baber/WOPTO huggingface dataset:
Patent JP-H03269412-A (JP)
Title: Liquid crystal display device
Inventor: YOSHIMIZU TOSHIYUKI
IPC: G02F1/1335
Filed: 1990-03-19
Abstract: PURPOSE:To maintain a high contrast and to obtain a bright black and white display by using uniaxially stretched high-polymer films for phase difference plates to constitutes a laminated structure and canceling the relative phase difference of the light passing a liquid crystal display cell by the transmission to the phase difference plates disposed on both surfaces of the cell, thereby making the display colorless. CONSTITUTION:This display device is constituted by laminating and disposing a 1st polarizing plate 2, the 1st phase difference plate 3, the supertwisted type liquid crystal cell 4, the 2nd phase difference plate 5, and a 2nd polarizing plate 6 this order. The phase difference plates 3, 5 are formed by using the uniaxially stretched high-polymer films having the large wavelength dispersion of a retardation value. The intersection angle of the lagging axis of the 1st uniaxially stretched high-polymer film 3 and the 1st rubbing axis of the liquid crystal display cell 4 adjacent to the 1st phase difference plate 3 and the intersected angle of the lagging axis of the 2nd phase difference plate 5 and the 2nd rubbing axis of the adjacent cell 4 are specified to 62 to 27 deg.. The intersection angle of the absorption axis of the 1st polarizing plate 2 and the lagging axis of the 1st phase difference plate 3 is specified to 29 to 38 deg. and the intersection angle of the absorption axis of the 2nd polarizing plate 6 and the lagging axis of the 2nd phase difference plate 5 is specified to 55 to 62 deg..
Patent JP-S54162660-A (JP)
Title: Manufacture of steel shape with symmetrical flange
Inventor: TAJIMA YOUTAROU
IPC: B21B1/08
Filed: 1978-06-15
Abstract: PURPOSE:To manufacture the H-beam almost free from the offset of the web, by placing the lower end face of the flange of the rolled material always on the same horizontal level, and by controlling the center level of the rolled material so as to coincide with the center level of the reducing roll, while executing the rolling work. CONSTITUTION:The rolling work is executed under the condition that the lower end face 12a of the rolled material, that is the H-beam 12, always coincides with the horizontal level 13. For this purpose, such driving system is employed for the upper and lower horizontal rolls 2, 3, of the edging mill 1, that the lower horizontal roll 3 is made stationary, and only the upper horizontal roll 2 is shifted vertically. The angle of inclination theta'of the side planes 8a, 9a, of the upper and lower horizontal rolls 8, 9, of the universal mill 7, is set at 0.5-10 degrees, and the outer side planes 15a', 16a', of the vertical rolls 15a, 16a, are set vertically, and then, the rolling works is executed; therefore, the rolling work by the universal mill 7 is free from any troubles.
Patent JP-S63238880-A (JP)
Inventor: TAKAYAMA SHUICHI
IPC: A61N1/40
Filed: 1987-03-27
Abstract: (57)【要約】本公報は電子出願前の出願データであるた め要約のデータは記録されません。
Patent JP-S57186822-A (JP)
Title: Automatic channel searching device
Inventor: ISHII TOMOHIDE
IPC: H04B1/16
Filed: 1981-05-13
Abstract: PURPOSE:To exactly receive a broadcast signal whose frequency is weak, being in the proximity of a strong broadcast signal, by switching a time constant of an AGC circuit in a sweep period of receiving frequency, by a sweep control signal, so that it becomes smaller than a time constant in case when sweep has been stopped. CONSTITUTION:In the course of a receiving operation which has stopped usual sweep, capacity of an AGC circuit is the sum of capacity of a capacitor 9a and 9b, but in a channel selecting period, it becomes only capacity of the capacitor 9a, the time constant becomes small, and a response time is shortened. As a result, even when a weak broadcast signal exists in the proximity of a strong broadcast signal, the gain of a tuner and an IF amplifier can be quickly returned largely when the receiving frequency has been swept gradually from its strong broadcast signal, and its weak broadcast signal can also be fetched by an IF signal processing circuit 2. In this way, after the sweep has been stopped, the capacitor 9a and 9b of the AGC circuit are used again, and the stable receiving operation is continued by a large time constant.
