baber/WOPTO huggingface dataset:
Patent TW-I743340-B (TW)
Title: Method for detecting defects, scanning electron microscope, and non-transitory computer readable medium storing a program
Inventor: PLIHAL MARTIN
IPC: H01J37/26
Filed: 2018-03-26
Granted: 2021-10-21
Abstract: Use of care areas in scanning electron microscopes or other review tools can provide improved sensitivity and throughput. A care area is received at a controller of a scanning electron microscope from, for example, an inspector tool. The inspector tool may be a broad band plasma tool. The care area is applied to a field of view of a scanning electron microscope image to identify at least one area of interest. 
Defects are detected only within the area of interest using the scanning electron microscope. The care areas can be design-based or some other type of care area. Use of care areas in SEM tools can provide improved sensitivity and throughput.
Patent TW-I656368-B (TW)
Title: Multi-core fiber attenuator
Inventor: ZSENG FAN-CHEN
IPC: G02B6/35
Filed: 2018-04-03
Granted: 2019-04-11
Abstract: 一種多芯光纖衰減器，包含多條光纖及一接頭模組。該接頭模組包括一光纖套塊、一對導針及一調整組件。該光纖套塊具有一前端面、多個在一前後方向延伸並貫穿該光纖套塊的光纖安裝槽以分別安裝該等光纖並使該等光纖的纖芯末端露出該前端面，及一對分別在一左右方向間隔設置且由該前端面凹入並在該前後方向延伸形成的導針安裝槽。該對導針分別設於該對導針安裝槽且凸伸出該前端面，每一導針安裝槽提供對應的導針一位移的空間。該調整組件與該對導針結合以調整該對導針相對於該光纖套塊的位置並定位該對導針在預設的位置。
Patent TW-I737906-B (TW)
Title: Heat conductive sleeve structure
Inventor: LIAO PANG HUNG
IPC: F28F1/02
Filed: 2018-04-03
Granted: 2021-09-01
Abstract: A heat conductive sleeve structure including a heat transfer element, a sleeve, and a heat pipe is provided in the present disclosure. The heat transfer element includes a working portion and a sleeving portion, and a matching hole for fixing the sleeve is provided in the sleeving portion. An end of the heat pipe is movably disposed in the sleeve and the other end of the heat pipe protrudes from the sleeve. The heat pipe is inserted in one end of the sleeve and is thereby axially movable in the sleeve and rotatable related to the heat transfer element about the sleeve.
Patent TW-I645202-B (TW)
Inventor: MAO SHU-JUNG
IPC: G01R31/316
Filed: 2018-04-12
Granted: 2018-12-21
Abstract: 本發明係提供一種量測架構，包含量測主系統、測試模組、單一類比
訊號供應裝置、單對多類比訊號輸出介面及待測載具。單一類比訊號供應裝置根據量測主系統的指令而輸出一類比訊號；單對多類比訊號輸出介面接收來自單一類比訊號供應裝置的類比訊號，並提供多個通道以將類比訊號同步輸出；待測裝置放置多個待測物，以供待測物各自接收通過該等通道中的其中一通道的類比訊號。
Patent TW-I668675-B (TW)
Inventor: HSU CHIH HAO
IPC: G08C19/00
Filed: 2018-05-04
Granted: 2019-08-11
Abstract: 本發明提供一種缺陷評估系統，用於監控一載具之受損狀況。本發明缺陷評估系統包含傳感電路、偵測模組及警示模組。傳感電路設置於載具上。偵測模組連接傳感電路之兩端，用以輸出一脈衝訊號至傳感電路，並接收傳感電路所回傳的一回傳訊號。警示模組耦接偵測模組，警示模組根據回傳訊號產生關於載具受損狀況之一警示訊息。相較於習知技術，本發明使用可撓曲的傳感電路不僅可降低載具幾何外形及空間上的限制，亦可減少人力及物力上的需求。
Patent TW-I727178-B (TW)
Title: Composite film and textile product comprising the same
Inventor: CHANG CHIH YU
IPC: B32B27/40
Filed: 2018-06-08
Granted: 2021-05-11
Abstract: The present disclosure provides a composite film and the textile product comprising such composite film. The composite film comprises a polytetrafluoroethylene film layer and a polyurethane film layer. The polyurethane film layer is attached to the polytetrafluoroethylene film layer, and has a thickness ranging from 0.3 mm to 1.2 mm.
