baber/WOPTO huggingface dataset:
Patent JP-H0467333-A (JP)
Title: Optical disk and method and apparatus for producing this disk
Inventor: ARAI YUJI
IPC: G11B7/24047
Filed: 1990-06-30
Abstract: PURPOSE:To obtain the optical disk which is hardly flawed even if the disks are stacked by subjecting the angle part between the peripheral surface and main surface of a light-transmissive substrate to chamfering. CONSTITUTION:At least the angle part between the peripheral surface 95 and main surface 97 of the light-transmissive substrate 91 of the optical disk formed with at least a layer 93 for protection on the light transparent substrate 91 is subjected to the chamfering 94. Since the angle part between the peripheral surface 95 and main surface 97 of the optical disk is subjected to the chamfering 94 in such a manner, the angle formed by the peripheral surface 95 and the main surface 97 is not perpendicularly steep. The optical disk which is hardly flawed is obtd. in this way.
Patent JP-H0467310-A (JP)
Title: Magnetic head
Inventor: HARA TAKANORI
IPC: G11B5/31
Filed: 1990-06-29
Abstract: PURPOSE:To obtain output corresponding to a film thickness for a prescribed track width by obliquely forming soft magnetic thin films in the gap direction and forming a part forming the track width with an angle larger than the other part for a gap. CONSTITUTION:A head chip 10 having high saturated magnetic flux density is formed in such a way that grooves 5 having groove wall surfaces whose upper part is at an acute angle compared to a lower part for the bottom of a substrate 1 by a prescribed pitch method are continuously formed on the surface of the substrate 1. The soft magnetic thin films 2 in a prescribed film thickness are formed by a vacuum evaporation or sputter method on one groove surface of respective grooves 5. Thus, the soft magnetic thin films 2 are obliquely formed for the gap 12 and the part forming the track width is formed with the angle larger than the other part for the gap 12. Thus, output corresponding to the film thickness for the track width can be obtained.
Patent JP-2000012565-A (JP)
Title: Semiconductor device manufacturing process
Inventor: OKUTSU FUMITAKE
IPC: H01L21/50
Filed: 1998-06-22
Abstract: PROBLEM TO BE SOLVED: To provide a semiconductor device manufacturing process wherein warp age change is not developed and coplanarity is not degraded. SOLUTION: In the manufacturing process, heat treatment which is relevant to mounting reflow in a user after shipment is carried out before lead molding, after sealing aging or before coplanarity amendment. Concretely, reflow or aging process X is added between a BT(bias test) process 2 and a lead molding process 3 or between the lead molding process 3 and a shipment process 4, in a semiconductor device manufacturing process including each of processes for package(PKG) cutting separation 1, selection/BT 2, lead molding 3, shipment 4 and mounting reflow 5.
Patent JP-S5875120-A (JP)
Title: Electronic control shutter circuit
Inventor: MIYAKE TOSHIHIDE
IPC: G03B7/087
Filed: 1981-10-29
Abstract: PURPOSE:To execute a proper exposure control without being influenced by variations of an optical conductive body such as CdS, by varying a current supplied to each transistor of a shutter circuit. CONSTITUTION:A photometric current mirror circuit is formed by a transistor (TR) Q1 in which the collector connected to the base has been connected to photometric CdS, a TR Q2 in which the collecter connected in series to said TR has been connected to the first current source Z1 and the collector has been connected to the base, a capacitor C1 by which the collector is charged in accordance with photometric voltage, a TR Q3 connected to the base CdS, a TR Q4 in which the collector connected in series to said TR and receiving a current supplied from the second current source Z2, etc. In this state, a shutter second time is controlled through the capacitor, a comparator COM to which a reference value has been set, etc. When a current supplied to the TRs Q2, Q3 from the electric power supplies Z1, Z2 is varied in accordance with a ratio gamma of logarithmic intensity of illumination of this CdS and a logarithmic resistance value corresponding to intensity of illumination, a proper exposure control is executed without being influenced by variations of the characteristics of CdS, etc.
