baber/WOPTO huggingface dataset:
Patent JP-H06158016-A (JP)
Title: Bonding of polyolefin material by aqueous polyurethane resin
Inventor: SHIMADA SHIGERU
IPC: C08G18/62
Filed: 1992-03-11
Abstract: PURPOSE:To facilitate bonding of a polyolefin material, such as polyethylene or polypropylene, with excellent bonding strength by using an aqueous polyurethane resin made from a polyol whose principal chain comprises an olefin. CONSTITUTION:A polyol component comprising a polyol whose principal chain comprises an olefin, such as a polyol made by saturating the double bonds of 1,2-polybutadiene polyol with hydrogen, is reacted with a polyisocyanate compound (e.g. tolylene diisocyanate) to produce an aqueous polyurethane resin. As the olefinic polyol, a polyol based on a saturated hydrocarbon and having an average molecular weight of 500 to 4,000 and an average functionality of hydroxyl group of 1.5 to 3 is preferably used. The obtained resin is used as an adhesive; it is thickened, if necessary, and applied to a polyolefin material by, e.g. brushing, rolling or spraying to effect bonding.
Patent JP-H08288233-A (JP)
Title: Ion implanting method
Inventor: FUSE HARUHIDE
IPC: H01L21/265
Filed: 1995-04-12
Abstract: PURPOSE: To provide an ion implanting method by which a high beam current of B ions at a high purity can be obtained and the probability of the piping trouble due to corrosion is low. CONSTITUTION: A raw material gas to be introduced into an ion source 1 is an enriched B2 H6 gas made by concentrating boron-11. The produced ions contain boron-11 about 90% with a little of BH ions and H ions. Thus, a beam current more than 2.5 times as high as that using the conventional BF3 gas can be obtained at a high beam purity, and because of the H-base gas, the probability of the piping trouble due to corrosion is equal to or less than that using arsine or phosphine gas.
Patent JP-H04318761-A (JP)
Title: Semiconductor integrated circuit device
Inventor: TAKI YOICHIRO
IPC: H01L27/00
Filed: 1991-04-18
Abstract: PURPOSE:To realize the semiconductor integrated circuit device for picture processing control able to output a contrast binarizing signal with excellent reproduction. CONSTITUTION:A systematic dither binarizing circuit 8 applies contrast binarizing to a correction image signal S0 by the systematic dither method and outputs a 1st contrast binarizing signal SB to an image area control circuit 6'. On the other hand, an error diffusion method binarizing circuit 1 applies contrast binarization to the correction image signal SO by the error diffusion method to output a 2nd contrast binarizing signal SC to the image area control circuit 6'. The image area control circuit 6' selects and outputs either of the 1st contrast binarizing signal SB or the 2nd contrast binarizing signal SC as the contrast binarizing signal based on a contrast selection signal S3. The circuit device has the effect of selecting and outputting the contrast binarizing signal with excellent reproducibility and short transmission time properly.
Patent JP-S60239010-A (JP)
Title: Load tap selector
Inventor: UCHIMURA KAZUHIKO
IPC: H01H9/00
Filed: 1984-04-28
Abstract: PURPOSE:To improve space efficiency and to facilitate and ensure the support of a resistor by forming the resistor with continuous form of a spiral former and a strand part. CONSTITUTION:A fixed-contact group 2 is disposed on an inside wall of a cylindrical oil container 1. While opening these contact group 2, a movable-contact group opens and closes the electric current. A resistor 7 is formed in series line in which spiral parts 71 and strand parts 72 exist alternately, the structure is such that the strand part 72 is inserted to a recessed portion provided in the both edges of a resistor supporting frame 8. The length L in axial direction of the resistor supporting frame 8 is made a little longer than the size of the resistor 7 so as to be able to install the spiral part 71 of the resistor 7 with tensile strength. In such a constitution, space efficiency is improved as the resistor 7 is wound in spiral form. And also, there is no fear, even at high speed operation, that the strand part 72 may shift to peripheral direction, because the recessed portion, where the strand part 72 is set, is provided at both sides of the supporting frame 8, and causes the tensile strength.
