baber/WOPTO huggingface dataset:
Patent TW-202231079-A (TW)
Title: Reduced overhead beam profile characterization
Inventor: DUAN WEI-MIN
IPC: H04W24/10
Filed: 2021-11-30
Abstract: Disclosed are techniques for wireless communication. In an aspect, a method of wireless communication performed by a transmission/reception point (TRP) includes transmitting, at a first time and to a receiving entity, a first beam response report that describes, using a first level of granularity, beam responses of a set of positioning resources, each positioning resource to be transmitted by the TRP at different times using different beams; transmitting, at a second time and to the receiving entity, a second beam response report that describes, using a second level of granularity different from the first level of granularity, beam responses of at least a portion of the set of positioning resources; and transmitting the set of positioning resources using the different beams. The TRP may receive positioning information from the receiving entity, the positioning information comprising measurements of at least some of the positioning resources, a positioning estimate, or combinations thereof.
Patent TW-202324014-A (TW)
Inventor: LIN YI-JIN
IPC: G05B23/00
Filed: 2021-11-30
Abstract: 一種製程診斷系統，包括數位雙生運算單元、製程診斷運算單元與遠端運算分析單元。數位雙生運算單元取得加工設備的振動相關參數及切削相關參數，並對振動相關參數、切削相關參數與加工設備對應的三維模型進行模擬運算，以產生三維運算結果。製程診斷運算單元接收三維運算結果，並呈現三維運算結果。遠端運算分析單元，接收三維運算結果，並對三維運算結果進行模擬分析，以產生分析結果。
Patent TW-202247487-A (TW)
Title: Alignment tray, alignment device, and alignment method
Inventor: MOTOYOSHI MAKOTO
IPC: H01L23/12
Filed: 2021-11-30
Abstract: An alignment device comprising: an alignment tray (20a) for causing a plurality of elements to be aligned at one time in a high precision; a first carrying unit (30) for carrying the plurality of elements to the alignment tray (20a) at one time; a driving unit (40) for driving the alignment tray (20a) to match the vertical angle of each element to the vertical angle of each recess in the alignment tray (20a); and a second carrying unit (40) for carrying the plurality of elements from the alignment tray (20a) at one time.
Patent TW-202235110-A (TW)
Title: Virus inactivation system and virus inactivation method
Inventor: TOMIMATSU KAZUTAKA
IPC: F24F6/14
Filed: 2021-12-01
Abstract: The purpose of the present invention is to reliably implement inactivation, via ozone, at a required location of an indoor space in response to measured environmental conditions. A virus inactivating system (10) comprises an ozone generating device (1), a measurement device (4), and a control device (5). The ozone generating device (1) generates ozone. The measurement device (4) measures the ozone concentration, temperature, and humidity at a plurality of measurement points in an indoor space (20). The control device (5) has: a CT value calculation unit that calculates a CT value, which is a product of the ozone concentration measured by the measurement device (4) and an elapsed time from the start of measurement of the ozone concentration; a storage unit that records a reference CT value necessary for inactivating a bacterium or virus to be inactivated under prescribed environmental conditions; a CT value determination unit that corrects the reference CT value on the basis of the ozone concentration, temperature, and humidity measured by the measurement device, and determines the corrected value to be a corrected CT value; and an assessment unit that assesses whether the calculated CT value satisfies the corrected CT value.
Patent TW-202228432-A (TW)
Title: Imaging method and imaging system
Inventor: LIU YU-RUN
IPC: G01T1/16
Filed: 2021-12-16
Abstract: Disclosed herein is a method, comprising sending radiation beam groups (i, j), i=1,..., M and j=1,..., Ni toward a same scene, wherein each radiation beam group comprises multiple parallel fan radiation beams sent simultaneously, wherein for each value of i, the radiation beam groups (i, j), j=1,..., Ni are parallel to each other and are sent one group at a time, and wherein no two radiation particle paths of two respective radiation beam groups with 2 different values of i are parallel to each other; for i=1,..., M and j=1,..., Ni, capturing with radiation of the radiation beam group (i, j) a partial image (i, j) of the scene; for each value of i, stitching the partial images (i, j), j=1,..., Ni; and reconstructing a 3-dimensional image of the scene from the stitched images (i), i=1,..., M.
