baber/WOPTO huggingface dataset:
Patent JP-H11316636-A (JP)
Title: Manual display, manual display method and medium for recording manual display program
Inventor: HIRASAWA MICHIHIKO
IPC: G06F3/048
Filed: 1998-05-06
Abstract: PROBLEM TO BE SOLVED: To provide a manual display, manual display method and medium for recording manual display program with which an introduction manual of peripheral equipment suitable for service conditions and an operation manual allowing reference to exact information related to the peripheral equipment can be displayed. SOLUTION: A prescribed CD-ROM is added to a printer 20, and when introducing the printer 20, the CD-ROM is loaded to a CD-ROM drive 13. Then, a setup guide is directly started from a main body 10 of a PC, the initial setting process of the printer 20 is displayed, and after a reference guide is installed to the main body 10 of PC and executed, while referring to help information or the like concerning the printer 20, update information on a web server 40 corresponding to the help information or the like is referred to.
Patent JP-2000313055-A (JP)
Title: Multilayer injection type hollow molding method and apparatus
Inventor: NIHEI NOBUAKI
IPC: B29C49/78
Filed: 1999-04-30
Abstract: PROBLEM TO BE SOLVED: To dispense with the setting work of the extrusion speed of an auxiliary material from an extruder and preventing the auxiliary material from becoming thin at the start of injection to keep the thickness ratio of a main material and the auxiliary material constant with high accuracy. SOLUTION: A control circuit 9 controls the extrusion speed of an auxiliary material F from an extruder 8 automatically in order to allow the filling ratio of the auxiliary material F to follow that of a main material S and allows the start of injection by an auxiliary material injection cylinder 17 to precede that by a main material injection cylinder 2. Further, the control circuit 9 controls the injection speed by the auxiliary material injection cylinder 17 automatically in order to allow the injection ratio of the auxiliary material F to follow that of the main material S. By this constitution, the working load of an operator can be reduced. The auxiliary material can be prevented from becoming thin at a start time of injection and the thickness ratio of the main material and the auxiliary material can be kept constant with high accuracy.
Patent JP-S611607-A (JP)
Title: Vegetation killer made of urea as raw material
Inventor: KANCHIKU KANBEE
IPC: A01N25/04
Filed: 1984-06-14
Abstract: PURPOSE:To enhance the effect as a vegetation killer, by using an alkaline substance in a vegetation killer made of urea as a raw material to increase the dissolved concentration of the urea in water. CONSTITUTION:A vegetation killer made of urea as a raw material. Weeds or unnecessary trees are killed with urea. In the process, an alkaline substance, e.g. caustic soda, is added to a urea solution to enhance the dissolved concentration of the urea therein. Thus, the aimed vegetation killer, made of the urea as a raw material, and nontoxic to humans and animals without damaging soil is obtained.
Patent JP-H09291336-A (JP)
Title: High temperature refractory steel with low yield ratio, and its production
Inventor: TOKUNO KAZUNARI
IPC: C22C38/14
Filed: 1996-04-23
Abstract: PROBLEM TO BE SOLVED: To provide a (400 to 510)N/mm<2> class low yield ratio steel material of 700 deg.C specification, used mainly for a skeleton of building and used in an uncoated or minimally coated state, and its production. SOLUTION: This steel material has a steel composition composed essentially of, by weight ratio, 0.01-0.05% C, 0.3-1.0% Mo, 0.05-0.1% Nb, and 0.02-0.1% V and further satisfies Nb+V combined precipitation parameters represented by respective contents of C, Nb, and V, heating temp. T at rolling, Ac point temp., and postrolling treatment temp. TP, NVP=100×(V/Nb)×(C-Nb/7-V /5)>=0.01 and EP=(T-1000)×(Ac1 -TP)>0. Moreover, the fraction of ferritic structure in this steel is regulated to >=0.8.
Patent JP-S5348722-A (JP)
Title: Internal microphone device
Inventor: NAONO HIROYUKI
IPC: G11B33/12
Filed: 1976-10-15
Abstract: PURPOSE:To improve S/N and frequency characteristic, by using the microphone held in the cabinet causing to protrude outside of the cabinet face through the push switch.
