baber/WOPTO huggingface dataset:
Patent TW-550969-B (TW)
Title: White LED circuit and LCD power circuit with feedback control
Inventor: LIOU GUANG-HUA
IPC: H05B33/10
Filed: 2002-06-17
Granted: 2003-09-01
Abstract: A kind of white LED circuit and LCD power circuit with feedback control are disclosed in the present invention. In the invention, a comparison unit is used to compare the battery voltage with the value corresponding to the working voltage of the light source unit. And, the comparison result is used to control the first voltage doubling-unit for selectively increasing the battery voltage, so as to monitor the working voltage of light source unit at any time and dynamically raise the battery voltage such that the battery voltage can drive the light source unit and reaches the optimum efficiency. In the invention, the second voltage doubling-unit is used to selectively increase the battery voltage to different times. And, after the voltage raise, the battery voltage input stabilizer unit and the inverse conversion unit are used to output the positive/negative power for the power source of the liquid crystal display screen.
Patent TW-563201-B (TW)
Title: Dry developing method
Inventor: KITAMURA AKINORI
IPC: G03F7/40
Filed: 2002-08-14
Granted: 2003-11-21
Abstract: A dry developing method leads processing gas between parallel flat plate electrodes installed in a vacuum processing container 102 and forms the plasma of the processing gas by applying a high frequency power to the electrodes for drawing a photoresist formed on a processed body 150 by a first step of plasma-processing the resist on an etched layer 152 having an already developed upper layer resist 156 containing silicon and a lower layer resist 154 installed in contact with the lower layer of the upper layer resist 156, in which the lower layer resist 154 is processed by a first process for plasma-processing by using the mixed gas of carbon monoxide gas and oxygen gas, and a second step for plasma-processing by using the mixed gas of nitrogen gas and hydrogen gas to perform a dry etching to the photoresist formed on the processed body 150. Accordingly, it is able to perform a dry developing to the photoresist in a highly accurate and highly efficient manner.
Patent TW-I254233-B (TW)
Title: Data processing system for patient data
Inventor: THIELSCHER CHRISTIAN
IPC: G06F17/30
Filed: 2002-10-09
Granted: 2006-05-01
Abstract: The invention refers to a data processing system for the processing of patient data, which includes person identifying data of a respective patient and corresponding health data (GD), with central system (3), which includes a database (4)storing the health data, and with terminal devices (1), which are connected with the central system for the request of health data from the database and/or for the input of health data into the central database. According to the invention, health data is stored in the central database without assignment to person identifying data (name, date of birth, etc.) but with a DIC which is required for access to health data. The invention can be used, e.g. for electronic health records.
Patent TW-589762-B (TW)
Title: Microstrip fed slot-line spiral antenna capable of lowering initial resonant frequency
Inventor: WANG JIAN-REN
IPC: H01Q1/38
Filed: 2002-10-16
Granted: 2004-06-01
Abstract: The present invention relates to a microstrip fed slot-line spiral antenna capable of lowering initial resonant frequency. In the invention, the spiral microstrip line and the ground plate are disposed on the substrate. In addition, a spiral slot-line opposite to the microstrip line is etched on the ground plate; and a feeding-in apparatus is connected to the external terminal of the microstrip line of the substrate while a metal plate having a larger area is connected to the internal terminal. By connecting the spiral microstrip line to the larger metal plate to have mutual electromagnetic coupling effect with the spiral slot line, the effects of lowering the initial resonant frequency and shrinking the size are obtained. Thus, the purpose of lowering initial resonant frequency and maintaining the original high bandwidth can be achieved by only slightly changing the structure without changing the substrate medium and the antenna size.
Patent TW-564502-B (TW)
Title: High-k gate oxides with buffer layers of titanium for MFOS single transistor memory applications
Inventor: LI TING KAI
IPC: H01L21/8247
Filed: 2002-10-23
Granted: 2003-12-01
Abstract: A method of fabricating a memory device includes preparing a silicon substrate; depositing a layer of high-k insulator on the silicon substrate; depositing a buffering layer on the high-k insulating layer; depositing a layer of ferroelectric material on the buffering layer by metal organic chemical vapor deposition; forming a top electrode on the layer of ferroelectric material; and completing the device obtained by above steps.
