baber/WOPTO huggingface dataset:
Patent TW-366623-B (TW)
Title: Improvements in high speed electric motors
Inventor: LOVATT HOWARD C
IPC: H02K1/27
Filed: 1998-01-23
Granted: 1999-08-11
Abstract: A high speed, brushless, DC motor has a rotor comprising a solid rare earth magnet core magnetized diametrically. The rotor includes a sleeve surrounding the magnet core to radically constrain the core during high speed rotation thereof. The sleeve extends axially in both directions from the core to form a hollow shaft for the rotor. The sleeve is formed of non-magnetic, low electrical conductivity material. Control circuitry is provided including an electronic inverter of a predetermined rating, the control circuitry including means to maintain substantially constant power through the range of motor speeds from a base speed to a maximum speed while maintaining a power factor close to 1.0.
Patent TW-408148-B (TW)
Title: Polyamide composition for car parts
Inventor: KONING CORNELIS EME
IPC: C08L77/06
Filed: 1998-03-17
Granted: 2000-10-11
Abstract: Polyamide composition for car parts, the polyamide of which consists substantially of units derived from aliphatic dicarboxylic acids and diamines and 1 to approx. 40 wt.% of the chain units is derived from one or more cycloaliphatic dicarboxylic acids and an aliphatic diamine or one or more cycloaliphatic diamines and an aliphatic dicarboxylic acid.
Patent TW-367468-B (TW)
Title: Image detector, manuscript scanner and manufacturing method of image detector
Inventor: MATSUMOTO TOSHIO
IPC: H01L27/14
Filed: 1998-04-21
Granted: 1999-08-21
Abstract: The invention provides a kind of image detector which can easily remove the foreign matter entered into the frame composed of the detection board, glass plate and the frame borders with no need to disassembly the detection board and glass plate. The method is to have the opening inside the image detector or have the external penetrated hole on one side face of the frame border or both faces inside. The frame border is to support the photoactive components installed on the substrate and the stick-like lens array. The penetrated hole is sealed by removable tape.
Patent TW-455577-B (TW)
Title: Process for purification of dimethyl sulphoxide (DMSO)
Inventor: COMMARIEU ANNIE
IPC: B01J39/04
Filed: 1998-05-15
Granted: 2001-09-21
Abstract: The invention relates to the purification of dimethyl sulphoxide (DMSO). The dimethyl sulphoxide (DMSO), to be purified is placed in contact with an ion exchange resin of sulphonic type in -SO3NH4 form, and the DMSO is then separated from the resin. The DMSO thus obtained has an iron cation content lower than 1 ppb and a sodium cation content lower than 2 ppb.
Patent TW-408461-B (TW)
Title: Method of removing the residue species in the spin-on-glass process
Inventor: GUO TANG-MIN
IPC: H01L23/52
Filed: 1998-06-19
Granted: 2000-10-11
Abstract: There is disclosed a method of removing the residue species in the spin-on-glass process, which utilizes the gas- flow to remove the residue species piled up on the surface of the wafer in the spin-on-glass (SOG) etch-back process. The method comprises providing a wafer on which a front-stage process is completed for metal interconnects, wherein a metal layer is formed; then, spin coating the SOG layer and proceeding SOG etch-back; after completing the etching, the plasma being power off; and then, applying the inert gas to remove the residue species in the spin-on-glass (SOG) process.
Patent TW-396524-B (TW)
Title: A method for fabricating dual damascene
Inventor: HUANG YI-MIN
IPC: H01L21/321
Filed: 1998-06-26
Granted: 2000-07-01
Abstract: A method for fabricating dual damascene is provided. Firstly form the first inter-metal dielectric layer and stop layer in turn on semiconductor substrate; then define the first photo-resist pattern of dummy metal line and via opening. Etch the stop layer to form via opening, and deposit the second inter-metal dielectric layer. Then, define the second photo-resist pattern and to form metal trench by etching, and cover the wafer with glue layer and metal layer. Finally, proceed to chemical mechanical polishing process to form dual damascene metal structure. Adopting the shallow metal-line dummy pattern provided by present invention could reduce metal line thickness loss in chemical mechanical polishing, and avoid the increase of parasitical capacity induced by the use of dummy metal line, moreover, no extra process is required.
