baber/WOPTO huggingface dataset:
Patent TW-498282-B (TW)
Title: System, method, and article of manufacture for a load balancer in environment services patterns
Inventor: BOWMAN-AMUAH MICHEL K
IPC: G06F9/46
Filed: 2001-02-14
Granted: 2002-08-11
Abstract: A system, method and article of manufacture are provided for distributing incoming requests amongst server components for optimizing usage of resources. Incoming requests are received and stored. An availability of server components is determined and a listing of available server components is compiled. A determination is made as to which server component on the listing of available server components is most appropriate to receive a particular request. Each particular request is sent to the selected server component determined to be most appropriate to receive the particular request.
Patent TW-495471-B (TW)
Title: Watertight and thermally insulating tank built into the bearing structure of a ship and method of manufacturing insulating caissons intended to be used in this tank
Inventor: DHELLEMMES JACQUES
IPC: F17C3/04
Filed: 2000-09-01
Granted: 2002-07-21
Abstract: Watertight and thermally insulating tank built into the bearing structure of a ship, said tank comprising two successive watertightness barriers, one being a primary one in contact with the product contained in the tank and the other being a secondary one placed between the primary barrier and the bearing structure, at least one thermally insulating barrier being provided between the bearing structure and the secondary watertightness barrier and/or between the two watertightness barriers, each thermally insulating barrier consisting of a number of caissons (102) of roughly parallelepipedal overall shape, each caisson having a bottom panel (105) and a top panel (106) made of plywood, characterized in that the panels of each caisson are spaced apart by a number of spacer pieces (103) which consist of thin sheets of plywood, extending at right angles to said panels, each caisson being at least partially filled with blocks of foam (104), bonded over a substantial part of the height of each spacer piece, to prevent the spacer pieces from buckling under load.
Patent TW-472190-B (TW)
Title: Method for directly accessing mass storage under protection mode
Inventor: ZHANG TUNG-RUEI
IPC: G06F12/00
Filed: 2000-09-08
Granted: 2002-01-11
Abstract: Provided is a method for directly accessing mass storage under protection mode with dynamic virtual device driver; dynamic VxD. It is able to read the specified located data in the harddisk by sending the command of read-write harddisk to VxD and sending the location and numbers of areas that are to be read as parameters to VxD. Then it writes data into the specified area of the harddisk by sending write command to VxD and sending the location and numbers of areas that are to be written as parameters to VxD.
Patent TW-438958-B (TW)
Title: Furnace boat-push device
Inventor: HWANG BEN-JAMN
IPC: F27B21/08
Filed: 2000-10-16
Granted: 2001-06-07
Abstract: The present invention provides a furnace boat-push device, which comprises a gas sealing device installed besides the inlet of a conventional furnace manifold, such that the gas from the nitrogen ejection outlet of the gas sealing device, will not pass through the wafer supported by the boat. Furthermore, the nitrogen ejection outlet is formed above the nozzle of the gas sealing device in such a way that it forms a specified angle with the surface of the wafer, thereby increasing the removal efficiency for the impurity particles on the surface of the wafer, while ensuring the wafer from the interference of the outside oxygen and impurity particles.
Patent TW-553771-B (TW)
Title: Exhaust gas purification catalyst for internal combustion engine
Inventor: YAMAMOTO KOSEI
IPC: B01J37/02
Filed: 2000-10-24
Granted: 2003-09-21
Abstract: An object of the present invention is to provide an exhaust gas purification catalyst which can minimize the separation of the catalyst layer due to heat and vibration, can suppress thermal deterioration of the catalytic substance, and can exhibit excellent purification capabilities under severe conditions. Specifically, the present invention relates to an exhaust gas purification catalyst wherein an undercoat layer comprising a heat-resistant inorganic oxide having an oxygen-absorbing substance added thereto is formed on a surface of a metallic carrier, and a catalyst-carrying layer is formed on the undercoat layer.
