baber/WOPTO huggingface dataset:
Patent JP-H02267272-A (JP)
Title: Thin film forming device
Inventor: TOMIKAWA TADASHI
IPC: C23C16/34
Filed: 1989-04-06
Abstract: PURPOSE:To efficiently apply a gaseous mixture utilized for film formation and to form a thin film at low cost by utilizing both an ungrounded electrode and a grounded electrode which are opposed with each other as the walls of the upper and lower surfaces of a film formation chamber in a plasma CVD method at the atmospheric pressure. CONSTITUTION:A film formation chamber 1 in a plasma CVD method at the atmospheric pressure is constituted of both the upper and lower surface parts which are made of an ungrounded electrode 2 and a grounded electrode 3 which are mutually opposed as a main body and the high resistors electrically insulating both electrodes 2, 3. A base plate A for a sample is placed on the grounded electrode 3 and a high-frequency power source 6 is connected to the ungrounded electrode. The distance (g) between the base plate 4 and the electrode 2 is regulated to 10-0.1mm and the ratio of the flow rate Q of the supplied gaseous mixture to the volume S of the discharge space is regulated to 1-10<2>sec<-1>. In this constitution, when the gaseous mixture wherein a gaseous raw material is diluted by large amounts of gaseous He is supplied to the discharge space through a feed port 5 and discharged through a discharge port 8 and film formation is performed, the gaseous mixture is effectively utilized and a uniform thin film is formed on the base plate A.
Patent JP-H05292292-A (JP)
Title: Storage type facsimile equipment
Inventor: FUJII TOSHIYUKI
IPC: H04N1/21
Filed: 1992-04-09
Abstract: PURPOSE:To provide the storage type facsimile equipment which reduces communication cost when frequency performing transmission to the same transmission destination. CONSTITUTION:Transmitting picture information from a picture information fetching part 5 is encoded at a code converting part 6, picture data stored in a communication data storing part 7 is analyzed at a communication required time analyzing part 9, when it is judged that a prescribed time set is not exceeded for speaking time for an unit charge tariff which a speaking time analyzing part 11 analyzed from dial numbers, transmission processing is not performed immediately, and the reception of the next transmitting document is instructed. When the communication required time summed-up of the transmitting documents of the same transmission destination exceeds the set time, a communication data control part 12 instructs a call control part 3 to make a call to a communication destination, and transmits the data to the same transmission destination stored in the communication data storing part 7.
Patent JP-H05291879-A (JP)
Title: Automatic equalizer circuit
Inventor: TOKUNAGA SHINJI
IPC: G11B20/10
Filed: 1992-04-09
Abstract: PURPOSE:To provide the automatic equalizing circuit correcting automatically a tap coefficient in matching with distortion of an input signal and realizing the correction with an analog circuit. CONSTITUTION:The circuit is provided with a comparator 107 receiving outputs of transversal filters (101-106) having N-sets of taps, a 1st low pass filter 108 receiving an output of the comparator 107 and outputting a reference waveform, a subtractor 109 obtaining a difference between an output of the 1st low pass filter 108 and an output of the transversal filter, N-sets of multipliers 110-112 multiplying the output of the subtractor 109 and an output of each stage of the transversal filters, N-sets of 2nd low pass filters 113-115 smoothing outputs of the N-sets of the multipliers, and N-sets of integration devices 116-118 receiving the outputs of the N-sets of the 2nd low pass filters respectively, and the outputs of the N-sets of the integration devices are used for tap coefficients of each stage of the transversal filters having N-sets of taps.
Patent JP-H10279098-A (JP)
Title: Automatic document feed device
Inventor: IMOTO SHINJI
IPC: G03G15/00
Filed: 1997-04-08
Abstract: PROBLEM TO BE SOLVED: To allow a guide member adjacent to a feed member of an automatic document feed device to function as a stopper of the feed member, to dispense with the screwing of the guide member, and a facilitate the exchanging work of the feed member. SOLUTION: A separation roller 1 to separate document P one by one in an abutted condition on a feed belt to feed the document P on an document loading table to the downstream side while rotated in the reverse direction, and a guide member 15 which is mounted in the space adjacent to the separation roll 1 in the thrust direction and guides the document P to be fed are provided, tip parts 24a, 24b of a snap fit 21 to attach/detach the guide member 15 are fitted in a notch 2a in an end part of a rotary shaft 2 so as to be used also as the stopper, and a snap fit 22 different in distance to the tip parts 24a, 24b is fitted to a columnar member 27 of a support member 26 fixed to a bottom surface of the space.
