baber/WOPTO huggingface dataset:
Patent TW-201535512-A (TW)
Title: Semiconductor device manufacturing method and semiconductor device manufacturing apparatus
Inventor: YAEGASHI HIDETAMI
IPC: G03F7/20
Filed: 2015-01-30
Abstract: A manufacturing a semiconductor device of the present disclosure includes coating a photosensitive material on a workpiece; exposing the photosensitive material using a first exposure mask; performing a positive-tone development on the photosensitive material using a first developer after the first exposing; exposing the photosensitive material using a second exposure mask after the first developing; and performing a negative-tone development on the photosensitive material using a second developer after the second exposing.
Patent TW-201628956-A (TW)
Title: Slip ring and support type reverse universal slip shaft using the same
Inventor: ZHAO LING-ZE
IPC: B65H18/16
Filed: 2015-02-06
Abstract: The present invention discloses a slip ring and a support type reverse universal slip shaft using the same, wherein the slip ring comprises a shaft tube group, a pushing ring, a sliding seat group and a bearing, the peripheral edge of the shaft tube group is slidably sleeved by the pushing ring, the sliding seat group and the bearing in sequence, the bearing is fixedly arranged, in collaboration with a flange cover, at the peripheral edge of the shaft tube group and is used for limiting the pushing ring and the sliding seat group; an outer ring sleeve for sleevedly linking the pushing ring and the sliding seat group is suspended and supported by the bearing; the sliding seat group is provided with a plurality of sliding blocks penetrating and extending to the outer side of the outer ring sleeve in a normal state; and when the slip ring is triggered by an air pressure, all the sliding blocks are submerged into the outer ring sleeve. Due to adoption of the above-described structure in conjunction with regulation of air pressure, all the sliding blocks can provide high and low tension requirements respectively in response to a corresponding implementation requirement.
Patent TW-201628674-A (TW)
Title: Ceiling guidance escape system
Inventor: CHEN HSIEH-PING
IPC: A62B3/00
Filed: 2015-02-09
Abstract: The present invention discloses a ceiling guidance escape system, comprising a plurality of guidance devices and an alarm device. The guidance devices are electrically connected with each other according to a predetermined sequence. Each guidance device comprises a detector and a guidance module. The detector is used to detect a disaster of a disaster field and then generate a disaster signal. The guidance device which is nearby the disaster field will be actuated according to the disaster signal. The alarm device is electrically connected the detector of each guidance device for generating an alarm sound according to the disaster signal. When the guidance device near by the disaster field is actuated, the present invention actuates the neighboring guidance devices of the guidance device nearby the disaster field in sequence to show an escape direction.
Patent TW-201541540-A (TW)
Title: Substrate processing apparatus
Inventor: SHIN DONG-HWA
IPC: H01L21/67
Filed: 2015-03-11
Abstract: Provided is a substrate processing apparatus. The substrate processing apparatus of the present invention includes a process chamber including a lower chamber with a top side opened and an upper chamber sealing the opened top side of the lower chamber, a support member installed within the lower chamber and on which a plurality of substrates are disposed on the same plane, exhaust members disposed on a bottom surface of the upper chamber facing the support member and extended radially from a center of the upper chamber; reaction cells, each of which has a fan shape, disposed on the bottom surface of the upper chamber, the reaction cells having reaction spaces partitioned by the exhaust members; and a showerhead unit installed on the reaction cell to supply a processing gas onto a substrate, wherein the exhaust member includes first side exhaust holes defined in a side surface thereof, and the reaction cell includes second side exhaust holes defined in an arc portion of the fan shape of the reaction cell to form an exhaust flow in all directions from a center of the reaction space.
