baber/WOPTO huggingface dataset:
Patent JP-S6072954-A (JP)
Title: Long-period rustproof coating composition
Inventor: SHINOHARA TOSHIO
IPC: C09D157/00
Filed: 1983-09-30
Abstract: PURPOSE:The titled composition which can form a coating film having good adhesion even to a poor substrate such as insufficiently derusted surface and excellent long-period rust resistance, comprising an epoxy resin mixed with scaly lead alloy pigment and a petroleum resin, and a hardener. CONSTITUTION:100pts.wt. epoxy resin (e.g. a bisphenol epoxy resin with an epoxy equivalent of about 150-3,300), 50-900pts.wt. scaly lead alloy pigment (lead alloy powder, containing about 0.05-5wt% Cu, Ni, Sb, etc., made into a scaly form having a diameter of about 10-100mu and a thickness of about 0.5- 3mu, using stearic acid, etc.), and 5-100pts.wt. petroleum resin (e.g. polyterpene resin) are mixed to form the principal component material (A). A hardener (B) (e.g. an amine adduct resin) is mixed therein in a ratio of about 0.8-1.2 active hydrogen equivalent weight of (B) per epoxy equivalent of (A).
Patent JP-H089922-A (JP)
Title: Production of dietary fiber using microorganism of genus rhizopus
Inventor: KUBO TAKAMASA
IPC: A23L29/20
Filed: 1994-06-30
Abstract: PURPOSE:To safely and easily produce a new dietary fiber containing chitosan recently increasing the expectation owing to its physiological activity. CONSTITUTION:A dietary fiber raw material is produced by culturing and proliferating a microbial strain of the genus Rhizopus in a liquid medium, adding 1-5% sodium carbonate or sodium hydroxide to the obtained mycelium, heat- treating at 100-130 deg.C in wet state and collecting exclusively the fibrous cell wall of the Rhizopus mycelium in refined state.
Patent JP-2001008986-A (JP)
Title: Buddhist image statue for accompanying corpse
Inventor: ASADA SHIGEHIRO
IPC: B44C3/00
Filed: 1999-06-29
Abstract: PROBLEM TO BE SOLVED: To easily form a Buddhist image statue for accompanying a corpse at a low cost for comforting mental agony of a bereaved family at encoffining the corpse by forming the statue of a wax material and by covering a gold or silver surface finishing layer with a surface section of a statue main body. SOLUTION: In a Buddhist image statue 1 for accompanying a corpse, a surface finishing layer 3 covered with powdered gold is provided on a surface section of a Buddhist image statue main body 2 which comprises a Kannon statue made of a wax material and is about 25 cm tall. A core member 4 for a candle made of cotton yarn extending from a head section 2b to a chest section 2c is provided vertically buried through a neck section 2a of the Buddhist image statue main body 2 to protect from folding the head section 2b.  This Buddhist image statue 1 is formed as the same way as a manufacture of candles in such a way that the wax material is poured into a metal mold in a melting condition, the core member 4 is inserted therein to cool and hardened the wax material to obtain the Buddhist image statue main body 2, ground coating is treated, and a paint including the powdered gold (generally powdered bronze of gold color) is coated to form the surface finishing layer.
Patent JP-S6073866-A (JP)
Title: Printer apparatus
Inventor: HACHISUGA TAKAAKI
IPC: B41J2/355
Filed: 1983-09-30
Abstract: PURPOSE:To make it possible to perform the adequate temp. control of a thermal head subjected to split driving and to enable the performance of printing with good efficiency, by operating the thermal head corresponding to the output signal of a temp. detector provided in correspondence with the blocks at both terminals. CONSTITUTION:In order to know the heat accumulation of a thermal head 5 caused by continuous printing, a pair of substrate temp. detectors 106, 106 respectively correspond to the blocks at both terminals of the thermal head 5. By this arrangement, the difference of heat accumulation at both left and right terminals of the thermal head 5 can be detected even when a printing pattern prints a sentence apt to be concentrated to the left side of paper and, therefor, stable temp. control can be performed by controlling the current supply time of power supplied to the heat generating resistors of the blocks at both left and right terminals. In addition, further good printing can be performed by performing this control by using the temp. information of a thermal transfer ribbon obtained by a printing medium temp. detector 192.
