baber/WOPTO huggingface dataset:
Patent TW-432302-B (TW)
Title: Reviewing method for layout design rule check
Inventor: TZENG SHIN-HUA
IPC: G06F17/50
Filed: 1999-04-13
Granted: 2001-05-01
Abstract: A reviewing method for layout design rule check (DRC) comprises: first proceeding the layout DRC to locate all plural violation sites against design rules and labeling the geometric coordinate values; then converting the coordinate values of such violation sites against design rules to multiple two-dimensional vector matrices representing pattern; comparing those two-dimensional vector matrices to obtain the geometry with identical two-dimensional vector matrix capable of being defined as the same pattern, thereby performing a pattern classification; next, calculating the tolerance distance or tolerance area in accordance with those two-dimensional vector matrices to define the violation degree of DRC so that the tolerance grade classification can be carried out; and performing an examination in accordance with the pattern classification and tolerance grade classification.
Patent TW-430926-B (TW)
Title: Method for producing thin dielectric layer applicable in capacitor and gate
Inventor: YOU TSUEI-RUNG
IPC: H01L21/76
Filed: 1999-06-04
Granted: 2001-04-21
Abstract: A method for producing a thin dielectric layer comprises: in an example, after the deposition of Ta2O5, introducing N radicals to form a smooth and dense SiN on the Ta2O5/Si boundary, in which the SiN/Si is very smooth due to a reaction between N and Si; introducing O radicals to amend defects of the Ta2O5 film, e.g. amending the defects of the dangling bonds and O bonds. The merits of the invented process include no rapid thermal process or a thermal nitridation at a high temperature. Therefore, the invented process is compatible with an embedded DRAM process. Furthermore, a smooth and dense SiN film, a smooth SiN/Si boundary, and a denser and better Ta2O5 can be obtained, thereby improving the leakage current, the refresh time and the reliability of the thin dielectric layer. The N and O can be generated by remote plasma, RF, ECR or ICP plasma technique.
Patent TW-412847-B (TW)
Title: Method for fabricating CMOS device
Inventor: LEE JONG-WOOK
IPC: H01L21/762
Filed: 1999-06-29
Granted: 2000-11-21
Abstract: A method for fabricating a CMOS device on a SOI, comprising the steps of: providing a SOI wafer having a stack structure of a base substrate, a buried oxide layer and a semiconductor layer; forming a field oxide film in the semiconductor layer to define an active region in which a PMOS device and a NMOS device are to be formed in the semiconductor layer of the SOI wafer, wherein the field oxide film is formed by performing thermal oxidation process so at to apply a compressive stress to the semiconductor layer that the PMOS device is to be formed; and forming the PMOS device and NMOS device in the active region defined by the field oxide film.
Patent TW-419763-B (TW)
Title: Wire bonding method
Inventor: NISHIURA SHINICHI
IPC: B23K20/00
Filed: 1999-08-07
Granted: 2001-01-21
Abstract: A wire bonding method that can have a simple trace, less movement, less bonding time capillary, and which won't cause the neck of the wire to be damaged is disclosed. Furthermore, it can produce a stable low-overall-height, low wiring curve below 200 mu m wire loop. The method is raising a capillary 4 to B after bonding a ball formed on the tip end of the wire 3 extending from the tip end of a capillary 4 to a first bonding point A, moving the capillary 4 to a position C located at an upward inclination in the direction of a second bonding point G, further moving the capillary 4 to a position D located at an upward inclination in the opposite direction from the second bonding point G, then moving the capillary 4 to a position E located at an upward inclination in the direction of the second bonding point G, and then lowering the capillary 4 so that the wire 3 is bonded to the second bonding point G.
Patent TW-448352-B (TW)
Title: Power-saving device and method for suspend to RAM
Inventor: JANG NAI-SHUEN
IPC: G06F1/32
Filed: 1999-09-06
Granted: 2001-08-01
Abstract: It is a kind of power-saving device and method for suspending to RAM using the feature that SDRAM has the ability of self-refresh and needs no control chips to provide control signals. When entering suspend to RAM, the first control chip (north bridge) stores memory data into a memory container through the second control chip (south bridge), then south bridge chip decreases the clock pulse CKE voltage of system memory, and at last the basic I/O system cut off power of north bridge chip to enter suspend to RAM. This invention features the control circuit and method according to the concept mentioned above.