Patent TW-492130-B (TW)
Title: Vacuum processing device and vacuum processing system
Inventor: KAWAHARA HIRONORI
IPC: B65G49/07
Filed: 2000-10-25
Granted: 2002-06-21
Abstract: The present invention provides a vacuum processing device for the large diameter of testing material and for eliminating the increase of manufacturing cost, and providing excellent maintainability. The vacuum processing device according to the present invention comprises a plurality of cassette stages (2a, 2b) in parallel configuration, and an atmosphere loader (1) on the carrying device (13) for transporting the wafer (20) from these cassette stages or toward the cassette stages; and, the etching chambers (11a, 11b) for processing the wafer; a vacuum carrying machine (7) connecting with the vacuum transporting chamber (16) for the vacuum processing chamber via the gate valves (15a, 15b); and, the gate valves (12a, 12b, 12c, 12d) connecting with the carrying device (13) and the vacuum transporting chamber (17), which are composed of a lock device (6) made of a loading lock room (6a) and an unloading lock room (6b). Moreover, the etching processing chamber for processing the wafer is an etching processing chamber formed with UHF-ECR reactor. The etching processing chambers are symmetric to the axis (line A) passing in the middle of the vacuum transporting chamber and the lock device, two of which are configured at the opposite sides of the vacuum transporting chamber, and the configuration positions of the two etching processing chamber to the vacuum transporting chamber are located at the opposite sides of the vacuum transporting chamber and in an acute angle. The antennas for UHF-ECR (110a, 110b) are in parallel to the axial line and opened to the opposite side of the vacuum transporting chamber.
Patent TW-I222985-B (TW)
Title: Continuous production of copolyamides based on a lactam (I), a diamine (II) and a dicarboxylic acid (III)
Inventor: DEININGER JUERGEN
IPC: C08G69/36
Filed: 2000-10-26
Granted: 2004-11-01
Abstract: A process for continuous production of copolyamides based on a lactam (I), a diamine (II) and a dicarboxylic acid (III) comprises reacting a mixture (IV) comprising a diamine (II), a dicarboxylic acid (III) and water in a first reaction zone at a pressure in the range from 1.3x10<5> to 2.5x10<5> Pa in the entry zone of the reaction zone and at a temperature above the melting point of polymer (V) to a conversion, based on the molar amounts of diamine (II) and dicarboxylic acid (III), of at least 80% to form a polymer (V), reacting a mixture (VI) comprising lactam (I) and water in a second reaction zone at a pressure in the range from 5x10<5> to 40x10<5> Pa and at a temperature above the melting point of polymer (VII) to a conversion, based on the molar amount of lactam (I), of at least 80% to form a polymer (VII),then reacting polymer (V) and polymer (VII) with each other in a third reaction zone at a pressure in the range from 1x10<5> to 1.5x10<5> Pa in the entry zone of the reaction zone at temperatures above the melting point of polymer (VIII) to form a polymer (VIII), said polymer (VIII) having a 95 DEG C. water extractables content, based on lactam (I), diamine (II) and dicarboxylic acid (III), of not more than 10% by weight, and then extracting the polymer (VIII) with water to obtain the copolyamide.
Patent TW-553848-B (TW)
Title: Laser etching method and apparatus therefor
Inventor: KOIDE JUN
IPC: B23K26/16
Filed: 2000-11-23
Granted: 2003-09-21
Abstract: The invention provides a laser etching method for optical ablation working by irradiating a work article formed of an inorganic material with a laser light from a laser oscillator capable of emitting in succession light pulses of a large energy density in space and time with a pulse radiation time not exceeding 1 picosecond, wherein, in laser etching of the work article formed of the inorganic material by irradiation thereof with the laser light from the laser oscillator with a predetermined pattern and with a predetermined energy density, there is utilized means for preventing deposition of a work by-product around the etching position.
Patent TW-516345-B (TW)
Title: Mechanism to test the alignment precision of micro via
Inventor: JANG CHIN-CHUNG
IPC: H05K10/00
Filed: 2000-11-30
Granted: 2003-01-01
Abstract: A mechanism to test the alignment precision of micro via is disclosed, which can be applied in testing the alignment precision of micro via, and which comprises a circuit board, a micro via, the first bonding pad layer, the second bonding pad layer, and a ring mark to prevent the shift of hole positioning pin from affecting the electrical conduction of the high density interconnection. Firstly, the testing mechanism for the alignment precision of micro via is aligned with the center of the micro via in the printed circuit board to be inspected by vision, and then the center line shift comparison is performed by using the first bonding pad layer and the second bonding pad layer, which are concentric circles with the micro via, so as to measure and calculate the difference value. By using the broken edge of the printed circuit board for inspection, not only the printed circuit board to be tested is prevented from being damaged, but also the quality condition can be understood correctly and effectively, so as to increase the reliability of the high density interconnect product.
