baber/WOPTO huggingface dataset:
Patent TW-499616-B (TW)
Title: Methods of forming liquid display panels
Inventor: GLOWNIA JAMES HENRY
IPC: G02F1/1339
Filed: 2000-05-10
Granted: 2002-08-21
Abstract: Liquid crystal display (LCD) panes can be formed rapidly by this method, which involves depositing liquid crystal (LC) in a central region of one substrate, depositing a filler of epoxy material in a continuous loop along the periphery of one substrate to surround the LC material, placing a second glass substrate over the first subsidize and in continuous contact with the epoxy fillet, and then causing the fillet to set by curing or cross-linking. Advantageously, the epoxy fillet can be hardened by scanning it with an infrared or ultraviolet laser focussed to avoid heating the LC maternal. Alternatively, the epoxy fillet can be formed from two-component epoxy by depositing one fillet of each component on the peripheral region of one of the substrates, joining the substrates to merge the two components, and then vibrating the joined substrates to enhance commingling and setting of the two components into a strong hermetic seal.
Patent TW-500729-B (TW)
Title: Spray dried catalyst composition and polymerization process utilizing same
Inventor: OSKAM JOHN H
IPC: C08F4/62
Filed: 2000-05-15
Granted: 2002-09-01
Abstract: This invention relates to a polymerization process comprising combining an olefin in the gas or slurry phase with a spray dried catalyst comprising an activator, a particulate filler and a metal catalyst compound. A process for olefin polymerization comprising combining in the gas or slurry phase an olefin with a spray dried composition comprising an activator, a particulate filler and a metal catalyst compound comprising a group 15 metal compound and/or a phenoxide catalyst, wherein the group 15 metal compound is represented by the following formulae: wherein M is a group 3 to 14 metal, each X is independently an anionic leaving group, y is 0 or 1 (when y is 0 group L' is absent), n is the oxidation state of M, m is the formal charge of the YZL ligand, Y is a group 15 element, Z is a group 15 element, L' is a group 15 or 16 element or group 14 containing group, L is a group 15 or 16 element, R1 and R2 are independently a C1 to C20 hydrocarbon group, a heteroatom containing group, silicon, germanium, tin, lead, phosphorus, or a halogen, R1 and R2 may also be interconnected to each other, R3 is absent, or is hydrogen, a group 14 atom containing C1-C20 group, a halogen, or a heteroatom containing C1-C20 group, R4 and R5 are independently an C1-C100 alkyl group, an C1-C100 aryl group, a substituted C1-C100 aryl group, a C1-C100 cyclic alkyl group, a substituted C1-C100 cyclic alkyl group, or C1-C100 multiple ring system, R6 and R7 are independently absent or hydrogen, and C1-C100 alkyl group, a halogen, a heteroatom or a C1-C100 hydrocarbyl group, or a heteroatom containing C1-C100 group, R is absent, or is hydrogen, a group 14 atom containing C1-C20 group, a halogen, or a heteroatom containing C1-C20 group, and the phenoxide catalyst is represented by the forumlae: wherein R1 is hydrogen or a C4 to C100 alkyl group and may or may not also be bound to M, and at least one of R2 to R5 is a group containing a heteroatom, the rest of R2 to R5 are independently hydrogen or a C1 to C100 group, and any of R2 to R5 also may or may not be bound to M, O is oxygen, M is a group 3 to group 10 transition metal or lanthanide metal, Q is an alkyl, halogen, benzyl, amide, carboxylate, carbamate, thiolate, hydride or alkoxide group, or a bond to an R group containing a heteroatom which may be any of R1 to R5, a heteroatom containing group may be any heteroatom or a heteroatom bound to carbon silica or another heteroatom, the heteroatom itself may be directly bound to the phenoxide ring or it may be bound to another atom or atoms that are bound to the phenoxide ring, and any two adjacent R groups may form ring or multi-ring structures.
