baber/WOPTO huggingface dataset:
Patent TW-411594-B (TW)
Title: A susceptor for a plasma CVD equipment, and the manufacture thereof
Inventor: SATOH KIYOSHI
IPC: H01L21/31
Filed: 1998-05-28
Granted: 2000-11-11
Abstract: Provided are a susceptor for a plasma CVD equipment, characterized in that the surface of the susceptor has raised and depressed portions which are continuously formed, and a steep protrusion is completely removed in the raised portion, and a method of roughening a surface of a susceptor for a plasma CVD equipment, which comprises a step of mechanically flattening the surface of the susceptor, a step of shot-blasting the surface of the thus-flattened susceptor, and a step of polishing the shot-blasted surface of the susceptor chemically, electrochemically and/or mechanically, a steep protrusion being completely removed from the surface of the susceptor, and an Ra value of the susceptor surface being 1 mu m <= Ra <= 8 mu m. Since the susceptor of the present invention reduces a rate of contact between a wafer substrate and the susceptor surface, adsorption due to charging can be prevented. Since the protrusion is completely removed from the surface of the susceptor, there is no fear of particle contamination due to abrasion. Since the Ra value of the susceptor surface is not changed due to abrasion upon using the susceptor of the present invention, the process stability is improved, and the film-forming treatment can be conducted with a high reproducibility.
Patent TW-408320-B (TW)
Title: The manufacture apparatus of light recording vector and the manufacture method
Inventor: TAKAKUWA ATSUSHI
IPC: B29C39/10
Filed: 1998-08-24
Granted: 2000-10-11
Abstract: A compact apparatus for the production of an optical recording medium by curing a curable resin (102b) between a substrate (101) and a casting mold (103) while reducing the time required for the transfer of the mold which is provided with a mold holding mechanism (2) for holding the mold (103), a conveyor mechanism (1) for conveying the substrate (101) coated with the resin (102b) to the mold (103) and placing the substrate (101) on the mold (103) in such a fashion that the coated surface of the resin (102b) opposes the mold (103), a resin curing mechanism (3) for curing the resin (102b) interposed between the mold (103) and the substrate (101) by the conveyor mechanism (1), and a peeling mechanism (4) for peeling the resin (102) cured by the curing mechanism (3) from the mold (103) together with the substrate (101).
Patent TW-388956-B (TW)
Title: Shallow trench isolation for semiconductor process
Inventor: LIOU YANG-NAN
IPC: H01L21/762
Filed: 1998-08-31
Granted: 2000-05-01
Abstract: The present invention provides shallow trench isolation (STI) method for semiconductor process. It is used to fill the shallow trenches between devices on the surface of a semiconductor wafer with a dielectric material to generate an electrical isolation, and as well avoid the dishing formation on the surface of the dielectric material in the shallow trenches after the chemical mechanical polishing. The method comprises the following steps. (1) Cover the surface of the semiconductor substrate with a dielectric material to form a first dielectric material in which the substrate has shallow trenches on it. The shallow trenches on the surface of the semiconductor wafer are filled up with dielectric material, and form corresponding pits of different size on the shallow trenches. (2) Form a second dielectric layer in each pit of the first dielectric layer. (3) Perform a planarization treatment on the surface of the semiconductor wafer to remove the second dielectric material layer in the pits on the surface of the first dielectric material, and substantially align the surface of the dielectric material in the shallow trenches with the surface of each device.
Patent TW-389889-B (TW)
Title: Recording medium loading device
Inventor: NAKAYAMA KEISUKE
IPC: G11B17/22
Filed: 1998-09-14
Granted: 2000-05-11
Abstract: According to the present invention, when a disk package P is mounted on a mounting region in a direction from an inserting inlet A1 to X1, then a corner part 1g is abutted upon a receiving part 14b of a shifting plate 14 and moves together from a position (a) to a position (b). In this case, a pushing up piece 14e of the shifting plate 14 presses a pressed up part of a contact structure 20 in the Z2 direction, so that the contact structure 20 is turned in the <beta>2 direction and there goes a sutuation change from (c) to (d). Accordingly, a contact 26a is abutted on a contact terminal 3 of the disk package P to form an electric connection. The abutting motion is made just before the completion of mounting of the disk package P, so the contact 26a slightly slides on a contact terminal 3. In this way, the contact 26a and the contact terminal 3 come to scrub with each other and are cleaned, and thus disorder such as false contact hardly occurs and a steady connection is achieved.