Patent TW-I229236-B (TW)
Title: Complementary mask, fabrication method thereof, exposure method, semiconductor device, and fabrication method thereof
Inventor: KOIKE KAORU
IPC: G03F1/20
Filed: 2002-11-12
Granted: 2005-03-11
Abstract: The first circuit pattern of the present invention is divided into patterns 26, 28 complementary to each other and having a plurality of pattern forming areas 34a, 34b where the complementary patterns 26, 28 formed by openings are arranged. The complementary patterns 26, 28 are arranged on the respective pattern forming areas 34a, 34b so that the pattern densities of the pattern forming areas 34a, 34b are substantially identical.
Patent TW-I245067-B (TW)
Title: Coumarin derivative and EL element using the coumarin derivative
Inventor: LAI JIUN-LIANG
IPC: H05B33/14
Filed: 2002-12-18
Granted: 2005-12-11
Abstract: The present invention relates to a coumarin derivative and an EL element using the coumarin derivative. The present invention uses a compound of the following formula (1), in which R1 is a C3-C10 branched alkyl.
Patent TW-I279169-B (TW)
Title: Plasma processing apparatus capable of performing uniform plasma treatment by preventing drift in plasma discharge current
Inventor: NAKANO AKIRA
IPC: H01J37/32
Filed: 2002-12-27
Granted: 2007-04-11
Abstract: A plasma processing apparatus has a plasma processing chamber that accommodates an electrode pair of a plasma excitation electrode for exciting plasma and a susceptor electrode facing the plasma excitation electrode, a workpiece to be treated being placed therebetween. The apparatus also has a chassis that accommodates an impedance matching circuit, provided in the middle of a supply path for feeding RF power from an RF generator to the plasma excitation electrode, for matching the impedance between the RF generator and the plasma processing chamber. In the chassis, impedances are axisymmetrically equal at a predetermined frequency with respect to the direction of a high-frequency current returning to the RF generator. The matching circuit has at least two inductance coils connected in parallel.
Patent TW-583467-B (TW)
Title: Display device and light guide plate
Inventor: GOTO YOUICHIRO
IPC: F21V8/00
Filed: 2002-12-30
Granted: 2004-04-11
Abstract: Disclosed are a display device and a light guide plate wherein the light which enters light guide plate 14 through side surface 14a from a linear light source 12 is reflected by the wall surface 18a constituting groove 18 to apply onto liquid crystal panel unit 16. The light reached wall surface 18a at an incident angle smaller than the critical angle will penetrate wall surface, with one part of the penetrated light entering again the light guide 14 through the other wall surface 18b, and the rest part of the penetrated light traveling straight to the outside without reaching the wall surface 18b. The brightness of the screen can be promoted because the light which once leaked to the outside enters again the light guide plate 14 through wall surface 18b. In addition, by lowering the height Hb of the wall surface 18b, the light amount reflected to an undesired direction caused by wall surface 18b can be decreased, and the falling down of contrast due to said reflected light is suppressed.
Patent TW-I265071-B (TW)
Title: Fluid mixing device and cutting device
Inventor: YOSHIDA MIKI
IPC: B24B55/02
Filed: 2003-02-13
Granted: 2006-11-01
Abstract: The object of the present invention is to accurately set, in a machining process using a processing fluid, the specific resistant value of the processing fluid to a specified value by an economical method. The solution of the present invention is to provide a fluid mixing device comprising a first fluid feed passage (34) for feeding a first fluid, a second fluid feed passage (43) for feeding a second fluid, and a mixing part (41) for generating mixed fluid by mixing the first fluid with the second fluid, wherein the first fluid feed passage (34) is branched into a first route (37) and a second route (38) through a flow ratio regulating part (36), the second route (38) is branched, at a branch part (39), to a third route (40) with a preset flow ratio, the first route (40) is connected to the mixing part (41), the second fluid feed passage (43) and a fourth route (44) are connected to the mixing part (41), the mixed flow generated by mixing, in the mixing part (41), the first fluid flowing in from the third route (40) with the second fluid flowing in from the second fluid passage (43) flows out to the fourth route (44), the fourth route (44) is merged to the second route (38) on the downstream side of the branch part (39), and the second route (38) is merged to the first route (37).
