baber/WOPTO huggingface dataset:
Patent TW-490783-B (TW)
Title: Testing device and method built in the wafer scribe line
Inventor: BU LING-KAI
IPC: G01R31/3185
Filed: 2001-05-22
Granted: 2002-06-11
Abstract: The present invention discloses a testing device and method built in the wafer scribe line, which is used to test multiple measuring voltages outputted from the die in the wafer. The testing device comprises a multiplexer and a comparator. The multiplexer is used to receive multiple measuring voltages and output a multiplexing voltage. The comparator is used to receive a reference voltage and a multiplexing voltage, and output the comparing result between the reference voltage and the multiplexing voltage. The present invention can use the digital tester for testing, so as to greatly increase the testing speed and reduce the testing cost. Moreover, the present invention is located in the scribe line on the wafer, so that it will not increase any manufacturing cost.
Patent TW-490420-B (TW)
Title: Meter display device for saddle type vehicle
Inventor: TSUJI MITSURU
IPC: B62K11/14
Filed: 2001-05-30
Granted: 2002-06-11
Abstract: A combined storage box and vehicle condition display for a small vehicle such as a scooter. The display is mounted in the handlebar cover and the mounting is done in a way so that the display can be mounted from above and still provides a neat appearance for the finished product.
Patent TW-508598-B (TW)
Title: Manufacturing method for thin inductor
Inventor: TZENG DE-LU
IPC: H01F41/00
Filed: 2001-06-07
Granted: 2002-11-01
Abstract: A manufacturing method for the thin inductor is provided, which comprises the following steps: forming of iron core, winding coil, welding the output terminal, glue filling for packaging, and polishing; wherein, during forming of iron core, a larger overall forming depth is provided, so as to facilitate the holding and manufacturing during the following coil winding. Furthermore, during the glue filling for packaging, the iron core, coil and output terminal can be packaged and fixed, and only the depth of excess iron core is exposed. Because the magnetic ferrite has better mechanical strength for polishing, the depth of excess iron core can be polished and removed by suitable polishing, so as to achieve a smaller overall depth. Thus, the overall depth of the inductor can be further reduced, and it is possible to produce super-thin inductor. The prevent invention provides a significant progress in the manufacturing of inductors.
Patent TW-496825-B (TW)
Title: Flexographic printing press with integrated dryer
Inventor: COMPTON CRAIG T
IPC: B41F23/04
Filed: 2001-06-19
Granted: 2002-08-01
Abstract: A flexographic printing press is provided which is particularly suited for printing thin, elastic webs. The web is imprinted by a plurality of printing decks which are positioned around a central impression cylinder. A between color dryer is located between each pair of adjacent printing decks and one or more additional dryers are located downstream of the last printing deck for drying the web before it leaves the central impression cylinder. The web does not pass any dryers after it leaves the central impression cylinder.
Patent TW-533502-B (TW)
Title: Manufacturing method of semiconductor integrated circuit device
Inventor: TADOKORO MASAHIRO
IPC: H01L21/302
Filed: 2001-06-26
Granted: 2003-05-21
Abstract: A manufacturing method of a semiconductor integrated circuit device comprises, in an SAC process or HARC process, subjecting a semiconductor substrate to plasma etching to make contact holes 14a, 14b in an oxide film made of a silicon oxide film 3d formed on the semiconductor substrate 2S. For improving the ease-in-etching property of the silicon oxide film and selectivity to a nitride film, a residence time of an etching gas within a chamber is so set as to be in a range where selectivity to an insulating film made of silicon nitride 8c is improved by using etching conditions of a low pressure and a maximized flow rate of the etching gas of C5H8/O2/Ar.
Patent TW-515001-B (TW)
Title: Method of chemical mechanical polishing
Inventor: LAI JIUN-YU
IPC: B24B37/04
Filed: 2001-07-31
Granted: 2002-12-21
Abstract: In the chemical mechanical polishing (CMP) process employed for microelectronics manufacturing, three contact regimes between the wafer surface and the polishing pad may be proposed: direct contact, mixed or partial contact, and hydroplaning. However, an effective in situ method for characterizing the wafer/pad contact and a systematic way of relating contact conditions to the process parameters are still lacking. In this work, the interfacial friction force, measured by a load sensor on the wafer carrier, has been employed to characterize the contact conditions. Models that relate the friction coefficient to the applied pressure, relative velocity, and slurry viscosity are developed and verified by experiments. Additionally, a correlation between friction coefficient and the material removal rate (MRR) is established and the effects of process parameters on the Preston constant are investigated.