Patent TW-429192-B (TW)
Title: Method for cleaning the surface of bonding pad
Inventor: JOU YOU-CHIANG
IPC: B23K3/08
Filed: 1998-10-14
Granted: 2001-04-11
Abstract: A method for cleaning the surface of a bonding pad comprises, after the completion of etching the protective layer, using a chemical solution with a strong alkalinity to clean the surface of a bonding pad in order to remove possible contaminants remained on the surface of the bonding pad.
Patent TW-419624-B (TW)
Title: Mobile computer
Inventor: JENKINS MICHAEL DAVID
IPC: G06F1/18
Filed: 1998-11-11
Granted: 2001-01-21
Abstract: This invention provides a computer structure where any PC card used with the computer will be inserted and used in a housing where the entire PC card is enclosed and protected. This prevents the frequent damage of PC cards in conventional computer structures.
Patent TW-435048-B (TW)
Title: Dial pulse collection in a digital loop carrier
Inventor: CORNES MARTIN P J
IPC: H04Q1/30
Filed: 1999-01-21
Granted: 2001-05-16
Abstract: A telecommunications system includes an access terminal and multiple channel unit cards coupled to the access terminal. The channel unit cards are configured to sense on-hook/off-hook signals on subscriber lines coupled to respective ones of the channel unit cards. Each channel unit card is configured to process received on-hook/off-hook signals and to send a message-oriented signal to the access terminal. Each message-oriented signal includes a value representing a dialed digit corresponding to on-hook/off-hook signals received in the respective one of the channel unit cards.
Patent TW-469271-B (TW)
Title: Method for production of maleic anhydride
Inventor: TAKAYASU OSAMU
IPC: C07C51/215
Filed: 1999-02-12
Granted: 2001-12-21
Abstract: In the production of maleic anhydride by the contact of a raw material gas containing an aliphatic hydrocarbon of not less than 4 carbon atoms and molecular oxygen with a vanadium-phosphorus oxide catalyst, the raw material gas is caused to allow presence therein of nitrogen and an inert gas possession a thermal conductivity of not less than 800(10<SP>-4</SP>Wm<SP>-1</SP>K<SP>-1</SP>) at 700K. The gas formed by the oxidation reaction is allowed to contact an absorbent to effect recovery of the produced maleic anhydride. Maleic anhydride is recovered from produced oxidation reaction gas spearated from a remained oxidation reaction gas after recovering maleic anhydride, and the separated inert gas is circulated to the reaction zone. The catalyst capable of producing maleic anhydride with a high yield can be obtained by activating the vanadium-phosphorus oxide catalyst with the gas composition containing an inert gas possessing a thermal conductivity of not less than 800(10<SP>-4</SP>Wm<SP>-1</SP>K<SP>-1</SP>) at 700K.
Patent TW-482666-B (TW)
Title: Absorbent structure and product based on raw materials having a high degree of renewability
Inventor: LAGERSTEDT EIDRUP MARIE-LOUISE
IPC: A61F13/15
Filed: 1999-02-26
Granted: 2002-04-11
Abstract: The invention relates to an absorbent structure and an absorbent product, such as a nappy, an incontinence shield, a sanitary towel or the like, which product includes the absorbent structure. The absorbent structure includes a superabsorbent which has been produced from one or more hydrophilic monomers by free radical copolymerization in the presence of starch and/or chemically modified starch. During production of the superabsorbent, use has been made of a free radical initiator which forms three or more radical sites per molecule. The absorbent structure furthermore includes hydrophilic and/or hydrophobic fibres which, together with the superabsorbent, impart a hydrophilic character to the absorbent structure. In the dry state, the superabsorbent constitutes between 10 and 75% of the dry weight of the absorbent structure. The absorbent structure and the product are based on raw material having a high degree of renewability.
Patent TW-403979-B (TW)
Title: IC chip, IC structure, liquid crystal device, and electronic unit
Inventor: UCHIYAMA KENJI
IPC: G02F1/1345
Filed: 1999-03-17
Granted: 2000-09-01
Abstract: This invention provides a method to avoid the conductive particles contained in the anisotropic conductive film escaping from the humpy electrode of a IC chip, which causes an increase of the conduct particles stored in electrode surface when IC chip is on a substrate by anisotropic conductive film. The solving means: when comprising the inbuilt semiconductor, at the same time, a plural of bump electrodes 2 is exposed, the face of those electrodes 2 is pressed on a IC chip substrate 1 by anisotropic conductive bond, and the outside direction of at least one in those electrodes 2 is higher than the inside. When using the IC chip 1 to pressurize the anisotropic conductive film, the higher outside portion could prohibit the conduct particles contained in the anisotropic conductive film escaping towards the outer of the bump electrode 2, which increases the number of the conduct particle on the bump electrode 2 surface.
