baber/WOPTO huggingface dataset:
Patent KR-20000001163-A (KR)
Title: Sense amplifier lay out structure of semiconductor memory
Inventor: YEON JE AN
IPC: H01L27/10
Filed: 1998-06-09
Abstract: PURPOSE: A sense amplifier lay out structure of a semiconductor memory capable of uniforming densities of impurities during an ion injecting process so that NMOS transistor has an identical critical voltage is provided. CONSTITUTION: The sense amplifier lay out structure of a semiconductor memory comprising: first through fifth contacts formed in a straight line in a first direction; a complementary bit line(/BL) situated from one sides of the first through fifth contacts by a predetermined distance in the first direction, a part of the complementary bit line(/BL) extending in a second direction and being connected to the fourth contact, wherein a sixth contact is formed at the complementary bit line(/BL); a true bit line(BL) situated from other sides of the first through fifth contacts by a predetermined distance in the first direction, a part of the true bit line(BL) extending in a second direction and being connected to the fourth contact, wherein a seventh contact is formed at the true bit line(BL); a ground line formed at extending portions of true and complementary bit lines(BL,/BL), connecting the first contact to second and third contact; a first gate connected to the sixth contact, and including a first part formed between the first and second contacts and a second part formed between the second and third contacts; and a second gate connected to a seventh contact, including a third part formed between the third and fourth contacts and a fourth part formed between the fourth and fifth contacts.
Patent KR-20000001843-A (KR)
Title: Injected sensor frame for vehicle
Inventor: JANG DONG SUNG
IPC: H01L21/78
Filed: 1998-06-15
Abstract: PURPOSE: A wafer sawing device is provided to perfectly remove wafer scraps generated at a wafer sawing process. CONSTITUTION: The wafer sawing device comprises: a wafer(50) including a direct circuit chip(52) divided by a street(54); a wafer sawing device(10) located in the center of the wafer; a side nozzle(22) formed with plural individual spray nozzle, located in a right and a left sides of a cutting blade(20); a center nozzle located in the front part of the cutting blade; the upper nozzle(29) located in the upper part of the cutting blade.
Patent KR-20000003128-A (KR)
Title: Contact point correction device for semiconductor device
Inventor: IN HAE JIN
IPC: H01L21/66
Filed: 1998-06-19
Abstract: PURPOSE: A contact point correction device for a semiconductor device is provided to have a complete contact of the semiconductor device with a tester socket is provided to obtain a high stability and reliability of the test performed. CONSTITUTION: The contact point correction device for a semiconductor element with a tester socket comprises; an AC servo motor assembly(110) to generate a pressure for the contact of the semiconductor element with the tester socket; an AC servo motor(102) connected to the press unit assembly(200); the press unit assembly(200) including a screw assembly(21) and a driving assembly(220); a bracket(214) to support a ball screw(212).
Patent KR-20000004309-A (KR)
Title: An address driving circuit of a pdp television
Inventor: KIM SE YONG
IPC: H04N5/66
Filed: 1998-06-30
Abstract: PURPOSE: An address driving circuit of a PDP television is disclosed to provide to easily implement a chip of the circuit. CONSTITUTION: The PDP address driving circuit converts a composite video signal provided form an external to RGB data and provides the converted data to each of address electrodes. An address driving IC receives m bits of RGB data which is inputted from one of input ports and outputs the input data through the M number of serially positioned output ports. A data interface unit provides a corresponding RGB data considering the relation between the input and the output. Thereby, it is possible to simplify the data transmission pattern.
Patent KR-19990013671-A (KR)
Title: 폴리에틸렌을 주성분으로 한 조성물과 조성물로 된 성형물의 제조방법
IPC: B29C48/32
Filed: 1998-07-08
Abstract: ASTM 표준 D792에 따라 23℃에서 표준밀도를 측정했을 때 940 ㎏/㎥ 이상이고 폴리에틸렌 100중량부당 1중량부 이하의 양으로 탈크를 함유하는 폴리에틸렌을 주성분으로 한 조성물, 조성물은 압출된 과립형태가 바람직하고, 현저하게 개량된 크리이프 내성을 나타낸다. 
     조성물로 성형한 물품의 제조방법과 성형품, 특히 파이프 연결구와 가압유체 운반용 파이프.