Patent JP-H0931565-A (JP)
Title: Method for melting nickel-titanium alloy and its melting apparatus
Inventor: OTSUGA DENJIRO
IPC: C22C1/02
Filed: 1995-07-19
Abstract: PROBLEM TO BE SOLVED: To perform a primary melting of Ni-Ti alloy by a vacuum arc remelting method(VAR). SOLUTION: A consumable electrode 4 is produced by forming a briquette and welding the briquette with only Ti raw material or a raw material containing Ti as essential material and low Ni content (<=50wt.%) and VAR is execute to this electrode. At the same time of this melting, particles 5 of Ni raw material are continuously supplied from the side wall 21 of a VAR furnace and dropped into molten metal pool 7 and made to molten metal having a desired alloy composition by integrating into the molten metal, and the molten metal is continuously cooled and solidified with a water cooling mold 1 and cast into an ingot 8.
Patent JP-S6426748-A (JP)
Title: Thick and thin processed yarn and its production
Inventor: OKITA JUNJI
IPC: D02G3/34
Filed: 1987-07-21
Abstract: PURPOSE: To produce a thick and thin textured yarn for clothes comprising polyester incompletely drawn fibers having thick parts and thin parts in the longitudinal direction, having a difference in light and shade of dyeing and excellent in bulkiness and quality. CONSTITUTION: This thick and thin textured yarn comprises polyester incompletely drawn fibers prepared by drawing an undrawn polyester yarn having 20 to 35×10<-3> birefringence ratio at 45-55% of the maximal draw ratio A=[(breaking elongation + 100)/100]×1.05 of the undrawn yarn while bringing the undrawn yarn into contact with a heating unit at 50-150 deg.C and then subjecting the drawn yarn to simultaneous draw false twisting and having 3-5% U%, 10-22C index (a value obtained by dividing the number of points crossing the center line C counted for 4 m yarn length in a chart in measurement with an evenness tester by 4) and 40-60 S index  a value obtained by determining an area S of a part indicating deep color parts for 25 cm in a U% chart and further obtaining the ratio [S/(L×1)] in percentage).  The yarn has deep colored parts and light-colored parts in a ratio of the same extent and providing a moire finish with a moderately calm difference of light and shade as a thick and thin yarn.
Patent JP-H0718703-A (JP)
Title: Operating lever for construction machine
Inventor: NISHIMURA MASAO
IPC: E02F9/20
Filed: 1993-06-30
Abstract: PURPOSE:To make a damper connected to an operating lever generate optimum damping force in accordance with changes in the temperature or the like of working fluid in a cylinder. CONSTITUTION:A damper 13 for a travel lever 11 is equipped with a piston assembly that makes slide movement inside a cylinder 16, interlocking with operation of a damper lever 14. A plurality of communicating holes bored in the direction of axis are provided to a plate and a holder that are provided to the piston assembly. As the holder is moved in reciprocation at a specified angle, the area of opening in a restrictor changes with overlapping parts in the communicating holes varied. A sensor 29 for detecting the temperature of working fluid is provided in the cylinder while a sensor 30 for detecting the operation angle of the travel lever 11 is mounted to a pivot 12. Signals from both of the sensors are taken into a control part, and an optimum area for the opening in the restrictor is calculated and the cylinder is turned thereby, making the holder turn relatively against the plate. Thereby, the degree of overlapping in the communicating holes can be varied.
Patent JP-H1026934-A (JP)
Title: Electronic tag and its manufacturing method
Inventor: FURUHASHI JUN
IPC: B42D15/10
Filed: 1996-07-12
Abstract: PROBLEM TO BE SOLVED: To easily obtain a sheathing resin which has high mechanical strength and excellent environmental resistance in an electronic tag in which internal parts such as IC chips and an antenna are necessary to be protected by the sheathing resin. SOLUTION: An internal parts holding parts 33 having a recessed part 33a for housing the internal parts and a projection 35 for positioning in a metallic mold is prepared, the internal parts are housed in the recessed part 33a and, then, the resin is infected in the recessed part and is solidified to form a protective fixing layer 35 for protecting and fixing the internal parts and, further, an external ornamental part is molded by the metallic mold so as to envelop the internal parts holding parts. Since both the protective fixing layer and the external ornamental part protect the internal parts, the protective fixing layer prevent the internal parts from being in contact with moisture even in the case of moisture immersion to inside from minute cracks, etc., generated in the external ornamental part.  Further, since the internal parts housed in the recessed part in the internal parts holding parts are fixed by the protective fixing layer, the movement of the internal parts by the pressure of the resin at the time of molding the external ornamental part can be prevented to improve productivity.
