baber/WOPTO huggingface dataset:
Patent TW-522689-B (TW)
Title: High speed buffer management structure and method for share memory using plural linked lists
Inventor: YUAN GUO-HUA
IPC: H04L12/54
Filed: 2001-09-07
Granted: 2003-03-01
Abstract: The present invention provides a high speed buffer management structure and method for share memory using plural linked lists, which uses unicast and multicast packet buffer memory linked list to store the linked lists for unicast and multicast packets. The unicast packet buffer memory linked lists are one-to-one mapped to the packet buffer memory. When the unicast packet is entered, the packet is configured with an entry of unicast packet buffer memory linked list, and the entry flag is set as the flag for unicast. When the multicast packet is entered, the packet is configured with an entry of unicast packet buffer memory linked list, and also with an entry of multicast packet buffer memory linked list, and the flag for the entry of the unicast packet buffer memory linked list is set as the flag of multicast, and the pointer is set to the address of the entry of the multicast packet buffer memory linked list.
Patent TW-535232-B (TW)
Title: Enhanced sacrificial layer etching technique for microstructure release
Inventor: DESPONT MICHEL
IPC: B81C1/00
Filed: 2001-09-14
Granted: 2003-06-01
Abstract: A method for at least partially releasing microstructures from a substrate is provided. The method comprises the steps of: (a) providing a substrate (2); (b) depositing onto said substrate (2) a first layer (4) and a second layer (6), the first layer (4) and the second layer (6) each comprising an electrically conducting material and each having a different oxido-reduction potential; (c) electrically connecting the first layer (4) and the second layer (6); (d) forming a microstructure (8) on the first (4) and second (6) layers deposited in step (b) to produce an intermediate structure (10); and (e) electrochemically etching said second layer (6) by immersing the intermediate structure (10) formed in step (d) in an electrolyte (12).
Patent TW-548889-B (TW)
Title: Rapid battery charging method and apparatus
Inventor: PETROVIC VLADIMIR
IPC: H02J7/00
Filed: 2001-09-27
Granted: 2003-08-21
Abstract: Methods and apparatus for battery charging provide a charging cycle in which charging periods alternate with discharging periods. A lead-acid battery is charged during charging periods having durations of 60 to 180 seconds at an initial rate between 0.65xC and 0.70xC, where C is the battery capacity in Ampere-hours. A lead-acid battery is discharged during discharging periods having durations of 10 to 20 seconds at a rate between 0.05xC and 0.07xC. There is a rest period after each charging and discharging period. The charge-rest-discharge-rest pattern is repeated for specified durations of time at sequentially lower charging currents, then repeated at a specified constant charging voltage until a specified charging current is reached or until a specific duration of time is reached. Nickel-metal hydride and nickel-cadmium batteries are charged during charging periods having durations of 9 to 11 seconds at a rate between 1.9xC and 2.1xC. Nickel-metal hydride and nickel-cadmium batteries are discharged during discharging periods having durations of 0.90 to 1.1 seconds at a rate between 0.19xC and 0.21xC. The charge-rest-discharge-rest pattern is repeated until a specified battery voltage is reached or until a specific duration of time is reached. Charge times of about two hours can be achieved for lead acid and about 1/2 hour for NiCd or NiMH batteries.
Patent TW-495849-B (TW)
Title: Controlled method of silicon-rich oxide deposition using HDP-CVD
Inventor: KAPOOR BIKRAM
IPC: C23C16/507
Filed: 2001-10-12
Granted: 2002-07-21
Abstract: A method and system for forming a layer on a substrate in a process chamber are provided. Deposition gases are provided to the process chamber and permitted to mix in the desired relative concentrations prior to the deposition step, resulting in improved composition uniformity of the layer. This may be accomplished by generating a heating plasma from a first gaseous mixture. The plasma is then terminated and a second gaseous mixture is provided to the process chamber such that the second gaseous mixture is substantially uniformly mixed. A second plasma is then generated from the second gaseous mixture to deposit the layer on the substrate.