Patent TW-498414-B (TW)
Title: Method and apparatus for cleaning, and method and apparatus for etching
Inventor: SOOBE JUN
IPC: H01L21/205
Filed: 2001-08-03
Granted: 2002-08-11
Abstract: A cleaning apparatus 30 is connected to a processing chamber (12) of a CVD system (10) for silicon. The cleaning apparatus (30) has first, second and third gas sources (32, 34, 36), from which chlorine gas, fluorine gas and an inert gas are introduced through MFC (38a, 38b, 38c), respectively, in which each flow rate is controlled under a mutually independent condition. These gases join in a piping member (42), being mixed to form a mixed gas. The mixed gas is led to a heated reactor (44), for example, a heat exchanger, to generate a generated gas containing chlorine fluoride gases such as ClF3 and the like by the reaction between the chlorine gas and the fluorine gas. The generated gas is fed to the inside of the processing chamber (12) through a cooling unit (46), an analyzing unit (48) and a buffer member (54).
Patent TW-506126-B (TW)
Title: Semiconductor device, liquid crystal module adopting same, method of manufacturing liquid crystal module and elentronic equipment adopting same
Inventor: FUKUTA KAZUHIKO
IPC: G02F1/1345
Filed: 2001-08-24
Granted: 2002-10-11
Abstract: A semiconductor device of the present invention includes a film-like flexible substrate having formed thereon a wiring pattern, external connection terminals formed at both end portions of the flexible substrate; and a semiconductor element mounted on a surface side of the flexible substrate, wherein a folded part, which is folded down in U-shape to a back surface side of the flexible substrate, is formed in a fixed state at least at one end portion of the flexible substrate. With this structure, the semiconductor device is COF mounted, and, for example, in its application to a liquid crystal module wherein the semiconductor device is provided so as to face a liquid crystal panel, the external connection terminals of the flexible substrate can be connected to an inner surface of a module main body for a liquid crystal panel in a state the semiconductor element of the semiconductor device faces the inside of the module main body. As a result, since the semiconductor element can be mounted without being projected to the outside of the module main body, the liquid crystal module can be made thinner for the thickness of the semiconductor element.
Patent TW-495920-B (TW)
Title: Method for forming borderless contact
Inventor: LIOU MENG-CHANG
IPC: H01L21/768
Filed: 2001-09-05
Granted: 2002-07-21
Abstract: A kind of method for forming borderless contact is disclosed in the present invention. The present invention provides a kind of method for forming borderless contact in semiconductor fabrication process. By forming two or more than two dielectric layers as the etching stop layer on the substrate and the active area, it becomes easy to control the etching depth and the critical dimension of the contact window. Therefore, both substrate and device can be prevented from the damage caused by over etch and position shift of critical dimension such that excellent device characteristic can be maintained.
Patent TW-I233290-B (TW)
Title: System for providing incoming phone call display, text messaging service, and e-mail identification
Inventor: YE YI-HAU
IPC: H04M1/00
Filed: 2001-09-28
Granted: 2005-05-21
Abstract: A system for providing incoming phone call display, text messaging service, and e-mail identification can enable a user to receive the data, text message, and e-mail identification data of an incoming call, in which the e-mail identification data include some basic data of an e-mail provided by an e-mail identification data server. A receiving device receives and decodes these messages and an output device is used to display or voice the messages. In some examples, the receiving device can be integrated to current electronic devices, e.g. TV, computers, PDA, electronic dictionaries, electronic watch, etc.
Patent TW-I229600-B (TW)
Title: Pharmaceutical composition for parenteral administration for the treatment of hepatocellular carcinoma
Inventor: WU MING-SHIUAN
IPC: A61K31/00
Filed: 2001-10-17
Granted: 2005-03-21
Abstract: The invention discloses a pharmaceutical composition for parenteral administration for the treatment of hepatocellular carcinoma, which comprises a therapeutically effective amount of arsenic trioxide and a pharmaceutically acceptable carrier.