Patent JP-S5517720-A (JP)
Title: Quick motion mechanism for disconnecting switch
Inventor: ASHITAKA KAZUHIKO
IPC: F16H27/02
Filed: 1978-07-19
Abstract: PURPOSE: To improve security and reliability of a quick motion device by engaging a lock lever with a driving lever and thereby preventing narual opening or closing of a disconnecting switch.  
     CONSTITUTION: An operating lever 5 having an arced long aperture 20 is connected to a driving shaft 1. A pin 6 at a top of a rod 11 is engaged with the long aperture  20 on the lever 5 and a compression spring 12 is energized by the rod 11. A lock  lever 15 is provided on a shaft 16 and is engaged with the pin 6 and a driving lever  10 while is energized in counter-clockwise by a compression spring 17. When the  operating lever 5 is rotated in clockwise by an operating device 7 through an output  lever 8 and an operating link 9, the pin 6 moves along the long aperture 20 and the  lock lever 15 is rotated aparting from the driving lever 10, and thus, locking for  entering into operation is released. When the pin 6 is crossed over the dead point  thereof and slip quickly along the long aperture 20, a single throw lever 4 effects  throw-in of a disconnecting switch 3 rapidly.  
     COPYRIGHT: (C)1980,JPO&Japio
Patent JP-H02269411-A (JP)
Title: Gas sealing device and high pressure collecting pipe
Inventor: YOSHIZU SAKAE
IPC: F16L9/19
Filed: 1989-04-07
Abstract: PURPOSE:To contrive the reduction of expense and the improvement of safety by connecting two or more high pressure cylinders to a single high pressure collecting pipe connected to a communication cable connection part through a single pressure reducing regulator valve and sealing gas. CONSTITUTION:Two or more high pressure gas cylinders 1 are connected directly or through a high pressure flexible hose 3 to a single high pressure collecting pipe 2 connected to a single pressure reducing regulator valve 4 connected to a connection part 6 of a communication cable by a low pressure sealed hose 5. Accordingly, since gas can be sealed by using the single high pressure collecting pipe 2 and pressure reducing regulator valve 4, a replacement period of the gas cylinder 1 can be extended with the pressure reducing regulator valve 4 capable of reducing the number in use. In this way, costs can be reduced further with the safety improved with regard to work.
Patent JP-S61248523-A (JP)
Title: Manufacture of semiconductor device
Inventor: GOTO HIROSHI
IPC: H01L21/302
Filed: 1985-04-26
Abstract: PURPOSE:To enable to form electrode windows of submicron order and electrodes with high conductivity by a method wherein the electrode windows are formed by the peripheral etching process of metallic silicide while the electrodes are formed by selective growing process. CONSTITUTION:An n<->Si layer 12, an n<+> buried layer 13, an n<+> contact region 14 and an oxide film 15 are successively formed on an Si substrate 11. Besides, an SiO2 film 16, an Si3N4 17, an MoSi2 layer 18, another SiO2 film 19 and a resist layer 20 are successively formed on the surface of substrate 11. Next the layer 20 is patterned into any electrode form as a mask to pattern the layer 19. At this time, the layer 18 beneath the periphery of layer 20 is etched to form openings 21 of submicron order by means of etching with a mixed gas of O2 and CCl4. After forming p<+> type base contact regions 23, the layer 20 is removed to etch the layer 18, using the layer 19 as a mask. Finally e.g. W is selectively grown only on the sides of regions 23 and the layer 18 to connect both of them with one another forming base leading electrodes composed of the layer 18 and W 24.
Patent JP-S59213320-A (JP)
Inventor: SHIRAISHI TAKESHI
IPC: A01D69/00
Filed: 1983-05-19
Abstract: (57)【要約】本公報は電子出願前の出願データであるた め要約のデータは記録されません。
Patent JP-H04320148-A (JP)
Title: Picture reader
Inventor: ASAI HIROYUKI
IPC: H04N1/19
Filed: 1991-04-19
Abstract: PURPOSE:To increase the entire read speed by quickening a transfer speed of an ineffective picture element other than a designated read area faster than a transfer speed in a designated read area when an original with a size smaller than a maximum read size is read. CONSTITUTION:An MPU 9 sets a timing to a programmable timer PTM 10 based on a position of a designation read area and size information and generates signals SH, VAL1D and they are fed to a CCD 8 and a SEL 14. A crystal oscillator OSC 11 generates a reference frequency, a frequency division counter CNT 12 frequency-divides it to obtain pulse trains whose maximum and basic operating frequencies are 10MHz and 5MHz. A clock generating gate 13 generates signals phi1, phi2, RS1, RS2 from an output of the CNT and the selector SEL 14 selects either the signals phi1, RS1 or the signals phi2, RS2 based on the signal VALID to drive the CCD 8. Thus, a waste time of an invalid area is reduced and the entire read time is decreased.
