baber/WOPTO huggingface dataset:
Patent JP-H07232418-A (JP)
Title: Packaging material and package
Inventor: SUGIYAMA YASUHARU
IPC: B65D30/02
Filed: 1994-02-24
Abstract: PURPOSE:To certainly prevent the leakage of a liquid and to enhance productivity by enabling the high speed filling with content, in a packaging material consisting of a base material film layer and a heat-sealable resin layer, by constituting the innermost layer being the heat-sealable resin layer of a film composed of an ethylene/alpha-olefin copolymer obtained by polymerization using a single site catalyst. CONSTITUTION:A packaging material is formed by laminating an anchor coat layer 2 and a laminating layer 3 to the outermost layer 1 being a base material film if necessary and subsequently laminating the innermost layer 4 being a heat-sealable resin layer composed of a film of an ethylene/alpha-olefin copolymer obtained by polymerization using a single site catalyst to the laminating layer 3. Since the ethylene/alpha-olefin copolymer obtained by polymerization using the single site catalyst is characterized by that mol.wt. distribution is narrow because a molecular chain is arranged and the comonomer contents of respective molecules are equal and an m.p. is controlled by the amt. of comonomers and the content of low-molecular components is low, the film composed of the copolymer is excellent in heat seal strength, transparency, low temp. sealability and has no offensive smell.
Patent JP-S58169570-A (JP)
Inventor: KIMURA AKIRA
IPC: D06M13/02
Filed: 1982-03-30
Abstract: (57)【要約】本公報は電子出願前の出願データであるた め要約のデータは記録されません。
Patent JP-H08269336-A (JP)
Title: Thixotropic organosiloxane composition
Inventor: JIYOAN MARII DONATERI
IPC: C08L83/12
Filed: 1996-03-07
Abstract: PROBLEM TO BE SOLVED: To obtain a homogeneous thixotropic organosiloxane composition by incorporating a base portion containing a curable liquid polydiorganosiloxane and a particulate filler and a curing agent portion containing a crosslinking agent of an organosilicon compound, a catalyst, a liquid organosiloxane copolymer or the like.  
     SOLUTION: The thixotropic organosiloxane composition contains (A) a base portion containing (i) a curable liquid polydiorganosiloxane having two or more silanols and a hydrolyzable group per molecule and (ii) a particulate curing agent containing OH groups in the particle surface and (B) a curing agent portion containing (iii) a crosslinking agent of an organosilicon compound containing three or more hydrolyzable groups bonded to the silicon per molecule in an amount to crosslink the composition in the presence of moisture, (iv) a catalyst in an amount to promote crosslinking of the composition, (v) a liquid organosiloxane copolymer of formula I or II in an amount to impart thixotropy to the composition, and (vi) a cyclic organosiloxane oligomer or the like. 
     COPYRIGHT: (C)1996,JPO
Patent JP-S62207994-A (JP)
Inventor: KAMEI TAKANOBU
IPC: G21C5/18
Filed: 1986-03-07
Abstract: (57)【要約】本公報は電子出願前の出願データであるた め要約のデータは記録されません。
Patent JP-2000249613-A (JP)
Title: Apparatus for measuring semiconductor pressure
Inventor: KATO AKIYUKI
IPC: G01L9/04
Filed: 1999-02-26
Abstract: PROBLEM TO BE SOLVED: To obtain an apparatus for measuring a semiconductor pressure having a low cost, good accuracy, sensitivity, excess pressure characteristics, stable manufacturing process small characteristic unevenness and capable of realizing high pressure resistance, by providing a pressure guiding hole for communicating the other surface of a first or second single crystal silicon substrate with an air gap chamber and communicating the chamber with an exterior. SOLUTION: A polysilicon layer 12 is formed on one surface of a first single crystal silicon substrate 11 by a semiconductor process. A second single crystal silicon substrate 13 is brought at its one surface into contact with the other surface of the layer 12 to constitute a diaphragm together with the layer 12. A recess 15 is provided on one surface side of the substrate 11, and an air gap chamber 16 from the layer 12 is formed. A round part 151 is provided at a part brought into contact with a side 153 in contact with a bottom 152 of the recess 15. A strain detecting element 17 is provided on a diaphragm 14, and a pressure guide hole 18 communicates the other surface of the substrate 11 or 13 with the chamber 16 and communicates the chamber 16 with an exterior.