Patent TW-I657653-B (TW)
Title: 電源轉換系統
Inventor: Zhang yun-chao
IPC: H02M7/5395
Filed: 2018-07-20
Granted: 2019-04-21
Abstract: 本發明提供一種電源轉換系統，包括變壓器、雙極性接面電晶體(bipolar junction transistor,BJT)、以及脈寬調變控制晶片(Pulse Width Modulation,PWM IC)，其中，在電源轉換系統進入閉環狀態後，在PWM IC內部：基於表徵流過變壓器的一次繞組的電流的電流感測電壓和表徵直流輸出電壓的輸出表徵電壓生成第一和第二控制信號；基於第一控制信號控制第一和第二功率開關的導通與關斷，並基於第二控制信號控制第三功率開關的導通與關斷，其中：當第一和第二功率開關從導通狀態變為關斷狀態但第三功率開關處於關斷狀態時，PWM IC控制BJT處於導通狀態，使得交流輸入電壓經過整流和濾波得到的直流輸入電壓經由變壓器的一次繞組、BJT、PWM IC的第一端子、PWM IC內部的連接在其第一和第二端子之間的二極體對連接到PWM IC的第二端子的電容充電。
Patent TW-I676874-B (TW)
Title: 調節儀及劣化位置檢測方法
Inventor: IWAKIRI KEN
IPC: G05B23/02
Filed: 2018-08-23
Granted: 2019-11-11
Abstract: 本發明提供一種調節儀及劣化位置檢測方法。監視員在現場容易地確認操作端的動作範圍中的已劣化的動作位置。實測回饋值算出部根據從操作端的編碼器中輸出的檢測信號，每隔固定時間算出表示對應於操作量的操作端的動作位置的實測回饋值，推斷回饋值算出部根據在實測回饋值之前算出的不包含劣化的影響的實測回饋值，算出與實測回饋值對應的推斷回饋值，驅動控制部以使動作位置以固定速度從事先指定的開始位置位移至停止位置為止的方式驅動操作端，顯示控制部將所獲得的實測回饋值與推斷回饋值加以圖表化來進行畫面顯示。
Patent TW-I728263-B (TW)
Title: Method and device of communicating with a lte network and a nr network
Inventor: WU CHIH-HSIANG
IPC: H04W60/00
Filed: 2018-09-07
Granted: 2021-05-21
Abstract: A communication device for communicating with a long-term evolution (LTE) network and a new radio (NR) network is configured to execute instructions of: the communication device registering to the LTE network and the NR network; and performing an IP multimedia subsystem (IMS) registration via the LTE network but not via the NR network, when registering to the LTE network and the NR network.
Patent TW-I791636-B (TW)
Inventor: HANSEN JOHN BOEGILD
IPC: C01C1/04
Filed: 2018-10-09
Granted: 2023-02-11
Abstract: In a method for generating ammonia synthesis gas by electrolysis, comprising feeding a mixture of steam and compressed air into the first of a series of electrolysis units and passing the outlet from one electrolysis unit to the inlet of the next electrolysis unit together with air, the electrolysis units are run in endothermal mode and the nitrogen part of the synthesis gas is provided by burning the hydrogen produced by steam electrolysis by air in or between the electrolysis units. The electrolysis units are preferably solid oxide electrolysis cell stacks.