Patent TW-459062-B (TW)
Title: Three element synthetic electroplating method
Inventor: LU FU-LE
IPC: C23C16/06
Filed: 1999-09-08
Granted: 2001-10-11
Abstract: This invention provides the three element synthetic electroplating method which contains pre-treatment, electroplating process, clean process and drying process. After the bath building process in the electroplating process, control of electrolyte and electroplating processes are carried out. The finished product using the whole inventive method has a non-carcinogenic surface electroplated layer which structure has uniform color, excellent smoothness and high abrasion resistance.
Patent TW-436318-B (TW)
Title: Apparatus for treating pyrophoric gases and toxic global warming gases
Inventor: SHIBAN SAMIR SHEHADE
IPC: B01D53/38
Filed: 1999-09-10
Granted: 2001-05-28
Abstract: A mixing chamber receiver pyrophoric gas for mixing with oxygen prior to discharge into an upright housing of the apparatus. Tubular members within the housing define annular passageways through which the mixed gas and oxygen flow in a serpentine manner with reversal of flow direction promoting the precipitation of matter. A receptacle is removably attached to the housing for collection of matter with mounting means enabling periodic receptacle removal for cleaning. An enclosure about a housing end includes a door for access to the receptacle. Provision is made for ventilating of the enclosure to an exhaust conduit during door opening to prevent escape of gas and particulate to the atmosphere. A modified from of apparatus includes a filter and chemical bed for further treatment of the flow.
Patent TW-418344-B (TW)
Title: Photomask raw glass with surface film protective layer and its production and protective layer forming liquid
Inventor: FUJIOKA AKIO
IPC: G03F1/48
Filed: 1999-10-27
Granted: 2001-01-11
Abstract: The objective of the present invention is to provide a photomask which is resistant to flawing, is hardly contaminated, obviates the degradation in UV transmittance and is inexpensive and durable by a technique relating to lamination and formation of a surface film protective layer for protecting an emulsion layer of a photomask (emulsion) which is photographic raw glass. This photomask raw glass with the surface film protective layer is obtained by laminating and forming the surface film protective layer on the photomask raw glass formed with a film plane (emulsion mask) of the emulsion layer on a glass substrate by using a protective layer forming liquid prepared by mixing a chief material, which is prepared by formulating a solution consisting of butyl acetate, methyl ethyl ketone (MEK) and cellosolve acetate, a hardener, which is prepared by formulating a solvent ethyl acetate with a hardener, and a diluent, which is prepared by formulating butyl acetate, methyl ethyl ketone (MEK) and cellosolve acetate, with a two-part crosslinking type contamination-proof surface coating agent. This process is for production of such raw glass.
Patent TW-402682-B (TW)
Title: Spectral analysis method of gas by laser beam
Inventor: MATSUMOTO ISAO
IPC: G01N21/359
Filed: 1999-11-22
Granted: 2000-08-21
Abstract: To provide a spectral analysis method capable of analyzing with high accuracy and with high sensitivity a gas being measured that is composed of a main-component gas having an absorption spectrum in the same wavelength band and of a measurement object by means of a single cell. In this spectrometric method, a semiconductor laser beam L0 is divided: the first laser beam LS is applied to a sample cell 6 for selectively feeding a gas G being measured that is composed of a main-component gas + a measurement object and a cancel gas C composed of the main-component gas, and the absorption spectrum of each gas is separately sampled, while the second laser beam LR is applied to a reference cell 16 for feeding a reference gas R having at least two well-known absorption spectra in its wavelength band; the absorption spectra of the reference gas R are added to each absorption spectrum separately sampled above and, by means of a computer 9, the absorption spectrum of the cancel gas C is superimposed on that of the gas G being measured, and their absorption spectra are subtracted, and thus the absorption spectrum of the measurement object in the gas G being measured is provided on the basis of the well-known absorption spectra of the reference gas R added.