Patent KR-20000008781-A (KR)
Title: Automatic label separating and sticking device
Inventor: KWON HYUK
IPC: B65C9/26
Filed: 1998-07-15
Abstract: PURPOSE: An automatic label separating and sticking device is provided to separate labels printed in a three sheets one row arrangement automatically and stick them automatically on the rear cabinet. CONSTITUTION: The automatic label separating and sticking device comprises; a label feeder(11) to feed labels indicating information such as TV specification etc.; a sticking device to stick labels on the back of the rear cabinet(13) transported by a conveyer(12); a sensor(14) to detect a set carried by a conveyer to the prescribed position; a rotary type cylinder to stick vacuum adsorbed labels on the back of the rear cabinet.
Patent KR-20000010125-A (KR)
Title: Method for forming capacitor
Inventor: YOON TAK HYEON
IPC: H01L27/108
Filed: 1998-07-30
Abstract: PURPOSE: A method is provided to simplify a process sequence for making a storage electrode and improve the step between the storage electrode and its surrounding. CONSTITUTION: The method comprises the step of; forming a first insulating layer(208) having a contact hole for exposing an impurity region(220) on a semiconductor substrate(200) on which a transistor having the impurity region is formed; forming a plug which is in contact with the impurity region by filling the contact hole; forming an etching stopper layer and a second insulating layer sequentially so as to expose the plug on the first insulating layer; forming a polysilicon pattern to be a storage electrode(206) of the capacitor so as to cover a side surface of the second insulating layer and a space; removing the second insulating layer so as to expose the etching stopper layer; forming a dielectric layer and a plate electrode on the storage electrode. Thereby, it is possible to form the storage electrode on one node contact by perform the expose and etching processing once so that it can simplify the process sequence and improve the step between the storage electrode and its surrounding.
Patent KR-19990014325-A (KR)
Title: 칼라-필터 제작 방법, 칼라 필터, 표시 장치, 및 표시 장치를 구비한 장치
IPC: B41J3/407
Filed: 1998-07-31
Abstract: 칼라 필터의 화소들 사이의 농도 불균일성을 대폭 감소시킬 수 있는 칼라-필터 제작 방법.  각 화소에 대해 토출된 잉크의 양을 일정하게 만들기 위하여, 이론적 잉크 토출 피치 D는 복수의 잉크-토출 노즐들의 단일 토출 당 토출된 잉크의 양과 일치하여 각각의 잉크-토출 노즐들에 대해 계산되고, 주사 방향에서 잉크 제트 헤드의 상대적인 운동량의 최소 운동 피치를 D라고 가정했을 때, 주사 방향을 따라 토출된 n번째 잉크 도트의 이론적인 토출 위치에 대응되는 값 kD(k는 0 또는 그 이상의 정수)가 nd(n은 0 또는 그 이상의 정수)와 일치하는 경우에는 잉크가 kD=nd를 만족하는 위치에서 토출되고, kD가 nd와 (n+1)d 사이의 값을 취하는 경우에는 잉크가 nd에 대응되는 위치 또는 (n+1)d에 대응되는 위치에서 토출되도록 한다.
Patent KR-20000010387-A (KR)
Title: Production method of unwoven fabric for mushroom cultivation
Inventor: HYUN SUN OK
IPC: D04H1/485
Filed: 1998-07-31
Abstract: PURPOSE: An unwoven fabric is provided to have the excellent plasticity, and to produce a port for a mushroom cultivation in a simple and economic method by using the plasticity. CONSTITUTION: The unwoven fabric is produced by processes of: producing a web of weigh 100¯140 g/m2 by a polyester fiber; needle-punching the web; thermal-bonding the needle-punched unwoven fabric at 100¯ 120°C by using a calendar installed an engraved roller. The needle-punching of the web performs by the needle- punching of a double-pass using a needle loom, and the unwoven fabric thermal-bonds passing the calendar. The unwoven fabric produced by these process easily forms a port plate(10) for a mushroom cultivation formed many ports(11) by a forming method such as a press because of the high intensity and the high elongation.
Patent KR-20000014398-A (KR)
Title: Pause control device of elevator
Inventor: LEE WON GI
IPC: B66B1/00
Filed: 1998-08-20
Abstract: PURPOSE: A pause control device of an elevator is provided to reduce energy consumption by intercepting power of the whole part except power of a central controlling unit on the pause driving of the elevator. CONSTITUTION: The device has: a main power changing device supplying power; a subsidiary power changing device partly supplying additional power; a central controlling unit conducting a certain control work by inputting power from the main power changing device; an inverter control device transmitting and receiving a certain data with the central controlling unit by supplying power from the subsidiary power changing device; a platform button input, output and communication control device transmitting and receiving a data about the central controlling unit and a hall calling; and a car calling input, output and communication control device transmitting and receiving a data to the central controlling unit and the platform button input, output and communication control device.
