baber/WOPTO huggingface dataset:
Patent IT-1262798-B (IT)
Title: Method for pressing the stuffing zone of industrially produced pizza and machine for implementing such procedure
Inventor: BUTTURINI GIANPAOLO
IPC: A21C/
Filed: 1993-07-30
Granted: 1996-07-04
Abstract: The method according to the invention calls for subjecting the central portion of the pizza to a relatively high pressure, advantageously over 4 bar, for a predetermined period of time, advantageously around 2 seconds. According to an essential characteristic of the invention, this pressure operation occurs after the leavening and, in particular, immediately prior to the operation of spreading the tomato sauce on the central portion of the pizza. <IMAGE>
Patent MX-168053-B (MX)
Title: Composicion aglutinante de formaldehido para preparar productos laminares lignocelulosicos con adhesivos basados en formaldehido y procedimiento para obtener dicha composicion
Inventor: MARKESSINI EFTHALIA VERGOPOULO
IPC: B32B21/14
Filed: 1984-02-07
Abstract: La presente invención se refiere a una composición aglutinante de formaldehido para preparar productos laminares lignocelulósicos con adhesivos basados en formaldehido, caracterizada porque comprende una solución de (a) al menos un compuesto hidroxilado orgánico con la excepción de alcoholes alifáticos monovalentes C1-4 y (b) al menos una amida, en agua, y porque contiene de 20 a 80 por ciento en peso de los ingredientes activos.
Patent PT-103437-B (PT)
Title: Dispositivo mecânico de conversão de energia
Inventor: ANTUNES JOAO MIGUEL VIEIRA CAE
IPC: F16H1/32
Filed: 2006-02-17
Abstract: A PRESENTE INVENÇÃO DESCREVE UM DISPOSITIVO MECÂNICO DE CONVERSÃO DE ENERGIA, QUE CONVERTE FORÇAS PROVOCADAS POR UMA FONTE DE OSCILAÇÃO (11) SOBRE UM SEGUNDO CORPO ANULAR (3) FAZENDO-O OSCILAR, NUM BINÁRIO DE ROTAÇÃO DO MESMO CORPO SOBRE O SEU PRÓPRIO EIXO (Z2). ESTE BINÁRIO É PROVOCADO PELA COMPONENTE TANGENCIAL DA REACÇÃO DAS FORÇAS (R1T, R3T) EXERCIDAS PELO PRIMEIRO CORPO ANULAR (1) E PELO TERCEIRO CORPO ANULAR (6) OPCIONAL SOBRE O SEGUNDO CORPO ANULAR (3) OSCILANTE DEVIDO AO NÃO ESCORREGAMENTO ENTRE AS REGIÕES PERIFÉRICAS (2, 4, 5, 7) DOS CORPOS ANULARES (1, 3, 6). A ROTAÇÃO DO SEGUNDO CORPO ANULAR (3) É ENTÃO TRANSFERIDA PARA UM VEIO (9) ATRAVÉS DE UM ACOPLAMENTO DE DESALINHAMENTO ANGULAR (10).