Patent JP-S5712558-A (JP)
Title: Mos transistor having high withstand voltage
Inventor: TANAKA TADAHIKO
IPC: H01L29/73
Filed: 1980-06-25
Abstract: PURPOSE:To contrive to enhance withstand voltage of an MOS transistor by a method wherein the channel length at the bending parts at tip parts of a source region is made as longer than the other part. CONSTITUTION:The N<+> type source region 22 and a drain region 23 are formed in a comb-shape in an N type epitaxial layer 24 on a P type Si substrate 21, and the channel region 25 are formed between them by ion implantation being controlled to have the prescribed concentration. The channel length l' of the channel region 25 at the bending parts of tip edges of the source region 22 is longer than the channel length l of the other parts (to form the shape thereof with a curve having a large radius of curvature is also favorable). By this constitution, because channel resistance at that parts are larger than the other parts, electric line of force to go from the bottoms of the drain region 23 toward the bending parts is reduced, electric field is weakened and concentration of current can be prevented. Therefore a high withstand voltage can be attained.
Patent JP-H01258425-A (JP)
Title: Pattern formation
Inventor: NAKAGAWA KATSUNOBU
IPC: G03F7/00
Filed: 1988-04-08
Abstract: PURPOSE:To prevent a stepped part from deforming thereby forming a pattern with high precision by forming a radiation sensitive resin layer on the stepped part. CONSTITUTION:A trench 12 is formed on a substrate 11 to form an oxide film 13. The oxide film 13 is coated with a positive type resist film 14 to form a removed part 14A of the resist film 14. The whole surface of the substrate 11 is coated with a water soluble organic film 15 as a mix preventive layer. Next, the whole surface is coated with a negative type resist film 16. The negative type resist film 16 is selectively removed by photoexposure process using ultraviolet ray irradiation to form a resist part 16A of the resist film 16 only on the trench 12 and peripheral part thereof. At this time, the film 15 is also removed leaving a residual part 15A below the residual part 16A. The oxide film 13 is selectively removed by etching process using the resist film 14 as a mask leaving residual parts 15A, 16A as they are to form a removed part 13A and a circuit pattern is formed. Through these procedures, the trench 12 can be prevented from deforming thus enabling the excellent trench 12 to be formed. Consequently, a pattern can be formed with high precision.
Patent JP-H02269299-A (JP)
Title: Screw conveyer
Inventor: OISHI YOSHIHIRO
IPC: E02F7/00
Filed: 1989-04-07
Abstract: PURPOSE:To eliminate the need of a large equipment and to improve the transport efficiency by providing endless belts and plural guide plates, and projecting the respective guide plates through an elongated hole along the screw shaft provided on a casing between adjacent wing portions of a screw wing. CONSTITUTION:Two endless belts are extended between support rollers 13, 13' and supported on the outside portion side of a casing 2 in such a manner as to circulate and move along a screw shaft 3. Plural guide plates are projected out through an elongated hole 11 along the screw shaft 3 provided on the casing 2 between adjacent wing portions of a screw wing 1. the rotation of a turning driving portion 4 is transmitted to the screw shaft 3 to rotate the screw shaft 3 and the screw wing 1 in the casing 2. Next, an article to be transported is scooped up from the lower end portion of the screw wing 1. At this time, the article to be transported is conveyed upward in the vertical direction by rising of the guide plate 6 and rotation round the screw shaft 3 of the screw wing 1 and discharged from the discharge port 5 for the article to be transported.
Patent JP-H05289338-A (JP)
Title: Positive electron beam resist
Inventor: TAMURA AKIRA
IPC: C08F20/42
Filed: 1992-04-08
Abstract: PURPOSE:To obtain a resist free from the generation of cracks of a resist pat tern on silicon dioxide, high in sensitivity and excellent in dry etching resistance by containing a specific 2-cyanoacrylic alkyl cyclohexyl polymer as a main component. CONSTITUTION:The 2-cyanoacrylic alkyl cyclohexyl polymer expressed by the formula is contained as a main component. In the formula, R is a lower alkyl group and is preferably 1-4C. When the carbon number of alkyl group of substituted group is >=5, the deterioration of sensitivity and negative inversion is generated because cross-linking reaction in side chain occurs preferentially by principal chain severance reaction. The number and position of alkyl substituted group is not restricted. In this case, the positive electron beam resist is obtained by the anion polymerization or the radical polymerization of 2- cyanoacrylic alkyl cyclohexyl monomer.