Patent TW-201544439-A (TW)
Title: Wire feeding amount adjusting apparatus
Inventor: IMAI SHIGERU
IPC: B65H77/00
Filed: 2015-03-12
Abstract: The disclosure provides a wire feeding amount adjusting apparatus, which may maintain the tension and the feeding amount without complicated structure and therefore maintenance may be easily performed and the cost may be decreased. The wire feeding amount adjusting apparatus of the disclosure includes: a driving shaft 21 and a driven shaft 22; a primary roll 23, disposed on the driving shaft 21; a secondary roll 24, disposed on the driven shaft 22; a transmitting member 25, frictional contacting with the primary roll 23 and the secondary roll 24 and transmitting a driving force; a feeding roll 26, disposed on the driven shaft 21 and feeding a wire M; and a swinging member 40, moving the transmitting member 25, wherein when the transmitting member 25 moves, the driven force transmitting ration from the primary roll 23 to the secondary roll 24 varies.
Patent TW-201545172-A (TW)
Title: Ferromagnetic metal nanowire dispersion and production method thereof
Inventor: TAKEDA HIROTAKA
IPC: C09D7/62
Filed: 2015-04-20
Abstract: The present invention provides a ferromagnetic metal nanowire dispersion having an excellent dispersibility, from which a ferromagnetic metal nanowire film having an excellent electrical conductivity can be made. The present invention relates to a ferromagnetic metal nanowire dispersion comprising a ferromagnetic metal nanowire and a polymer compound.
Patent TW-201620094-A (TW)
Title: Semiconductor border protection sealant
Inventor: ZHAO SAM ZIQUN
IPC: H01L21/56
Filed: 2015-04-23
Abstract: A semiconductor package includes a semiconductor unit containing an active circuitry layer. The semiconductor package also includes a plurality of bonding pads on the active circuitry layer, which are configured to be connected to corresponding external conductive connectors. The semiconductor package also includes a protective sealant coating filling grooved edges of the active circuitry layer. The protective sealant coating contains an exterior wafer-singulated surface.
Patent TW-201546787-A (TW)
Title: Display device
Inventor: KONG JI-HYE
IPC: G09G3/20
Filed: 2015-06-10
Abstract: A pixel, a display device including a plurality of pixels, and a method of driving the display device. The display device includes: an emission pixel comprising an emission device, the emission pixel being in a display area; a dummy pixel in a non-display area outside the display area; and a repair line that is connectable to the emission device of the emission pixel and the dummy pixel, wherein the dummy pixel includes: a first dummy driver for receiving a same data signal as the data signal applied to the emission pixel for each of a plurality of subfields of one frame and controlling emission of the emission device of the emission pixel via the repair line; and a second dummy driver for resetting the repair line in one of the subfields in which the emission device does not emit light.
Patent TW-201643258-A (TW)
Title: Control method of carburizing heat treatment
Inventor: HUANG CHIA-HUNG
IPC: C21D11/00
Filed: 2015-06-12
Abstract: This invention discloses a control method of carburizing heat treatment to solve a problem of a poor carburizing effect of the known micro-manufacture components. The control method is executed by a computer system and comprises steps of acquiring appearance features of a machine component; and reading at least one control parameter about the machine component from a database based on the appearance features, to execute a processing of carburizing heat treatment for the machine component based on the control parameter. Thus, it can actually resolve the said problem.
Patent TW-201608630-A (TW)
Title: Method for polishing silicon wafer, polishing composition, and polishing composition set
Inventor: TSUCHIYA KOHSUKE
IPC: H01L21/304
Filed: 2015-06-18
Abstract: Provided is a method for polishing a silicon wafer with which it is possible to effectively realize a high grade surface. The provided method for polishing a silicon wafer includes an intermediate polishing step for polishing using a polishing slurry (Sp) that contains abrasive grains, and a final polishing step for polishing using a polishing slurry (Sf) containing abrasive grains. A substance having a relative haze (Hp) that is more than 100% and less than 680% of the relative haze (Hf) of the polishing slurry (Sf) is used as the polishing slurry (Sp).
