baber/WOPTO huggingface dataset:
Patent JP-2004227770-A (JP)
Title: Disk recording medium and recording/reproducing device
Inventor: SHIMIZU KIKUO
IPC: G11B7/007
Filed: 2004-03-22
Abstract: <P>PROBLEM TO BE SOLVED: To provide a highly reliable and large capacity information recording/reproducing system capable of stable reproduction while guaranteeing stable signal qualities for all inner and outer recording positions.  <P>SOLUTION: The recording area of a disk recording medium 1 is divided into a plurality of zones 2a to 2f sequentially adjacent in a radial direction, recording/reproducing clocks are allocated to the zones 2a to 2f, and data are recorded/reproduced by the clocks allocated to the zones 2a to 2f.  <P>COPYRIGHT: (C)2004,JPO&NCIPI
Patent JP-2005266649-A (JP)
Title: Image recording material and image forming method
Inventor: TOSAKA YASUO
IPC: G03C7/20
Filed: 2004-03-22
Abstract: <P>PROBLEM TO BE SOLVED: To provide an image which ensures small variation of dot gain even if density is changed and in which variation of a black dot color tone is improved and image unevenness is improved, when image formation is performed with a dot area image forming apparatus which forms variable density pixels and reproduces dots by aggregates of the pixels.  <P>SOLUTION: In an image recording material used for recording an image comprising Y, M, C and K dot images with a dot area image forming apparatus which reproduces a dot image by aggregates of pixels, when part of the dot images has a dot area ratio of 30%, the number of dots per 6.45 cm<SP>2</SP>is ≥100×10<SP>3</SP>, the image recording material forms the dot images by receiving images each consisting of a dye and/or a pigment, and the image recording material has at least one white pigment layer having a white pigment content of ≥50 mass%.  <P>COPYRIGHT: (C)2005,JPO&NCIPI
Patent JP-2005264661-A (JP)
Title: Antiseismic joint structure of segment
Inventor: NAKAYAMA HIROAKI
IPC: E21D11/04
Filed: 2004-03-22
Abstract: <P>PROBLEM TO BE SOLVED: To provide an antiseismic joint structure of segments capable of imparting earthquake resistance without changing the tunnel axial length of a male side engaging member.  <P>SOLUTION: The male side engaging member 6 comprises a locking member 3 having a locking protrusion 4 at the tip, and a case member 36 with a guide part fixed to the side face of one segment 2 while biasing the locking member 3 by a spring in the tunnel axial direction to support the locking member 3 in a forward movable manner. A female side engaging member 5 comprises a slide stopper holding frame 20 fixed to the side face of the other segment 1, and a slide stopper 12 supported movably in the radial direction of the tunnel by the holding frame 20, biased by a spring in a direction to close an entry part of the locking member 3 and capable of locking the locking protrusion 4.  <P>COPYRIGHT: (C)2005,JPO&NCIPI
Patent JP-2004326087-A (JP)
Title: Embodying equipment and its method for all-optical nor gate using gain saturation of semiconductor optical amplifier
Inventor: BYUN YOUNG TAE
IPC: G02F1/015
Filed: 2004-03-22
Abstract: <P>PROBLEM TO BE SOLVED: To provide embodying equipment and its method for embodying, specially, a 10 Gbits/s all-optical NOR logic element in a logic element by using a light signal transmitted from an arbitrary point in an optical circuit like optical computing for a pump signal and an irradiation signal.  <P>SOLUTION: An A+B signal which is the total of input signals of an input signal pattern (A) of 1100 and an input pattern (B) of 0110 is used for the pump signal (1110), and a clock signal is generated with the input signal pattern (A) of 1100 and used for the irradiation signal (1111), which is made incident on a semiconductor optical amplifier (SOA) together with the pump signal at the same time to obtain Boolean logical expressions (A+B). Consequently, a NOR logic element is embodied by an XGM (Cross Gain Modulation) method using a gain saturation characteristic of the semiconductor optical amplifier, so the structure is simplified and all-optical logic elements for other functions are constituted by the same method. Consequently, the all-optical logic element performs an important duty for all-optical circuit and all-optical system embodiments.  <P>COPYRIGHT: (C)2005,JPO&NCIPI
Patent JP-2005276501-A (JP)
Title: Ion source, processing unit, and processing method using it
Inventor: TOKITA TOSHINOBU
IPC: G01N1/28
Filed: 2004-03-23