Patent TW-440757-B (TW)
Title: Flow controller
Inventor: MCLOUGHLIN ROBERT F
IPC: G05D16/20
Filed: 2000-01-26
Granted: 2001-06-16
Abstract: A control system for digitally monitoring and/or controlling pressure to a pneumatic load such as a stop/suckback valve. Pressure is sensed in the pneumatic fluid input lines to the pneumatic load, and a closed loop control is used to maintain the pressure at a predetermined level. In an alternative embodiment, the control system is used to ensure equal dispensing in multi-point dispense apparatus. Thus, pressure is sensed downstream of each valve in fluid communication with a respective nozzle. Any pressure differential detected is corrected by appropriate valve adjustment.
Patent TW-426578-B (TW)
Title: Adjustable and extended guide rings
Inventor: QUEK SEBASTIAN SER WEE
IPC: B24B5/00
Filed: 2000-01-21
Granted: 2001-03-21
Abstract: A carrier head is provided that improves the pressure uniformity of a semiconductor wafer against the polishing pad in chemical mechanical polishing (CMP). The carrier head includes a carrier, a carrier film, and a guide ring. The objective of CMP is to provide planarization of the surface of a semiconductor wafer by uniformly removing material. One embodiment of the invention uses independent adjusting screws threaded in the carrier to provide uniform wafer pressure and lengthen guide ring life. The adjusting screws are threaded internally to accept holding screws attached to the guide ring using a backing. This facilitates variation in the spacing between the carrier and guide ring at each adjusting screw. A locking nut on each adjusting screw is used to maintain each gap setting. This embodiment eliminates the need for shims and the associated trial-and-error set-up time in selecting shims. In addition, compensating for guide ring wear can be easily performed without disassembling the carrier head. A second embodiment uses air vents in the carrier, an L-shaped guide ring, and O-rings between the guide ring and carrier. These modifications prevent polishing slurry from being drawn into the point of contact between the carrier and guide ring. If permitted, dried slurry deposits between the guide ring and carrier would cause variations in applied pressure to the wafer during polishing which in turn would result in non-uniform removal of material during CMP.
Patent TW-479399-B (TW)
Title: Microelectromechanical rotary structures
Inventor: HILL EDWARD A
IPC: F03G7/06
Filed: 2000-02-25
Granted: 2002-03-11
Abstract: MEMS (microelectromechanical system) structures are provided that are designed to rotate in response to thermal actuation or the like. In one embodiment, the MEMS rotary structure includes a hub having one or more radial spoke members that impose a rotational force upon the hub in response to applied changes in temperature. The MEMS rotary structure can also include a ring at least partially encircling the hub and connected to the hub by means of one or more hub spoke members. Controllable clockwise, counterclockwise, or both clockwise and counterclockwise rotation of the hub or ring are provided. The MEMS rotary structures can also include thermal arched beam actuators that are operably connected to the spoke member. As the temperature changes, the thermal arched beam actuators move the spoke members in order to rotate the MEMS structure. Various applications are provided for these rotating MEMS structures, including but not limited to rotary actuators, rotary switches and relays, variable capacitors, variable resistors, shutters, and valves.
Patent TW-463180-B (TW)
Title: Electrically conductive paste
Inventor: TACHIKA HIROSHI
IPC: H05K1/09
Filed: 2000-03-08
Granted: 2001-11-11
Abstract: It is provided that the circuit material is used for membrane circuit with good property of antibending in low temperate and short drying time. The characteristics of electrically conductive paste is that its major gradients are conductive powder (A) of main gradient of silver, coupling agent of polyester resin (B) with number average molecular weight of 3000 above, and solvent (D) and wherein the resin (B) is the inner aromatic dicarbonate acid with total acid of 70 mol% above, there are 1 to 50 wt% of repeating units of polyalkylene glycol and/or polycaprolactone included in the said paste.