Patent JP-S6230702-A (JP)
Title: Herbicide
Inventor: TAKASE MASAYUKI
IPC: C07F9/48
Filed: 1986-04-17
Abstract: PURPOSE:A herbicide showing improved herbicidal effects on various perennial weeds causing problems particularly in foliar treatment, having no phytotoxicity to main crops such as maize, cotton, beet, etc., containing a specific alpha-substituted ethylphosphinic acid as an active ingredient. CONSTITUTION:A herbicide an alpha-substituted ethylphosphinic acid shown by the formula (X is Oh or hydroxyamino; R is H, inorganic or organic air cation or ester residue; n is 1-3) or its derivative such as 2-hydroxyethylsulfonic acid, calcium bis(2-hydroxyethylphosphinate), etc., easily being synthesized from well-known compounds, as an active ingredient. The active ingredient is blended with a carrier or an auxiliary, prepared into emulsion, wettable powder, suspension, granule, aqueous solution, etc., and used by soil treatment or foliar treatment before or after germination of weeds. The agent is effective against perennial weeds, for example, broad-leaved weeds such as Pharbitis purpures Voigt, etc., gramineous weeds such as barnyard grass, cyperaceous weeds such as nutgrass, etc.
Patent JP-S62243815-A (JP)
Inventor: NAKAZAWA ICHITA
IPC: A41H43/04
Filed: 1986-04-17
Abstract: (57)【要約】本公報は電子出願前の出願データであるた め要約のデータは記録されません。
Patent JP-H0249078-A (JP)
Title: Water-base ink composition
Inventor: CHIAKI HISASHI
IPC: C09D11/17
Filed: 1989-04-07
Abstract: PURPOSE:To provide the subject composition containing a specific tetrakisazo dye, having high stability and safety and suitable for writing utensil, ink-jet printing and recorder. CONSTITUTION:The objective composition contains a tetrakisazo dye of formula I [M is H, Na, K, Li or NH4; B1 and B2 are group of formula II or III (m is 0 or 1; n is 0-2; Y1 is COOM; Y2 is H, Cl, CH3, OH, OCH3, COOM or SO3M; Z is H, CH3 or t-C4H9)]. The dye of formula I can be produced e.g., by tetrazotizing 4,4'-diaminostilbene-2-2'-disulfonic acid amide, coupling the resultant compound with a compound of formula V and coupling the obtained compound with a compound of formula VI or a compound of formula VII.
Patent JP-H04301846-A (JP)
Title: Manufacture of mask substrate for exposure
Inventor: ITO SHINICHI
IPC: G03F1/68
Filed: 1991-03-29
Abstract: PURPOSE:To reduce a number of manufacturing steps and to prevent deterioration of positioning precision and to enhance patterning precision. CONSTITUTION:The mask substrate for exposure is obtained by forming a light-shielding film 42 on an SiO2 substrate 41 to be used as a phase shifting layer, forming a first positive type resist 43, forming a second positive type resist 44 higher in sensitivity than the first resist 43, selectively exposing the resist 44 to low energy beams, further selectively exposing the resists 43, 44 to higher energy beams, then developing the resists 43, 44, etching the disclosed light-shielding film 42, further etching the substrate 41 disclosed by etching the film 42 by a prescribed depth, etching the resist 43 by using the resist 44 as a mask, and finally etching the film 42 disclosed by removing the resist 43.
Patent JP-S58205108-A (JP)
Title: Optical circuit
Inventor: ADACHI AKIHIRO
IPC: G02B6/28
Filed: 1982-05-26
Abstract: PURPOSE:To prevent light from returning to a light emitting element by forming end surfaces of an input and an output optical fiber slantingly to an optical axis, forming end surfaces of distributed index lenses for collimating and convergence which face said end surfaces slantingly to the optical axis while sphering the other-side end surfaces. CONSTITUTION:The projection end surface 2 of the input optical fiber 1 and the incidence end surface 10 of the distributed index lens 3 for collimating are formed at an angle alpha to the optical axis, and the other surface of the lens 3 is sphered. The optical lens 1 is arranged at the focal point of the lens 3. The incidence end surface 5 of the output optical fiber 4 and the projection end surface 2 of the distributed index lens 6 for convergence are formed and arranged similarly and symmetrically. Light entering the lens 3 from the projection end surface of the input fiber 1 is made into parallel luminous flux, which is attenuated by an optical function element 9 and made incident to the optical fiber through a lens 6. The incidence end surface 8 of the lens 6 is sphered and the angle alpha is set adequately to prevent the light from returning to the light emitting element.