Patent JP-S6341791-A (JP)
Title: Skived-finned heat exchanger
Inventor: HARAGA HISATO
IPC: F28F3/04
Filed: 1986-08-06
Abstract: PURPOSE:To achieve a high heat transfer performance by dispersedly arranging fins in such a manner that the length of a fin in the gas flow direction is determined by the specified function of its thickness and the space between the fins in the gas flow direction is determined by the specified function of the fin length. CONSTITUTION:The length l of a fin 1 is made 1-5 times of the thickness of the fin 1. An extrusion-molded flat tube 4 is skived in such a way that grooves 5 are cut in accordance with the width of the fin 1, and the fin 1 is cut and raised by a cutter 6. For the skiving operation of the fins 1, the first row is skived with a space in between four times of the fin length l in the gas flow fdirection, and then the following row is skived by moving the tube 4 or cutter 6 by a suitable distance normal to the lengthwise direction of the tube 4. Such operations are repeated along the length of the tube 4. As a result, the heat transfer performance can be substantially improved, and the device can be made compact and light weight.
Patent JP-S5974893-A (JP)
Inventor: MUTOU SHIYOUTAROU
IPC: B66C23/32
Filed: 1982-10-19
Abstract: (57)【要約】本公報は電子出願前の出願データであるた め要約のデータは記録されません。
Patent JP-2001015478-A (JP)
Title: Etching method and device for semiconductor substrate
Inventor: KAMETANI EIJI
IPC: H01L21/306
Filed: 1999-06-29
Abstract: PROBLEM TO BE SOLVED: To provide the etching method and device of a semiconductor substrate for surely eliminating dicing damage, when a cutting groove is formed to split the semiconductor substrate. SOLUTION: After a cutting groove 2 is formed on a dicing line on a semiconductor substrate 1 where a plurality of semiconductor elements are formed, the etching solution of a semiconductor is brought into contact with the inner wall of the cutting groove 2 under loaded conditions, and a defective region being formed on the inner wall of the cutting groove 2 or near it is eliminated by the etching method of the semiconductor substrate.  Also, the etching device of the semiconductor substrate consists of a retention means of the semiconductor substrate 1 for retaining the semiconductor substrate 1, in which the cutting groove 2 is formed in the dicing line is retained at a prescribed position in etching solution or air, and a loading means for the etching solution for bringing the etching solution of the semiconductor into contact with the inner wall of the cutting groove 2 under loading conditions.
Patent JP-2000023448-A (JP)
Title: Stepping motor for indicator instrument
Inventor: NUMAYA HIROYASU
IPC: G01R5/16
Filed: 1998-06-30
Abstract: PROBLEM TO BE SOLVED: To provide a stepping motor for an indicator instrument capable of preventing the indicating position of a pointer from dislocating from a given position corresponding to an input signal, even if a sharp indication change occurs or if impact is applied from the outside. SOLUTION: This stepping motor for an indicator instrument is made up of bobbins 6 wound with coils 5, a yoke body 11 having comb-tooth-like yoke 10 stacked in layers, the rotating shaft 7, whose top end is protruding from the yoke body 11, of a magnetic rotor 9, and a pointer mountable to the rotating shaft 7. Damper oil DP is provided in such a way as to make it possible to contact the rotating shaft 7 or magnetic rotor 9, and a brake means 18 which changes the damping force of the damper oil DP depending on the rotational direction of the magnet rotor 9 is provided on the contact part of the damper oil DP with the rotating shaft 7 or magnetic rotor 9.
Patent JP-S6075122-A (JP)
Title: Level shift circuit
Inventor: TSUN KENZOU
IPC: H03K5/003
Filed: 1983-10-01
Abstract: PURPOSE:To adjust optionally a level shift amount by providing a level setting circuit, a differential amplifier constituted as a full feedback amplifier and a shift rate setting circuit in combination. CONSTITUTION:A differential output current of the differential amplifier 30 is fed to a base of transistors (TRs) 38, 42 so that a voltage equal to a forward voltage drop VF of a diode 61 of the level setting circuit 56 is generated across a resistor 50, allowing the outputs of the differential amplifier 30 to balance. Since the emitter area of TRs 64, 66 of the shift factor setting circuit 62 is set to be N times that of TRs 42, 40 and a current N times the current flowing to the resistor 50 flows to the emitter, the level shift amount VL generated at output terminals 70A, 70B is expressed as VL=VF(Rb/Ra)N, where Ra, Rb are values of resistors 58, 60, and the level shift amount is set optionally by using the forward voltage as a reference.
