baber/WOPTO huggingface dataset:
Patent JP-S6287295-A (JP)
Title: Water cleaning device
Inventor: OE HIROAKI
IPC: C02F1/28
Filed: 1985-10-14
Abstract: PURPOSE:To prevent the intrusion and propagation of microorganisms into an adsorbent part and to obtain hygienic water by constituting the front and rear of the adsorbent part of a bacterium removing or bactericiding mechanism. CONSTITUTION:A body of a mechanism for cleaning up water is constituted of a mechanism 5 which can remove bacteria from the water or bactericide the water and the adsorbent part 4 sandwiched by said mechanism on the front and rear. The bacterium removing mechanism 5 is used for at least either of the front and rear of the part 4. The above-mentioned bactericiding and bacterium removing mechanisms are respectively UV irradiation and bactericiding filter. The bactericiding filter consists of a porous hollow yarn membrane 5. As a result, the intrusion and propagation of the microorganisms to the adsorbent part are prevented and the hygienic water is obtd.
Patent JP-H0897141-A (JP)
Title: Method of forming polycrystalline semiconductor layer, polycrystalline semiconductor tft, and beam annealing device
Inventor: MASUSHIGE KUNIO
IPC: H01L21/336
Filed: 1994-09-22
Abstract: PURPOSE: To provide a polycrystalline semiconductor film transistor having uniform distribution property by determining the thickness of an amorphous semiconductor film and the content of carbon in specified range, and the residence time in the direction of scanning of beam spot having the luminous intensity within the specified range of peak luminous intensity, in specified range. CONSTITUTION: The beam spot of a continuous wave laser beam is applied to an amorphous semiconductor film having silicon for its main ingredient, while scanning it. The amorphous semiconductor film is polycrystallized by beam annealing. At this time, the thickness of the amorphous semiconductor film is made 50-250nm. Moreover, the content (density) of carbon is made 5×10<18> cm<-3> or under. The residence time in the direction of the scanning of the beam spot 3 having luminous intensity of 60% or over of the peak luminous intensity is made 3-5μs, on the amorphous semiconductor film irradiated with a beam spot.
Patent JP-H05215873-A (JP)
Title: Continuous time interpolator
Inventor: POORU SUTEIIBUNSON
IPC: G04F10/04
Filed: 1992-08-27
Abstract: PURPOSE: To avoid a timing error by providing an orthogonal phase hybrid means shifting the phases of two signals from a reference transmitter by 90 deg., a sampling means, a digital means and an encoding means. CONSTITUTION: A continuous time interpolation apparatus 302 is equipped with an orthogonal phase hybrid 305, a synchronizing apparatus 304, a following hold (T&H) 306, an analogue/digital converter(DC) 308 and an encoding circuit 312. The hybrid 305 divides a reference oscillator 306 into two equal vibration signals so as to shift one phase by 90 deg. with respect to other phase. T&Hs 306A, 306B catch the analogue samples of a 0 deg. signal 322 and a 90 deg. signal 324. ADCs 308A, 308B take the synchronism of T&Hs 306A, 306B and ITout 320 takes the synchronism of the ADC 308 and, therefore, ITout 302 takes synchronism after output 332 is stabilized to be delayed by a time sufficient to transmit a signal to the ADC 308.
Patent JP-S6283772-A (JP)
Inventor: NORUBERUTO KONRATSUZU
IPC: G01T1/29
Filed: 1986-09-29
Abstract: (57)【要約】本公報は電子出願前の出願データであるた め要約のデータは記録されません。
Patent JP-H03119001-A (JP)
Title: Modified polyisobutene and its manufacture
Inventor: DEIITOMARU BENDAA
IPC: C08F4/06
Filed: 1990-08-31
Abstract: PURPOSE: To obtain the title novel polymer by subjecting isobutene to carbocationic polymerization by using an olefinic initiator and subjecting the reaction product to dehydrohalogenation before reacting the same with maleic anhydride.  
     CONSTITUTION: At first, isobutene is subjected to carbocationic polymerization by boron trichloride and olefin represented by formula X-R 1 -X or formula I (wherein R 1  is a olefinic unsaturated divalent group, X is halogen or alkoxy, Y is O or-O-CO-) and the obtained polyisobutene-(α-ω)-dihalide is dehalogenated and reacted with maleic anhydride to obtain an objective polymer represented by formula II (wherein R 2  is divalent groups represented by formulae III or IV and m and n are each a degree of polymarization of 1-1,000). In the reaction with maleic anhydride, 1.5-3 times excessive maleic anhydride is used and reaction is performed at 180-210°C in the absence of oxygen. 
