baber/WOPTO huggingface dataset:
Patent JP-2002123280-A (JP)
Title: Speech synthesis method, speech synthesizer, and recording medium recording speech synthesis processing program
Inventor: HASEGAWA HIROSHI
IPC: G10L19/07
Filed: 2000-10-16
Abstract: PROBLEM TO BE SOLVED: To realize the generation of a synthetic sound similar to a way of speaking that a human speaks very naturally with small-scale hardware. SOLUTION: Among phoneme information, pitch information and power information obtained by syntax analysis, the pitch information and the power information are inputted into a sound source generating part 1, and then inputted into an LSP synthesis filter 2 after generating a typical pitch pulse (standard pitch pulse). The phoneme information is inputted into an LSP parameter converting part 3. The LSP parameter converting part 3 selects a corresponding LSP standard parameter from an LSP standard parameter storage part 4. The selected LSP standard parameter is converted into an LSP parameter having similarity with more natural utterance by using a DRNN. The LSP parameter is outputted to the LSP synthesis filter 2. The LSP synthesis filter 2 outputs synthesized speech by performing a convolution operation by using the standard pitch pulse and the conversion-processed LSP parameter.
Patent JP-2001342564-A (JP)
Title: Method for preparing metallic thin film and preparation device
Inventor: ABE TAKAO
IPC: C23C16/14
Filed: 2000-10-20
Abstract: PROBLEM TO BE SOLVED: To provide a method for preparing a noble metal thin film, which has a fast deposition rate, can use cheap raw materials and does not leave impurities on the thin film. SOLUTION: The method for preparing a metallic thin film includes steps of; supplying a raw material gas 55 including chlorine into an introduction vessel 11 having a perforated plate 12 made from Cu; converting the raw material gas 55 into plasma; forming a precursor 13 of Cu component included in the perforated plate 12 and chlorine in the material gas 55 by etching the perforated plate 12 with the material gas plasma; converting hydrogen gas into plasma; discharging the precursor 13 from the introduction vessel 11, putting it through a rotating magnetic field, accelerating and making run toward a substrate 15; and forming a Cu thin film 62 on the substrate 15 by hitting the precursor 13 onto the substrate 15 after removing the chlorine by putting the precursor 13 through the hydrogen gas plasma.
Patent JP-2002130563-A (JP)
Title: Pipe joint
Inventor: OKUBO ATSUSHI
IPC: F16L15/04
Filed: 2000-10-20
Abstract: PROBLEM TO BE SOLVED: To provide a pipe joint capable of reducing labor and time requiring to connect two tubular members. SOLUTION: A pair of fitting members 1, 2 is rotably and undetachably connected to each other. A tapered female threaded portion 11 on which a gas tube is screwed and fastened is on one of the fitting member 1 whereas a tapered male threaded portion 21 on which it is screwed and fastened to the gas induction inlet of a gas appliance is on the other of the fitting member 2.
Patent JP-2002134630-A (JP)
Title: Semiconductor device and its manufacturing method
Inventor: YOSHIHARA IKUO
IPC: H01L21/8242
Filed: 2000-10-25
Abstract: PROBLEM TO BE SOLVED: To make a contact resistance low by excluding etching damage and mixture of carbon, etc., and then by forming a metal silicide layer, in a semiconductor device having an electrostatic discharge protection element between a dopant diffused layer connected to an external I/O terminal and an input/ output MOS transistor. SOLUTION: In a semiconductor device having the electrostatic discharge protection element 1 between the dopant diffused layer (high concentration dopant diffused layer 29e for taking out) connected to the external I/O terminal and the input/output MOS transistor 3, at least one transistor of a circuit element comprises at least two dopant diffused layers of different concentration and a MOS transistor formed by a salicide process, the electrostatic discharge protection element 1 comprises a protective resistance region 31 including a low concentration dopant diffused layer 23, the high concentration dopant diffused layer 29e for taking out, formed in self-alignment manner to a side wall forming layer 26 (a mask layer 28) provided thereupon, and a metal silicide layer 33 formed thereupon.
