baber/WOPTO huggingface dataset:
Patent TW-328588-B (TW)
Title: Semiconductor memory device
Inventor: ISA SATOSHI
IPC: G11C29/00
Filed: 1996-09-30
Granted: 1998-03-21
Abstract: A semiconductor memory device equipped with redundant circuit for generating redundancy select signal representing if input address is matched with program address, in which the redundant circuit comprises: (1) Having the program address and address detect circuit supplied by the input address, when the input address is matched with the program address, the address detect circuit generates first voltage level on its output node, and when the input address is not matched with the program address, then generates second voltage level on the output node; and (2) Having first input end connected to the output node of the address detect, from differential circuit between second end supplied by reference voltage and output end driving the redundant select signal, the reference voltage is intermediate level between first voltage level and second voltage level.
Patent TW-467897-B (TW)
Title: Synthesis of quaternary melanin compounds and their use as hair dyes or for skin treatment
Inventor: WENKE GOTTFRIED
IPC: C07D209/04
Filed: 1996-11-22
Granted: 2001-12-11
Abstract: The specification describes water soluble, cationic products useful as hair colorants or for skin care obtained by oxidative polymerization of a 5,6-dihydroxyindole-2-quaternary amides or esters, as well as compositions containing the same, methods of using the same in compositions to color hair or treat skin and intermediates for producing the products.
Patent TW-343968-B (TW)
Title: Process for the production of terephthalic acid
Inventor: RAMAKRISHNAN RAMACHANDRAN
IPC: B01J19/18
Filed: 1996-12-10
Granted: 1998-11-01
Abstract: A process for the manufacture of aromatic polycarboxylic acids comprising (a) contacting, in the liquid phase in a reactor partially filled with a saturated aliphatic acid as solvent, a polyalkyl-substituted benzene and an oxygen-rich gas in the presence of a heavy metal partial oxidation catalyst which selectively oxidizes the polyalkyl-substituted benzene to an aromatic polycarboxylic acid, thereby producing a liquid product comprising the aromatic polycarboxylic acid and a waste gas stream comprising carbon dioxide; (b) forming a carbon dioxide-enriched gas from the waste gas stream; (c) chilling at least part of the separated carbon dioxide-enriched gas; and (d) recycling the chilled carbon dioxide-enriched gas to the reactor.
Patent TW-314546-B (TW)
Title: Adhesive-free adhesion between polymeric surfaces
Inventor: LIAW DER-JANG
IPC: C09J5/02
Filed: 1996-12-23
Granted: 1997-09-01
Abstract: A manufacturing method for adhesion between polymeric substrate includes the following steps: (a) Firstly functional monomer with free radical polymerization proceeds surface graft polymerization to modify the surface of first polymeric substrates. (b) Secondly functional monomer with free radical polymerization proceeds surface graft polymerization to modify the surface of second polymeric substrates. (c) The surface of firstly and secondly modified polymeric substrates contacts each other under liquid medium. (d) Keep contact for some time until liquid medium to be dry.
Patent TW-318946-B (TW)
Title: Method of forming dielectric as protection film
Inventor: SHIAH LIANG-JIUH
IPC: H01L21/31
Filed: 1997-01-31
Granted: 1997-11-01
Abstract: A method of forming dielectric as protection film comprises of the following steps: (1) forming one semiconductor structure on one substrate; (2) forming one silicon-free dielectric on the semiconductor structure, in which the silicon-free dielectric is viewed as one protection film.
Patent TW-396186-B (TW)
Title: Method of treating polyamide membranes to increase flux
Inventor: MICKOLS WILLIAM E
IPC: B01D67/00
Filed: 1997-02-01
Granted: 2000-07-01
Abstract: The flux of a composite reverse osmosis or nanofiltration membrane having a polyamide discriminating layer is enhanced in a one-step process in which the discriminating layer is treated with ammonia or certain alkylamines. It is possible to control both rejection rate and flux of the membrane as well as convert reverse osmosis membtanes into nanofiltration membtanes.
Patent TW-335459-B (TW)
Title: Optical system and apparatus for ultraviolet lithography
Inventor: JOSEPHUS JOHANNES MARIA BRAAT
IPC: H01L21/31
Filed: 1997-02-24
Granted: 1998-07-01
Abstract: A sort of optical system and apparatus for ultraviolet lithography, including at least one reflective surface corresponding to the application radioactive wavelength, featuring the at least one reflective face having a correction layer for correction of the inaccurancy formed on the reflective surface, being the layer available for penetration of the applicable radioactive wavelength, with the refraction index of the wavelength and that of the surrounding suffering a maximum difference of 10%, with adjustable inaccuracy.