Patent TW-I224279-B (TW)
Title: Two-node DSM system and data maintenance of same
Inventor: CHEN WEI-LONG
IPC: G06F15/16
Filed: 2003-03-28
Granted: 2004-11-21
Abstract: A two-node DSM system includes a first and a second DSM nodes. Each of the nodes includes at least one processor, a system bus, a memory control chip, a DSM controller and in internal bus. The respective DSM controllers of the first and the second nodes are directly coupled with each other via a bus line in order to enhance the operational efficiency of the system. In another aspect, the preferred data maintenance method includes steps of discriminating whether the latest data of a specific local memory line is in the local memory by the DSM controller of a processor; requesting the latest data via the internal bus when the latest data is in the local memory, and transferring the latest data to the other node via the bus line in a data transmission format the same as that of the internal bus.
Patent TW-I223007-B (TW)
Title: Coating apparatus
Inventor: HSU CHEN-YUAN
IPC: C23C14/00
Filed: 2003-04-03
Granted: 2004-11-01
Abstract: A coating apparatus includes a motive unit, a transition mechanism, a monitor mechanism, a substrate holding mechanism and a coating source. In this case, the motive unit has a rotation axle. The transition mechanism has a first gear and a second gear. Even more, the first gear is pivoted on the rotation axle and the second gear engages with the first gear. The center of the second gear has a first opening. The monitor mechanism has at least two testing units. The substrate holding mechanism that is connected with the second gear has a second opening. The second opening is set opposite to the first opening. The monitor mechanism sets through the first gear and the second gear through the first and second openings. The coating source sets corresponding to the substrate holding mechanism and the testing units.
Patent TW-I263557-B (TW)
Title: Electrolytic polishing liquid, electrolytic polishing method and method for fabricating semiconductor device
Inventor: SATO SHUZO
IPC: H01L21/321
Filed: 2003-04-18
Granted: 2006-10-11
Abstract: This invention provides an electrolytic polishing method in which conductivity is enhanced without causing aggregation or precipitation of abrasive grains and good planarization is realized without causing any defect in a metal film or wiring to be polished. In the electrolytic polishing method for planarizing the surface of a metal film to be polished by sliding a polishing pad (15) on the surface of the metal film in electrolytic polishing liquid E while oxidizing, the electrolytic polishing liquid E contains at least abrasive grains and an electrolyte for sustaining charged state of the abrasive grains. Since an electrolytic polishing liquid exhibiting high conductivity is employed, a high electrolytic current level can be attained and the inter-electrode distance can be increased. Since an electrolytic polishing liquid exhibiting good dispersion state of abrasive grains is employed, such defects as residual abrasive grain or scratch are eliminated.
Patent TW-I234196-B (TW)
Title: Semiconductor device and manufacturing method for the same
Inventor: KARIYAMA MASARU
IPC: H01L21/265
Filed: 2003-06-20
Granted: 2005-06-11
Abstract: The present invention relates to a manufacturing method for a semiconductor device that includes, at least, the step of forming a drift region of a second conductivity type provided with a low concentration region in the semiconductor substrate on, at least, one side in the channel length direction of the gate electrode by means of impurity ion implantations with predetermined implantation angles with four different directions; and the step of forming a high concentration region of the second conductivity type surrounded by the drift region, with the exception of the low concentration region. A semiconductor device having a drift region that can be miniaturized without increase in the number of manufacturing steps as well as a manufacturing method for the same can be provided according to the above described method.