Patent JP-S5750040-A (JP)
Title: Japanese language input device
Inventor: SATOU FUMITAKA
IPC: G06F17/22
Filed: 1980-09-09
Abstract: PURPOSE:To make a manual operation unnecessary, by automatically detecting that it has been finished to write one character, and starting to recognize said character, in a device for recognizing a character of a Japanese language which is inputted by handwriting at a real time, as a static pattern. CONSTITUTION:On a tablet 1, there are 4 Chinese character input areas where each one character can be handwritten, and one of 0-3 codes is stored in a register 14 in accordance with an area pushed by a stencil. Now, for instance, it is finished to write one character in one area, and when the stencil is moved to the next area, since the previous area code stored in the register 14 does not coincide with the present character area code provided from a tablet controlling circuit 11, an output of a comparing circuit 15 energizes an AND gate 17 through an inverter 16. A character recognizing circuit 13 detects that one character has been finished, by the output signal from the gate 17, and reads this character pattern from a memory 12.
Patent JP-S5649576-A (JP)
Title: Schottky diode
Inventor: TANBARA HIDEO
IPC: H01L29/872
Filed: 1979-09-28
Abstract: PURPOSE:To lower the threshold voltage and increase resisting pressure by a method wherein the portion near the surface where a semiconductor is connected with a metal is surrounded with a low density layer of the same conductive type as that of the semiconductor. CONSTITUTION:After an n layer is formed on an n<+> type Si substrate, an n<-> type circular layer 3 is laid on it by injecting B ions. Then an opening is made in an SiO2 film 4 so that Ti 5 may come into contact with the circular layer. A leak in a Schottky diode is prevented in the neighborhood of the interfacing surface by such a construction, while reverse resisting pressure is increased. When using a p<+> type Si substrate, a circular p<-> layer is formed by laying a p layer to produce a W electrode. Then a similar Schottky diode with high resisting pressure and low threshold voltage become obtainable.
Patent JP-H0421755-A (JP)
Title: Flux for hot dip zn-al alloy-coating
Inventor: TAKAHASHI JUNICHI
IPC: C23C2/30
Filed: 1990-05-16
Abstract: PURPOSE:To develop the flux for hot dip Zn-Al alloy-coating which does not generate nonplating by dissolving PbCl2, NH4Cl and ZnCl2 at specific ratios into water. CONSTITUTION:The PbCl2 and the NH4Cl are incorporated into the flux of this invention to improve the adhesive property of the Zn-Al alloy-coating layer and the work, such as iron or steel parts, by the coupled effects thereof. The above-mentioned effects are not sufficiently utilized if the content of the PbCl2 is below 0.1wt.%. On the other hand, the content of the NH4Cl to be incorporated is too little and the effect (to be described later) thereof is not effectively utilized if the ratio exceeds 50wt.%. The ZnCl2 allows the content of the above-mentioned NH4Cl to be widely adopted and improve the gloss, smoothness, etc., on the surface of the Zn-Al alloy-coating layer. The content of the NH4Cl and the ZnCl2 is specified to 10 to 99wt.% in this case.
Patent JP-H02304921-A (JP)
Title: Dry etching method
Inventor: IIZUKA KATSUHIKO
IPC: H01L21/3065
Filed: 1989-05-19
Abstract: PURPOSE:To obtain a high selection ratio to SiO2 without depending upon a mask material by using a specific gas as an etching gas in the dry etching of polycrystalline silicon on a substrate, on a surface of which an SiO2 film is formed. CONSTITUTION:An SiO2 film 32 through thermal oxidation is shaped onto a silicon substrate 31 as an insulating oxide film, a polycrystalline silicon film 33 is formed onto the film 32 through a chemical vapor growth method, and a mask pattern 34 is shaped onto the layer 33. Hydrogen bromide or the mixed gas of bromine and hydrogen is used as an etching gas in the dry etching method of the polycrystalline silicon 33. The etching rate of SiO2 is decelerated regardless of the presence of carbon at that time. Accordingly, a high selection ratio can be acquired to SiO2 without depending upon a mask material-that is, even when a resist (an organic film) is employed as the mask material.
Patent JP-H04350974-A (JP)
Title: Semiconductor device
Inventor: TERAI HIROHARU
IPC: H01L29/866
Filed: 1991-05-29
Abstract: PURPOSE:To prevent an electric current from flowing locally when a surge voltage is applied and to increase a protective ability a method wherein, in a medium or high breakdown-strength diode, a region which is deeper than a contact injection region is formed in a cathode part. CONSTITUTION:An n-well region 2 is former in a P-type semiconductor substrate 1. An n<+> type region 6 is formed to be large in its inside in such a way that it comes into contact with a cathode electrode for a diode and that it surrounds the n-well region 2. The side face part of the n<+> type region 6 is formed in such a way that it comes into contact with an element isolation region 10 and that it is overlapped with a P-well region 3. A P<+> type region 7 is formed as an anode electrode at the inside of the P-well region 3. Even when a surge voltage is applied, a place where an electric current is concentrated does not exist, and a protective ability is increased.