Patent TW-571427-B (TW)
Title: Inductor structure for suppressing reduction of Q value
Inventor: TSAI JAU-JIE
IPC: H01L27/02
Filed: 2000-12-05
Granted: 2004-01-11
Abstract: The invented inductor structure at least contains the followings: the passivation layer formed on an insulation layer that contains via windows inside; and the spiral main body located on the passivation layer to fill into the via window, in which the spiral main body is covered with a covering layer. The area of via window is larger than 5 mum x 5 mum for reducing the resistance of via window; and thickness of the spiral main body is set from 6 to 26 mum for reducing the serial connection resistance.
Patent TW-458911-B (TW)
Title: Luggage restraining structure
Inventor: KIM YING-DAE
IPC: B62D25/08
Filed: 2000-12-06
Granted: 2001-10-11
Abstract: The luggage restraining structure comprises a safety block (30) fixed by securing elements between a rear folding seat (20) and a trunk (11), the trunk (11) being formed behind the rear folding seat (20) which is collapsible and easy to keep. The luggage retraining structure prevents the luggage from bouncing into the passenger area by the force of inertia of luggage loaded in the trunk (11) in the event of a sudden stop or rear-on collision, thereby protecting the passengers against the impact energy of luggage.
Patent TW-478082-B (TW)
Title: Contactor having LSI-circuit-side contact piece and test-board-side contact piece for testing semiconductor device and manufacturing method thereof
Inventor: MARUYAMA SHIGEYUKI
IPC: H01R11/01
Filed: 2000-12-20
Granted: 2002-03-01
Abstract: A contactor is placed between a semiconductor device and a test board. A contact electrode of the contactor electrically connects the semiconductor device to the test board. The contact electrode is formed of a conductive layer provided on an insulating substrate. The contact electrode comprises a first contact piece which contacts a terminal of the semiconductor device, a second contact piece which contacts an electrode of the test board, and a connecting portion which electrically connects the first contact piece and the second contact piece.
Patent TW-561530-B (TW)
Title: Process for fabricating CMOS transistor of IC devices employing double spacers for preventing short-channel effect
Inventor: TSAI WEN-JER
IPC: H01L21/8238
Filed: 2001-01-03
Granted: 2003-11-11
Abstract: A kind of process for fabricating CMOS transistor of IC devices employing double spacers with the capability of preventing short-channel effect is disclosed in the present invention. At first, a gate structure is formed on the substrate of integrated circuit device, and is followed by forming the first isolation layer on the sidewall of the gate structure. After that, impurities are implanted into the source/drain regions of the transistor to form lightly doped source/drain regions of the transistor. Then, the second sidewall isolation layer is formed for the gate structure such that the second sidewall isolation layer covers the surface of the first sidewall isolation layer. By using a source/drain implantation procedure, heavily doped source/drain regions are formed below the lightly doped source/drain regions. At last, by performing a rapid thermal annealing procedure, the impurities of lightly doped source/drain regions and heavily doped source/drain regions are driven in a side direction into the channel region of the transistor. The degree of driving impurities in a side direction into the channel region is substantially equal to the thickness of the first isolation layer at the base of gate structure. In addition, the source/drain regions of the transistor are activated through the rapid thermal annealing procedure.
Patent TW-498568-B (TW)
Title: Microwave isolator
Inventor: MCKITTERICK JOHN BURT
IPC: H04B1/44
Filed: 2001-02-06
Granted: 2002-08-11
Abstract: A microwave isolator including a driving circuit and a receiving circuit, wherein the driving circuit receives an input signal from a first isolated circuit and generates a corresponding radio frequency (RF) signal and the receiving circuit detects and decodes the corresponding RF signal and provides a corresponding output signal to a second isolated circuit. The driving circuit contains an oscillator for generating the corresponding RF signal based on the input signal from the first isolated circuit, a transmitting antenna for transmitting the corresponding RF signal, and a microwave switch interposed between the oscillation means and the transmitting antenna for switching the RF signal to the antenna. The receiving circuit contains a receiving antenna to receive the corresponding RF signal and means for detecting and decoding the received corresponding RF signal and providing the corresponding output signal to the second isolated circuit.
