baber/WOPTO huggingface dataset:
Patent TW-455816-B (TW)
Title: Array-based embedded image coding, ABEC
Inventor: YANG JU-SHING
IPC: G06K11/00
Filed: 1999-08-04
Granted: 2001-09-21
Abstract: The present invention is an array-based embedded image coding (ABEC) that, by cooperating with state bit decision logic, applies sequential array coefficient scanning and combines the ordering and precision processes of coding operation to output embedded data flows in a single stage. By means of the budget estimation of the bit budget controller mechanism on a specific state bit, ABEC can accurately control the output budget and ensure a better compression effect in the final coding scanning.
Patent TW-429657-B (TW)
Title: Method for forming an electrical connector and an electrical connector obtained by the method
Inventor: LI YU-SUNG
IPC: H01R12/52
Filed: 1999-11-02
Granted: 2001-04-11
Abstract: A method for forming an electrical connector, comprising the following steps: stamping a flat metal sheet to obtain a number of blank contacts and connecting portion lying on the flat plane, the connecting portion electrically connecting the blank contacts thereby; insert molding elastomeric material to top and bottom faces of the metal sheet wherein a number of openings are formed in the elastomeric material aligning with the blank contacts and the connecting portions; and applying a tool through the openings to act on the blank contacts and the connecting portions whereby the blank contacts are bent to extend over top and bottom faces of the elastomeric material so that contacts for engaging with mating electrical components are formed, and the connecting portions are separated from the contacts so that the contacts are electrically individual from each other.
Patent TW-467953-B (TW)
Title: New detergent and cleaning method of using it
Inventor: NOHARA MASAHIRO
IPC: C23G1/24
Filed: 1999-11-10
Granted: 2001-12-11
Abstract: The invention relates a detergent comprising 0.1 to 60 wt.% of oxidants and 0.0001 to 5 wt.% chelants. It is easily to remove the resist pattern layers using as etching mask in the process of semi-conduct integrated circuit and resist residues resulting from the dry etching treatment by above mentioned detergents. Further, it is easily to remove the residues resulting from the conductive film in the preparing process of substrate using for liquid crystal panel during dry etching treatment by above mentioned detergents. The cleaning method of using above mentioned detergents would not corrode wiring material, insulating material of film circuit element, and other material during the preparing process of semi-conduct integrated circuit or substrate using for liquid crystal panel.
Patent TW-593798-B (TW)
Title: Production of silicon single crystal wafer
Inventor: NAKAMURA KOZO
IPC: C30B15/14
Filed: 1999-11-18
Granted: 2004-06-21
Abstract: To produce a silicon single crystal wafer for a semiconductor device at a high percent nondefective with respect to oxide film withstand voltage without generating the dislocation cluster by pulling up a silicon ingot with a CZ (Czochralski) method under such conditions that the ratio of (G outer)/(G center) is controlled so as to be a values within a specified range of 1.10 to 1.50, wherein G is a temperature gradient (DEG C/mm) in the axial direction of a single crystal at a temperature in the range of the solid-liquid interface temperature to about 1,350 DEG C. Further, in the production process, the ratio of (G1 edge)/(G1 center) and the ratio of (inner diameter of OSF ring)/(single crystal diameter) are controlled so as to be a value within the range represented by the formula ""1.15 <= (G1 edge/G1 center) <= 1.25"" and ""0.5 < (OSF ring bore/diameter of crystal) < 1.06x(G1 center x G2 center)<-0.2>"". In a wafer sliced from the silicon ingot thus produced, by expanding the inner diameter of the OSF ring, the void defect density in a void region existing inside the ring is reduced. Thus, the objective silicon wafer which is appropriately used as a wafer not to be subjected to annealing treatment and also suitable for efficient production, can be produced.
Patent TW-514947-B (TW)
Title: Structure and fabrication of flat-panel display having spacer with rough face for inhibiting secondary electron escape
Inventor: ROBER W BARTON
IPC: H01J31/12
Filed: 2000-03-28
Granted: 2002-12-21
Abstract: A flat-panel display contains a pair of plate structures (20 and 22) separated by a spacer (24) having a rough face (54 or 56). When electrons strike the spacer, the roughness in the spacer's face causes the number of secondary electrons that escape the spacer to be reduced, thereby alleviating positive charge buildup on the spacer. As a result, the image produced by the display is improved. The spacer facial roughness can be achieved in various ways such as depressions (60, 62, 64, 66, 70, 74, or 80) or/and protuberances (82, 84, 88, and 92). Various techniques are presented for manufacturing the display, including the rough-faced spacer.