Patent TW-500804-B (TW)
Title: Hearth rolls for heating furnace and soaking furnace of vertical heat treating furnace and vertical heat treating furnace including hearth rolls
Inventor: IIDA YOSHIHIRO
IPC: C21D1/00
Filed: 2000-05-30
Granted: 2002-09-01
Abstract: A vertical heat treating furnace for passing a metal strip, therethrough for heat treatment and a hearth roll applied to a heating/soaking furnace of the vertical heat treating furnace are disclosed. The hearth roll can be configured such that the taper angle of each of first taper sections continuous to a flat section at a central portion of the hearth roll from a roll axial direction is larger than the taper angle of each of second taper sections continuous to each of the first taper sections from the roll axial direction. The length Lc (mm) of the flat section and the length L1 (mm) of the first taper section can satisfy the following relationships: 0.5 Wmin ≤ Lc ≤ Wmin and Wmin ≤ Lc+2xL1 ≤ Wmax-400, where Wmin is the minimum width (mm) of the metal strip, and Wmax is the maximum width (mm) of the metal strip.
Patent TW-447121-B (TW)
Title: Manufacturing method for lower electrode of stacked capacitor
Inventor: YANG GUO-YU
IPC: H01L27/108
Filed: 2000-06-22
Granted: 2001-07-21
Abstract: A manufacturing method for lower electrode of stacked capacitor is applied for a substrate with a node contact opening already formed thereon. The method includes the following steps: first, sequentially forming a first insulation layer, a first conductor layer and an isolation layer on the substrate; then, sequentially patterning the isolation layer, the first conductor layer and the first insulation layer to make the reserved first conductor layer and isolation layer to become a bit line and a capping layer and expose the node contact opening; next, forming a spacer on the capping layer, the bit line and the patterned first insulation layer in which the spacer, the bit line and the capping layer are called the bit line structure altogether; then, forming the second conductor layer on the substrate; patterning the second conductor layer to form a lower electrode of the capacitor, wherein the lower electrode of the capacitor covers part of the bit line structure and electrically connects to the node contact opening.
Patent TW-432163-B (TW)
Title: Engine generating machine
Inventor: HIRANUMA JUNJI
IPC: F02B77/00
Filed: 2000-07-11
Granted: 2001-05-01
Abstract: In an engine generating machine, a power-generating unit constructed by integration of the an engine and a generator, is housed in a case including an undercover and a pair of left and right side covers. A pair of reinforcing frames are coupled at their lower ends to the undercover and extend upwards along inner surfaces of the left and right side covers. The reinforcing frames have upper ends coupled to each other and are commonly fastened to a carrying handle. A fuel tank is supported inside the reinforcing frames, and a fuel pump and a fuel cock are mounted on the reinforcing frames. Thus, the maintenance of a fuel supply system for the engine can be facilitated, and the fuel tank can be protected while avoiding an increase in weight.
Patent TW-465152-B (TW)
Title: Light emitting device, production method thereof, and light emitting apparatus and display unit using the same
Inventor: KOJIMA SHIGERU
IPC: H01S3/06
Filed: 2000-07-13
Granted: 2001-11-21
Abstract: An n-type cladding layer formed of a non-single crystal body of n-type AlGaN, a light emitting layer containing a plurality of micro-crystals made from ZnO, and a p-type cladding layer formed of a non-single crystal body of p-type BN are sequentially stacked on a substrate made from quartz glass. An insulating layer is formed between the n-type cladding layer and the p-type cladding layer in such a manner as to bury spaces between the micro-crystals, to thereby prevent occurrence of leakage current. The insulating layer is formed by oxidizing the surface of the n-type cladding layer. Since the light emitting layer contains the plurality of micro-crystals improved in crystallinity, it is possible to enhance the emission efficiency, to extend the selection range of each of materials for forming the light emitting layer, n-type cladding layer, p-type cladding layer, and substrate, and to form a device array on a common substrate having a large area.
Patent TW-486644-B (TW)
Title: Method and apparatus for matching a user's use profile in commerce with a broadcast
Inventor: PHILYAW JEFFRY JOVAN
IPC: G06F17/30
Filed: 2000-08-11
Granted: 2002-05-11
Abstract: A method for advertising over a network and broadcast media combination. A user's computer at a location on the network is operable to receive a signal from a broadcast generated by an advertiser, which signal has embedded therein unique coded information. The user's computer is connected to an advertiser's location in response to extracting the unique coded information from the audio signal. The advertiser's location is correlated to the unique coded information. The operation of connecting causes profile information of the user to be sent to the advertiser's location over the network. The profile at the advertiser's location is then received, and information generated to forward to the user based upon the user's profile forwarded thereto. This information is then forward to the connected user.
