baber/WOPTO huggingface dataset:
Patent JP-H04269766-A (JP)
Title: Electrostatic charge image developing toner
Inventor: ONO HITOSHI
IPC: G03G9/097
Filed: 1991-02-25
Abstract: PURPOSE:To obtain a high-quality electrostatic charge image developing toner which causes no contamination of copies, etc., even in continuous copying by incorporating a compd. of specified structure into the toner. CONSTITUTION:The toner contains at least a resin and a colorant, and at least one kind of compd. expressed by formula I or II. In formulae I and II, R1, R2, Ar<1>, Ar<2> are substd. or unsubstd. alkyl groups or aralkyl groups, X<1>-X<4> are hydrogen atoms, alkyl groups, hydroxyl groups, etc., respectively. Besides the compds. expressed by formula I or II, this toner may contain other charge controlling agents including well-known ones, for example, Nigrosine dye, quarternary ammonium salt, polyamine resin, etc.
Patent JP-H09223660-A (JP)
Title: Projection aligner
Inventor: HIRACHI KAZUYUKI
IPC: H01L21/027
Filed: 1996-02-19
Abstract: PROBLEM TO BE SOLVED: To provide a projection aligner allowing it to avoid exposure in an underset state of a reticule and a sensitive substrate inspite of setting a large- sized and heavy weight substrate stage. SOLUTION: A reticule alignment controller 42 performing a constant servo- driving control of a reticule table 7 and a substrate stage controller 43 performing a driving control of a substrate stage 10 are connected by means of a local interface 30. The substrate stage controller 43 monitors a positioning error of a substrate stage 10 and a positional error of the reticule table 7 obtained through a local interface 30 so as to perform exposure control. Further, the reticule alignment controller 42 monitors a driving state of the substrate stage 10 through the local interface 30 and when the substrate stage 10 is under high-speed driving, gain of servodriving of the reticule table 7 is lowered and stopped.
Patent JP-S62189406-A (JP)
Title: Waveguide type optical demultiplexer
Inventor: MIYAGAWA TOSHIYA
IPC: G02B6/12
Filed: 1986-02-17
Abstract: PURPOSE:To permit integration of a waveguide type optical demultiplexer and other functional elements by using an optimized reflection type diffraction grating so that the demultiplexed signal light can be guided in an optional direction at a low loss. CONSTITUTION:An SiO2 buffer layer 16 is formed on an Si substrate 10 and an incident single mode optical waveguide 11 and exit optical waveguides 12-14 are formed on the buffer layer 16. One end of the incident single mode optical waveguide 11 and one end of the exit optical waveguides 12-14 intersect with each other at one point to form an intersected optical waveguide part 17. The reflection type diffraction grating 15 is formed on the side face of the intersected part 17. The optical waveguide widths of the incident single mode optical waveguide 11 and the exit optical waveguides 12-14 are respectively specified to several - several 10mum. The 3-wavelength multiplex signal light guided in the waveguide 11 is diffracted to different directions by every wavelength by the reflection type diffraction grating 15 and is respectively guided to the exit optical waveguides 12-14.
Patent JP-S59157223-A (JP)
Title: Production of high crushing strength type electric welded pipe for oil well
Inventor: MURAYAMA HIROSHI
IPC: C22C38/12
Filed: 1983-02-28
Abstract: PURPOSE:To improve crushing strength without application of a heat treatment by hot-rolling a steel contg. a specific amt. of C, Si, Mn, N, V and Ti at a specific temp. and allowing the steel to cool without water spraying within the specific time from the end of hot rolling then cooling the steel at a specific cooling rate and coiling the steel at a specific temp. CONSTITUTION:A steel is composed, by weight %, of 0.01-0.18 C, 0.45-0.25 Si, 1-2 Mn, <0.05 Nb, <0.07 V, <0.03 Ti and the balance Fe with inevitable impurities. Such steel is hot-rolled at 740-830 deg.C. The steel is allowed to cool without water spraying within 1-15sec after the hot rolling and thereafter the steel is cooled at an average cooling rate of >=15 deg.C/sec. The steel is coiled when cooled to 400-600 deg.C.
Patent JP-S56127482-A (JP)
Title: Ink ribbon feed mechanism for printer
Inventor: KURIYAMA MEIKAI
IPC: B41J33/14
Filed: 1980-03-13
Abstract: PURPOSE: To prolong the life of a ribbon in the endless ink ribbon feed mechanism utilizing the movement of a carriage by releasing the ribbon from pressure at all times except for the feeding period.  