Patent PT-116340-B (PT)
Title: Processo e sistema para extração de 2,4,6-tricloroanisole (tca) de material de cortiça
Inventor: GEERT FEYE WOERLEE
IPC: B27K7/00
Filed: 2020-05-07
Abstract: A PRESENTE INVENÇÃO REFERE-SE A UM PROCESSO E SISTEMA PARA DESCONTAMINAÇÃO DE MATERIAL DE CORTIÇA. O PROCESSO COMPREENDE CIRCULAR CICLICAMENTE UM FLUIDO DE EXTRAÇÃO ATRAVÉS DE UM LEITO DE MATERIAL DE CORTIÇA, SEGUIDO POR CIRCULAR O FLUIDO ATRAVÉS DE UM MEIO ADSORVENTE PARA REGENERAR O FLUIDO DE EXTRAÇÃO E RETORNAR O FLUIDO ASSIM REGENERADO PARA O LEITO DE CORTIÇA, REPETIR A MESMA CIRCULAÇÃO DE FLUIDO DURANTE UMA QUANTIDADE PREDETERMINADA DE TEMPO, EM QUE O PASSO DE REGENERAÇÃO DO FLUIDO DE EXTRAÇÃO É REALIZADO EM CONDIÇÕES SUPERCRÍTICAS OU QUASE-CRÍTICAS DE PRESSÃO E TEMPERATURA PARA O FLUIDO DE EXTRAÇÃO. A INVENÇÃO TAMBÉM SE REFERE A UM SISTEMA PARA REALIZAR O PROCESSO DE DESCONTAMINAÇÃO DE CORTIÇA, O SISTEMA COMPREENDENDO UM MEIO DE BOMBAGEM (2) PARA CIRCULAR O FLUIDO DE EXTRAÇÃO, E UM MEIO DE SUPORTE DE MATERIAL DE CORTIÇA (4), AMBOS DISPOSTOS DENTRO DE UMA CÂMARA DE EXTRAÇÃO (1). NUMA FORMA DE REALIZAÇÃO PREFERIDA, UM SUPORTE DE MEIO ADSORVENTE (3) ESTÁ TAMBÉM DISPOSTO EM SÉRIE DENTRO DA CÂMARA DE EXTRAÇÃO (1). A INVENÇÃO APLICA-SE NA INDÚSTRIA DA CORTIÇA.
Patent RO-82539-B (RO)
Title: Process for preparing some catalytic composition used for alpha-olefin polymerization
Inventor: EPSTEIN RONALD ALAN
IPC: C08F4/00
Filed: 1981-06-26
Abstract: A titanium halide containing component suitable for use in a catalyst system comprising said component and an aluminum containing component is obtained by co-pulverizing a halogen containing magnesium compound, e.g. MgCl2, with an electron-donor compound, e.g. ethyl benzoate, to produce a co-pulverized product. The co-pulverized product is then reacted with an organic phosphite, e.g. triphenyl phosphite, to produce a reaction product. The reaction product is then reacted with a titanium halide compound, e.g. TiCl4. A catalyst system for the polymerization of alpha-olefins includes such titanium halide containing component and an organoaluminum component.
Patent SE-377865-B (SE)
Inventor: LINDMAYER J
IPC: H01L31/0224
Filed: 1972-09-28
Abstract: 1395200 Solar cells COMMUNICATIONS SATELLITE CORP 27 Sept 1972 [28 Sept 1971] 44564/72 Heading H1K A solar cell comprises a 500-2000Š thick layer of one conductivity type forming a PN junction with an underlying semi-conductor substrate. An electrode formed by photolithographic steps comprises a large number of metal strips each between 1 and 20 Á wide and occupies at most 10% of the layer area A typical cell is made by diffusing phosphorus, arsenic or antimony into one face of a P type silicon wafer to a depth of 1500Š by specified methods to give a surface impurity concentration of 10<SP>19</SP>-10<SP>20</SP> atoms/cc. The damaged top 500Š of the diffused layer is then oxidized by heating in steam and the oxide preferably removed. An electrode consisting of fine strips perpendicular to a connecting busbar or strips parallel to the busbar and connected to it by tapered intermediate bus-bars is then provided. In one example the electrode pattern is first defined by exposing a photoresist coating to light or an electron beam and developing. A 300Š layer of chromium and a superposed 2000Š layer of silver are then deposited overall and the undeveloped photoresist dissolved to remove the overlying metal. The remaining electrode metal is then thickened tp 20. Á. by plating with silver. Alternatively the chromium is overcoated with a 20 Á layer of gold which is then silver plated, or chromium deposited over the entire N type layer and form etched with the aid of a photoresist mask. Gallium arsenide is an alternative semiconductor material.