Patent TW-202301332-A (TW)
Title: Semiconductor storage device
Inventor: FUNATSUKI RIEKO
IPC: G11C16/26
Filed: 2022-01-07
Abstract: This semiconductor storage device has a first memory cell group to an eighth memory cell group that are arranged along a first direction; a first word line extending in the first direction; and a first sense amplifier group to an eighth sense amplifier group that are capable of supplying a voltage respectively to the first memory cell group to the eighth memory cell group. The first memory cell group to the eighth memory cell group each have a plurality of memory cells and a plurality of bit lines respectively connected to the plurality of memory cells. When a program voltage is supplied to the first word line in a write operation, the first sense amplifier group supplies a first voltage to a bit line connected to a memory cell to be written among a plurality of memory cells of the first memory cell group, and the second sense amplifier group supplies a second voltage, which is different from the first voltage, to a bit line connected to a memory cell to be written among a plurality of memory cells of the second memory cell group.
Patent TW-202329111-A (TW)
Title: Small-area side capacitive read-only memory device, and array and operation method thereof achieve highest capacitance value at smallest circuit configuration area to further reduce the overall area of the read-only memory
Inventor: HUANG YU-TING
IPC: G11C16/02
Filed: 2022-01-14
Abstract: A small-area side capacitive read-only memory device, and its array and operation method are disclosed. This small-area side capacitive read-only memory device is embedded with a field-effect transistor in a semiconductor substrate. The field-effect transistor includes a first dielectric layer and a first conductive gate stacked on the first dielectric layer. A lateral side of the first conductive gate extends to a top of a second dielectric layer and is connected to a second conductive gate to generate a capacitive effect. The second conductive gate has a plurality of finger-shaped portions connected by strip portions. Accordingly, the invention can generate the highest capacitance value through the smallest layout area, thereby reducing the overall area of the read-only memory and achieving high-efficiency reading and writing.
Patent TW-202246432-A (TW)
Inventor: LU LUNG-TAI
IPC: C09K3/14
Filed: 2022-02-07
Abstract: 本發明係關於一種用於拋光包括碳氮化矽層之基板的化學機械拋光組合物，該組合物包含以下、基本上由以下組成或由以下組成：水性液體載劑、分散於該液體載劑中之陰離子膠態二氧化矽粒子、構形控制劑，且其pH在約2至約7範圍內。
Patent TW-202233633-A (TW)
Title: 後補
Inventor: CHEN KEVIN X
IPC: C07D495/04
Filed: 2022-02-21
Abstract: The present invention relates to a series of thienopyrimidinedione compounds and an application thereof, and specifically relates to a compound represented by formula (II) and a pharmaceutically acceptable salt thereof.
Patent TW-202246341-A (TW)
Title: Antibody against nkp46 and use thereof
Inventor: Yang liu-qing
IPC: G01N33/68
Filed: 2022-03-04
Abstract: Provided are an antibody of NKp46 receptors or an antigen-binding fragment thereof, a derivative comprising said antibody or antigen-binding fragment thereof, a pharmaceutical composition and related use for treating, diagnosing and detecting cancers thereof.