Patent JP-H02269265-A (JP)
Title: Pressing device for clutch bolt
Inventor: TASHIRO SHOICHI
IPC: E04F21/00
Filed: 1989-04-07
Abstract: PURPOSE:To press a reinforcing bar surely, strongly, and quickly by providing a support shaft fixed in front of a main body case, two pressing levers rotatably fitted on the support shaft and provided with arc-shaped pressing pieces at the tips, and a means rotating the pressing levers. CONSTITUTION:A support frame 2 is fitted at the tip of a main body case 1, a support shaft 3 is integrally fitted to the tip, two pressing levers 4 are rotatably fitted to the support shaft 3, and arc-shaped pressing pieces 4a are integrally provided at the tips of the pressing levers 4. Operating levers 5 are rotatably fitted at the rear ends of the pressing levers 4, and an operating pin 6 is rotatably fitted at the rear ends of the operating levers 5. The operating pin 6 is reciprocated in the longitudinal direction by a driving device provided in the main body case 1, a trigger 1a is once pushed in and moved in the longitudinal direction by one stroke. The pressing pieces 4a of the pressing levers 4 are operated to the closed state from the opened state, the grasping piece 10a of a clutch bolt 10 is pressed to a reinforcing bar to grasp it.
Patent JP-S58205460-A (JP)
Title: Nutrimental composition for fish farming
Inventor: TSURUTA MASAMI
IPC: A23K1/18
Filed: 1982-05-25
Abstract: PURPOSE:A nutrimental composition for the fish farming containing calcium pantothenate and/or calcium ascorbate and nutriments mixed and dispersed uniformly in a feed without the dissolution loss of the nutriments. CONSTITUTION:A nutrimental composition for the fish farming prepared by incorporating 1.2-15mol, preferably 1.5-10mol, based on one mole calcium salt, disodium hydrogenphosphate or dipotassium hydrogenphosphate with the conventional nutriments for the fish farming containing calcium pantothenate and/or calcium ascorbate and if necessary a high polymeric polyelectrolyte, e.g. sodium polyacrylate.
Patent JP-S60228425-A (JP)
Title: Production of biphenyl
Inventor: TEZUKA TAKAHIRO
IPC: B01J19/12
Filed: 1984-04-27
Abstract: PURPOSE:An alpha-azohydroperoxide is dissolved in an aromatic hydrocarbon and subjected to radical decomposition with light irradiation and/or heat to enable safe and high-yield production of a biphenyl which is used as a starting material for high polymers. CONSTITUTION:A compound of formulas I -III (R1, R2 are H, alkyl, aryl, polycyclic aromatic aryl, (CH2)4-7; R3, R4 are alkyl, COOH, CHO, CH2OH, CN, OH, X) is dissolved in a substrate of formula IV (R6, R7 are alkyl, COOR9, CHO, CH2OH, OR9, X) and subjected to radical decomposition with light and/or heat to give a biphenyl. Light irradiation is carried out using light of 3,200- 4,200Angstrom wavelength emitted from high-pressure mercury lamp, metal halide lamp or fluorescent lamp and heat is effected at a temperature lower than the boiling point of the substrate. EFFECT:The process is in no need of high temperature and high pressure and can be carried out by no use of water and catalysts.
Patent JP-S61252128-A (JP)
Title: Forming of film of polyphenylene ether resin
Inventor: HOSONO TAIJI
IPC: B29C48/08
Filed: 1985-04-23
Abstract: PURPOSE:To obtain the film of polyphenylene ether resin, stable and high in quality thereof, by a method wherein a composition, obtained by mixing the polyphenylene ether resin with diamide compound, is extruded under specified conditions. CONSTITUTION:The polyphenylene ether resin is mixed with diamide compound to manufacture the film by melt extrusion method. The temperature of resin in an extruder is set at 200-320 deg.C. Extruded molten resin is taken off with the draft ratio of 0.5-50. When the draft ratio is less than 0.5, drooping is generated in the extruded polyphenylene resin film and wrinkles are generated in the film. When the draft ratio exceeds 50, the film is easily cut or torn to the longitudinal direction thereof. The film is cooled to the temperature of 30-120 deg.C under taking it off. When the temperature is lower than 30 deg.C, the film will not contact with a roll closely, however, when it exceeds 120 deg.C, wrinkles will easily generated in the film. According to this method, the polyphenylene ether film, having smooth surface and stable quality, may be obtained.
Patent JP-S5313191-A (JP)
Title: Power source connecting device
Inventor: KOJIMA YUTAKA
IPC: H01R13/502
Filed: 1976-07-21
Abstract: PURPOSE: To prevent shortcircuit between load brade and grounding blade and to prevent removal of power source cord by fixing load blade and grounding blade projecting in same direction on each side of thick portion of the body. 