Patent TW-I220073-B (TW)
Title: Method for manufacturing polysilicon film
Inventor: CHANG MAO-YI
IPC: H01L21/77
Filed: 2003-07-24
Granted: 2004-08-01
Abstract: A method for manufacturing polysilicon film is provided. An insulating layer, a first amorphous silicon layer, and a cap layer are formed on a substrate sequentially, and a first laser annealing process is preformed to form a first polysilicon layer with at least one void from the first amorphous silicon layer. Then the cap layer and portion of the insulating layer in the void are removed to form a first opening in the insulating layer, and a second opening is consist from the void and the first opening. A second amorphous silicon layer is formed on the first amorphous silicon layer, wherein the second amorphous silicon layer has a recess in the second opening. At least a second laser annealing process is performed, and the recess is as the discrete seed to perform the crystallization process to a second polysilicon layer form the first polysilicon layer and the second amorphous silicon layer.
Patent TW-I234741-B (TW)
Title: Software protection method and system of same
Inventor: LIN KUANG-SHIN
IPC: G06F13/14
Filed: 2003-08-26
Granted: 2005-06-21
Abstract: The invention provides a software protection method and system suitable for the software used in an information apparatus to protect the software from being arbitrarily copied by other users. First, a confirmation password is set at a key position of an application program, and a progress-monitoring module is provided in the apparatus. When the program is to be executed, the version number of the apparatus has to be confirmed first and then the program continues to run. When being executed to the key position, the program has to request the progress-monitoring module to provide the password information, and confirm the received password information and continue to run after correct confirmation. Thereafter, whenever being executed to the key position, the program has to request the progress-monitoring module to provide the password information and continue to run after correct confirmation, thereby detecting each key position. After all passwords are correctly confirmed, the application program can be fully executed in the information apparatus.
Patent TW-I221877-B (TW)
Title: Air-cooled internal combustion engine
Inventor: KAMBE TAKASHI
IPC: F02F1/32
Filed: 2003-09-02
Granted: 2004-10-11
Abstract: The present invention contributes to enhance the air cooling effect of the cooling air passage and to dispose ignition plugs at an easy-mounting location to allow effective air cooling. According to the present invention, the air-cooled internal combustion engine includes a valve mechanism provided above a combustion chamber, and the cooling air passage extending in the fore-and-aft direction between the aforementioned combustion chamber and the aforementioned valve mechanism along the exhaust port and the intake port, and there are provided the laterally extending cooling air passage in communication with the aforementioned cooling air passage extending in the fore-and-aft direction, the ignition plug provided in the laterally extending cooling air passage, and a cooling fin curved from the aforementioned cooling air passage extending in the fore-and-aft direction toward the aforementioned laterally extending cooling air passage. Further, a centerline of the exhaust port is inclined with respect to the fore-and-aft direction of the internal combustion engine in order to widen front opening of cooling air passage in the fore-and-aft direction.
Patent TW-I220768-B (TW)
Title: Method of forming a gate and method of forming a contact window
Inventor: YEH FANG-YU
IPC: H01L21/28
Filed: 2003-09-04
Granted: 2004-09-01
Abstract: A method of forming a gate is described. A substrate including a memory cell area and a periphery area is provided, wherein a dielectric layer, a first conductive layer, and a second conductive layer have been formed on the substrate. A mask layer is formed on the second conductive layer. A first etching process is preformed to remove the second conductive layer by using the mask layer to be an etching mask, until the surface of the first conductive layer in the memory cell area or the periphery area is exposed. A second etching process is performed to remove a partial thickness of the sidewalls of the second conductive layer, and the etching selectivity of the second conductive layer is bigger than that of the first conductive layer for the second etching process. A first thermal process is performed. A third etching process is preformed to remove the first conductive layer by using the mask layer to be an etching mask, until the surface of the dielectric layer in the memory cell array area and the periphery area is exposed.
Patent TW-I246687-B (TW)
Title: Method of and apparatus for managing disc defects using temporary defect management information (TDFL) and temporary defect management information (TDDS), and disc having the TDFL and TDDS
Inventor: HWANG SUNG-HEE
IPC: G11B7/24
Filed: 2003-09-26
Granted: 2006-01-01
Abstract: A disc having an updatable defect management area used by an apparatus for managing defects on the disc, the disc including a user data area which includes user data, a spare area that is a substitute area for a defect exiting in the user data area, and an area in which are recorded an address of data that is last recorded in the user data area and an address of replacement data recorded in the spare area. Accordingly, the disc defect management method and apparatus are applicable to recordable disc such as a write-once disc while effectively using a defect management area of the disc.