Patent TW-I242183-B (TW)
Title: Optical disc changer
Inventor: KIM TAE-MYUN
IPC: G11B7/085
Filed: 2001-11-27
Granted: 2005-10-21
Abstract: An optical disc changer includes a main body, a tray installed in the main body to be capable of sliding, a roulette rotatably installed at the tray and where a plurality of optical discs are accommodated, an optical pickup device for selectively reproducing one of the optical discs accommodated on the roulette, a drive gear portion installed at the main body, rotated by being connected to a drive unit, and selectively engaged with a rack gear portion formed on the bottom surface of the tray, and a tray transfer portion installed adjacent to the drive gear portion and having a tray gear portion selectively engaged with the rack gear portion and the drive gear portion.
Patent TW-583322-B (TW)
Title: Coating with low sticking and low friction coefficient on a surface of workpiece
Inventor: JU JI-WEN
IPC: C23C14/00
Filed: 2001-11-28
Granted: 2004-04-11
Abstract: The present invention relates to a coating having low sticking and low friction coefficient on a surface of a workpiece, comprising a first metal layer and a second metal layer. The first metal layer is formed on the surface of the workpiece, and the first metal layer is pure metal, like chromium (Cr) and molybdenum (Mo), etc. The second metal layer is formed above the first metal layer, and the second metal layer is alloy of chromium nitride with silver (Ag), lead (Pb) or copper (Cu), etc. The first metal layer of chromium (Cr) or molybdenum (Mo) has high affinity with the workpiece, and is adapted to be the bonding layer between the second metal layer and the workpiece so as to enhance the adhesion of the coating. The second metal layer can provide the workpiece with the low sticking and low friction coefficient characteristics. Therefore, the coating according the present invention can improve the problems of sticking and friction of the workpiece or mold to elongate the life of the workpiece or mold and improve manufacture efficiency.
Patent TW-546745-B (TW)
Title: Method for mounting semiconductor component and semiconductor component
Inventor: WOLF KUNO
IPC: H01L23/433
Filed: 2001-12-18
Granted: 2003-08-11
Abstract: The invention relates to a method for mounting a semiconductor component (10) and to a semiconductor component (10). The semiconductor component (10) comprises a housing consisting of a base (8), a connecting piece (30) and a potting compound. According to the invention, the semiconductor component (10) is at least partially surrounded by the potting compound using a potting method and a lead frame (50) is provided therein (50), in which the lead frame (50) is disposed to form a seal with a potting mould (41, 42).
Patent TW-516098-B (TW)
Title: Light source generation apparatus and exposure method of contact hole
Inventor: WU YUAN-HSUN
IPC: G03F7/20
Filed: 2001-12-20
Granted: 2003-01-01
Abstract: An exposure method of contact hole includes the following steps: providing an exposure machine having a light source and a camera lens, in which the camera lens has a central light-passing hole and at least one auxiliary light-passing hole; providing a mask having plural contact hole patterns; using the camera lens to make light source pass through the mask for performing the exposure; and providing a light source generation apparatus, which includes a light source and a camera lens having a central light-passing hole and at least one auxiliary light-passing hole for passing the light source to perform the exposure.
Patent TW-508691-B (TW)
Title: Cleaning method after etching metal layer
Inventor: CHEN YI-NAN
IPC: C23G1/12
Filed: 2001-12-21
Granted: 2002-11-01
Abstract: The present invention discloses a cleaning method after etching metal layer. Firstly, a metal pattern layer and a corresponding photoresist pattern layer on the surface of the substrate are formed sequentially, and an ashing process is performed to remove the photoresist pattern layer. Then, an Ozone ashing process is performed to release the charge generated on the surface of metal pattern layer by the etching process. The period of ozone ashing process is between 30 to 180 seconds and the temperature is between 200 DEG C to 300 DEG C. Finally, a mixed solution formed of sulfuric acid with 0.07 to 0.4M mole concentration and hydrogen peroxide with 0.8 to 1.5M mole concentration to clean the surface of metal pattern layer at a temperature between 25 DEG C to 50 DEG C, so that the polymer residual can be effectively removed. The reliability of device can thereby be ensured.