Patent JP-H03248954-A (JP)
Title: Distance specifying device
Inventor: SHIBATA SHINJIRO
IPC: B60L3/00
Filed: 1990-02-28
Abstract: PURPOSE:To prevent the generation of an error in a rotation amount of a wheel detected at a given distance even when a wheel is deformed by selecting the length of a distance specifying device, located on a running route to specify a distance range in which a rotation amount of a wheel is detected, to a value being integral number times as long as the outer peripheral length of a wheel. CONSTITUTION:A gauge 10 for correcting a speed serving as a distance specifying device is mounted on a track 2 and on the inlet side of a wheel device line in an automobile assembly process. The gauge is formed of a long stripform light shield plate, a rectangular notch part 10a opened downward is formed closer to the one end thereof, and the gauge is mounted on a web 2c of a track 2 through brackets 11 and 11. A photo sensor PS located in the vicinity of the drive wheel of a vehicle running on the track 2 is caused to approach the gauge 10, and ON and OFF signals are output. In this case, a period between ON-operation of the photo sensor PS and re-ON-operation, namely, length between the one edge of the gauge 10 and the other edge of the notch part 10a is selected to a value being an integral number times as long as the outer peripheral length of a drive wheel to specify a reference distance L.
Patent JP-S54141388-A (JP)
Title: Production of compound semiconductor single crystal
Inventor: SAGAWA TOSHIO
IPC: H01L21/208
Filed: 1978-04-25
Abstract: PURPOSE: To obtain a high quality cpd. semiconductor single crystal wafer with a relatively uniform impurities concn. distribution in {100} face and low dislocation density by growing a crystal while allowing the interface between solid and melt to coincide with {100} face.  
     CONSTITUTION: GaAs seed crysttal 14, Si 15 as dopant and Ga 16 are put in quartz boat 2, and the boat is hermetically sealed in transparent quartz container 18 together with As 17. Crystal 14 is so chaped that a face perpendicular to boat 2 becomes (332) face 12 and a face at the rear end side of boat 2 (001) face 13. According to the temp. profile of the diagram container 18 is heated, forming a GaAs melt, with high temp. furnance 19 and low temp. furnace 20 provided with radiation hole 7 and each having such a structre that the temp. distribution varies in the longitudinal direction. The melt is contacted to (001) face 13 of seed crystal 14, and the temp. of furnace 19 is lowered at a rate about 1.7 deg/hr like arrow 21 to solidify them. After cooling to room temp. at a rate about 100 deg/hr, a desired GaAs semiconductor single crystal is taken out. 
     COPYRIGHT: (C)1979,JPO&Japio
Patent JP-H11251070-A (JP)
Title: Manufacture of organic electroluminescence element
Inventor: KANAI HIROYUKI
IPC: H05B33/26
Filed: 1998-03-03
Abstract: PROBLEM TO BE SOLVED: To improve the adhesiveness of a film formation preventing layer made of a resist material by forming first electrodes in a substrate in a patter shape, and roughening substrate faces located between the first electrodes. SOLUTION: For patterning a first electrode layer 2 and for roughening a substrate 1, the gap portions of the first electrode layer 2 are roughened to form the first electrode layer 2 in advance, then the first electrode layer 2 is patterned, or the first electrode layer 2 is formed on the substrate 1, then the first electrode layer 2 is patterned and the substrate faces between electrodes are roughened. When the substrate 1 is roughened in advance, the substrate 1 is spin-coated with a liquid resist, it is pattern-exposed and developed to form a resist pattern, it is dipped in an acid solution for roughening, then the resist is removed to form the first electrode layer 2 at the upper section. A resist film is formed, a pattern exposure is applied to it, and the first electrode layer 2 is machined to manufacture a desired substrate.
