baber/WOPTO huggingface dataset:
Patent TW-369450-B (TW)
Title: Method of removing oxide from a surface of metal, and method of and apparatus for removing oxide from a surface of metal strip
Inventor: NEIHEISEL GARY L
IPC: B23K26/36
Filed: 1997-12-23
Granted: 1999-09-11
Abstract: The invention relates to a process and apparatus for using laser radiation to remove an oxide layer (scale) from a hot rolled or annealed steel strip (40) by vaporization traveling in a gravitationally vertical direction at a speed of at least 10 m/min. The process includes unitizing electromagnetic radiation from a high power laser such as a free electron laser whose radiation has a surface power density of at least about 5 MW/cm<SP>2</SP> at a point of contact with the metal strip surface. The radiation is passed through an optical system of aligned lenses or mirrors for focusing the radiation into a straight line projected transversely completely across the strip. The radiation has a pulse width less than 100 picoseconds, a pulse repetition rate greater than 10 MHz and a high average power of at lest 10 KW. A radiation beam (56) is passed though a homogenizer (60) having a linear diverging lens (74) for spreading the radiation in a linear transverse direction. The radiation is passed though a cylindrical convergent lens (78) or a long cylindrical mirror (132) and focused into a straight line beam (36) projected completely across the width of the strip to remove the oxide by vaporization by the interaction of one or more of the spatial elongated laser pulses thereby forming an oxide free surface. A sealed interaction chamber (90) contains a non-oxidizing gas (108), a slotted entry (91) for receiving the oxidized strip, a slotted exit (92) for a passage of the as-cleaned strip, at least one elongated window(93) for receiving the radiation into the chamber, an exhaust duct (94) for removing the non-oxidizing gas ladened with oxide debris from the chamber and a filter (106) for removing oxide powder from the gas. The non-oxidizing gas is directed into the chamber at a point just above a plasma plume (112) and just beyond incident focused radiation beam (36) through a long slot-like gas nozzle (114). By keeping the chamber sealed from the ambient atmosphere and by maintaining sufficient non-oxidizing gas adjacent to the plasma interaction zone and the cleaned metal surface, reoxidation of the cleaned steel surface can be prevented.
Patent TW-410201-B (TW)
Title: Handle angle compensator in power steering apparatus and vehicle
Inventor: ISHIKAWA KAZUO
IPC: B62D5/09
Filed: 1998-03-26
Granted: 2000-11-01
Abstract: The present invention relates to handle angle compensator which compensates the displacement between the handle angle and the steering wheel angle, in a power steering apparatus comprising a hydraulic oil supply apparatus which discharges amount of oil according to rotation number of the handle, and an actuator which is driven by the hydraulic oil discharged from said hydraulic oil supply apparatus and steers the steering wheels. To compensate said displacement, the object is to reduce the useless idle running of the handle caused by the compensation of handle angle based on the absolute angle, and to provide the handle angle compensator of the power steering apparatus which can reduce the useless amount of handle operation. With the handle angel detecting means, the actual location of the handle is detected with relative angle from the reference location, and the steering wheel angle can be detected with the handle angle detecting means. The target location which is the normal location of the handle from steering wheel angle, can be obtained with relative angle by the target location computing means. When the displacement between actual location of the handle and the target location exceeds the tolerance, the compensating mean is driven to compensate the amount of displacement.
Patent TW-369500-B (TW)
Title: Concave-corner bag structure and the production method
Inventor: Wu an-min
IPC: B65D33/22
Filed: 1998-05-06
Granted: 1999-09-11
Abstract: The present invention relates to the structure of a folded-corner bag and its production method that refers to first making a conveying process of successive material having fold-in corners on both sides with an inflated bag carrying the material a pair of washers inserted into the fold-in corners on both sides of the material and both the washers having opposite thermal cutting material on top of and under them for thermal sealing producing 4 strips of sealing corners by thermal pressure, being each of the corner sealing lines in extension in tilt from the inside of the fold-in corners backward to the outside of the concave corner; then, after said material conveying a predetermined trip of the 4 corner sealing lines, a preset sealing blade disposed at a fixed point conducting thermal sealing and cutoff of the material, forming thus a bottom sealing line and a cutoff line, leaving the bottom sealing line overlap the inner end with said corner sealing line, being disposed said cutoff line slightly in front of the bottom sealing line, cutting gradually the concave-corner bag; the two pairs of corners formed by the concave corner between both sides of the concave-corner bag and the bottom sealing line is then closed by said 4 corner sealing line.