Patent TW-202316623-A (TW)
Inventor: ONG YI CHING
IPC: H01L27/06
Filed: 2022-03-08
Abstract: 本揭露有關於一種積體電路晶片包含位於基材上方的第一金屬層。位於第一金屬層上方的第二金屬層。介於第一金屬層與第二金屬層之間的離子晶體層。介於第一金屬層與第二金屬層之間的金屬氧化層。第一金屬層、第二金屬層、離子晶體層以及金屬氧化層位於沿著基材排列的電晶體元件上方。
Patent TW-202336063-A (TW)
Title: Composition for preparing waterborne polyurethane, method for preparing waterborne polyurethane and waterborne polyurethane prepared therefrom
Inventor: CHEN SHU-YI
IPC: C08G18/08
Filed: 2022-03-11
Abstract: The present disclosure provides a composition for preparing waterborne polyurethane, a method for preparing waterborne polyurethane and a waterborne polyurethane prepared therefrom. The composition includes a tri-blocked copolymer, a diisocyanate compound and a hydrophilic chain extender. The tri-blocked copolymer is a polyethylene glycol- propylene glycol-ethylene glycol copolymer or a polyethylene glycol-caprolactone-ethylene glycol copolymer, and the stoichiometric ratio between the isocyanate groups of diisocyanate compound and the hydroxyl groups of the tri-blocked copolymer is ranging from 1.2 to 2.0. The method including performing a pre-polymerization step, an end-capping step and a dissolving step using the composition. The waterborne polyurethane product prepared therefrom has excellent mechanical, physical and chemical properties.
Patent TW-202337120-A (TW)
Title: Switch mode power supply circuit with high voltage output, and electrostatic spray apparatus and agricultural plant protection apparatus using the same
Inventor: CHEN YU-KAI
IPC: H02M3/10
Filed: 2022-03-11
Abstract: A switch mode power supply circuit with high voltage output, an electrostatic spray apparatus and agricultural plant protection apparatus using the same are provided. The switch mode power supply circuit is connected in series with at least a pre-stage power converter and a post-stage power converter. In order to simplify the control, the switch of the pre-stage power converter is omitted, only one switch of the post-stage power converter is adopted. And thus the synchronous control is performed. Since the multiple sets of power conversion circuits in the previous stage are connected in series, the turn ratio of the transformer in the power converter in the subsequent stage can be reduced. The transformer can be miniaturized thereby and the power supply circuit would be more suitable for agricultural plant protection machine and electrostatic spray apparatus.
Patent TW-202304457-A (TW)
Title: Formulation
Inventor: SIMPSON DAVID BRADLEY BROOK
IPC: A61K47/38
Filed: 2022-03-17
Abstract: A pharmaceutical formulation which comprises ceralasertib, dibasic calcium phosphate, microcrystalline cellulose, low-substituted hydroxypropyl cellulose and magnesium stearate is described.
Patent TW-202300021-A (TW)
Inventor: SCHNEIDER DANIEL
IPC: A01N25/12
Filed: 2022-03-17
Abstract: 一種殺有害生物組成物，其包含：(a) 按重量計20%至35%的作為活性成分的甲氧哌啶乙酯，和 (b) 按重量計5.5%至15%的分散劑組合，該分散劑組合包含：(i) 按總組成物的重量計5%至10%的丙烯酸接枝共聚物在水和丙二醇中的溶液；以及 (ii) 按總組成物的重量計0.5%至5%的烷基萘磺酸鈉甲醛縮合物。
Patent TW-202247287-A (TW)
Title: Substrate processing method and substrate processing device
Inventor: ISHIKAWA SHINYA
IPC: H01L21/31
Filed: 2022-03-25
Abstract: Provided is a feature for controlling the dimensions and/or shape of an opening to be formed in a film to be etched. A substrate processing method according to the present disclosure comprises: a step for preparing a substrate having (a) a film to be etched, (b) a mask film formed on the film to be etched and having a side wall defining at least one opening on the film to be etched, and (c) a protective film formed on at least the side wall of the mask film so as to surround the opening, and containing at least one element selected from the group consisting of boron, phosphorus, sulfur, and tin; and a step for etching the film to be etched using the protective film and the mask film as a mask.
Patent TW-202305084-A (TW)
Title: Polishing method, and polishing composition set
Inventor: ICHITSUBO TAIKI
IPC: C09K3/14
Filed: 2022-03-29
Abstract: Provided is a polishing method whereby it becomes possible to reduce defects on the surface of an object to be polished. The polishing method comprises a polishing step for supplying a polishing composition S1 containing abrasive grains A1 and a polishing composition S2 containing abrasive grains A2 in this order onto the same polishing plate to polish an object of interest. With respect to the abrasive grains A1, the ratio (D2A1/D1A1) of an average grain diameter (D2A1) which is measured by the dynamic light-scattering method to a grain diameter (D1A1) which is converted from a specific surface area measured by the BET method is 1.5 or more. With respect to the abrasive grains A2, the ratio (D2A2/D1A2) of an average grain diameter (D2A2) which is measured by the dynamic light-scattering method to a grain diameter (D1A2) which is converted from a specific surface area measured by the BET method is less than 1.5.