Patent TW-457358-B (TW)
Title: Apparatus and method for highly efficiently controlling temperature and humidity of gas
Inventor: OMI TADAHIRO
IPC: F24F13/22
Filed: 2000-09-08
Granted: 2001-10-01
Abstract: To provide an apparatus and a method of highly efficiently controlling gas temperature and humidity, in which a heat exchange efficiency of a cooling coil can be increased, the cooling water amount can be reduced, a piping diameter, and a power of a water-supply pump can also be reduced, and the initial cost, and the running cost for the air conditioning system can be reduced. This apparatus for highly efficiently controlling temperature and humidity of gas is equipped with a means for removing condensate attached on the cooling coil to improve the efficiency of the heat exchange of the coil.
Patent TW-461938-B (TW)
Title: Manufacture and structure for an axial (radial) fanner
Inventor: YANG PEI-RU
IPC: F04D29/60
Filed: 2000-09-30
Granted: 2001-11-01
Abstract: Disclosed is a manufacture and structure for an axial (radial) fanner. The elements including the spindle and bearings used within the fanner are made of ceramic materials. After the above spindle has been made by the ceramic material, it is provided with a passageway penetrating the spindle body. The above spindle is then placed in a mold apparatus. When the plastic material is injected into the mold apparatus, the plastic material will pass through the passageway of this spindle and extend out of the free end of the spindle for forming a retaining portion. After the spindle is made into a tubular configuration by the ceramic material, it is interference-fitted into a hollow column of the fanner base. The retaining portion of spindle is provided with a fastener to prevent the blades from detaching the bearings after the spindle is inserted through the bearing.
Patent TW-449640-B (TW)
Title: Cutter head, tunnel excavating machine, and cutter replacing method
Inventor: TANAKA JUNICHI
IPC: E21D9/087
Filed: 2000-11-07
Granted: 2001-08-11
Abstract: A cutter head is rotationally drivably mounted on a front portion of a tunnel excavating machine body, a plurality of cutter spokes are provided radially on the cutter head, a plurality of mounting holes are formed in a front surface portion of each of the cutter spokes, a valve plate is turnably mounted and has through-holes formed in correspondence with the mounting holes, relay bits are mounted movably to the through-holes and the mounting holes and rearwardly withdrawably, the relay bit can be fixed by bolts at a position at which the relay bit protrudes from the front surface portion of the cutter spoke, and when the relay bit is withdrawn rearward from the mounting hole, the valve plate is turned to close the mounting hole, whereafter the relay bit is detached and can be replaced.
Patent TW-556468-B (TW)
Title: Clamping heat sinks to circuit boards over processors
Inventor: BOOKHARDT GARY L
IPC: H05K3/30
Filed: 2000-11-22
Granted: 2003-10-01
Abstract: A heat sink (18) may be spring strapped onto a socketed processor (11) using clips (10) that engage the spring strap (20) and that are pre-positioned on the circuit board (14). The clips (10) may be C-shaped and may include an upper spring arm portion (34), a vertical portion (32), and a base (30) which may be surface mounted to the circuit board (14). The upper spring arm (34) of the C-shaped clip (10) then releasably engages the spring strap (20) to clamp the heat sink (18) firmly onto the socketed processor (11).
Patent TW-554000-B (TW)
Title: Dispersing agent for aqueous emulsion and suspension polymerization of vinyl compound
Inventor: TANIMOTO SEIJI
IPC: C08F2/30
Filed: 2000-12-01
Granted: 2003-09-21
Abstract: By the use of a vinyl alcohol polymer bonded with more than 1.9 moles of 1,2-glycol as the dispersing agent for emulsion polymerization and the dispersing agent for suspension polymerization, the amount of the dispersing agents to be added can be decreased while the polymerization stability is excellent, the aqueous emulsion obtained therefrom has excellent water resistance and lower temperature dependency, the coloring of the vinyl polymer obtained by the suspension polymerization can be decreased, and the environmental loading of the drainage from suspension polymerization can lowered.
Patent TW-494005-B (TW)
Title: Filter cartridge
Inventor: FATH JURGEN
IPC: B01D46/42
Filed: 2001-02-16
Granted: 2002-07-11
Abstract: A filter cartridge is made of an accordion fold pack folded in a zigzag-shape. At the end faces (4) of the accordion fold pack (2), running parallel to the folds, provision is made for the closing elements (5) which include stiffening strips (6), partially covering the accordion fold pack (2), at least on its discharge side, and sealing elements (7) integrally connected to the stiffening strips (6).