Patent TW-581911-B (TW)
Title: Formation method of lumpy pattern and color filter for liquid crystal display apparatus manufactured by the same
Inventor: MATSUSHIMA KINJI
IPC: G02B5/20
Filed: 1998-06-26
Granted: 2004-04-01
Abstract: The present invention provides a formation method of lumpy pattern and includes the followings: the first engineering, in which the photosensitive resin layer composed of alkaline non-dissolved resin and negative type photosensitive resin is formed on the substrate; the second engineering, in which the photosensitive resin layer is exposed through the mask having the desired opening pattern; and the third engineering, in which the photosensitive resin layer is developed through the use of alkaline developer and is hardened to form the lump pattern composed of the protruding portion corresponding to the exposed opening pattern region, and the recessed portion corresponding to the un-exposed region. In addition, the formation method of lumpy pattern is provided, and the method contains the followings: the first engineering, in which the photosensitive resin layer is undergone with a heating process to solidify at least one part of the thermally hardening resin after the photosensitive resin layer composed of the thermally hardening resin and negative type photosensitive resin is formed on the substrate; the second engineering, in which the photosensitive resin layer is exposed through the mask having the desired opening pattern; and the third engineering, in which the photosensitive resin layer is developed through the use of alkaline developer and is hardened to form the lump pattern composed of the protruding portion corresponding to the exposed opening pattern region and the recessed portion corresponding to the un-exposed region. Furthermore, a color filter for liquid crystal display apparatus is provided in the invention, in which the color filter has the followings: a substrate; a coloring layer composed of plural colors formed by the assigned patterns on the substrate; the transparent protection layer formed to at least covering the coloring layer; and the transparent pillar protruding portion, which is more protruding than the transparent layer and is formed at plural assigned portions on the substrate such that the transparent passivation layer and the pillar protruding portion are formed according to the method stated above.
Patent TW-396268-B (TW)
Title: Apparatus for retaining a workpiece in a process chamber within a semiconductor wafer processing system
Inventor: MAROHL DAN A
IPC: H01L21/683
Filed: 1998-10-12
Granted: 2000-07-01
Abstract: Apparatus for retaining a workpiece in a process chamber of a semiconductor wafer processing system. The apparatus has a thermal transfer element, an electrostatic chuck on top of the thermal transfer element and a clamping ring that secures the chuck to the thermal transfer element is a predefined orientation. The detachable, ""keyed"" chuck permits rapid exchange of wafer support platforms for increased productivity and consistent placement of same upon the thermal transfer element for reliable processing conditions.
Patent TW-432640-B (TW)
Title: High density DRAM device for simultaneously forming capacitor electrode board and metal contact structure
Inventor: YANG FU-LIANG
IPC: H01L21/8242
Filed: 1998-12-18
Granted: 2001-05-01
Abstract: A manufacturing method for DRAM device which is characterized for simultaneously forming capacitor electrode board to produce stack-type capacitor structure and forming the metal layer contact structure and word line contact structure. The process is characterized for depositing a barrier layer and a capping tungsten layer on the storage node, and the depositing process can completely fill up the metal layer contact opening and the word line contact opening. The method uses an anisotropic RIE procedure to conduct the pattern definition procedure so as to remove the undesired portion of the tungsten layer and barrier layer and form the capacitor electrode board, metal layer contact structure and word line contact structure which all comprise the tungsten layer and barrier layer that are all produced with a single deposition procedure and a single pattern definition procedure.
Patent TW-440593-B (TW)
Title: Radiation-curable silicone rubber composition
Inventor: OKINOSHIMA HIROSHIGE
IPC: C08L83/06
Filed: 1999-01-07
Granted: 2001-06-16
Abstract: A radiation-curable silicone rubber composition is provided which includes: (A) a specific organopolysiloxane having radiation-sensitive (meth)acryloyl groups at the both terminals of the molecular chain, (B) a photosensitizer; (C) a tetraalkoxysilane or a partial hydrolysis-condensation product thereof; and (D) optionally together with a specific organic titanium compound. This composition is curable upon irradiation by ultraviolet rays for a short time and exhibits adhesion quickly. Hence, it is useful for the bonding, coating and potting of various substrates. This composition also has a relatively weak adhesion immediately after curing, and can be peeled from the substrate with ease for a while. Hence, it is also suited for uses where repair is required. Because of a high curing rate, it can be effective for, e.g., making a process short, improving productivity and saving energy in the manufacture of electric and electronic parts.