Patent JP-H10248100-A (JP)
Title: Speech speed converter
Inventor: KONDO KATSUFUMI
IPC: G10L21/043
Filed: 1997-03-05
Abstract: PROBLEM TO BE SOLVED: To provide the speech speed converter where a speech by a wearing party is fed back without speech speed conversion when the wearing party makes a speech. SOLUTION: The converter is provided with a microphone picking up an external voice signal including its own speech voice and a microphone picking up only its own speech voice separately. In the case that no its own speech voice is in existence, that is, when the wearing party makes no speech, the external voice signal is expanded and read in time series and outputted. When its own speech voice is in existence, the external voice signal is aborted, its own speech voice signal is outputted without time base expansion and the external voice signal (when no its own speech voice is in existence) that has been time-base-expanded already and stored in an output buffer is outputted altogether. Thus, its own speech voice is accurately fed back and the external voice signal is effectively outputted.
Patent JP-H08259633-A (JP)
Title: Resin for coating material to use in paraffin solvent
Inventor: ANDORU JIYAN BUIKUTORU JIYANDO
IPC: C09D7/12
Filed: 1996-03-07
Abstract: PROBLEM TO BE SOLVED: To obtain a coating material resin which is soluble in parafinic solvent and having resistance to UV light.  
     SOLUTION: A resin which is particularly useful in making a parafinic- solvent-based coating material contains repeat units deriving from (a) about 10 - about 55 wt.% p-tert-butyl styrene, (b) 0 - about 40 wt.% vinyl aromatic monomer, (c) about 20 - about 80 wt.% alkyl methacrylate monomer, and (d) about 2 - about 25 wt.% alkyl acrylate monomer. A coating material formulation which has good hardness and improved resistance to UV light by utilizing this resin contains (a) a parafinic solvent, (b) the resin, and (c) one or more pigments. 
     COPYRIGHT: (C)1996,JPO
Patent JP-S59176931-A (JP)
Title: System changeover system
Inventor: IKEUCHI SATOSHI
IPC: H04B1/74
Filed: 1983-03-26
Abstract: PURPOSE:To relieve system failure without providing a switch for changing over route by equipping a spare system in one route to other route. CONSTITUTION:A direct route 3 between terminal stations 1' and 2 is provided with active systems 3-1-3-4 and spare systems 4-5 and 4-6 for a detour route 4 and the detour route 4 is provided with spare systems 3-5 and 3-6 of the route 3 in addition to active systems 4-1-4-4. If the systems 3-3, 3-4 and 4-5 of the route 3 are cut off in error because of a road work or the like, supervisory systems SV( I )6 and SV(II)7 detect the failed systems 3-3 and 3-4, drive the system changeover switches SW(II)1 and SW(II)2 with said detection signal and relieve the failure by changing over the systems 3-3 and 3-4 into the spares 3-5 and 3-6 of the route 4 side. In this case, the failure of the system 4-5 is supervised by SV(III)8, and SV(IV)9 and repaired since an alarm is raised, and no effect due to the failure is produced because the system is not used normally.
Patent JP-H05189525-A (JP)
Title: Surface forming method
Inventor: NAKAJIMA YASUO
IPC: G06F17/50
Filed: 1991-02-22
Abstract: PURPOSE:To show the delicate change of the shape of a curved surface by setting an optional number of reference curves which cross two of boundary lines on the surface end represents the internal shape of the surface. CONSTITUTION:Plural surface boundary lines which set an optional area, e.g. four boundary lines Lp serving as other boundaries to decide an optional surface S are decided based on the given conditions. Then an optional number of reference curves Ls, e.g. three reference curves LS1, LS2 and LS3, which cross two curves LP opposite to each other are prepared to secure a desired internal shape of the surface S. Thus it is possible to obtain a connection vector VS for the curve LP at the crossing point between both curves LS and LP and a connection vector Vts of the curve LS. Then a vector that is orthogonal to both vectors Vtp and Vts is obtained so that a surface referring to the curve LS is formed.