Patent JP-H0223705-A (JP)
Title: Amplifier circuit
Inventor: FUNABASHI HIROYUKI
IPC: H03F1/34
Filed: 1988-07-13
Abstract: PURPOSE:To eliminate a capacitor for oscillation prevention by providing a shunt circuit in a feedback circuit which is added to a buffer amplifier driving an output transistor and directly supplying the circuit current to the base of the output transistor from the buffer amplifier with a driving current. CONSTITUTION:A current I2 corresponding to a first current I1 flowing into the collector C of a transistor TR31 can be obtained by TR39 which constitutes a current mirror circuit with TR37. The current I2 is supplied with the base driving current ID in an output transistor TR12 from the collector of TR39. Since the current I2 is supplied from the feedback circuit FB to the driving current ID being the output current of the buffer amplifier 3 through the shunt circuit SC, the feedback current of the circuit FB jis suppressed for the amount and the amplification gain of a full feedback amplifier consisting of the amplifier 3 and TR12 is suppressed. Consequently, oscillation can be suppressed by the suppression of the amplification gain of the feedback amplifier and the driving capacity of output TR12 can be improved. Since oscillation is suppressed, the capacitor for oscillation prevention can be facilitated.
Patent JP-S59135516-A (JP)
Inventor: IENSU IERUGEN MERUBEKU
IPC: F24D19/10
Filed: 1983-09-22
Abstract: (57)【要約】本公報は電子出願前の出願データであるた め要約のデータは記録されません。
Patent JP-H1014571-A (JP)
Title: Mutagenesis, mutagenic gene, transgenic organism and its production
Inventor: OGATA NORIO
IPC: C12N15/00
Filed: 1996-07-04
Abstract: PROBLEM TO BE SOLVED: To obtain an organism to which mutation is induced by introducing a mutator gene obtained by polymerizing deoxyribonucleoside in the presence of a protein with no template nor primer into cells so as to provide the organism with diversity of mutation while suppressing damage to the organism. SOLUTION: This mutation-induced transgenic organism having diversity of mutation is obtained by introducing into a mutator gene a DNA obtained by polymerizing a deoxylibonucleoside in a reaction system in which no template nor primer is present at approximately 20-70 deg.C in the presence of a protein composed of thermostable DNA polymerase originating from cells which belong to Cellumococcus or Cellumus bacteria, transplanting the mutator gene- introduced cells into an oviduct or uterus of an adaptive mother being in pseudopregnant condition, or otherwise into an uterus after the cells are cultured in vitro so as to grow to a morula or blastocyst, thereby increasing the size of the genome DNA in condition where the damage to the objective organism is suppressed.
Patent JP-S6066545-A (JP)
Title: Synchronous general optimum receiver
Inventor: NAMEKAWA TOSHIHIKO
IPC: H04L25/03
Filed: 1983-09-21
Abstract: PURPOSE:To adjust a synchronous optimum receiver, where a function table is addressed in accordance with the contents of a receiving signal and synchronizing pattern data and specific functional data read out from the table is used to perform a maximum likelihood test, with a simple digital circuit prepared for adjusting. CONSTITUTION:The probability density function P(Z) of noise of an objective communication line is preliminarily analyzed and grasped, and the logP(Z) obtained by the logarithmic conversion of this function is stored as a function table 3 in a memory. When the function table 3 is addressed by the output of a subtracting circuit 7, data logP(Xn-S2n) and data logP(Xn-S1n) are read out alternately from the table 3. This data passes a code inverting circuit 8 and is inputted to a totaling circuit 9. The totaling circuit 9 accumulates input data successively and is reset by the output B of a decoder 6. A discriminating circuit 10 compares data (y), which is outputted from the totaling circuit 9 then, with 0 synchronously with the output A of the decoder 6 to output demodulated data RD.
Patent JP-S5963563-A (JP)
Title: Automatic ultrasonic flaw detector of solid member
Inventor: YAMAMOTO EIJI
IPC: G01N29/26
Filed: 1982-10-05
Abstract: PURPOSE:To eliminate the need for a driving mechanism for a probe, to reduce the size and cost of a device, and to improve a flaw detection speed and precision by switching and scanning the probe group in a probe array successively, performing transmission and reception delay for obtaining a ultrasonic wave beam characteristics to detect a fault autmatically on the basis of a receive composite signal. CONSTITUTION:The light probe groups which regard the reference position of the probe array 10 as a starting position are connected to a transmission part 20 and a preamplifier 24 selectively. Then, a signal generator 16 outputs a trnsmission control signal for focus flaw detection and oblique focus flaw detection successively and a transmit pulse signal under the delay control of a transmission delay circuit 18 is supplied from a transmission part 22 to a probe group selected in the probe array 10 to perform the focus flaw detection of a round billet by vertical flaw detection; and the oblique focus flaw detection is switched to and carried out eventually. A reflection echo is brought under the delay control of a reception delay circuit 26 and added together by an adder 28; and the composite signal is converted into a digital signal after distance amplitude correction, and further to calculate and record and detect the defects over the entire circumference of the round billet.