     COPYRIGHT: (C)1978,JPO&Japio
Patent JP-H07265451-A (JP)
Title: Fall preventing device
Inventor: FUKUI HIROAKI
IPC: E04G21/32
Filed: 1994-03-31
Abstract: PURPOSE:To prevent the fall of a worker by means of a safety belt by connecting the hook of the safety belt to a hold-down material such as a pipe, etc., even when it is placed at a comparatively high position at a high position working site. CONSTITUTION:The frame 4 of a take-up reel is connected to the hook 11 to be engaged with the hold-down material, and a flat belt 13 is taken up on the rotor 15 of the take-up reel, and a connection ring 18 is formed at the tip of the flat belt 13, and the hook of the safety belt is engaged with the connection ring 18, and a pole 23 is engaged with the gear 25 of a ratchet wheel 22 when the flat belt 13 is drawn out at high speed. In this way, the rotation of the rotor 15 can be blocked, and the gears 37, 38 of a main rotary can 35 and a free rotary cam 36 can be kept at a noncoincidental position when the flat belt 13 is taken up on the rotor 15, and a stopper 39 can be prevented from being engaged with the gears of the main rotary cam 35 and the free rotary cam 36.
Patent JP-H09282736-A (JP)
Title: Tape driving device
Inventor: MITSUYASU TAMOTSU
IPC: G11B15/467
Filed: 1996-04-10
Abstract: PROBLEM TO BE SOLVED: To stabilize the tape traveling of a tape driving device for directly driving a tape in the outer peripheral surface of a drum by disposing a stator in the vicinity of a fixed drum head. SOLUTION: A tape is wound on the outer peripheral surface of a drum unit 12 including a fixed head with a stuck piezoelectric element subjected to polarization for its inner peripheral surface, and a stator 13 having the inner diameter of a curvature nearly equal to the drum outer diameter of the drum unit 12 is pressed on the drum unit 12. Thus, a tape 15 and the stator 13 are brought into surface-contact with each other, the floating of the tape 15 on the drum unit 12 is suppressed and the holding force of the tape 15 is increased. Thus, a tape speed is controlled highly accurately with high responsiveness, and even if fluctuation occurs in tape tension, the fluctuation of the tape speed is suppressed. Preferably, as a tape pressing force detecting part, for instance, a load converter 18 is added, and control is performed such that a tape pressing force takes a desired value.
Patent JP-2000281498-A (JP)
Title: Ferroelectric single crystal thin film and its production
Inventor: KAWAGUCHI TATSUO
IPC: C30B29/30
Filed: 1999-03-30
Abstract: PROBLEM TO BE SOLVED: To provide a new method for producing a ferroelectric single crystal thin film in which a step index type optical waveguide is formed by adding at least one kind of element. SOLUTION: A ferroelectric single crystal thin film containing at least one kind of element added thereto is formed on a ferroelectric single crystal substrate according to a liquid-phase epitaxial method. (1) The ferroelectric single crystal thin film is then preferably cooled to 500-700 deg.C in a quick cooling step at preferably 50-2,000 deg.C/min cooling rate in order to prevent the element from diffusing into the interior of the ferroelectric single crystal and (2) the ferroelectric single crystal thin film is subsequently cooled to room temperature in an annealing step at preferably 0.01-5 deg.C/min cooling rate in order to epitaxially grow the ferroelectric single crystal thin film.
Patent JP-H06276468-A (JP)
Title: Multi-pattern erasure system
Inventor: WAKABAYASHI TAICHI
IPC: H04N5/91
Filed: 1993-03-23
Abstract: PURPOSE:To provide the multi-pattern erasure system in which a wait time required for making a content of a floppy disk coincident with a content of a multi-pattern is remarkably reduced more than that of a conventional system by deleting part of the content of the floppy disk in a reproduction device of an electronic still camera system having a multi-pattern display function. CONSTITUTION:A picture of each track sought from a floppy disk is stored in a memory 22, and multi-pattern display is attained by reading the content of the memory 22 to be displayed on a multi-screen as one pattern. When a picture of a track of the floppy disk is deleted, a changeover device 6 is thrown to connect a changeover erasure circuit 7 to a head 4. Simultaneously a write switching signal is fed to a multi-pattern block 20, a changeover device 23 is thrown to connect an output of a blue back SG circuit 21 to the memory 22. Then an address corresponding to the track to be deleted is sent and the content of the multi-pattern is deleted as soon as the content of the floppy disk is deleted by writing a blue back signal to the address.
