baber/WOPTO huggingface dataset:
Patent JP-S60124948-A (JP)
Title: Manufacture of semiconductor device
Inventor: MATSUURA NORIAKI
IPC: H01L21/76
Filed: 1983-12-10
Abstract: PURPOSE:To enable the formation of flat element-isolating regions by a method wherein a groove is formed in the element-isolating region of a semiconductor substrate, and an oxide film is formed in this groove. CONSTITUTION:After a protection oxide film 8 and an Si nitride film 9 are formed on the surface of a semiconductor substrate 7, the film 9 of a region serving as the element-isolating region is selectively removed. Next, an impurity layer 10 is formed by selective ion implantation with the film 9 as a mask. Then, an oxide film 11 is formed by selectively oxidizing the layer 10. The groove is formed on the substrate 7 by removing the film 11. After a protection oxide film 12 is formed by oxidizing the inclined section and the bottom section of the groove, an Si nitride film 13 is formed over the entire surface of the substrate 7. Only the film 13 coating the bottom of the groove is removed, thus leaving the Si nitride film 13' at the inclined section of the groove. The Si nitride film left on the substrate 7 is used as a mask, and an impurity of the same conductivity type as that of the substrate 7 is diffused to the bottom of the groove. With the films 9 and 13' as a mask, oxide films 16 are selectively formed on the bottom and the inclined surfaces of the groove. Thereby, a structure without a stepwise difference between the element-isolating region and the element-forming region can be obtained.
Patent JP-S60124668-A (JP)
Title: Insulated wire
Inventor: ASANO KENJI
IPC: H01B3/30
Filed: 1983-12-09
Abstract: PURPOSE:To provide an insulated wire which has excellent mechanical characteristics an resistance to heat and refrigeration medium and has a high enameled wire baking rate, by applying an enamel paint contg. a specified polyamide-imide resin and an alkoxy-modified amino resin to a conductor and baking it. CONSTITUTION:0.05-5pts.wt. alkoxy-modified amino resin (e.g. butylated melamine resin) is blended with 100pts.wt. polyamide-imide resin having a reduced viscosity of 0.15-0.45 obtd. by reacting an arom. tribasic acid anhydride (e.g. trimellitic anhydride) with an arom. diisocyanate (e.g. 4,4'-diaminodiphenylmethane diisocyanate) in a ratio of COOH/NCO of 1.15-1.40 in a polar solvent, to obtain a a polyamide-imide enamel paint. The paint is applied to a conductor directly or through an insulating material and baked.
Patent JP-H0281011-A (JP)
Title: Focus detector and endoscope provided therewith
Inventor: YOSHIDA HIDEAKI
IPC: G02B7/28
Filed: 1988-09-17
Abstract: PURPOSE:To accurately predict a focusing position by finding the predicted focusing position from a specific frequency component of video signals at two positions of a focusing member by calculation. CONSTITUTION:Images and signals are inputted to an A/D converter 73 directly or through a preprocess circuit 71 and digital video signals outputted form the converter 73 are inputted to a memory 76, adding means 77, subtracting means 78, and absolute quantity discriminating means 79 through a BPF 75. The memory 76 stores the output f1 of the BPF 75 at the 1st position d1 of a focusing lens. The adding means 77 calculates f2+f1 by adding the output f2 of the BPF 75 at the 2nd position d2 of the lens. The subtracting means 78 calculates f1-f1. A calculating means 81 calculates G(d)=2(f2-f1)/(d2-d1)(f2+ f1) upon receiving the calculated results from the means 77 and 78 and a calculated result d2-d1 of a lens position calculating means 84 and another calculating means 86 finds a defocusing quantity (d) from a G(d) data table 87 and the quantity (d) is compared 89 with a predicted value.
Patent JP-S6385460-A (JP)
Title: Automatic chemical analyzer
Inventor: WATANABE FUMIO
IPC: G01N35/04
Filed: 1986-09-30
Abstract: PURPOSE:To eliminate the need for a turn table and to shorten the time for photometry without being limited by cleaning and drying time by moving a reaction vessel array back and forth linearly, subjecting the vessels to the pho tometry and disposing a reaction photometric line and cleaning and drying line independently. CONSTITUTION:The reaction photometric line 50 which houses the reaction vessel to be subjected to the photometry and the cleaning and drying line 60 which is independent from said line and houses the reaction vessels after the end of the photometry are disposed to the reaction vessel array. The reaction vessels 23 included in the line 50 and the line 60 are given intermittent moving force linearly by a carrier 5 by which the vessels are successively progressed forward by each one piece. First reagent dispensing 15 and second reagent dispensing 16 are executed and the total number of the vessels 23 housed in the line 50 are subjected to the photometry when the line 50 moves back and forth toward the right so as to cross an optical path 10. One piece at the right side end of the vessels 23 with which the photometry ends is fed to the line 60.
