baber/WOPTO huggingface dataset:
Patent TW-449516-B (TW)
Title: Welding method for Si based material
Inventor: KIHARA TORU
IPC: B23K10/02
Filed: 2000-04-08
Granted: 2001-08-11
Abstract: To make welding possible for Si based materials, the welding of which was presumed impossible due to the extreme brittleness and a high electrical resistance, and to improve the degree of freedom in the machining of Si based materials, by utilizing the heat of arc plasma in arc welding. With a tungsten rod 3 used as a cathode in an argon gas 5 atmosphere, and with a water-cooled copper plate 4 as an anode, an arc is generated between the pair of electrodes 3, 4. Then, the arc length is gradually extended, while a pair of Si based materials with the end faces abutted on each other are brought close to an arc column 2. After that, the Si based materials are rotated around an axial center, with fusion welding carried out for the weld zone.
Patent TW-499419-B (TW)
Title: Catalysts for methacrylic acid production and process for producing methacrylic acid
Inventor: KASE YUICHI
IPC: C07C57/05
Filed: 2000-04-27
Granted: 2002-08-21
Abstract: Improved catalyst for use in production of methacrylic acid by vapor phase oxidation reaction and/or vapor phase oxidative dehydrogenation reaction of at least one compound selected from methacrolein, isobutylaldehyde and isobutyric acid is provided. This improved catalyst is a composition composed of (A) complex oxide containing as essential components molybdenum and phosphorus, which is per se known as a catalyst for the above reaction(s), and (B) complex oxide containing as essential components cerium and zirco-nium. When this improved catalyst is used, the operation for producing methacrylic acid can be stably continued over prolonged period.
Patent TW-432241-B (TW)
Title: Compound lens system
Inventor: HUANG YOU-JR
IPC: G02B9/00
Filed: 2000-05-15
Granted: 2001-05-01
Abstract: The invention is a compound lens system; specifically by introducing plastic lens in design, the spherical aberration can be overcome using aspheric design, and grating surface is used to overcome chromatic aberration. Therefore it's possible to get better imaging quality by different arrangement direction of lenses and allotted ratio of focal length. When this invention is applied to an optical system composed of three lenses; by making at least two of the lenses with plastic, and disposing grating surface and aspheric surface on the plastic lens, the aberration can be sufficiently corrected. In view of the above the manufacturing cost of optical system is reduced substantially.
Patent TW-I263498-B (TW)
Title: Ziprasidone suspension
Inventor: ARESON DANIEL RAY
IPC: A61K47/14
Filed: 2000-05-23
Granted: 2006-10-11
Abstract: Compositions comprising ziprasidone free base or a difficult to wet pharmaceutically acceptable ziprasidone acid addition salt, a polysorbate, and colloidal silicon dioxide form good aqueous suspensions having a useful shelf life and are easily re-suspended if settling occurs.
Patent TW-I240181-B (TW)
Title: User control of web browser user data
Inventor: SHRADER THEODORE JACK LONDON
IPC: G06F17/30
Filed: 2000-06-13
Granted: 2005-09-21
Abstract: A mechanism to dynamically present basic authentication and cookie information to a web browser user. As part of a login, a user will have entered a userid and password as part of the basic authentication process. He or she also can configure the web browser to display cookies that are sent to the browser for setting. After their initial display, however, this information is either hidden or not easily accessible to the user. The present invention is a mechanism that allows a web browser user easy access to his or her logged-on userid and cookies.
Patent TW-511383-B (TW)
Title: A method and apparatus for location dependent information services
Inventor: DELAVAL GEORG
IPC: G06Q30/00
Filed: 2000-11-15
Granted: 2002-11-21
Abstract: A method and apparatus is described for providing location dependent information services to customers in a WAP-Bluetooth environment. WAP-Bluetooth server units are provided to customers including qualified third party developers. A WAP-Bluetooth SDK is provided to third party developers and qualified WAP-Blnetooth applications arc developed thereby. Qnalified applications are loaded on WAP-Bluetooth server units for providing location dependent information services. Connections are made with WAP-Bluetooth client terminals and location-dependent WAP pages are pushed toward the WAP-Bluetooth client terminals using a WAP-Bluetooth application. A WAP-Bluetooth signal is transmitted in a coverage area associated with the location dependent information service and connections made with client terminals to provide the location dependent information service. Qualified applications are registered such that applications are available to customers and third party developers m a product registry. Qualified applications are presented and provided on a trial basis to customers using a website. The SDK includes a WAP-Bluetooth development environment, WAP-Bluetooth software modules, WAP-Bluetooth application examples, a bootloader, a software platform, and a basic WAP-Bluetooth application, and documentation. The software platform includes a Bluetooth stack, an operating system, and drivers. The WAP-Bluetooth development environment includes a graphical user interface development tool, associated with Windows' or UNIX operating environments.
