baber/WOPTO huggingface dataset:
Patent JP-H10221351-A (JP)
Title: Surface measuring instrument
Inventor: TAKADA KEIJI
IPC: G01B7/00
Filed: 1998-03-11
Abstract: PROBLEM TO BE SOLVED: To enable the information such as strain and cracks in a sample to be obtained, an interval (vacuum gap) between a needle and the sample during STM (scanning type tunnel microscope) measurement to be measured and the surface shape of an insulator to be observed. SOLUTION: A sample 1 is applied to the surface of a conductive block 2. Piezo-plates 3, 4 are applied to the rear surface of the block 2 and DC voltage V4 is given to a needle 11 by an electrode 7. When the needle 11 approaches the surface of the sample 1, tunnel current 1 flows between both. This tunnel current 1 is detected by an ammeter S and AC voltage Vf from an oscillator 15 is given to the needle 11, overlapping with DC voltage Vd . Strain generated on the surface of the sample propagates as the strain wave in the sample and the block 2 to strain the piezo-plates 3, 4. Induced voltage Vp1 Vp2 of the piezo- plates are subjected to the subtractive process by a differential amplifier 5.
Patent JP-H02239542-A (JP)
Title: Gyrotron device
Inventor: ITO YASUYUKI
IPC: H01J25/00
Filed: 1989-03-10
Abstract: PURPOSE:To provide a quasi-optical gyrotron device, which can turn into large output and high frequency, by using a resonator consisting of a ring-shaped mirror and a flat mirror, and using a pencil-shaped revolving electron beam as electron beam supply source. CONSTITUTION:A resonator 12 is composed of a ring-shaped mirror 41, which is arranged in the axial direction using as reference the running axes of a hollow revolving electron beam 35 and a pencil-shaped revolving electron beam 23, and a flat mirror 42. This flat mirror 42 is provided in the center with a hole 43 to admit passage of electron beam, and around this hole 43 radially arranged slits 44 are formed to allow passage of electromagnetic wave while it is turned into a hollow beam. When the pencil-shaped revolving electron beam is irradiated in the condition that an axially oriented magnetic field is impressed to this resonator 12, electromagnetic wave in the circumferential mode number m=1 is excited within the resonator. Electromagnetic wave with large power thus generated is emitted in the form of hollow beam from part admitting passage provided in the flat mirror 42.
Patent JP-S56155683-A (JP)
Title: Floating separator
Inventor: SUGIHARA KAZUTOYO
IPC: C02F1/24
Filed: 1980-05-03
Abstract: PURPOSE:To float and separate dissolved, suspended, and precipitated substances in the form of a scum by a method in which a floc-forming agent, bubble-forming agent, etc., are added to a waste water containing dissolved, suspended, and precipitated substances and then the waste water is passed through a multistage floating separator. CONSTITUTION:A waste water A containing heavy metals, etc., is continuously introduced into the first to the fourth tanks 14-17 of a condition-providing tank 10, where FC agent 32 capable of generating bubbles and also of adhering flocs to the bubbles is added. The waste water so treated is continuously passed through the first, second, and third floating separators 40, 50, and 60, compressed air from a supplier 90 is sent to these tanks 40, 50, and 60 to agitate the waste water by bubbles and to float scum B containing impurities heavy metals, the scum is dropped into scum dehydrators 46, 56, and 66 through skimmers 45, 55, and 65, and separated water is returned to the waste water tank 1 and the scum B is separated and removed.
Patent JP-S58175605-A (JP)
Inventor: TAKASE YOSHINARI
IPC: B27L5/00
Filed: 1982-04-08
Abstract: (57)【要約】本公報は電子出願前の出願データであるた め要約のデータは記録されません。
Patent JP-H05220594-A (JP)
Title: Wire and coated electrode for gas shielding arc welding for high cr austenitic stainless steel
Inventor: NATSUME SHOGO
IPC: B23K35/30
Filed: 1992-02-13
Abstract: PURPOSE:To obtain a wire and a coated electrode having a good weldability and an excellent creep characteristic in the gas shielding arc welding for a high Cr austenitic stainless steel (20-25 Cr). CONSTITUTION:The welding wire contains in percent 0.02-0.1 C, 0.1-1.0 Si, 0.5-2.5 Mn, 13.00-18.00 Ni 20.00-25.00 Cr, 0.2-1.5 Nb 0.01-0.20 N and the impurity contents of P, S, Al, Ti B and O are restrained and the contents of one or both of Zr and Mg are also restrained and the remain is balanced with Fe and others. The coated electrode is made of a wire as the core which is coated with a coating consisting of in percent 10-45 metallic carbonate, 5-50 metallic fluorinate 1-10 Si compound (in terms of SiO2), 1-15 Ti compound (in terms of TiO2), 0.5-5 REM (rare earth metal) and <=20 metal powder.