Patent TW-540247-B (TW)
Title: Method for verifying malfunction of blind equalizer
Inventor: LAI JYH-TING
IPC: H04N7/24
Filed: 2001-12-31
Granted: 2003-07-01
Abstract: A method for verifying malfunction of a blind equalizer by adjusting a plurality of internal weightings to equalize an input signal comprises: at a primary signal time point in a constant period, using a signal generating loop to generate a primary location signal; multiplying the primary location signal with a set of continuously decreasing signals to obtain a primary signal; providing an interference location signal from an ISI generating loop, in which the interference location signal is generated in a plurality of time points asynchronous with respect to the primary signal time point in the constant period; multiplying the interference location signal with a set of continuous signals to obtain an interference signal; adding the primary signal with the interference signal to generate an input signal; sending the input signal into a blind equalizer; removing the corresponding weighting, which will enter an overflow state, of the interference signal in the blind equalizer, in which a selection of the primary signal time point generated by the primary location signal and the time point generated by the interference location signal is used to specify the weighting of overflow in the blind equalizer.
Patent TW-525308-B (TW)
Title: Organic light emitting diodes on plastic substrates
Inventor: BERNIUS MARK T
IPC: H01L51/52
Filed: 2002-02-04
Granted: 2003-03-21
Abstract: The invention is an optoelectronic device comprising a transparent polymeric substrate bearing on one surface thereof a transparent polymerized organosilicon protective layer, a first electrode over the polymerized protective layer, an optoelectrically active film comprising an electroactive material, said film having a first side, which is in contact with the transparent electrode and a second side in contact with a second electrode, wherein said first electrode is characterized in that it allows light to pass to or from the optoelectrically active film. Preferably, the device further comprises additional protective packaging over the second electrode.
Patent TW-515865-B (TW)
Title: Engine lubrication system
Inventor: SHINODA AKIHISA
IPC: F01M1/08
Filed: 2002-02-19
Granted: 2003-01-01
Abstract: An engine lubrication system has an arrangement in which the base of a crankcase is used to form an oil reservoir, and a part of an oil slinger that is driven by a crankshaft via a transmission system is immersed in the oil within the oil reservoir. An oil pump that is driven by the transmission system is immersed in the oil within the oil reservoir, and a discharge port of the oil pump communicates with a lubricating-oil passage within the crankshaft. It is thereby possible to provide an engine lubrication system based on a splash-type lubrication system while at the same time using a forced-type lubrication system, thus reducing the capacity of the oil pump and simplifying the drive system, and effectively suppressing an increase in the overall cost.
Patent TW-569517-B (TW)
Title: A device for externally rotary drive of offset motor
Inventor: YANG TAI-HER
IPC: H02P3/06
Filed: 2002-03-22
Granted: 2004-01-01
Abstract: A device for externally rotary drive of offset motor, comprising: external rotary assembly, offset means, drive motor and transmission means; the external rotary assembly is complete with a hub centrally fitted with a shaft to make it rotatable, which carries in turn an offset means not in line with it, the said offset means being furnished with one or more drive motor, also out of alignment with said shaft, on the output shaft end of the drive motor is mounted a primary gear or friction wheel which gives moment to transmission, in said hub are mounted follower internal ringed gear or internal ringed friction wheel which are made in contact with afore-mentioned primary gear or friction wheel to thereby achieve actuation of the internal rotary assembly outside and by the motor thus driven to transmission, the dislocation design serves also to adjust the axial clearance between the primary gear or friction wheel and the follower internal ringed gear or internal ringed friction wheel, and that redounding to the setting of speed ratio and facilitating the placement of more than one motor as justified on a case by case basis, in view of an increase in torque of transmission and transmission efficiency as well.
Patent TW-557595-B (TW)
Title: A power storage device
Inventor: HOSOKAWA TAKEHIRO
IPC: H01M50/553
Filed: 2002-08-01
Granted: 2003-10-11
Abstract: A power storage device (nonaqueous electrolyte battery) 1 is constructed by a electric generating section 40 consisting of an anode 10, a cathod 20 and the electrolyte (nonaqueous electrolyte battery) 30, and inclusion bag which includes the electric generating section, an anode lead 21 and a cathod lead. The inclusion bag 50 has the first sheet 51 and the second sheet 52 which are made of the compound wrapping materials and face each other, and a paired synthetic resin spacers 60 which are used to ensure a space to accommodate the electric generating section. Each spacer is positioned between the face F51 of the first sheet facing the second sheet and the face F52 of the second sheet which faces the face F51, and furthermore, is positioned respectively at the opposite edges of the face 51.