Patent TW-318211-B (TW)
Title: The optical fiber circulator with reflection and side by side-type
Inventor: LIN SONG-FWU
IPC: G02B6/26
Filed: 1997-03-06
Granted: 1997-10-21
Abstract: An optical fiber circulator with reflection and side by side-type is composed by 2 reflecting surfaces, a preposition dual-deflection crystal, a 1st Failed circulator, a 2nd Failed circulator, and a back-position dual-deflection crystal and a reflecting board. The optical fiber circulator is having 3 side by side I/O ports that are 1st, 2nd and 3rd port, and can transfer the light signal from 1st port to 2nd port, 2nd port to 3rd port; The reflecting board is having a reflecting coating layer for reflecting light signal; And the two reflecting surfaces are used as reflecting surface of two I/O port for guiding light signal to suited devices; Therefore, it can short the intervals of different I/O ports, and reduce the size of optical fiber circulator.
Patent TW-346611-B (TW)
Title: An image processor, a game machine using the image processor, a method of image processing and a medium
Inventor: TAKAHASHI YASUHIRO
IPC: A63F13/837
Filed: 1997-03-18
Granted: 1998-12-01
Abstract: An image processing device, which generates images in which a central figure and peripheral figures sat in a virtual spatial coordinates system are viewed from a prescribed viewpoint, and outputs image display signals corresponding to these images, the image processing device being characterized in comprising: focal point calculating means for determining a second point on the peripheral figures on the basis of a first point previously set with respect to the central figure, line of sight calculating means for determining a line of sight on the basis of the first point and the second point, viewpoint calculating means for determining the viewpoint for generating images on the basis of the first point and the line of sight, and image signal generating means for generating the image display signals corresponding to the image viewed from the viewpoint in the direction of the line of sight.
Patent TW-336344-B (TW)
Title: Trench isolation area and process for forming the same
Inventor: LIN DAH-CHIH
IPC: H01L21/76
Filed: 1997-04-29
Granted: 1998-07-11
Abstract: A process for forming trench isolation in a semiconductor wafer, which at least comprises: forming a trench in the wafer; forming a nitrogenous silicide layer on the wafer and depositing it along the surface of the trench; providing a predetermined amount of silicon in the trench; applying a heat treatment to convert the predetermined amount of silicon into a silicon oxide layer as the insulation material of the trench isolation; and removing the nitrogenous silicide layer formed on the wafer.
Patent TW-355157-B (TW)
Title: A method of connecting thin board and apparatus of the same
Inventor: HASEGAWA KATSUJI
IPC: B27D1/10
Filed: 1997-09-18
Granted: 1999-04-01
Abstract: A method of connecting thin board, characterized in that: processing the thin films for use to be connected having a prescribed thick with one of the end of the thin film to form the end having less than a prescribed thickness, consequently, one of the thin portion and remaining portion is connected with a applied agent, in addition, connected the thin portion by heated pressure.
Patent TW-344697-B (TW)
Title: Dual purpose staple gun tacker
Inventor: RUDOLF WINGERT
IPC: B25C1/00
Filed: 1997-10-22
Granted: 1998-11-11
Abstract: A staple gun tacker for driving staples of various leg lengths, which comprises: a housing having a staple gun driving end, having a staple discharge opening located in the housing; a staple spacer guide slidably mounted on the staple driving end of the housing near the staple discharge opening and including a free end which extends on the opening; and control means for selectively controlling the position of the staple discharge opening relative to the position of the staple spacer guide and its free end, thereby the depth to which a particular staple is driven in a workpiece can be selectively controlled.
Patent TW-357418-B (TW)
Title: Column grid array for semiconductor packaging and method
Inventor: ABBOTT DONALD C
IPC: H01L23/498
Filed: 1997-11-19
Granted: 1999-05-01
Abstract: A method of making column grid array for semiconductor packaging, including the following steps: providing the substrate having a first side and a second side; forming a plurality of holes passing through the substrate; forming contact points on the first surface of the substrate; and stuffing with conductive materials the plurality of holes for forming on the second side of the substrate the extension for making electric contact.