Patent TW-I224019-B (TW)
Title: Golf club head and compound plates therefor
Inventor: CHEN YUN-FANG
IPC: A63B102/32
Filed: 2003-11-04
Granted: 2004-11-21
Abstract: A golf club head comprises a main body, and at least one compound plate. The main body made of metal is provided with a striking plate and at least one recession selectively formed on a crown portion, a sole portion, and/or a side portion of the main body. The compound plates are formed by pre-lamination of at least one metal substrate and at least one nonmetal substrate. The compound plates is combined with the corresponding recessions of the main body to construct a shell of the main body so that a center of gravity and a striking voice of the main body can be specifically adjusted.
Patent TW-I274397-B (TW)
Title: Method for forming narrow trench structure and method for forming gate structure with narrow spacing
Inventor: JANG WEN-YUE
IPC: H01L21/308
Filed: 2003-11-20
Granted: 2007-02-21
Abstract: The present invention discloses a method for forming narrow trench structure, which includes: first, forming plural oxidizable island-like first mask layers on a substrate covered with a to-be-defined layer, and then performing an oxidization process onto the island-like first mask layers to form an oxidization layer on the sidewall and upper surface of each island-like first mask layer; then filling a second mask layer in each gap between the island-like first mask layers, and then removing the oxidization layers to retain a narrow opening with a width substantially the same as the thickness of the oxidization layer; and finally defining a narrow trench structure via the narrow opening. The present invention also discloses a method for forming gate structure with narrow spacing.
Patent TW-I282369-B (TW)
Title: Oligonucleotide probes, biochip and method for detecting Pseudomonas aeruginosa
Inventor: JANG CHANG-CHIUAN
IPC: C12Q1/68
Filed: 2003-11-27
Granted: 2007-06-11
Abstract: This invention relates to oligonucleotide probes having strain specificity for Pseudomonas aeruginosa, which are designed for analyzing intergenic spacer (ITS) nucleic acids sequence of 16S-23S ribosomal genes in bacteria. The probe can be spotting on basic material for producing biochip and used for detecting Pseudomonas aeruginosa by hybridization. This invention presents advantages of correct and rapid detection, and can be used for identification of Pseudomonas aeruginosa.
Patent TW-I227583-B (TW)
Title: Laser cutting system for minute thin-film circuit
Inventor: LI JIUN-HAU
IPC: H01S3/00
Filed: 2004-02-13
Granted: 2005-02-01
Abstract: A kind of laser cutting system for minute thin-film circuit accompanied with a laser light source to provide the required laser light beam for the cutting operation is disclosed in the present invention. The invention is composed of: the adjustment unit, which is capable of simultaneously receiving the infrared-indication calibrating-light and the laser light beam to be overlapped for output; an alignment unit for receiving a correcting pattern so as to provide user with the capability of controlling and adjusting the projection position of the correcting pattern; the reflection unit for reflecting the light beam outputted from the mixing light apparatus so as to overlap with the simultaneously received correction pattern for output; and the focusing unit for focusing the light beam outputted from the laser light reflection unit and then outputting it. Thus, the output light beam of the mixing light apparatus is located at the correction center position such that the projection and focusing of laser light are even more precise so as to have the capability of increasing the cutting precision.
Patent TW-I235440-B (TW)
Title: Method for making leadless semiconductor package
Inventor: CHANG CHI-WEN
IPC: H01L21/48
Filed: 2004-03-31
Granted: 2005-07-01
Abstract: A method for making leadless semiconductor package is disclosed. Initially, a metal carrier is provided. A plurality of package unit regions are defined on the upper surface thereof and a plurality of dividing paths are disposed between the package unit regions. A plurality of contact pads are formed on the package unit regions in a manner of plating. Next, a plurality of chips are mounted on the package unit regions of the metal carrier and electrically connected with the contact pads on corresponding package units. A plurality of package bodies are formed on the corresponding package unit regions, which do not cover the dividing paths. The package bodies can be separated easily without process of sawing or punching after etching the metal carrier.