Abstract: <P>PROBLEM TO BE SOLVED: To provide an ion source with high and stable output power ions.  <P>SOLUTION: This ion source comprises a supply part supplying fine particles and/or a liquid containing the fine particles , a capillary flowing the supplied fine particles and/or the liquid, a drive part discharging the fine particles and/or the liquid from the capillary, and a charging means charging the discharged fine particles and/or the liquid.  <P>COPYRIGHT: (C)2006,JPO&NCIPI
Patent JP-2005276306-A (JP)
Title: Polarizing beam splitter, its manufacturing method, and optical pickup device
Inventor: KAMIBAYASHI HIROYUKI
IPC: G02B5/28
Filed: 2004-03-24
Abstract: <P>PROBLEM TO BE SOLVED: To provide a polarizing beam splitter having a film structure capable of reducing a ripple in a transmission bandpass of a P polarization.  <P>SOLUTION: This polarizing beam splitter has a multi-layer film (polarizing beam splitter film 4) formed by being alternatively laminated with high refractive films 2 and low refractive films 3 on an optical substrate 1, and it reflects a light of a 1st light source 6 incident to a surface having the multi-layer film from an air face and transmits a light of a 2nd light source 7 incident to an optical substrate surface opposite to the above surface having the multi-layer film. Further, the number of laminated layers N of the polarizing beam splitter film 4 is in the range of 16≤N≤40, and a distribution of a ratio of optical film thickness D/M (M: average thickness of optical films of all laminated layer films, D: thickness of optical film of each layer) is in the range of 0.5≤D/M≤2.5, and an average surface roughness is settled to ≤0.50nm, which is obtained by measuring such measuring points that a distance between the measuring points is ≤100nm with respect to a surface of the side arranging the polarizing beam splitter film 4 of the optical substrate 1 thereon.  <P>COPYRIGHT: (C)2006,JPO&NCIPI
Patent JP-2005277162-A (JP)
Title: Method for manufacturing electronic component
Inventor: IKEGAMI HIROSHIGE
IPC: H01G4/30
Filed: 2004-03-25
Abstract: <P>PROBLEM TO BE SOLVED: To provide a method for manufacturing an electronic component free from delamination and high in dimensional accuracy.  <P>SOLUTION: The method comprises a step of forming a first ceramic green sheet layer 2 on a supporting body 1, a step of forming a second ceramic green sheet layer 3 on the first ceramic green sheet layer 2 for the formation of a ceramic green sheet 4, a step of forming a conductor layer 5 on the ceramic green sheet 4, a step of laminating several ceramic green sheets 4 and of heating the laminate for the fabrication of a ceramic green sheet laminate 6, and a step of baking the ceramic green sheet laminate 6. The point of a penetrator pressing the first ceramic green sheet layer 2 is displaced by 10-100 μm in the range of 35-100°C in a penetration test using a needle probe having a 1 mm-diameter needle under a load of ≤0.77 N.  <P>COPYRIGHT: (C)2006,JPO&NCIPI
Patent JP-2005272721-A (JP)
Title: Hot-melt composition and water-proof connector using the same
Inventor: IDE TAKEHISA
IPC: C08L9/06
Filed: 2004-03-25
Abstract: <P>PROBLEM TO BE SOLVED: To obtain a hot-melt composition that can favorably adhere non-polar polymers such as a polyolefin material or polar polymers such as PBT or PA and can be used for a hot-melt adhesive, and provide a water-proof connecter using the same.  <P>SOLUTION: The water-proof connecter 1 comprises a plurality of electric wires 4 formed by covering core wire with a non-polar polymer, and a plurality of connection terminals 5 connected to a plurality of these electric wires 4, a connector housing 3 that is made of a polar polymer and has a terminal-receiving room 2 for receiving the terminals 5 inside, and a mold resin 6 that prevents moisture from invading into the terminal-receiving room 2 and encapsulates the connection parts between the electric wires 4 and the connection terminals 5 in the inside of the housing 3. The mold resin is mainly composed of a maleic acid-modified olefinic resin, a 9C hydrogenated petroleum resin, an amorphous polyolefin and styrene-ethylene-propylene-styrene rubber.  <P>COPYRIGHT: (C)2006,JPO&NCIPI
Patent JP-2005278350-A (JP)
Title: Device for controlling electric power steering device
Inventor: KOBAYASHI HIDEYUKI
IPC: B62D5/04
Filed: 2004-03-26
Abstract: <P>PROBLEM TO BE SOLVED: To provide a device for controlling an electric power steering device that simply reduces a torque level difference of a brushless motor that has Hall sensors and is driven by rectangular waves.  <P>SOLUTION: In the device for controlling the electric power steering device that is configured to give assist power by the brushless motor to a steering system of a vehicle, a torque level difference compensating means is provided that outputs a compensation value that reduces the torque level difference of the brushless motor based on the timing of an output signal of a rotation angle detecting means of the brushless motor.  <P>COPYRIGHT: (C)2006,JPO&NCIPI