Patent TW-408557-B (TW)
Title: Electroluminescent assemblies using blend systems
Inventor: WEHRMANN ROLF
IPC: H05B33/22
Filed: 1999-04-02
Granted: 2000-10-11
Abstract: Electroluminescent assemblies containing a substrate, an anode, an electroluminescent element and a cathode, where at least one of the two electrodes is transparent or semitransparent in the visible spectral region and the electroluminescent element can contain in order: A hole injection zone, hole transport zone, electroluminescent zone, electron transport zone and an electron injection zone, characterized in that the hole injection zone contains an uncharged or cationic polythiophene of the formula (I), Where Q1 and Q2 represent, independently of one another, hydrogen, substituted or unsubstituted (C1-C20)-alkyl, CH2OH or (C6-C14)-aryl or Q1 and Q2 together represent -(CH2)m-CH2- where m=0 to 12, preferably 1 to 5, (C6-C14)-arylene, and n represents an integer from 2 to 10,000, preferably from 5 to 5000, and the hole transport zone adjoining the hole injection zone Contains one or more aromatic amine compounds.
Patent TW-428098-B (TW)
Title: IC testing apparatus
Inventor: TAKESHITA SATORU
IPC: H01L21/66
Filed: 1999-05-18
Granted: 2001-04-01
Abstract: The present invention relates to an IC testing apparatus with testing head that can only reduces component exchange for the corresponding IC type during the exchange of IC type. The solution is stated below. The IC testing apparatus having IC socket, which is electrically contacted with tested IC, is prepared. The socket baseboard 505 is used to make coaxial cable 506 electrically contact with testing head. The secondary stage of socket baseboard 511, which has the installed IC socket 510, can be assembled and disassembled from the socket baseboard 505. The secondary stage of socket baseboard 511 has the disposed-wire figure corresponding to tested IC type that connects each terminal of IC socket and each terminal of socket baseboard 505.
Patent TW-430762-B (TW)
Title: A main board for an easily-upgradable computer
Inventor: KIM TAE-WOOK
IPC: G06F1/16
Filed: 1995-04-07
Granted: 2001-04-21
Abstract: An easily-upgradable computer includes a CPU board removably attached to a main board. The CPU board includes a CPU, a jump setting circuit which includes a plurality of factory-set jump switches, and a pair of first connectors electrically connected to the CPU and jump setting circuit. The main board includes a plurality of conventional peripheral devices, drivers and controllers, a clock generator, and a pair of second connectors removably coupled and electrically connected to the pair of first connectors. A wiring pattern of the CPU board electrically connects address, data, control signal, and poser supply terminals of the CPU to the pair of first connectors, and a wiring pattern of the main board electrically connects the plurality of peripheral devices, drivers, and controllers, and the clock generator to the pair of second connectors. The jump switches on the CPU board are factory-set in accordance with the operational specifications of the CPU, and control the clock generator on the main board.
Patent TW-418357-B (TW)
Title: Chemical generator with controlled mixing and concentration feedback and adjustment
Inventor: MUNROE JAMES PLATT
IPC: G05D11/02
Filed: 1999-07-02
Granted: 2001-01-11
Abstract: The present invention is an apparatus and process for blending high purity chemicals to produce a high purity chemical mixture with circulation, purification and sensing of said chemical mixture between blending of said high purity chemicals and storage of said high purity chemicals for use, ultimately to produce a high purity chemical mixture for on-site use in treating semiconductor materials, such as at a semiconductor fabrication facility that processes silicon wafers.
Patent TW-474941-B (TW)
Title: Method for improving hydrolysis resistance of pentaerythritol diphosphite and pentaerythritol diphosphite produced thereof
Inventor: HE RUEI-JUANG
IPC: C07F9/09
Filed: 1999-07-20
Granted: 2002-02-01
Abstract: The present invention relates to a method for improving the hydrolysis resistance of pentaerythritol diphosphite shown in formula (1) (in which R and R' can be the same or different and separately represent C4-C30 aliphatic or cycloaliphatic group or C6-C30 aryl or alkylaryl group, which are defined in the specification); which comprises adding a poor water soluble acid neutralizer into the pentaerythritol diphosphite shown in formula (1); and a pentaerythritol diphosphite prepared thereof.
