Patent SG-11201903730X-A (SG)
Title: Lithography systems with integrated metrology tools having enhanced functionalities
Inventor: AMIT ERAN
IPC: H01L21/027
Filed: 2017-08-21
Abstract: INTERNATIONAL APPLICATION PUBLISHED UNDER THE PATENT COOPERATION TREATY (PCT) (19) World Intellectual Property 111111101111011101 HIM 0110100111111111111111111111111111111111111111111111 Organization International Bureau (10) International Publication Number (43) International Publication Date .....0\"\" WO 2018/089076 Al 17 May 2018 (17.05.2018) WIPO I PCT (51) International Patent Classification: (74) Agent: MCANDREWS, Kevin et al.; KLA-Tencor Corpo- GO3F 7/20 (2006.01) HO1L 21/027 (2006.01) ration, Legal Department, One Technology Drive, Milpitas, GO3F 7/00 (2006.01) California 95035 (US). (21) International Application Number: (81) Designated States (unless otherwise indicated, for every PCT/US2017/047742 kind of national protection available): AE, AG, AL, AM, (22) International Filing Date: AO, AT, AU, AZ, BA, BB, BG, BH, BN, BR, BW, BY, BZ, 21 August 2017 (21.08.2017) CA, CH, CL, CN, CO, CR, CU, CZ, DE, DJ, DK, DM, DO, DZ, EC, EE, EG, ES, FI, GB, GD, GE, GH, GM, GT, HN, (25) Filing Language: English HR, HU, ID, IL, IN, IR, IS, JO, JP, KE, KG, KH, KN, KP, (26) Publication Language: English KR, KW, KZ, LA, LC, LK, LR, LS, LU, LY, MA, MD, ME, MG, MK, MN, MW, MX, MY, MZ, NA, NG, NI, NO, NZ, (30) Priority Data: OM, PA, PE, PG, PH, PL, PT, QA, RO, RS, RU, RW, SA, 62/421,932 14 November 2016 (14.11.2016) US SC, SD, SE, SG, SK, SL, SM, ST, SV, SY, TH, TJ, TM, TN, TR, TT, TZ, UA, UG, US, UZ, VC, VN, ZA, ZM, ZW. (71) Applicant: KLA-TENCOR CORPORATION [US/US]; Legal Department, One Technology Drive, Milpitas, Cali- (84) Designated States (unless otherwise indicated, for every fornia 95035 (US). kind of regional protection available): ARIPO (BW, GH, GM, KE, LR, LS, MW, MZ, NA, RW, SD, SL, ST, SZ, TZ, (72) Inventors: AMIT, Eran; Geva 3/6 Pardes Hanna-Karkur, UG, ZM, ZW), Eurasian (AM, AZ, BY, KG, KZ, RU, TJ, 37061 Haifa (IL). VOLKOVICH, Roie; Shderot Alexan-TM), European (AL, AT, BE, BG, CH, CY, CZ, DE, DK, der 10/10, 3824969 Hadera (IL). YERUSHALMI, Liran; EE, ES, FL FR, GB, GR, HR, HU, IE, IS, IT, LT, LU, LV, 43 Inbar, 30900 Zicron Yaacob (IL). — MC, MK, MT, NL, NO, PL, PT, RO, RS, SE, SI, SK, SM, = = _ (54) Title: LITHOGRAPHY SYSTEMS WITH INTEGRATED METROLOGY TOOLS HAVING ENHANCED FUNCTION- = ALITIES 100 = 80 80 160 170 = S S S S _ — = Metrology tool _ .. . A Metrology tool P rocess control SW Grouping of control based on landscape = _ .. . = 85 130 --... = 110, 120 ----.. \"-.. = ..... . ' = --/ - `140 ---c• 150 = IM tool = Printing tool Control 4—* module Processor(s) 9 0 105 -----) /1/ '\"----\ 112 1-1 Figure 7 IN © (;;;N (57) : Lithography systems and methods are provided with enhanced performance based on broader utilization of the integrated GC metrology tool in the printing tool to handle the metrology measurements in the system in a more sophisticated and optimized way. 0 ---- Additional operation channels are disclosed, enabling the integrated metrology tool to monitor and/or allocate metrology measurements GC thereby and by a standalone metrology tool with respect to specified temporal limitations of the printing tool; to adjust and optimize 1-1 C the metrology measurement recipes; to provide better process control to optimize process parameters of the printing tool; as well as to ei group process parameters of the printing tool according to a metrology measurements landscape. C [Continued on next page] WO 2018/089076 Al MIDEDIMOMMIDIREIDINIREHOMMIHMOVOIMIE TR), OAPI (BF, BJ, CF, CG, CI, CM, GA, GN, GQ, GW, KM, ML, MR, NE, SN, TD, TG). Published: — with international search report (Art. 21(3))