pattern structure is provided to reduce the number of inferior semiconductor devices by preventing a semiconductor chip pattern and an alignment mark pattern from being damaged in a semiconductor fabrication process. CONSTITUTION: A wafer pattern structure includes semiconductor chip area(1) and alignment mark areas. The alignment mark area(5) includes a first area, a second area and a prohibition area. Many semiconductor chip areas includes many semiconductor chip patterns. Alignment mark patterns for arranging a wafer during a light-exposing process are formed in the alignment mask area. The first area includes the alignment mark pattern. A second area includes a damage prevention pattern of a predetermined shape to prevent a damage of the alignment mark pattern during the etching process after the light-exposing process. The prohibition area is determined between the alignment mark pattern and the damage prevention pattern. Thereby, the wafer pattern structure reduces the number of inferior semiconductor devices by preventing a semiconductor chip pattern and an alignment mark pattern from being damaged in a semiconductor fabrication process.
Patent KR-20010010860-A (KR)
Inventor: HO MUN HO
IPC: H01L21/66
Filed: 1999-07-23
Abstract: PURPOSE: A method for detecting a poor semiconductor package is to detect a position of a poor semiconductor package after a molding process. CONSTITUTION: A wafer is cut along a scribe line to divide a semiconductor chip. Each semiconductor chip is adhered on each unit space formed on a pattern film(10). Each unit space of the pattern film is arranged in a shape of matrix, and the semiconductor chip is also arranged in a shape of matrix. A bonding pad is electrically connected to a metallic pattern of the pattern film through a wire bonding process. Before a molding process, a poor semiconductor chip is detected, and a position thereof is marked with a special symbol. A mapping process is performed by scanning an upper portion of the pattern film. The position of the semiconductor chip is reduced in a high magnification, and an edge surface of the pattern film is marked with a laser. The pattern film is molded with a sealant(30). The marked portion(40) is distinguished.
Patent KR-20010011874-A (KR)
Inventor: LEE JU HEUNG
IPC: H04N7/50
Filed: 1999-07-30
Abstract: PURPOSE: A device for generating an address of a memory and a wireless terminal using thereof, is provided to generate a memory address capable of being outputted in a desired row direction without using a counter and an accumulator, so that the configuration of hardware in a video encoder/decoder of a wireless terminal or an interleaver of a mobile communication system can be simplified, and an operation speed can be quickened. CONSTITUTION: In a memory inputting optional data according to row addresses and outputting the data according to column addresses, a counter(520) sequentially generates row addresses and column addresses to 63 with a 6-bit output. A MUX(multiplexer,530) receives the row addresses and the column addresses generated in the counter(520), to select one according to a control signal. If the control signal selects row-write addresses, the MUX(530) selects the row-write addresses, and if the control signal selects column-read addresses, the MUX(530) selects the column-read addresses. A pre-memory receives data according to the row-write addresses, and outputs data according to the column-read addresses. The row addresses and the column addresses are simultaneously generated in a memory address generator by a predetermined difference of time. And parallel processing is enabled by mutually changing the direction of row and column, after one period of addresses are generated.
Patent KR-20010016827-A (KR)
Inventor: BAE GEUN TAEK
IPC: C09D5/32
Filed: 1999-08-04
Abstract: PURPOSE: Provided is a photo-selective absorption coating composition containing a sub-phthalocyanine colorant, which can be applied to a surface or a filter of a color display. CONSTITUTION: The photo-selective absorption coating composition comprises a plastic resin and the sub-phthalocyanine colorant(formula 1), which are dissolved in an organic solvent, wherein the plastic resin is at least one selected from the group consisting of poly(methylmethacrylate), poly vinyl alcohol, polycarbonate, ethylene vinyl acetate, or poly(vinyl butyral). In the formula, R1-R4 are independently hydrogen; C1-C6 alkyl, alkoxy, or alkyl amine; phenyl; alkyl phenyl; nitro or halogen substituted phenoxy; nitro; halogen; cyano, and X is F, Cl, or Br.
Patent KR-20010018928-A (KR)
Inventor: YOON JO HUI
IPC: B01J23/10
Filed: 1999-08-24
Abstract: PURPOSE: Disclosed is a catalyst of the wet oxidation process for removing non-decomposable and toxic aromatic chemicals from those preparation or consuming process. The devised catalyst is composed of transition metals such as Mn, Cu, Ce, and Zr and the weight ratio of mixed species is 0.36, 0.07, 0.43, and 0.14, respectively. CONSTITUTION: The nitrate salts of Mn (0.36), Zr (0.14), Ce (0.43) and Cu (0.07), where number in parentheses is weight ratio, are dissolved in the distilled water to gain 8.5 of pH with addition of ammonium solution. The precipitated material is washed with distilled water and then is dried at 100deg.C for 24 hours. The final catalyst is prepared by calcining and crushing below 200 mesh size.