Patent TW-202243009-A (TW)
Inventor: WANG YU-LIN
IPC: H01L21/318
Filed: 2022-04-01
Abstract: 一種電子裝置包括基板、第一線路層、氧化物絕緣層與氮化物絕緣層。第一線路層配置在基板上，並包括外層金屬層。外層金屬層含有重量百分比在97%以上的鉬。氧化物絕緣層配置在第一線路層上，並接觸外層金屬層。氮化物絕緣層配置在氧化物絕緣層上，其中氧化物絕緣層的厚度與氮化物絕緣層的厚度之間的厚度差大於或等於250奈米。
Patent TW-202243081-A (TW)
Title: Semiconductor removing apparatus and operation method thereof
Inventor: SHEN YU-TANG
IPC: H01L21/67
Filed: 2022-04-08
Abstract: An operation method of a semiconductor removing apparatus includes moving a semiconductor structure to a stage, wherein the semiconductor structure includes a lower substrate, a cap, and a micro electro mechanical systems (MEMS) structure between the lower substrate and the cap, and the cap has a diced portion; pulling, by a clamp assembly, a tape of a tape roll from a first side of the stage to a second side of the stage opposite to the first stage, such that the tape is attached to the cap of the semiconductor structure; and d pulling, by the clamp assembly, the tape of the tape roll from the second side of the stage back to the first side of the stage, such that the diced portion of the cap separates from the semiconductor structure.
Patent TW-202303749-A (TW)
Title: Substrate processing method and substrate processing apparatus
Inventor: GOHIRA TAKU
IPC: H01L21/31
Filed: 2022-05-06
Abstract: A substrate processing method according to an illustrative embodiment of the present invention is for processing substrates comprising a film to be etched and a mask that is disposed upon the film to be etched and has an opening. This method includes: (a) a step in which a first processing gas is used to form a first layer containing nitrogen on a side wall of a recessed section that is provided in the film to be etched and corresponds to the opening; (b) a step in which, after (a), a second processing gas that includes a gas containing carbon and hydrogen is used to form a second layer containing carbon and hydrogen upon the first layer; and (c) a step in which, after (b), a third processing gas is used to etch the recessed section.
Patent TW-202243723-A (TW)
Title: Ammonia-process desulfurization and decarbonization integrated device and method
Inventor: ZHANG JUN
IPC: B01D53/78
Filed: 2022-05-11
Abstract: The invention is applied to desulfurization and decarburization of process gas containing sulfur oxides and CO2, and belongs to the field of environmental protection, ammonia is used as a desulfurization and decarbonization agent, the gas firstly enters a desulfurization device for desulfurization to generate ammonium sulfate fertilizer, the desulfurized gas enters a decarbonization device to remove carbon dioxide in the gas to generate ammonium bicarbonate fertilizer, the decarbonized gas contains free ammonia, is washed with a desulfurization circulating solution and then is washed with water, and the washing solution returns to a desulfurization tower and is used as an absorbent for desulfurization. A desulfurization unit is provided with a cooling device for cooling the flue gas, so that the subsequent decarburization requirement is met. Condensate water generated in the desulfurization cooling process is used as ammonia washing replenishing water or used for other purposes after being subjected to film separation and purification, concentrated water returns to a desulfurization area, and no waste water is generated. According to the technology, decarburization and desulfurization technologies are organically integrated, ammonia washing efficiency is high by adopting acidic desulfurization circulating liquid to wash ammonia, the problem of ammonia escape in the decarburization process is successfully solved, the process is simpler, investment and operation cost is low, by-products of ammonium sulfate and ammonium bicarbonate fertilizer are produced, CO2 does not need to be reinjected underground for storage, by-product ammonia water can be used, and the purposes of treating waste with waste and recycling economy are really achieved.
