Patent SG-11201900607W-A (SG)
Title: Process for the generation of thin inorganic films
Inventor: ADERMANN TORBEN
IPC: C23C16/455
Filed: 2017-08-23
Abstract: INTERNATIONAL APPLICATION PUBLISHED UNDER THE PATENT COOPERATION TREATY (PCT) (19) World Intellectual Property Organization International Bureau (43) International Publication Date 08 March 2018 (08.03.2018) WIP0 I PCT 0111111010 0111 °nolo mull °Ellin Eno oimIE (10) International Publication Number WO 2018/041695 Al (51) International Patent Classification: TR), OAPI (BF, BJ, CF, CG, CI, CM, GA, GN, GQ, GW, C07F 15/00 (2006.01) C23C 16/455 (2006.01) (21) International Application Number: PCT/EP2017/071236 (22) International Filing Date: 23 August 2017 (23.08.2017) (25) Filing Language: English (26) Publication Language: English (30) Priority Data: 16186628.0 31 August 2016 (31.08.2016) EP (71) Applicant: BASF SE [DE/DE]; Carl-Bosch-Strasse 38, 67056 Ludwigshafen am Rhein (DE). (72) Inventors: ADERMANN, Torben; Endemannstrasse 13, 69115 Heidelberg (DE). ABELS, Falko; Gutenbergstrasse 2a, 67354 Roemerberg (DE). LIMBURG, Carolin; Werderplatz 4, 68161 Mannheim (DE). WILMER, Ha- gen; Ernst-Kunz-Strasse 33, 67071 Ludwigshafen (DE). GERKENS, Jan; Goethe-Allee 20, 37073 Gottingen (DE). SCHNEIDER, Sven; Felix-Klein-StraBe 3, 37083 Gottin- gen (DE). (74) Agent: BASF IP ASSOCIATION; BASF SE, G-FLP C006, 67056 Ludwigshafen (DE). (81) Designated States (unless otherwise indicated, for every kind of national protection available): AE, AG, AL, AM, AO, AT, AU, AZ, BA, BB, BG, BH, BN, BR, BW, BY, BZ, CA, CH, CL, CN, CO, CR, CU, CZ, DE, DJ, DK, DM, DO, DZ, EC, EE, EG, ES, FI, GB, GD, GE, GH, GM, GT, HN, HR, HU, ID, IL, IN, IR, IS, JO, JP, KE, KG, KH, KN, KP, KR, KW, KZ, LA, LC, LK, LR, LS, LU, LY, MA, MD, ME, MG, MK, MN, MW, MX, MY, MZ, NA, NG, NI, NO, NZ, OM, PA, PE, PG, PH, PL, PT, QA, RO, RS, RU, RW, SA, SC, SD, SE, SG, SK, SL, SM, ST, SV, SY, TH, TJ, TM, TN, TR, TT, TZ, UA, UG, US, UZ, VC, VN, ZA, ZM, ZW. (84) Designated States (unless otherwise indicated, for every kind of regional protection available): ARIPO (BW, GH, GM, KE, LR, LS, MW, MZ, NA, RW, SD, SL, ST, SZ, TZ, UG, ZM, ZW), Eurasian (AM, AZ, BY, KG, KZ, RU, TJ, TM), European (AL, AT, BE, BG, CH, CY, CZ, DE, DK, EE, ES, FI, FR, GB, GR, HR, HU, IE, IS, IT, LT, LU, LV, MC, MK, MT, NL, NO, PL, PT, RO, RS, SE, SI, SK, SM, KM, ML, MR, NE, SN, TD, TG). Published: — with international search report (Art. 21(3)) (54) Title: PROCESS FOR THE GENERATION OF THIN INORGANIC FILMS 1-1 kl) 01 V; X, I M / 71' _ _ 0 (I) 1 Pf ,,, 2 ] GC R p -\"\" 0 ,-. , Il q 0 m el C (57) : The present invention is in the field of processes for the generation of thin inorganic films on substrates, in particular atomic layer deposition processes. The present invention relates to a process for the generation of inorganic films comprising depositing the compound of general formula (I) onto a solid substrate (I), wherein M is Mn, Ni or Co, X is a ligand which coordinates M, n is 0, 1, 2, 3, or 4, R 1 is an alkyl group, an alkenyl group, an aryl group, a halogen, or a silyl group, R 2 is an alkyl group, an alkenyl group, an aryl group, or a silyl group, p and q are 1 or 2, wherein p + q = 3, and m is 1, 2, or 3.