Patent TW-430942-B (TW)
Title: Method for reducing the contact resistance of polysilicon plug
Inventor: WU KING-LUNG
IPC: H01L21/768
Filed: 1999-12-23
Granted: 2001-04-21
Abstract: The present invention provides a method for reducing the contact resistance of polysilicon plug in which a semiconductor chip comprises a substrate; a conductive layer formed on a predetermined area on the substrate surface; an insulation layer formed on the conductive layer; a plug hole formed on the insulation layer and connected to the surface of the conductive layer; and a polysilicon layer formed in the plug hole for forming the polysilicon plug; in which the plug hole is formed by a dry etching process and the dry etching process will form a barrier on the surface of the conductive layer at the bottom of the plug hole. The method uses an implantation process to implant impurities into the barrier for reducing the contact resistance of the polysilicon plug and the conductive layer.
Patent TW-462087-B (TW)
Title: Methods and solutions for post-chemical mechanical polishing
Inventor: GOTKIS YEHIEL S
IPC: H01L21/321
Filed: 2000-04-24
Granted: 2001-11-01
Abstract: In accordance with the present invention, methods and compositions are provided for the effective removal of copper by-products from the surface of semiconductor wafers following CMP. The present invention comprises a solution of a volatile copper chelating agent, an organic copper corrosion inhibitor, and a water-soluble, metal hydroxide for cleaning and processing semiconductor wafers. The present invention further comprises a method for cleaning scrub brushes and wafers, and prolonging the life of mechanized scrub brushes following CMP of semiconductor wafers using the solution of the present invention.
Patent TW-449759-B (TW)
Title: Electric discharge lamp lighting device
Inventor: HATAUCHI TAKASHI
IPC: H05B41/24
Filed: 2000-02-02
Granted: 2001-08-11
Abstract: There is provided an electric discharge lamp lighting device which can reduce the power dissipation and can be downsized. An electric discharge lamp lighting device is characterized in comprising a rectifier/filter circuit for converting AC voltage into DC voltage, a high-frequency inverting circuit for inverting the DC voltage into a high-frequency AC voltage whose frequency is higher than that of the AC voltage, a distributed constant circuit having at least a transmission line, and a line transformer for causing an electric discharge lamp to light, by boosting the high-frequency AC voltage and controlling the amount of current of the high-frequency AC voltage after the lamp is lit.
Patent TW-509759-B (TW)
Title: Ball screw with ball bearing ring
Inventor: LIN HUANG-MING
IPC: F16H25/20
Filed: 2000-04-10
Granted: 2002-11-11
Abstract: In prior art, when the balls nut is equipped with bearings, though frictional force is reduced between the balls nut and bearing bush, the disadvantages includes a complex structure with a large size, lower number of balls, difficulty in assembly, needs for modifying the bearing ball sizes, and easy detachment of the preload ring. In this invention, the bearing bush employed is divided into a main and a sub bearing bushes and a preload ring. The bushes are moved toward opposite sides for filling bearing balls into bearing races and then the bushes are moved back to the original position. Moreover, reduction of preload on the preload ring can be compensated by adjusting the thickness of the preload ring by means of grinding.
Patent TW-I245610-B (TW)
Title: Cord end cover
Inventor: NEZU MIKIO
IPC: A44B99/00
Filed: 2000-07-28
Granted: 2005-12-21
Abstract: This invention relates to a cord end cover. Even though when a substantial length of a cord is brought out, it easily prevents the pendulum phenomenon of a cord terminal cover by a single operation. This cover is attached to the terminal 41a of a cord 41 positioned on clothing or the like, by inserting the terminal 41a into the cover and locking it therein. In that case, a cover body 2 receiving the terminal 41a of the cord 41 from an opening 3a at one end. Further, it has a planar part formed on a portion of the outer surface 2a thereof. Furthermore, it has a hook part 4 provided to project from the outer surface 2a. At the mean time, it is elastically oscillated using a base part 4a as a fulcrum. Consequently, it forms an insertion space gap 8 between itself and the planar part 4.