Patent KR-19980082113-A (KR)
Title: 외벽단열용 스티로폴의 제조 방법
Filed: 1998-08-24
Abstract: 1. 전체 구성 
     본 외벽단열용 스티로폴 제조 공정에서는 EPS (φ=0.2∼3.0㎜, Expandable P/S) 원료 bead를 103∼105℃에서 1차 발포시키고 분말상의 alumina와 talc를 투입하고 성형기를 이용하여 101(±6)℃의 온도범위에서 열화 팽창 및 성형(규격:1200 * 600 * 50㎣)하고 건조실 내를 1m/min의 속도로 이동시키면서 건조시켜서 외벽단열용 스티로폴 시제품을 제조한다. 
     2. 발명의 효과 
     본 외벽단열용 스티로폴 제조 공정(#725)에 의해서 제조한 시제품과 기존의 공정(#727)으로 제조한 스티로폴제품에 대한 부피의 수축률 등을 비교해 본 결과, 전자가 훨씬 더 작은 변화율을 보여서 숙성기간 단축이라는 면에서 일단 만족스러운 결과를 보여준다.    즉 #725의 제조방식으로 제조하는 경우 40일 경과시 99.53% (cf. #727:96.42%), 170일 경과 후 98.36% (cf. #727:95.71%)의 수축률을 보여 #727 시료의 실험결과에 비하여 훨씬 작은 수축률을 보이므로 기존의 5∼6주간의 장기적인 숙성 기간이 필요하지 않다.    2차 발포 성형 후 아닐링 시에 건조실 내의 온도는 기존의 낮은 온도(30℃)보다는 60℃정도의 고온을 유지해야 효과적인 건조가 이루어진다.    세라믹스 첨가 실험 결과 570(±10.0)g의 EPS bead(φ=0.2∼3.0 ㎜, 발포제 : azobisformamaide(ABFA))원료에 5.0(±0.8)g의 alumina 분말(200∼300mesh), 5.4(±0.6)g의 talc분말(300mesh)을 혼합한 혼합물로부터 제조한 시료가 다른 시료에 비하여 작은 흡수량(0.186g/100㎠)과 양호한 굽힘강도(2.082Kg/㎠)를 보이는 등 가장 우수한 물성을 보인다.    시제품의 제조에서 사용하는 원료의 양은 압축강도와 밀도값에 영향을 주며, 굽힘강도나 흡습성 등에는 큰 영향을 주지 않는다.
Patent KR-19990023880-A (KR)
Title: 동벡터 검출 장치와 동벡터 검출 방법 및 화상 부호화 장치
IPC: G06T7/20
Filed: 1998-08-26
Abstract: 본 발명은 동벡터 검출에 있어서 소비 전력 및 검출 성능면에서 서브샘플링 설정을 종래보다 더 적절하게  실시 가능하게 하는 것으로, 상관도 연산 수단(13)은 부호화 대상 블록과 탐색 범위내의 후보 블록의 상관도를 연산하는 복수의 상관도 연산 블록(13a∼13d)을 구비한다.  각 상관도 연산 블록(13a∼13d)은 각각 부호화 대상 블록의 서로 다른 화소군이 제 1 화상 저장 수단(11)으로부터 공급됨과 함께 이 공급된 화소군에 대응하는 후보 블록의 화소군이 제 2 화상 저장 수단(12)으로부터 공급되며, 이들 공급된 화소군끼리 상관도 연산을 실행한다.  제어부(20)는 부호화 대상 블록의 주파수 성분 등의 화상 특징 정보(S1)나 전지의 잔량 등의 사용 상황 정보(S2)에 따라서 서브샘플링 설정을 한다.  그리고 이 설정에 대응하여 상관도 연산 수단(13)에 대해 상관도 연산 블록(13a∼13d)의 전부 또는 그 일부를 선택하여 동작시킨다.