Patent TW-545016-B (TW)
Title: Receiving device and method with the function of correcting baseline wander
Inventor: HUANG CHIH-WEN
IPC: H04L25/06
Filed: 2001-03-21
Granted: 2003-08-01
Abstract: A receiving device and method with the function of correcting baseline wander are proposed. The receiving device uses a first and second resistor network to receive a first and second input signals, respectively. A comparator is employed to compare the output signals of the resistor networks and generates control signals. The receiving device uses a comparing logic unit to compare the output signals of the resistor networks and generates NRZI output signals. Then, an integrator is used to generate compensation signals according to the control signals and NRZI output signals, and a V/I converter is used to convert the compensation signals into compensation current and output the compensation current to the resistor network to correct the baseline wander.
Patent TW-525230-B (TW)
Title: Method of doping trench sidewall and hemispherical-grained silicon in deep trench cells and plasma doped dram device
Inventor: TEWS HELMUT HORST
IPC: H01L21/8242
Filed: 2001-08-01
Granted: 2003-03-21
Abstract: A method of doping trench sidewall and hemispherical-grained silicon in deep trench cells to increase surface area and storage capacitance while avoiding deformation of trenches and hemispherical-grained silicon, comprising: (a) etching a deep trench structure by reactive ion etching; (b) forming a LOCOS collar in an upper portion of the trench over a conformal layer of a silicon containing material, the collar leaving a lower portion of the trench exposed; (c) depositing a film of hemispherical-grained silicon (HSG-Si) at sidewalls of the deep trench; (d) plasma doping the hemispherical-grained silicon; and (e) depositing a node dielectric and filling the trench with polysilicon.
Patent TW-501170-B (TW)
Title: Wafer washing apparatus and its spray head
Inventor: HU JU-JIUN
IPC: H01L21/00
Filed: 2001-06-19
Granted: 2002-09-01
Abstract: This invention provides a wafer washing apparatus and its spray head, in which the wafer washing apparatus is used to wash clean wafers consisting of a pedestal, a spray head, an ultrasonic controller and a pulse pressure controller. The pedestal is used to sustain the wafer. The spray head has a relative movement relationship with the pedestal and is used to spray water onto the wafer. The ultrasonic controller, the pulse pressure controller and the spray head are electrically connected so that the spray head can produce ultrasonic water spray or pulse water spray. There are a plural number of spray holes on the surface of the spray head facing the wafer and the water sprayed from the spray holes can cover the whole wafer surface during the relative movement between the spray head and the wafer. Moreover, there are a plural number of parallel metal lines formed on the wafer and the direction of water spray from the spray head is parallel with the direction of the formed metal lines. Through the use of the construction and arrangement of the inventive spray head, the wafer washing apparatus can wash the wafer more thoroughly and can prevent the wafer from damage during washing.
Patent TW-531989-B (TW)
Title: A shielding guard, especially adapted for optical and electronical transceiver
Inventor: FESTAG MARIO
IPC: H01R13/658
Filed: 2001-08-15
Granted: 2003-05-11
Abstract: The invention relates to a shielding guard, especially adapted for optical and electronical transceiver, with a shelly hollow body (301) and contacting springs (304) integrally made with the said hollow body (301) to make the hollow body (301) in contact with a metal structure. According to the invention, the contacting springs are made of flanges (304) which are extended from the hollow body (301) and bent back toward the hollow body (301). In this way, the invention provides a combing structure, which can improve the shielding effect.
Patent TW-518689-B (TW)
Title: Control method for plasma etching process
Inventor: CHIOU SHIAN-GUANG
IPC: H01L21/3065
Filed: 2001-09-05
Granted: 2003-01-21
Abstract: A control method for plasma etching process is provided, in which the control method for plasma etching process according to the present invention can adjust the etching process based on the relative intensities of the etching product and the reactant on the mass spectra or the optical spectra. The inventive control method for plasma etching process can perform in-situ and real-time control of the plasma etching process to ensure obtaining the expected etching result at the end of etching, even though the etching objects have different pattern densities.