     COPYRIGHT: (C)1991,JPO
Patent JP-H04111796-A (JP)
Title: Cutting method of image cutting device
Inventor: KIMURA MASAAKI
IPC: B26D5/00
Filed: 1990-08-30
Abstract: PURPOSE:To carry out cutting smoothly without lowering a cutting speed by arranging a synthesizing means to synthesize with a newly inputted cutting command when the inputted cutting command is at least smaller than a prescribed step volume. CONSTITUTION:Assuming that a cutting command such as (a j1) is smaller than the number of prescribed steps, data on the end point j1 is skipped so as to be synthesized with the end point j2 of the next data. That is, the data is the same with the cutting command such as (a j2). When the cutting command of this (a j2) still does not reach a prescribed step volume L, this data is skipped further. Assuming now that the prescribed step volume L is exceeded when (a j4) is attained by carrying out this operation successively. It follows from this that the above-mentioned plural number of cutting commands are finally replaced with a single cutting command such as (a j4) by a control means 4. By moving a cutting member 1 at a stretch according to this synthesized cutting command, a very smooth cutting can be carried out.
Patent JP-H0785843-A (JP)
Title: Variable color fluorescent lamp and lighting method therefor
Inventor: TANIMIZU SHINKICHI
IPC: H05B37/02
Filed: 1993-09-14
Abstract: PURPOSE:To provide a single fluorescent lamp suitable for comfortable illumination, whose light color is variable, and having simple shape and to provide the lighting method of the lamp. CONSTITUTION:Regarding a xenon sealed fluorescent lamp 20 to which plural kinds of phosphors 4 are applied, the plural kinds of phosphors 4 are phosphors which have different luminance saturation properties among them one another depending on the voltage applied to them and at the time of pulse lighting of the fluorescent lamp 20, the pulse voltage of a lighting apparatus 21 is adjusted under a specified duty ratio condition to change the light color of the single lamp. Consequently, though the sealed gas, the phosphors, and the lighting method are different from those for a widely used lamp, the lamp light colors have good color rendering properties since they have wavelength and waveform similar to those of conventional three light color's wavelength and waveform and the light color can be changed without exchanging the lamp based on hot and cold and wet and dry. Conditions when the sealed gas is xenon, environmental pollution is not caused even if the lamp is discarded after use.
Patent JP-2000139317-A (JP)
Title: Insect catching apparatus
Inventor: YAMAGUCHI KANICHI
IPC: A01M1/14
Filed: 1999-08-12
Abstract: PROBLEM TO BE SOLVED: To provide an insect catching apparatus capable of capturing harmful insects or eliminating insects like them by positively arranging the apparatus even at a place of public attention. SOLUTION: A doll main body 64 comprising a doll having a color as an interior is detachably disposed on an exchange part 68 for catching insects. The exchange part 68 for catching insects is detachably installed on a seat 62 by a strut part 67 also used as legs 65. The exchange part 68 for catching insects comprises a cylindrical member of a double structure, etc. In the case of the cylindrical member of the double structure, an inner cylinder is engaged with the strut part 67. Insects such as cockroaches, etc., crawl their way up from the part of the doll lets 65, attracted to a space of two cylindrical members of the exchange part 68 for catching insects and captured by a tacky member not shown in the figure. Since the appearance of the insect catching apparatus is a doll, it can be arranged at a place of public attention without hesitation.  The exchange parts 68 for catching insects can be properly changed.