Patent TW-201615575-A (TW)
Title: Breaking device, method for installing breaking blade on breaking device and breaking blade cartridge
Inventor: Mitani takuro
IPC: C03B33/027
Filed: 2015-06-23
Abstract: The present invention provides a breaking device in which a breaking blade can be easily and accurately installed. The breaking device breaks a brittle-material substrate by making the breaking blade abut against the brittle-material substrate, and comprises a breaking blade cartridge which is removable from the breaking device under the condition the breaking blade is installed and fixed, and the breaking blade is in "installed" status by installing the breaking blade cartridge, in which the breaking blade is installed and fixed, in an installing portion of the device. The present invention is capable of easily and accurately installing the breaking blade.
Patent TW-201541887-A (TW)
Title: Methods and apparatus for reducing overhead for NFC data exchange protocol messages
Inventor: HILLAN JOHN
IPC: H04B5/00
Filed: 2013-10-17
Abstract: A method, an apparatus, and a computer program product for wireless communication are provided in connection with improving NDEF message processing. In one example, a communications device is equipped to determine, based on one or more contextual factors, that data received at a NFC device is missing at least a portion of a NDEF header, and generate a complete NDEF message by adding the missing portion of the NDEF header. In another example, a communications device is equipped to receive a complete NDEF message that includes a NDEF header and data and is intended to be written on a remote NFC device, determine, based on one or more contextual factors, that the remote NFC device is configured to receive a modified version of the complete NDEF message, and generate the modified version of the complete NDEF message by removing at least a portion of the NDEF header.
Patent TW-201706108-A (TW)
Title: Processing method for generating micro-bubbles in polymer by processing-forming machine to install a micro-bubble generation element at a proper position, such as a mold, a transporting screw rod, or a feeding tube for its porous part to be indeed inserted into the polymer fluid
Inventor: LIAO WEI-ZHI
IPC: B29C44/44
Filed: 2015-08-06
Abstract: A processing method for generating micro-bubbles in polymer by a processing-forming machine is disclosed, in which a micro-bubble generation element is installed at a proper position, such as a mold, a transporting screw rod, or a feeding tube, so that a porous part of the micro-bubble generation element can be inserted into the polymer fluid. As a result, after the high-pressure high-temperature gas passes through the porous part of the micro-bubble generation element, micro-bubbles so generated can be sufficiently mixed uniformly with the polymer fluid, thereby obtaining a product with good foaming effect after cooling down.
Patent TW-201614828-A (TW)
Title: Display device, manufacturing method thereof, and electronic device
Inventor: YANAGISAWA YUICHI
IPC: H01L27/32
Filed: 2015-08-14
Abstract: A highly reliable display device. A first flexible substrate and a second flexible substrate overlap each other with an element positioned therebetween. A periphery of the overlapped first and second substrates is covered with a high molecular material having a light-transmitting property. The high molecular material is more flexible than the first substrate and the second substrate. As the element, for example, an EL element can be used.
Patent TW-201626362-A (TW)
Title: Providing an indication of the suitability of speech recognition
Inventor: KIM YOON
IPC: G10L15/22
Filed: 2015-08-28
Abstract: This relates to providing an indication of the suitability of an acoustic environment for performing speech recognition. One process can include receiving an audio input and determining a speech recognition suitability based on the audio input. The speech recognition suitability can include a numerical, textual, graphical, or other representation of the suitability of an acoustic environment for performing speech recognition. The process can further include displaying a visual representation of the speech recognition suitability to indicate the likelihood that a spoken user input will be interpreted correctly. This allows a user to determine whether to proceed with the performance of a speech recognition process, or to move to a different location having a better acoustic environment before performing the speech recognition process. In some examples, the user device can disable operation of a speech recognition process in response to determining that the speech recognition suitability is below a threshold suitability.
Patent TW-201627317-A (TW)
Title: Method of producing iridium complex
Inventor: MASAHIRO YASUSHI
IPC: C23C16/18
Filed: 2015-09-14
Abstract: A method of producing a tris ([beta]-diketonato) iridium, in which [beta]-diketone is made reacted with an iridium compound, is characterized in that the iridium compound is subjected to an activation treatment to thereby activate the iridium compound, and then react the [beta]-diketone. The activation treatment includes: (a) an alkali treatment where an alkali is added to a solution of the iridium compound to adjust a pH of the solution closer to an alkali side than that of pre-addition of alkali and pH 10 or higher; and (b) an acid treatment where an acid is added to the alkali-treated solution to adjust a pH of the solution closer to an acid side than that of pre-addition of acid and simultaneously pH difference to fall within 0.1-10. The method allows, when a tris ([beta]-diketonato) iridium is produced, a synthetic reaction to advance with no range of the [beta]-diketone to be coordinated to the iridium limited.