Patent TW-471125-B (TW)
Title: Manufacturing method of dual metal damascene
Inventor: HUANG YI-SHIUNG
IPC: H01L21/768
Filed: 2000-08-30
Granted: 2002-01-01
Abstract: A manufacturing method of dual metal damascene is provided. First, a substrate with dielectric layer is provided and two photo resist (PR) layers are continuously formed on the dielectric layer. These two PR layers have their own dielectric opening and trench pattern. Second, these two PR layers are used as etching masks to etch the dielectric layer and form a dual metal damascene contact. Then a conductive layer is filled into the dual metal damascene contact to form a dual metal damascene structure. Because the patterns of the PR layer can be transferred to dielectric layer by etching step, patterns of plug contact and interconnection are simultaneously defined when the PR layer is exposed and the plug contact and interconnection can be formed in the dielectric layer at the same time. The invention is advantageous in that only one-time etch and PR removal steps are required and the process is simplified. Beside, by controlling the selectivity of PR to dielectric layer and the thickness of PR, dual metal damascene structure can be formed in spite of whether the dielectric layer has an etching stop layer or not.
Patent TW-560191-B (TW)
Title: Method and system of identifying software and firmware objects available for download over a network such as a cable television system
Inventor: SAFADI REEM
IPC: H04N21/435
Filed: 2000-09-14
Granted: 2003-11-01
Abstract: This method and system allow a subscriber to a cable television service to receiving a listing or menu of programming available for that subscriber's set-top terminal to upgrade or enhance the features available over the cable system. A directory of services (DoS) message is transmitted to over the cable system to the subscriber's set-top terminal. The terminal can then display for the subscriber the menu of programming available. This display may include a price for downloading each programming object. The subscriber can then, using a remote control unit or a user input device on the terminal, direct the set-top terminal to acquire a listed programming object. The DoS message will provide information enabling the set-top terminal to download the indicated programming object from the cable system in response to the subscriber's input. The subscriber can then have immediate access to upgraded or enhanced programming, the purchase of which is billed to the subscriber's account.
Patent TW-502517-B (TW)
Title: Transmitting method, transmitting system and transmitter
Inventor: CHANG TZE-YU-SHR
IPC: H04L12/28
Filed: 2000-09-11
Granted: 2002-09-11
Abstract: In an IEEE1394 system or network with similar object, data transmission rate can be properly controlled via equipment for receiving the forwarding data. A data transmission equipment can be set up as the first equipment, while each of one or multiple equipment receiving the transmitted data from the first equipment is set up as external equipment. As far as the transmitted data is concerned, the quantity of external equipment is specified. When receiving the control command of control authorization place from one of the external equipment, transmission speed is then changed. When control command is not sent to data forwarding place authorized by external equipment in a preset period of time, the control authorization is returned. If there are a plurality of equipment to receive data from the first equipment, the control authorization then returns to the first equipment.
Patent TW-I256395-B (TW)
Title: Regioselective synthesis of rapamycin derivatives
Inventor: SHAW CHIA-CHENG
IPC: C07F7/18
Filed: 2000-09-14
Granted: 2006-06-11
Abstract: This invention provides a regioselective process for preparing a 42-ester or ether of rapamycin, and 31-silyl ether intermediates.