Patent JP-S59184502-A (JP)
Inventor: IKEDA TERUYUKI
IPC: H01C10/23
Filed: 1983-04-05
Abstract: (57)【要約】本公報は電子出願前の出願データであるた め要約のデータは記録されません。
Patent JP-S59184208-A (JP)
Title: Suspension polymerization of vinyl chloride
Inventor: MARUYAMA HITOSHI
IPC: C08F14/06
Filed: 1983-04-04
Abstract: PURPOSE:To effect suspension polymerization of vinyl chloride while controlling scale deposition for a prolonged time, by polymerizing vinyl chloride in an aqueous medium in a polymerizer whose inside wall has a film formed by coating the wall with a modified PVA having a silyl group in the molecule and drying the wet film by heating. CONSTITUTION:In suspension-polymerizing vinyl chloride alone or together with a monomer copolymerizable therewith in an aqueous medium, the inside wall of a polymerizer is previously coated with a polymer scale deposition preventing agent comprising an aqueous solution of a modified polyvinyl alcohol having a silyl group in the molecule, and the wet film is dired by heating. Examples of the processes for producing the modified polyvinyl alcohols include (i) a process comprising introducing silicon into polyvinyl alcohol or a modified polyvinyl acetate containig carboxyl or hydroxyl group by post-modification with a silylating agent, and (ii) a process comprising saponifying a copolymer containing a vinyl ester and an olefinically unsaturated monomer having a silyl group in the molecule or a copolymer containing these monomers and an olefinically unsaturated monomer having an ionic hydrophilic group in the molecule.
Patent JP-S51136362-A (JP)
Title: Method of treating discharge sludge from electrolytic working into non polluting substance
Inventor: TAKADA KOUJI
IPC: C02F9/00
Filed: 1975-05-21
Abstract: PURPOSE: To treat sludge discharged from electrolytic working so as to convert such sludge into non-polluting substance without introducing hexavalent chromium. 
     COPYRIGHT: (C)1976,JPO&Japio
Patent JP-H0641009-A (JP)
Title: Hydroxyphenylalkyl carboxylate as stabilizer
Inventor: PAURU DEYUUBU
IPC: C07C39/11
Filed: 1993-02-24
Abstract: PURPOSE: To provide a carboxylic acid ester of hydroxyphenylalkanol excellent as a stabilizer for org. material, especially synthetic org. polymers, against thermal, oxidative or actinic degradation.  
     CONSTITUTION: This compd. is expressed by formula I, and for example, 6-(3-tertiary butyl-4-hydroxy-5-methylphenyl)hexylstearate. In formula I, (n) is 4 to 8; (m) is 1 to 4; A is alkyl, cycloalkyl, phenyl, naphthyl, biphenyl, formula II (R 3 , R 4  are each alkyl) or the like when m=1, A is a direct bond, alkylene, cycloalkylene, phenylene, naphthylene or the like when m=2, A is alkantriyl, benzenetriyl, naphthalenetriyl formula III (R 5  to R 7  are each alkylene) or the like when m=3, or A is benzene, naphthyl, cyclohexyl or the like having four free valences when m=4; R 1 , R 1 ' are each alkyl or cycloalkyl. The compd. is useful for stabilization, especially of polyolefin and styrene copolymers and is used by 0.01 to 10 wt.%, especially 0.05 to 0.3 wt.% of the whole weight. 
     COPYRIGHT: (C)1994,JPO
Patent JP-S63224966-A (JP)
Title: Image forming device
Inventor: KOBAYASHI NORIYUKI
IPC: B41J25/304
Filed: 1987-03-14
Abstract: PURPOSE:To reduce an impact by a thermal head upon a platen when the pressure contact of the thermal head is initiated and permit the pressure contact force to be easily controlled by providing a normal rotating and reversing motor which changes the tension of a spring energizing a supporting member in a direction where the platen and printing head are caused to contact with each other under pressure, through a moving member. CONSTITUTION:A kick roller is permitted to rotate by driving of a motor for a recording medium to feed a recording medium in a cassette and thereby, the recording medium is supplied into between a platen 52 and a thermal head 47. Next, a cam gear 75 is allowed to rotate clockwise by a predetermined value by driving of a pulse motor 71 to move a gear pin 89 from (A) point to (B) point. Following this movement, a cam pin 88 is absorbed by tension of a sprint 90, turning a head cam 78 to clockwise with a shaft 81 as a pivot. In this way, the thermal head 47 is permitted to contact the platen 52 without any resultant impact force. In addition, the pulse motor 71 is caused to rotate to change the tension of the spring 90, setting the pressure contact force of the thermal head 47 upon the platen 52 to a predetermined range for printing density variations.
