Patent EP-2281916-A1 (EP)
Inventor: SCHIMANSKI ARND
IPC: C23C18/12
Filed: 2010-06-24
Abstract: The method for coating the substrates (S1, S2, S3, S4) at normal pressure, comprises generating a plasma jet from a working gas, feeding gaseous, liquid or solid precursors to the working gas and/or the plasma jet, where the precursor is brought into the plasma jet for reaction, depositing a reaction product of one of the precursors on a surface of the substrate and/or on a layer disposed on the substrate, and depositing a further layer using a wet-chemical process, where the layer deposition is carried out at atmospheric pressure. A sol-gel-process is applied as wet-chemical process. The method for coating the substrates (S1, S2, S3, S4) at normal pressure, comprises generating a plasma jet from a working gas, feeding gaseous, liquid or solid precursors to the working gas and/or the plasma jet, where the precursor is brought into the plasma jet for reaction, depositing a reaction product of one of the precursors on a surface of the substrate and/or on a layer disposed on the substrate, and depositing a further layer using a wet-chemical process, where the deposition of the layers is carried out at atmospheric pressure. A sol-gel-process is applied as wet-chemical process. One of the properties of the substrates such as scratch resistance, self-healing ability, barrier properties, corrosion resistance, reflectivity, transmissivity, refractive index, transparency, light scattering, electrical conductivity, anti-bacterial behavior, friction, adhesion, hydrophilicity, hydrophobicity, repellency, surface tension, surface energy, anti-corrosive effect, dirt-repellent effect, self-cleaning ability, photocatalytic behavior, anti-stress behavior, wear characteristics, chemical resistance, biocidal behavior, biocompatible behavior, electrostatic behavior, electrochromic activity, photochromic activity and gasochromic activity is altered by one of the deposited layers. A multi-function coating is realized with two of the properties of the substrates. The layer deposited by the plasma is formed as adhesion-promoting layer and/or barrier layer. An organic light-emitting diode is formed by depositing the layers. A sol used for the sol-gel-process is modified by nanoparticles. A luminescent coloring material, thermochormic, electrochromic, photochromic and/or gasochromic-switching coloring material and/or a phosphorescent and/or fluorescent coloring material are deposited in one of the layers, where nanozeolites are loaded with the coloring material. The coloring material is fed to the working gas or the plasma jet separately or mutually with the precursor, and is fed to the sol used for the sol-gel-process, where one of the materials such as silver, carbon, titanium dioxide, magnesium fluoride, tungsten oxide and silicon dioxide is deposited in the wet-chemically deposited layer and aluminum oxide or zirconium oxide is deposited in the plasma layer. Glass, metal, ceramic, textile, paper, wood, building material, biological surfaces or plastic is coated as substrate. The generation of the plasma takes place in a free jet plasma source, by dielectric hindered discharge or by microwave excitation. The precursor is transferred into a gaseous state before feeding into the working gas or the plasma jet. A throughput of the working gas and/or the precursor is variably controllable and/or regulatable. An air, gas or vapor is used as working gas. One of the layers is deposited as gradient layer.