Patent TW-503586-B (TW)
Title: MOSFET structure with low junction capacitance
Inventor: JANG YAU-WEN
IPC: H01L21/336
Filed: 2001-10-29
Granted: 2002-09-21
Abstract: A MOSFET structure with low junction capacitance includes a bent gate having a first sidewall and a second sidewall on a semiconductor substrate. A source region is located in the semiconductor substrate and adjacent to the first sidewall of the bent gate. The source region has a wide part and a narrow part. A contact window is located above the wide part of the source region and electrically connected to the wide part of the source region. A drain region is located in the semiconductor substrate and adjacent to the second sidewall of the bent gate. The drain region has a wide part and a narrow part. A contact window is located above the wide part and electrically connected to the wide part of the drain region. The wide part of the drain corresponds to the narrow part of the source. The narrow part of the drain corresponds to the wide part of the source region.
Patent TW-498427-B (TW)
Title: Method for fabricating organic thin film
Inventor: SHONO TOMOFUMI
IPC: G03F7/38
Filed: 2001-11-06
Granted: 2002-08-11
Abstract: First, an undercoating film made of silicon nitride or silicon nitride oxide is formed on a substrate. Then the undercoating film is subjected to both/either process A of wet-cleaning the undercoating film with a cleaning liquid and/or process B of irradiating ultraviolet light onto the undercoating film. Afterward, an organic thin film is formed on the undercoating film by providing a liquid organic material (a specific organic material is used if only either process A or process B has been performed).
Patent TW-501308-B (TW)
Title: Asymmetric high-frequency filtering structure
Inventor: WANG CHIN-LI
IPC: H01P1/205
Filed: 2001-11-07
Granted: 2002-09-01
Abstract: The present invention provides a filtering device, which employs a multi-layered and size-reduced high frequency band pass filtering structure, and utilizes cross-coupling to form an attenuation pole at the high frequency or low frequency side of the passing band to generate an asymmetric frequency response. The frequency position of the attenuation pole can be adjusted by the coupling amount, so as to meet the requirement of system specification.
Patent TW-510026-B (TW)
Title: Manufacturing method of memory device with buried source/drain
Inventor: HUANG SHUEI-CHIN
IPC: H01L21/8246
Filed: 2001-11-23
Granted: 2002-11-11
Abstract: There is provided a manufacturing method of memory device with buried source/drain, which comprises forming a dielectric layer on a substrate; forming a word line on the substrate; then, forming a buried source/drain in the substrate; next, forming a barrier layer on the exposed surface of the word line; subsequently, forming a metal layer on the substrate; defining a metal layer to make the retained metal layer cover on the buried source/drain regions at two sides of the word line and cross on the word line.
Patent TW-558532-B (TW)
Title: Vehicular rearview mirror control module
Inventor: SU WEN-WEI
IPC: B60R1/06
Filed: 2001-12-04
Granted: 2003-10-21
Abstract: This invention relates to a vehicular rearview mirror control module to be implemented by a vehicle control system. The vehicle control system includes a first control module connected to a turning signal and a side-view mirror and a second control module connected to a turning signal lever. The control modules share a vehicular digital signal bus for transmitting various digital encoded signals for controlling corresponding equipment. The vehicular rearview mirror control module and the first and second control modules are connected to the vehicular digital signal bus in parallel. When the two control modules detect and generate a digital encoded signal in response to the state of the turning signal lever, and transmit the signal to the first control module for activating the turning signal, the vehicular rearview mirror control module generates a signal for activating the rearview mirror to change its reflection angle at the same time.
Patent TW-550495-B (TW)
Title: Printing method for data format in extensible markup language
Inventor: YOU JIUN-HUA
IPC: G06F3/09
Filed: 2001-12-19
Granted: 2003-09-01
Abstract: The present invention is a method for processing data in XML format, which print the data in XML format according to a selected printing format, which includes the following steps: providing a plurality of format macro element definition files and the format macro elements corresponding to the plurality of format macro elements respectively, so as to use the format macro elements to modify the definition file for the selected printing format; and, executing an XSLT conversion processing procedure to combine the XML format data and the selected printing format definition file as an integrated file; converting the macro elements used by the integrated file as a sampling object syntax printing file; next, converting the sampling object syntax printing file into the printing file output with the output method.