Patent JP-S5882893-A (JP)
Inventor: KITAO JIYUNICHI
IPC: B67D7/12
Filed: 1981-10-31
Abstract: (57)【要約】本公報は電子出願前の出願データであるた め要約のデータは記録されません。
Patent JP-H0841173-A (JP)
Title: Liquid epoxy resin composition, its production and method of curing same
Inventor: FUKUI TARO
IPC: H01L23/29
Filed: 1994-07-27
Abstract: PURPOSE:To obtain a liquid epoxy resin composition having low viscosity and being excellent in handleability, humidity resistance, etc., by mixing an epoxy resin with a curing agent containing a specified compound and an acid anhydride and fused silica. CONSTITUTION:This composition is produced by mixing an epoxy resin (A) (e.g. bisphenol A epoxy resin) with a curing agent (B) containing a naphthalene- skeleton-containing compound (B) represented by the formula and an acid anhydride and fused silica (C). It is desirable that the amount of component C is 10-80wt.% based on the total weight of the composition, that the particle diameter of component C is 20mum or above and that the content of particles having a diameter of 20mum or above and a specific gravity of 0.7-1.5 is at least 50vol.% based on the total amount of particles having diameters of 20mum or above. This composition can be desirably used to form a sealed resin layer by spot sealing and can give a cured product having reduced warpage and high reliability.
Patent JP-S6332846-A (JP)
Title: Electron gun
Inventor: SUGANUMA TADAO
IPC: H01J37/067
Filed: 1986-07-25
Abstract: PURPOSE:To prevent the position of a cathode from being changed to use this device normally for a long period, by providing a cathode and membera for gripping this cathode, and by equipping these gripping members with a mechanism preventive of a position shift of the cathode across the direction in which the gripping members grip the cathode. CONSTITUTION:A cathode 2 made of lanthanum hexa-boride is formed columnarly with its top end being machined conically. A passing hole 3a whose inner diameter is much larger than the diameter of the cathode 2 is formed in a machining process in the central part of a rectangular parallelepiped-shaped heating member 3 made of thermally-decomposed graphite, and then the columnar part of the cathode 2 is inserted into the passing hole 3a. The heating member 3 made of thermally-decomposed graphite is formed of laminated layers, having elasticity in the direction of lamination. Therefore, when both ends of a carbon body 3 are gripped by means of supporting electrodes 4 and 104 and pressed in the directions shown in arrows, the heating member 3 is compressed to be deformed and pressured in contact with the columnar plane of the cathode 2, with gaps 36 being left, sc that the cathode 2 is perfectly gripped. Hence, the parts shown in 3c in the heating member 3 function preventive of a position shift of the cathode.
Patent JP-S6066282-A (JP)
Inventor: ARIMA IWAO
IPC: C08L3/00
Filed: 1983-09-20
Abstract: (57)【要約】本公報は電子出願前の出願データであるた め要約のデータは記録されません。
Patent JP-H085028-A (JP)
Title: Porous nozzle on which foreign matter do not adhere
Inventor: HISASHI KOBAYASHI
IPC: F23D14/50
Filed: 1995-06-20
Abstract: PURPOSE: To enable gas injection with the least adhesion of foreign materials by providing with at least one passageway to flow a first part of gas to the front part and a porous body part flowing a second part of the gas to the front part, and enabling it to flow to the front part of the nozzle. CONSTITUTION: A porous nozzle 1 has a front part 2 of a predetermined length L having a front part 3 and is arranged with one or more passageways 4 piercing through the length of it. The ratio of the diameter d1 of the passageway 4 to the diameter d2 of the front surface 3 is set to be 0.05 to 0.8. A porous body 11 is arranged around the passageways 4 of the front part 2. The porous body 11 comprises monolithic ceramic and sintered metal, and there will be cases of surrounding it with a non-porous material. In the use of it, the gas is introduced to the back part of the nozzle from a gas feeding source, injected from the front surface with the first part of the gas flowing through the passageways 4 and the second part of the gas flowing through the porous body 11, ignited and combusted.