Patent TW-396197-B (TW)
Title: A stable aqueous dispersion, a method of preparing a fast-setting coating on a substrate and the coated material
Inventor: HARRIS JOHN K
IPC: C09D133/00
Filed: 1998-05-21
Granted: 2000-07-01
Abstract: A fast-setting coating material can be prepared by contacting a stable aqueous dispersion of a polymer that contains strong cationic groups and weak acid groups onto a substrate that is basic or rendered to be basic. Alternatively, the coating material can be prepared by contacting in either order or concurrently, the surface of a substrate with two separate polymers, one of which contains strong cationic groups, and the other of which contains weak acid groups. In this case, the substrate need not be basic for the coating to quickly set.
Patent TW-381322-B (TW)
Title: Method for prevention of via poisoning caused by residual from spin on glass back etching
Inventor: SUNG SHU-REN
IPC: H01L21/768
Filed: 1998-05-22
Granted: 2000-02-01
Abstract: A kind of method for prevention of via poisoning caused by residual from spin on glass back etching that the method is to form several bulges on the substrate and employ these bulges to generate rugged surface in the followed deposition of dielectric and metal layers so that the spin on glass after back etching covers only the recession of dielectric surface and not remaining on the bulged portion. However, the bulged portion of dielectric is formed at the via hole, the formed via holes will not expose the spin on glass layer. Therefore, the invented method can prevent via plug poisoning effect caused by the exposition of spin on glass in the via holes.
Patent TW-368678-B (TW)
Title: Method for controlling process conditions of a semiconductor fabricating equipments management system
Inventor: KWON DAE-HONG
IPC: G06Q50/00
Filed: 1998-06-01
Granted: 1999-09-01
Abstract: Process conditions of a semiconductor fabricating equipments management system are controlled through a process condition combining module installed in a host computer. Through the process condition combing module, process step IDs or PPIDs can be differently specified for each of wafers inserted in slots of a cassette. The wafers can be fabricated as semiconductor products with good quality according to the differently specified process step IDs, or PPIDs for each of them. With the differently specified process step IDs or PPIDs, large scale wafers can be more efficiently processed.
Patent TW-424030-B (TW)
Title: Dual purpose tool for cutting and grinding
Inventor: MORIYASU SEI
IPC: B24D5/06
Filed: 1998-06-05
Granted: 2001-03-01
Abstract: A tool is constructed by a plurality of diamond columns 22 arranged so as to protrude on a working surface and a conductive bond member 24 for integrally fixing the diamond columns. The conductive bond member is electrolytically dressed while a conductive liquid is supplied between the bond member and an electrode 4 which faces the bond member at a distance, thereby enabling the diamond columns 22 to be protruded. By the construction, it can be applied to both of an efficient rough cutting for a ductile material and a precise grinding for a brittle material without detaching or re-attaching a workpiece, the relatively soft ductile material such as aluminum, copper, or plastic can be worked with a deep cut, the brittle material such as monocrystal silicon, glass, or tungsten carbide can be efficiently and stably grinned, so that a fluctuation of a working position due to wear can be compensated.
Patent TW-436597-B (TW)
Title: Process components, containers, and pipes suitable for containign and transporting cryogenic temperature fluids
Inventor: KELLEY LONNY R
IPC: C22C38/40
Filed: 1998-06-17
Granted: 2001-05-28
Abstract: Process components, containers, and pipes are provided that are constructed from ultra-high strength, low alloy steels containing less than 9 wt% nickel and having tensile strengths greater than 830 Mpa (120 ksi) and DBTTs lower than about -73  DEG C (-100 DEG F).