Patent JP-S55143995-A (JP)
Title: Cephalosporin derivative and its preparation
Inventor: OOI NOBUHIRO
IPC: A61P31/04
Filed: 1979-04-26
Abstract: NEW MATERIAL:A cephalosporin derivative of formula I [R 1  is H, lower alkanoyl, aralkyl, etc.; R 2  is H, lower alkoxy, halogen, etc.; R 3  is H or lower alkyl; R 4  is H or OH; R 5  is H or lower alkoxy; R 6  is H, acetoxy, etc.; n is 1W3; m is 1Wn; ρm is a number which designates the position of substitution groups, and is 2W6 when R 1  is not H or R 3  is H].  
     EXAMPLE: 7-[D(-)-α[3-(3, 4-Dihydroxybenzoyl)-3-methyl-1-ureido]-α-phenylacetamido]-3-acetoxymethyl-3-cephem-4-carboxylic acid.  
     USE: Antibacterial agent effective to Gram-positive and Gram-negative bacteria.  
     PROCESS: A 7-aminocephalosporin of formula II (Y is H or protecting group) or its reactive derivative is made to react with a substituted ureidophenylacetic acid of formula III or its reactive derivative. 
     COPYRIGHT: (C)1980,JPO&Japio
Patent JP-H02229014-A (JP)
Title: Manufacture of skin material adhered synthetic resin molding and apparatus used in this method
Inventor: MASUI SHOHEI
IPC: B29C43/36
Filed: 1989-03-02
Abstract: PURPOSE:To adhere a skin material in the condition of not causing wrinkles and the like at the part of the complicated configuration of a synthetic resin molding by applying molten synthetic resin and a skin material between a die and another die meshed engagingly therewith, and pulling the skin material partly outward both die during the clamping period. CONSTITUTION:Since a skin material 5 is connected to the ends 7a of elastic spiral members 7 as pulling means 6 fixed on the outside of a synthetic resin molding die 1, the skin material 5 may be subjected to the pulling force in a die outward direction of the synthetic resin molding die 1 by the elastic restoring force to elastic spiral members 7 as being pulled between both die 2, 3 during the clamping period. Although the skin material 5 will be slightly pulled into both die 2, 3 while pulling the elastic spiral members 7, it is adhered onto the molten synthetic resin 4 in the condition of being tightened during the clamping period with the result that it may also be subjected to the pulling forces of the elastic spiral members 7. Any resin employed ordinarily in injection molding or extruding molding can be available as molten resin 4. As skin materials, they are given a cloth, nonwoven fabric, metal, fiber, net of thermosetting resin, paper, metallic foil or thermoplastic resin and sheet or film made of thermoplastic elastomer.
Patent JP-H03252736-A (JP)
Title: Data string allocation method
Inventor: MIYASAKA TORU
IPC: G06F12/00
Filed: 1990-03-01
Abstract: PURPOSE:To reduce oppression on a storage area and the number of input/ output requests for an external memory device by performing processing assuming that a data string with the same image is allocated to a position allocated at the external memory device when the same image exists in an internal memory device. CONSTITUTION:It is searched whether or not the same image as that of the data string saved in the internal memory device 6 exists in the data string of an inputted record, and when the same image exists, the processing assuming that the data string with the same image is allocated to the position allocated at the external memory device 10 is performed without allocating it to the external memory device 10. In such a way, it is possible to prevent, oppression on the external memory device 10 applied and the increase in the number of input/output requests.