Patent TW-533244-B (TW)
Title: Method for processing dusts or dust mixtures
Inventor: EDLINGER ALFRED
IPC: C22B7/04
Filed: 2001-01-18
Granted: 2003-05-21
Abstract: In a method for processing dusts or dust mixtures containing alkalis and heavy metals, such as, e.g., steelworks dusts, fine ores or blast furnace dusts, the dusts are charged onto or into, in particular top-blown on or blown into, a bath of molten metals and liquid oxidic slags. Volatile heavy metal compounds such as, e.g., Zn and/or Pb oxides are separated from the gaseous phase and alkalis are introduced into the slags.
Patent TW-594552-B (TW)
Title: Remote control device with pointer
Inventor: WATANABE MASAO
IPC: G06F3/038
Filed: 2001-02-06
Granted: 2004-06-21
Abstract: The present invention is to achieve good operability, which can move the cursor without unconsciously releasing the dragging mode during dragging. The present invention provides a remote control device, which includes a pointer 4; the buttons 4a, 4b configured on the pointer 4; and a button status detection means 6 for detecting the connecting or disconnecting status of the buttons 4a, 4b; a connection mode determination means 1 for determining the buttons 4a, 4b being connected when satisfying the first determination condition based on the detection result of the button status detection means 6; a mode storage means 3 for storing the mode for buttons 4a, 4b determined to be connected; a switch means 1 for not outputting the change when the buttons 4a, 4b being determined as connected but then becoming disconnected; a mode releasing means 1 for releasing the mode being determined as connected when satisfying the second predetermined condition; and, the transmission means 7 for transmitting at least the output from the pointer 4 and the output from the switch means 1.
Patent TW-502170-B (TW)
Title: Adaptive adjustment of threshold of FIFO buffer
Inventor: BAI HUNG-DA
IPC: G06F5/06
Filed: 2001-02-27
Granted: 2002-09-11
Abstract: A device, requiring memory access and real-time operation, usually has a FIFO buffer between the memory and the device. A threshold of the FIFO buffer is used to trigger the buffer starting memory access or to change the access priority of the buffer. According to the invention, the threshold value of the buffer is increased once condition of the buffer being empty is detected. This approach prevents the buffer from empty again. Through the approach, the threshold value will not be too high to adversely affect the utilization of the memory bandwidth.
Patent TW-I239089-B (TW)
Title: Manufacturing process of semiconductor device
Inventor: FUKUDA HIROKAZU
IPC: H01L23/50
Filed: 2001-03-15
Granted: 2005-09-01
Abstract: The present invention provides a manufacturing method of a semiconductor device to fulfill the requirements including the miniaturization and light-weight of portable terminal apparatus, and the function of extending application time of built-in battery. The subject of the present invention is to surmount the real mounting structure of the present power MOSFET to effectively reduce the switching-on resistance so as to become suitable for mass production. The invented semiconductor apparatus is composed of the followings: the lower frame 4 provided with the chip seat 2, which is used for fixing the semiconductor chip 1, and the external leads 3d, 3g; the bunting contact electrode 6 and the external lead 3s, which are fixed on the current-flow electrode 5 formed on top of the semiconductor chip 1; and the molding resin 8. The invention can be undergone with a mass production in the two-frame manner to realize the real mounting structure with extremely low switching-on resistance.
Patent TW-I241357-B (TW)
Title: Preplating treatment agent, and method for plating metal with such preplating treatment agent
Inventor: IMORI TORU
IPC: H05K3/38
Filed: 2001-04-13
Granted: 2005-10-11
Abstract: The present invention provides a method for metal plating which makes it possible to perform electroless plating in a favorable manner even on materials difficult to apply electroless plating, and a pretreatment agent for this method. An article to be plated is treated with a pretreatment agent which has been prepared by mixing a solution of a silane coupling agent having a metal-capturing functional group in its molecule and a solution containing a metal that shows catalytic activity in the deposition of a plating metal such as copper, nickel or the like from an electroless plating solution onto the surface of an article to be plated so that the above-mentioned metal is captured by the above-mentioned silane coupling agent, and then adding a reducing agent. Afterward, electroless plating is performed so that a metal thin film is formed on the surface of the article pretreated above. Then, desired metal plating can be performed.