Patent TW-201621065-A (TW)
Title: Parts for plasma treatment device, and method for producing parts
Inventor: NAGAYAMA NOBUYUKI
IPC: C23C4/06
Filed: 2015-09-16
Abstract: This invention aims to control the generation of particles from a sprayed coating made of yttrium fluoride. A part which is exposed to plasma in a plasma treatment device is provided. This part includes a substrate and a coating. The substrate is made of, for example, aluminum or an alloy of aluminum. An alumite film can be formed on the surface of the substrate. The coating is formed on the surface of the substrate or of a base which includes a layer provided on the substrate by spraying yttrium fluoride. The porosity of the coating of the part is ≤ 4%, and the arithmetic average roughness (Ra) of the surface of the coating is ≤ 4.5 [mu]m.
Patent TW-201614223-A (TW)
Title: Wafer edge inspection with trajectory following edge profile
Inventor: HORN PAUL
IPC: G01B11/24
Filed: 2015-09-30
Abstract: This inspection system has an optical head, a support system, and a controller in electrical communication with the support system. The support system is configured to provide movement to the optical head with three degrees of freedom. The controller is programmed to control movement of the optical head using the support system such that the optical head maintains a constant angle of incidence relative to a wafer surface while imaging a circumferential edge of the wafer. An edge profiler may be scanned across the wafer to determine an edge profile. A trajectory of the optical head can be determined using the edge profile.
Patent TW-201632252-A (TW)
Title: Flue gas treatment system and flue gas treatment method
Inventor: MASUDA TOMOTSUGU
IPC: B01D53/60
Filed: 2015-10-30
Abstract: The present invention provides an exhaust gas treatment system and an exhaust gas treatment method by which the NOX content of combustion exhaust gas is reduced, the SO3 concentration is reduced to a greater extent than in the past, and stable long-term operation of the plant is possible. The exhaust gas treatment method pertaining to the present invention removes NOX and SO3 from combustion exhaust gas containing NOX and SO3, wherein the exhaust gas treatment method is provided with a denitration/SO3 reduction step in which, prior to catalytic contact: NH3, as a first additive, and one or more selected from the group consisting of olefin hydrocarbons represented by the general formula: CnH2n (n: an integer of 2 to 4) and paraffin hydrocarbons represented by the general formula: CmH2m+2 (m: integer of 2 to 4), as a second additive, are added to the combustion exhaust gas; the combustion exhaust gas is denitrated; and SO3 is reduced to SO2.
Patent TW-201621636-A (TW)
Title: Apparatus and method to preclude load replays in a processor
Inventor: COL GERARD M
IPC: G06F9/38
Filed: 2015-11-20
Abstract: An apparatus includes first and second reservation stations. The first reservation station dispatches a load micro instruction, and indicates on a hold bus if the load micro instruction is a specified load micro instruction directed to retrieve an operand from a prescribed resource other than on-core cache memory. The second reservation station is coupled to the hold bus, and dispatches one or more younger micro instructions therein that depend on the load micro instruction for execution after a number of clock cycles following dispatch of the first load micro instruction, and if it is indicated on the hold bus that the load micro instruction is the specified load micro instruction, the second reservation station is configured to stall dispatch of the one or more younger micro instructions until the load micro instruction has retrieved the operand. The plurality of non-core resources includes an off-core cache memory.