Patent TW-444045-B (TW)
Title: Thermoconductive silicone rubber composition and its production
Inventor: NAKANO AKIO
IPC: C08L83/06
Filed: 1999-10-06
Granted: 2001-07-01
Abstract: This invention provides the thermoconductive silicone rubber composition which comprises (A) 2-69.9 vol.% of an organopolysiloxane of the average compositional formula R1aSiO(4-a)/2 (R1 is a univalent hydrocarbon group; a is a positive number of 1.90-2.05), (B) 0.1-50 vol.% of a hydrolyzable group-containing methylpolysiloxane of formula II (R2 is a 1-4C univalent hydrocarbon group; R3 is a 1-4C alkoxy group or acyloxy group; A is methyl group or a group of ZSiR2bR3(3-b); Z is an oxygen atom or 2-10C bivalent hydrocarbon group; b is 0, 1 or 2; m is 3-100; n is 0-50; 5≤(m+n)≤100; when n is 0, at least one of As is Z-SiR2bR3(3-b)), (C) 30-90 vol.% of thermoconductive filler, and (D) such an amount of a curing agent as to be necessary for curing the composition. This thermoconductive silicone rubber composition is capable of suppressing in viscosity rise and plasticity rise even if compounded with a large quantity of the thermoconductive filler, excellent in molding processability and having high thermal conductivity.
Patent TW-468360-B (TW)
Title: Thermopile infrared device, thermalpile infrared array device and the manufacturing method thereof
Inventor: JOU JENG-SAN
IPC: H01L35/00
Filed: 1999-11-04
Granted: 2001-12-11
Abstract: A thermalpile infrared array device comprises plural thermopile devices, each thermopile device comprises: a substrate; at least a thermocouple lead formed in the way of hanging arm on the substrate, each thermocouple arm has a first end and a second end located on the reverse side of the first end, the first end is connected to the substrate to form a cool contact end, the second end is spaced with the substrate for a preset distance; and a floating thin plate formed on top of said at least one thermocouple lead, the floating thin plate is supported through the second end of the thermocouple lead to form a thermal contact end, and said at least one lead of thermocouple is completely masked under the floating thin plate. In addition, said device further comprises an integrated circuit formed on the substrate under the floating thin plate and is electrically connected to said thermocouple lead, so as to process the signal outputted from the thermocouple lead.
Patent TW-I232510-B (TW)
Title: Planarized semiconductor interconnect topography and method for polishing a metal layer to form wide interconnect structures
Inventor: SETHURAMAN ANANTHA R
IPC: H01L21/768
Filed: 1999-11-08
Granted: 2005-05-11
Abstract: The present invention advantageously provides a substantially planarized semiconductor topography and method for making the same by selectively etching a dielectric layer to form a plurality of posts surrounded by trenches. The trenches are filled with a conductive material, such as a metal, deposited to a level spaced above the upper surfaces of the dielectric layer and the posts. The surface of the conductive material is then polished to a level substantially coplanar with the upper surfaces of the dielectric layer and the posts. Advantageously, the polish rate of the conductive material above the trenches is substantially uniform. In this manner, the topological surface of the resulting interconnect level is substantially void of surface disparity.
Patent TW-592695-B (TW)
Title: Tocopherols, tocotrienols, other chroman and side chain derivatives and uses thereof
Inventor: KLINE KIMBERLY
IPC: C07C323/20
Filed: 1999-11-17
Granted: 2004-06-21
Abstract: The present invention provides an antiproliferative compound having the structural formula wherein X is oxygen, nitrogen or sulfur; R1 is alkyl, alkenyl, alkynyl, aryl, heteroaryl, carboxylic acid, carboxylate, carboxamide, ester, thioamide, thiolacid, thiolester, saccharide, alkoxy-linked saccharide, amine, sulfonate, sulfate, phosphate, alcohol, ethers and nitriles; R2 is hydrogen, methyl, benzyl carboxylic acid, benzyl carboxylate, benzyl carboxamide, benzylester, saccharide and amine; R3 is selected from the group consisting of hydrogen, methyl, benzyl carboxylic acid, benzyl carboxylate, benzyl carboxamide, benzylester, saccharide and amine; R4 is of methyl, benzyl carboxylic acid, benzyl carboxylate, benzyl carboxamide, benzylester, saccharide and amine; and R5 is alkyl, alkenyl, alkynyl, aryl, heteroaryl, carboxyl, amide and ester. Also provided is a method for inducing apoptosis in a cell comprising administering a composition comprising a compound.