Patent JP-S61247001-A (JP)
Inventor: NOI KEIICHI
IPC: H01C7/10
Filed: 1985-04-24
Abstract: (57)【要約】本公報は電子出願前の出願データであるた め要約のデータは記録されません。
Patent JP-S58208445-A (JP)
Inventor: UMEZAWA HIDEJI
IPC: D03D51/34
Filed: 1982-05-26
Abstract: (57)【要約】本公報は電子出願前の出願データであるた め要約のデータは記録されません。
Patent JP-S5211766-A (JP)
Title: Method of manufacturing semiconductor device
Inventor: KACHI MASAO
IPC: H01L21/52
Filed: 1975-07-17
Abstract: PURPOSE: To decrease defective mounting of semiconductor devices by adding an etching process after roughening the reverse surface of the Si substrates. 
     COPYRIGHT: (C)1977,JPO&Japio
Patent JP-S59214309-A (JP)
Title: Muting circuit
Inventor: WAKAMORI HACHIROU
IPC: H03F1/00
Filed: 1983-05-19
Abstract: PURPOSE:To allow a sound signal to have almost no amplitude distortion in a muting-off state by impressing a reverse voltage to the base of a transistor (TR) for muting in the muting-off operation state. CONSTITUTION:The reverse bias which has a value larger than peak values of amplitudes in the positive and negative half cycles of a sound signal input voltage is impressed from a reverse bias power source 8 to the base of the muting TR5 through a bias resistance 9. While a muting control signal has a specific positive voltage, the TR5 turns on to perform muting-on operation, and when the muting control signal falls to 0V, the TR5 turns of to enter the muting-off operation state and biased reversely to eliminate a current i3 which flows through resistances Rc and R7 in the negative half cycle of the sound signal input (vi). Consequently, the problem of distortion which appears in a sound signal output by the current i3 is eliminated.
Patent JP-H01260618-A (JP)
Title: Cleaning device for magnetic head
Inventor: FUJIKI MASAKI
IPC: G11B5/41
Filed: 1988-04-12
Abstract: PURPOSE:To prevent an error of a magnetic tape device by cleaning a magnetic head according to the detected value of the control level of an automatic gain control device. CONSTITUTION:A cleaning instructing device 5 which issues the cleaning instruction of the magnetic head 2 according to the detected value of an amplification degree detecting device 4 to detect the control level of the automatic gain control device 3 to control the gain of a read amplifier 6 according to the level of a read signal by the magnetic head 2 of the magnetic tape device 1 is provided. When the gain of the automatic gain control device 3 reaches a maximum value, the level of the read signal comes lowest, and it means that reading ability comes to a limit. At that time, the cleaning instruction of the magnetic head 2 is issued from the cleaning instructing device 5 according to the detected value of the amplification degree detecting device 4. Thus, the magnetic head is cleaned always at the optimum time, and the error can be prevented.
Patent JP-H01260868-A (JP)
Title: Dc type superconducting quantum interference element using oxide superconductor
Inventor: KUROKI KENJI
IPC: H01L39/22
Filed: 1988-04-12
Abstract: PURPOSE:To increase the product of a superconducting critical current and a normal conductive resistance without changing the inductance of a loop by forming weak links in meander shapes, in a DC type superconducting quantum interference element having the weak links using oxide superconductive films at two places. CONSTITUTION:This element is composed of weak links at two places and a superconducting loop including the links. As a thin film 1, e.g., a YBa2Cu3O7-delta film formed by RF magnetron sputtering is used. The thin film is formed on a single crystal. Then, the superconductor thin film 1 is obtained by heat treatment. Photoresist is used in patterning, and etching is performed. In this SQUID, the weak links 2 are formed in meander shapes. The area of a hole 3 of the SQUID is made to be, e.g., 9,000 (mum<2>). The width of a line is made to be 20mum. The Iength is made to be about 800mum in terms of a straight line.
Patent JP-2000283220-A (JP)
Title: Base isolation display stand
Inventor: FUJII AKIHITO
IPC: F16F15/02
Filed: 1999-03-30
Abstract: PROBLEM TO BE SOLVED: To exert damping force corresponding to the weight of a base-isolated object at the time of isolation action, in a base isolation display stand protecting the base-isolated object from earthquakes and the like by base isolation of an upper base on which the base-isolated object such as an art object is placed. SOLUTION: A sliding support 7 and a rolling support 9 are provided in parallel between an upper base 3 on which a base-isolated object is placed and a lower base 5 provided below the upper base 3. A load acting on the low base 5 from the upper base 3 is supported by these supports 7, 9, and relative horizontal vibration of both bases 3, 5 is isolated. The sliding support 7 maintains vertical intervals between both bases 3, 5, and supports the load acting from the upper base 3. The rolling support 9 supports the load acting from the upper base generally constant through a pressing member 11 elastically urging the rolling support 9 to either one of the base 3 or 5.