     CONSTITUTION: Mounted on the carriage 4 moved rightward and leftward along a shaft 6 are a ribbon holding plate 2 (fixed), a pressure member 11 attached to an elastic flat plate 10 and energized in the direction of separating from a ribbon 7 and a cam plate (movable both rightward and leftward) 12 having a wedge-shaped projection 13. When the carriage 4 moving rightward approaches the right-hand side plate 8, the cam plate 12 is brought into contact thereiwith to move leftward with respect to the carriage 4, so that the ribbon 7 is fixed between the holding plate 2 and the pressure member 11, and when the carriage 4 returns leftward, the ribbon 7 is simultaneously fed leftward. On the other hand, when the carriage 4 approaches the left-hand side plate 9, the reverse operation to the above is performed, so that the pressure member 11 is separated from the holding plate 2. Accordingly, during the succeeding rightward movement of the carriage (during printing), the ribbon 7 is released from pressure. 
     COPYRIGHT: (C)1981,JPO&Japio
Patent JP-S60174667-A (JP)
Title: Printer
Inventor: YOKOYAMA SHIZUO
IPC: B41J29/46
Filed: 1984-02-20
Abstract: PURPOSE:To prevent danger of electric shock, etc., by a method in which an electrode not to be used for printing is provided to the printing head, current is flowd in the electrode before printing, and when current or voltage different from a set value is generated, no printing operation is made. CONSTITUTION:A dummy electrode 21 not to be used in printing is provided in a printing head 20 for electrifying transfer, consisting of a recording electrode 22 and a return electrode 23. Under the condition that the head is closely contacted with a ribbon and a paper before the beginning of printing, a fine current of a level enough not to form image is flowed, and after the absence of foreign matter between the head and the platen is confirmed, the printing operation is started. A danger of electric shock, etc., can thus be prevented, and the shortening of the life of the head can be eliminated by removing discharge.
Patent JP-S57146252-A (JP)
Title: Method for washing of aluminoborosilicate glass substrate for photo mask
Inventor: MATSUDA TSUNEO
IPC: G03F1/82
Filed: 1981-03-04
Abstract: PURPOSE:To make the boundary part of a photo mask pattern smooth to enhance the exfoliation strength, by washing an aluminoborosilicate glass substrate, where the coefficient of linear expansion is a specific value or below, with an aqueous solution where the aqueous solution of condensed phosphoric acid and a neutral detergent are mixed. CONSTITUTION:After the surface of a glass substrate for photo mask which consists of the aluminoborosilicate glass including MgO or PbO and has 60X 10<-7>/ deg.C coefficient of linear expansion is polished, this glass substrate is washed with pure water. Next, the glass substrate is washed with an aqueous solution where the aqueous solution of condensed phosphoric acid and a neutral detergent are mixed. Next, the glass substrate is washed with pure water and is dried. When a pattern is formed on, for example, chromium mask balnks made from this washed glass substrate, the boundary of the pattern of this photo mask becomes smooth, and the exfoliation strength of the chromium film is enhanced.
Patent JP-H10228119-A (JP)
Title: Electrophotographic organic photoreceptor
Inventor: TAKANO YUKIO
IPC: G03G5/00
Filed: 1997-02-17
Abstract: PROBLEM TO BE SOLVED: To obtain excellent printing durability, to suppress toner filming due to repeated use of a photoreceptor and to obtain an image of high quality for a long time by cleaning the surface of a photosensitive layer formed on a conductive base body with a lower alcohol. SOLUTION: As for the layer structure of a photosensitive layer on a conductive base body, a single photosensitive layer, a laminated photosensitive layer comprising a base coating layer, charge producing layer and charge transfer layer formed in this order, or a laminated photosensitive layer comprising a charge transfer layer, charge producing layer and surface protective layer formed in this order can be used. The surface of the single photosensitive layer, or the surface of the charge transfer layer or the surface protective layer as the outermost layer of the laminated photosensitive layer is cleaned with a lower alcohol.  Thereby, foreign matters on the surface of the photosensitive layer which causes toner filming can be removed or an inhomogeneous state of the surface can be avoided without changing or deteriorating the photosensitive layer, and therefore, production of toner filming can be suppressed.