Patent JP-H02250006-A (JP)
Title: Method for peeling resist
Inventor: MORISHIGE AKIRA
IPC: H01L21/30
Filed: 1989-03-24
Abstract: PURPOSE:To easily peel a photoresist layer on patterned films after patterning the films by plasma following exposing the entire positive type-resist layer after resist layer is exposed and developed. CONSTITUTION:Films 4 to 6 to be patterned are coated with the positive type resist layer 11, which is exposed and developed for patterning; and the whole of the remaining positive type resist layer 11 is exposed. Thus, the exposure processing is performed twice to make inter-molecule bonds weak in the positive type resist layer 11 used for a mask, so when the films 4 to 6 are etched by oxygen plasma, the positive type-resist layer 11 becomes hard to set. Consequently, the resist film is easily peeled with a resist removing solvent which is generally used.
Patent JP-S63237037-A (JP)
Title: Production of nonlinear optical device
Inventor: OKAZAKI MASAKI
IPC: G02F1/361
Filed: 1987-03-26
Abstract: PURPOSE:To enable fine processing of a nonlinear optical device using high energy beams by using a specified material for a patternable nonlinear optical material. CONSTITUTION:A patternable material for a nonlinear optical device is expressed by the formula I, wherein R<1> and R<2> are H atom, etc.; Ar is aromatic group; X is halogen atom, etc.: J is a divalent joint group; (m) and (n) are positive integers; (p), (q), and (r) are zero or positive integers with the proviso that p+q+rnot equal to 0; Y is a group generated by eliminating one H atom from a compd. expressed by the formula II or III. In the formula II, Z<1> and Z<2> are N atom, etc.; X is alkyl group, etc.; (n) is zero or an integer 1-3; R<11> is H atom, etc. In the formula III, Z<11> is a group of atoms necessary for forming a five- or six-membered ring having a nitro group as substituent; Z<12> is a group of atoms necessary for forming a pyrrole ring which may be substituted or condensed to a ring. By this constitution, a nonlinear optical material of a desired size may be arranged on a substrate.
Patent JP-H09260541-A (JP)
Title: Semiconductor package
Inventor: ASAI HIRONORI
IPC: H01L23/12
Filed: 1996-03-27
Abstract: PROBLEM TO BE SOLVED: To reduce the electric resistance of a wiring circuit, using copper or the like without using high fusing point metal for the wiring material. SOLUTION: A BGA(ball grid array) package of wiring board 10 is changed from a conventional ceramic multilayer board to a single layer ceramic substrate, and also a wiring circuit 20 is provided on the surface of the board by metallization of a copper thick film after baking of the board. The filling up of the via hole 11 is performed similarly. Since the wiring board is made after baking of the board, the necessity of using high fusing point metal vanishes, consequently in the case of a thick film wiring circuit 20, the electric resistance is reduced to about 1/3 as compared with a conventional, for example, tungsten wiring circuit.
Patent JP-S54162464-A (JP)
Title: Wire bonding method
Inventor: ISHII TOSHIHIKO
IPC: H01L21/60
Filed: 1978-06-13
Abstract: PURPOSE: To enable excellent line bonding, by plating the gold of high purity less than 0.4 μm and cleaning the surface via the metal plating layer through which copper can not be penetrated, on the copper foil on the resin base surface.  
     CONSTITUTION: The line bonding is sufficient with the surface hardness of the resin base such as paper epoxy and paper phenol. Further, it is discovered that the purity of gold plated and the surface dirtness can give greater effect on the characteristics of the line bonding more than the requirements of the thickness of sinking due to rubbing of the metal fine wires. Accordingly, by managing these two factors, the line bonding excellent to the gold layer 0.4 μm or less which can be regarded as impossible, can be made. That is, the metal which dose not penetrate copper is plated on the copper foil, gold plating having greater purity 0.4 μm or less in thickness is made with sufficient cleaning, can solve the problems. 