Patent TW-370472-B (TW)
Title: Improved catalyst composition for preparing 5-formyl valerate esters from pentenoic esters
Inventor: TSAI JING-CHERNG
IPC: B01J31/24
Filed: 1998-06-30
Granted: 1999-09-21
Abstract: The present invention discloses an improved catalyst composition for preparing 5-formyl valerate esters by hydroformylation of pentenoic esters with good activity, high selectivity in the presence of hydrogen and carbon monoxide. Said improved catalyst composition includes: (a) 0.1 to 10 moles of rhodium complex as shown in the following formula, wherein x is an integer ranging 1 to 6; y is an integer ranging 0 to 6; z is an integer ranging 0 to 6; and R is an acetic group, an acetyl acetone group or a halogen atom, and (b) 0.1 to 200 moles of a phosphoric complex having a double chelating ligands, as shown in the following formula, wherein R1, R2, R3 and R4 can respectively be a methyl or an aromatic group; and Ar can be a 2,2'-bisphenol, a 1,1'-di-naphthol or a 2,2'-ethane-bis(4,6-di-tert-butylphenol).
Patent TW-519553-B (TW)
Title: Device for tensioning knitted fabrics in knitting machines, particularly in large-diameter circular machines
Inventor: PANUCCIO VINCENZO
IPC: D04B15/88
Filed: 1998-07-16
Granted: 2003-02-01
Abstract: A device for tensioning knitted fabrics in knitting machines, particularly in large-diameter circular machines device comprises a plurality of tensioning rollers (11) which are arranged side by side so as to affect substantially all the transverse extension of the fabric (12) and are arranged below the needle work area of the machine. Each tensioning roller (11) cooperates with a contrast roller (13) which acts on the face of the fabric (12) that is opposite to the face that makes contact with the tensioning rollers and is orientated so that its axis is parallel to the axis (11a) of the corresponding tensioning roller (11). There are actuators (14) for actuating the tensioning rollers (11) so that they rotate about their respective axes (11a) in order to apply traction to the fabric (12) being formed. The actuators comprise, for each tensioning roller (11), a motor (14) which can be actuated independently or in correlation with the actuation of the motors that actuate the other tensioning rollers (11).
Patent TW-396442-B (TW)
Title: Preventing the conductive layer from the damage by chemical mechanical polishing method
Inventor: LIOU JUNG-SHI
IPC: H01L21/304
Filed: 1998-07-23
Granted: 2000-07-01
Abstract: This is a method used to decrease the conductive layer damage caused by chemical mechanical polishing. A dielectric layer is formed to cover the first conductive layer on a substrate; an organic layer with low dielectric constant is formed on said dielectric layer. Then, by photolithography and etching processes define these two layers in sequence to form a predetermined contact opening for conductive via. The barrier layer is formed on the inner wall and bottom of said contact opening. A second conductive layer is formed on said organic layer with low dielectric constant and is used to fill said contact opening. After filling the contact opening, etching back is proceeded to remove the redundant second conductive layer with organic layer with low dielectric constant as the chemical mechanical polishing etch stop. A conductive via is formed in contact opening and the organic layer with low dielectric constant is removed.
Patent TW-561166-B (TW)
Title: Copolycarbonates based on indanebisphenols
Inventor: WESTERNACHER STEFAN
IPC: C08G64/06
Filed: 1998-07-31
Granted: 2003-11-11
Abstract: The present invention relates to novel copolycarbonates containing as recurring, bifunctional carbonate structural units (A) at least one of the carbonate structural units corresponding to formula (I), wherein the groups R1 independently of one another, each represent a C1-C12-alkyl group, preferably C1-C3-alkyl group, particularly preferably a methyl group or a halogen, preferably chlorine or bromine, and n represents an integer from 0 to 3, preferably 0, and (B) at least one of other bifunctional carbonate structural units, different from A, corresponding to formula (II), wherein the group -O-R-O- represents any diphenolate groups, wherein -R- is an aromatic group having 6 to 40 C atoms, which can contain one or more aromatic or condensed, optionally containing hetero atoms, aromatic nuclei and optionally be substituted with C1-C12-alkyl groups or halogen and can contain aliphatic groups, cycloaliphatic groups, aromatic nuclei or hetero atoms as bridging links, with the exception of at least one of the bifunctional carbonate structural units corresponding to formula (III), wherein M represents a divalent hydrocarbon group having 1 to 8 C atoms, O, CO, S, SO or SO2 and R2 to R5 are identical or different and each represent hydrogen or a hydrocarbon radical having 1 to 5 C atoms, in quantities of from 5 to 95%, based on the total number of mols of structural units corresponding to formulae (I) and (III).