Patent JP-S5886996-A (JP)
Title: Welding material of high strength and high toughness
Inventor: OOMAE TAKASHI
IPC: B23K35/30
Filed: 1981-11-18
Abstract: PURPOSE:To improve the toughness and strength of weld zones and to make products smaller in size and higher in performance by limiting the components of the welding material to be used in a low temp. region. CONSTITUTION:The welding material which satisfies high toughness and high strength simultaneously in a low temp. region of about -90 deg.C is consisted of the components contg., by weight, 0.05-0.15% C, 0.25-0.7% Si, 0.60-1.80% Mn, 4.5-11.0% Ni, 0.20-1.20% Cr, 0.020-0.60% Mo, and 0.03-0.12% Ti, and contg. >=0.40% and <=0.30X(wt% Ni)<2> content of Cr+Mo. The reasons for limiting the compsn. lie in the need of Ni for assuring the low temp. toughness. The Cr and Mo improve strength after hardening and tempering. The high toughness and the high strength are satisfied simultaneously by specifying the content of Cr+Mo. The Ti is necessary to make weld metal clean.
Patent JP-S6076179-A (JP)
Title: Thermoelectric converter
Inventor: TANAKA TOSHIAKI
IPC: H01L35/30
Filed: 1983-09-30
Abstract: PURPOSE:To enable effective heat absorption and radiation while obtaining electric insulation as well as to facilitate installation by arranging a multiplicity of semiconductor elements for thermoelectric conversion between a pair of heat absorbing and heat radiating plates, each of the elements being adhered at one end to each of the electrode foils facing to each other. CONSTITUTION:When a DC power supply is connected, a metallic plate 1 is cooled and a metallic plate 2 is heated. On the other hand, when the power supply is connected reversely, the metallic plate 1 is heated while the metallic plate 2 is cooled. Further, when a load instead of the power supply 31 is connected between terminals 27 and 28 so as to heat or cool the metallic plate 1 and to cool or heat the metallic plate 2, a predetermined power can be supplied to the load. Accordingly, in the operation of this thermoelectric converter as mentioned above, the metallic plate 1 and 2 holding semiconductor elements 25 and 26 can function more efficiently as heat absorbing or heat radiating plates than conventional holding plates of ceramic or the like, whereby heating/cooling and electricity generation can be performed efficiently.
Patent JP-H1128746-A (JP)
Title: Clamping device
Inventor: ICHIHARA KOICHI
IPC: B22D17/26
Filed: 1997-07-09
Abstract: PROBLEM TO BE SOLVED: To enable change and control of a clamping force in the course of molding and to enable stable generation of a large clamping force. SOLUTION: This clamping device has a fixed platen 11, a fixed mold 15, a rear platen 13, a movable platen 12, a movable mold 16, an electromagnet- suction plate unit of which one member of an electromagnet 18 and a suction plate 22 is fixed to the back of the rear platen 13 and the other member is provided movably, a pressure piston 17 which is supported movably in the axial direction in relation to the rear platen 13 by a bearing 81 and of which one end is fixed to the movable platen 12 and the other end is connected to the other member mentioned above through the intermediary of a link mechanism 61, and a motor connected to the link mechanism 61. Since the pressure piston 17 does not tilt to the rear platen 13, the movable platen 12 cab be supported in a stable state.
Patent JP-H0825404-A (JP)
Title: Method for fixing molding resin to synthetic resin film
Inventor: INAGAKI JIRO
IPC: B29C45/14
Filed: 1994-07-12
Abstract: PURPOSE:To provide a method for fixing a molding resin to a synthetic resin film in which the film can be easily and surely fixed directly and rigidly to the resin. CONSTITUTION:A synthetic resin film 10 made of thermoplastic material and a molding resin 15 made of thermoplastic material are prepared. The steps of extending the predetermined surface of the film 1 and so bringing molding resin of a high temperature melted on the surface of the midway of extending the film 10 as to directly push the resin 15 in a high-pressure state are simultaneously conducted. Then, the contact surfaces of the film 10 and the resin 15 are held until the resin 15 is cooled to its solidifying temperature. Thus, the contact surfaces of the film 10 and the resin 15 are directly rigidly fusion- bonded.