Patent TW-430700-B (TW)
Title: A polyester fiber and producing the same
Inventor: OGAWA TATSUYA
IPC: D01D5/24
Filed: 1999-03-18
Granted: 2001-04-21
Abstract: A polyester fiber composed of  a polyester comprising 90 mole% or more of polyethyleneterephthalate repeating unit, in which the single fiber has a W-shaped cross-sectional shape having a flatness value of from 2 to 4 as represented by a quotient obtained by dividing the lone side of the circumscribed quadrilateral of the W-shaped cross section by the short side thereof, is characterized in that the fiber exhibits the characteristic properties satisfying the following conditions (1) and (2): (1) 60% ≦ elongation at break ≦ 200%; (2) 45% ≦ boil-off shrinkage ≦ 70%. The polyester fiber is an improved pre-oriented fiber having characteristics enabling a draw false-twisting at a higher processing speed to produce a false-twist texturized yarn for making a fabric with an excellent water-absorbency. The polyester fiber can be prepared using a spinneret having specifically modified W-shaped orifices by a melt spinning process in which the following conditions are satisfied: (1) maintaining the surface of the spinnerete at a temperature of 285 DEG C or more; (2) cooling the extruded fibers to solidify by blowing a current of cooling air across the running fibers in the direction normal to the open side of the W-shaped orifices arrange over spinneret; (3) applying a finish oil to the fibers in an amount sufficient to form an finish oil film having a thickness of from 0.02 to 0.05 mu m on the  surface of the single fiber; and (4) subsequently winding the fiber yarn at a winding speed of from 3,000 m/min. to 4,500 m/min.
Patent TW-593764-B (TW)
Title: Method for selectively etching low k dielectrics
Inventor: YAN CHUN
IPC: H01L21/3065
Filed: 1999-04-12
Granted: 2004-06-21
Abstract: The present disclosure pertains to a method for plasma etching of low k materials, particularly polymeric-based low k materials. Preferably the polymeric-based materials are organic-based materials. The method employs an etchant plasma where the major etchant species are generated from a halogen other than fluorine and oxygen. The preferred halogen is chlorine. The volumetric (flow rate) ratio of the halogen: oxygen in the plasma source gas ranges from about 1:20 to about 20:1. The atomic ratio of the halogen: oxygen preferably falls within the range from about 1:20 to about 20:1. When the halogen is chlorine, the preferred atomic ratio of chlorine: oxygen ranges from about 1:10 to about 5:1. When this atomic ratio of chlorine: oxygen is used, the etch selectivity for the low k material over adjacent oxygen-comprising or nitrogen-comprising layers is advantageous, typically in excess of about 10:1. The plasma source gas may contain additives for the low k dielectric over an adjacent material, to provide a better etch profile, or to provide better critical dimension control, for example. When the additive contains fluorine, the amount of the additive is such that residual chlorine on the etched surface of the low k material comprises less than 5 atomic %.
Patent TW-414780-B (TW)
Title: A method for the regulation of the temperature of the heated air in an apparatus for the hot-air pasting of plastic films
Inventor: JAN BURGER
IPC: B31B50/64
Filed: 1999-04-20
Granted: 2000-12-11
Abstract: To regulate the temperature of the heated air in an apparatus for the pasting of plastic films having a rack having a table over which the workpieces are conveyed continuously by a conveyor apparatus, having a conveyor roller pair disposed in a gap of the table top and supported in the rack, consisting of a lower counter-pressure roller and an upper suction cylinder, having a conveyor cylinder acting together with the suction cylinder which successively transfers sections to the suction cylinder, and having a broad-slit nozzle directed to the roller gap which blows in a controlled manner heated air to the roller gap, the temperature directly after the pasting of the pasted region of the workpiece at which a good pasting occurs is determined as the nominal value and the temperature of the heated air is regulated to this nominal value.