     COPYRIGHT: (C)1979,JPO&Japio
Patent JP-H07280870-A (JP)
Title: Fault locating method for parallel two line three terminal transmission lines
Inventor: TOI MASANORI
IPC: G01R31/08
Filed: 1994-04-12
Abstract: PURPOSE:To realize an accurate fault locating operation by correcting a specific formula for determining the current distribution at the time of fault using the impedance of line between one end and a branch point and the impedance of line ahead of the branch point. CONSTITUTION:A normalized distance (x) is determined according to formula I using zero-phase currents IO1, IO2 flowing through one and the other lines of a parallel two line transmission line, absolute values ¦Z0A¦, ¦Z0B¦, ¦Z0C¦ of zero-phase impedances between one end and a branch point, the branch end and the counterpart end, and the branch point and branch end, and a polarity amount Vpl*. In the formula, Re{} represents the real component of {}. When 0<=x<=1, a fault location distance Lf is determined according to a formula; Lf=x-sA (sA represents the length of line between one end and the branch point) and when x>1, (x) is determined according to formula II. The distance can be determined according to a formula; Lf=sA+x-sB or Lf=sA+x-sC, where sB represents the distance between the branch point and the counterpart end and SC represents the distance between the branch point and the branch end.
Patent JP-H09264274-A (JP)
Title: Scroll compressor
Inventor: SUGIMOTO KAZUYOSHI
IPC: F04C18/02
Filed: 1996-03-27
Abstract: PROBLEM TO BE SOLVED: To enable radial check at the time of oscillating scroll work, and also reduce the weight of the oscillating scroll by extendedly providing an injection passage for ejecting liquid such as oil to a compression space on the end plate of the oscillating scroll in a direction nearly perpendicular to a straight line for connecting a pair of key grooves to each other. SOLUTION: In a compressor for carrying out compression by gradually contracting a plurality of compression spaces formed by an oscillating scroll 8 and a fixing scroll by turning operation of the oscillating scroll 8, an injection passage 33 for ejecting oil and the like to a compression space is formed on the end plate 15 of the oscillating scroll 8. The injection passage 33 consists of a horizontal hole 34 extending to the diameter direction of the oscillating scroll 8 and a vertical hole 35 opened to the compression space and which is communicated with the horizontal hole 34, the injection passage 33 is extendedly arranged in a direction perpendicular to a straight line L1 for connecting a pair of key grooves 31 to each other, and the opening end of the horizontal hole 34 is closed by a plug 38.  It is thus possible to enable holding by the radial check at the time of oscillating scroll work.
Patent JP-H01247828-A (JP)
Title: Operating unit for static liquid operated joint clutch
Inventor: MORI MASAO
IPC: F16D31/08
Filed: 1988-03-26
Abstract: PURPOSE:To transmit efficiently a power received by an input shaft to an output shaft by providing a direct coupling means for connecting the input and output shafts directly to each other and an oil quantity change means operable externally, and interlocking both means so that the direct coupling means will operate when the speed of the output shaft is equal to or above the predetermined level. CONSTITUTION:When an oil quantity change means 21 is operated with an operation lever 38, an oil quantity supplied to a hydraulic pump housing is changed and the speed of input side gear 8 and an output side gear 7 is changed. When the quantity becomes zero, both gears 8 and 7 give interlocked rotation. A clutch dog 42 is splined to an output shaft 11 and engaged with a clutch claw 43 at the end of an input shaft 4 (pump housing 5) with the operation of an interlocked rotation lever 45. The oil quantity change means 21 and the interlocked rotation lever 45 are connected to each other with a push cable 46. According to the aforesaid construction, the input and output shafts 4 and 11 are not engaged with each other during the turn of the lever 38 from a minimum to a maximum quantity. When the oil quantity becomes zero, the shafts 4 and 11 are geared with each other and directly made to give an interlocked turn.
Patent JP-S60228860-A (JP)
Inventor: HASEGAWA JIYUNICHI
IPC: F25B5/00
Filed: 1985-04-08
Abstract: (57)【要約】本公報は電子出願前の出願データであるた め要約のデータは記録されません。
Patent JP-2000268184-A (JP)
Title: Image processing device and method and recording medium
Inventor: KUBONO HIDEO
IPC: G06T9/00
Filed: 1999-03-17
Abstract: PROBLEM TO BE SOLVED: To collectively detect the edges included in an image with high accuracy regardless of the scatter of density within the image by detecting the edges set in an image according to the image data in response to the density value of every pixel that has undergone the logarithmic conversion. SOLUTION: An image processor applies the logarithmic conversion processing to the RGB corresponding to density value of each of pixels forming the image data (S2) and then applies the Laplacian arithmetic processing to the logarithmic density value obtained for every RGB of each pixel (S3). Then the logarithmic image is binalized according to the Laplacian arithmetic processing result obtained for every RGB of each pixel (S4) and also the line thinning processing is applied to the obtained binalized image (S5). Then a natural spline curve is generated to every sequence of points of the binalized image that has undergone the line thinning processing (S6) and then the natural spline curve is converted into a B-spline curve, which is displayed on a CRT (S7).