Patent TW-I227388-B (TW)
Title: Authentication and management device
Inventor: SUGIYAMA AKIRA
IPC: G06F21/44
Filed: 2000-09-19
Granted: 2005-02-01
Abstract: Carry out a plurality of communications between server and client to transmit and receive signals of data or application program. In the send and receive signal between the accessed side and the accessing side, when it is each send and receive fixed time of the previous signal from the opposite party or the receive fixed time of the signal transmitted from the own party among all participants in the existing time system, if the elapsed time of those fixed time from the opposite party is added, the computer related with the communicating parties is at least controlled by a clock device with clock signal having an identical clock signal interval equivalent to a constant and a common timer at the accessed side so that the starting time QB0 to the ending time QE0 of the computer at the communication source is set up by a clock device (e.g. timer in unit of second) with the same clock signal interval equivalent to a constant to form the same condition as the clock signal of the existing time of the generation device. Hence, between the accessing side and the accessed side, for instance the time space of the generation device allocated for setting the existing time at the accessed side, further proceed time transformation in the mentioned time space between the own party and the opposite party regarding the send and receive signal. By adding the send and receive time (send and receive fixed time) or the receive time (receive fixed time) of each previous signal to the elapsed time of the send and receive time and the receive time, form a clear display on the time space of the computer on the opposite side shown in Fig. 17.
Patent TW-462900-B (TW)
Title: Vibration diagnosis method for abnormality or malfunctions of roller of hot rolling machine for steel strip
Inventor: JENG JI-JAU
IPC: B21B38/00
Filed: 2000-10-11
Granted: 2001-11-11
Abstract: This invention relates to a vibration diagnosis method for abnormality or malfunctions of roller of hot rolling machine for steel strip, mainly comprising in sequence vibration signals measuring step; signal calculating step; determining step for effective value and peak-to-peak value of amplitude; effective frequency center, comprehensive determining step for peak frequency, equivalent frequency center, amplitude modulation frequency, and amplitude modulation variation; determining step for primary peak sharpness of secondary frequency spectrum; and comprehensive determining step for equivalent frequency center and frequency concentration, so as to diagnose the characteristic parameters of time domain, frequency domain, and amplitude modulation of each vibration signal. Then, depending upon the combination of the multiple-parameter discriminant, the abnormal condition the working roller and backing roller being either working roller vibration phenomenon, poor lubrication of working roller bearing, abrasion of main shaft coupler, scratches of backing roller surface, or abnormal loading of roller bearing can be determined.
Patent TW-518698-B (TW)
Title: Die used for resin-sealing and molding an electronic component
Inventor: OSADA MICHIO
IPC: H01L21/56
Filed: 2000-11-08
Granted: 2003-01-21
Abstract: A die used for molding an electronic component with resin includes a fixed, top die (1) and a movable, bottom die (2) and at least has a surface contacting a melted resin material that is electroplated (A) with nickel-tungsten alloy (NiW). This plating can provide releaseability of a resin-molded body (13) and the like superior to hard-chromium plating (HCr) to allow an ejector pin (14, 15) to efficiently eject and release the resin-molded body (13) from the die.
Patent TW-I224494-B (TW)
Title: Methods of blocking an ethylene response in plants using cyclopropene derivatives
Inventor: SISLER EDWARD C
IPC: A01N35/02
Filed: 2000-11-22
Granted: 2004-12-01
Abstract: Methods of applying cyclopropene derivatives and compositions thereof to block ethylene receptors in plants are disclosed. One such method comprises applying to the plant an effective ethylene response-inhibiting amount of cyclopropene derivatives or compositions thereof. Also disclosed are methods of inhibiting abscission in plants, methods of inhibiting the ripening of picked fruits, methods of inhibiting the ripening of picked vegetables, and methods of prolonging the life of cut flowers.
Patent TW-558735-B (TW)
Title: Semiconductor device tester and semiconductor device test method
Inventor: YAMADA KEIZO
IPC: G01R1/06
Filed: 2000-11-29
Granted: 2003-10-21
Abstract: A plurality of measuring positions on a sample are sequentially irradiated with electron beams having identical cross sectional shapes, currents produced in the sample when the individual measuring positions are irradiated with electron beams are measured and the measured currents or physical amounts derived from the measured currents are displayed on a two-dimensional plane as a function of measuring position.