Patent TW-372947-B (TW)
Title: Lead perovskite based ceramic compositions without any free lead oxide
Inventor: CHU MIKE SSU-HAI
IPC: C04B35/00
Filed: 1995-01-12
Granted: 1999-11-01
Abstract: A ceramic composition which comprises Pb(Mg1/3Nb2/3)O3 or the oxide precursor thereof, in admixture with barium copper oxide of the formula BaCuO2 as a sinter aid therefor. The compositions do not contain any free lead oxide and have high dielectric constant, e.g. above 8000, and low loss factor, e.g. below 3%.
Patent TW-454037-B (TW)
Title: Combustible gas with high combustion value
Inventor: CHEN HUNG-LIN
IPC: C10L3/12
Filed: 1999-06-11
Granted: 2001-09-11
Abstract: The present invention provides a combustible gas with a high combustion value, which is prepared by adding butane, pentane and hexane at a certain ratio into a light oil, and adding the mixture into a liquefied petroleum gas, thereby obtaining a saturated steam of a combustible gas having a high combustion value. When such a gas is mixed with a combustion assist in burning, the mixture has the characteristics of generating a large amount of heat, having a high flame temperature, and a short preheat time, as well as having a high safety and low cost.
Patent TW-430823-B (TW)
Title: Protected superconductor component and process for its production
Inventor: GAUSS STEPHAN
IPC: H01L39/16
Filed: 1999-08-09
Granted: 2001-04-21
Abstract: The invention relates to a high-temperature superconductor component with a particular cross-sectional area, which has a current-carrying section, the current-carrying section being in contact with a safety conductor in such a way that the critical current flowing on transition of the superconductor to normal conduction can be taken up without damage by the safety conductor in at least 1 second and rerouted, as well as a process for its production.
Patent TW-508375-B (TW)
Title: Alkaline degreasing liquid formetallic material and the method of using the same
Inventor: NAGASHIMA YASUHIKO
IPC: C23C22/78
Filed: 1999-08-31
Granted: 2002-11-01
Abstract: This invention relates to a new alkaline degreasing liquid for metallic material used in phosphate film forming process, in which water rinsing step after degreasing step can be eliminated. The degreasing liquid of the invention is characterized by containing 0.5 to 8 g/L of polyoxyethylenealkylether with HLB at 12 to 17, at least one sort of alkaline metal salt or ammonium salt and water, with total alkalinity at 1 to 15 points, and with pH at 8 to 13, and the method of the invention is characterized by contacting the metal with the said alkaline degreasing liquid, and then, without water rinsing, make the metal contact with the phosphate film formation liquid.
Patent TW-469176-B (TW)
Title: Processing of rain erosion resistant layer for aluminium phosphate ceramic base matrix composites
Inventor: CHEN HSIN-JEN
IPC: B05D3/00
Filed: 1999-10-08
Granted: 2001-12-21
Abstract: This invention provides the processing of rain erosion resistant layer for aluminium phosphate ceramic base matrix composites. The raw materials are alumina, silicon oxide ceramic and alumina phosphate ceramic resin. The optimal composition of the raw materials is adjusted and mixed homogeneously. The mixture is coated onto the surface of the alumina phosphate base matrix composite. A dense layer with rain erosion resistance is then obtained after the coated composite is impregnated with silicone resin for resin sealing and thermally treated. This dense ceramic layer can reduce rain erosion rate at least for 100 times and, therefore, can improve the rain erosion resistance of aluminium phosphate base ceramic composite for the microwave application.
Patent TW-493341-B (TW)
Title: An auto-focusing algorithm using discrete wavelet transform
Inventor: ACHARYA TINKU
IPC: G02B7/28
Filed: 1999-10-21
Granted: 2002-07-01
Abstract: What is disclosed is a method that includes generating an overall sharpness parameter for a given focus position by performing a discrete wavelet transform upon an image captured by an imaging device and automatically focusing said imaging device to an optimal focus position by comparing a plurality of different sharpness parameters. The optimal focusing position is automatically determined by finding the highest sharpness parameter for a given scene.