Patent TW-387103-B (TW)
Title: Alarming system of semiconductor device fabrication facility
Inventor: RHEEM BYEONG-KI
IPC: H01L21/265
Filed: 1998-09-08
Granted: 2000-04-11
Abstract: There is provided an alarming system for semiconductor device fabrication facility for monitoring the current operation state of the facility performing a process, such as ion-implantation, by installing lamps of a lamp tower being visibly and easily recognizable from a distance. The alarming system of semiconductor device fabrication facility comprises : a logical-sum means for processing logical-sum on receipt of the signal for the state of at least one facility ; a driving means for outputting at least one driving signal to drive a lamp on receipt of the logical-sum result ; and a lamp tower consisting of lamps having the one-to-one corresponding number for at least one output driving signal, and the lighting state of the lamps is different depending on each driving signal and a particular state of the facility.
Patent TW-400570-B (TW)
Title: The dual alignment method of the asymmetry alignment mark
Inventor: WEI CHI-HUNG
IPC: H01L21/68
Filed: 1998-10-31
Granted: 2000-08-01
Abstract: A dual alignment method of the asymmetry alignment mark is used in acquiring an alignment coordinate for the chip after polishing. Firstly, acquire the first and the second positions of the marks on left and right alignments of the chips. Secondly, after rotating the chips for 180 DEG, then acquire the third and the fourth positions of both alignment marks on the marks on left and right alignments of the chips. Finally, take the average value of the first, the second, the third and the fourth positions in order to acquire the alignment coordinate. For the asymmetrical phenomena of the alignment mark produced after polishing the chips, use the overlapped alignment to acquire the correct positions of the alignment mark so that the subsequent processes of the integrated circuit can acquire the exact patterns of the transferred wiring lines due to the acquirement of the correct alignment coordinate.
Patent TW-426645-B (TW)
Title: Joined articles and a process for producing such joined articles
Inventor: OHASHI TSUNEAKI
IPC: C04B37/00
Filed: 1998-12-24
Granted: 2001-03-21
Abstract: To maintain a bonded state of a bonded body for a long period of time even in the case of exposing a brazing material layer to an oxidizing atmosphere or a high-vacuum atmosphere at a high temperature in obtaining the bonded body by bonding a ceramic member to a metal member with the metal brazing material layer. A brazing material containing 50-99 wt.% of copper, 0.5-20 wt.% of aluminum and 0.5-5 wt.% of one or more active metals selected from the group consisting of titanium, zirconium, hafnium, vanadium and niobium is used. A ceramic member 6 is brazed to another member 3 using the brazing material to give a bonded body provided with the ceramic member 6, the other member 3 and a brazing material layer. The brazing material layer is heated in an oxidizing atmosphere at a temperature preferably lower than the solidus line of the brazing material.
Patent TW-375670-B (TW)
Title: Internal combustion engine capable of enhancing output power
Inventor: MEYER SIEGFRIED
IPC: F02B1/14
Filed: 1999-01-19
Granted: 1999-12-01
Abstract: The invention relates an improvement of internal combustion engine capable of enhancing output power. The key structure of said engine comprises a cylinder, a piston, a connecting rod, at least one crank shaft and an output bearing; characterized in that a track is provided at an appropriate place inside the cylinder, and a squeezing plate is mounted on the top end of the rail, a squeezing convex plate is secured on the outer surface of tip of connecting rod in the vicinity of said squeezing plate; when the connecting rod moves, the squeezing convex plate will contact the squeezing plate, and relatively squeeze said piston slightly upward so as to decrease the descending speed of the piston driven by the movement of the connecting rod, which ensures the optimal compression ratio immediately prior to the ignition to gain the maximum power output and brings about near complete combustion in the cylinder so as to save fuel and reduce air pollution.
Patent TW-423199-B (TW)
Title: Switching regulator control circuit of PFM system and switching regulator thereof
Inventor: SUDO MINORU
IPC: H02M3/155
Filed: 1999-02-12
Granted: 2001-02-21
Abstract: To suppress ripple voltage at the time of a high supply voltage in an SW regulator of the PFM system. A supply voltage dependency is given to the PFM-DUTY ratio of the SW regulator of the PFM system to reduce the PFM-DUTY ratio at the time of a high supply voltage.