Patent TW-556217-B (TW)
Title: Non-volatile semiconductor
Inventor: CHO TAE-HEE
IPC: G11C16/26
Filed: 2001-09-06
Granted: 2003-10-01
Abstract: Disclosed herein is a non-volatile semiconductor memory device, which comprises a plurality page buffers each a send node. Voltages of odd-numbered (or even-numbered) ones of the sense nodes are varied according to states of corresponding memory cells during a first sense period, while voltages of even-numbered (or odd-numbered) ones of the sense nodes are fixed at a predetermined voltage during the first sense period. On the other hand, voltages of the even-numbered (or odd-numbered) sense nodes are varied according to states of corresponding memory cells during a second sense period, while voltages of the odd-numbered (or even-number) sense nodes are fixed at a predetermined voltage during the second sense period. By this sense scheme, although a sense node corresponding to an OFF cell is floated, a voltage of a sense node having a floating state is not coupled down when a voltage of a sense node corresponding to an ON cell is lowered.
Patent TW-548205-B (TW)
Title: Tire demounting tool
Inventor: KLISKEY ROGER
IPC: B60C25/02
Filed: 2001-09-28
Granted: 2003-08-21
Abstract: A tool for demounting a first bead of a tire mounted on a rim, the tool comprising a handle having a first end and a second end; a first working end extending radially outwardly from the first end of the handle; the first working end including a heel extending radially outward from the handle; a body portion extending radially outward from the heel and including a forward opening crook and a raised portion disposed adjacent the crook; and a tip extending radially outward from the body portion. An opposite end of the tool is configured as a second working end for demounting a second bead of the tire from the nm and comprises a heel extending radially outward from the handle; a body portion extending radially outward from the heel and defining a forward opening crook and an elongate raised portion adjacent the crook; and a tip extending radially from the body portion.
Patent TW-512437-B (TW)
Title: Semiconductor device having LDD-type source/drain regions and fabrication method thereof
Inventor: KIM DO-HYUNG
IPC: H01L21/336
Filed: 2001-10-18
Granted: 2002-12-01
Abstract: A semiconductor device having LDD-type source/drain regions and a method of fabricating the same are provided. The semiconductor device includes at least a pair of gate patterns disposed on a semiconductor substrate and LDD-type source/drain regions disposed at both sides of the gate patterns. The substrate having the gate patterns and the LDD-type source/drain regions is covered with a conformal etch stop layer. The etch stop layer is covered with an interlayer insulating layer. The LDD-type source/drain region is exposed by a contact hole that penetrates the interlayer insulating layer and the etch stop layer. The method of forming the LDD-type source/drain regions and the etch stop layer includes forming low concentration source/drain regions at both sides of the gate patterns and forming the conformal etch stop layer on the substrate having the low concentration source/drain regions. Gate spacers are then formed on the sidewalls of the gate patterns. Using the gate patterns and the gate spacers as implantation masks, impurity ions are implanted into the semiconductor substrate to form high concentration source/drain regions. The spacers are then selectively removed. An interlayer insulating layer is formed on the substrate where the spacers are removed.
Patent TW-508730-B (TW)
Title: Method of forming shallow trench isolation in silicon
Inventor: MILLER ERIC R
IPC: H01L21/762
Filed: 2001-10-31
Granted: 2002-11-01
Abstract: A method of forming a shallow trench isolation region in a silicon wafer which results in the elimination of long range slip displcations in the wafer and reduces leakage current across the isolation regions. Long shallow trenches are formed in a silicon wafer at a 45 degree angle to the (111) plane of the wafer. This is achieved by moving the primary flat of the wafer to the (100) plane prior to the formation of the trenches, which causes the bottom edges of the long trenches to intersect with several (111) planes, so that stresses do not propagate along any one single (111) plane. The trenches are then filled with an insulative material, such as oxide.
Patent TW-593195-B (TW)
Title: Multicomponent glass, glass fiber, twister and taper
Inventor: DOHMEN PETRUS JACOBUS MARIA
IPC: G02B6/00
Filed: 2001-11-15
Granted: 2004-06-21
Abstract: Cd-free multicomponent glass to be used in particular as core glass (2) in glass fibers for optical twisters and tapers, the glass being of the lanthanide flint type and comprising the following main constituents (in mol %): B2O3 20-70; ZnO 1-15; Lanthanide oxide 1-23; ZrO2, and/or HfO2 1-10; As2O3 0.1-0.3.