Patent KR-20000014974-A (KR)
Title: Cooling chamber for semiconductor manufacturing apparatus
Inventor: CHEON JEONG-GU
IPC: H01L21/304
Filed: 1998-08-26
Abstract: PURPOSE: A cooling chamber used for semiconductor fabrication apparatus is provided to improve a cooling speed of a wafer by using only a cooling water without using a cooling gas. CONSTITUTION: The cooling chamber comprises a chamber body (3) for effectively cooling a wafer (11) and a chamber cover (4) for opening and closing the chamber body (3) according to an upward and downward driver (7). The chamber cover (4) further includes a first and a second cooling rooms (8, 9) and a first and a second vaporizing rooms (83, 91) divided by a water flow control plate (81); a cooling water supply pipe (84) connected to the cooling rooms (8, 9); and a vacuum pump (6) connected to the vaporizing rooms (83, 91) via a vapor outlet pipe (86).
Patent KR-20000015218-A (KR)
Title: Guide system of elevator
Inventor: HAM SUN SIK
IPC: B66B7/02
Filed: 1998-08-27
Abstract: PURPOSE: A guide system of an elevator is provided to make a passenger ride in an elevator in a comfortable and pleasant state by efficiently reducing and interrupting the horizontal vibration of a car which gives a feeling of uneasiness and of unpleasantness to a passenger when an elevator travels. CONSTITUTION: The guide system of an elevator is formed by: a guide roller(4), which is connected with a guide rail(3) vertically installed inside of an elevator path to a car frame(2) of a car(1) installed in an elevator, installed by being supported to be revolved by a lever(5); a supporting bracket(6) of which end is fixed to the car frame and of which inside fixes a supporting member(7); a spring(8) installed between the upper area of the supporting member and the lever to absorb the vibration transmitted through the guide roller; a supporting rod(9) fixed inside of the supporting bracket on the lower area of the supporting member; and a stopper(10) installed by supporting itself to the supporting rod to restrict the displacement of the lever to prevent the lever from excessively revolving.
Patent KR-20000019140-A (KR)
Title: Malfunction preventing circuit
Inventor: KIM SEONG RYONG
IPC: G11C7/00
Filed: 1998-09-09
Abstract: PURPOSE: A malfunction preventing circuit is provided to generate a signal which is always maintains a width over the constant magnitude and to prevent a malfunction of the semiconductor device by applying a constant delay to an input signal, if the width of the input signal is narrow, and making the input signal maintain a sufficient pulse width. CONSTITUTION: A malfunction preventing circuit comprises: a first signal generating mean (200) receiving a control signal having various pulse widths and generating a signal delayed as a predetermined width(T1); and a second signal generating mean() receiving the output signal of the first signal generating mean(210) and the control signal, thereby generating a standard signal having a pulse width(T2) as a normal function is possible, and comparing the standard signal and the control signal, thereby generating a signal having more large width.
Patent KR-19990029853-A (KR)
Title: 노광 패턴 마스크 및 그 제조 방법
IPC: H05K3/00
Filed: 1998-09-16
Abstract: 본 발명은 다수의 배선 패턴 소자들로 구성된 집적 회로 배선 패턴과, 배선 패턴 소자들의 단부 근처에서 제공되는 다수의 더미 패턴 소자들로 구성된 더미 패턴을 구비한다.     이것은 작은 치수의 배선 패턴 소자에서 노출 실패를 방지할 수 있게 한다.
Patent KR-20000020048-A (KR)
Title: Organic electricity luminescence device having enhanced luminescent efficiency
Inventor: LEE JAE KYUNG
IPC: H05B33/14
Filed: 1998-09-17
Abstract: PURPOSE: A device is provided to enhance a luminescence efficiency of a device with an increase of an injection efficiency of positive holes and electrons by manufacturing a positive hole transport layer and/or an electron transport layer. CONSTITUTION: A device comprises a transparent electrode(2) of a positive polarity, an organic layer including an organic luminescence layer, and an electron injection polarity. The organic layer further includes a positive hole transport layer(3) and/or an electron transport layer(4). The positive hole transport layer(3) includes polyamide formed from dianhydride compound of electron affinity more than 1.10 eV but less than 1.90 eV and/or the electron transport layer(4) includes polyamide formed from diamin compound of an ionization potential between 6.80 eV and 7.70 eV.
Patent KR-19980087777-A (KR)
Title: 고기능성 나이론 중공사 직물 및 그 제조 방법
Filed: 1998-09-17
Abstract: 본  발명은  나이론  중공사를  공기  가공(Air  Jet  Texturing)하여  제직한  고기능성  나이론  중공사  직물  및  그의  제조  방법에  관한  것이다. 