Patent JP-2005270492-A (JP)
Title: Mask
Inventor: SATO AKIHIRO
IPC: A62B7/12
Filed: 2004-03-26
Abstract: <P>PROBLEM TO BE SOLVED: To provide a mask permitting easy replacement of an air-supply part such as a filter unit.  <P>SOLUTION: The mask 1 with a face piece 2 and the air-supply part such as the filter unit to be attached to/detached from the face piece 2 has a first cylindrical part 9 for inserting a second cylindrical part formed in the air-supply part in such a way that the second cylindrical part can be pulled out. The first cylindrical part 9 has a stopper means 32, which comprises a circular arc part 65 extending along the inner surface of the first cylindrical part 9 and overhanging to the inner side of the first cylindrical part 9, and an operation end part 64 slidable in the peripheral direction on the outer peripheral surface of the first cylindrical part 9. The circular arc part 65 is elastically deformed by the operation of the operation end part 64 in such a way that the inner diameter becomes larger, so that the second cylindrical part can be inserted into/pulling out of the first cylindrical part.  <P>COPYRIGHT: (C)2006,JPO&NCIPI
Patent JP-2005277268-A (JP)
Title: Substrate treatment apparatus and substrate treatment method
Inventor: MATSUKA TAKESHI
IPC: H01L21/304
Filed: 2004-03-26
Abstract: <P>PROBLEM TO BE SOLVED: To provide a substrate treatment apparatus capable of miniaturizing an apparatus configuration, attaining reduction in cost, improving throughput, performing developing treatment with high uniformity, and drying a substrate, while preventing the degradations of a pattern collapse or the like.  <P>SOLUTION: In a development processing unit D according to this substrate processing apparatus, the development processing, a cleaning processing, a drying processing and a bake processing to a substrate W are performed within one chamber 51. The development processing is carried out by supplying a developing substance which is atomized by a developing substance supply unit 53 by using a ultrasonic wave and by using N<SB>2</SB>gas as a carrier. The cleaning processing is carried out by warm pure water supplied by a warm pure water supply unit 57. The drying processing is carried out by dry overheated steam supplied by a steam supply unit 59. The bake processing is carried out by a hot plate 63. A supporting pin 67 for supporting the substrate W is driven vertically by a pin drive mechanism 69.  <P>COPYRIGHT: (C)2006,JPO&NCIPI
Patent JP-2005285929-A (JP)
Title: Method for manufacturing semiconductor device
Inventor: NISHIMURA ISAMU
IPC: H01L29/78
Filed: 2004-03-29
Abstract: <P>PROBLEM TO BE SOLVED: To prevent the reduction of an exposure margin or falling down of a resist pattern during lithography for the formation of a gate electrode, and to form the gate electrode appropriately.  <P>SOLUTION: A gate insulating film 2, a gate electrode film 3 containing silicon and a first insulating film 4a are formed in order on the main surface of a silicon substrate 1. Lithography and etching are applied to form a groove 9a including a position for forming a gate electrode, in the first insulating film 4a, as well as to expose a gate electrode film 3 on the bottom of the groove 9a. Then, the surface of the gate electrode film 3 exposing over the bottom of the groove 9a is subjected to silicide formation, and while the part is used as a mask, the gate electrode film 3 is selectively etched. Thus, by the lithography for forming the groove 9a in the first insulating film 4a, a photo resist film (not illustrated) can be made small in thickness. Therefore, an exposure margin can be increased and the resist pattern can be prevented from falling down.  <P>COPYRIGHT: (C)2006,JPO&NCIPI
Patent JP-2005280028-A (JP)
Title: Ink jet printer
Inventor: OKAZAKI SHINYA
IPC: B41J2/175
Filed: 2004-03-29
Abstract: <P>PROBLEM TO BE SOLVED: To realize such a structure as liquid, e.g. ink, flows easily to the downstream side when it is introduced for the first time even at a position of small channel diameter in the damper unit of an ink jet printer.  <P>SOLUTION: A damper unit 10 comprises ink reservoirs 30b-30d provided, at the upper part thereof, with damping chambers 31b-31d formed to store a predetermined amount of bubbles. Ink inlets 53b-53d from the ink supply tube 14 side are provided on the upstream side of the damping chambers 31b-31d in the ink reservoirs 30b-30d and ink outlets 41b-41d to the recording head 21 side are provided in the bottom on the downstream side of the damping chambers 31b-31d. In the bottom of the ink reservoirs 30b-30d, a groove 65 is formed to extend from the ink inlet 53b-53d side to the ink outlet 41b-41d side. Liquid such as ink flowing from the ink inlets 53b-53d flows quickly to the downstream side through the groove 65 regardless of surface tension.  <P>COPYRIGHT: (C)2006,JPO&NCIPI