Patent JP-H08250435-A (JP)
Title: Depositing method for polycrystalline si thin film
Inventor: ISHIHARA SHUNICHI
IPC: C23C16/50
Filed: 1995-03-10
Abstract: PURPOSE: To improve the crystallinity of a thin film by maintaining a low temperature process and fully achieving the structural relaxation of a thin film by introducing SiFn radical and dopant radical intermittently and with deviated durations into a film forming space where H radical always flows. CONSTITUTION: H radical, SiFn radical and dopant radical have occurred within different spaces adjacent to a film forming space creating thin films, and only the H radical always flows in the film forming space. The H radical occurred will collide with and react on the SiFn radical introduced from an SiFn radical introducing pipe 20 and then produce SiH1 Fm radical having a film deposition ability. Under this conditions, SiFn radical is flowed intermittently. The introduction of the SiFn radical and dopant radical is deviated timewise.
Patent JP-H04286994-A (JP)
Title: Emergency cooling system for containment vessel
Inventor: SUZUKI HIROAKI
IPC: G21C9/004
Filed: 1991-03-15
Abstract: PURPOSE:To utilize effectively the water of a pressure suppression chamber to the cooling of a containment vessel by using a static measure and cool the containment vessel, at the time of an imaginary accident. CONSTITUTION:The lower part of a pressure suppression chamber 4 and a containment vessel 3 are connected with piping 20, and the lower end of the piping 20 and a pressurized inert gas tank 21 are connected with the piping 25. The temperature of the lower part of a pressure vessel 2 is measured with a thermometer 30, and when this value is over a set value, valves 22 and 23 are opened by a signal from a controller 32. When the pressure of the containment vessel 3 is over a set value, a valve 10 is opened by a signal from a controller 42, and the gas within the pressure suppression 4 is led to a filter vent system 11.
Patent JP-H037271-A (JP)
Title: 6-epifumagillol and its derivative
Inventor: KISHIMOTO SHOJI
IPC: A61P37/06
Filed: 1990-03-01
Abstract: NEW MATERIAL:The compound of formula [R<1> is 2-methyl-1-propenyl or isobutyl; R<2> is H, (substituted) aliphatic hydrocarbon reside or (substituted) acyl], its derivative or their salts. EXAMPLE:6-O-formyl-6-epifumagillol. USE:A drug having vascularization-inhibiting action, cell proliferation inhibiting action, immuno-suppressing action, etc., and useful as a remedy and preventive for rheumatism, psoriasis, retinopathy of diabetes mellitus, arteriosclerosis, cancer, rejection after transplantation of organ, etc. PREPARATION:The compound of formula I wherein R<2> is (substituted) alkanoyl, (substituted) aroyl or (substituted) aromatic heterocyclic carbonyl can be produced by reacting 1mol of 6-epifumagillol or 6-epidihydrofumagillol with 1-10mol of an activated reactive derivative of carboxylic acid such as acid anhydride or acid halide in an organic solvent in the presence of a base.
Patent JP-S58177382-A (JP)
Inventor: ANRI BARANTAIN JIYAN JIYONKA
IPC: B41J1/48
Filed: 1983-03-25
Abstract: (57)【要約】本公報は電子出願前の出願データであるた め要約のデータは記録されません。
Patent JP-H07258029-A (JP)
Title: Aqueous make-up gel containing organopoly- siloxane
Inventor: IZABERU BARA
IPC: A61K8/898
Filed: 1995-03-10
Abstract: PURPOSE: To provide an aqueous gel that contains an organopolysiloxane usable in the field of cosmetics in the form of make-up foundation or blusher for making up face and/or body. CONSTITUTION: This aqueous make-up gel contains (A) 0.01-30 wt.% of a hydrophilic polymer as a gelling agent, (B) 0.001-10 wt.% of a colorant soluble or dispersible in the aqueous phase and (C) 0.02-50 wt.% of an organopolysiloxane dissolved in the aqueous phase and has an absolute viscosity of 1-100, preferably 5-30 poise. The polysiloxane dissolved in aqueous phase is, for example, a copolymer of siloxane and hydrolyzed or unhydrolyzed protein (1-50 wt.% content), a dimethicone copolyol and its derivative (0.5-20 wt.% content) and organopolysiloxane solubilized using a surfactant with a HLB of >=8.