Patent JP-H0283243-A (JP)
Title: Composition for cement milk construction
Inventor: SHIMADA KENGO
IPC: C04B111/70
Filed: 1988-09-20
Abstract: PURPOSE:To provide the title composition suppressed in bleeding without impairing castability and strength-developability, comprising cement, calcined alum and potential hydraulic fine powder of specified granular size. CONSTITUTION:The objective composition comprising (1) 10-90 pts.wt. of cement <=15mu in granular size prepared by grinding or classifying cement <=88mu in granular size, (2) 3-50 pts.wt. of calcined alum <=15mu in granular size prepared by calcining aluminum alum or iron alum at 350-750 deg.C followed by grinding, and (3) <=90 pts.wt. of potential hydraulic fine powder <=15mu in granular size (e.g., blast-furnace granulated slag).
Patent JP-S6292478-A (JP)
Title: Manufacture of semiconductor device
Inventor: UENOYAMA TAKESHI
IPC: H01L21/28
Filed: 1985-10-18
Abstract: PURPOSE:To decrease a parasitic resistance between a gate capacity and a gate electrode by providing the steps of accumulating an insulating film on the entire substrate, forming one island on the gate electrode, etching the side of the island, accumulating a gate metal on the entire surface, and forming the gate electrode made of two metals. CONSTITUTION:A semi-insulating GaAs substrate 1 is covered with a resist 2 except an active layer portion, an active layer 4 is formed by Si ion implanting 3, the resist 2 is removed, and heat treated. An Si3N4 film 5 is accumulated on the entire surface, a gate electrode forming portion is formed as an island 5 of 1mum wide by photolithography, the side of the island 5 is etched with CF4, and aluminum 6 is deposited as a gate metal on the entire surface. The aluminum on the island 6 of the Si3N4 film and the substrate 1 are removed by anisotropic ion etching 7, the remaining aluminum on the side wall of the island 6 is formed as dual gate electrode 8, an Si3N4 film 9 is further accumulated, the aluminum 6 is etched, the gate 8 remains only on the side of the island 5. Then, source, drain and ohmic electrodes 10 are formed.
Patent JP-2000066221-A (JP)
Title: Liquid crystal display device
Inventor: OKAMOTO MASATAKA
IPC: G02F1/1343
Filed: 1998-08-20
Abstract: PROBLEM TO BE SOLVED: To provide a liq. crystal display device capable of improving the productivity to enable the device to easily confirm the dimension of sealed width of a sealing agent. SOLUTION: A liq. crystal display device is provided with a liq. crystal display element having a sealing agent 9, a pair of electrode substrates 100, 110 arranged oppositely to each other through the sealing agent 9, and a liq. crystal layer 10 injected and sealed in between a pair of the electrode substrates 100, 110. In this case, a dummy electrode 20 for confirming the sealed width dimension of the sealing agent 9 is provided on a part of the sealing agent forming area of at least one electrode substrate of a pair of the electrode substrates of the liq. crystal element. This dummy electrode 20 is composed of the three kind of the dummy electrodes 21, 22 and 23 having the length of the min. width, standard width and the max. width in the sealed width dimension of the sealing agent 9.
Patent JP-S63239779-A (JP)
Inventor: DENISU JIYOOJI HARORUDO BARAAD
IPC: H01M10/0565
Filed: 1987-09-19
Abstract: (57)【要約】本公報は電子出願前の出願データであるた め要約のデータは記録されません。
Patent JP-H0555847-A (JP)
Title: Gain control circuit
Inventor: OKASHIN YAMATO
IPC: H03G3/10
Filed: 1991-08-21
Abstract: PURPOSE:To reduce the number of external terminal pins necessary for controlling gain in a gain control circuit formed as an IC. CONSTITUTION:The gain control circuit is provided with a constant current circuit 30 for supplying a constant current I30 to an externally connected variable resistor R10, a circuit 20 for supplying an output current I41 corresponding to voltage Vp generated in the resistor R10 when the fixed current I30 is supplied to the resistor R10 and an amplifier 12 for changing gain correspondingly to the output current I41 of the circuit 20.