Patent JP-H0278891-A (JP)
Title: Condenser
Inventor: TAKAHASHI FUMIO
IPC: F28B9/02
Filed: 1988-09-14
Abstract: PURPOSE:To prevent the stagnation of incompressible gas and reduce a pressure loss in the group of tubes by a method wherein inflow steam is made to flow into a steam distributing passage to make flow speed in the steam distributing passage highest it the inflow part of the passage while an outflow part is provided at the side of the inflow part of a condenser vessel in the group of cooling tubes. CONSTITUTION:The flow speed of steam, flowing from an inflow port 7, is increased since the sectional area of a steam inflow passage 5 is narrowed gradually and, thereafter, the steam flows into a steam distributing passage 6. A part of the steam flows into the group 2 of cooling tubes in the steam distributing passage 6 and, therefore, a mass flow speed in the steam distributing passage 6 is reduced and a pressure is increased. The flow resistance of the group of tubes in the group 2 of cooling tubes is large and, therefore, a pressure distribution is determined mainly by a pressure distribution in the outer periphery of the group 2 of cooling tubes or a pressure distribution in the steam distributing passage 6 and the flow resistance of the flow of steam in the group 2 of cooling tubes whereby a pressure below the group 2 of cooling tubes, which is in contact with the steam distributing passage 6, is reduced toward the outflow port 4 of the passage 6. Further, a pressure in the outflow port 4 is set so as to be lower than the pressure of a pressure reducing part whereby the pressure may be reduced even in a part above the group 2 of cooling tubes toward the outflow port 4.
Patent JP-S6290019-A (JP)
Title: Pushbutton tuner
Inventor: OHASHI TAMAKI
IPC: H03J5/08
Filed: 1985-10-16
Abstract: PURPOSE:To smooth the manual turning operation of a manual tuning mechanism at preset and to ensure the meshing by utilizing a lever ratio to mesh and press a meshing member into contact with a turning system of the manual tuning mechanism while the forwarding state of the channel selection member is held. CONSTITUTION:A press contact mechanism 50 is provided between a front end of an operating member 24 of a channel selection mechanism C and a meshing member 30 of the channel selection member 31. The mechanism 50 is engaged with a meshing member 30 and a has a projection 56 in point contact with a crown gear 29 and consists a lever piece 58 projected with a support piece 57 and an elastic pressure spring 61 inserted via a space section 59 and provided between the piece 57 and a support piece 60 of the space part 59. In forwarding state of the mechanism C, attended with the forwarding of members 24, 31, the tip of the lever piece 58 is depressed forward by the spring 61, the meshing member 30 is forwarded by the lever ratio and the crown gear 29 meshes with the pinion gear and is pressed into contact with the gear 20. Thus, in turning the knob 3, the torque is delivered to the channel selection mechanism C via a turning shaft 21. Thus, the elastic force exerted to the member 31 is only that of the restoring spring 37.
Patent JP-H1167452-A (JP)
Title: Organic thin film electroluminescent element
Inventor: NAGAI KAZUKIYO
IPC: C09K11/06
Filed: 1997-08-11
Abstract: PROBLEM TO BE SOLVED: To provide an element that is not deteriorated and excellent in durability by including an aromatic polycarbonate resin containing a specific constituent in at least one layer of a single or multiple layer organic compound thin film constituting a luminescent layer. SOLUTION: A constituent is expressed by formula. In the formula, R<1> designates a hydrogen atom, a substituted or unsubstituted alkyl group, or a substituted or unsubstituted aryl group. Ar<1> designates a substituted or unsubstituted aryl group. Each of Ar<2> and Ar<3> designates a substituted or unsubstituted allylene group. It is preferable that at least one layer of organic compound thin films of a luminescent layer should be comprised of a layer containing an aromatic polycarbonate containing a constituent unit expressed by formula and an electron carrying layer substance or furthermore containing a luminous substance.  At least one layer of a hole injecting-and-carrying layer contains a polycarbonate resin containing the constituent unit expressed by formula, or, on top of that, it is preferable that at least one layer of the positive hole injecting-and-carrying layer and/or the same electron injecting-and-carrying layer, or the same positive hole and electron injecting-and-carrying layer should contain the same constituent.
Patent JP-2001049316-A (JP)
Title: Stave for shaft furnace type metallurgical furnace and disposing structure thereof
Inventor: MITSUI SHOHEI
IPC: F27D1/12
Filed: 1999-08-13
Abstract: PROBLEM TO BE SOLVED: To obtain a copper-made stave for shaft furnace type metallurgical furnace, in which the suitable function can be displayed according to the fitting position in the furnace without developing the useless heat loss and the stability of a profile in the furnace, the extension of service life in the furnace body and the lowering of fuel cost can be realized. SOLUTION: As the copper-made stave for the middle part or the upper part range of the shaft in the furnace body, the projecting parts 1 are formed at the side surface in the furnace and also, the area ratio of the forming range of the projecting parts is <=40% of the projection area on the side surface in the furnace and the structure for holding refractory 3 into at least recessed part 2 between the projecting parts on the side surface in the furnace, is provided.  As the copper-made stave for the lower part range of the shaft or the range between the lower part in the shaft and tuyeres in the furnace body, the projecting parts are formed at the side surface in the furnace and also, the area ratio of the forming range of the projecting parts is >40% of the projection area on the side surface in the furnace and the structure, in which the depth of the recessed part between the projecting parts is <=100 mm, is provided.