Patent TW-384247-B (TW)
Title: Method to stabilize silicon removal rate during wafer polishing
Inventor: ALLEN FRANKLIN LOUIS
IPC: B24B37/04
Filed: 1998-02-09
Granted: 2000-03-11
Abstract: A method for stabilizing the silicon removal rate during chemical-mechanical wafer polishing, the method comprising the steps of circulating a polishing slurry (28) in a chemical-mechanical wafer polishing apparatus (10) and agitating the polishing slurry to adjust both the redox potential and pH of the polishing slurry, to dissolve SiOx aggregates in the polishing slurry and to minimize or eliminate the precipitation of SiOx aggregates in the polishing slurry.
Patent TW-360949-B (TW)
Title: Dual damascene process
Inventor: YE WEN-GUAN
IPC: H01L21/3205
Filed: 1997-12-19
Granted: 1999-06-11
Abstract: A dual damascene process comprises providing a semiconductor substrate, forming a semiconductor element thereon, and forming a first photoresist layer covering one contact of the semiconductor element; forming a first hydrogentrioxy silane layer covering the semiconductor element, and forming a first oxide layer covering the first hydrogentrioxy silane layer and the first photoresist layer, and performing a polishing step enabling the surface of the first oxide layer and the surface of the first photoresist layer having a same height, forming a second photoresist layer covering the first photoresist layer, and forming a second hydrogentrioxy silane layer covering the first oxide layer, forming a second oxide layer covering the second hydrogentrioxy silane layer and the second photoresist layer, and performing a polishing step enabling the surface of the second oxide layer and the surface of the second photoresist layer having a same height, next sequentially removing the second photoresist layer and the first photoresist layer thereby exposing an opening, forming a barrier adhesive layer covering the sidewall and the bottom of the opening, and forming a metal layer covering the barrier adhesive layer and filling up the opening, and finally performing a polishing step enabling the surface of the metal layer and the surface of the second oxide layer having a same height.
Patent TW-459076-B (TW)
Title: Push device for pushing tubes or packages onto a mandrel and takeup apparatus including the same
Inventor: JASCHKE KLEMENS
IPC: B65H67/04
Filed: 1997-12-19
Granted: 2001-10-11
Abstract: For pushing package (7) from a winding mandrel (4) of a takeup apparatus (1), a push device is proposed, which has a piston arranged for reciprocating movement in a cylinder (8) by supplying a pressure medium. The piston is a magnetic piston whose polarity is opposite to that of at least one magnet connecting to a push unit (9). The push unit (9) is displaceable substantially along the cylinder (8).
Patent TW-353106-B (TW)
Title: Aqueous ink for writing instrument
Inventor: MIYAZAKI SHIGERU
IPC: C09D11/00
Filed: 1998-01-13
Granted: 1999-02-21
Abstract: An aqueous ink for a writing instrument comprising a colorant, a dispersant, water and a polar solvent, which is characterized in that the ink contains 0.5 to 20 % weight of dextrin or maltodextrin based on a whole weight of the ink, and a viscosity modifier with an amount to generate a viscosity of 100-4000 mPa.s at a shear rate of 3.84 s-1.
Patent TW-382823-B (TW)
Title: Transparent window layer LED
Inventor: CHEN SHI-MING
IPC: H01L31/101
Filed: 1998-02-06
Granted: 2000-02-21
Abstract: A transparent window layer LED comprises growing a GaP.AlGaIn supercell on the p-type limit layer as the transparent window layer for using the GaP.AlGaIn supercell to increase the current distribution and increase the illumination region. Furthermore, the transparent window layer greatly increases the brightness of the LED and eliminates a secondary growing process required in the conventional technique thus production cost can be reduced.
Patent TW-408076-B (TW)
Title: Variable compact structure in a motor vehicle drive transmission with one or more driving wheels
Inventor: IERACE ARMANDO
IPC: F16H57/033
Filed: 1998-02-26
Granted: 2000-10-11
Abstract: A compact variable structure in a motor vehicle drive transmission with one or more driving wheels (12) which can be placed on a motor vehicle chassis (11). The structure comprises a central body (14), at least one closing side cover element (16, 17) and three axes comprising a driving axis (18), a wheel or wheels axis (19) and an intermediate transmission axis (10). The central body (14) is of the plate type and provides on at least one of its two sides a series of four housings (20, 21, 22, 23). A first fixed housing (20) is suitable for the driving axis (18), and the remaining housings (21, 22, 23) for axes carrying gear wheels to selectively receive two pairs of transmission gear wheels (26, 30; 31, 32; 26, 30'; 31', 32') according to at least two positions of wheel bases in relation to the positioning of the wheel axis (19). The cover element (16, 17) provides at least two housings (35, 36; 39, 40) for the selected positioning of the axes (10, 19).