Patent JP-H0282512-A (JP)
Title: Electron beam lithography
Inventor: ASAUMI MASASHI
IPC: H01L21/027
Filed: 1988-09-19
Abstract: PURPOSE:To improve the accuracy of a pattern position by eliminating any error involved in distortion correction of electron beam deflection by defining the amount of a step movement of a sample as being a reciprocal of an integer times a field size. CONSTITUTION:A inverted L-shaped drawn pattern is formed by superimposing drawn patterns 2a, 2b, 2c, and 2d according to four times field drawings. Each field drawing is performed with the amount of exposed 1/4 of the optimum amount of exposure of an electron beam resist used. Sub-fields, to which the drawn patterns 2a-2d belong, the different for each field 1a-1b. Therefore, deflection distortion corrections on the drawn patterns 2a-2d are also different for each field. Now, if it is assumed only the drawn pattern 2a has improper correction of deflection distortion, the drawn pattern 2a is displaced from the other drawn patterns 2b-2d. A portion of the pattern 2a protruding from the patterns 2b-2d simply has the amount of exposure 1/4 of the optimum amount of exposure for the resist which is not resolved when developed.
Patent JP-2001060822-A (JP)
Title: Microstrip antenna
Inventor: ISHITOBI TOKUMASA
IPC: H01Q9/04
Filed: 1999-08-20
Abstract: PROBLEM TO BE SOLVED: To provide a microstrip antenna which is inexpensive and also can be miniaturized. SOLUTION: A ground electrode 21 and a patch electrode 22 supported so as to face each other through a dielectric layer are provided, the electrode 22 has a reactance loading pattern where the widths of its start edge and end edge along the direction in which current flows are larger than that of its central part and each of interior angle edge is shaped with a continuous smooth curve.
Patent JP-H04114460-A (JP)
Title: Lead frame and manufacture thereof
Inventor: YONEDA TOSHIO
IPC: H01L23/50
Filed: 1990-09-04
Abstract: PURPOSE:To prevent burrs from occurring at the thin-wall part of the tip of an inner lead by a method wherein a thin-wall part tapered in thickness is provided to the tip of the inner lead of a lead frame. CONSTITUTION:A lead frame is provided with a large number of inner leads 1 arranged so as to enable the tips of them to be located around a semiconductor element mounting stage and outer leads 3 provided so as to be connected to the inner leads 1. A coining process is carried out by the use of a punch Ps whose periphery is tapered to make the tip 1S of the inner lead 1 as thin as 0.7mm or so. Thereafter, the lead frame is thermally treated at a temperature of 600 deg.C for 30 minutes to correct its parts deformed in processing through stamping and stabilized in shape. Lastly, the tip 1S of the inner lead 1 is placed in a die and stamped, whereby a lead frame provided with inner leads whose tips 1S are thin-wall can be obtained.
Patent JP-H0766120-A (JP)
Title: Surface position detector and fabrication of semiconductor employing it
Inventor: KAWASHIMA HARUNA
IPC: G01C3/06
Filed: 1993-08-26
Abstract: PURPOSE:To locate the entire exposing region within the allowable depth of focus of a projection optical system even if the wafer surface is inclining by varying the information relating to the heights of a plurality of measuring points in the exposing region on the surface of a wafer according to the size of the exposing region while retaining the similarity in the relative position of the plurality of measuring points. CONSTITUTION:Correction optical systems 12-16 are provided for respective measuring point 19-23 and the projective magnifications on the detection planes 17 thereof are substantially equalized. The position of a pinhole image incident to the detection plane 17 is varied depending on the position of the measuring points 19-23 on the surface of a wafer 2. The measuring points 19-23 on the surface of wafer are conjugated with the detection plane of a photoelectric converting means SC through a projection means SB. Consequently, the position of pinhole image on the detection plane 17 is varied depending on the height of the measuring points 19-23. The photoelectric converting means SC detects information relating the incident position of pinhole image on the detection plane 17 and delivers the information to a focus control means 18.