Patent TW-535300-B (TW)
Title: Light emitting diode with enhanced light extraction, method for growing the same and method for manufacturing the same
Inventor: DENBAARS STEVEN P
IPC: H01L33/44
Filed: 2001-03-05
Granted: 2003-06-01
Abstract: This invention describes new LEDs having light extraction structures (26) on or within the LED to increase its efficiency. The new light extraction structures (26) provide surfaces for reflecting, refracting or scattering light into directions that are more favorable for the light to escape into the package. The structures can be arrays of light extraction elements (42, 44, 46, 48, 50, 52) or disperser layers (112, 122, 134, 144, 152, 162). The light extraction elements can have many different shapes and are placed in many locations to increase the efficiency of the LED over conventional LEDs. The disperser layers provide scattering centers for light and can be placed in many locations as well. The new LEDs with arrays of light extraction elements are fabricated with standard processing techniques making them highly manufacturable at costs similar to standard LEDs. The new LEDs with disperser layers are manufactured using new methods and are also highly manufacturable.
Patent TW-527659-B (TW)
Title: Semiconductor device and its manufacturing method
Inventor: MATSUURA TAKAO
IPC: H01L23/50
Filed: 2000-12-05
Granted: 2003-04-11
Abstract: A kind of semiconductor device and its manufacturing method are disclosed in the invention. The semiconductor device comprises the followings: the wing plate 1e for supporting a semiconductor chip 2; an encapsulating body 3, which is formed by sealing the semiconductor chip 2 with a resin; a plurality of leads 1a, which are made of copper alloy and are exposed to the back face 3a of the encapsulating body 3 so as to have a soldered layer 8 on the exposed mounted face 1d; and the conduction wires 4 for connecting the soldering regions 2a of the semiconductor chip 2 and the corresponding leads 1a. In the manufacturing process, after using the resin-mold, the back face 3a of the encapsulating body 3 is polished by a brush so as to make the two widthwise edge portions, which are exposed from the back face 3a of the encapsulating body 3, of the lead 1a into rounded faces. In addition, the central portion of the mounted face 1d of the lead 1a containing the rounded faces is more protruded than the back face 3a of the encapsulating body 3 so as to improve the connection reliability at the mounting time. In addition, the management of manufacturing process in the manufacturing procedures of a semiconductor device is made easier.
Patent TW-502525-B (TW)
Title: Scanner with reference pattern for combining pictures and the picture combining method
Inventor: CHEN YAN-CHENG
IPC: H04N1/387
Filed: 2001-02-02
Granted: 2002-09-11
Abstract: The invention provides a scanner with reference pattern for combining pictures and the picture combining method, which uses the design for configuring the reference pattern in the scanner, so that the light machine can be used to retrieve the reference pattern when the memory capacity of the scanner is insufficient. After the logical computation by the picture combining method, the light machine can precisely and rapidly continue the scanning.
Patent TW-488026-B (TW)
Title: Protective hardmask for producing interconnect structures
Inventor: DALTON TIMOTHY J
IPC: H01L23/532
Filed: 2001-02-15
Granted: 2002-05-21
Abstract: The present invention provides a permanent protective hardmask which protects the dielectric properties of a main dielectric layer having a desirably low dielectric constant in a semiconductor device from undesirable increases in the dielectric constant, undesirable increases in current leakage, and low device yield from surface scratching during subsequent processing steps. The protective hardmask further includes a single layer or dual layer sacrificial hardmask particularly useful when interconnect structures such as via openings and/or lines are formed in the low dielectric material during the course of making the final product. The sacrificial hardmask layers and the permanent hardmask layer may be formed in a single step from a same precursor wherein process conditions are altered to provide films of differing dielectric constants. Most preferably, a dual damascene structure has a tri-layer hardmask comprising silicon carbide BloK™, PECVD silicon nitride, and PECVD silicon dioxide, respectively, formed over a bulk low dielectric constant interlevel dielectric prior to forming the interconnect structures in the interlevel dielectric.