Patent TW-I796374-B (TW)
Inventor: CAO PEIYAN
IPC: G01T1/24
Filed: 2018-10-22
Granted: 2023-03-21
Abstract: 本文所公開的是一種輻射檢測器，其包括：雪崩光電二極體(APD)，具有耦合到電極的第一側，並且配置成在線性模式中工作；電容器模組，電連接到電極，並且包括電容器，其中電容器模組配置成把來自電極的載荷子收集到電容器上；與電容器並聯的電流拉取模組，電流拉取模組配置成補償APD中的洩漏電流，並且包括電流源和調制器；其中電流源配置成輸出第一電流和第二電流；調制器配置成控制電流源輸出第一電流的時長與電流源輸出第二電流的時長的比率。
Patent TW-I684013-B (TW)
Title: 作業分類設備之電荷偵測裝置
Inventor: ZHANG JIAN-RONG-LI
IPC: H05F3/00
Filed: 2018-12-11
Granted: 2020-02-01
Abstract: 一種作業分類設備之電荷偵測裝置，其係偵測離子產生器之正、負離子量 ，該電荷偵測裝置包含偵測感知器及微處理器，該偵測感知器係相對於離子產生器，且位於離子產生器之下方，以偵測相對之離子產生器所釋放的正離子量及負離子量，並將偵測資料傳輸至微處理器，由微處理器分析是否有正離子量及負離子量之不平衡情形，而可立即正確得知必須調整相對應之離子產生器釋放的正離子量或負離子量，達到正確控制所需待調離子產生器以利確實消除靜電之實用效益。
Patent TW-I785175-B (TW)
Title: 電解用元件
Inventor: TANAKA YOSHINORI
IPC: C25B9/19
Filed: 2018-12-26
Granted: 2022-12-01
Abstract: 電解用元件具備：陽極、陰極、離子交換膜、及間隔件。陰極具有：陰極用供電體、及覆蓋陰極用供電體之表面的陰極用表面材。離子交換膜會接觸陽極，並且在陽極與陰極之間離開陰極用表面材而配置。間隔件設置於陰極用表面材與離子交換膜之間的陰極用水通路。
Patent TW-I680925-B (TW)
Inventor: LIAO TSUNG JEN
IPC: H01L21/02
Filed: 2018-12-26
Granted: 2020-01-01
Abstract: The various embodiments provide a semiconductor chip holder that holds semiconductor chips. The chip holder protects the semiconductor chips from possible damage during transport and/or storage. The chip holder is flexible and may be wound around a reel for convenient transport and storage. In one embodiment, the chip holder includes a support substrate with receptacles that receive semiconductor chips, a cover layer that seals 
the receptacles and holds the semiconductor chips within the receptacles, and plugs to securely couple the support substrate and the cover layer together.
Patent TW-I736836-B (TW)
Title: An upper for an article of footwear and an article of footwear
Inventor: ZAVALA ROBERTO
IPC: A43B23/02
Filed: 2017-03-10
Granted: 2021-08-21
Abstract: In one aspect, the present disclosure provides an upper for an article of footwear and a method of manufacturing the same. The upper may include a knit element having a first area, the first area including a first side and a second side opposite the first side. The first side may be formed of at least 30% more material than the second side such that the first area is configured to curve convexly away from the first side.
Patent TW-I804573-B (TW)
Title: Method and system of substrate processing
Inventor: LIU ERIC CHIH-FANG
IPC: H01L21/033
Filed: 2019-02-11
Granted: 2023-06-11
Abstract: Methods and systems for line cut by multi-color patterning techniques are presented. In an embodiment, a method may include providing a substrate. The method may also include forming a first feature on the substrate, the first feature having a cap formed of a first material. Additionally, the method may include forming a second feature on the substrate, the second feature having a cap formed of a second material. In still a further embodiment, the method may include selectively removing the second feature using an etch process that etches the first material at a first etch rate and etches the second material at a second etch rate, wherein the second etch rate is higher than the first etch rate.
Patent TW-I761668-B (TW)
Title: 具自我檢測的電腦系統及其偵錯方法
Inventor: HU CHIH-HSIEN
IPC: G06F11/32
Filed: 2019-03-22
Granted: 2022-04-21
Abstract: 本發明提出一種電腦系統及其偵錯方法。電腦系統包括
電路板、記憶體、電路板圖像以及處理器。電路板包含多個連接介面用以電性耦接多個硬體裝置。記憶體儲存有基本輸入輸出系統程式。基本輸入輸出系統程式包含有開機自我檢測程式。處理器於電腦系統開機時載入基本輸入輸出系統進行開機程序，並且讀取並執行開機自我檢測程式，以檢測與所述多個連接介面電性耦接的所述多個硬體裝置。當有任一硬體裝置經檢測出現異常時，處理器透過顯示器顯示電路板圖像並於電路板圖像上對應於異常硬體裝置的連接介面圖像的位置顯示標記圖案。
Patent TW-I744616-B (TW)
Title: 不斷流工法及裝置
Inventor: SATO YASUNARI
IPC: F16L41/06
Filed: 2019-03-26
Granted: 2021-11-01