Patent JP-S61192782-A (JP)
Inventor: HANSU RAINAA CHIERUFUASU
IPC: C09K3/10
Filed: 1986-02-17
Abstract: (57)【要約】本公報は電子出願前の出願データであるた め要約のデータは記録されません。
Patent JP-S6246010-A (JP)
Inventor: KONSUTANCHIN SHIYUTORU
IPC: F15B15/14
Filed: 1986-02-17
Abstract: (57)【要約】本公報は電子出願前の出願データであるた め要約のデータは記録されません。
Patent JP-H07240459-A (JP)
Title: Interelement isolation method for semiconductor element and semiconductor device employing it
Inventor: OKUNO MASAKI
IPC: H01L21/76
Filed: 1994-03-01
Abstract: PURPOSE:To prevent the intrusion of moisture or dust in the atmosphere through the border between an element forming region and an interelement isolation region by forming the border of a compact thermal SiO2 film and other regions of a porous SiO2 film. CONSTITUTION:Silicon nitride 4 is deposited in a predetermined pattern on an Si substrate 1. A resist film 14 is deposited and then removed by anisotropic etching from the head part of silicon nitride 4 to leave the resist film 14 at the side end part thus forming a mask pattern 15. The Si substrate 1 is then immersed into an anode formation liquid and a current is fed between an anode, i.e., the Si substrate 1, and a platinum cathode thus exposing porous Si 9 from the Si substrate 1. After removing the resist film 14, wet oxidation is performed to obtain an interelement isolation film 5 where a compact thermal SiO2 film 13 for preventing intrusion of moisture or dust in the atmosphere is formed at the border A between an element forming region 3 and an interelement isolation region 12 and a porous SiO2 film 11 is formed at other regions.
Patent JP-S61189642-A (JP)
Title: Plasma reactor
Inventor: ITAKURA HIDEAKI
IPC: H01L21/302
Filed: 1985-02-18
Abstract: PURPOSE:To obtain the titled apparatus which can process a plurality of wafers at a time without deterioration in the uniformity of reaction by a method wherein reaction chambers are provided so as to utilize the gas plasma generated and branched in a plasma generation chamber or generated in a plurality of plasma generation chambers under the same condition. CONSTITUTION:Two plasma generation chambers 1a, 1b are provided, and magnetic coils 2a, 2b are wound around each. When a microwave power is impressed through a microwave introduction port 5 with the flow of a reaction gas through a gas introduction port 3, a high-density gas plasma generates by the induction of electron-cyclotron resonance under the same condition in each of the generation chambers 2a, 2b. The gas plasma of the same condition generated in each of them 2a, 2b is guided by lead-out electrodes 6a, 6b, 6c, 6d to the surfaces of samples 9a, 9b on sample holding tables 8a, 8b installed to reaction chambers 7a, 7b, resulting in etching or the formation of thin films. As a result, two wafers can be processed at a time, and the processing capacity can be improved.
Patent JP-H10228087-A (JP)
Title: Photographic processing device
Inventor: PICCININO JR RALPH L
IPC: G03D3/13
Filed: 1998-02-13
Abstract: PROBLEM TO BE SOLVED: To provide a photographic processing device being a thin tank where the hitting force of processing solution is prevented from being weakened and a belt is used to move photosensitive material. SOLUTION: This device is provided with at least one processing channel including the processing solution where the photosensitive material 12 passes and having substantially fixed thickness T, and a slot nozzle 76 making the processing solution hit against the photosensitive material passing through the channel. The nozzle is arranged at a distance shorter than T from the opposed side walls of the channel so that the processing solution may hit against the photosensitive material.
Patent JP-S62187852-A (JP)
Title: Processor for photosensitive material
Inventor: UCHIDA SHUNJI
IPC: G03D3/00
Filed: 1986-02-14
Abstract: PURPOSE:To prevent a processor from being corroded with processing liquid and its produced gas and malfunctioning by providing a contact piece which is pressed against a photosensitive material above the boundary part between plural processing liquid tanks, and detecting the rotation of the contact piece by a magnetic sensor unit provided outside the processing liquid tanks separately and generating an electric signal. CONSTITUTION:Units 4210, 4310, and 4410 above detecting means, i.e. the 2nd, the 3rd, and the 4th detection parts are all installed above the respective processing liquid tanks 42, 43, 44, and 45 and pressed against a conveyed photosensitive material S; and output parts which detect the passage of the photosensitive material and generate an electric signal are installed outside the processing liquid tanks at distance. Consequently, even if processing liquid fluctuates or is scattered when an externals or internal units is taken out of each processing liquid tank or when a copying machine is moved, there is no corrosion due to the contacting of the processing liquid. Further, gas produced from the developing liquid CD and bleaching fixing liquid BF which are held at high temperature contacts a detector directly a little, so the durability is superior and no malfunction is caused.