Patent JP-S57174723-A (JP)
Title: Bus load controlling system
Inventor: TERADA MATSUAKI
IPC: G06F13/36
Filed: 1981-04-22
Abstract: PURPOSE:To reduce the peak load of a bus, by monitoring the bus load through an input/output device and varying the using frequency of the bus in accordance with the bus load. CONSTITUTION:The data to be fed to a CPU1 from an input/output device 3 is prepared at a buffer memory 11. A DMA control circuit DMAC9 delivers a bus occupying request REQ2-3 to a bus occupancy control circuit BA4 and a DMA control circuit 1-2. The circuit BA4 sends back ACK2-4 in case when the bus 2 is not in use. Then the circuit DMAC9 reads the data by which the address of a counter 10 is transferred to an address bus 2-1 out of the memory 11 via a control circuit MCONT12 and then delivers it to a data bus 2-2. Thereafter, a data fetch request SRVI2-5 is delivered. The circuit 1-2 writes the data on the bus 2-2 into a memory 1-1. Then SRVO2-10 is delivered after the fetching of data is over.
Patent JP-H10241011-A (JP)
Title: Automatic teller machine and its controlling method
Inventor: MIKUNI SHIGERU
IPC: G07D9/00
Filed: 1997-02-26
Abstract: PROBLEM TO BE SOLVED: To enable a customer to easily execute key operation and to prevent the occurrence of an input miss or the like without generating confusion in operation by selecting a screen of a key array most familiar to the customer as an operation screen based on transaction screen specification information written in a cash card. SOLUTION: A customer inserts a cash card 7 into a card inserting/ejecting port 2 and executes a transaction. Transaction screen specification information 8 has been written in the card 7. A medium reading part 12 reads out the information from a medium, i.e., the card 7, inserted into the port 2 of the automatic transaction device 10 and executes processing. A transaction screen control part 13 executes control for reading out the transaction screen of the specified key array from a transaction screen storage part 11 based on the information 8 read out by the reading part 12 and displaying the read screen on an operation part 5. The information 8 can be stored also in a medium such as a bank book to be used for a transaction.
Patent JP-S61219166-A (JP)
Title: Manufacture of semiconductor memory device
Inventor: MINAMI KAZUMA
IPC: H01L27/108
Filed: 1985-03-25
Abstract: PURPOSE:To avoid the deterioration in interlayer withstand voltage using sufficiently thick interlayer insulating film by a method wherein the second polycrystalline silicon film is left on the sidewall of condenser electrode for storing data and then the polycrystalline silicon film on the sidewall is oxidized by thermal oxidation process. CONSTITUTION:The second oxide film 16, the first polycrystalline silicon film 15 and a silicon nitride film 14, the first oxide film 13 are anisotropically dry- etched using photoresist 17 as a mask. Firstly a silicon dioxide film 18 as the third oxide film to be a stopper to any damage to substrate 11 is formed by thermal oxidation process and then the second polycrystalline silicon film 19 is formed on the silicon dioxide film 18 by vapor growing process. Secondly the polycrystalline silicon film 19 is anisotropically dry-etched to be left as the polycrystalline silicon film 19a on the sidewall of condenser electrode for storing data. After removing the third oxide film 18, a gate insulating film 21 as the fourth oxide film is formed by thermal oxidation process. At this time, the polycrystalline silicon film 19a left on the sidewall of condenser electrode for storing data is also oxidized. Finally a gate electrode 22 (polycrystalline silicon film) is formed.
Patent JP-H05263510-A (JP)
Title: Two-layer type vertical trough
IPC: E03C1/122
Filed: 1992-03-17
Abstract: PURPOSE:To permit waste water, together with rain water, to be sanitarily introduced to a drainage facility without damaging the appearance of a building. CONSTITUTION:A two-layer type vertical trough 1 is made up of a vertical rain water passage 2 and a drain passage 3 provided in parallel with the passage 2 through a partition wall 4. Waste water, together with rain water, is introduced to a drainage facility through the vertical trough 1 connected with a drain tube D without extending to the outer wall without joining with rain water. The waste water can thus be sanitarily treated with rain water without damaging the appearance of the building.