Abstract: 一種不斷流工法，具備由孔鋸將既有管穿孔的穿孔過程、及從切削溝將管塞插入既有管內的管塞插入過程的不斷流工法，具備：在穿孔過程之前，準備在分歧管部具有橫跨圓周方向的半周被切開的半周溝的T字管的過程；及在穿孔過程之後，將配管材連接在T字管的分歧管部的連接過程；及在連接過程之後，將插入半周溝的第1閘門拔除的過程；在管塞插入過程中，將第1閘門作為管塞從切削溝插入既有管內。
Patent TW-I710446-B (TW)
Title: 混煉轉子及批次式混煉機
Inventor: KONISHI AKIRA
IPC: B29B7/20
Filed: 2019-03-27
Granted: 2020-11-21
Abstract: 在混煉轉子(4、5)中，構成混煉翼(13～18)之長翼(13～15)的扭轉角(θL)，為38度以上，53度以下。長翼(13～15)，係具有翼頂部(13a～15b)；該翼頂部(13a～15b)，是在與外殼內面之間，以沿著翼長邊方向形成：第1翼端間隙(L)、以及寬度比上述第1翼端間(L)隙還狹窄的第2翼端間隙(S)之方式所構成。形成第2翼端間隙(S)之長翼(13～15)的中心角(θc)，為5度以上，10度以下。
Patent TW-I703213-B (TW)
Inventor: FENG-HUEI LIN
IPC: C12N5/07
Filed: 2019-03-28
Granted: 2020-09-01
Abstract: A cell culture device comprises a top layer, a diffusion layer, and a suspension layer. The diffusion layer comprises at least one diffusion channel. The suspension layer comprises a multiple suspension units. The multiple suspension units are connected to the diffusion channel. A fluid is conducted through the diffusion channel and flow into the suspension units for drop suspended. Cells are cultivated in the fluid suspended in the suspension unit. The cell culture device can be used in an electromagnetic cell culturing system. The electromagnetic cell culturing system is a combination of hanging drop method, microfluidic technology and electromagnetic stimulation. The electromagnetic cell culturing system can improve the growth of cells and also is capable of continuously providing culture medium into the cell culture device. The cell culture device can be used for culturing large quantity of cells with high productivity.
Patent TW-I740126-B (TW)
Title: 照明器具、終端器、照明系統、資訊終端機、照明器具之配對方法及程式
Inventor: SHINYASHIKI YASUFUMI
IPC: H04B10/114
Filed: 2019-04-11
Granted: 2021-09-21
Abstract: 本發明提供一種可容易進行配對之照明器具。
照明器具20具備以第1無線通信方式與資訊終端30通信之第1通信部21，及以第2無線通信方式與終端器10通信之第2通信部22，第1通信部21構成為自資訊終端30接收用以指定照明器具20作為終端器10之配對對象之信號，第2通信部22構成為於自指定為照明器具20之配對對象之終端器10接收到用以執行與終端器10之配對之信號時，執行與終端器10之配對。
Patent TW-I679261-B (TW)
Title: 黏著劑組成物、黏著片及光學膜
Inventor: YAMAGATA MASATO
IPC: C09J133/08
Filed: 2014-03-18
Granted: 2019-12-11
Abstract: 本發明提供一種具有抗靜電性、可實現未實施抗靜電處理的被黏著體在剝離時的剝離帶電壓的抑制，高速剝離時的黏著力小，低速剝離時的黏著力高而達到不產生隆起、剝離等問題的程度，並且可以得到透明性優異的黏著片、貼附有該黏著片的光學膜的黏著劑組成物。
 
     本發明的黏著劑組成物，其特徵在於，含有：玻璃轉移溫度未達0℃的聚合物(A)；及含有反應性離子液體作為單體單元、且固有黏度(dL/g)為0.01以上且未達0.5的聚合物(B)。
Patent TW-I708671-B (TW)
Title: 多段發泡之方法
Inventor: CHEN CHING-HAO
IPC: B29C43/18
Filed: 2019-05-03
Granted: 2020-11-01
Abstract: 本發明所提供多段成型之方法，其主要之技術特徵係令高分子原料之發泡結構係經由兩階段的發泡製程所產生，其中，在第一階段的發泡製程中，係將高分子原料與發泡劑混合後，經由射出機或押出機等供料裝置之輔助，使混合後的材料進入一第一模具中，經發泡並受該第一模具模製成型為具有一第一發泡倍率之發泡胚，再將該發泡胚自該第一模具中取出；在第二階段之發泡製程中，則係以超臨界流體為發泡劑，對被置入於一密閉空間中之該發泡胚在預設之溫度及壓力下進行第二次發泡，使之成為具有一第二發泡倍率之發泡物，並使該第一發泡倍率小於該第二發泡倍率。
Patent TW-I751414-B (TW)
Title: 雲端資料庫之管理系統及其方法
Inventor: GAO YA-ZHEN
IPC: G06F21/60
Filed: 2019-05-10
Granted: 2022-01-01
Abstract: 本發明旨在揭露一種雲端資料庫之管理系統及其方法，其由一第一雲端主機、一第二雲端主機與一雲端控制台通訊連接，雲端控制台接收第一雲端主機/第二雲端主機之通知訊息後，設定一第三方資料庫並以一虛擬裝置身份安裝於第一雲端主機/第二雲端主機，以供第一雲端主機/第二雲端主機存取第三方資料庫之資料。
Patent TW-I692981-B (TW)
Title: Image display system and a method for increasing a data volume of a controlling signal thereof
Inventor: HUNG KUO-CHING
IPC: H04N7/10
Filed: 2019-05-17
Granted: 2020-05-01
Abstract: An image display system can increase data volume of a controlling signal in a frame of analog image so as to process an analog image in real time. A method for increasing the data volume of the controlling signal, which is used in the image display system, comprises increasing the time for sending the controlling signal, changing an encoding mode of the controlling signal to increase data volume which is sent in a unit time or outputting an analog image signal and the controlling signal at the same time. Therefore, the data volume of the controlling signal in a frame of image can be increased.