Patent JP-S5877501-A (JP)
Title: Method and device for hot hydrostatic pressure treatment
Inventor: ICHIKIZAKI TETSUO
IPC: B22F3/14
Filed: 1981-11-04
Abstract: PURPOSE:To perform titled treatment inexpensively with good temp. uniformity by heating and pressurizing an object to be treated by means of a molten pressure medium which fills the inside of a heating vessel disposed in the heat insulating chamber in a pressure resistant vessel. CONSTITUTION:After an object 12 to be treated is carried onto the hearth 11 in a heating vessel 18, a heat insulating layer 5 is put in a pressure resistant vessel 30 and a top cover 2 is closed, then electricity is conducted to a heater 7 to preheat the device. A molten pressure medium 13 is admitted into the inside 20 of the heating vessel. After the object 12 to be treated is suck thoroughly in the medium 13, a sluice valve 23 is closed and a gas of high pressure is fed under pressure into the high pressure chamber 15 in the vessel 30 through a supply hole 10 for the gaseous pressure medium and conduction of electricity to the heater 7 is started. The medium 13 is heated by controlling the electric power supplied to the heater 7 and the object 12 is heated via the medium 13. At the same time, pressure is acted upon the object 12 via the medium 13 by the force feeding of the gas whereby the object is subjected to a hot hydrostatic pressure treatment.
Patent JP-S6151740-A (JP)
Title: Ion implantation device
Inventor: WAKE SETSUO
IPC: H01L21/266
Filed: 1984-08-21
Abstract: PURPOSE:To improve both the accuracy of the pattern of an impurity ion implantation layer and the accuracy of the amount of impurity ion implantation by installing in the same vacuum chamber an irradiator used to irradiate far ultraviolet rays upon the resist film of the wafer, an impurity ion implantation device and a transfer mechanism. CONSTITUTION:A wafer 50 is extracted through an auxiliary exhaust chamber 7 and placed on a transfer base plate 2 before being stopped by the end of a wafer stopper 4a. Then, the light of a far ultraviolet ray lamp 5 is irradiated upon a mask resist film on the main surface of the wafer 50 to degas and harden the resist film. Next, when the end of the wafer stopper 4a is buried in the transfer base plate 2, the wafer 50 glides over the surface of the transfer base plate 2 before being stopped by the end of a waver stopper 4b. Next, an impurity ion implantation layer is formed by irradiating an impurity ion beam from the X direction while using the resist film as a mask. After that, when the end of the wafer stopper 4b is buried in the transfer base plate 2, the wafer 50 is removed outside the device through an auxiliary exhaust chamber 8.
Patent JP-S6151865-A (JP)
Title: Semiconductor device
Inventor: TERAO NOBORU
IPC: H01L27/01
Filed: 1984-08-21
Abstract: PURPOSE:To obtain a semiconductor device, dielectric strength thereof does not lower, by forming a thick film section to one part of an silicon oxide film and shaping a polysilicon layer onto the thick film section. CONSTITUTION:A thick film section is formed to one part of an silicon oxide film 2 to constitute a surface projecting section 5, and a polysilicon layer 3 in approximately the same size as the projecting section 5 is shaped onto the projecting section 5. The surface projecting section 5 is formed through a photoengraving technique. Stress is generated in a contacting section 4 between the polysilicon layer 3 and the surface projecting section 5 of the silicon oxide film 2 in the same manner as conventional devices, but large stress as seen in conventional devices is not generated because the silicon oxide film 2 in the contacting section takes a projecting shape, and defects and cracks do not reach the main body section of the silicon oxide film 2 even when they are generated in the surface projecting section 5 by stress. Consequently, dielectric strength between the polysilicon layer 3 and a semiconductor base body 1 does not lower. The lowering of dielectric strength due to stress is at issue in a bonding pad section for connecting electrodes or a high-voltage applying section, and the polysilicon layer 3 need not be formed in approximately the same size as the surface projecting section 5 in other sections.