Patent TW-564537-B (TW)
Title: A method, apparatus, and system for enabling programming
Inventor: HUDGENS STEPHEN J
IPC: H01L23/525
Filed: 2002-08-20
Granted: 2003-12-01
Abstract: In an aspect, an apparatus is provided that sets and reprograms the state of programmable devices. In an aspect, a method is provided such that an opening is formed through a dielectric exposing a contact formed on a substrate. The resistivity of the contact is modified by at least one of implanting ions into the contact, depositing a material on the contact, and treating the contact with plasma. In an aspect, a spacer is formed within the opening and programmable material is formed within the opening and on the modified contact. A conductor is formed on the programmable material and the contact transmits to a signal line.
Patent TW-I284061-B (TW)
Title: A process for making metal oxide-coated microporous materials
Inventor: WOODHEAD JAMES L
IPC: B01D53/34
Filed: 2002-09-13
Granted: 2007-07-21
Abstract: A process that provides a catalytic rare earth oxide-coated microporous free-flowing bulk particulate wherein the amount of metal oxide coated thereon is high, without jeopardizing the effectiveness of the material. The rare earth metal oxide coated on the outer surface may be in the range of 20 to 70% by weight based on the total equivalent rare earth metal oxide and microporous particulate material content. In particular, a zeolite free-flowing bulk particulate having high loadings of rare earth metal oxide tends to be quite stable. For instance, when the rare earth metal oxide-coated zeolite free-flowing bulk particulate has been heat treated at temperature less than about 200 DEG C and then slurried in water, typically, less than 30% by weight of the rare earth metal oxide (based on the total equivalent rare earth metal oxide content) is found to leach into water. This material has been found to have minimal leachability when heat treated above about 400 DEG C. The process for making a catalytic rare earth metal oxide-coated microporous particulate material having greater than 20% by weight of said rare earth metal oxide coated on outer surfaces of said microporous particulate material, based on the total equivalent rare earth metal oxide and microporous particulate material content, the process comprises the steps of: (i) combining an amount of a colloidal dispersion of rare earth metal oxide hydrate with a compatible microporous particulate to form a slurry, the amount of the colloidal dispersion being sufficient to provide, when heat treated as per step (ii), greater than 20% by weight of the rare earth metal oxide, the microporous particulate material having an average pore size of less than 20 Å and the colloidal dispersion having a particle size of at least 20 Å, to position thereby, the colloidal dispersion on the outer surfaces of the microporous particulate material; and (ii) heat treating the slurry at a temperature below about 200 DEG C, above about 400 DEG C, or sequential combinations thereof wherein the slurry is heat treated, firstly, at temperatures below about 200 DEG C and secondly, above about 400 DEG C, to fix the resultant rare earth metal oxide on the outer surfaces of the microporous particulate material, to provide a free flowing bulk particulate.
Patent TW-I241639-B (TW)
Title: Plating method and apparatus for controlling deposition on predetermined portions of a workpiece
Inventor: BASOL BULENT M
IPC: C25D5/02
Filed: 2002-09-19
Granted: 2005-10-11
Abstract: The present invention relates to methods and apparatus for plating a conductive material on a workpiece surface in a highly desirable manner. Using a workpiece-surface-influencing device, such as a mask or sweeper, that preferentially contacts the top surface of the workpiece, relative movement between the workpiece and the workpiece-surface-influencing device is established so that an additive in the electrolyte solution disposed on the workpiece and which is adsorbed onto the top surface is removed or otherwise its amount or concentration changed with respect to the additive on the cavity surface of the workpiece. Plating of the conductive material can place prior to, during and after usage of the workpiece-surface-influencing device, particularly after the workpiece surface influencing device no longer contacts any portion of the top surface of the workpiece, to achieve desirable semiconductor structures.
Patent TW-591246-B (TW)
Title: Optical film with high contrast
Inventor: GIBBONS GORDON WILLIAM
IPC: G09F13/04
Filed: 2002-10-16
Granted: 2004-06-11
Abstract: Optical systems and methods are disclosed that display information. Optical systems and methods include a light source and an optical film, where the optical film has low reflectance, controlled viewing angle, low glare and/or relatively high optical transmittance for diffuse incident light. Instrument cluster is disclosed that includes such an optical film. The optical film may include display graphics. The optical film may have higher optical transmittance for diffuse incident light than for collimated incident light.