Patent TW-394822-B (TW)
Title: Method and apparatus for cooling a turbine with compressed cooling air from an auxiliary compressor system
Inventor: BRIESCH MICHAEL SCOT
IPC: F02C7/18
Filed: 1998-05-13
Granted: 2000-06-21
Abstract: A combustion turbine system is provided with compressed cooling air by an auxiliary air compressor system. The combustion turbine system has a system air compressor, a combustor, and a turbine. The auxiliary air compressor system receives an air stream and produces a compressed cooling air stream therefrom. The cooling air stream is then directed to the combustion turbine system and is used to cool the turbine.
Patent TW-375640-B (TW)
Title: Composition and method of improving water repellency and durability in fiber, non-woven, textile, and paper compositions
Inventor: LAU WILLIE
IPC: C08F220/04
Filed: 1998-06-18
Granted: 1999-12-01
Abstract: A composition comprising an emulsion polymer comprising as polymerized units: (i)(a) from 9.5 to 99.9 parts by weight of at least one C12 to C40 alkyl ester of (meth)acrylic acid; (b) from 0 to 90 parts by weight of at least one less than C15 ethylenically unsaturated monomer; (c) from 0 to 90 parts by weight of at least one ethylenically unsaturated acid containing monomer or salts thereof, and (d) from 0.1 to 10 parts by weight of at least one cross-linking monomer; and (ii) from 0 to 10 parts by weight, based on the polymer weight of at least one cross-linking agent, provided that the composition contains 0.1 to 10 parts by weight, based on the polymer weight cross-linking monomer and cross linking agent; wherein the emulsion polymer is prepared by emulsion polymerization. A method of improving water repellency and durability in fiber, non-woven, textile, and paper compositions and a water repellent and durable article are also disclosed.
Patent TW-542699-B (TW)
Title: Method for bursting cell wall
Inventor: CHIUE JUANG-CHIUN
IPC: A23L33/00
Filed: 1998-06-19
Granted: 2003-07-21
Abstract: A method for bursting a cell wall mainly comprises using instantaneous pressurization, instantaneous heating, instantaneous depressurization, instantaneous drying, etc. to pressurize and heat the moisture inside a cell to a critical point for vaporization and using an instantaneous differential pressure to burst the cell wall without damaging the cell while maintaining its original nutrients, thereby increasing the absorption and digestion efficiency of the nutrients of a human body.
Patent TW-436890-B (TW)
Title: Apparatus for baking a resist deposited on a semiconductor wafer
Inventor: BAE YONG-GUK
IPC: H01L21/00
Filed: 1998-09-22
Granted: 2001-05-28
Abstract: An apparatus for baking a photosensitive resist deposited on a semiconductor wafer, comprises a hot plate for generating heat to bake the resist, a plurality of spacers for supporting the wafer to be spaced over the hot plate with variable distance, the spacers having the upper end part abutting with the edge of the wafer and the lower end part connected with the hot plate, and spacer movement means for raising or lowering the spacers to adjust the interval between the wafer and hot plate. Each of the spacers has a cylindrical from with peripherally spiral grooves connected with corresponding spirally grooved hole formed in the hot plate, and the spacer movement means includes a grip formed on the lower end part of each spacer. The grip is used to raise or lower the corresponding spacer by rotating. Each of the spacers includes a stopper provided at the upper end to support the periphery of the wafer.
Patent TW-372254-B (TW)
Title: Cubic frame type block and apparatus and method for manufacturing the same
Inventor: HAN KI-SOO
IPC: E02B3/14
Filed: 1998-09-24
Granted: 1999-10-21
Abstract: A cubic frame type block. The cubic frame type block includes a vertical direction forming part in its side, horizontal direction forming parts in the top and bottom sides of the vertical direction forming part, a cylindrical hollow formed in its inner part, a round shape lateral central hole formed in the center of its outer part, and a triangle pyramid type reinforcement projecting part formed in the top and bottom parts of the inner part. The method for using the cubic frame type block, comprises the steps of forming a horizontal chimney path connected in the before, behind, right, and left directions thereof by constructing the cubic frame type block and a cross type block formed in a support groove thereof, and forming a vertical chimney path connected in the top and bottom directions thereof.