Patent JP-2000265971-A (JP)
Title: Magnetic fluid driving pump
Inventor: ICHIYAMA YOSHIKAZU
IPC: F04B9/00
Filed: 1999-03-17
Abstract: PROBLEM TO BE SOLVED: To enable the long life and miniaturization by providing no mechanical movable part. SOLUTION: A magnetic fluid driving pump is provided with an annular passage 2 having a suction port 4 and a discharge port 6 and partially filled with magnetic fluid 14; a magnet 12 for generating the bias bypass magnetic field and the driving magnetic field, as a magnetic field applying means for generating the bias magnetic field for holding the magnetic fluid 14 in the annular passage 2 and the driving magnetic field for moving the magnetic fluid along the annular passage 2; and an electromagnet 16 for generating the pulse-like driving magnetic field. By generating these magnetic fields, the magnetic fluid 14 held in a holding part 2a of the annular passage 2 is separated at the suction port 4 into a magnetic fluid block 14a, it is moved along the annular passage 2 and held again in the holding part 2a through the discharge port 6.
Patent JP-2000264619-A (JP)
Title: Siliceous powder and its production
Inventor: KAMIYA HIDEHIRO
IPC: C08K9/06
Filed: 1999-03-18
Abstract: PROBLEM TO BE SOLVED: To enhance the flexural strength and the heat resistance to soldering of a resin composition with a spherical silica filled therein while keeping the compactly packed properties and the high fluidity of the excellent properties of the spherical silica. SOLUTION: This siliceous powder has >=0.75 average sphericity, and satisfy at least one of conditions having <=0.50 nN adhesive force to a probe measured by using an interatomic force microscope, having <=95 Pa tensile breaking stress of a powder layer measured by a hung-type two-division cell-type sticking power test, and having both absorption bands of Si-OH at about 4415 cm-1 and Si-OR (R is an alkyl group) at about 4350 cm-1 in an IR spectrum.
Patent JP-S63237432-A (JP)
Title: Inspection system for semiconductor device
Inventor: HONMA MICHIO
IPC: G01R31/28
Filed: 1987-03-25
Abstract: PURPOSE:To reduce the number of inspection steps and to reduce the damage of an electrode pad by a method wherein a fuse for remedy use at a redundant circuit is broken after receipt of the information on a defective part at a semiconductor device having a remediable defect and another information on a position of this semiconductor device on a semiconductor wafer while a bad mark is put on the semiconductor device after receipt of the information on the position of the semiconductor device having an unremediable defect on the semiconductor wafer. CONSTITUTION:Each semiconductor device 2 on a semiconductor wafer 1 placed on a prober 11 is tested by using an IC tester 12. The information collected from these inspection parts is transferred to a trimmer unit 20 by using a communication route, a floppy disk or the like. This trimmer unit 20 is composed of a remedy processing part 21 and a marking part 22; the remedy processing part 21 is equipped with a laser light source used to cut a fuse for remedy use and a fuse-positioning mechanism. Regarding the semiconductor device 2 having a remediable defect according to the information, a fuse to be used to remedy the defect is cut as shown by cutting-off fuses 5 at the remedy processing part 21; regarding the semiconductor device having an unremediable defect, bad marks 3 are printed by using the marking part 22.
Patent JP-H01244465-A (JP)
Title: Method and device for sticking thin film
Inventor: HAMAMURA FUMIO
IPC: H01L21/027
Filed: 1988-03-25
Abstract: PURPOSE:To prevent air bubbles from remaining between a dry film and substrate and, at the same time, to prevent occurrence of rumples by press-fitting the dry film with the substrate so that the press-fitting area is expanded from the central part of the substrate to the peripheral part under vacuum. CONSTITUTION:After a carrier 3 placing the substrate 1 and dry film 4 are carried into a vacuum chamber 5 and an enclosed chamber 5 is formed by bringing up a pair of enclosing means 5c, the chamber 5 is evacuated. Then a bottom stage 6b is brought up so as to press the film 4, substrate 1, and carrier 3 against a top surface 8a and the carrier 3, substrate 1, and film 4 are press-fitted to each other with pressure while the stage 6a is elastically deformed. Since the thickness of the stage 6a at the central part is larger than that of the peripheral part, the photosensitive resin die of the film 4 is brought into contact from the central part as the stage 6b is brought up and the contacting area is expanded to the peripheral part. Thus, a laminated body 20 of the film 4, substrate 1, and carrier 3 is produced.
