Patent SG-11201402456P-A (SG)
Title: Method for preparing liquid chemical for forming water-repellent protective film
Inventor: RYOKAWA ATSUSHI
IPC: H01L21/304
Filed: 2012-11-19
Abstract: (i2) mwu ft iz s-5 iv x m £ titz s issaj n d9) mm IHMMi _ (43) 2013 ^6^ 6 0 (06.06.2013) I P O I P C T (10) WO 2013/080822 A1 (51) H01L 21/304 (2006.01) (21) PCT/JP2012/079902 (22) 2012^11^ 19 0(19.11.2012) (25) g|@ttii0>Wi§: B*Wi (26) @(8&M©Wl§: 0*f§ (30) fiBfcftf '— 1 £: 2011-261011 2011 ^ 11 ^ 29 0(29.11.2011) JP ^Ji® 2012-237503 2012 ^ 10 ^ 29 0(29.10.2012) JP (71) Hi M A : \"tr > h ^ |±_(CENTRAL GLASS COMPANY, LIMITED) [JP/JP]; T 7550001 Uj • 2 5 3#±fc Yamaguchi (JP). (72) [SSJII §t(RYOKAWA, Atsushi); T 7550001 LU • 5 5 2 3 #±fe -fe > h \"7 Jl' 5B -f ^ TC 35 tt 1b ^ 5Jf ^ PJT Yamaguchi (JP). LJUH J1¥(YAMADA, Shuhei); T 7550001 Uj = Pl?OTX?m5 2 5_3Stt -tr>h^ 3^1 Ib^SFfttfr 1*1 yamaguchi (JP). = H3A(FUJITANI, Masahiro); T 7550001 Uj • = IW^?SP5 2 5 3Stt t>h7^ 5^33^1 Yamaguchi (JP). 4A flj —(KUMON, Soichi); T 5150001 HElftl&IK — m*amn 5 1 o -tr> = fig ^ EJF PJT fa Mie (JP). If H *£| (SAITO, Mas- anori); T5150001 = SfcTfT^ P ffl]\" 1 5 1 0 -tr> Mie (JP). StJl ^(SAIO, Takashi); T5150001 = BRrtr^pprrj 5 1 o -t?> h^fig^^a fig ^ 5Jf F/T fa Mie (JP). JTL E9 /\"S (ARATA, Shinobu); T 5150001 -SRtelKrfi^P par 1 5 1 0 -tr> h^Hfl^ttaSSsa Mie (JP). (HASHIMOTO, Yosuke); T 7550001 LUP»^m^^^^5 2 5 3#±fe \"tr> h \"7 s^a Ib^Sjf 3?CF/T fa Yamaguchi (JP). (74) ftIIA: 'M* tf®, ^(KOBAYASHI, Hiromichi etal.); T 1040044 £l* BJ 5 EST 1f29^ s H i G Afama^MFjifa Tokyo (JP). (8i) (^ro&i^PBy, IS ft nJ f b): AE, AG, AL, AM, AO, AT, AU, AZ, BA, BB, BG, BH, BN, BR, BW, BY, BZ, CA, CH, CL, CN, CO, CR, CU, CZ, DE, DK, DM, DO, DZ, EC, EE, EG, ES, FI, GB, GD, GE, GH, GM, GT, HN, HR, HU, ID, IL, IN, IS, KE, KG, KM, KN, KP, KR, KZ, LA, LC, LK, LR, LS, LT, LU, LY, MA, MD, ME, MG, MK, MN, MW, MX, MY, MZ, NA, NG, NI, NO, NZ, OM, PA, PE, PG, PH, PL, PT, QA, RO, RS, RU, RW, SC, SD, SE, SG, SK, SL, SM, ST, SV, SY, TH, TJ, TM, TN, TR, TT, TZ, UA, UG, US, UZ, VC, VN, ZA, ZM, ZW. (84) *!£H (asrofci^isy > ±T(Dmm(Dfcm% 11^ nlfb): ARIPO (BW, GM, KE, GH, LR, LS, MW, MZ, NA, RW, SD, SL, SZ, TZ, UG, ZM, ZW), -3- — =y v mmta (54) Title: METHOD FOR PREPARING CHEMICAL FOR FORMING PROTECTIVE MEMBRANE (54) fgBJCD^fft : [HI] ^ iii©sis*& AA... FIRST PREPARATION METHOD BB... FIRST REFINEMENT STEP (SOLVENT REFINEMENT) CC... MIXING STEP (MIXING SOLVENT AND AGENT FOR FORMING WATER-REPELLANT PROTECTIVE MEMBRANE) DD... SECOND REFINEMENT STEP (CHEMICAL REFINEMENT) (57) Abstract: This method prepares a chemical that is for forming a water-repellant protective membrane, has solvent a and an agent for forming a water-repellant protective membrane, and is for forming a water-repellant protective membrane at least at the fS surface of the concave portions of the bumpy pattern of a wafer having the bumpy pattern at the surface. The method has: first a re - finement step that eliminates the elements (metal impurities) Na, Mg, K, Ca, Mn, Fe, Cu, Li, Al, Cr, Ni, Zn, and Ag in the solvent by ^ means of distilling the solvent or by means of particle-eliminating membrane a and an ion exchange resin membrane; mixing a step 00 for mixing the solvent after the first refinement step and the agent for forming a water-repellant protective membrane; and a second © refinement step for eliminating particles in the chemical after the mixing step by means of particle-eliminating membrane. a O tit&tz/sbO), mmt, y HU ^ N a , Mg, K, Ca, Mn, Fe, Cu, Li, Al, Cr, Ni, Zn $.L£A g n (&jswiai) £, ic^y^s-rs, XIA, ^ u, -r ;u£, 1 %2(Dmwk*.n^t&o WO 2013/080822 Al I lllll llllllll II llllll III lllll lllll lllll lllll III III III lllll llll llll lllll lllll lllllll llll llll T (AM, AZ, BY, KG, KZ, RU, TJ, TM), 3 — \ (AL, AT, BE, BG, CH, CY, CZ, DE, DK, EE, ES, FI, FR, o, & (x ,\ GB, GR, HR, HU, IE, IS, IT, LT, LU, LV, MC, MK, MT, ~~ 21 *(3)} NL, NO, PL, PT, RO, RS, SE, SI, SK, SM, TR), OAPI (BF, BJ, CF, CG, CI, CM, GA, GN, GQ, GW, ML, MR, NE, SN, TD, TG).