Patent TW-525323-B (TW)
Title: Electrical connector with feature for limiting the effects of coefficient of thermal expansion differential
Inventor: HARPER DONALD K JR
IPC: H01R12/71
Filed: 1999-12-15
Granted: 2003-03-21
Abstract: An insulative housing for an electrical connector, comprising: a base; and at least one aperture extending through said base for receiving a contact. The aperture has an enlarged opening at one end adapted to receive a fusible element for securing the connector to a substrate. The enlarged portion has a cross-sectional area, in one orientation, that can be larger than the cross-sectional areas of other orientations. An electrical connector housing, comprising: a base; and a plurality of apertures in the base for receiving a contact. Each aperture has a recess for receiving a portion of a fusible element therein. Each recess has a characteristic, with the characteristic of a portion of the recesses being different than the characteristic of the other recesses. A method of limiting the effects of the differential coefficient of thermal expansion of an electrical connector and a substrate to which the connector mounts, comprising the steps of: providing an electrical connector with a housing having an array of recesses that receive fusible elements to secure the connector to the substrate; defining at least one predetermined location on the housing; and manipulating the recesses located in the at least one predetermined location.
Patent TW-585852-B (TW)
Title: Process for the preparation of epsilon-caprolactam
Inventor: GUIT RUDOLF PHILIPPUS MARIA
IPC: C07D201/08
Filed: 2000-01-17
Granted: 2004-05-01
Abstract: Process for the preparation of epsilon-caprolactam comprising treating 6-aminocaproic acid, 6-aminocaproate ester, 6-aminocaproamide, oligomers or polymers of these compounds or mixtures comprising at least two of these compounds in a cyclisation reactor in the presence of superheated steam in which a gaseous product stream comprising epsilon-caprolactam, lights and heavies is obtained, wherein the product stream, after condensation and removal of water and lights, is split into a epsilon-caprolactam stream and a heavies stream containing heavies and epsilon-caprolactam and the heavies stream is recycled to a cyclisation reactor.
Patent TW-507050-B (TW)
Title: Thrust bearing arrangement
Inventor: RASMUSSEN OLE H
IPC: F01C21/02
Filed: 2000-02-17
Granted: 2002-10-21
Abstract: A thrust bearing arrangement for a rotary shaft includes a main bearing mounted on the rotary shaft at a first axial location and an idler bearing mounted on the shaft at a second axial location spaced from the first axial location. Each of the main bearing and the idler bearing has an inner race in contact with the rotary shaft and a floating outer race. A thrust member is disposed between the outer races of the first and second bearings for transmitting axial thrust forces to a machine frame. A spring maintains a preload condition on the bearings.
Patent TW-440967-B (TW)
Title: Activation method to reduce resistivity of p-type thin film
Inventor: TZENG JIAN-SHIN
IPC: H01L21/324
Filed: 2000-03-10
Granted: 2001-06-16
Abstract: This invention provides a novel manufacturing method to activate high resistivity p-type thin film into low resistivity p-type thin film by using laser. The above-mentioned high resistivity p-type thin film is the p-type doped III-nitride thin film or p-type doped II-VI compound thin film. This method can be carried out directly in an atmospheric environment without the need of special inert gas ambience and the activation time can be shortened by adjusting the power of the laser, the focus distance and the power density of the laser. Compared with the conventional method, the proposed method is simple in the manufacturing process and can reduce the production cost. Therefore, it is practical for optoelectronic industry.
Patent TW-552309-B (TW)
Title: Method for forming composite vapor-deposited films with varied compositions formed in the initial and final stages of deposition, composite vapor-deposition material for the film and method for manufacture thereof
Inventor: FURUICHI SHINJI
IPC: B22F5/12
Filed: 2000-03-16
Granted: 2003-09-11
Abstract: A method for forming a composite vapor-deposited film one side of which suitable for vapor-deposition on a phosphor surface of a CRT, such as a color television picture tube, has high light reflectivity, and the other side of which has a property to absorb radiant heat, and a composite vapor-deposition material suitable for vacuum deposition are disclosed. The composite vapor-deposition material has a high vapor-pressure metal envelope and a low vapor-pressure metal in the core region of the envelope. Low vapor-pressure metal powder should preferably be dispersed and held by high vapor-pressure metal powder in the core region. Vacuum deposition using this composite vapor-deposition material yields a composite deposited film having a composition comprising almost 100% of the high vapor-pressure metal formed in the initial stage of evaporation, and a composition comprising 100% of the low vapor-pressure metal formed in the final stage of evaporation.