Patent TW-201639068-A (TW)
Title: Semiconductor process equipment
Inventor: JANAKIRAMAN KARTHIK
IPC: H01L21/677
Filed: 2015-12-30
Abstract: A system for processing a substrate is provided including a first planar motor, a substrate carrier, a first processing chamber, and a first lift. The first planar motor includes a first arrangement of coils disposed along a first horizontal direction, a top surface parallel to the first horizontal direction, a first side, a second side. The substrate carrier has a substrate supporting surface parallel to the first horizontal direction. The first processing chamber has an opening to receive a substrate disposed on the substrate carrier. The first lift includes a second planar motor having a second arrangement of coils disposed along the first horizontal direction. A top surface top surface of the second planar motor is parallel to the first horizontal direction. The first lift is configured to move the top surface of the second planar motor between a first vertical location and a second vertical location.
Patent TW-201723487-A (TW)
Title: Test base and test equipment using the same allowing a transfer arm of the test equipment to stably and horizontally place an electronic component so that an electrical contact of the electronic component is electrically connected to the probe set accurately
Inventor: LIU CHANG-XING
IPC: G01R1/067
Filed: 2015-12-31
Abstract: A test base and test equipment using the same are disclosed. The test base is provided with a frame base installed with a base having at least one probe set, wherein a fixed end of the probe set is protruded from a bottom surface of the base, so as to be electrically connected to a test circuit board. An expansion end of the probe set is protruded from a top surface of the base. A supporting base for supporting an electronic component uses at least one elastic member underneath to push against for being mounted to an upper side of the base. The supporting base comprises a supporting plane. The supporting plane is provided with at least one through hole corresponding to the expansion end of the probe set. When the elastic member pushes to lift the supporting base, the expansion end of the probe set is not protruded from the supporting plane of the supporting base. Accordingly, when an electronic component is placed in a transfer arm of the test equipment, the electronic component can be stably and horizontally placed on the supporting plane of the supporting base. When the electronic component presses downwards, the expansion end of the probe set is protruded from the supporting plane of the supporting base, such that an electrical contact of the electronic component is electrically connected to the probe set accurately, thereby achieving beneficiary of significantly increasing a test quality.
Patent TW-201724633-A (TW)
Title: Electrolyte additive
Inventor: HWANG BING-JOE
IPC: H01M10/0569
Filed: 2015-12-31
Abstract: The present invention provides an electrolyte to maintain low impedance of a battery, and the electrolyte includes: a lithium salt, an organic solvent and an electrolyte additive having a compound of formula I: wherein M is selected from lithium or sodium; Z is a Lewis acid including boron, aluminum or phosphorus; Y is one selected from a group consisting of hydrogen, an alkyl group, a haloalkyl group, a sulfoalkyl group, a carboalkyl group, a nitroalkyl group, a nitro group, a cyano group, an aldehyde group and a carboxyl group; and X is selected from -CN, -NO2, -CHO, -CH3SO2, -F or -Cl. By Adding few amounts of the additive of formula I to a common commercial electrolyte, a good solid electrolyte interface layer (SEI layer) will be preferentially formed on the surface of an electrode material. The SEI layer would not be thickened and will maintain the high conductivity and low impedance of the battery so that the battery has better coulombic efficiency when the battery charges/discharges at high voltage.
Patent TW-201643951-A (TW)
Title: Cutting device and cutting method
Inventor: TSUTAFUJI KATSUNORI
IPC: H01L23/12
Filed: 2016-01-20
Abstract: A cutting jig (9), on which first marks (17) are formed, is attached to a cutting table (8). The first marks (17) correspond to second marks (4) formed on a sealed substrate (1). The positions of the first marks (17) (first coordinate positions) are measured in advance and stored. The sealed substrate (1) is placed on the cutting jig (9) and the positions of the second marks (second coordinate positions) are measured. The first coordinate positions are compared with the second coordinate positions to calculate the amount of offset of the sealed substrate (1). The sealed substrate (1) is lifted from the cutting jig (9) and moved according to the amount of offset and placed again on the cutting jig (9). In this manner, it is possible to accurately match the position of a cutting groove of the cutting jig (9) with the position of a cutting line on the sealed substrate (1), and thus, it is possible to cut the sealed substrate (1) along the cutting line located on the cutting groove.