Patent JP-H11262561-A (JP)
Title: Pachinko machine
Inventor: KISHI ISAO
IPC: A63F7/02
Filed: 1998-03-17
Abstract: PROBLEM TO BE SOLVED: To provide a pachinko machine which can make a reach expression to further enhance a player's expectation for generation of a big hit pattern made. SOLUTION: A grouping pattern GA is added to patterns displayed on a third display part 34C which stops its variable display last in a reach mode. So when the third display part 34C tentatively stops and the added grouping pattern GA is displayed there, it means that the pattern may be changed to make a hit condition. And, by previously notifying that the possibility of a big hit is increased, a player's expectation for generation of a hit pattern mode will be further enhanced. And, in addition, in order to make the game more exciting, a grouping pattern A (GA), which certainly leads to a bog hit, and a grouping pattern B (GB), which may lead to a big hit with a strong probability, are added as grouping patterns.
Patent JP-S63254381-A (JP)
Inventor: DENPO KAZUO
IPC: F25D23/00
Filed: 1987-04-11
Abstract: (57)【要約】本公報は電子出願前の出願データであるた め要約のデータは記録されません。
Patent JP-H09282126-A (JP)
Title: Display method for process progress chart
Inventor: TAZAWA SATOSHI
IPC: G06Q10/00
Filed: 1996-04-11
Abstract: PROBLEM TO BE SOLVED: To easily find a process as a bottleneck of a line by connecting respective coordinate positions and coordinate positions (origin coordinate) where the total values of lot feed times and process times are shown as zero and displaying the obtained line as a progress line. SOLUTION: As for a lot A, respective coordinate positions PA1 -PA10 shown by the total values of the end times of respective processes 1-10 shown on a time base and the process times of the processes 1-10 shown on a progress axis and origin coordinate 0 are connected and this obtained line SA is displayed as the progress line. In this form, the progress states and progress schedules of the machining of even lots which are different in machining procedure and process time can be compared without misjudgement. Namely, the gradient of the progress line shows the speed of the process progress irrelevantly to the lots, the progress states and progress schedules of the different lots can be compared without misjudgement.
Patent JP-H03288150-A (JP)
Title: Heat developable color photosensitive material
Inventor: KAWAMOTO FUMIO
IPC: G03C8/40
Filed: 1990-04-04
Abstract: PURPOSE:To prevent the deterioration in image and particularly unequal transfer and transfer defect by providing a halation preventive layer via a layer contg. nitrocellulose on the rear surface side of a plastic base in particular. CONSTITUTION:Polyethylene terephthalate, polycarbonate, etc., are used as the plastic base. This photosensitive material has a heat developable photosensitive layer contg. at least a silver halide and dyestuff donative compd. dividely in one or >=2 layers on one side on this plastic base and is provided with the halation preventive layer via the layer contg. at least the nitrocellulose on the other side. The nitrocellulose having 10000 to 200000 mol. wt. is used in this case. The deterioration of the images and the generation of particularly the unequal transfer and transfer defect are obviated in this way.
Patent JP-S59214273-A (JP)
Title: Semiconductor device
Inventor: OONAKA SEIJI
IPC: H01L31/10
Filed: 1983-05-20
Abstract: PURPOSE:To reduce the junction capacitance of the lower section of a gate electrode for a transistor by forming the gate electrode on the surface of a semi- insulating semiconductor substrate and electrically connecting a semiconductor layer of the lower section of the gate electrode and a semiconductor layer in a photodiode. CONSTITUTION:An N type InGaAs layer 2 is formed on a semi-insulating InP substrate, and a P type diffusion layer 3 in a light-receiving section for a P-I-N photodiode and a junction type FET are integrated on the layer 2. A gate electrode 7 is shaped to the surface of the semi-insulating substrate 1 in a region from which the N type InGaAs layer 2 is removed. The P type diffusion layer 3 in the light-receiving section and a P type diffusion layer 8 as the lower section of the gate electrode 7 are connected electrically. The junction capacitance of the lower section of the gate electrode 7 is brought to zero because the gate electrode 7 is formed on the surface of the semi-insulating substrate 1.