Patent JP-H0654976-A (JP)
Title: Automatic sewing device
Inventor: SHINOMIYA HIROAKI
IPC: D05B57/38
Filed: 1992-08-05
Abstract: PURPOSE:To form unbent and regular stitches when sewing in any direction by providing a vertical shuttle with the axis normally faced in the normal direction and tilted by 90 deg. clockwise against the stitches at the time of the shuttle thread cast-off of a needle thread. CONSTITUTION:A shuttle pedestal 4 is rotatably supported on a frame F below a sewing machine bed, and a vertical shuttle 2 is rotatably supported on the shuttle pedestal 4. A shuttle drive motor 3 rotating the vertical shuttle 2 is fitted to the shuttle pedestal 4, and a shuttle pedestal drive motor 5 rotating the shuttle pedestal 4 is fitted to the frame F. The shaft 5a of the shuttle pedestal drive motor 5 is located on the extended axis of the needle 1 of a sewing machine, and the shuttle pedestal 4 is rotated centering on the needle location 8 when the shuttle pedestal drive motor 5 is rotated. The center 2a of the shuttle 2 is controlled to be tilted by 90 deg. clockwise against stitches 7 at the time of the shuttle thread cast-off when the stitches 7 are formed on a fabric 6 to be sewn in the fabric feed direction 9 inclined by the angle alpha against the standard fabric feed direction 10.
Patent JP-H07174800-A (JP)
Title: Surface measuring instrument
Inventor: NISHIMATSU SHIGERU
IPC: G01R31/26
Filed: 1994-09-26
Abstract: PURPOSE:To prevent generation of leak current due to the contact of an electrode and accurately measure charge distribution by using an electrode where the air gap on a semiconductor surface can be varied and by measuring C-V (capacityvoltage) while applying voltage by changing the gap. CONSTITUTION:Silicon oxide film 2 is formed on silicon 1 and an electrode 3 is brought closer to the oxide film 2 by a variable mechanism 4 for measuring C-V characteristics. A rough-move mechanism by a micrometer and a fine-move mechanism by a piezoelectric actuator are provided at the movable mechanism 4 and capacity is measured and then the distance from the oxide film 2 is obtained. The electric field in the most of oxide film 2 exists M on the outermost surface of the interface with the silicon 1 and is nearly uniformly distributed in the film 2. Therefore, by changing gap and performing C-V measurement at three points, each electric charge can be measured. Also, when electric charge is properly distributed, C-V measurement is performed for many times by changing gap. Then, when data are analyzed by a CPU, the electric charge distribution in the film 2 can be estimated without any destruction.
Patent JP-H1165548-A (JP)
Title: Image display device
Inventor: MICHIYOSHI HIROSHI
IPC: G09G5/18
Filed: 1997-08-26
Abstract: PROBLEM TO BE SOLVED: To make delay of display data small, while suppressing a circuit scale from increasing in an image display device having a scrolling function. SOLUTION: A second horizontal addition value is obtained by adding a horizontal offset data HO to a first horizontal addition value SH1 which is the addition value of a horizontal count value H and a horizontal display position data HP and codes of characters to be displayed are read out from a table memory 34 by making these upper 6 bits SH2 [8:3] as one part of an address A. Image data Dh which is equivalent to one line in the horizontal direction of the characters are read from an image memory 36 by making these codes one part of an address AI, and these data are parallel inputted so shift register 38 in timings corresponding to the horizontal offset data HO according to a load signal LD generated from the lower 3 bits SH2 [2:0] of the second horizontal addition value.  The shift register 38 serially outputs the input image data through a dot clock CL and an image is displayed by using these serial image data.