Patent JP-2005285204-A (JP)
Title: Optical recording medium
Inventor: FUKUZAWA SHIGETOSHI
IPC: G11B7/24
Filed: 2004-03-29
Abstract: <P>PROBLEM TO BE SOLVED: To provide an optical recording medium capable of stably reproducing data recorded by a recording mark sequence including at least one of a recording mark and a blank region having the size equal to the resolution limit or finer a plurality of times.  <P>SOLUTION: The optical recording medium wherein the recording mark sequence including at least one of the recording mark and the blank region having the size equal to or finer than the resolution limit is formed to record data and recorded data are reproduced by irradiation with a laser beam includes a laminated body wherein a second dielectric layer 6 is sandwiched by a recording layer 7 and a light absorption layer 5. The light absorption layer 5 has crystallinity when film-deposition thereof is completed and maintains the crystallinity even when being irradiated with the laser beam.  <P>COPYRIGHT: (C)2006,JPO&NCIPI
Patent JP-2005045207-A (JP)
Title: Electrostatic chuck for wafer
Inventor: PARK JONG-ROK
IPC: H01L21/683
Filed: 2004-03-29
Abstract: <P>PROBLEM TO BE SOLVED: To provide an electrostatic chuck for a wafer by which heat generated in the wafer is simply and conveniently cooled by feeding a helium gas through a helium feeding passage.  <P>SOLUTION: The electrostatic chuck for the wafer includes a base 20 on which the wafer 10 is mounted, an annular first sealing member 30 which is fitted to the end of the upper face of the base 20, an annular second sealing member 40 which is fitted on the upper face of the base 20 separated from and inside the first sealing member 30 and which divides the wafer 10 into an edge 12 and a center portion 14 when the wafer 10 is mounted, a first helium feeding passage 50 that is branched and formed within the base 20 and that discharges the helium gas to the edge 12 of the wafer 10, and a second helium feeding passage 60 which is branched and formed within the base 20 so that it may have a difference in height from the first helium feeding passage 50 and which discharges the helium gas to the central portion 14 of the wafer 10.  <P>COPYRIGHT: (C)2005,JPO&NCIPI
Patent JP-2005279463-A (JP)
Title: Water treatment method
Inventor: YONEDA TAKESHI
IPC: B01D19/00
Filed: 2004-03-30
Abstract: <P>PROBLEM TO BE SOLVED: To provide a water treatment method for efficiently performing the filtration of impurities or the like and the degassing of a dissolved gas corresponding to a change in the temperature of water to be treated.  <P>SOLUTION: In the water treatment method using a reverse osmosis membrane part 2 for removing impurities or the like in water to be treated and the membrane type degassing part 3 connected to the downstream side of the reverse osmosis membrane part 2 and degassing the dissolved gas in the water to be treated using a gas permeable membrane and constituted so that the water to be treated is filtered by the reverse osmosis membrane part 2 to remove impurities and the dissolved gas is degassed by the membrane type degassing part 3, the relation between the flow rate and temperature of the water to be treated the residual value of impurities in diltered water after impurities or the like in filtered water after the impurities or the like are filtered in the reverse osmosis membrane part 2 and the value of the residual dissolved gas in permeated water after the dissolved gas is degassed in the degassing part 3 is preliminarily calculated to determine the value of the residual tolerance of the impurities or the like and the value of the residual tolerance of the dissolved gas are also determined and the temperature of the water to be treated is detected to control the flow rate of the water to be treated on the basis of the temperature of the water to be treated so as to satisfy the value of residual tolerance of the impurities or the like of the value of the residual tolerance of the dissolved gas.  <P>COPYRIGHT: (C)2006,JPO&NCIPI
Patent JP-2005286200-A (JP)
Title: Printed circuit board and method for preventing forgetting soldering of electronic component in printed circuit board
Inventor: KATO YOSHIRO
IPC: H05K3/34
Filed: 2004-03-30