Patent JP-S6164942-A (JP)
Inventor: TAKAGI MASATOSHI
IPC: E04B7/14
Filed: 1984-09-04
Abstract: (57)【要約】本公報は電子出願前の出願データであるた め要約のデータは記録されません。
Patent JP-H057731-A (JP)
Title: Denitration device of fluidized bed boiler
Inventor: NISHIYAMA AKIO
IPC: F23J15/00
Filed: 1991-06-28
Abstract: PURPOSE:To enhance denitration efficiency due to NH3 and to reduce the consumption amount of NH3. CONSTITUTION:An NH3 injection pipe 24 is arranged to exhaust gas passages 9, 11 on an upstream side so that the distances from the NH3 injection pipe 24 to dust collectors 10, 12 become 0.5sec or less as an exhaust gas stagnation time. That is, since NH3 is not decomposed when the temp. of exhaust gas is 700-900 deg.C and the exhaust gas stagnation time is 0.5sec or less, the NB, injection pipe 24 is arranged at the position where the stagnation time is 0.5sec or less.
Patent JP-S6161434-A (JP)
Title: Manufacture of element region for semiconductor integrated circuit
Inventor: KOBAYASHI HIROMI
IPC: H01L21/761
Filed: 1984-09-03
Abstract: PURPOSE:To reduce the lateral expansion of an insulating diffusion layer by a method wherein a first epitaxial layer of one conductivity type is grown on a substrate, diffusion is accomplished for the formation of an insulating- isolating region of the opposite conductivity type, a second epitaxial layer of the first conductivity type is grown, and then a heat treatment is effected. CONSTITUTION:A first N-type epitaxial layer 18 is grown, with its thickness half that of a prescribed epitaxial layer, on a P-type substrate 11. A process follows wherein P-type diffusion layers 13, 14 are formed by diffusing a P-type impurity. Further, a second N-type epitaxial layer 19 is grown adding to the first N-type eiptaxial layer 18, the two layers 18, 19 combined to be as thick as the prescribed epitaxial layer. A heat treatment follows for the formation of an isolated element region 15 containing a P-N junction. The lateral expansion of the isolating diffused layers 16, 17 may be less than that expected under the conventional method.
Patent JP-2001009495-A (JP)
Title: Treatment of organic wastewater
Inventor: OTAKE HISAO
IPC: C02F11/18
Filed: 1999-06-29
Abstract: PROBLEM TO BE SOLVED: To separate and recover a phosphorus component in a short time by separating wastewater after aeration-treatment into primary treatment water and sludge, concentrating the obtained sludge and heating the concentrated sludge under specified conditions to release phosphorus and separate into secondary treatment water containing the released phosphorus component and the secondary sludge free from phosphorus component. SOLUTION: Raw wastewater A is fed from an anaerobic treatment tank 7 to an aeration treatment tank 1 to subject to aerobic treatment by an aeration means 12. The aeration-treated liquid is separated into phosphorus component-concentrated sludge and primary treatment water (a) by a solid-liquid separation means 2. The obtained sludge is concentrated by a concentration means 3 to obtain primary sludge (x) and phosphorus component-free separated water, which is discharged together with the primary treatment water (a). The obtained primary sludge (x) is heated by passing through a heat exchanger 11 and then heated at 60-90 deg.C for 10-120 minutes using a heating means 10 in a phosphorus releasing tank 4 to release the phosphorus component. The heated sludge is separated into treated water secondary treatment water) (b) rich in the phosphorus component and secondary sludge (z) by a solid-liquid separation means 5.
Patent JP-H1098028-A (JP)
Title: Slit nozzle injecting gas for plasma processing reactor
Inventor: MAYDAN DAN
IPC: H01L21/302
Filed: 1997-07-09
Abstract: PROBLEM TO BE SOLVED: To provide a compact gas injection system for a plasma gas reactor with small surface area of hermetic sealing. SOLUTION: A gas injection system 100 has a vacuum chamber having a side wall, a pedestal for holding a semiconductor wafer under processing, and a RF voltage applicator applying RF voltage to a chamber, and injects gas into a plasma reactor. This gas injection system has at least one gas feeder containing the gas, gas diffuser with at least one slot aperture facing the inside of it, and one or more gas feed lines connecting one or more gas feeders to the gas diffuser. A desirable embodiment of this emission gas diffuser has a plurality of gas diffusion nozzles installed on the side wall of the chamber with their respective slot apertures facing the inside of the chamber, gas feed line are used to connect the respective gas diffusion nozzles to the discrete gas feeders.