Patent TW-I698546-B (TW)
Inventor: SIE WEI JIE
IPC: C23C16/34
Filed: 2019-06-20
Granted: 2020-07-11
Abstract: A substrate having a nucleation layer of aluminum nitride includes a silicon substrate and the nucleation layer of aluminum nitride. The nucleation layer of aluminum nitride is positioned on the silicon substrate, wherein a thickness of the nucleation layer of aluminum nitride is in a range of 20 nm to 200 nm. A surface roughness of the nucleation layer of aluminum nitride is less than or equal to 0.4 nm. A full width at half maximum of a peak in an X-ray rocking curve for the nucleation layer of aluminum nitride is less than or equal to 4000 arc sec. The silicon substrate is a substrate including silicon, and a material thereof, for example, could be SiC or Si. The nucleation layer of aluminum nitride has no slip line, so that an epitaxy layer positioned thereafter could provide a preferred performance. A manufacturing method of the semiconductor substrate having the nucleation layer of aluminum nitride is disclosed herein.
Patent TW-I720519-B (TW)
Title: 金額結算系統及方法
Inventor: SUN JIAN
IPC: G06Q20/40
Filed: 2019-06-24
Granted: 2021-03-01
Abstract: 公開了一種金額結算系統及方法。一種金額結算系統，該系統具有數量可配置的若干節點，每個節點對應一個支持轉帳功能的帳戶，節點具有可配置的結算關係屬性；節點間以樹形結構關聯，每組父子關係對應一組存在結算關係的帳戶：父節點對應結算金額轉入帳戶、子節點對應結算金額轉出帳戶；任一節點的結算關係屬性中，至少包括該節點的父節點標識。
Patent TW-I712466-B (TW)
Title: 雙主軸加工機的主軸補償方法及具有補償功能的雙主軸加工機
Inventor: Peng wen-xing
IPC: B23Q5/00
Filed: 2019-06-27
Granted: 2020-12-11
Abstract: 一種雙主軸加工機的主軸補償方法，主要是控制夾持有一物件的一第一主軸與一第二主軸先位於一第一歸零角度與一第二歸零角度後再轉動，然後，控制該第二主軸夾持該物件，同時，獲得該第一主軸之轉動角度與該第二主軸之轉動角度的差值後，以該第一轉動角度與該第二轉動角度的差值為一參考補償值，再控制該第一主軸釋放該物件，最後，控制該第二主軸以該參考補償值修正轉動角度。藉此，使該第二主軸在每一次夾持該物件進行加工時，以該參考補償值修正轉動角度，提高加工時的精度，及提升該物件的成品品質。
Patent TW-I813720-B (TW)
Title: Ｎｉｒ反射多層材料片
Inventor: YANSEN LAUW
IPC: B32B7/023
Filed: 2019-07-09
Granted: 2023-09-01
Abstract: 本發明係關於一種多層材料片，其包含一NIR反射半透明聚合層，其對於一波長為從750 nm至1000 nm之所有光具有多於20%之一反射率且對於一波長為從380 nm至750 nm之所有光具有多於50%之一透射率；及一NIR反射著色聚合層，其對於一波長為從1000 nm至2100 nm之所有光具有多於25%之一反射率。本發明亦關於適用於光伏打模組之一背層，該背層包含該多層材料片；及關於包含該背層之一光伏打模組。
Patent TW-I731390-B (TW)
Title: 互連結構、電路及包括該互連結構或電路的電子設備
Inventor: ZHU HUILONG
IPC: H01L23/522
Filed: 2019-08-14
Granted: 2021-06-21