Patent TW-256834-B (TW)
Inventor: CAMILLE GEORGE WERMUTH
IPC: A61P25/18
Filed: 1993-08-31
Granted: 1995-09-11
Abstract: The subject of the invention is the derivatives of formula I: <IMAGE>  in which,   R1 represents a phenyl or naphthyl radical (optionally substituted),   R2 represents a hydrogen or halogen atom or an alkyl, hydroxymethyl or formyl radical, R3 represents an alkyl, cycloalkyl, alkenyl, cycloalkyalkyl or phenyl radical, R4 represents a hydrogen atom or an alkyl, cycloalkyl or cycloalkylalkyl radical, R5 represents an alkyl, cycloalkyl, cycloalkylalkyl or alkenyl radical or a radical of formula B: <IMAGE>  (p = 0, 1, 2 or 3), - R6 represents an optionally substituted phenyl, pyridyl, imidazolyl, pyrrolyl, thienyl or furyl radical or a cycloalkyl radical, - m and n, which are identical or different, each represent 0 or 1,   their possible stereoisomers and their addition salts. MEDICAMENTS.
Patent TW-226486-B (TW)
Title: A production method for mask ROM with shallow buried bit lines
Inventor: HORNG YEUN-DING
IPC: H01L27/112
Filed: 1994-01-31
Granted: 1994-07-11
Abstract: A production method for mask ROM with shallow buried bit lines whichcomprises the following steps: provides a silicon base which is doped with a first conductive materialand is segregated into active areas by the oxidation of silicon; forms a layer of composite silicon and a layer of silicon nitride; covers a layer of photo resistor on the area which is to be formed intothe buried bit lines source pole/destination pole and etches away theexposed silicon nitride and composite silicon and removes the photo resistor; undergoes oxidation to form an insulating oxide layer on the surface ofthe exposed silicon base and the composite silicon; removes the remaining silicon nitride; uses the dopant of a second conductive material to undergo doping ofthe composite silicon so as to form the shallow contact area andconstitute source pole/destination pole on the surface of the siliconbase under the composite silicon; removes the insulating oxide layer and grows the gate oxide; and sediments and forms the gate oxide to complete the mask ROM before encoding.
Patent TW-332281-B (TW)
Title: Active matrix display device
Inventor: YAMAZAKI SHUNPEI
IPC: G09G3/32
Filed: 1995-02-08
Granted: 1998-05-21
Abstract: An active matrix display device comprises the characteristics: (1) Image signal lines and gate signal lines having pixel electrodes on physically orthogonal matrix; (2) At least cascading three thin film transistors with respect to the said one pixel electrode, and there is a thin film transistor always keeping in ON state circuit as switch elements except installed to connect to image signal of the said cascaded thin film transistors; and (3) Activated layer of said thin film transistor is made of crystallized silicon, containing catalyst element one quadrillion~ten quintillion for promoting silicon crystallization.
Patent TW-312618-B (TW)
IPC: A61B5/0295
Filed: 1995-04-28
Granted: 1997-08-11
Abstract: A non-invasive technique and system is provided for measuring flow of liquid driven by a flexible diaphragm of a membrane pump (18). Flow, pressure and/or temperature of a gas, such as air, used to drive the pump (18) is continuously monitored. Instantaneous volume of liquid being pulled into or out of a chamber of the pump (18) can be calculated from measured values of the gas used to drive the pump (18). Sensors (10, 12 and/or 14) are used to measure values relating to the gas. The sensed parameters are concurrently monitored and continuously determine the amount of gas flowing to and from the diaphragm of the membrane pump (18) utilized to move liquid within a liquid pathway. The measurements may then be used to calculate the instantaneous flow rate of the liquid.
Patent TW-272166-B (TW)
Title: Manufacturing method for acrylic-plastic sheets embelished with genuine dried flowers
Inventor: LAY WENN-IAN
IPC: B44F9/00
Filed: 1995-08-18
Granted: 1996-03-11
Abstract: A manufacturing method for acrylic-plastic sheets embelished with genuine dried flowers mainly by placing the dried flowers between two layers of paper pulp; and a paper product combining the dried flowers formed after the paper pulp congealed; then putting the paper product into a mold and filling the mold with liquid acrylic plastic; finally a acrylic-plastic sheet embelished with genuine dried flowers obtained after the liquid acrylic plastic congealed.
