Patent KR-100829926-B1 (KR)
Title: Substrate and system for synthesizing carbon-nano-tube
Inventor: YANG JUN HYEOK
IPC: B82B3/00
Filed: 2007-03-28
Granted: 2008-05-16
Abstract: A carbon nanotube substrate and a carbon nanotube synthesis system are provided to minimize contamination of reaction furnace and to improve productivity of carbon nanotube synthesis process by preventing the synthesized carbon nanotube from being released from substrate. A carbon nanotube synthesis system(1) has a substrate(10), a reaction chamber(100) and a before/after treatment place. The side wall of the substrate(10) is along the edge of the lower wall crossing at the right angle. The before/after treatment place has a station part(200), a primary transport device(300), a substrate storing part(400), a catalyst coating part(500), a recovery part(600) and a secondary transport part(700). The station part(200) is located at a side of the reaction chamber(100). A primary gate valve(212) is between the station part(200) and the reaction chamber(100). A heat insulation material(213) is between the primary gate valve(212) and the reaction chamber(100). The station part(200) has a primary region(220) and a secondary region(240). The primary region(220) is near the reaction chamber(100), and the substrate storing part(400) is provided for the primary region(220). The secondary region(240) is arranged to contact with the other side of the primary region(220), and the arrangement makes a line with the reaction chamber(100). A primary transport device(300) is provided for the secondary region(240). The primary region(220) has a fore-end region(222) and a behind-end region(224). The fore-end region(222) is arranged to make a line with the reaction chamber(100) and with the secondary region(240), and the behind-end region(224) is perpendicular to the line made by the fore-end region(222), the reaction chamber(100) and the secondary region(240). An inert gas supply part(260) is provided in the station part(200) to remove air from inside of the station part(200) and to maintain inert gas atmosphere. The secondary transport device(700) is located at the opposite side of the behind-end region(224) with respect to the fore-end region(222) of the station region(200). The catalyst coating part(500) and the recovery part(600) are located at both sides of the secondary transport device(700), respectively while being parallel with the line made by the reaction chamber(100) and the secondary region(24) of the station part(200). A secondary gate valve(214) is between the secondary transport device(700) and the station part(200) to control the passage of the substrate(10). The reaction chamber(100) also has a reaction furnace(110), a boat(120) in the furnace(110), a heating part(130), a gas supply part(140), a gas exhaust part(150) and a retention gas detection part(160). The boat(120) has laminate structure consisting of a substrate(10) for synthesizing carbon nanotube, and each laminate optionally has a few substrates(10) which are arranged in a parallel line to the reaction furnace(110). The gas exhaust part(150) has an exhaust duct (154), a main exhaust line(155) which is connected to the gas exhaust duct(154), a ventilation line(156) and a vacuum ventilation line(157). The gas exhaust duct(154) is at a flange(112b) which is on the other side of the reaction furnace(110). A primary valve is on the ventilation line(156), and a secondary valve is on the vacuum ventilation line(156). The retention gas detection part(160) has a gas detector(162) and a control part(168).