Patent TW-402635-B (TW)
Title: Solutions for cleaning residual contamination on wafer after chemical mechanical polishing and the use thereof
Inventor: LIAU MING-JI
IPC: C11D3/30
Filed: 1998-09-29
Granted: 2000-08-21
Abstract: The present invention relates to a novel cleaning solution which is able to effectively remove the residual contaminations on the surface of a wafer after chemical mechanical polishing. Said cleaning solution comprises an ammoninum solution, a surfactant and a chelating agent. The present invention further relates to process for effectively removing residual contamination on the surface of a wafer or a well grown ingot after chemical mechanical polishing using the above novel cleaning solution. Moreover, the subject invention provides a process for effectively removing residual contamination on a wafer surface prior to the growing of a gate oxidizing layer during the manufacture of a semiconductor, which comprises the use of the novel cleaning solution as recited above to clean the surface of said wafer after chemical mechanical polishing.
Patent TW-419542-B (TW)
Title: Yarn brake
Inventor: KAUFMANN RICHARD
IPC: B65H59/22
Filed: 1998-09-30
Granted: 2001-01-21
Abstract: A yarn brake having two disklike or platelike brake elements pressed resiliently against one another has a substantially U-shaped bail (19) with two legs extending in spaced apart fashion on either side of the brake elements. Pinlike bearing means for the brake elements are secured to this bail by means of at least one bearing part receiving them, which part is embodied on or joined to at least one of the bail legs. At least one of the brake elements has a central opening, through which the bearing means extend.
Patent TW-390990-B (TW)
Title: A system for allowing a two word instruction to be executed in a single cycle and method therefor
Inventor: DRAKE RODNEY J
IPC: G06F9/38
Filed: 1998-11-27
Granted: 2000-05-21
Abstract: A system for allowing a two word instruction to be executed in a single cycle thereby allowing a processor system to increase memory space without reducing performane. A first address bus is coupled to the linearized program memory for sending addresses of instruction to be fetched to a linearized program memory. A pointer is coupled to the first address bus for storing an address location of a current instruction in the linearized program memory to be fetched and for placing the address location of the current instruction to be fetched on the first address bus. A second address bus is provided and has one end coupled to the output of the program memory and a second end coupled to the first address bus. The second address bus is used for placing an address of an operand of a second word of the two word instruction onto the first address bus after an address of an operand of a first word of the two word instruction has been placed on the first address bus. This allows the address of the first word and second word to be combined to provide the full address value of the two word instruction in a single cycle.
Patent TW-388991-B (TW)
Title: Method for fabricating DRAM capacitor
Inventor: HUANG TZE-YAU
IPC: H01L21/8242
Filed: 1998-12-24
Granted: 2000-05-01
Abstract: The present invention provides a method for fabricating a DRAM capacitor, which comprises the following steps: forming a first doped polysilicon layer on a semiconductor substrate; sequentially forming a BPG layer and a SiNOx compound layer on the first doped polysilicon layer; sequentially etching the SiNOx compound layer, the BPG layer and the first doped polysilicon layer to form an overlapped layer; applying a BPG etching and a polysilicon etching on the sidewall of the overlapped layer to form a double-T overlapped layer; forming a second doped polysilicon layer on the upper surface and the sidewalls of the double-T overlapped layer; anisotropically etching the second doped polysilicon layer to remove the top surface of the second doped polysilicon layer and the sidewalls of the SiNOx compound layer; removing the SiNOx compound layer and the BPG layer to form a crown-shaped bottom electrode plate of a capacitor by the remaining second doped polysilicon layer and the first doped polysilicon layer; forming a dielectric layer and an upper electrode plate on the surface of the bottom electrode plate thereby constituting a capacitor.
Patent TW-I244493-B (TW)
Title: Water dispersible polymeric compositions
Inventor: ANDERSON JEFFREY L
IPC: C09D11/02
Filed: 1999-02-02
Granted: 2005-12-01
Abstract: An aqueous polymeric dispersion is described containing at least one substantially non-gelled polymeric composition comprising the reaction product of an A polymer which is an addition polymer having 3.5 or more reactive functional groups per polymer chain and a B polymer having about 2 to about 3 functional groups per polymer chain that are co-reactive with the reactive functional groups of the A polymer and an aqueous solvent. The aqueous polymeric dispersion is particularly useful in or as overprint varnishes, inks, pigment dispersions, paints, adhesives, coatings, support resins, emulsion polymers and the like.