Patent JP-S59107521-A (JP)
Title: Method for formation of protective film on semiconductor element
Inventor: IGARASHI KAZUMASA
IPC: H01L21/312
Filed: 1983-12-05
Abstract: PURPOSE:To enable to form a polyimide protective film having an excellent adhesive property and dampproof characteristics by a method wherein a specific ratio of diaminosiloxane and non-silicon containing diamine are simultaneously polymerization-reacted with tetracarboxylic acid dianhydride. CONSTITUTION:The diaminosiloxane indicated in general formula I and the diamine containing no silicon atom in a molecule are simultaneously polymerization-reacted with aromatic tetracarboxylic acid dianhydride. When said polymerization reation is going to be performed, the mixing ratio of diaminosiloxane is brought within the range of 1-4mol% for the total quantity of diamino compound and also the content of silicon contained in the final reactant is set at 0.5wt% or below, thereby enabling to obtain siloxane denatured polyimide precursor, which is applied on the surface of a semiconductor element. After application of said material, a polyimide protective film is formed by performing a high temperature heat treatment. As a result, the polyimide protective film of excellent adhesive and dampproof properties for element surface can be obtained.
Patent JP-S6289521-A (JP)
Title: Manufacture of curved steel material
Inventor: KUBOTA NOBUYASU
IPC: B21C37/00
Filed: 1985-10-15
Abstract: PURPOSE:To blank out steel belts to be formed to a curved steel material from a steel plate without unavailing by melt cutting each steel belt to constitute the curved steel material from the steel plate in the shape of straight line that is the stretched shape of the curved steel belt and to combine into specific sectional shape, then heating to curve. CONSTITUTION:As the straight steel material is curved by an extruder 13, loaded on a conveyer 14 and its top end is passed through a heat generating heater 16 to a chuck 18. At bending the intermediate part, the top end of that bending part is fixed oppositely to the heat generating heater 16 and a feeding device 15 is driven to extrude the steel material. The periphery of the steel material opposed to the heat generating heater 16 is red heated in a narrow width, and in accordance with its extruding, a guide bar 19 is rotated to bend the straight steel material and to cool quickly with water.
Patent JP-H0766845-A (JP)
Title: Information flow rate limiting device
Inventor: HIGUCHI SHINICHI
IPC: H04Q3/00
Filed: 1993-08-24
Abstract: PURPOSE:To reduce an abort quantity by aborting a control object information block only when the total number of transmission queue information blocks in a shared memory to each outgoing line is more than a threshold shared memory capacity and each block number is more than a threshold of the outgoing line queue length. CONSTITUTION:A queue length monitor block 41 counts number of information blocks addressed to each outgoing line to be sent in a common memory 2 and an information block detector 44 detects the arrival of a non-priority information block. Furthermore, 1st and 2nd registers 42, 43 have a threshold level A for a total capacity of the memory 2 and a threshold level B used to discriminate the congestion state of each outgoing line queue. A 1st comparator 45 compares the total number of information blocks in the memory 2 with the threshold level A and a transmission wait information block number to each outgoing line stored in the block 41 with the threshold level B respectively. Only when the threshold levels A, B are smaller, an abort control block 47 aborts the non-priority information block. Thus, the memory 2 is used efficiently and the abort information block quantity is reduced.
Patent JP-S6386433-A (JP)
Title: Photoresist coating method
Inventor: KITAURA YOSHIAKI
IPC: G03F7/16
Filed: 1986-09-30
Abstract: PURPOSE:To prevent the generation of defects in a photoresist by a method wherein, when the photoresist is rotary painted on a semiconductor substrate and the photoresist on the substrate edge is removed, a guide ring smaller in size than the substrate is moved close to the substrate, and high pressure gas is blown into said guide ring. CONSTITUTION:After the dust on the surface of a semiconductor substrate 11 has been cleaned by rotating the substrate at high speed, a photoresist 12 is dripped thereon. Then, the semiconductor substrate 11 is rotated at the revolution number for the period with which the desired film thickness can be obtained, and a photoresist film is formed on the semiconductor substrate. Subsequently, a guide ring 13, having the diameter smaller by 3 mm than the semiconductor substrate 11, is brought to the point aparted from the substrate by 1 mm, the substrate 11 is rotated while N2 gas is being fed into the guide ring 13, and resist thinner 14 is blown against the edge of the substrate. Besides, the substrate is rotated for drying and removal of the atmosphere of resist thinner. As a result, the intrusion of the splash and the atmosphere of said thinner into the center part of the substrate can be prevented, and the defectless photoresist can be formed.