Patent JP-2002127896-A (JP)
Title: Drive device of monorail carrier
Inventor: MATSUI SUMIYUKI
IPC: B61B13/04
Filed: 2000-10-27
Abstract: PROBLEM TO BE SOLVED: To provide a monorail carrier furnished with a drive device of a motive power unit capable of increasing the number of occupants and increasing traveling speed by reducing the weight of a frame body by eliminating a carriage for a driver by improving an operating property of an operation lever and a change lever as well as provided with a seat at a position favourable in weight balance. SOLUTION: The monorail carrier provided with the drive device is constituted by providing an engine 8 on a frame 6 and a centrifugal brake and a stop brake 9 on an intermediate shaft to which motive power is transmitted from the engine 8, providing a reduction gear having a driving wheel 1 to provide thrust by being engaged with a rack and a hole of a rail on a terminal shaft, providing the operation lever 5 to connect to and disconnect from the motive power from the engine 8 and the change lever 7 to change the traveling direction forward and reverse, providing a handle 11 of the driver in front of the operation lever 5 and the change lever 7 and constituting the seat 4 on which the driver can be seated in a position on cover a part of the frame body in the rear.
Patent JP-2001323175-A (JP)
Title: Resin composition
Inventor: KAWAMURA SHUKICHI
IPC: B32B27/00
Filed: 2000-10-30
Abstract: PROBLEM TO BE SOLVED: To produce a resin composition that has visible light and UV light shielding function, gas barrier properties and moldability at the same time. SOLUTION: The resin composition comprises (A) a gas barrier resin, (B) an inorganic substance having a particle size of 0.1-0.5 μm, (C) an inorganic substance having a particle size of 0.01-0.06 μm and, as an optional component, (D) one or more than one compound selected from a 4-24C higher fatty acid, its metal salt, its ester and its amide and contains, per 100 pts.wt. the component (A), 1-15 pts.wt. the component (B), 0.5-5 pts.wt. the component (C) and 0-0.5 pts.wt. the component (D).
Patent JP-2002141259-A (JP)
Title: Manufacturing method for semiconductor device
Inventor: YAMADA KAZUYA
IPC: G03F7/36
Filed: 2000-10-30
Abstract: PROBLEM TO BE SOLVED: To provide a manufacturing method where a satisfactory resist pattern is formed on a wafer, and the resist pattern is removed easily without damaging the wafer. SOLUTION: The manufacturing method consists of a process (i), where a water-soluble organic layer is formed on the film to be worked or on a substrate and a resist layer for silylation is formed on it; a process (ii) wherein a prescribed pattern is exposed to the resist layer for silylation, an exposed part is subjected to silylation, so as to be dry-developed by using an oxygen plasma and the resist layer in the prescribed pattern is formed; and a process (iii) wherein a desired treatment is executed by using the resist layer into a desired pattern as a mask and a process (iv) where the organic layer is removed by using an aqueous solution and the resist layer is lifted off.
Patent JP-2002141311-A (JP)
Title: Wafer polishing method and wafer washing method
Inventor: TSUCHIYA TOSHIHIRO
IPC: B24B37/30
Filed: 2000-10-31
Abstract: PROBLEM TO BE SOLVED: To provide a wafer polishing method which prevents contamination caused by polishing agent and reduces nanotopography, and a wafer washing method which removes a protection film from a polished wafer readily. SOLUTION: In a method for polishing a wafer by holding one surface of a wafer by evacuation to a holding table while adding polishing agent with the other surface of a wafer held to a polishing cloth, the other surface of a wafer is polished with a wafer. A protection film of a plurality of layer is formed in one surface and held by a holding table. A first protection film which absorbs irregularities of one surface of a wafer is formed in a side in contact with a wafer in a protection film of a plurality of layers, and a second protection film with etching resistance to polishing agent is formed in a side held by a holding table. A wafer polished by the wafer polishing method is immersed in alkaline solution, isopropyl alcohol and alkaline solution in this order and a protection film of a plurality of layers formed in a wafer is removed.