Patent JP-H06188850-A (JP)
Title: System and equipment for data transfer
Inventor: IWAI TAKUMI
IPC: H04J3/06
Filed: 1993-07-15
Abstract: PURPOSE:To receive the status or the like of a main equipment and other slave equipments even by the slave equipment itself outputting information for specifying a data transmission source by the main equipment and fetching data sent out from the equipment pertinent to the information by the other equipment. CONSTITUTION:The main equipment MA is provided with a data memory MAa for storing the data to be transmitted/received and a transmission number generation part MAb for generating the signals (transmission numbers) of numbers for specifying the equipment to be a data transfer source. The main equipment MA and the slave equipments SA0, SA1...SAX are connected by signal lines L1, L2 and L3 and a clock CLK and a frame pulse FP are respectively supplied from the main equipment MA through the signal line L3 to the respective slave equipments. Also, transfer data TD are transmitted/received among the respective equipments including the main equipment MA through the signal line L3. Then, the main equipment MA outputs the transmission number of the equipment to be the data transmission source, the equipment pertinent to the transmission number sends out the data provided in the equipment itself, the other equipment fetches the data and thus, the data are transferred among the respective equipments.
Patent JP-S6332106-A (JP)
Title: Speed governing system change-over device
Inventor: KAWAI TAKUMI
IPC: F01D19/00
Filed: 1986-07-28
Abstract: PURPOSE:To hold down the load fluctuation to a minimum by causing a flow conversion and changeover function to be exercised, when the speed governing system is changed over, in such a manner that the amount of change in the steam flow in multiple valves is always shared among the valves in the same ratio to the amount of the whole change. CONSTITUTION:Load commands LR from a basic control facility 1 are inputted by means of throttle governing cam characteristics 2alpha, 2beta and nozzle cut-out governing cam characteristics 3alpha, 3beta into a steam flow coversion functions 4alpha, 4beta. The output of the conversion functions 4alpha,4beta and signals from change- over ratio signal generators 9, 10 are multiplied by means of a multiplier 5, and then, control signals are transmitted by means of an opening inverse operation functions 7alpha, 7beta to valve position control circuits 8alpha, 8beta. When the speed governing system is changed over, the steam flow command signals for each valve are divided at a fixed ratio in accordance with the signals from the change-over ratio signal generators 9, 10 before they are transmitted to the opening inverse operation functions 7alpha, 7beta.
Patent JP-H0784413-A (JP)
Title: Electrophotographic carrier
Inventor: SATO YOSHIHIRO
IPC: G03G9/113
Filed: 1993-06-24
Abstract: PURPOSE:To unnecessitate the replenishment of carrier at the time of running, to stabilize the electrostatic property at the time of running and humidity fluctuation and to improve a developing property and the service life of a developer by incorporating polycarbonate resin into binder resin. CONSTITUTION:The binder resin is incorporated with the polycarbonate resin. And coating resin is incorporated with the polycarbonate resin having the crystallinity of <=0.25. The binder resin of a magnetic dispersion system carrier is incorporated with polydiorganosiloxane-polycarbonate block copolymer expressed by the formula. In the formula, (x) and (y) are the ratio of copolymerization, R1-R8 are hydrogen, halogen atom or lower alkyl group independently, R9 and R10 are 1C-3C alkyl or phenyl group independently, A is O, S, alkylidene group, etc., and the alkylidene group may have one ring structure together with.
Patent JP-S6332784-A (JP)
Title: Small-sized tape cassette
Inventor: HIRAYAMA HIROMICHI
IPC: G11B23/087
Filed: 1986-07-26
Abstract: PURPOSE:To open a cover without providing a new lock releasing means to the side of device to be mounted by providing a lock releasing projection projected from the side face of a cassette enclosure to the locking piece of the cover. CONSTITUTION:The rear end 16d of the locking piece 16 to be deformed elastically locking a cover 4 is fitted to the supporting part 18 of a cassette half 3A and the locking part 16c of the other end is engaged with the engagement 4a of the cover 4. Then the lock releasing projection 16e is provided to the outer side face of a locking piece main body 16a and projected outward from the side face of the cassette enclosure. In mounting the cassette 13 to the side of device, the projection 16e is depressed by a holder inner wall 21 to release the lock of the cover 4. Thus, it is not required to provide newly a releasing means to the device side to simplify the device.
Patent JP-S58216231-A (JP)
Inventor: KOKU YAN CHIYAN
IPC: G03B11/04
Filed: 1982-10-06
Abstract: (57)【要約】本公報は電子出願前の出願データであるた め要約のデータは記録されません。