Patent JP-S6389177-A (JP)
Inventor: OGAWARA YUKIO
IPC: A63B71/10
Filed: 1986-10-01
Abstract: (57)【要約】本公報は電子出願前の出願データであるた め要約のデータは記録されません。
Patent JP-S6389454-A (JP)
Inventor: BANDAI HARUFUMI
IPC: H05K1/03
Filed: 1986-09-30
Abstract: (57)【要約】本公報は電子出願前の出願データであるた め要約のデータは記録されません。
Patent JP-S6477145-A (JP)
Title: Manufacture of semiconductor device
Inventor: HOSAKA TAKASHI
IPC: H01L21/3205
Filed: 1987-09-18
Abstract: PURPOSE:To prevent the cutting due to step differences of a wiring at contact parts by a method wherein, after dummy patterns of a size of the same degree as the size of contact holes are formed at positions to make the contacts between first and second wiring layers, the first wiring layer, an interlayer insulating film and a flattening film are formed, then the first wiring layer existing on the dummy patterns is etched using an anisotropic etch back until the first wiring layer is exposed. CONSTITUTION:Contact dummy patterns 3 of the same size as that of contact holes or a size close to the size of the contact holes are formed at positions to make the contacts between wiring layers on an insulating film 2. Then, a first wiring layer 4 is laminated to form a desired pattern. Then, an interlayer insulating film 5 is laminated and a flattening film 6 is laminated for eliminating and flattening the surface step differences of the film 5. The resist 6 and the film 5 are etched using anisotropic etching and the etching is ended at a time when the surface of the layer 4 on the dummy patterns is exposed. Then, a second wiring layer 7 is laminated and is patterned in a desired form.
Patent JP-H0661859-A (JP)
Title: Semiconductor integrated circuit device and a/d conversion circuit
Inventor: TANBA HIROKO
IPC: H03M1/74
Filed: 1992-08-10
Abstract: PURPOSE:To provide a current source with a high output impedance, a highly accurate current mirror circuit and an A/D conversion circuit with high accuracy and low power consumption. CONSTITUTION:A source of a MOS transistor(TR) M1 is connected to a power supply VDD and its gate receives a voltage VB1. The device is provided with the MOS TR M1, an operational amplifier 1 whose inverting input terminal connects to a drain of the MOS TRM1 and whose noninverting input terminal receives a voltage VB2, and a MOS TR M2 whose gate receives an output of the operational amplifier and whose source is connected to the drain of the TR M2, and they form a constant current source using the drain of the TR M2 as a current output terminal. A constant current flows to an imaginary ground of the operational amplifier without changing a drain voltage of the MOS TR M1 deciding the current even when a voltage at the current output terminal is subjected to change and then the current source with a high impedance is realized. A highly accurate current mirror is obtained by selecting drain voltages of the current mirror pair identically as an imaginary ground similarly to above.
Patent JP-S6477352-A (JP)
Title: Radiotelephony system
Inventor: MAKI KATSUHISA
IPC: H04M1/26
Filed: 1987-09-18
Abstract: PURPOSE:To accurately call a user by calling a telephone number of an abbreviated dial corresponding to the telephone number drawn on a touch panel. CONSTITUTION:When a user draws numerals corresponding to a telephone number on the touch panel 16, the drawn numerals are recognized as prescribed numerals by a numeral recognizing circuit 19 through a position detecting circuit 18. When all numerals corresponding to the telephone number are drawn on the touch panel 16, calling based upon the telephone number corresponding to the numeral string is executed by a calling circuit 20. Since calling is executed by the telephone number corresponding to numerals drawn on the touch panel 16 by the user, the calling can be executed by the accurate telephone number without accurately checking the position, display, etc., of the telephone number by visual operation.
Patent JP-H0682119-A (JP)
Title: Air-conditioning apparatus
Inventor: UENO KIYOTAKA
IPC: F24F3/00
Filed: 1992-09-02
Abstract: PURPOSE:To obtain an air-conditioning apparatus which enables the supplying of cool and hot air to a plurality of rooms simultaneously. CONSTITUTION:Room heat exchangers 24 and 34 perform functions as evaporator and condenser simultaneously to execute a simultaneous cooling/heating operation. In the simultaneous cooling/heating operation, the capacity of a compressor 1 and opening of flow regulating valves 21 and 31 are controlled so that detected temperatures of air for air-conditioning via the room heat exchangers 24 and 34 reach set values for cooling and heating respectively. Moreover, in the simultaneous cooling/heating operation, cooling and heating loads of individual rooms are determined to obtain necessary amount of air of the rooms is determined from the cooling and heating loads from cooling and heating loads thus obtained. Thus, the speed of a fan 43 and the openings of dampers 45a and 45b are controlled to satisfy the necessary amount of air.
Patent JP-H0397034-A (JP)
Title: Program correcting device for terminal machine
Inventor: AIZAWA NORIO
IPC: G06F13/00
Filed: 1989-09-11
Abstract: PURPOSE:To considerably shorten the time required for the change of an application program by storing the application program and the version indicating the revision number of the program in a program memory and storing only the version and correction information corresponding to this version in a non- volatile memory to correct the program before the actual start of job. CONSTITUTION:The version indicating the revision number of a pertinent application program is stored together with the application program in the program memory consisting of a ROM 23 or the like. The version and correction information corresponding to this version are stored in a non-volatile memory 26. The application program read out from the program memory 23 is corrected with correction information stored in the non-volatile memory 26 before the start of job at the time of power-on or the like. Thus, the actual job is started with the corrected application program.