Patent JP-2002136473-A (JP)
Title: Intracavity observation apparatus and light guide mounting method for the same
Inventor: KOMI SHUJI
IPC: A61B1/00
Filed: 2000-11-02
Abstract: PROBLEM TO BE SOLVED: To constitute a light guide formed by bundling extremely fine optical fibers in such a manner that the light guide can be illuminated with a light quantity free of unevenness and can be easily assembled to a distal end body. SOLUTION: A mold member 55 for mounting the light guide 31 formed to an arcuate shape to the right and left of the inner peripheral surface of a distal end body 32 consists of a body tube 42 of an observation system unit 40 and a member having the same external form shape as that of body tube holding members 43a and 43b continuing therein. Arcuate spaces 58L and 58R are formed on both right and left sides of the distal end body 32 and the many extremely fine optical fibers 31F constituting the light guide 31 are inserted into the distal end body 32 from its base end side and are projected from the distal end side. Adhesives are applied to the projecting segments and the optical fibers are pulled into spaces 58L and 58R to the position where the fibers slightly project from the distal end face of the distal end body 32.  The fibers are thus adhered to the inside surface of the distal end body 32. The end face of the light guide 31 projecting from the distal end body 32 is polished, by which the exit end for illumination light is formed.
Patent JP-2002139043-A (JP)
Title: Dynamic pressure bearing, polygon scanner, and their manufacturing method
Inventor: SUZUKI MITSUO
IPC: F16C33/12
Filed: 2000-11-06
Abstract: PROBLEM TO BE SOLVED: To provide a dynamic pressure bearing capable of precluding rotational vibration in the high-temperature, high rotation condition while the anti- abrasiveness of a rotor is well maintained, also a polygon scanner incorporating such a bearing, and establish their manufacturing method. SOLUTION: The dynamic pressure bearing 25 includes rotor 2 made of metal and a support 4 for the rotor 2 and the polygon scanner 1 incorporates such a bearing 25, and the invention also includes a method for manufacturing them, whereby a coating film is formed by thermal spray on that surface 3 of the rotor 2 confronting the support 4 and a polygon mirror 9 is formed after formation of the film so that the intended polygon scanner 1 is accomplished.
Patent JP-2002145368-A (JP)
Title: Returnable case
Inventor: TAKATSUJI HIDEMASA
IPC: B65D81/02
Filed: 2000-11-10
Abstract: PROBLEM TO BE SOLVED: To provide a foldable returnable case in which a load does not shift. SOLUTION: In forming this returnable case 10, horizontal frame materials 111, 111, 112, 112 are laid on supports 113, 113, 114, 114 for forming a frame base 11. On the base 11, facing side frame bodies 12, 13 are provided standing along the supports 113, 113, 114, 114. The top of the frame bodies 12, 13 are connected one by one with horizontal frame materials 15 and 17. The top of the supports are formed with connecting parts 117, 141 to be connected with the bottom end of the vertical frames 121, 131 of the frame bodies 12, 13. In assembling the box 10, the frame bodies 12, 13 are mounted standing on the frame base 11 facing each other, the facing frame bodies 12, 13 are connected with horizontal frame materials 15, 17, and the bottom end of the bodies 12, 13 are connected and fixed with the supports using a connecting bolt 18 and a locking plate 20.
Patent JP-2002151448-A (JP)
Title: Cmp pad for cerium oxide polishing agent and method of polishing wafer
Inventor: NISHIYAMA MASAYA
IPC: B24B37/20
Filed: 2000-11-13
Abstract: PROBLEM TO BE SOLVED: To provide a CMP pad for a cerium oxide polishing agent with which a substrate such as a silicon oxide film or the like can be polished efficiently at a high speed and can readily control its process in a CMP technique for planarizing an interlayer dielectric, and a BPSG film and a shallow trench isolation insulating film, and to provide a method of polishing a wafer by using the same. SOLUTION: This CMP pad for a cerium oxide polishing agent is used to polish a thin film formed on a substrate chemically and mechanically by using a cerium oxide polishing agent and has fine projections and depressions on the surface. The mean surface roughness Ra along the center line of the pad surface is defined by the ratio to the D99% grain size of polishing agent particles measured by a laser scattering grain size distribution measuring instrument.
Patent JP-2002144585-A (JP)
Title: Method for manufacturing ink jet head
Inventor: YAMAZAKI SEIJI
IPC: B41J2/055
Filed: 2000-11-14
Abstract: PROBLEM TO BE SOLVED: To enhance productivity when boron doping is performed in a vertical furnace and to lessen damage onto an Si substrate by making thermal diffusion of boron uniform. SOLUTION: Si substrates 41 placed facing each other in the vertical direction of a diffusion source 51 of a solid principally comprising B2O3 is thermally diffused with high density boron in a vertical furnace. Following to the boron dope process, the Si substrates are immersed into hydrofluoric aqueous solution and a boron doped layer formed on the side opposite to the boron doped surface is removed.