Patent JP-S5550859-A (JP)
Title: Purification of lecithin
Inventor: MATSUEDA KATSUHARU
IPC: A23J7/00
Filed: 1978-10-09
Abstract: PURPOSE: To obtain high-purity lecithin having improved flavor usable for food directly, by using a specific organic solvent free from food and hygienic problems as an extractant.  
     CONSTITUTION: Lecithin is extracted from (A) an oil-containing lecithin, e.g. soybean lecithin, with (B) propylene glycol at a weight ratio of 1:2W20 at room temperatureW80°C, and the extract is mixed with a 2W20wt% aqueous organic acid, e.g. citric, tartaric, lactic, succinic, malic, or fumaric acid at pH2W5. The coagulated and deposited lecithin is separated, rinsed with water, and dried at 80°C or below. 
     COPYRIGHT: (C)1980,JPO&Japio
Patent JP-S616499-A (JP)
Inventor: YOSHIOKA TAKAO
IPC: B30B15/28
Filed: 1984-06-19
Abstract: (57)【要約】本公報は電子出願前の出願データであるた め要約のデータは記録されません。
Patent JP-S5834190-A (JP)
Title: Plating liquid washing and collecting method
Inventor: HOSHINO TADASHI
IPC: C25D5/48
Filed: 1981-08-08
Abstract: PURPOSE:To efficiently collect an expensive plating liquid, by leading a substance to be treated, which has been subjected to plating, into a washing vessel having a stepped cutting part, and washing the remaining plating liquid with water. CONSTITUTION:A substance to be treated 2 which has been treated with a gold plating liquid is moved, and is led to a stepped cutting part 81 of a washing vessel 8 for washing the gold plating liquid. The part of the remaining gold plating liquid 3 adhering onto the substance to be treated 2 is washed by water 5 fed from a water feed pipe 9, and the water which has washed the remaining gold plating liquid 3 is overflowed a gold plating liquid collecting tank 7, and feed to a plating liquid collecting device, then regenerated.
Patent JP-S5825562-A (JP)
Title: Perfect combustion expediting method for internal combustion engine
Inventor: KINOSHITA YOSHIAKI
IPC: F02M31/04
Filed: 1981-08-08
Abstract: PURPOSE:To expedite perfect combustion of fuel by heating the air which is introduced into a carbureter. CONSTITUTION:The open air, which is introduced into a carbureter from an air cleaner, is converted into a heating air, sucked up, and mixed with the fuel which is injected into the carbureter, thereby producing a perfect gas. By producing the perfect gas, the mixed gas inside the carbureter makes perfect combustion, which makes it possible to reduce fuel consumption and inhibit the discharge of harmful gases as well.
Patent JP-S62284154-A (JP)
Inventor: ENDO HAJIME
IPC: F25B11/00
Filed: 1986-05-31
Abstract: (57)【要約】本公報は電子出願前の出願データであるた め要約のデータは記録されません。
Patent JP-S5916285-A (JP)
Inventor: KATOU YUTAKA
IPC: H01R13/717
Filed: 1982-07-16
Abstract: (57)【要約】本公報は電子出願前の出願データであるた め要約のデータは記録されません。
Patent JP-2000314317-A (JP)
Title: Cooling water structure of outboard motor
Inventor: MINENO KAZUO
IPC: F02B61/04
Filed: 1999-04-30
Abstract: PROBLEM TO BE SOLVED: To provide the cooling water structure of an outboard motor which can eliminate the possibility of water leakage and oil capacity reduction and also improve maintenance property. SOLUTION: In an outboard motor 1 for cooling each part of an engine 3 by the cooling water pumped up by a water pump, a cooling water passage 21 is formed in the constitution member of the engine 3, and also a water inspection port 26 is provided on the constitution member of the engine and the cooling water passage 21 is connected with the water inspection port 26 with a connection pipe 29.
Patent JP-H09306411-A (JP)
Title: Focused ion beam working device
Inventor: SAKAGUCHI KIYOSHI
IPC: G01N1/28
Filed: 1996-05-20
Abstract: PROBLEM TO BE SOLVED: To provide a focusing ion beam working device capable of working a vertical section by decreasing a tapered angle. SOLUTION: Two-dimensional scanning of an ion beam is raster scanned, but at this time, a scanning interval d in a work section vertical direction can be arbitrarily set to an input device 11, so that an optimum scanning interval in accordance with a work purpose can be assigned. When a desired probe current is assigned to the input device 11, a control device 9, from a relation between the stored probe current and the scanning interval, reads an optimum scanning interval to the assigned probe current, to be supplied to a scanning circuit 10, a scanning interval of a scanning signal is optimized. Further, in the scanning signal from the scanning circuit 10, a scanning interval in a vertical direction of a work section of an end part of the scanning region is decreased in a region distant from the work section, the interval can be increased in a region adjacent to the work section.