Patent JP-H08229646-A (JP)
Title: Continuous casting nozzle for brass
Inventor: OKUBO SHUICHI
IPC: C04B35/52
Filed: 1995-02-24
Abstract: PURPOSE: To provide a continuous casting nozzle capable of suppressing generation of Zn0 on the inner face of nozzle during casting so as to stably cast high quality brass. CONSTITUTION: A nozzle is made of a graphite material having a thermal conductivity of >=30kcal/mh deg.C to <100kcal/mh deg.C and a porosity of >15% to <=302%. By suppressing generation of Zn0 on the inner face of nozzle and preventing Zn0 from filming, the high quality casting having good coating surface is stably obtained for long time.
Patent JP-H06274756-A (JP)
Title: Automatic laundary agent machine
Inventor: NAKATSUKA MASAYA
IPC: G07F17/12
Filed: 1993-03-19
Abstract: PURPOSE:To provide an automatic laundary agent machine which can be easily used even by the busy users by deciding the delayed take-out of laundary by each time band and setting the laundary deposited time band in a laundary receiving enable period. CONSTITUTION:The time when the laundary is deposited in a box is measured and stored, and then a person in charge measures and stores the time when the laundary is returned. When a delayed fetching mode is selected, it is checked whether the depositing time is included or not in a period covering the returning time through the delayed receiving time of laundary. For instance, the receiving enable period of the laundary deposited in a period 1 covers 15:00 of the second day through 10:00 of the third day as conventional. However the laundary deposited in a period 2 is returned at 15:00 of the third day and then fetches with delay at 15:00 of the fourth day. Therefore the time band of the period 2 shown in the double dotted line is included in the preceding period. Thus the laundary can be received in the same time band as that when the laundary is deposited.
Patent JP-H07273223-A (JP)
Title: Manufacture of semiconductor device
Inventor: TAKAHASHI KATSUYUKI
IPC: H01L27/11
Filed: 1994-03-30
Abstract: PURPOSE:To make a lower part of polycrystalline silicon low in resistance so as to prevent a standby current from increasing in an SRAM by a method wherein impurity ions are implanted in an interface between the high-resistance polycrystalline silicon of a SRAM and an SiO2 film under it. CONSTITUTION:An oxide film (HTO film) 22 is formed through a CVD method, and a non-doped polycrystalline silicon film 28 is formed through a vacuum CVD method. Then, oxygen ions are implanted in an interface between the non-doped polycrystalline silicon film 28 and the insulating film 22 in dose of 1X10<19>cm<-2> with an accelerating energy of 70KeV by a large current ion implanting device. A large amount of interstitial silicon is generated in an interface between the non-doped polycrystalline silicon film 28 and the insulting film 22 by annealing carried out at a temperature of 90 deg.C and in an N2 atmosphree, and the lower part of the non-doped polycrystalline silicon film 28 becomes high in resistance.
Patent JP-S58178396-A (JP)
Inventor: KITATSUME YOSHIAKI
IPC: G10L15/06
Filed: 1982-04-12
Abstract: (57)【要約】本公報は電子出願前の出願データであるた め要約のデータは記録されません。
Patent JP-S62218169-A (JP)
Title: Ribbon for thermal transfer printer
Inventor: FUJIWARA TAKASHI
IPC: B41M5/41
Filed: 1986-03-20
Abstract: PURPOSE:To ensure a noiseless operation and enable a clear print to be obtained at high speed, by providing a transfer ink layer on one side of a poly(p- phenyleneterephthalamide) film containing a specified amount of conductive carbon black, by coating. CONSTITUTION:A ribbon case is constituted of a poly(p- phenyleneterephthalamide) film containing 15-40wt% of conductive carbon black. The polymer is a polymer of the formula, and is produced from p- phenylenediamine and terephthaloyl chloride by low-temperature solution polymerization. The carbon black loaded film has a thickness of 2-20mum. If the thickness is more than 20mum, response of an ink layer to a printing head is poor, whereas if the thickness is less than 2mum, the film may be easily broken or elongated. If the carbon content is more than 40wt%, the film becomes brittle, whereas if the carbon content is less than 15wt%, conductivity of the film is excessively low, and a thermal transfer system can not operate effectively.