Abstract: 本發明揭露一種互連結構、電路及包括這種互連結構或電路的電子設備。根據實施例，一種用於在襯底上形成的多個半導體元件的互連結構可以設置在所述多個半導體元件之下。該互連結構可以包括：沿從半導體元件向著襯底的方向交替設置的至少一個過孔層和至少一個互連層，其中，每一過孔層包括分別設於所述多個半導體元件中至少一部分半導體元件下方的過孔，每一互連層包括分別設於所述多個半導體元件中至少一部分半導體元件下方的導電節點，其中，在同一互連層中，至少一個導電節點與至少另一個節點之間具有導電通道，各過孔層中的過孔與各互連層中的相應導電節點在從半導體元件向著襯底的方向上彼此至少部分地交疊。
Patent TW-I706665-B (TW)
Title: 基於區塊鏈的資料核對系統、方法、計算設備及儲存媒體
Inventor: ZHOU FAN
IPC: H04L29/08
Filed: 2019-09-23
Granted: 2020-10-01
Abstract: 本說明書揭露基於區塊鏈的資料核對系統、方法、計算設備及儲存媒體，其中所述基於區塊鏈的資料核對系統包括：第一核對系統、第二核對系統及區塊鏈上的第一區塊鏈節點和第二區塊鏈節點；第一核對系統被配置為按照預設條件採集第一業務資料並產生第一核對檔案，向第二核對系統發送核對請求；第二核對系統被配置為接收核對請求，將第一業務資料與本地資料庫中的第二業務資料進行核對，產生核對結果通知並發送至所述第一核對系統，將本地資料庫中核對成功的第二業務資料發送至區塊鏈上的第一區塊鏈節點；第一核對系統還被配置為接收核對結果通知，將核對成功的第一業務資料發送至區塊鏈上的第二區塊鏈節點。
Patent TW-I711829-B (TW)
Inventor: KIM DONG IL
IPC: G01R31/01
Filed: 2019-10-01
Granted: 2020-12-01
Abstract: 本發明涉及用於測試電子元件的處理器。本發明的用於測試電子元件的處理器將一個特定傳送裝置負責傳送的傳送區間分為第一負責區間和第二負責區間，並且使得在第一負責區間傳送時握持測試托盤的部位和在第二負責區間傳送時握持測試托盤的部位不同，當一起測試裝載於多個測試托盤的多個電子元件時，多個測試托盤在相應的傳送區間能夠彼此獨立且同時傳送。根據本發明，簡化和減少傳送裝置的結構，從而具有降低生產成本和減小設備的尺寸的效果。
Patent TW-I757642-B (TW)
Title: 圖案檢查裝置及圖案檢查方法
Inventor: INOUE TAKAFUMI
IPC: G01N21/956
Filed: 2019-10-04
Granted: 2022-03-11
Abstract: 本發明涉及圖案檢查裝置及圖案檢查方法。
本發明的一態樣的圖案檢查裝置具備：光學圖像取得機構，其從形成有複數個圖形圖案之基板取得複數個區域的光學圖像資料；複數個比較處理電路，其等進行將光學圖像資料彼此進行比較的晶粒-晶粒檢查處理、和將光學圖像資料與從設計圖案資料作成的參照圖像資料進行比較的晶粒-資料庫檢查處理中的一個處理；和檢查處理電路，其按複數個區域中的每個區域，對複數個比較處理電路之中被按區域可變地設定的數量的比較處理電路分別輸出該區域的光學圖像資料，對光學圖像資料的輸出目的地的各比較處理電路控制為進行晶粒-晶粒檢查處理或晶粒-資料庫檢查處理。
Patent TW-I702295-B (TW)
Title: 一種耐熱鋁合金
Inventor: Lin chao yu
IPC: C22C21/02
Filed: 2019-10-17
Granted: 2020-08-21
Abstract: 一種耐熱鋁合金具有如下以重量百分比計之組成：Si為6.5~7.5wt%、Mg為0.4~0.7wt%、Fe為 0.2wt%、Ti為0.04~0.2wt%、Be為<0.04wt%、Zr為0.1~0.3wt%、Sc為0.1~0.3wt%及Sr為0.01~0.03wt%，其餘則由Al及不可避免雜質所構成。
Patent TW-I713270-B (TW)
Title: Electronic device and machine used therewith
Inventor: LIN CHENG-CHUN
IPC: H05K5/02
Filed: 2019-10-28
Granted: 2020-12-11
Abstract: An electronic device includes a first main body, a first electrical connector, and an insert member. The first main body has an insertion end and at least one hole located at the insertion end. The first electrical connector is disposed at the insertion end. The insert member is coupled to the first main body through the at least one hole and includes a plurality of ribs and a plurality of removed portions. The ribs and the removed portions are sequentially and linearly arranged based on a coding pattern. The ribs extend away from the insertion end.
