Patent CH-691595-A5 (CH)
Inventor: KUNZ MARTIN
IPC: C08F2/50
Filed: 1996-11-14
Abstract: A compound of formula (I) or (I') is claimed. In the formulae, R1 and R2 = phenyl or other aromatic hydrocarbon (optionally with heteroatom) optionally substituted 1-5 times by 1-20C alkyl, 2-20C alkyl which is interrupted by O, S(O)p or NR5, or are substituted by OR6, R6S(O)p, R6S(O)2O, R7R8N, R6OC(O), R7R8NC(O), R9C(O), R9R10R11Si, R9R10R11Sn, R12R13B, halogen, R9R10P(O)q and/or CN, with the proviso that the phenyl radical or the aromatic hydrocarbon radicals are substituted in at least one o-position, or R1 and R2 are 1-10C alkyl which is substituted by R9R10R11Si, or R1 and R2 form bridges to produce structures of formula (II), (IIa) or (IIb) in which the aromatic rings are optionally substituted by 1=20C alkyl, 2-20C alkyl which is interrupted by O, S(O)p or NR5, or are substituted by OR6, R6S(O)p, R6S(O)2O, R7R8N, R6OC(O), R7R8NC(O), R9C(O), R9R10R11Si, R9R10R11Sn, halogen, R9R10P(O)q and/or R12R13B; R2a = phenylene or other divalent aromatic hydrocarbon (optionally with heteroatom) optionally substituted 1-5 times by 1-20C alkyl, 2-20C alkyl which is interrupted by O, S(O)p or NR5, or are substituted by OR6, R6S(O)p, R6S(O)2O, R7R8N, R6OC(O), R7R8NC(O), R9C(O), R9R10R11Si, R9R10R11Sn, R12R13B, halogen, R9R10P(O)q and/or CN, or R2a = phenyl-1-6C alkylene; R3 = 1-20C alkyl substituted by R9R10R11Si, or is phenyl or other aromatic hydrocarbon (optionally with heteroatom) optionally substituted 1-5 times by 1-20C alkyl, 2-20C alkyl which is interrupted by O, S(O)p or NR5, or are substituted by OR6, R6S(O)p, R6S(O)2O, R7R8N, R6OC(O), R7R8NC(O), R9C(O), R9R10R11Si, R9R10R11Sn, R12R13B, halogen, R9R10P(O)q and/or CN; R4 = 2-20C alkyl which is interrupted by O, S(O)p and/or NR5 or is phenyl, other aromatic hydrocarbon, 1-20C alkyl, 3-12C cycloalkyl, 2-8C alkenyl, phenyl-1-6C alkyl or naphthyl-1-3C alkyl optionally substituted by OR6, R6S(O)p, R6S(O)2O, R7R8N, R6OC(O), R7R8NC(O), R9C(O), R9R10R11Si, R9R10R11Sn, R12R13B, halogen, R9R10P(O)q and/or CN; E = R14R15R16P, R6R6aS or R8R8aR7N; Y = (CH2)n, CH=CH, C(O), NR5, O, S(O)p or a group of formula (i); n = 0, 1 or 2, m = 2 or 3; p = 0, 1 or 2; q = 0 or 1; R5 = H, 1-12C alkyl or phenyl-1-6C alkyl or phenyl which are optionally substituted 1-5 times by 1-6C alkyl, 1-12C alkoxy or halogen; R6 and R6a = as R5 except H; R7, R8 and R8a = 1-12C alkyl, 3-12C cycloalkyl or phenyl-1-6C alkyl or phenyl which are optionally substituted 1-5 times by 1-6C alkyl, 1-12C alkoxy, R6OC(O), CN and/or halogen, or R7 and R8, together with the N to which they are attached, form a 5- or 6-membered ring which may additionally contain O or S atoms; R9, R10 and R11 = 1-12C alkyl, 3-12C cycloalkyl or phenyl-1-6C alkyl or phenyl which are optionally substituted 1-5 times by 1-6C alkyl, 1-12C alkoxy and/or halogen; R12 and R13 = as for R9, R10 and R11, or R12 and R13 may, together with the B to which they are attached, form a 5- or 6-membered ring; R14, R15 and R16 = 1-12C alkyl, 2-12C alkenyl, 3-12 C cycloalkyl (optionally substituted by R6OCO, or CN) or phenyl-1-6C alkyl or phenyl (optionally substituted 1-5 times by 1-6C alkyl, 1-12C alkoxy or halogen); G = a radical which is able to form positive ions; and if R1, R2 and R3 = 2,4,6-trimethylphenyl, R4 is not 2-20C alkyl or 2-8C alkenyl. Also claimed are: (i) a composition comprising: (a) ethylenically unsaturated photopolymerisable compound(s); and (b) compound(s) of formula (I) or (I') where all substituents are as above, except R3 which can additionally be 1-4C alkyl; (ii) a process for the photopolymerisation of non-volatile monomeric, oligomeric or polymeric compounds containing ethylenically unsaturated double bond(s); (iii) a substrate which is coated on its surface(s) with a composition as in (i); (iv) a process for the photographic production of relief images which comprises subjecting a coated substrate as in (iii) to imagewise exposure and removing the unexposed areas with a solvent; (v) a process for producing relief images which comprises exposing a coated substrate as in (iii) by means of a movable laser beam (without mask) and subsequently removing the unexposed areas with a solvent; and (vi) a process for the thermal polymerisation of compounds containing ethylenically unsaturated double bonds, which comprises using (I) as an initiator.