Patent JP-H06304013-A (JP)
Title: Umbrella and its receptacle
Inventor: MUKAI MASAMI
IPC: A45B19/10
Filed: 1993-03-22
Abstract: PURPOSE:To provide an umbrella to be used very conveniently. CONSTITUTION:A handle 4700b of an umbrella is provided with an inner space capable of receiving umbrella cloth 4 or the like. A ferrule 4700a mounted to the tip of the umbrella is constituted to function as a lid for an opening of the handle 4700b. In the use of the umbrella, the umbrella cloth 4, struts 3, etc., can be stretched out by drawing out the ferrule 4700a. When the umbrella cloth 4 or the like is received. The struts 3 are contracted after folding the umbrella cloth or the like. Thus, the opening of the handle is closed by the ferrule 4700a. Since the handle portion is enlarged while the whole length is elongated, the convenience for using the umbrella is improved and the operations of drawing out and receiving the umbrella are facilitated.
Patent JP-H07271302-A (JP)
Title: Seal
Inventor: ITO NORIYUKI
IPC: B41M5/26
Filed: 1994-03-30
Abstract: PURPOSE:To obtain such a seal that unathorized opening of a document bag or the like and forgery of a seal can easily be verified by allowing a color developing ink layer to develop color with an org. solvent or with heat. CONSTITUTION:This seal has a color developing ink layer 20 containing a leuco pigment and developer and a protective film layer 30 which does not transmit a solvent successively formed on a base sheet 10 which transmits a solvent. A releasing sheet 50 is formed with an adhesive layer in-between on the back surface of the base sheet 10. The base sheet 10 is such a sheet 10 that has brittleness and transmits a solvent.
Patent JP-S59188161-A (JP)
Title: Manufacture of complementary mos semiconductor device
Inventor: MURAKAMI NORIO
IPC: H01L29/78
Filed: 1983-04-08
Abstract: PURPOSE:To enable to effectively prevent a latchup phenomenon by electrically insulating and isolating a well region via an SiO2 layer, thereby eliminating the production of a parasitic bipolar transistor structure. CONSTITUTION:An SiO2 layer 6 is formed on an N type semiconductor substrate 1, an N type epitaxial layer 7 is grown, and an SiO2 film 8 and SiO3N4 film 9 are formed. The first film 11 and the second film 12 remain by selective etching. The layer 7 is formed as an SiO2 layer 13 by oxidizing, and the insulated and isolated remaining epitaxial layer 7 is formed under the first film 11. Boron ions are implanted as a P type well region 14, the seource and drain region 15 of an N type MOS transistor, and the source and drain region 16 of a P type MOS transistor are formed, and gate insulating films 17, 18 and gate electrodes 19, 20 are formed.
Patent JP-H06250023-A (JP)
Title: Light diffusing plate for direct back light
Inventor: TACHIHABA FUMITAKE
IPC: G02B6/00
Filed: 1993-02-25
Abstract: PURPOSE:To obtain a light diffusing plate with a high luminance and small thickness suitable for a direct back light by painting out back surface of a transparent light guide plate with an ink containing a white pigment to form a diffusing layer and then applying an ink containing a controlling agent for light transmission on the diffusion layer by dot printing to form a light controlling layer. CONSTITUTION:A silica ink, for example, an ink containing 18% silica, 4.5% titanium dioxide, and the balane org. synthetic resin binder which is, in this case, 52% transparent acrylic resin dissolved in the balance solvent is applied while painting out the back surface of a transparent acrylic resin light guide plate 11 to form a diffusion layer 12 having 4mum thickness. Then, an ink consisting of a controlling agent for transmission of light, for example, 28% titanium dioxide, 2% white pigment, and the balance org. synthetic resin binder which is, in this case, a transparent acrylic resin dissolved in a solvent is applied on the diffusion layer 12 by dot pattern printing to form a light controlling layer 13 of 4mum thickiness and 50mm width. Thus, the light diffusion plate is obtd.
Patent JP-S59186067-A (JP)
Title: System for processing path retrieval
Inventor: SHIOZAKI TOORU
IPC: G06F17/50
Filed: 1983-04-07
Abstract: PURPOSE:To decrease a time required for computer for retrieving a path by slicing and dividing a board into slits, shifting slits sequentially and retrieving the path between adjacent slits in parallel at the same time. CONSTITUTION:Processors 9a-9n are assigned to each grating in a slit 10a including a start point 6 and the path in the Y direction is retrieved from the start point 6. The result of retrieval is expressed by a direction 12 of the path found out and preserved in a slit 10a' of a grating map 11. Then, the processors 9a-9n are assigned to each grating of a slit 10b, and the path in the X direction from the grating preserved for the path in the slit 10a the slit 10b is retrieved in parallel at the same time between adjacent gratings of the slits 10a and 10b. As to the grating whose path from the slit 10a is not found out, the path in the Y direction is retrieved. The result of the retrieval is preserved in the slit 10b'. The slits are shifted sequentially in the X direction and the path is being retrieved until the point reaches the end point 7.