Patent TW-202246676-A (TW)
Title: Speed reducer
Inventor: SASAKI SATOSHI
IPC: F16H57/04
Filed: 2022-05-13
Abstract: A speed reducer comprising: an annular external gear which has a plurality of external teeth and in which a first through hole and a plurality of second through holes arranged side by side in the circumferential direction so as to surround the first through hole are formed; an input shaft extending through the first through hole; a first bearing holding the input shaft so that the input shaft is relatively rotatable with respect to the external gear in the circumferential direction; a plurality of inner periphery pins extending through the second through holes in the axial direction; an inner periphery pin holder holding both ends of the plurality of inner periphery pins and surrounding the outer peripheral surface of the input shaft; a second bearing surrounding the outer peripheral surface of the external gear; and internal gear pins meshing with the external teeth. The second bearing includes: an outer ring fixed to the inner periphery pin holder; an inner ring disposed on the radially inner side relative to the outer ring and forming an output shaft that rotates at a lower speed than the input shaft; and rolling elements contacting the inner peripheral surface of the outer ring and the outer peripheral surface of the inner ring. In the inner ring, a pin holding portion having an annular shape surrounding the outer peripheral surface of the external gear and holding the internal gear pins is formed along the inner peripheral surface.
Patent TW-202307294-A (TW)
Title: Epitaxial wafer for ultraviolet light emitting element and method for manufacturing same
Inventor: TSUCHIYA KEITARO
IPC: C30B29/40
Filed: 2022-06-30
Abstract: The present invention is an epitaxial wafer for an ultraviolet light emitting element, said wafer having: a first supporting substrate which is heat resistant and transparent to ultraviolet light; an AlxGa1-xN (0.5 < x ≤ 1) seed crystal layer joined through adhesion on the first supporting substrate; and an epitaxial layer in which a first conductivity type cladding layer having as a main component AlyGa1-yN (0.5 < y ≤ 1), an AlGaN active layer, and a second conductivity type cladding layer having as a main component AlzGa1-zN (0.5 < z ≤ 1) are grown in this order on the seed crystal layer. The present invention thereby provides an epitaxial wafer for an ultraviolet light emitting element having an epitaxial layer of a group III nitride such as AlN, which is inexpensive and high-quality and has high light extraction efficiency, and a method for manufacturing the same.
Patent TW-202301802-A (TW)
Title: Automatic gain control for passive optical network
Inventor: DANGELAS VIRGINIJUS
IPC: H03F3/08
Filed: 2019-09-19
Abstract: An automatic gain control circuit controls a gain of a burst mode amplifier. A peak detector includes an input coupled to an output of the amplifier. A plurality of resistors is coupled in series between an input of the first amplifier and the output of the first amplifier for setting the gain of the amplifier. A first gain stage is responsive to an output signal of the peak detector for disabling a first resistor of the plurality of resistors to alter the gain of the first amplifier. A second gain stage is responsive to the output signal of the peak detector for disabling a second resistor of the plurality of resistors to alter the gain of the first amplifier. A comparator responsive to the output signal of the peak detector causes a pulse generator to enable the first gain stage and second gain stage each burst mode.