Patent TW-569498-B (TW)
Title: Modular jack assembly with signal conditioning
Inventor: WOJTACKI THOMAS
IPC: H01R13/719
Filed: 2002-10-18
Granted: 2004-01-01
Abstract: An electrical connector assembly comprises a housing (26) including a beam platform (170) having a front mating section (176), a rear platform section (186), and a pair of opposite side edges (192, 194). A plurality of electrical contacts (28) are carried by the housing, the contacts being arranged in an upper row and a lower row. The contacts in each of the rows have mating contact portions (271b-278b) exposed along the front mating section, and circuit board connecting sections (271d-278d). The circuit board connecting sections of the upper row of contacts extend beyond one of the side edges, and the circuit board connecting sections of the lower row of contacts extend beyond the other of the side edges. Signal conditioning devices (16) including circuit cards (18) having signal conditioning components (22, 24) thereon are mounted to the side edges and are electrically connected to the circuit board connecting sections of the contacts.
Patent TW-I254453-B (TW)
Title: Trench DMOS device with improved drain contact
Inventor: HSHIEH FWU-IUAN
IPC: H01L29/417
Filed: 2002-10-30
Granted: 2006-05-01
Abstract: A trench DMOS transistor device that comprises: (a) a substrate of a first conductivity type; (b) an epitaxial layer of first conductivity type over the substrate, wherein the epitaxial layer has a lower majority carrier concentration than the substrate; (c) a trench extending into the epitaxial layer from an upper surface of the epitaxial layer; (d) an insulating layer lining at least a portion of the trench; (e) a conductive region within the trench adjacent the insulating layer; (f) a body region of a second conductivity type provided within an upper portion of the epitaxial layer and adjacent the trench; (g) a source region of first conductivity type within an upper portion of the body region and adjacent the trench; and (h) one or more low resistivity deep regions extending into the device from an upper surface of the epitaxial layer. The low resistivity deep region acts to provide electrical contact with the substrate, which is a common drain region for the device. By constructing a trench DMOS transistor device in this fashion, source, drain and gate contacts can all be provided on a single surface of the device.
Patent TW-586228-B (TW)
Title: Method for fabricating a titanium nitride sensing membrane on an EGFET
Inventor: HSIUNG STEPHEN SHEN-KAN
IPC: G01N27/414
Filed: 2003-03-19
Granted: 2004-05-01
Abstract: A method for fabricating a titanium nitride (TiN) sensing membrane on an extended gate field effect transistor (EGFET). The method uses a sensitive material-TiN obtained by r. f. reactive sputtering as a high-pH-sensitive material for a multi-structure EGFET to obtain sensing devices with TiN/Al sensing membrane. Because the TiN material is inherently used in the CMOS standard process, all elements in the sensing devices or corresponding circuits can be made by the CMOS standard process for mass production with low cost and also have high yield and high performance.
Patent TW-I254151-B (TW)
Title: Transflective liquid crystal display device color filter
Inventor: SUGAWARA MASAYUKI
IPC: G02B5/23
Filed: 2003-05-09
Granted: 2006-05-01
Abstract: The main object of the present invention is to provide a color filter for a translucent color liquid crystal display device, which is easy for manufacture, and can perform display with a similar tone by a reflective light and transmitting light, and forms light scattering in the reflective light area. The present invention to achieve the above object is a color filter for a translucent color liquid crystal display device, which comprises a transparent substrate, and a reflective coloring layer and a transmissive coloring layer formed on the transparent substrate, which is characterized in that: the reflective coloring layer forms protrusions on the side surface of the liquid crystal layer in a manner that the average film thickness is smaller than that of the transmissive coloring layer. The refractive index difference between the reflective coloring layer and the surface contacted layer of the side formed with protrusions of the reflective coloring layer becomes more than 0,1. In addition, the main object of the present invention is to provide a transflective liquid crystal display device color filter, which is characterized in comprising a transparent film pattern area laminated with a transparent substrate; a transparent film pattern layer on the transparent substrate so that the transparent film forms a pattern shape, and a coloring layer formed on the transparent film pattern layer.