Patent JP-H03253132-A (JP)
Title: Data transfer control system
Inventor: GOTO HIROSHI
IPC: H04L1/24
Filed: 1990-03-01
Abstract: PURPOSE:To confirm the transmitting/receiving and transfer of transfer data without arranging a memory for preparing initial transfer data on the receiving side by arranging similar rule string data generators for converting the initial transfer data on both the transmitting and receiving sides to decide the validity of transfer data. CONSTITUTION:In a transmitting processor part 5, the initial transfer data A are sent from a transmission program control part 1 to a rule string data generator 3 and converted into data B based upon a prescribed rule string and the converted data B are sent to a transmission line 6 following the data A. In a receiving processor part 13, the data A are separated by a receiving program control part 8 and converted into data B by a rule string data generator 10 (similar to the generator 3). A comparing/control part 14 compares the conversion data obtained from the control part 8 with the conversion data B obtained from the generator 10, and at the time of detecting the coincidence of both the data B, confirms the normal operation of the transfer function. Thus, the normality/abnormality of the transfer function can be checked without preparing checking transfer data on the receiving side.
Patent JP-S61214348-A (JP)
Inventor: HENKU HOUKESU
IPC: H01J65/04
Filed: 1986-03-11
Abstract: (57)【要約】本公報は電子出願前の出願データであるた め要約のデータは記録されません。
Patent JP-H06238637-A (JP)
Title: Processing method and device for cement product
Inventor: TAKAGI NOBORU
IPC: B28B3/02
Filed: 1993-02-16
Abstract: PURPOSE:To omit the cutting process after the curing process, making a recessed and projected pattern clear and cut peripheral edges of a product not forcibly by pressing the surface of an uncured cement molded body and press cutting the peripheral edges of the cement molded body. CONSTITUTION:In a mold 1 for providing a recessed and projected pattern like laying bricks on the surface of a belt-shaped molded body G, press molding is carried out by using a mold 1 provided with deaeration holes 3 with wire mesh 2 having the mesh finer than the cement particles as filters and also a cutting blade 4 formed into a cylindrical shape on the peripheral edges 1B of the deaeration holes on a recessed mold face bottom 1A. In that case, a press mold 1 is lowered onto the surface of the molded body G, and the recessed and projected pattern is formed on the product surface while deaeration is carried out from the deaeration holes 3, and then the cutting blade 4 is lowered to cut the peripheries of product. As a result, the recessed and projected pattern G1 with deep, clear cuts is formed on the surface even in the uncuring stage of the product G and peripheral edges G2 are cut accurately.
Patent JP-H10253523-A (JP)
Title: Freezing and thawing test method
Inventor: IZUMI SABURO
IPC: G01N17/00
Filed: 1997-03-06
Abstract: PROBLEM TO BE SOLVED: To provide a freezing and thawing test method that can be easily performed and in capable of accurate measurement. SOLUTION: After the immersion of a test piece 1 formed of a facing material for a predetermined period of time, the test piece 1 is housed in a sealing bag 5 in a hermetically sealed state, cooled, and heated. After repeating the cooling and heating cycle which freezes and thaws the test piece 1 a plurality of times, the states of the test piece 1 before the test and after the test are compared with each other to evaluate the frost damage-resistant performance of the facing material. As the test piece 1 immersed in water is housed in the sealing bag 5, it is possible to repeat the cooling and heating cycles while the test piece 1 is in the state of holding water without the need for separately immersing the test piece 1 in a water tank, etc.