Abstract: <P>PROBLEM TO BE SOLVED: To provide a printed circuit board and a method for preventing forgetting soldering capable of easily and definitely detecting the soldering of electronic components for circuit constant adjustment.  <P>SOLUTION: Two through holes 2 as openings into which lead terminals of resistors 3 as the circuit constant adjustment parts can be inserted are formed at a predetermined distance in a substrate 1. Continuity treatment such as plating is not applied on the internal surface of the through hole 2, which is isolated from a circuit pattern. When the circuit pattern is formed on the surface of the substrate 1, a land 4 is formed substantially concentrically with the through hole 2 and formed with the inside diameter of the land 4 bigger than the diameter of the through hole 2. An insulating layer 5 as a contact preventive means so as to cover overlapped portions of at least the lead terminal 3a and the land 4 under the lead terminal 3a is provided on a part of the upper potion of the land 4.  <P>COPYRIGHT: (C)2006,JPO&NCIPI
Patent JP-2005292179-A (JP)
Title: Lithographic printing plate precursor
Inventor: SASAKI HIDETO
IPC: G03F7/00
Filed: 2004-03-31
Abstract: <P>PROBLEM TO BE SOLVED: To provide a lithographic printing plate precursor excellent in stain resistance and printing durability and less liable to cause stain of a non-image portion of a shadow area even if the amount of dampening water supplied is reduced in printing when an FM screen is used for dots.  <P>SOLUTION: The lithographic printing plate original is obtained by sequentially disposing an intermediate layer containing a polymer having a structure represented by formula (I) in a side chain and an image recording layer on a support for a lithographic printing plate obtained by subjecting an aluminum sheet to at least an alkali metal silicate treatment and having 5-15 mg/m<SP>2</SP>of Si in a surface. In the formula, Y represents a linking group to a backbone skeleton of the polymer; R<SP>1</SP>represents H or a monovalent hydrocarbon group; and R<SP>2</SP>represents a divalent hydrocarbon group.  <P>COPYRIGHT: (C)2006,JPO&NCIPI
Patent JP-2005292216-A (JP)
Title: Cleaning member and its manufacturing method
Inventor: KAWAMURA HISAFUMI
IPC: C23C18/31
Filed: 2004-03-31
Abstract: <P>PROBLEM TO BE SOLVED: To provide a polyurethane cleaning member, the friction coefficient of the surface of which is uniformly lowered and which is superior in durability.  <P>SOLUTION: In the cleaning member made of polyurethane rubber, a metallic covering layer is formed by performing pre-treatment at least on the part of the cleaning member, coming into contact with a surface to be cleaned with a noble metal compound catalyst and a silane coupling agent, having a functional group possessing a metal capturing function and performing electroless nickel plating thereto.  <P>COPYRIGHT: (C)2006,JPO&NCIPI
Patent JP-2005291021-A (JP)
Title: Compressor
Inventor: SUGIMOTO MASANORI
IPC: F04B39/10
Filed: 2004-03-31
Abstract: <P>PROBLEM TO BE SOLVED: To extend a lifetime of a suction valve by reducing wear of the suction valve in a compressor.  <P>SOLUTION: An upper surface 6D inclines on a step part 1A of a cylinder 1. A suction valve seat member 6 using low friction coefficient material having self lubricating nature is provided, and the suction valve seat member 6 and a suction valve 5 are abutted. Consequently, since the suction valve 5 gradually gets in contact with the suction valve seat 6 from another end side 5A at a time of open of the suction valve 5 to receive the suction valve 5, wear part does not concentrates and the lifetime of the suction valve can be extended.  <P>COPYRIGHT: (C)2006,JPO&NCIPI
Patent JP-2005288586-A (JP)
Title: Work positioning device
Inventor: SUNA HIRONOBU
IPC: B23Q3/15
Filed: 2004-03-31
Abstract: <P>PROBLEM TO BE SOLVED: To provide a work positioning device capable of adjusting the attraction force of a permanent magnet acting on a work, as a result, of generating sliding movement on the attraction surface while the work is attracted onto the attraction surface by weakening the attraction force so as to make an attitude correction, and making positioning while the work is restrained strongly on the attraction surface by intensifying the attraction force.  <P>SOLUTION: When pneumatic cylinders 14 and 15 are put in operation and an actuating link 8 is moved horizontally to the right in the figure, a cam groove 9 is moved to the right in the figure, and a roller follower 7 is pushed by the push-move slope 9a in the moving direction of the actuating link 8. The roller follower 7 is pushed moving downward approximately vertically while rotating around a roller shaft 6 and is descended. This causes a magnet unit 3 to move apart from a base plate 2, which weakens the attraction force of the attraction surface 2a.  <P>COPYRIGHT: (C)2006,JPO&NCIPI