Patent JP-S6477510-A (JP)
Title: Clamping device of mold
Inventor: HATTORI YOSHIHIKO
IPC: B29C45/67
Filed: 1987-09-18
Abstract: PURPOSE:To generate a necessary mold clamping force with small driving force by a method wherein the pressure bearing area of a second ram is made larger than that of a first ram, and a specified mold clamping holding mechanism, which contains a unidirectional valve means, is provided in a connecting passage between a first and a second oil chambers. CONSTITUTION:When a ram 44 is raised by the actuation of a hydraulic cylinder 42, a first ram 20 is pushed upwards, resulting in flowing the working oil in a first oil chamber 24 through a connecting passage 34 and a check valve 38 in the midway of the passage 34 into a second oil chamber 28. Since the pressure bearing area of a second ram 26 is made larger than that of the first ram 20, the driving force applied to the ram 20 is boosted at the ram 26. Even after the injection of rubber material with an injection device and the following lowering of the ram 44 in the hydraulic cylinder 42, the oil pressure developed in a second oil pressure 28 is retained so as to maintain the mold clamped state. When molds 16 and 30 arrive a mold opening station, pilot operating pressure is fed to the check valve 38 so as to open the check valve and consequently to let the oil pressure escape in the second oil chamber 28 to the first oil chamber 24 in order to release the mold clamping force.
Patent JP-H04115500-A (JP)
Title: Thinning method of particle in particle accumulation ring
Inventor: NAKAMURA TAKESHI
IPC: H05H7/10
Filed: 1990-09-05
Abstract: PURPOSE:To eliminate necessity of adjustment of d.c. components by using a signal indicated by a specific formula 3, in which a.c. signal indicated by a specific formula 2 is amplitude modulated by a.c. signal indicated by a specific formula 1, and making '0' at electrode pass time of particle desired to be left in a ring, as RF knockout signal. CONSTITUTION:A signal indicated by a formula 3, in which a.c. signal indicated by a formula 2 is amplitude modulated by a.c. signal indicated by a formula 1, is added to an electrode 16, as RF knockout signal. The RF knockout signal can be thus synthesized using only a.c. signals and can eliminate necessity of adjustment of amplitudes of d.c. component and a.c. component.
Patent JP-H08101226-A (JP)
Title: Bearing unit with rotational-speed detection device
Inventor: SAKAMOTO MITSUYOSHI
IPC: B60T8/171
Filed: 1994-09-29
Abstract: PURPOSE: To obtain a bearing unit in which the strength of a fixed ring is held and which can be made small and lightweight by a method wherein the inside diameter of a through hole made in the fixed ring is made small. CONSTITUTION: A tone wheel 21 is fixed to the outer circumferential face in the intermediate part of a rotating ring 5, and a sensor 24 is fixed to the inner circumferential face in the intermediate part of a fixed ring 2. The sensor 24 comprises a socket 32 for signal pickup. A plug 42 is inserted from a through hole 36 made in a part of the fixed ring 2, the tip of the plug 42 is inserted into the socket 32, and a signal voltage which is induced in the part of a coil 27 is taken out.
Patent JP-2001059401-A (JP)
Title: Rotor cooling air supply device
Inventor: ICHIYANAGI TAKU
IPC: F01D25/10
Filed: 1999-08-23
Abstract: PROBLEM TO BE SOLVED: To manufacture a rotor cooling air nozzle at a low cost and with high accuracy. SOLUTION: Cooling air is supplied from a cooling air nozzle 71 to an axially annular cooling air passage 30 which is formed in the inside of the rotor shaft 11 of a gas turbine rotor 10. The cooling air nozzle 71 is formed as a plurality of approximately straight tubular air passages having a circular cross section which is opened at equal intervals in an annular nozzle member 70 arranged to surround the inlet circumference of the annular cooling air passage 30. Thereby, the cooling air nozzle 71 can be manufactured with high accuracy and with ease by means of mechanical work.  Each cooling air nozzle 71 is arranged at an angle to the axial direction with a rotor shaft peripheral tangential direction so that an ejected cooling air flow has a component of velocity in the direction of the rotor shaft peripheral tangent which is approximately equal to a rotor shaft peripheral speed and a component of velocity in a rotor shaft axial direction which is approximately equal to an axial component of cooling air flow speed in the cooling air passage 30. Therefore, pressure loss caused by change in cooling air direction can be reduced.