Patent TW-336262-B (TW)
Title: Defocused laser drilling process for making nonwoven fabric forming device and apparatus for producing nonwoven fabric
Inventor: WILLIAM A JAMES
IPC: B32B3/24
Filed: 1995-10-16
Granted: 1998-07-11
Abstract: Defocused laser drilling process for making nonwoven fabric forming device, including the following steps: (a) provision of a workpiece; (b) focusing a laser beam, by keeping the focus under the top of the workpiece; and (c) drilling of the laser beam in a perforation diameter in predetermined figure for passing the workpiece, for forming each of the perforations on the top of the bearing produced by the array peak and the valley.
Patent TW-366513-B (TW)
Title: Winding mach for deviation coils and the press conductive component
Inventor: SARUTA KEN
IPC: H01J9/236
Filed: 1996-01-30
Granted: 1999-08-11
Abstract: The present invention aims to provide a reliable and easy-operational deviation coil winding machine for forming and the press conductive component. Including: pressing means 13 of the conductor component 12 against the wire 8; application on the conductor component press of wire material 8 of the first polarity 14, 15 at rated voltage. Movement of the conductor component 12 pressed on the wire 8 and stuck on the checking means 27, before applying voltage between the conductor component 12 on the wire 8.
Patent TW-393673-B (TW)
Title: Plasmsa etch with trifluoroacetic acid and derivatives
Inventor: ROBERTS DAVID ALLEN
IPC: H01L21/00
Filed: 1996-06-17
Granted: 2000-06-11
Abstract: The present invention is directed to the etching of material selected from the group consisting of silicon dioxide, silicon nitride, boronphosphorus silicate glass, fluorosilicate glass, siliconoxynitride, tungsten, tungsten suicide and mixtures thereof under plasma etch conditions, particularly for cleaning operations to remove silicon dioxide or silicon nitride from the walls and other surfaces within a reaction chamber of a plasma-enhanced chemical vapor deposition reactor. The etching chemicals used in the etch process are trifluoroacetic acid and it derivatives, such as; trifluoroacetic anhydride, trifluoromethyl ester of trifluoroacetic acid and trifluoroacetic acid amide and mixtures hereof.
Patent TW-312822-B (TW)
Title: CMOS operation amplifier with bipolar junction transistor as input stage
Inventor: WANG SHYH-CHYI
IPC: H01L21/328
Filed: 1996-06-26
Granted: 1997-08-11
Abstract: A manufacturing method of bipolar junction transistor with accumulated base on semiconductor substrate comprises of: (1) square first dopant base region and via implantation diffusing into semiconductor substrate; (2) square second dopant base contact region and via implantation and curing into base region, forming low-resistance path from the base region to external circuit region; (3) square third dopant collector region and via implantation and curing to base region in base contact, and distant to the base contact region with first distance; (4) square third dopant emitter region and via implantation and curing to base region in collector region, and distant to the collect region with second distance; (5) polysilicon base accumulator device deposited in base region between collector region and emitter region.
Patent TW-324760-B (TW)
Title: A plunger
Inventor: LII WENN-JANG
IPC: E03C1/30
Filed: 1996-09-03
Granted: 1998-01-11
Abstract: A kind of plunger includes - colloidal sealer with connection jog and chase in the upper and lower end, the jog penetrates the chase and vents it with different radius at the both ends. - adapter, its outer radius is fitted into the chase and there is a hole connecting with the connection chase and be fixed with a spring around the border of the hole - forcing rod, with bombous chase in the front and shaft in the end; - Through the assembly of the parts above, there is an adapter for connection with pressure bottle. The operation sequence is to enclose the inlet of drain with either side of the sealer or different combination of adapters with forcing rod and pressure bottle. Force the pressure bottle directly or by pushing the rod and remove the clag by the high pressure.
Patent TW-467727-B (TW)
Title: Novel dairy analogue, method for producing the same and its use
Inventor: WANG SHIAN-MING
IPC: A23C9/12
Filed: 1996-09-13
Granted: 2001-12-11
Abstract: The present invention relates to a novel dairy analogue, which comprises: composite enzymes, milk base, biologically active bacteria, vitamins, carbohydrates, sufficient amount of food additives, and optionally reaction solvent. The present invention further relates to a method for producing such novel dairy analogue, and a composition containing the same.