Patent JP-H01293821-A (JP)
Title: Bath tub serving as washing machine
Inventor: INOUE TAKASHI
IPC: D06F17/00
Filed: 1988-05-24
Abstract: PURPOSE:To integrally form a washing machine and a bath tub, and save space, by fitting a washing agitating blade rotatable with a driving force, attachably and removably on a bottom section in the bath tub. CONSTITUTION:A rotary driving shaft 3 is projectingly set in a recessed section 4 set on the bottom surface of a bath tub 1 so that an agitating blade 2 may be fitted on the bottom section of the bath tub 1 at the time of washing. The recessed section 4 is covered with a cover at the time of taking a bath, and so the driving shaft 3 is not projected from the bottom surface and is for safety. Besides, by the driving shaft 3, to the bath tub 1, the combustion exhaust gas (a) of an adjacent separately-placed boiler is conducted, and the shaft 3 is rotated by a rotational force transmitting mechanism connected directly to a turbine 5 rotated by the gas, and so at the time of washing, the agitating blade 2 is rotated, and the bath tub 1 can be used for a washing tank. As a result, the bath tub and washing machine can be integrally formed, and so the space of a residential building or the like can be saved.
Patent JP-S5649836-A (JP)
Title: Liquid heater
Inventor: HIRASAWA FUSAO
IPC: F24H1/20
Filed: 1979-09-28
Abstract: PURPOSE:To lower the noise during heating the liquid and to improve the thermal efficiency, by heating the liquid directly by a burner with the liquid forced to circulate by centrifugal force. CONSTITUTION:An underwater burner 2 is disposed to the upper side of the apparatus body 1 to direct downward. A combustion cylinder 3 encircles the burner 2, and a rotary cylinder 5 is provided outside the combustion cylinder 3. When liquid is filled in the apparatus body 1 and the rotary cylinder 5 is rotated by a motor 6, the liquid drops from the upper circumferential edge of the cylinder 5 and then is sucked through communicating ports 5a again into the rotary cylinder 5 to be circulated. In this state, when the burner 2 is ignited, the exhaust gas generated by the combustion is included into the liquid in the combustion cylinder 3, then discharged through discharge ports 4, and ascends along the inner wall of the rotary cylinder 5. During this period, the high temperature exhaust gas heats the liquid, and then is discharged through a discharge cylinder 11. Thus, as the liquid level in the combustion cylinder 3 and the rotary cylinder 5 is lowered than that in the apparatus body 1, the blast pressure and the fuel supply pressure can be lowered.
Patent JP-S62281442-A (JP)
Title: Manufacture of semiconductor device
Inventor: OTSU KOJI
IPC: H01L21/76
Filed: 1986-05-30
Abstract: PURPOSE:To enable active element regions or the like small in dimensional conversion difference to be formed, by forming an anti-oxidizing mask layer on a semiconductor substrate so that a semiconductor having a main element of the same material as the semiconductor substrate is made to selectively grow and then performing selective oxidation to form element isolation regions. CONSTITUTION:Element isolation regions 8 on a semiconductor substrate 1 is removed to form an anti-oxidizing mask layer 4, and a semiconductor layer 7 having a main element of the same material as the semiconductor substrate 1 is selectively formed on the exposed regions 6 of the semiconductor substrate. Thereafter this semiconductor layer 7 is oxidized to form element isolation regions 8. A P-type Si semiconductor substrate 1, for example, is thermally oxidized to form a thermal oxidation film 2, with a Si3N4 layer 3 piled thereon by CVD method. Then, the element isolation regions 8 are removed to perform patterning of the thermal oxidation film 2 and the Si3N4 layer 3 and to form an anti-oxidizing mask layer 4. Ion implantation of boron is then performed to form channel stop regions 5. Moreover, a semiconductor layer 7 made of Si is selectively formed on the exposed regions 6 of the semiconductor substrate, and the semiconductor layer 7 is thermally oxidized with SiO2 to form element isolation regions 8, and then the Si3N4 layer 3 is removed by etching.
