Patent SG-11201805176R-A (SG)
Title: A method and an apparatus for monitoring and controlling deposit formation
Inventor: PIIRONEN MARJATTA
IPC: C12M1/34
Filed: 2016-12-21
Abstract: INTERNATIONAL APPLICATION PUBLISHED UNDER THE PATENT COOPERATION TREATY (PCT) (19) World Intellectual Property -, Organization 111111110111101110101011111010111110111010110111010111111011111111101111011111 International Bureau 0.. .... .. (10) International Publication Number ...... ... (43) International Publication Date WO 2017/109287 Al 29 June 2017(29.06.2017) WIPO I PCT (51) International Patent Classification: (74) Agent: KOLSTER OY AB; (Salmisaarenaukio 1), GO1N 21/64 (2006.01) GO1N 33/18 (2006.01) P.O.Box 204, FI-00181 Helsinki (FI). GO1N 33/34 (2006.01) GO6K 9/78 (2006.01) GO1N 21/85 (2006.01) GO1N 17/00 (2006.01) (81) Designated States (unless otherwise indicated, for every C12M 1/34 (2006.01) GO1N 21/94 (2006.01) kind of national protection available): AE, AG, AL, AM, AO, AT, AU, AZ, BA, BB, BG, BH, BN, BR, BW, BY, (21) International Application Number: BZ, CA, CH, CL, CN, CO, CR, CU, CZ, DE, DJ, DK, DM, PCT/FI2016/050907 DO, DZ, EC, EE, EG, ES, FI, GB, GD, GE, GH, GM, GT, HN, HR, HU, ID, IL, IN, IR, IS, JP, KE, KG, KH, KN, (22) International Filing Date: KP, KR, KW, KZ, LA, LC, LK, LR, LS, LU, LY, MA, 21 December 2016 (21.12.2016) MD, ME, MG, MK, MN, MW, MX, MY, MZ, NA, NG, (25) Filing Language: English NI, NO, NZ, OM, PA, PE, PG, PH, PL, PT, QA, RO, RS, RU, RW, SA, SC, SD, SE, SG, SK, SL, SM, ST, SV, SY, (26) Publication Language: English TH, TJ, TM, TN, TR, TT, TZ, UA, UG, US, UZ, VC, VN, (30) Priority Data: ZA, ZM, ZW. 20156009 23 December 2015 (23.12.2015) F 1 (84) Designated States (unless otherwise indicated, for every (71) Applicant: KEMIRA OYJ [FI/FI]; Porkkalankatu 3, kind of regional protection available): ARIPO (BW, GH, 00180 Helsinki (FI). GM, KE, LR, LS, MW, MZ, NA, RW, SD, SL, ST, SZ, TZ, UG, ZM, ZW), Eurasian (AM, AZ, BY, KG, KZ, RU, (72) Inventors: PIIRONEN, Marjatta; c/o Kemira Oyj, IP TJ, TM), European (AL, AT, BE, BG, CH, CY, CZ, DE, Management, P.O. Box 44, 02271 Espoo (FI). JOENSUU, DK, EE, ES, FI, FR, GB, GR, HR, HU, IE, IS, IT, LT, LU, — Iiris; c/o Kemira Oyj, IP Management, P.O. Box 44, 02271 LV, MC, MK, MT, NL, NO, PL, PT, RO, RS, SE, SI, SK, — Espoo (FI). HESAMPOUR, Mehrdad; c/o Kemira Oyj, SM, TR), OAPI (BF, BJ, CF, CG, CI, CM, GA, GN, GQ, — GW, KM, ML, MR, NE, SN, TD, TG). = IP Management, P.O. Box 44, 02271 Espoo (FI). EK- MAN, Jaakko; c/o Kemira Oyj, IP Management, P.O. Box Published: 44, 02271 Espoo (FI). — with international search report (Art. 21(3)) = AND CONTROLLING DEPOSIT FORMATION = (54) Title: A METHOD AND AN APPARATUS FOR MONITORING Digital library 73 — = = _ 75 = ,- = 70 - _._Processing Display = 77 Unit 72 6 Chemical dosing C 74 1-1 71 IN GC ei P 0\ 0 Fig. 7 1-1 IN 1-1 (57) : A method and apparatus for monitoring deposit formation in a process comprising an aqueous flow is provided. Ac - 0::) cording to the invention a feed flow of an aqueous liquid is provided onto a receiving surface to be monitored. At least part of a re - \" ceiving surface is illuminated with at least one light source. SVisual data is collected across the receiving surface and analyzed. The C quality and type of deposition attached to the receiving surface is classified based on information obtained from the analyzed visual data, and a quantitative scaling and/or fouling indication is computed based on the classification.