Patent TW-470795-B (TW)
Title: Knitting method for waste yarn disposal
Inventor: OKAMOTO KAZUYOSHI
IPC: D04B1/22
Filed: 2000-08-04
Granted: 2002-01-01
Abstract: The object of this invention is to simplify the disposal of a waste yarn produced at yarn-in and yarn-out, which is a knitting method for disposing an unused yarn edge produced in yarn-in and/or yarn-out of a knitting yarn used in knitting a knitted fabric by using a flat knitting machine having at least a pair of front and back needle beds, either or both of which are movable in a longitudinal direction thereof, and characterized in comprising: (a) a step of forming two or more waste yarn disposal loops by means of a knitting yarn subjected to yarn-in and/or yarn-out by using an unused needle in the vicinity of a side end of a knitting fabric main body, and (b) a step of sequentially moving, when knitting the courses of the knitting fabric main body continuous from the respective formed waste yarn disposal loops, the waste yarn to loops in different courses positioned at the end side of the knitting fabric main body and overlapping it to thereby retain the waste yarn in the knitting fabric by the loops of the knitting fabric main body.
Patent TW-521169-B (TW)
Title: Fiber collimator mixing fiber lens and ball lens
Inventor: TSAI PEI-RUNG
IPC: G02B6/42
Filed: 2000-08-18
Granted: 2003-02-21
Abstract: A fiber collimator mixing fiber lens and ball lens comprises a single mode fiber, a fiber lens and a ball lens. Said fiber lens is installed on one side of the single mode fiber, and is connected to one end of the single mode fiber. Said ball lens is disposed on the same side of the fiber lens, and is in the same line as the single mode fiber and fiber lens, wherein the laser light is emitted from the single mode fiber toward the fiber lens, passes through the fiber lens and ball lens, and is focused behind the ball lens.
Patent TW-466669-B (TW)
Title: Locating device of resist spray nozzle
Inventor: LAI KUEI-SI
IPC: H01L21/68
Filed: 2000-09-22
Granted: 2001-12-01
Abstract: The invention provides a locating device of resist spray nozzle, which has a nozzle to spray photoresist on the center of a semiconductor chip, a rotatable robot with a photoresist conveying pipe connected to one end of the nozzle, a covering nut, a locating ring, a fixing ring to connect the covering nut and the rotatable robot, a fixing ring, and a spring set between the covering nut and the locating ring. The covering nut has an opening with diameter (D). The locating ring has a rotating position, which passes through the opening of the covering nut, with a diameter not larger than the opening diameter (D), and has at least two protrusions. The fixing ring has two cavities conformable to the two protrusions to interact with the two protrusions.
Patent TW-I242015-B (TW)
Title: 6-mercapto-cyclodextrin derivatives: reversal agents for drug-induced neuromuscular block
Inventor: ZHANG MINGQIANG
IPC: C08B37/16
Filed: 2000-11-08
Granted: 2005-10-21
Abstract: Disclosed is a 6-mercapto-cyclodextrin derivative having the general formula I, wherein m is 0-7 and n is 1-8 and m+n=7 or 8; R is (C1-6)alkylene, optionally substituted with 1-3 OH groups, or (CH2)o-phenylene-(CH2)p-; o and p are independently 0-4; X is COOH, CONHR1, NHCOR2, SO2OH, PO(OH)2, O(CH2-CH2-O)q-H, OH or tetrazol-5-yl; R1 is H or (C1-3)alkyl; R2 is carboxy-phenyl; q is 1-3; or pharmaceutically acceptable salts thereof. The 6-mercapto-cyclodextrin derivative is highly suitable for use in the reversal of drug-induced neuromuscular block.
Patent TW-493206-B (TW)
Title: Identification method of semiconductor integrated circuit device, manufacturing method of semiconductor integrated circuit device, and semiconductor integrated circuit device
Inventor: MURANAKE MASAYA
IPC: H01L23/544
Filed: 2000-12-05
Granted: 2002-07-01
Abstract: In the manufacturing procedure of semiconductor integrated circuit device, multiple identification elements constructed conformally are formed and are used as the inherent identification information for the semiconductor integrated circuit device based on the processed size relationship between various physical quantities of multiple identification elements stated above.