Patent TW-419653-B (TW)
Title: Optical pick-up head with multiple light sources
Inventor: JU JAU-JIU
IPC: G11B7/1398
Filed: 1999-03-16
Granted: 2001-01-21
Abstract: The present invention reveals an optical pick-up head with multiple light sources, in which laser beams generated by more than one light sources are combined in the same optical output path; a beam shaper that can be allocated in the optical pick-up head with multiple light sources is provided based on the present invention. The beam shaper is formed by compounding two prisms with several beam-combining interfaces, each beam-combing interface has a proper coating to reflect a laser beam of certain wavelength, and let the other laser beams of the other wavelengths to pass and refract, thereby, laser beams of more than one wavelengths are combined in the same optical output path and the laser beams pass through one of the prisms are amplified, and also the chromatic aberrations are eliminated so that the optical component of the optical pick-up head is more dense and the volume is smaller.
Patent TW-500842-B (TW)
Title: Silicon etching process
Inventor: WU GUANG-YUNG
IPC: C30B33/12
Filed: 1999-03-25
Granted: 2002-09-01
Abstract: A polysilicon etching process uses HBr, He and a mixture gas of helium/oxygen (He/O2) as an etching gas. The pressure of the etching reaction chamber is maintained at above 30 mTorr. The total flow rate of HBr and He is more than 400 sccm, and the individual flow rates thereof are separately at 180 to 280 sccm. The flow rate of the mixture gas of He and oxygen (He/O2) is 5 to 10 sccm so that a higher etching selectivity can be obtained between the polysilicon and silicon oxide, while avoiding a hardening of the photoresist caused by the polymer product.
Patent TW-561054-B (TW)
Title: Composition comprising a liquid absorbed on a support based on precipitated silica
Inventor: VIOT JEAN-FRANCOIS
IPC: A23K1/16
Filed: 1999-06-21
Granted: 2003-11-11
Abstract: The invention relates to a conditioned composition comprising at least one liquid absorbed on a support containing a precipitated silica, this silica being in the form of substantially spherical beads and having: an average bead size in excess of 150 mum, a packed filling density (PED) LOWER THAN 0.29, a 75 mum screen oversize of at least 88% by weight, a pore volume (Vd1), made up of pores having a diameter smaller than 1 mum, in excess of 2.0 cm<3>/g. It also relates to the use of a silica of this type as a support for liquid.
Patent TW-412781-B (TW)
Title: In-situ substrate transfer shuttle
Inventor: KURITA SHINICHI
IPC: B65G49/06
Filed: 1999-05-20
Granted: 2000-11-21
Abstract: The present invention provides an apparatus and method for sequential deposition of regular series of layers on consecutive substrates in a modular assembly-line like system. The apparatus and method are especially used processing large glass or metal substrates such as are employed in solar panels. The apparatus includes a load lock chamber and a processing chamber coupled to the load lock chamber. Both the load lock chamber and the processing chamber include a platen to support the substrate. Each platen includes slots therein. A substrate transfer shuttle is provided which is moveable along a shuttle path between one position in the load lock chamber and another position in the processing chamber for transferring the substrate between the load lock chamber and the processing chamber. The shuttle may be moved below the level of the platen and may be maintained in the processing chamber during processing.
Patent TW-436620-B (TW)
Title: Image acquisition method and device for inspecting flat panel display
Inventor: FUJIWARA KIYOSHI
IPC: G01N21/88
Filed: 1999-06-04
Granted: 2001-05-28
Abstract: The purpose of the present invention is to provide an image acquisition method and device of inspecting flat panel display for precisely inspect the presence of a pixel defect of a flat panel display. The solution of the present invention is to transform the monochrome image of the flat panel display photographed by solid state camera device into digital image data, and extract the moire component from this image data to detect the period of this moire component. Link the data sequence of said image data in the X-axis direction or Y-axis direction with the pixel value collected from the period of moire to find a plurality of smooth curves with the defect components removed, calculate the pixel values on these plurality of smooth curves, the image data of the defect components can be obtained from their difference with the original image data. Or calculate the average of the plurality of smooth curves to obtain the smooth image data not containing moire. Add this smooth image data and the data of the defect components, the result of summation is regarded as the checking image data accommodated in the image memory.