Patent JP-2002153033-A (JP)
Title: Ipm motor
Inventor: FUJIWARA KENJI
IPC: B60L50/10
Filed: 2000-11-15
Abstract: PROBLEM TO BE SOLVED: To suppress torque ripples of an IPM motor. SOLUTION: This IPM motor has a stator (12) which is provided with n1 pieces of slots (161-1612) and a rotor (11) which has a flank (11a) opposed to the stator (12). The rotor (11) includes n2 pieces of magnets (14) and a magnetic force line inductor (13a) positioned between the magnets (14) and the flank (11a). At this time, n1 and n2 satisfy the relation n1<n2.
Patent JP-2002115181-A (JP)
Title: Method for processing nonwoven fabric
Inventor: FUKUDA JIRO
IPC: D04H1/425
Filed: 2000-11-16
Abstract: PROBLEM TO BE SOLVED: To apply water-repelling treatment and dyeing treatment to a nonwoven fabric containing cellulosic fiber and produced by spun lace method without causing the uneven dyeing and the lowering of strength. SOLUTION: A nonwoven fabric containing cellulosic fiber and produced by spun lace method is treated with an aqueous dispersion containing a synthetic rubber latex and/or a synthetic resin emulsion containing a pigment and an amphoteric ion composite layer structure and a water-repelling agent having a perfluoroalkyl group.
Patent JP-2002157532-A (JP)
Title: Device for transferring electronic value
Inventor: TERADA MASAYUKI
IPC: G06Q20/00
Filed: 2000-11-20
Abstract: PROBLEM TO BE SOLVED: To provide an electronic value transferring device which can transfer an electronic value from a transmitter to a receiver only with the first communication and can be realized with a device having a small quantity of storage capacity. SOLUTION: This electronic value transferring device receives electronic value transfer information including an electronic value, receiver identification information, electronic value transfer identification information and an electronic signature from the transmitter, generates record information corresponding to the electronic value transfer information, stores a list of already received records consisting of its own identification information, lower limit electronic value transfer identification information and a plurality of records, verifies the electronic signature, verifies that the electronic value transfer identification information is newer than the lower limit electronic value transfer identification information, that a record is not included in the list of already received records and that the identification information of the receiver coincides with its own record,  and adds the record to the list of the already received records and eliminates an older record from the list of the already received records only when all verification is successful, that is, when signature verification, electronic value transfer identification information verification, unreceived record verification and receiver identification information verification are successful.
Patent JP-2002156203-A (JP)
Title: Displacement sensor
Inventor: KIMURA MASAHIRO
IPC: G01B7/30
Filed: 2000-11-20
Abstract: PROBLEM TO BE SOLVED: To provide a displacement sensor in which the operation of a specimen is transmitted surely and whose performance is enhanced. SOLUTION: The displacement sensor 30 is provided with a coupling 2 which comprises a pressure part 2a, which is connected to the specimen 10 and which performs a rotating operation by the movement of the specimen 10, a rotation transmission member 1 comprising pressure receiving parts 1a on both sides in a direction of rotation in which the pressure part 2a is turned and a position detection means 4 which is installed at the member 1. The displacement sensor is constituted in such a way that the coupling 2 comprises an auxiliary pressure part 2b and that the member 1 comprises auxiliary pressure receiving parts 1b, 1j pressed by the part 2b.
Patent JP-2002170950-A (JP)
Title: Method of controlling thickness of screen oxide layer
Inventor: GO CHOSHAKU
IPC: H01L21/306
Filed: 2000-11-22
Abstract: PROBLEM TO BE SOLVED: To improve the electric nature of a semiconductor by solving the question that a screen oxide layer becomes excessively nonuniform with respect to its thickness. SOLUTION: There are provided a substrate with gates 34, 36 disposed on specified surface regions, a screen oxide layer 44 disposed on a substrate surface so as to surround the gates 34, 36, and an insulation layer covering the gates and the screen oxide layer. The insulation layer on the gate surface and the substrate surface is removed by anisotropically dry etching to form gate spacers 43 on the insulation layer remaining on the gates side walls, and the screen oxide layer 44 not covered with the spacers is wet etched down to a specified thickness using diluted hydrofluoric acid(DHF).