Patent TW-483794-B (TW)
Title: Numerical control device and method for controlling an axis of numerical control device
Inventor: NIGAZAWA HIROMICHI
IPC: G05B19/414
Filed: 2000-12-29
Granted: 2002-04-21
Abstract: The numerical control device of this invention comprising movable spindles (32) constructed of a plurality of movable modules (31), so as to convert the processing program for controlling displacement commands of the plurality of movable modules (32) into displacement commands of the plurality of movable modules (32) of each of the movable modules (31) to perform the controlling operation. As such, only commands for defining displacements of the movable spindles are required in order to perform the operations. Further, the random assignment and configuration of the plurality of movable modules (31) corresponding to the movable spindles may be assigned based on the configured assignment so as to apply proper pulses profiles to the movable spindles. The movable modules (31) may be detached from the movable spindles under abnormality.
Patent TW-I242582-B (TW)
Title: Improved flow carbonate polymer blends
Inventor: OGOE SAMUEL A
IPC: C08L25/12
Filed: 2001-01-10
Granted: 2005-11-01
Abstract: Disclosed is a polymer blend composition containing a branched aromatic carbonate polymer and a rubber-modified monovinylidene aromatic copolymer comprising a star-branched rubber and optionally, a linear rubber. The polymer blend compositions according to the invention have a desirable balance of processability and when molded, impact strength.
Patent TW-490852-B (TW)
Title: Manufacture method of MOS transistor of embedded memory
Inventor: CHIEN SUN-CHIEH
IPC: H01L29/772
Filed: 2001-01-19
Granted: 2002-06-11
Abstract: This invention provides a manufacture method of MOS transistor of embedded memory. Firstly, a gate oxide layer, an undoped polysilicon layer and a dielectric layer are formed sequentially on a semiconductor wafer having a memory array area and a periphery circuit area defined therein. The undoped polysilicon layer on top of the memory array area is doped to form a doped polysilicon layer and the dielectric layer on top of the memory array area is then removed. Subsequently, a metal silicide layer and a passivation layer are formed in order on the surface of the semiconductor wafer. The passivation layer, the metal silicide layer, and the doped polysilicon layer are etched to form a plural number of gate electrodes. The passivation layer, the metal silicide layer, and the dielectric layer on top of the periphery circuit area are removed. A plural number of gate electrodes are also formed on the periphery circuit area by etching the undoped polysilicon layer. Finally, spacer, source and drain of MOS transistor are formed on the periphery circuit area.
Patent TW-527178-B (TW)
Title: Vacuum cleaner and handle for same
Inventor: GAMMACK PETER DAVID
IPC: A47L5/32
Filed: 2001-02-23
Granted: 2003-04-11
Abstract: A vacuum cleaner (100) comprises a main body (3), separating apparatus, a flexible hose (20) having one end for coupling to an input of the separating apparatus and the other end terminating in a connecting part (40), a rigid pipe (9, 10) being selectively connectable to the main body (3) (see figure 2A) so as to provide a handle for the cleaner when connected to the main body (3), or a wand when released from the main body (3). The pipe (9) has an opening at each of first and second ends (16, 17) and a gripping portion (11) at the first end (17) for allowing a user to grasp the pipe (9). The hose connecting part (40) is connectable to the opening at either end(16, 17) of the pipe (9). Thus, the pipe (9) can be more conveniently used during a cylinder mode of cleaning.
Patent TW-I282352-B (TW)
Title: A manufacturing method using a water-based adhesive to adhere rubber polymer and fabric
Inventor: TSAI MING-TZUNG
IPC: C09J113/02
Filed: 2001-02-27
Granted: 2007-06-11
Abstract: This invention provides a manufacturing method using a water-based adhesive to adhere rubber polymer and fabric, including following procedures: (1) applying water-based adhesive on upper side of a rubber polymer evenly; (2) baking the applied rubber polymer in an oven to dry the water in the water-based adhesive; (3) sending the baked material into a pasting machine to be pressed and stuck on fabric; (4) steaming and drying the water-based adhesive inside the fabric having rubber polymer and water-based adhesive in a steamer via proper heating and pressing. The water-based adhesive is harmless to human body, so the present product is safe and environment friendly.