Patent TW-424009-B (TW)
Title: Rolling mill
Inventor: OCHI SHIGEHARU
IPC: B21B13/10
Filed: 1999-11-03
Granted: 2001-03-01
Abstract: A rolling mill comprising a roll unit and a drive unit for driving the roll unit. The drive unit comprises an outer housing, a pair of large-diameter ring-like driving bevel gears disposed concentric with the pass line, an input shaft mechanism for rotating the driving bevel gears, and transmission mechanisms for transmitting the torque of the driving bevel bears to the rolls. Each transmission mechanism comprises a small-diameter transmission bevel gear caught between and engaging with the driving bevel gears and first and second transmission shafts for transmitting the torque of the transmission bevel gear to a roll. The drive and roll units are coupled and uncoupled by couplings. Four positioning parts are formed on the outer periphery of the inner housing of the roll unit. The outer housing of the drive unit is generally in the shape of a ring, and four positioning parts are formed on the inner periphery of the outer housing. When the inner housing is fitted into the outer housing, the inner housing is positioned in the outer housing by the positioning parts laterally and longitudinally and also in both directions of the pass line by stoppers and hold-downs.
Patent TW-581719-B (TW)
Title: Processes of mixing, compatibilizing, and/or recycling blends of polymer materials through solid state shear pulverization, and products by such processes
Inventor: FURGIUELE NAOMI
IPC: B29B13/10
Filed: 2000-01-18
Granted: 2004-04-01
Abstract: A method of making polymeric particulates wherein polymeric scrap material, virgin polymeric material and mixtures thereof are supplied to intermeshing extruder screws which are rotated to transport the polymeric material along their length and subject the polymeric material to solid state shear pulverization and in-situ polymer compatibilization, if two or more incompatible polymers are present. Uniform pulverized particulates are produced without addition of a compatibilizing agent. The pulverized particulates are directly melt processable (as powder feedstock) and surprisingly yield a substantially homogeneous light color product. The pulverized particulates also can be more intimately mixed than mixtures which are provided by only melt mixing, and can be melt processed without a significant delay in achieving phase inversion. The pulverized particulates also provide a stable microstructure.
Patent TW-443945-B (TW)
Title: Biaxially oriented polyethylene film with improved optics and sealability properties
Inventor: SU TIEN-KUEI
IPC: B32B27/32
Filed: 1999-11-22
Granted: 2001-07-01
Abstract: Methods of preparing biaxially oriented polyethylene films with improved optics and sealability properties are provided. The methods include stretching in the machine direction a multi-layer base sheet having a core layer with a first and a second side, at least one skin layer and outer surfaces; then coating at least one of the outer surfaces with a resin selected from the group consisting of low density polyethylene, very low density polyethylene, linear low density polyethylene and blends thereof; and finally, stretching the base sheet in a direction transverse to the machine direction.
Patent TW-457144-B (TW)
Title: Method and apparatus for forming parts from a continuous stock material and associated forge
Inventor: BIEDERMAN RONALD R
IPC: B21K27/02
Filed: 1999-12-18
Granted: 2001-10-01
Abstract: The present invention provides a method and apparatus for forming a plurality of parts, such as spade-type boring bits, from a continuous stock material. Thus, the various steps of the forming method of the present invention can be performed to predetermined portions of the continuous stock material prior to separating the continuous stock material into discrete parts, thereby enhancing the efficiency of the forming process. The present invention also provides an improved forge for forming portions of the continuous stock material into parts having a predetermined shape. The forge can be designed to provide a clearance region proximate the forward end of the ram to permit slight flexing of the forward end of the ram in a radially outward direction during forging operations. The forge can also include a lubrication system for lubricating its various components. In addition, the forge can incrementally rotate the ram after one or more parts have been forged. By repeating the incremental rotation of the ram, the forge will eventually rotate the ram a full 360 DEG. An improved forging die is also provided which includes a back surface having a conical medial section and a pair of conical lateral sections that are recessed relative to the medial section such that forces will principally be applied to the medial section during forging operations.
Patent TW-555611-B (TW)
Title: Power source device for discharge surface treatment, and method therefor
Inventor: GOTO AKIHIRO
IPC: B23H1/02
Filed: 2000-01-18
Granted: 2003-10-01
Abstract: When the discharge current is supplied with a first pulse width T1, switching elements (10) are controlled by control means (11) so that a predetermined amount of electrode material is supplied, a first peak value Ip1 is adjusted to a predetermined one, the electrode material is released, and an electrode component (15a) is made to adhere to a work (2). When the discharge current is supplied with a second pulse width T2, a second peak value Ip2 is so adjusted that the release of the electrode material can be controlled and the electrode component (15a) adhering to the work (2) can be melted, the electrode component (15a) is thus melted, and a hard coating made from the melted electrode component (15b) is formed on the work (2). The hard coating is a good coating containing crystallite particles.