     본  발명에  따른  고기능성  나이론  중공사  직물은  겉보기  섬도  40d  내지  99d  또는  251d  내지  3000d의  폴리아미드  원사로서  중공율이  5％∼30％  되는  중공사를  단독으로  또는  합본하여  공기  가공시킨  가공사를  사용하여  상기  가공사만으로  또는  다른  원사와  혼직  또는  교직된  것을  특징으로  한다. 
     본  발명에  따르면  보온성,  경량성,  굽힘  저항성이  크게  향상되고   은은한  광택을  가지는  다양한  기능의  직물을  얻을  수  있는  효과가  있다.
Patent KR-20000027767-A (KR)
Title: Plasma device
Inventor: PARK SIN SEUNG
IPC: H01L21/3065
Filed: 1998-10-29
Abstract: PURPOSE: A plasma device is provided to easily search an etching end point, after a processor easily monitors by finding out an impedance as a phase angle value in a reaction chamber by an impedance sensor. CONSTITUTION: A plasma device comprises a reaction chamber(11), a reaction gas supplier(13), a source power applier(14), a magnetic force applier, a wafer chuck(15), an RF(Radio Frequency) bias applier(16), a main controller(19), an impedance sensor(17), and a local controller(18). The reaction gas supplier is arranged on the upper part of the reaction chamber. The source power applier applies power to a reaction gas supplied from the reaction gas supplier, and forms the reaction gas as plasma. The magnetic force applier is arranged on an outer circumference of the reaction chamber, and controls distribution uniformity of the plasma which is spread as a wafer(30), to magnetic force. The wafer chuck is arranged on the lower part of the reaction chamber, and the wafer is installed thereon. The RF bias applier is connected to the wafer chuck, and controls ion energy of the plasma. The main controller adjusts states of the reaction gas supplier and the source power applier, and the magnetic force applier and the bias applier to control the plasma. The impedance sensor senses an impedance in the reaction chamber between the wafer chuck and the RF bias applier, and between the main controller, the RF bias applier, and the main controller. The local controller analyzes data applied from the impedance sensor.
Patent KR-20000028423-A (KR)
Title: Apparatus for automatically setting up/outputting sounds according to tv programs and method the same
Inventor: LEE KI JEONG
IPC: H04N5/60
Filed: 1998-10-31
Abstract: PURPOSE: An apparatus for setting up/outputting sounds is provided to automatically set up and output sound condition according to TV programs. CONSTITUTION: An apparatus for automatically setting up/outputting sounds according to TV programs comprises a timer(300), a storage unit(302), a controller(304), a selector(306), a sound controller(308), and a voice circuit(310). The timer has time information on present time. The storage unit is divided into N regions according to program genres, and differently stores a surround operation and volume size. The controller interprets a genre of a broadcasted program, and outputs information on the surround operation and the volume size of a corresponding region among the N regions. The selector selects a signal outputted from the controller when a selection mode by an outer signal is an automatic mode, and selects a control signal when the selection mode is a manual mode. The voice controller controls the surround operation and the volume size by a signal applied from the selector. The voice circuit generates an original voice signal by a control signal from the sound controller.
Patent KR-20000031575-A (KR)
Title: Fire extinguisher embedding umbrella holder
Inventor: YU SANG GIL
IPC: A62C13/76
Filed: 1998-11-07
Abstract: PURPOSE: A fire extinguisher is provided to make people easily find the fire extinguisher when firing and to utilize an indoor space, by embedding an umbrella stand. CONSTITUTION: A fire extinguisher is composed of an iron container(1) having capacity for storing certain amount of chemicals, a lever(2) used for a handle and controlling chemicals spray, a nozzle(31) for spraying, a flexible hose(3), hose fixing hole(41), a band(4) for settling the hose and a stand(5). Some elastic clips(42) are installed on the outer circumference of the band to fix an umbrella(6) and some collecting cup(52) are installed in the opposite position of the elastic clips to collect water from the umbrella in a state of standing the umbrella knob on the outer circumference of a band(51).