Patent JP-S6048196-A (JP)
Title: Method for removing phosphorus from organic waste liquid
Inventor: MATSUO YOSHITAKA
IPC: C02F9/00
Filed: 1984-05-07
Abstract: PURPOSE:To remove stably the phosphorus with high efficiency by releasing a part of phosphorus contained in returned activated sludge into a soln. to form a liquid mixture contg. high-concn. soluble phosphorus, and removing the phosphorus chemically from a part of the mixture. CONSTITUTION:The phosphorus is substantially removed by separating the flow with a distribution vessel 2. Namely the amt. of entrained soluble phosphorus is decreased by the amt. corresponding to the amt. of the phosphorus introduced into a chemical phosphorus removing stage. Since the activated sludge in an aeration tank 5 has surplus capacity for removing phosphorus after reabsorbing the entrained soluble phosphorus, the phosphorus can be removed surely even with the comparatively small-capacity aeration tank 5. A liquid mixture 39 flowing out from the aeration tank is introduced into the final settling pond 10 wherein the activated sludge is separated by settling and concentrated to obtain a treated liquid 40. At least a part of the activated sludge which is separated by settling and concentrated is returned to an anaerobic tank 1 and treated as returned sludge 32.
Patent JP-S5613147-A (JP)
Title: Mold for extrusion-molding foamable synthetic resin
Inventor: OOKIDO MITSUHARU
IPC: B29C48/32
Filed: 1979-07-14
Abstract: PURPOSE:To improve the reliability of the strength of a mold product and to prevent the reduction in a foaming magnification, by a method wherein a cooling hole is perforated in a mold, which is constituted such that an inner mold, an intermediate mold, and an outer mold are placed cocentrically, and a cylindrical molded product extruded through the mold is cooled. CONSTITUTION:An inner mold 1, an intermediate mold 2, and an outer mold 3 are positioned cocentrically through the medium of their respective gaps, and a cooling hole 5 is provided in the inside of the approximately cylindrical inner mold 1. A rough section is provided on an outer circumferential surface of the inner mold 1, and a plurality of core-feeding holes 7 are bored in the intermediate mold 2. An inside discharge section 8 between the inner mold 1 and intermediate mold 2 and an outside discharge section 9 between the intermediate mold 2 and outer mold 3 are connected together through the medium of a flow path 10 formed in the intermediate mold 2. This causes the formation of an extrusion-molding mold 4. Foamable synthetic resin 14 is flowed into a manifold 12 from the direction A, and is formed into a former shape, which is before foaming, in the inside discharge section 8 and the outside discharge section 9. A cylindrical procudt 17 is extruded through the mold 4, and simultaneously, the molded product 17 and a core material 15 are united together.
Patent JP-2000241374-A (JP)
Title: Method for measuring content of magnesium in molten aluminum alloy
Inventor: MORINAKA MASAYUKI
IPC: G01N33/20
Filed: 1999-02-24
Abstract: PROBLEM TO BE SOLVED: To simply, effectively measure a content of magnesium(Mg) in a molten Al alloy by adding phosphorus(P) in molten aluminum alloy, measuring an eutectic temperature and applying it to a predetermined formula. SOLUTION: When P is, for example, added as an eutectic nuclear material of a sufficient amount in a molten Al alloy, an eutectic temperature of the alloy is related to an amount of contained Mg. This Mg content can be calculated by a formula of Mg= (577-TE)/4.4)×Si/12.5 (wherein 577 indicates the case that Mg amount is zero at a binary eutectic temperature of Al-Si series Al alloy, that is 577 deg.C, the (577-TE) indicates how much the eutectic temperature TE actually measured is lower from the binary eutectic temperature, the coefficient 12.5 is an eutectic real composition (12.5% Si) of the Al-Si series Al alloy, Si/12.5 is an eutectic saturated temperature, that is, when the amount of the Si is zero, the eutectic saturation temperature is zero, and when the amount is 12.5%, the saturation temperature becomes 1.
Patent JP-H04299399-A (JP)
Title: Voice feature quantity extraction device
Inventor: YASUDA HARUTAKE
IPC: G10L21/02
Filed: 1991-03-28
Abstract: PURPOSE:To provide the feature quantity extraction device which can normalize sound source characteristics through simple arithmetic when features are extracted by a BTSP system. CONSTITUTION:The voice signal inputted from a microphone 1 is amplified and corrected by a preprocessing part 2. A frequency analysis part 3 obtains power spectra(TSP), channel by channel, and they are put into a time series by a multiplexer(MUX) and stored in a register 5 for 15 channels. The power spectra stored in the register 5 are supplied to a mean value arithmetic part 6 and mean values of three adjacent channels of the power spectra are found. An adder 7 subtracts the mean value of each channel, found by the mean value arithmetic part 6, from the original power value to obtain the normalized sound characteristics of the speaker, thereby obtaining nearly the same effect with the least square approximate straight line.