Patent JP-H05244502-A (JP)
Title: Cm transmitter
Inventor: ITO HIDEKI
IPC: H04N5/445
Filed: 1992-02-26
Abstract: PURPOSE:To allow a video monitor of the CM transmitter to simply discriminate whether or not a CM is transmitted according to a CM transmission schedule. CONSTITUTION:The transmitter is provided with an automatic program controller 1 outputting CM control data 6 based on a CM transmission schedule 12, a CM transmission controller 2 outputting CM retrieval data 7 and CM control data information sets 13-19 based on the CM control data, a video file device 3 outputting a CM video signal 9 corresponding to the CM retrieval data 7, a super processor 4 superimposing the CM control data information sets 13-19 onto a CM video signal 9 outputted from the video file device 3, and a video monitor 5 on which a video picture to be superimposed is displayed, and whether or not the CM is sent according to the CM transmission schedule is discriminated based on the superimposed video image.
Patent JP-S59198714-A (JP)
Title: Manufacture of semiconductor element
Inventor: OONISHI TOYOKAZU
IPC: H01L21/02
Filed: 1983-04-26
Abstract: PURPOSE:To reduce probability to damage a semiconductor wafer during the manufacturing process of a semiconductor device using a compound semiconductor, and to make the device to be suitable for automation by a method wherein a high melting point metal film or a high melting point metal silicide film is formed on the back of the wafer preceding the formation process of a semiconductor element. CONSTITUTION:A high melting point metal film or a high melting point metal silicide film is formed on the back of a semiconductor wafer preceding the formation process of a semiconductor element using a compound semiconductor. The tungsten silicide (WSi0.6) film 3' is formed at the degree of 1mum thickness using the magnetron sputtering method on one side of the circular wafer 1' consisting of gallium arsenide of the degree of 400mum thickness and 2 inches diameter manufactured by using the liquid encapsulated Czochralski method. After then, the wafer 1' is turned over, and the semiconductor element is formed on the wafer 1' according to the conventional technique.
Patent JP-S62231342-A (JP)
Title: Down load control system for micro test program
Inventor: KIDA TETSUYA
IPC: G06F9/24
Filed: 1986-03-31
Abstract: PURPOSE:To execute the down load of all necessary micro test programs in a lump by providing a device program corresponding table to obtain a necessary program name in a host. CONSTITUTION:The operator of a work station 11 requests the down load of a micro test program to a host 13 in order to test the device of device numbers DV-A-DV-D. The host 13 refers to a device program corresponding table 14 in accordance with the down load request and obtains a micro test program corresponding to the device numbers DV-A-DV-D. Next, from a micro test program library 14, individual equivalent micro programs are retrieved and respective programs are down-loaded to the work station 11. Thus, all necessary micro test programs can be down-loaded in a lump.
Patent JP-S60216552-A (JP)
Title: Etching method
Inventor: NAKAO ICHIROU
IPC: G03F1/72
Filed: 1984-04-12
Abstract: PURPOSE:To vary the diffraction efficiency in a grating plane by a method wherein etchings of different depth are carried out in an etched surface by sputter etching under inclination of the surface to be etched in the region including a potential-inclined part. CONSTITUTION:A diffraction grating pattern of resist is prepared on an InP substrate 5 by interference exposure. The substrate 5 is placed on the cathode 3 of a parallel flat system RIE device, and is then inclined at 45 deg. rectangularly to the linear direction of the diffraction grating. Using CCl4, etching is carried out for 30sec ujnder a gas pressure of 5X10<-3>Torr at 13.56MHz and 150W. The accelerating voltage in the cathode 3 is VCC+VP but decreases below thid value when going off from the electrode 3 on the substrate 5. In case the physical etching is more dominant than the chemical etching, this accelerating voltage seriously influences the etching depth, thus, the etching with continuous changes in depth can be achieved. Since the accelerating voltage and the distribution of potential can be varied with the kind of gas, gas pressures, and powers, the proportion of continuous changes in etching depth can be arbitrarily determined by taking the angle of inclination of the substrate surface into consideration.