Patent SG-11201807211X-A (SG)
Title: Compositions and methods using same for deposition of silicon-containing film
Inventor: LI JIANHENG
IPC: C23C16/56
Filed: 2017-02-22
Abstract: INTERNATIONAL APPLICATION PUBLISHED UNDER THE PATENT COOPERATION TREATY (PCT) (19) World Intellectual Property Organization International Bureau (10) International Publication Number (43) International Publication Date WO 2017/147150 Al 31 August 2017 (31.08.2017) WIPO I PCT (51) International Patent Classification: C23C 16/32 (2006.01) C23C 16/30 (2006.01) C23C 16/34 (2006.01) C23C 16/56 (2006.01) C23C 16/40 (2006.01) C23C 16/505 (2006.01) (21) International Application Number: PCT/US2017/018873 (22) International Filing Date: 22 February 2017 (22.02.2017) (25) Filing Language: English (26) Publication Language: English (30) Priority Data: 62/300,312 26 February 2016 (26.02.2016) US (71) Applicant: VERSUM MATERIALS US, LLC [US/US]; 8555 River Parkway, Tempe, AZ 85284 (US). (72) Inventors: LI, Jianheng; 937 Crest Way, Emmaus, PA 18049 (US). LEI, Xinjian; 1928 Cherrywood Street, Vista, CA 92081 (US). VRTIS, Raymond, Nicholas; 1510 Randi Lane, Orefield, PA 18069 (US). RIDGEWAY, Robert, Gordon; 3277 Dovecote Drive, Quakertown, PA 18951 (US). SINATORE, Dino; 3322 S. Ruch Street, Whitehall, PA 18052 (US). MAO, Manchao; 5534 Caballos Place, San Diego, CA 92130 (US). (74) Agents: ROSSI, Joseph, D. et al.; Stradley Ronon Stevens, & Young, LLP, 30 Valley Stream Parkway, Mal- vern, PA 19355 (US). (81) Designated States (unless otherwise indicated, for every kind of national protection available): AE, AG, AL, AM, AO, AT, AU, AZ, BA, BB, BG, BH, BN, BR, BW, BY, BZ, CA, CH, CL, CN, CO, CR, CU, CZ, DE, DJ, DK, DM, DO, DZ, EC, EE, EG, ES, FI, GB, GD, GE, GH, GM, GT, HN, HR, HU, ID, IL, IN, IR, IS, JP, KE, KG, KH, KN, KP, KR, KW, KZ, LA, LC, LK, LR, LS, LU, LY, MA, MD, ME, MG, MK, MN, MW, MX, MY, MZ, NA, NG, NI, NO, NZ, OM, PA, PE, PG, PH, PL, PT, QA, RO, RS, RU, RW, SA, SC, SD, SE, SG, SK, SL, SM, ST, SV, SY, TH, TJ, TM, TN, TR, TT, TZ, UA, UG, US, UZ, VC, VN, ZA, ZM, ZW. (84) Designated States (unless otherwise indicated, for every kind of regional protection available): ARIPO (BW, GH, GM, KE, LR, LS, MW, MZ, NA, RW, SD, SL, ST, SZ, TZ, UG, ZM, ZW), Eurasian (AM, AZ, BY, KG, KZ, RU, TJ, TM), European (AL, AT, BE, BG, CH, CY, CZ, DE, DK, EE, ES, FI, FR, GB, GR, HR, HU, IE, IS, IT, LT, LU, [Continued on next page] — (54) Title: COMPOSITIONS AND METHODS USING SAME FOR DEPOSITION OF SILICON-CONTAINING FILM (57) : Described herein are compositions and methods using same for forming a silicon- containing film such as without limitation a silicon carbide, silicon nitride, silicon oxide, silicon oxynitride, a carbon-doped sil- icon nitride, a carbon-doped silicon oxide, or a carbon doped silicon oxyni- tride film on at least a surface of a substrate having a surface feature. In one aspect, the silicon-containing films are deposited using the co-deposition of a first compound comprising a carbon-carbon double or carbon-carbon triple bond and a second compound comprising at least one Si-H bond. Figure 1(a) F Figure 1 (b) 11111111111111011101111111111101011111011101011111111110111111111111111111111110111111 W O 20 17 / 147 15 0 Al WO 2017/147150 Al 1#11101MOHNIIMMEOMMIMOHOHOMEHOIS LV, MC, MK, MT, NL, NO, PL, PT, RO, RS, SE, SI, SK, Published: SM, TR), OAPI (BF, BJ, CF, CG, CI, CM, GA, GN, GQ, GW, KM, ML, MR, NE, SN, TD, TG). with international search report (Art. 21(3))