Patent TW-310437-B (TW)
Title: Cable assembly with equalizer board
Inventor: MICHAEL W FOGG
IPC: H01B11/20
Filed: 1996-10-30
Granted: 1997-07-11
Abstract: An electrical cable assembly (1) comprises a housing (2), electrical contacts (3) in the housing (2) connected to a circuit board (4), multiple conductors (5) of an electrical cable (6) connected to the circuit board (4), signal conditioning circuitry (7) on the circuit board (4), the circuitry (7) being interposed between the electrical contacts (3) and the conductors (5), and an insulating holder (8) mounted on the circuit board (4), the contacts (3) extending on the holder (8), and the holder (8) being mounted in a cavity in the housing (2).
Patent TW-326493-B (TW)
Title: The radiant thermometer
Inventor: KARAGAWA SHUNJI
IPC: G01K15/00
Filed: 1996-11-09
Granted: 1998-02-11
Abstract: A radiant thermometer, which is composed by an infrared sensor for receiving radiant heat from to-be-measured object and for outputting infrared inspecting signal, a photo-guiding device used for guiding radiant heat to infrared sensor, a temperature sensor used for measuring basic temperature and for outputting basic temperature signal, a temperature differential inspecting device used for measuring the temperature difference between the infrared sensor and the photo-guiding device and for outputting that temperature differential signal, and a temperature-calculating devices for inputting infrared inspecting signal, basic temperature signal and temperature-differential signal to correct error according to temperature differential and for calculating the temperature data signal. Its features are in that by installing a correction coefficient adjusting device inside the temperature calculating device to adjust temperature differential signal or to correct coefficient of infrared ray inspecting signal.
Patent TW-321786-B (TW)
Title: Production method for memory component with grating capacitor
Inventor: TZENG HORNG-HUEI
IPC: H01L21/70
Filed: 1996-12-05
Granted: 1997-12-01
Abstract: A production method of polysilicon structure in integrated circuit includes: first dielectric layer on wafer; flattening of the aforementioned dielectric layer; formation of hole by means of etching the first dielectric layer to expose the aforementioned wafer with microphotographic technique and etching technique; formation of a layer of polysilicon; formation of a layer of second dielectric layer; formation of dotted polysilicon Hemi-Spherical Grain; formation of poly-oxide by oxidizing the Hemi-Spherical Grain; formation of grating polysilicon by etching the second dielectric layer and polysilicon with etching technique by means of taking poly-oxide as etching mask; removal of the poly-oxide; and removal of the second dielectric layer.
Patent TW-342513-B (TW)
Title: Method of making a thermoelectric fuse and the fuse resulting therefrom
Inventor: RONALD J DEDERT
IPC: H01H85/02
Filed: 1997-01-10
Granted: 1998-10-11
Abstract: A method of manufacturing an electrothermal fuse device, which comprises the steps of: screening a conductive polymer onto electric terminations; placing a metal fuse link between the electric terminations and forming an electric connection therewith; thermally curing the conductive polymer; applying deoxidant; applying encapsulant; and thermally curing the encapsulant.
Patent TW-325595-B (TW)
Title: Flash memory with floating bit line and manufacturing method thereof
Inventor: SHYU CHING-SHYANG
IPC: H01L27/10
Filed: 1997-03-12
Granted: 1998-01-21
Abstract: A manufacturing method of flash memory with floating bit line, which is applicable for forming matrix multiple flash memory cells on one first-type semiconductor substrate along one first orientation and one second orientation at predetermined angle with respect to said first orientation, comprises the following steps: (1) On said first-type semiconductor substrate in sequence forming one second-type layer and one first-type layer; (2) Along said first orientation individually forming multiple isolating trenches deep to said second-type layer, and isolating said first-type layer into multiple body lines; (3) On said isolating trench forming insulator; (4) On said body line in sequence forming first dielectric and first conductive layer; (5) On said first conductive layer in sequence forming one second dielectric and one second conductive layer; (6) Along said second orientation etching to said body line so as to form stacked gate of said multiple flash memory cells, and control gate of said stacked gate extends along said second orientation to become word line; (7) With said stacked gate as mask, doping second-type dopant to said body line to form second-type doped region, therefore forms drain and source region of said flash memory cell; (8) Lateral side of said stacked gate forming insulating spacer; (9) On said second-type doped regions between said insulating spacers independently forming bit lines.