Patent JP-S56128814-A (JP)
Title: Water gate with electrical antifreezing apparatus
Inventor: MATSUZAKI SHIGEMI
IPC: E02B7/20
Filed: 1980-03-12
Abstract: PURPOSE: To prevent freezing effectively, by mounting skin current heating tubes on such places where freezing should be prevented as an upper part of the door of a water gate by the water side and right and left guiding channel plate of the door by the water side.  
     CONSTITUTION: A plural number groups of the skin current heating tubes 28W30 are mounted to the back of a front steel plate 27 which is a constituent of a door 9 of a water gate where ice and snow are apt to accumulate. Another plural number groups of skin current heating tubes 31, 32 are mounted to the lower part of a door stopper 15 with which a lower watertight rubber plate 14 of the door 9 makes contact. The skin current heating tubes is made by inserting loosely an insulated wire 2 in steel tubes 1, 1' with a ferromagnetic property when an AC current is flowed from an AC power source 3 to the insulated wire 2, a secondary current flows concentratedly near the inner skin of the steel tube 1, 1', so that leakage of the secondary current outside the steel tube can virtually be prevented. Because of heat generated by the steel tube 1, 1' freezing around the place can be prevented. 
     COPYRIGHT: (C)1981,JPO&Japio
Patent JP-H08227219-A (JP)
Title: One-component developing device
Inventor: SAITO HIROSHI
IPC: G03G15/08
Filed: 1995-01-27
Abstract: PURPOSE: To obtain a one-component developing device capable of preventing an adverse effect from acting on image quality by foreign matter by removing the foreign matter caught in a wedge-shaped region or preventing the foreign matter from being caught in the wedge-shaped region. CONSTITUTION: The one-component developing device is provided with a cam 10 as an abutting part changing means for deflecting a layer thickness uniformizing plate 3 to change the position of its abutting part on a developing roller 2 so that the foreign matter caught in the wedge-shaped region C is removed therefrom. The cam 10 is supported rotatably around a shaft 10a supported by the side plate of the developing device and has such a shape that the layer thickness uniformizing plate 3 can be set in abutting and nonabutting states by the rotation of the cam 3.
Patent JP-S63200259-A (JP)
Title: Control system for application of bus
Inventor: SANO RYOICHI
IPC: G06F13/37
Filed: 1987-02-16
Abstract: PURPOSE:To ensure the rational control for distribution of the bus application rights by transferring successively these bus application rights in accordance with the priorities decided by a delay chain. CONSTITUTION:Plural microprocessors MPU0-MPUn that can be served as bus masters are connected in parallel in a daisy chain system. The bus request signals produced from these bus masters are monitored with each other and other bus request signals are produced as long as said monitored bus request signals are kept under the inactive states. In addition, to this signal producing function, a function is provided to transmit immediately an activated bus permission signal of the daisy chain input to the daisy chain output as long as the bus masters produce no bus permission signal of their own, and a function which disuses the bus application right when a bus master ends its own bus application right and the bus request signals of other bus masters are active.
Patent JP-H07237092-A (JP)
Title: Detecting method for abnormality of cutting tool
Inventor: KOGA KOJI
IPC: B23Q17/09
Filed: 1994-03-01
Abstract: PURPOSE:To enlarge a monitoring application range by comparing a tool monitoring command timer with time beside object at the time of inputting of set up information, and when the monitoring command timer is longer, carrying out monitoring from the end of the time beside object, and when the monitoring command timer is shorter, judging processing to be special for carrying out the monitoring from the inside of the time beside object. CONSTITUTION:In a teaching mode, a tool monitoring command is outputted after the begining of the rotation of a spindle. Namely, before the begining of processing, fixed code information (monitoring command information) is inputted from a NC program. The data of spindle load at the time of inputting of information are read to set up rushcut time regarded as the time beside object. Next, a tool monitoring command timer is compared with the rushcut time to judge a processing mode. Thus, the processing mode is judged to be ordinary processing from the monitoring command timer being larger than the rushcut time, and the monitoring is carried out from the end of the time beside object. In the case of the monitoring command timer being smaller than the rushcut time, the processing mode is judged to be special processing, and the monitoring is carried out from the time beside object.