Patent TW-I752379-B (TW)
Title: 內褲構造
Inventor: YANG HE-YUAN
IPC: A41B9/04
Filed: 2019-11-25
Granted: 2022-01-11
Abstract: 一種內褲構造，包括有一本體，其頂端設有一以一鬆緊帶圍成之腰部開口，底端兩側分別設有一腿部開口，本體上對應人體生殖器的位置定義為一造型區。本體及造型區以多數紗線編織而成，其中本體以高編織密度構成不可目視穿透之結構，而造型區以低編織密度構成可目視穿透之結構，據此具有穿著透氣舒適不悶熱之功效，且可藉由其形狀造型增進美觀。
Patent TW-I717122-B (TW)
Title: Surface roughness prediction method of wire electrical discharge machining workpiece
Inventor: JIANG JEHN-RUEY
IPC: G06N3/02
Filed: 2019-11-26
Granted: 2021-01-21
Abstract: Provided is a surface roughness prediction method for determining the surface roughness of a workpiece after performing wire electrical discharge machining on the workpiece. The method includes: (A) providing a plurality of static parameters before performing the wire electrical discharge machining, a plurality of time series parameters obtained during the wire electrical discharge machining, and the mean and standard deviation of each timing parameter; (B) using Markov chain to convert each timing parameter into a Markov eigenvector including a plurality of Markov eigenvalues; (C) normalizing the plurality of static parameters, Markov eigenvalues, and means and standard deviations; and (D) inputting the plurality of normalized static parameters, Markov eigenvalues, and means and standard deviations into a neural network for processing so as to obtain a predicted surface roughness.
Patent TW-I733289-B (TW)
Inventor: LIN CHENG HSUAN
IPC: H01L27/14
Filed: 2018-04-10
Granted: 2021-07-11
Abstract: 本發明提供一種感測模組及其製造方法，該感測模組包括一基板、複數個透光封裝體及一不透光封裝體。基板包括一表面以及設置於該表面上的複數個感測元件。該些透光封裝體設置於該表面上、且分別覆蓋該些感測元件，該些透光封裝體之每一個包括一光接收窗口；不透光結構設置於該表面上、位於該些透光封裝體之上、且沿著該表面的法線方向遮蔽該些光接收窗口、並使該些光接收窗口沿著各自的法線方向露出。藉此，感測模組可感測不同方向之光線。
Patent TW-I732453-B (TW)
Title: A structure of dish antenna
Inventor: CHOU HIS-TSENG
IPC: H01Q1/36
Filed: 2020-02-11
Granted: 2021-07-01
Abstract: A reflector antenna structure consisting of a main reflector, a secondary reflector and a feed antenna, wherein the main reflector is a paraboloid, and the secondary reflector is a hyperboloid and is connected to a conical surface near its vertex. The focal point of the hyperboloid is set near the focal point of the parabola, and the feed source antenna has a radiating aperture disposed near another focal point of the conical surface.