Patent TW-546699-B (TW)
Title: Exposure apparatus and exposure method capable of controlling illumination distribution
Inventor: NISHINAGA HISASHI
IPC: G03B27/42
Filed: 2001-02-23
Granted: 2003-08-11
Abstract: An exposure apparatus radiates an exposure light beam from an exposure light source onto a reticle via an illumination optical system including a first fly's eye lens, a second fly's eye lens, a lens system, a blind, and a condenser lens system, so as to project an image of a pattern on the reticle onto a wafer via a projection optical system. An illumination characteristic is measured by using an evaluation mark plate on a reticle stage and a spatial image-measuring system provided for a wafer stage. The states of the second fly's eye lens and the lens system are adjusted by the aid of a driving unit on the basis of the measured value. A concentration filter plate, which is formed with a pattern of a predetermined transmittance distribution, is rotatably arranged in the vicinity of a conjugate plane with respect to an image plane between the second lens system and the blind. The angle of rotation of the concentration filter plate 51 is controlled so that the uneven illuminance is corrected.
Patent TW-I289457-B (TW)
Title: Emulsion composition
Inventor: BABA TAKAAKI
IPC: A61K8/06
Filed: 2001-03-13
Granted: 2007-11-11
Abstract: The present invention is an emulsified composition comprising (a) 0.01-5 wt% polysiloxane-polyoxyalkylene copolymer, (b) 0.05-1 wt% nonionic surfactant, (c) 10-30 wt% humectant, and (d) 1-50 wt% urea. The present invention provides an emulsified formulation of a urea-containing emulsified composition that has a superior emulsifying ability even with a lowered blend ratio of the surfactant, suppresses tingling due to urea, and is good feeling of use without stickiness even with a high blend ratio of the humectant.
Patent TW-I281465-B (TW)
Title: Process for the carbonylation of pentenenitrile
Inventor: DRENT EIT
IPC: C07C253/30
Filed: 2001-03-21
Granted: 2007-05-21
Abstract: Process to prepare a 5-cyanovaleric acid or its ester by carbonylation of a pentenenitrile, wherein pentenenitrile is reacted with carbon monoxide and water or an alcohol in the presence of a catalyst system. The catalyst system comprises: (a) a metal of group VIII or a compound thereof and (b) a bidentate phosphine, arsine and/or stibine ligand, wherein the bidentate ligand has the general formula (I): R1R2-M1R-M2-R3R4, wherein M1 and M2 are independently P, As or Sb, R is a divalent organic bridging group, which bridging group comprises a chain of 3 to 5 atoms directly connecting the 2 phosphorus atoms, which chain consists of carbon atoms and optionally a nitrogen, oxygen or sulphur atom or a silano or dialkylsilicon group, which alkyl groups independently comprise from 1 to 4 carbon atoms, and R1-R4 represent the same or different optionally substituted tertiary alkyl groups, (c) an acid having a pKa less than 3, as measured at 18 DEG C in an aqueous solution. The process to prepare 5-cyanovaleric acid or ester can be used in a process to prepare epsilon-caprolactam comprising: (i) carbonylation of pentenenitrile to 5-cyanovaleric acid or ester according to any one of claims 1-11; (ii) reduction of 5-cyanovaleric acid or ester as obtained in step (i) to 6-aminocaproic acid or ester, (iii) cyclisation of the 6-aminocaproic acid or ester to epsilon-caprolactam.
Patent TW-I256074-B (TW)
Title: Bilayer photolithography process
Inventor: LIN JR-YUNG
IPC: G03F7/40
Filed: 2001-05-07
Granted: 2006-06-01
Abstract: Disclosed is a bilayer photolithography process, in which, on a material layer waiting for patternization of a substrate, an un-photosensitive polymer layer and the upper photoresist layer are formed in sequence, exposure being carried out on the upper photoresist layer to form a patternized upper photoresist layer and part of the un-photosensitive polymer layer being exposed. Subsequently, a patternized photoresist layer is used as an etching mask and gas containing O2/HBr is used as a dry etchant to carry out etching to strip off the exposed un-photosensitive polymer layer to expose part of the material layer to be patternized.
Patent TW-593550-B (TW)
Title: Polysiloxane-urethane-polyacrylic acid/polyacrylate copolymer and method for producing the same
Inventor: YANG JENG-GAN
IPC: C08L83/10
Filed: 2001-05-17
Granted: 2004-06-21
Abstract: A macromonomer synthetic technique is used to introduce a polysiloxane-urethane macromonomer having an unsaturated bond on one end thereof into the side chain of a polyacrylic acid/polyacrylate, thereby forming a polysiloxane-urethane-polyacrylic acid/polyacrylate copolymer having better toughness and thermal resistance.