Patent TW-487644-B (TW)
Title: Stencil sheet roll with detection device
Inventor: OHSHIMA KENJI
IPC: B41L13/04
Filed: 2001-03-08
Granted: 2002-05-21
Abstract: There is provided a target plate (74) in a hollow portion formed in a stencil sheet roll (72). A stencil printing machine (12) includes at least one of a distance sensor (82) for measuring a position of the target plate (74) and a measurement means for measuring a color. The stencil printing machine (12) further includes a discrimination means for discriminating a type of the stencil sheet roll (72) in accordance with the measured position of the target plate (72) or in accordance with the obtained color information of the target plate (72). It is possible to discriminate various types of stencil sheet rolls with a simple structure. Therefore, it is possible to prevent a wrong stencil sheet roll from being set in the stencil printing machine (12).
Patent TW-483185-B (TW)
Title: Shutdown battery separator made with a blend of polymer and oligomer
Inventor: NGUYEN KHUY V
IPC: H01M50/491
Filed: 2001-03-08
Granted: 2002-04-11
Abstract: The instant invention is directed to a battery separator including a microporous polyolefinic membrane having a porosity in a range of 30-80%, an average pore size in a range of 0.02-2.0 microns, and being made from a blend of a polyolefin polymer and an oligomer of a polyolefinic polymer.
Patent TW-I290484-B (TW)
Title: Single layer high performance catalyst
Inventor: MUSSMANN LOTHAR
IPC: F01N3/10
Filed: 2001-03-22
Granted: 2007-12-01
Abstract: The invention relates to a single layer high performance catalyst containing on an inert carrier body a catalytic coating comprising platinum, rhodium and various oxide materials. The catalyst is characterised in that the catalytic coating comprises at least one first support material selected from the group comprising a first active alumina, ceria rich ceria/zirconia mixed oxide and a zirconia component, said at least one first support material being catalysed with a first part of the total platinum amount of the catalyst, and a second support material catalysed with the second part of the total platinum amount and with rhodium said second support material being a second active alumina.
Patent TW-505616-B (TW)
Title: Method for producing micro-system chip by injection compression molding
Inventor: HUANG JUNG-TANG
IPC: B81C1/00
Filed: 2001-05-10
Granted: 2002-10-11
Abstract: The present invention combines injection compression molding and micro-electromechanical techniques to product minute patterns, such as micro-flow-channel, micro-channel, cavities, etc., that are required in the production of a micro-system chip, on a plastic material. The method is characterized in adopting an optical disk injection molding production method and an micro-electromechanical technique to produce a minute pattern on a stamper, and using a micro-electromechanical process to produce a micro-heater array module. Such a module is mounted in a mold. The micro-heaters can locally control the heating characteristics so that the plastic material has a goof flow property at the narrowing spots or spots with a larger thickness variation in the structure during the filling or compression process. Furthermore, the micro-heater can also be used to adjust the temperature distribution of a larger area or a thinner element in order to reduce the problem of deformation and the occurrence of seam line caused by inconsistent shrinkage during cooling due to a larger overall temperature difference. The present invention can be applied on a micro-system chip, e.g. a communication chip, an optical chip, and a bio-chip, etc. A plastic sheet produced by an injection compression according to the present invention can reach a wafer size of 6-8 inches and can be used directly for wafer scale encapsulation on a substrate with an IC or micro-electromechanical elements thereon, thereby reducing the cost.
Patent TW-497157-B (TW)
Title: Method of growing a thin film in gaseous phase, and apparatus for growing a thin film in gaseous phase adapted to conducting the above method
Inventor: TORIHASHI SHUJI
IPC: C23C16/455
Filed: 2001-05-16
Granted: 2002-08-01
Abstract: An improved method of growing a thin film in gaseous phase maintaining a uniform thickness and uniform electric properties such as resistivity, etc. over the whole surface of the film, and an apparatus for growing a thin film in gaseous phase adapted to conducting the above method. A method grows the thin film in gaseous phase by flowing down a film-forming reaction gas through plural gas feed ports 1, 2 formed in the top portion of a cylindrical reactor of an apparatus for glowing a thin film in gaseous phase via flow stabilizer plates 3, and bringing the film-forming reaction gas into contact with the wafer substrate A placed on a rotary susceptor 4 disposed on the lower side thereby to grow a thin film on the surface of the substrate, wherein space formed by the inner wall at the top portion of the reactor B and the flow stabilizer plates 3 is sectionalized into plural spatial sections in a concentric manner with the center of the wafer substrate A as nearly a center point, the gas feed ports 1, 2 are arranged to be corresponded to the sections, and at least either the flow rate or the concentration (8, 9) of the film-forming reaction gas fed to any one of the sections is adjusted.