Patent JP-H01205513-A (JP)
Title: Dry capacitor
Inventor: KANBA MASARU
IPC: H01G4/22
Filed: 1988-02-12
Abstract: PURPOSE:To reduce a contact angle of an immersion liquid to a dielectric member and to enhance the immersion performance of the immersion liquid into a capacitor blank body by adding a surface-active agent of an appropriate amount to an epoxy resin immersion liquid. CONSTITUTION:A capacitor blank body formed by winding a metal-evaporated film is impregnated with an epoxy resin immersion liquid to which a surface-active agent of about 0.1-2.0wt.% has been added; it is hardened. In general, the immersion liquid is prepared in such a way that an epoxy resin, a diluent and the surface-active agent have been added and stirred. By this setup, a contact angle of the immersion angle to a dielectric member can be reduced; the immersion performance of the immersion liquid to the capacitor blank body can be enhanced.
Patent JP-H02209472-A (JP)
Title: Material for vapor deposition and vapor deposition device
Inventor: KURODA HITOSHI
IPC: C23C14/24
Filed: 1989-02-10
Abstract: PURPOSE:To obtain the material for vapor deposition which can be deposited by evaporation simultaneously on >=2 surfaces of an object to be subjected to vapor deposition and allows the vapor deposition uniform over a wide area by forming a vapor deposited metal layer on at least a part of the outside surface of a core wire consisting of a high melting point metal. CONSTITUTION:The vapor deposited metal 5 consisting of Au, Ag, Al, Ni, Cr, etc., is formed on the core wire 3 as a wire rod consisting of the high melting point metal, such as W or nichrome wire, over the entire length from the outer periphery thereof to form the material 1 for vapor deposition. The section shape of the core wire 3 may be elliptical and various other shapes in addition to a circular shape. The time required for heating and cooling of a boat associated with replenishing of the metal as the material 1 for vapor deposition of the exchange operation of the object to be subjected to vapor deposition, etc., is eliminated by using the above-mentioned material 1 for vapor deposition. The working efficiency of the vapor deposition device is, therefore, improved.
Patent JP-S56129795-A (JP)
Title: Rotary compressor
Inventor: INAGAKI MITSUO
IPC: F04C28/28
Filed: 1980-03-12
Abstract: PURPOSE: To prevent the inside of a cylinder chamber from being unusually high- pressurized by a method wherein when a pressure inside the cylinder chamber increases over a prescribed pressure, a check valve is opened a communicating hole to cause it to directly lead out a coolant in the cylinder chamber to a down-stream of a discharge port.  
     CONSTITUTION: The first and second communicating holes 22, 23 are both communicated with the cylinder chamber R and an oil storage chamber 8 in a rear housing 16 outward a rearward side plate 7. Inside the communicating holes 22, 23 respectively, are arranged the check valves 24 which open the communicating holes 22, 23 to permit the coolant in the cylinder chamber R to escape to the oil storage chamber 18 side, only when the pressure in the cylinder chamber R is increased over the prescribed pressure than the pressure in the oil storage chamber 18. Accordingly, a liquid coolant at the initial stage of compression is allowed to escape to the rear housing 16 side before the pressure in the cylinder chamber R increases unusually. 
     COPYRIGHT: (C)1981,JPO&Japio
Patent JP-S55125290-A (JP)
Title: Reducing method for electrolytic current at electrolytic smelting
Inventor: KOJIMA REIJI
IPC: C25C7/02
Filed: 1979-03-19
Abstract: PURPOSE: To easily reduce the electric current without changing the other condition, by connecting the conductor having a fixed resistance between electrodes of electrolytic baths to be decreased electrolytic current and branching off the current.  
     CONSTITUTION: One end of the conductor C having a fixed resistance value, is connected with the high electric potential bus bar B 2  of the electrolytic bath A 2  and also, the other end is connected with the low electric potential B 4  of the electrolytic bath A 3 , on occasion of decreasing the current density in A 2 , A 3  among the electrolytic baths A 1 , A 2 ...An. Hereby, branched current paths are formed against the current paths in the above baths A 2 , A 3  and as a result of it, the electrolytic current, that is, current density in the baths A 2 , A 3 , is decreased corresponding to the resistance value of the above conductor C. By the above construction, the current of only desired electrolytic baths is able to decrease without changing another condition such as the number of each pole plate or distance of the pole plate in the electrolytic bath. 
     COPYRIGHT: (C)1980,JPO&Japio
Patent JP-S6242635-A (JP)
Inventor: DEIITERU GIYANTENBAIN
IPC: H04B10/10
Filed: 1986-02-18
Abstract: (57)【要約】本公報は電子出願前の出願データであるた め要約のデータは記録されません。