Patent JP-S6016643-A (JP)
Inventor: KITAGAWA YOSHIO
IPC: E04C2/06
Filed: 1983-07-08
Abstract: (57)【要約】本公報は電子出願前の出願データであるた め要約のデータは記録されません。
Patent JP-S5749962-A (JP)
Title: Electrostatic printing method
Inventor: SATOU TSUTOMU
IPC: G03G13/26
Filed: 1980-09-09
Abstract: PURPOSE:To obtain many clear copies by forming two charge moving layers, capable of transferring only charge carriers having the opposite polarities, on a conductive supporting base via a coloring layer by optical oxidation, and by forming an electrostatic latent image after generation of the color on the coloring layer color by exposure. CONSTITUTION:On a conductive base 1, the 1st charge movement layer 2 capable of transferring only a positive or genative unipolar charge carrier is formed and on the layer 2, a coloring layer 3 containing leuco type triallyl methane which colors with ultraviolet rays or white light directly or after providing an intermediate layer 5 of a binder, SiO, etc. On the layer 3, a charge movement layer 4 having the opposite polarity to the layer 2 is formed directly or after forming an intermediate layer 6 similar to the layer 5, thus obtaining a photoreceptor. After this photoreceptor is exposed hnu to make the layer 3 color in a pattern shape, DC bias AC charging is performed while the entire surface is irradiated with white light to charge an exposed part and an unexposed part with the opposite polarities, and then a part to be developed is devoloped and and transfered with a toner having the opposite polarity. The process of charging, developing and transferring is repeated to obtain many copies.
Patent JP-H08320601-A (JP)
Title: Image forming device
Inventor: KITAJIMA TATSUYA
IPC: G03G15/00
Filed: 1995-05-24
Abstract: PURPOSE: To provide an electrophotographic copying machine or the like capable of shortening the warming up time and performing more consecutive copying, even under the ambient condition such as low temp. CONSTITUTION: On detecting sensitivity potential of a practically used photoreceptor drum 1 by a surface potential sensor 5, a CPU 23 is allowed to compute the sensitivity limit temp. of the photoreceptor drum 1 based on this detection result, by referring to a table data showing relation between the sensitivity potential and the sensitivity limit temp. of the photoreceptor drum 1 preliminarily stored in ROM 31, and to variably control the copying enable temp. (ready temp.) of the photoreceptor drum 1, or the copying standby temp. (wait temp.), based on this computed sensitivity limit temp.
Patent JP-S62281438-A (JP)
Title: Manufacture of integrated circuit
Inventor: TAGUCHI KAZUO
IPC: H01L21/66
Filed: 1986-05-30
Abstract: PURPOSE:To eliminate the possibility of laser restricting a working range for trimming and thus permitting chips to be identified by quality marks in a short time by performing the marking which is obteined according to quality of chips, thereby transferring ink to a wafer and applying laser beams to a thermal transfer film placed on the wafer. CONSTITUTION:A manufacture of IC circuit comprises two processes; one of them is a trimming process where laser beams are applied to a pattern formed on e wafer 2 to perform trimming and the other one is a marking process where the marking is cerried out eccording to the quality of the chips and then, in the manufacture of IC circuit, the above marking is performed as follows: a thermal transfer film 8 is put on the wafer 2 and ink of the film 8 is transferred to the wafer 2 after applying the laser beams to the film 8. For instance, trimming and quality judgement are carried out by using a laser trimmer and when defective chips are detected, the thermal transfer film 8 is placed on the wafer 2 according to CPU 7 and the. laser beams are applied on the film 8. As a result, the laser beams dissolve ink of the film 8 and transfer it on the wafer 2, resulting in having a defective mark on the wafer.
Patent JP-S5351791-A (JP)
Title: Device for producing standard gas
Inventor: OKAMOTO MASAYOSHI
IPC: B01L5/02
Filed: 1976-10-21
Abstract: PURPOSE: To perform a bulk production of standard gas at high concentration by means of a device having provided a tubular body which is inserted into the vessel and constituted so as to pass diluted gas. 
     COPYRIGHT: (C)1978,JPO&Japio
Patent JP-H0422267-A (JP)
Title: Printer
Inventor: UEDA SHIGERU
IPC: B41J21/00
Filed: 1990-05-17
Abstract: PURPOSE:To easily discriminate a binary data even when a binary data and a multi-value data are overlapped by designating a part in which a binary data and a multi-value data are overlapped and converting the binary data and the multi-value data of the part respectively. CONSTITUTION:A binary data A and a multi-value data B from a host device are stored respectively to a binary page memory 102 and a multi-value memory 103 via an input control section 101. The binary data is converted into a character pattern data under the control of a main control section 104 and expanded in a bit map memory 106. The multi-value data is stored in the multi-value memory 103, in which 8-bit data per one picture element are allocated. A most significant bit in the 8-bits indicates that the binary character is printed in black or in void. When data for one page are stored in the memory 106 and the multi-value memory 103 in this way, the main control section 104 sends a print start signal 152 to an image forming section 109.