Patent TW-I230191-B (TW)
Title: Circuit connecting adhesive with anisotropic conductivity connecting method of circuit board and circuit connecting construction by using the adhesive
Inventor: NOMURA SATOYUKI
IPC: C09J7/02
Filed: 2001-12-27
Granted: 2005-04-01
Abstract: The present invention relates to an adhesive for connecting an anisotropic electroconductive circuits. The adhesive is interposed between two neighboring boards having opposite circuit electrodes so as to electrically connect the corresponding electrodes along the pressing direction in pressing process. Said adhesive comprises an electrode conductive particle which has been subject to a surface treatment with at least a compound selected from the group consisting of a radical polymerization compound and a basic compound or a compound having at least an epoxy group. Also disclosed are a method for connecting the circuit boards using said adhesive and a circuit connection structure.
Patent TW-518664-B (TW)
Title: System and method to improve lithography process
Inventor: LIN JIN-SHIANG
IPC: H01L21/027
Filed: 2002-01-14
Granted: 2003-01-21
Abstract: A system and method to improve lithography process is disclosed, which combines optical lithography and electron beam lithography. Using the photoresist which can be exposed in optical lithography and electron beam lithography, and divide the integrated circuit pattern into the critical region for electron-beam exposure and non-critical region for exposure by projection aligner. When all of the integrated circuit patterns are exposed to the photoresist film, then proceed the developing work.
Patent TW-526577-B (TW)
Title: Monitoring method for size of exposure shot of electronic beam
Inventor: WANG WEN-CHUAN
IPC: H01L21/027
Filed: 2002-03-22
Granted: 2003-04-01
Abstract: A monitoring method for size of exposure shot of electronic beam is disclosed, and the present invention is suitable for a mask process. By measuring and recording the critical dimensions of non-exposure regions in several special patterns or the critical dimensions between non-exposure regions during e-beam lithography, the size of exposure shot of electronic beam generated by mask exposure equipment can be monitored. Therefore, the problem, which is the critical dimension of pattern on mask affected due to inappropriate control to the size of exposure shot of electronic beam, is resolved, and moreover, the accuracy of pattern on mask is enhanced.
Patent TW-593464-B (TW)
Title: Method and apparatus for sequential plasma treatment
Inventor: COLPO PASCAL
IPC: B01J19/08
Filed: 2002-04-01
Granted: 2004-06-21
Abstract: The apparatus for plasma treatment of a non-conductive hollow substrate (1), comprises a plurality of ionisation energy sources (7-10) disposed adjacent to each other all along the part of the substrate to be treated. The apparatus further comprises a processing means (11) for sequentially powering the plurality of ionisation energy sources from a radio frequency power source (6). Each ionisation energy source (7) is comprised of two parts (7a, 7b) sandwiching the substrate. The ionisation energy sources can be capacitively or inductively coupled plasma sources.
Patent TW-582053-B (TW)
Title: Process control apparatus and method
Inventor: MARUME YASUHIRO
IPC: H01L21/02
Filed: 2002-04-03
Granted: 2004-04-01
Abstract: The process control apparatus allows control of a plurality of diffusion apparatuses and recycling apparatuses in a semiconductor manufacturing process. The diffusion apparatuses can process product wafers and non-product wafers. The recycling apparatuses can process a prescribed number of wafers, which are processed by the diffusion apparatuses at once. A method of process control includes the steps of preparing recycling procedure data for each type of film formed on a wafer by diffusion processing, setting a recycle control number for controlling recycling processing based on the recycling procedure data, and outputting a recycling instruction to the recycling apparatus when the prescribed number of non-product wafers are accumulated and when an accept request is received from the recycling apparatus.