Patent TW-538266-B (TW)
Title: Active matrix array substrate and its manufacturing method
Inventor: HIROSE TAKASHI
IPC: G02F1/13
Filed: 2000-03-29
Granted: 2003-06-21
Abstract: An active matrix array substrate having active elements aligned in matrix, and more than one scanning line and data line for driving the active elements. Each scanning line is connected to a common scanning bus through a scanning line test resistance, and each data line is connected to a common data bus through a data line test resistance. Each data line is configured with a metal multilayer, and each scanning line test resistance and data line test resistance are configured with a lowest metal layer of this metal multilayer. With this configuration, electrostatic breakdown between a scanning line 4 and data line 5 or neighboring data lines 5 during the manufacturing process is preventable. Accordingly, an active matrix array substrate and its manufacturing method which delivers good yields are achieved.
Patent TW-441027-B (TW)
Title: Formation method of SRAM buried contact
Inventor: REN YI-MIN
IPC: H01L21/8244
Filed: 2000-04-21
Granted: 2001-06-16
Abstract: A formation method of SRAM buried contact comprises: providing a substrate sequentially formed there on a gate oxide layer, a first conductive layer, and a mask layer; forming a buried contact opening for exposing part of the substrate in the mask layer, the first conductive layer and the gate oxide layer; forming an epitaxial silicon layer in the buried contact opening, and filling up the buried contact opening; next, removing the mask layer, and forming a second conductive layer on the substrate; next, forming a buried contact in part of the substrate under the epitaxial silicon layer; next, patterning the second conductive layer, the first conductive layer, the epitaxial silicon layer, and the gate oxide layer until exposing the part of the substrate and part of the buried contact; and finally, using the second conductive layer, the first conductive layer and the epitaxial silicon layer as a mask to form a source/drain region combined with part of the buried contact in the substrate.
Patent TW-430556-B (TW)
Title: Combination unit for facial treatment machine
Inventor: KAMIYANAGI MASANAO
IPC: A61H33/06
Filed: 2000-05-31
Granted: 2001-04-21
Abstract: This invention relates a combination unit for facial treatment machine used in facial treatment salon. The object is to provide a combination unit for facial treatment machine capable of reducing the displacement and load of beauticians (those who providing services) and operating the machine easily while performing a facial treatment work. In order to achieve the object, a combination unit 10 for facial treatment machine comprises, a facial treatment bed 16 with a backrest portion 12 and a base portion 14, a pillow portion 18 installed at an upper end of the backrest portion 12, an operation panel 20 of a facial treatment machine 22 provided at the pillow portion 18, and fittings 24A to 24E of the facial treatment machine 22 suspended from supported by parts hanging rack 26 installed at a lateral side of the backrest portion 12and a body function portion 28 installed at the base portion 14.
Patent TW-484018-B (TW)
Title: Position determining method for moving body and apparatus using the method
Inventor: HATADA FUMIO
IPC: G01S5/16
Filed: 2000-06-09
Granted: 2002-04-21
Abstract: The present invention provides a position determining method and an apparatus of using such method for practical objective. With such method, it is possible to obtain a solution (the position and moving direction of a moving body) that is not easily affected by the test error due to the incident angle without being affected by the setup mode of the reflecting device and the distance to the reflecting device. For a combination of three reflecting devices selected from a group of more than three reflecting devices, the position and moving direction of a moving body are determined by means of trigonometric measurement. Among a plurality of solutions, the x-component xt and the y-component yt for the position of a moving body are selected from a combination that has a minimum in one of the variation rate ∂XP/∂Α, ∂XP/∂β in the x (or X) component of direction, and the variation rate ∂YP/∂Α, ∂YP/∂β in the y (or Y) component of direction of the test error with respect to the two opening angles Α, β, between any of the three reflecting devices, while the average value of the moving directions selected from two combinations of all directional components is assigned as the moving direction φ of the moving body.
Patent TW-518431-B (TW)
Title: Scatter compensating system
Inventor: TSUKITANI MASAO
IPC: H04B10/291
Filed: 2000-07-19
Granted: 2003-01-21
Abstract: A scatter compensating system is disclosed in which the optical signals in wavelength band 1520nm-1620nm transmitted in the first common transmission path, are wave separated into the C band (1520 nm to 1565 nm) and the L band (1565 nm to 1620 nm) by the wave separator. The wave separator outputs the optical signal of the C band to the first branch transmission path, and outputs the optical signal of the L band to the second branch transmission path. The first scatter compensating device is provided on the first common transmission path, for compensation the scatter of the C band and the L band. The second scatter compensating device is provided on the second branch transmission path, for compensating the scatter of the L band which can not be compensated sufficiently with the first scatter compensating device. Accordingly, the scatter of the optical transmission path can be reduced.