Patent KR-19990014575-A (KR)
Title: 온수보일러용 급탕탱크 내면에 대한 법랑층 형성방법
IPC: C23D5/00
Filed: 1998-11-24
Abstract: 본 발명은 온수보일러와 연결되어 사용되는 급탕탱크의 내면에 균일한 두께로 조직이 치밀한 법랑층이 형성되도록 함으로써 급탕탱크 사용시 탱크에 균열이 발생되는 것을 효과적으로 막아 보일러용 급탕탱크의 사용수명을 연장시킬 수 있도록 한 것으로, 강판소재를 특정형태로 절단, 가공하는 가공공정과, 가공된 소재를 용접하여 탱크를 이루는 용접공정과, 다수의 금속입자나 모래를 내면에 강하게 분출시켜 탱크내면의 불순물을 박리시키기 위한 쇼트 및 샌드블라스팅공정과, 박리된 각종 불순물을 탱크내부로부터 제거하는 불순물 제거공정과, 불순물이 제거된 탱크내부에 법랑액을 투입하는 법랑액 투입공정과, 법랑액이 투입된 탱크를 눕혀 회전시키면서 좌우로 시이소운동되게 하여 내면에 법랑액이 골고루 도포되게 하는 도포공정과, 탱크내 투입된 법랑액을 배출제거하는 배출공정과, 법랑액이 배출완료된 탱크를 고속으로 회전시켜 도포된 법랑액의 조직을 치밀하게 하는 다짐공정과, 내면에 법랑액이 치밀한 조직으로 도포된 탱크를 자연건조후 소성(燒成)처리하는 소성공정으로 되는 것을 특징으로 하는 온수보일러용 급탕탱크 내면에 대한 법랑층 형성방법이다.
Patent KR-20000039474-A (KR)
Title: Stacked chip package using tape circuit substrate
Inventor: LEE HYEOK
IPC: H01L23/28
Filed: 1998-12-14
Abstract: PURPOSE: A stacked chip package using a tape circuit substrate is provided to reduce a size of the package to that of a chip. CONSTITUTION: In a stacked chip package(40), an upper semiconductor chip(43) is stacked on a lower chip(41). Each chip(41,43) includes electrode pads(44,45) formed on a top surface of each chip(41,43) and arranged along both opposed edges of the top surface, and the pads(44,45) of each chip(41,43) are at right angles to each other. An elastomer layer(46) is interposed between a tape circuit substrate(30) and the upper chip(43). The tape circuit substrate(30) includes a polyimide tape(32) having windows(35,37) to expose the electrode pads(44,45), and beam leads(31,36) formed under the polyimide tape(32) and extended to the window(35,37). Solder balls(49) on the tape(32) are electrically connected with the beam leads(31,36) via holes in the tape(32) and copper leads under the tape(32). The beam leads(31,36) exposed through the window(35,37) are respectively bonded with the electrode pads(44,45), and then liquid resin encapsulant is applied.
Patent KR-20000039774-A (KR)
Title: Repairing and waterproofing method
Inventor: WON GUK HUI
IPC: E04D11/02
Filed: 1998-12-16
Abstract: PURPOSE: A repairing and waterproofing method is provided to prevent the surface of a slab rooftop from secondly cracking caused by water in a protecting layer, to prevent a spread layer from being separated from a matrix and to prevent a waterproof layer from cracking caused by water gathered in the edge of the rooftop by tightly combining fiber glasses. CONSTITUTION: A part having cracks is cut and vacuumed by an air compressor. A drain pipe is inserted into a thermostat layer after breaking the inside of a drain hole. A cement glue(6) is covered on the wall and the parapet of a slab rooftop(100) in 1mm thickness. Fiber glass 618CR(8') is covered on an edge(30) and then cement mortar(7) is plastered in 3 to 5mm thickness to fill a gap. After that, a cement glue(6') is covered twice in 1mm thickness and fiber glass 618CR(8) is crossly covered twice in 0.7 to 0.8mm thickness. On the top, SA-506 and the cement glue are covered three times in 1mm thickness and finally SA-506 crude solution is covered twice in 1mm thickness.
Patent KR-20000040106-A (KR)
Title: Overlay measuring pattern of semiconductor device
Inventor: JEONG WOO YEONG
IPC: H01L21/027
Filed: 1998-12-17
Abstract: PURPOSE: An overlay measuring pattern of a semiconductor device is provided to reduce a measuring error. CONSTITUTION: In a semiconductor device, an overlay pattern is formed in a scribe line separating two adjacent dies on a semiconductor substrate(10). The overlay pattern includes an outer box(20) which is formed into a rectangular frame in a former process, and an inner box(30) which is formed within the outer box(20) apart from the outer box(20) in a latter process. The outer and inner boxes(20,30) have a first pattern array(20a) and a second pattern array(20b), respectively. The first and second pattern array(20a,20b) are composed of a plurality of lattices arranged in matrix shape. Each lattice of the pattern array(20a,20b) is equal in size to a cell pattern in the die. Therefore, an overlay between two patterns formed through the former and latter processes can be exactly measured.