Patent TW-569042-B (TW)
Title: Filter for plasma display panel
Inventor: TERUI HIROTOSHI
IPC: G02B5/22
Filed: 2002-04-11
Granted: 2004-01-01
Abstract: A filter for a plasma display panel provided with an antireflection optical film having a color correction function, whereby when red light emitted from the plasma display panel is passed therethrough, the positional relation of the position before the passage and the position after the passage in the CIE xy chromaticity diagram of the red light, satisfies at least one of the following formulae (1) and (2) relating to changes in coordinates x,y, and the following formulae (3) and (4) relating to distances from standard values: Formulae relating to coordinates x,y: Deltax > 0.003, Deltay < -0.003, where Deltax is the change in coordinate x, and Deltay is the change in coordinate y, formulae relating to distances from standard values: DeltaD(rn) < -0.003, DeltaD(rc) < -0.003, where DeltaD(rn) is the change in the distance from a point (x,y)=(0.67,0.33), and DeltaD(rc) is the change in the distance from a point (x,y)=(0.64,0.33), and DeltaD(rn) and DeltaD(rc) respectively mean that when they take positive values, the distances become long, and when they take negative values, the distances become short.
Patent TW-544337-B (TW)
Title: Washing type painting booth which uses two step water flows
Inventor: TOIKAWA KOICHI
IPC: B05B15/04
Filed: 2002-04-11
Granted: 2003-08-01
Abstract: The object of the present invention is to improve the collecting efficiency of paint mist applied by showering, more water being used to circulate in a front water-flow board and a showering nozzle. But an inner wall extending from a sucking port of a lower part of the water-flow board to a showering portion is easily adhered by the paint so as to cause problems in cleaning. In addition, the noises caused by water flow and collision gives an unpleasant impression to worker, and brings adverse effect to the environment. This invention intends to solve these problems. The solution of the present invention is to provide a gutter which receives the showering liquid which was injected for processing the interior for collecting paint mist, where a portion of the showering liquid flows back to a tank, and the remainder overflows along a longitudinal direction of the gutter to make the flow downwards along the vertical aspect of a liquid flow-board. The inside of the liquid-flow board consists of a two-level top and bottom configuration. On a front of the top level is provided with a first level liquid-flow board. On a rear lower part is provided with a second level liquid-flow board. Between the first and second water-flow boards are formed with incoming air sucking passages for sucking air flow to flow through. The bottom of the second level liquid-flow board is constructed in such a manner to merge into a lower part of the liquid flow.
Patent TW-523577-B (TW)
Title: Variable refrigerant flow rate heat exchanging ventilator and method for controlling the same
Inventor: WENG GUO-LIANG
IPC: F24F11/02
Filed: 2002-04-12
Granted: 2003-03-11
Abstract: This invention relates to a variable refrigerant flow rate heat exchanging ventilator and method for controlling the same, comprising the steps of controlling the refrigerant flow rate in the heat exchanging ventilator such that the flow rate may vary along with the target environmental thermal energy rate of the freezing space by directly controlling the flow rate of the refrigerant supplied to and circulating in the heat exchanging pipes, so as to improve the operation efficiency of the freezing conditioning unit and the steadiness of the heat balance within the freezing conditioning zone thereby reducing the circulation rate of the refrigerant and energy consumption.
Patent TW-578131-B (TW)
Title: Light emitting device
Inventor: KOYAMA JUN
IPC: G09G3/32
Filed: 2001-10-05
Granted: 2004-03-01
Abstract: A light emitting device having a plurality of pixels each including a first TFT, a second TFT, a third TFT, a fourth TFT, an EL element, a source signal line, and a power supply line, wherein the third TFT and the fourth TFT are connected to each other at their gate electrodes, wherein the third TFT has a source region and a drain region one of which is connected to the source signal line and the other of which is connected to a drain region of the first TFT, wherein the fourth TFT has a source region and a drain region one of which is connected to the drain region of the first TFT and the other of which is connected to a gate electrode of the first TFT, wherein a source region of the first TFT is connected to the power supply line and the drain region thereof is connected to a source region of the second TFT, and wherein a drain region of the second TFT is connected to one of two electrodes of the EL element.
Patent TW-I245186-B (TW)
Title: Net-battle game method, computer-readable medium for recording program, and server for playing the game via a network
Inventor: YOSHIDA SHUICHIRO
IPC: A63F13/00
Filed: 2002-05-08
Granted: 2005-12-11
Abstract: On a server, face image is registered and updated according to the player's skill-level. Specifically, as personal information, not only registration of user's address, name, or pen name, but also face information is registered and changed according to the game result. Therefore, this permits a quick visual recognition of the previous game result. As the result, when performing a battle game between terminals, the player can be understood the competitor's skill-level.