Patent TW-473783-B (TW)
Title: Laser apparatus, laser annealing method, and manufacturing method of a semiconductor device
Inventor: YAMAZAKI SHUNPEI
IPC: H01L21/20
Filed: 2000-07-25
Granted: 2002-01-21
Abstract: To provide a laser apparatus and a laser annealing method with which a crystalline semiconductor film with a larger crystal grain size is obtained and which are low in their running cost. A solid state laser easy to maintenance and high in durability is used as a laser, and laser light emitted therefrom is linearized to increase the throughput and to reduce the production cost as a whole. Further, both the front side and the back side of an amorphous semiconductor film is irradiated with such laser light to obtain the crystalline semiconductor film with a larger crystal grain size.
Patent TW-518757-B (TW)
Title: Manufacturing method for thin film transistor having lightly doped drain
Inventor: KUNG JI-HO
IPC: H01L21/77
Filed: 2000-07-25
Granted: 2003-01-21
Abstract: A manufacturing method for thin film transistor having lightly doped drain is disclosed, which includes the following steps: forming a gate insulating layer and a gate electrode on a polysilicon layer; forming a photoresist layer covering the gate electrode and a portion of the polysilicon layer; implanting the first conductive dopant into the polysilicon layer to obtain a first ion implantation region and a second ion implantation region, in which the dopant density of the second ion implantation region is higher than the dopant density of the first ion implantation region.
Patent TW-499542-B (TW)
Title: Internal combustion engine and method of operating same
Inventor: YANG KOON-CHUL
IPC: F02M67/06
Filed: 2000-09-11
Granted: 2002-08-21
Abstract: An internal combustion engine includes a compressor (23) to supply pressurised gas I to effect injection of fuel for combustion in the engine. An intake system (17, 18, 19) includes a throttling assembly (19) to control the flow of air through the intake system. A gas inlet port to the compressor (23) is connected (31) to the air intake system (17, 18, 19) downstream of the throttling assembly (19). This lowers the pressure at the inlet port of the compressor (23) to below ambient air pressure. A method of operating an internal combustion engine of this type includes the step of lowering the pressure at the inlet port to the compressor (23) to below ambient air pressure.
Patent TW-483856-B (TW)
Title: Kitchen waste collecting vehicle
Inventor: LING YUAN-HUNG
IPC: B65F3/14
Filed: 2000-09-28
Granted: 2002-04-21
Abstract: This invention is related to a kitchen waste collecting vehicle, comprising a container tank, a crusher, a feeing conveyance device, column counter conveyance mechanism, a positioning conveyance device, a lifting device, claming, moving, flipping mechanism, sucking, pouring and moving mechanism, bridging mechanism, sucking and moving mechanism, a cleaning device, a waste removing device, blower mechanism, a reverse direction control device, a collected-material conveyance device, and direction changing mechanism, characterized in that: in cooperation with the devices and mechanism, the container tank containing the kitchen waste may be collected in the kitchen waste collecting vehicle is a smooth, fast, precise, cleaning and automatic manner under sanitary operating conditions, such that the kitchen waste may be free from causing pollution and recycled effectively. Further, the container tank may be gathered and reused in a smooth, fast, and self-cleaning manner after a complete operation cycle so as to provide an economic and effective measure for recycling resources.
Patent TW-593423-B (TW)
Title: Solid particles
Inventor: LANZE ROLF
IPC: C08G64/30
Filed: 2000-11-01
Granted: 2004-06-21
Abstract: The present invention relates to solid particles which contain dihydroxy compounds and carbonic acid esters and to a process for the production thereof and to an apparatus for the production thereof and to the use thereof for the production of polycarbonate using the transesterification process and to a process for the production of polycarbonate using the transesterification process.