Patent JP-2001219973-A (JP)
Title: Preservation method and subdivision pack kit for silicone composition
Inventor: NAKAGAWA HIROYUKI
IPC: B65D81/20
Filed: 2000-11-24
Abstract: PROBLEM TO BE SOLVED: To provide a preservation method for subdivision packed components which are mixed for forming a hardened silicone composition. SOLUTION: Agents in each of subdivision packs for a silicone composition which can be hardened are preserved under the depressurized condition. Thereby the number of bubbles in the hardened body of the silicone composition can be reduced and decline of strength can be prevented for the hardened body.
Patent JP-2002161646-A (JP)
Title: Method and apparatus for automatically correcting oblique parking in mechanical multistory parking space
Inventor: NAKAJIMA OSAMU
IPC: E04H6/18
Filed: 2000-11-27
Abstract: PROBLEM TO BE SOLVED: To prevent a vehicle from obliquely parking with respect to a storing elevator. SOLUTION: There is provided an apparatus for automatically correcting oblique parking of the vehicle 1, which detects side surfaces of front and rear wheels 1a and 1b of the vehicle 1 by means of projectors 31 and 32 and photo receivers 33 and 34, to thereby detect tread width centers of the front and rear wheels 1a and 1b. When the tread width center of each of the front and rear wheels 1a and 1b is matched with the center of the storing elevator 3, first and second fork conveyors 14A and 14B are stopped.
Patent JP-2002160312-A (JP)
Title: Method for printing on internal circumferential surface of paper tube and paper tube manufacturing apparatus using the same
Inventor: ITO AKIHIRO
IPC: B31C3/00
Filed: 2000-11-27
Abstract: PROBLEM TO BE SOLVED: To provide a printing method for quickly and easily displaying lot numbers or the like on an internal circumferential surface of a paper tube regardless of a size of its internal diameter, and a manufacturing apparatus for the paper tube to which the method is applied. SOLUTION: Tapes 16, 17, 18 and 19 drawn from a plurality of rolls 16a, 17a, 18a and 19a respectively are wound on a mandrel 11 in such a manner that the tapes are spirally superimposed so as to form a long-sized paper tube A. When the long-sized paper tube is cut at a proper length for manufacture of paper tubes with a predetermined width, a mark or the like is printed on the tape 16 forming the internal circumferential surface of the paper tube A at the place between the roll 16a and the mandrel 11.
Patent JP-2002160052-A (JP)
Title: Melting holding furnace
Inventor: NAGAKO YUKIHISA
IPC: B22D17/28
Filed: 2000-11-27
Abstract: PROBLEM TO BE SOLVED: To provide a pot type melting holding furnace, which is free from such danger that brings about a vapor explosion even though a pot is broken, and moreover, makes it easy to exchange an inner case which is embedded with an induction coil. SOLUTION: A melting pot 3 is stored in a body 2 of a furnace which is provided with a fire resisting layer 8 around its inner side in a condition that a space 10 is provided between the fire resisting layer 8 and the melting pot 3. An inner case 6 of the body 2 of the furnace which is embedded with the induction coil 9 inside the fire resisting layer 8, is made as a cartridge type case detachable from an outer case 5, so that the inner case 6 in which the induction coil 9 is embedded can be exchanged easily.
Patent JP-2002166755-A (JP)
Title: Power distribution control device
Inventor: IDO YUSAKU
IPC: B60W10/18
Filed: 2000-11-29
Abstract: PROBLEM TO BE SOLVED: To improve reliability and productivity of a power distribution control device and to enlarge a loaded object range of the device related to a car type, by securing independency of the power distribution control device. SOLUTION: In a step 210, a value of a quick brake control flag F (1: quick brake control mode, and 0: normal control mode) is discriminated, and a 'quick brake discriminating routine' is called and executed for F=0. In the quick brake discriminating routine, the control device discriminates a quick brake state of a vehicle by itself, and determines whether movement to the quick brake control mode is performed. The process proceeds to a step 240 when a return code RC is 0 (normal state), or to a step 245 when the RC is 1 (quick brake state). It is estimated that an ABS operates when the quick brake state is detected continuously T1 times. When F is 1, an engaging degree r of a coupling is 0 and rear wheels are not driven, so that interference phenomenon between ABS control and 4WD control does not occur in the quick brake control mode.