Patent TW-202321713-A (TW)
Title: 偵測電子電路受攻擊或劣化之方法及裝置
Inventor: RAMSDALE TIM
IPC: G01R19/165
Filed: 2022-09-15
Abstract: 本文揭示用於偵測電子電路受攻擊或劣化之裝置。此裝置包含電壓位準偵測器，建構為判定電子電路的電壓位準是否超過最大選定閾值，且具有如果電壓位準超過最大選定閾值時生成第一個二進位電壓限制信號。此裝置亦包含邊際電壓位準偵測器，建構為判定電子電路之電壓位準是否超過邊際選定閾值，此邊際選定閾值係小於最大選定閾值，且具有如果電壓位準超過邊際選定閾值時生成第二個二進位電壓限制信號。安全監控系統監控第一個及第二個二進位電壓限制信號，並建構為基於第一個二進位電壓限制信號及第二個二進位電壓限制信號之至少一者判定可能的攻擊或劣化已發生。
Patent TW-202315775-A (TW)
Title: Rail inspection device
Inventor: OTSUKA HIROSHI
IPC: B61K9/08
Filed: 2022-09-26
Abstract: A rail inspection device 1 includes a carriage 10 traveling in a traveling direction X along a pair of traveling rails 80 and a guide rail 83. The rail inspection device 1 further includes a determination unit that executes a contact time determination process, a curve entry time determination process, and a rail inspection process. The contact time determination process is a process of determining the contact time when the guide wheel 40 contacts the guide rail 83. The curve entry time determination process is a process of determining a curve entry time when a right front wheel 24 and a left front wheel 23 move from a straight section 71 to a curve section 72. The rail inspection process is a process of determining whether or not the installation position of the guide rail 83 is within an appropriate range based on the anteroposterior relationship between the curve entry time and the contact time.
Patent TW-202330829-A (TW)
Title: Reinforcement film
Inventor: SASAKI SHOGO
IPC: C09J4/06
Filed: 2022-10-19
Abstract: Provided is a reinforcement film including a base layer and a pressure-sensitive adhesive layer, wherein the reinforcement film has both excellent low elasticity and excellent heat resistance, and poor IC connection, for example, is not likely to occur. A reinforcement film according to an embodiment of the present invention includes a base layer and a pressure-sensitive adhesive layer, wherein: the pressure-sensitive adhesive layer is configured from an acrylic pressure-sensitive adhesive; the surface elasticity of the pressure-sensitive adhesive layer is 50 kPa to 1,000 kPa at 25 DEG C; and the heat shrinkage in the MD direction when the reinforcement film is heated for 5 minutes at 180 DEG C is 1.0% or less.
Patent TW-202309058-A (TW)
Title: Coated substrate
Inventor: MEYERS STEPHEN T
IPC: G03F7/038
Filed: 2014-08-06
Abstract: Organometallic solutions have been found to provide high resolution radiation based patterning using thin coatings. The patterning can involve irradiation of the coated surface with a selected pattern and developing the pattern with a developing agent to form the developed image. The patternable coatings may be susceptible to positive-tone patterning or negative-tone patterning based on the use of an organic developing agent or an aqueous acid or base developing agent. The radiation sensitive coatings can comprise a metal oxo/hydroxo network with organic ligands. A precursor solution can comprise an organic liquid and metal polynuclear oxo-hydroxo cations with organic ligands having metal carbon bonds and/or metal carboxylate bonds.
Patent TW-202324621-A (TW)
Inventor: PATIL ANIKET
IPC: H01L23/28
Filed: 2022-10-28
Abstract: 一種裝置，該裝置包括第一封裝以及經由第一複數個焊料互連耦合到該第一封裝的第二封裝。第一封裝包括：第一基板，該第一基板包括至少一個第一介電層和第一複數個互連；及耦合到第一基板的第一整合裝置。第二封裝包括：包括至少一個第二介電層和第二複數個互連的第二基板；耦合到第二基板的第一表面的第二整合裝置；經由第二複數個焊料互連耦合到第二基板的第一表面的第三整合裝置；及耦合到第二基板的第一表面的第一複數個通道互連，其中第一複數個通道互連位於來自第二複數個焊料互連的焊料互連之間。
Patent TW-202315106-A (TW)
Title: Solid-state imaging device, and electronic apparatus
Inventor: TAKACHI TAIZO
IPC: H01L27/146
Filed: 2018-10-09
Abstract: The present disclosure relates to a backside irradiation type solid-state imaging device capable of reducing manufacturing costs, a method for manufacturing a backside irradiation type solid-state imaging device, an imaging device, and an electronic apparatus. A memory circuit and logic circuit, which have been individualized, are laid out horizontally, embedded with an oxide film to be planarized, and laminated so as to be included in the planar direction under a solid-state imaging element. The present disclosure is applicable to an imaging device.