Patent TW-I710677-B (TW)
Title: 耐水解熱塑性聚氨酯纖維及其製作方法
Inventor: LIN CHIH YI
IPC: D01D10/02
Filed: 2020-02-20
Granted: 2020-11-21
Abstract: 本發明有關於一種耐水解熱塑性聚氨酯纖維及其製作方法。此耐水解熱塑性聚氨酯纖維具有較低之熱收縮性與良好之耐水解性，而可滿足應用之需求。於此耐水解熱塑性聚氨酯纖維的製作方法中，先提供熱塑性聚氨酯材料，並進行熔融押出製程，以形成纖維材料。然後，對纖維材料進行延伸製程，以製得本發明之耐水解熱塑性聚氨酯纖維。
Patent TW-I747173-B (TW)
Title: Process cartridge
Inventor: UENO TAKAHITO
IPC: G03G21/18
Filed: 2007-12-24
Granted: 2021-11-21
Abstract: A process cartridge for use with a main assembly of an electrophotographic image forming apparatus, the main assembly including a driving shaft, to be driven by a motor, having a rotational force applying portion, wherein the process cartridge is dismountable from the main assembly in a direction substantially perpendicular to an axial direction of the driving shaft, the process cartridge includes i) an electrophotographic photosensitive drum having a photosensitive layer at a peripheral surface thereof, the electrophotographic photosensitive drum being rotatable about an axis thereof; ii) process means actable on the electrophotographic photosensitive drum; iii) a coupling member engageable with the rotational force applying portion to receive a rotational force for rotating the electrophotographic photosensitive drum, the coupling member being capable of taking a rotational force transmitting angular position for transmitting the rotational force for rotating the electrophotographic photosensitive drum to the electrophotographic photosensitive drum and a disengaging angular position in which the coupling member is inclined away from the axis of the electrophotographic photosensitive drum from the rotational force transmitting angular position, wherein when the process cartridge is dismounted from the main assembly of the electrophotographic image forming apparatus in a direction substantially perpendicular to the axis of the electrophotographic photosensitive drum, the coupling member moves from the rotational force transmitting angular position to the disengaging angular position.
Patent TW-I754904-B (TW)
Inventor: LEE JI HO
IPC: C09K3/14
Filed: 2020-03-24
Granted: 2022-02-11
Abstract: 本發明涉及用於圖案化鎢晶片的化學機械拋光漿料組成物和使用其拋光圖案化鎢晶片的方法。化學機械拋光漿料組成物包含：選自由極性溶劑和非極性溶劑組成的群組的至少一種；磨料；選自由式1表示的化合物和由式2表示的化合物組成的群組的至少一種；以及氫氧化四丁銨。
Patent TW-I743771-B (TW)
Inventor: CHEN KAI-FU
IPC: H02J9/06
Filed: 2020-05-06
Granted: 2021-10-21
Abstract: A power control system includes a first power supply, a second power supply, a power supply, a second power supply, a plurality of first power supply units and a plurality of second power supply units. The first power supply unit includes a first switch unit, and the second power supply unit includes a second switch unit. When the first power supply is powered off, the second power supply is switched through the first switch unit to power the first power supply unit. When the second power supply is powered off, the first power supply is switched through the second switch unit to power the second power supply unit. Thus, the power control system improves the power usage and efficiency of the power supply.
Patent TW-I743872-B (TW)
Title: Electrochemical deposition systems
Inventor: KEIGLER ARTHUR
IPC: C25D5/22
Filed: 2020-07-07
Granted: 2021-10-21
Abstract: An electrochemical deposition system for depositing metal onto a workpiece, comprises a deposition chamber adapted to receive plating solution, a workpiece holder for holding a workpiece in a first plane, a shield holder for holding a shield in a second plane substantially parallel to the first plane, an agitation plate having a profiled surface to agitate plating solution, wherein the workpiece holder, shield holder and agitation plate are all adapted for insertion into and removal from the deposition chamber, and further comprising an actuator operable to change a relative distance between the workpiece holder and shield holder, in a direction normal to the first and second planes, while they are located within the deposition chamber.
Patent TW-I751629-B (TW)
Title: 6,7-二氫-5H-吡啶并[2,3-c]嗒𠯤-8-基衍生物、含其等之醫藥組合物及其等作為促細胞凋亡劑之用途
Inventor: NOVAK TIBOR
IPC: A61K31/538
Filed: 2020-07-28
Granted: 2022-01-01
Abstract: 本發明揭示一種式(I)化合物： 
其中Het、Het 1 
、Het 2 
、A 4 
、A 5 
、Z 1 
、R 1 
、R 2 
和R 3 
如本說明書中所定義。本發明亦揭示藥劑。
Patent TW-I812877-B (TW)
Title: Substrate processing apparatus
Inventor: HORIKOSHI AKIRA
IPC: H01L21/306
Filed: 2020-09-02
Granted: 2023-08-21
Abstract: A liquid film of a processing liquid containing at least one of sulfuric acid, a sulfate, peroxosulfuric acid, and a peroxosulfate, or a processing liquid containing hydrogen peroxide is formed on a substrate. A plasma is radiated to the liquid film. Thereby, a substrate processing method in which substrate processing using an oxidizing power of the processing liquid can be efficiently performed is provided.