Patent TW-389930-B (TW)
Title: Developing solution feed system for semiconductor photolithography process
Inventor: PARK SUNG-HYEON
IPC: H01L21/027
Filed: 1997-04-08
Granted: 2000-05-11
Abstract: Disclosed is a developing solution feed system for a semiconductor photolithography process in which the developing solution is fed with its contained gas removed. The inventive developing solution feed system comprises a plurality of feed tanks and a developing solution feed line having a plurality of first connecting pipes, each connected to the feed tanks, a second connecting pipe connected to the first connecting pipe to be converged into one passage, and a plurality of third connecting pipes diverged from the second connecting pipe. The system also comprises nozzles connected to the third  connecting pipe of the developing solution feed line to thereby sputter the developing solution on wafers each located in process chambers, a gas removal device installed in the second connecting pipe of the developing solution feed line to thereby remove gas contained in the developing solution, and shut off valves, each installed in the third connecting pipes to thereby open and close passages, so that the developing solution can selectively be fed into only one process chamber through the third connecting pipes.
Patent TW-350092-B (TW)
Title: Method for controlling grain growth during processing
Inventor: PARANJPE AJIT P
IPC: C23C16/52
Filed: 1997-04-18
Granted: 1999-01-11
Abstract: A method for controlling grain growth, being the method formed on a substrate of the first thickness, having the following steps: forming of the first layer of the settlement material to the second thickness, which is thinner than the first thickness, which has a crystal chip structure; forming on the first layer a thin intermediate film, of which the crystal chip structure is different from the crystal chip structure of the first layer; forming the second layer of the settlement material of the thin intermediate layer to the third thickness, which is thinner than the first thickness; and the first thickness equal the total of the second and the third thickness.
Patent TW-384256-B (TW)
Title: Method of endowing plate sheet with permanently folding direction and apparatus therefor
Inventor: YAMAMOTO MASAHIRO
IPC: B31F1/08
Filed: 1997-05-16
Granted: 2000-03-11
Abstract: A method of imparting directional permanency of folding to a sheet, and an apparatus therefor, which is suitable for manufacturing frame bodies, cushioning members and other block products for packaging, from a sheet of paper and other recyclable materials. The method comprises a third step of shifting respective folding working tools, disposed on one or both surfaces of a sheet, required amounts so as to permit the sheet to be folded along respective folding ruled lines, and a fourth step of shortening spacings between the respective folding working tools at a uniform ratio in accordance with an apparent amount of shortening in a longitudinal direction caused by the shifting while synchronizing with the third step. Directional permanency of folding can be accurately and industrially imparted to the sheet along the folding ruled lines.
Patent TW-477916-B (TW)
Title: Photoresist layer supporting film and photoresist film laminate
Inventor: KUDO TAKAFUMI
IPC: H05K3/46
Filed: 1997-05-19
Granted: 2002-03-01
Abstract: A photoresist layer supporting film is (A) formed from a polymer composition comprising (i) 55 to 100% by weight of a copolyester containing ethylene terephthalate units as a main recurring unit and having a melting point of 210 to 250 DEG C and (ii) 0 to 45% by weight of polybutylene terephthalate or a copolyester containing butylene terephthalate units as a main recurring unit and having a melting point of not lower than 180 DEG C and (B) has a plane orientation coefficient of 0.08 to 0.16. Since this supporting film is excellent in substrate shape follow-up properties and resolution, it is suitable for the preparation of a photoresist film laminate by laminating a protective film and a photoresist layer on the surface thereof.