Patent TW-527346-B (TW)
Title: Process for the preparation of indoles
Inventor: WURZIGER HANNS
IPC: C07D209/88
Filed: 2001-05-23
Granted: 2003-04-11
Abstract: Process for the preparation of indoles, characterised in that at least one arylhydrazone in liquid or dissolved form is mixed with at least one catalyst in liquid or dissolved form in at least one, optionally heatable microreactor and reacted for a residence time, and the indole compound obtained in this way is, if desired, isolated from the reaction mixture, the catalyst empolyed being an inorganic acid, an organic acid, a Lewis acid, or a mixture of at least two of these catalysts.
Patent TW-494541-B (TW)
Title: Method for producing silicon nitride read-only-memory
Inventor: LIOU JIAN-HUNG
IPC: H01L21/28
Filed: 2001-05-28
Granted: 2002-07-11
Abstract: A method for producing a silicon nitride read-only-memory (ROM) comprises: sequentially forming a first oxide layer and a silicon nitride layer on a substrate; patterning the silicon nitride layer and the first oxide layer to form an opening and exposing a portion of the substrate; performing an oxidation process to form a second silicon oxide layer on the silicon nitride layer while forming a field oxide layer on the substrate exposed by the opening; patterning the second oxide layer, the silicon nitride layer and the first oxide layer to form a structure of an oxide layer-silicon nitride layer-oxide layer.
Patent TW-555788-B (TW)
Title: Process for production of optical material
Inventor: YOSHIMURA YUICHI
IPC: C08G79/00
Filed: 2001-06-13
Granted: 2003-10-01
Abstract: An improved process for producing optical materials with minimized yellowing is described. The process is characterized by polymerizing/curing a composition for optical materials after adding a bluing agent. With the use of the bluing agent, the yellowing is minimized even when a large amount of an ultraviolet light absorber is used to improve a light resistance of the resultant optical material, thereby enabling the production of optical materials having a colorless and transparent appearance and excellent optical properties.
Patent TW-550544-B (TW)
Title: Disk driving device
Inventor: KOHYAMA TAKURO
IPC: G11B33/12
Filed: 2001-06-27
Granted: 2003-09-01
Abstract: The disk driving device according to the present invention has a structure including a horizontal guiding mechanism and a vertical guiding mechanism between a frame (10) and a slider (60) for slidably guiding the slider (60). The horizontal guiding mechanism includes a joint sheet (69b) configured at least on the frame (10) or on the slider (60), and a joint sheet configured on the other one, and the joint hole (24a) joined with these joint sheets (69b); and, using the sheet metal material to form the joint sheet (69b) in one of the frame (10) and the slider (60), and by folding part of the sheet metal material to form the joint sheet (69b). Thus, the present invention can form the joint sheet (69b) by folding part of the sheet metal material to simplify the structure of the disk driving device according to the present invention for easy manufacturing and reducing the manufacturing cost.
Patent TW-583286-B (TW)
Title: Multicolor dye set with high light-fastness and high water-fastness
Inventor: LEU YI-JING
IPC: C09D11/00
Filed: 2001-07-20
Granted: 2004-04-11
Abstract: An ink-jet ink of multicolor dye set with high light-fastness and high water-fastness comprises: a multicolor dye set, a surfactant, and an aqueous solvent. The multicolor dye set includes a cyan dye set, a magenta dye set, and a yellow dye set. The cyan dye set comprises direct blue 199 dye, acid blue 9 dye, and direct blue 86 dye. The magenta dye set comprises reactive red 180 dye, acid red 52 dye, and reactive red dye. The yellow dye set comprises acid yellow 23 and direct yellow 86 dye. When the multicolor dye set of the invention is applied in ink-jet printing process, the high-quality printed image possesses great light-fastness and water-fastness high chroma, broad color gamut.