baber/WOPTO huggingface dataset:
Patent JP-H0681740-A (JP)
Title: Diaphragm pump
Inventor: ITO KAZUHIRO
IPC: F02M37/12
Filed: 1992-08-28
Abstract: PURPOSE:To prevent the damage to a fuel injection diaphragm pump due to discharge pressure lowering by the air intake of a motor-driven feed pump. CONSTITUTION:The driving current of a motor-driven feed pump for supplying fuel to a diaphragm pump 10, is detected by an ammeter 31 to be inputted in an electronic control unit (ECU) 30. When the variation width of the driving current of the feed pump, detected by the ammeter 31, exceeds a specified value, the intake of air by the feed pump is judged in the ECU 30 to stop an engine.
Patent JP-S6290793-A (JP)
Inventor: MORI SHOICHI
IPC: G07D9/00
Filed: 1985-10-16
Abstract: (57)【要約】本公報は電子出願前の出願データであるた め要約のデータは記録されません。
Patent JP-H0572092-A (JP)
Title: Friction life evaluation device for solid lubricant film
Inventor: YASUDA YOSHITERU
IPC: G01N3/56
Filed: 1991-09-10
Abstract: PURPOSE:To decrease scattering, shorten evaluation testing time and evaluate the friction life of solid lubricant film by attaching a position sensor and a vibration sensor on a part of a weight load axis doubling as a rotation axis, and detecting the position change and the vibration of the rotation axis. CONSTITUTION:By operating the power sources 7 and 17 for driving both rotation axes, both solid lubricant film attaching rings 5 and 15 are rotated in opposite directions. At the same time, one ring 15 is pushed to the other ring 5 by the weight of a bob 19. During this evaluation test, the position change in the weight load axis and rotation axis 14 is detected by a gap sensor 23 and a gap sensor signal processor 25. Also with an acceleration pickup 27 and an acceleration pickup signal processor 28, the vibration of the rotation axis 14 during the test is detected. Thus by detecting the change in the position and vibration of the rotation axis 14 due to the friction, partial break and the like of the solid lubricant film, friction life evaluation for the solid lubricant film is done. This evaluation has small scattering and takes a short testing time.
Patent JP-H0877563-A (JP)
Title: Optical card driving method and optical information recording and reproducing device
Inventor: NODA KAZUO
IPC: G11B7/0033
Filed: 1994-08-31
Abstract: PURPOSE: To accelerate the recording/reproducing of information on an optical card, to miniaturize an optical card drive mechanism, to reduce power consumption and to prevent the occurrence of vibration of a drive part by winding the optical card around a cylindrical body and rotating the cylindrical body. CONSTITUTION: The flexible optical card 1 arranging side by side plural tracks is wound around the cylindrical body 8 so that the tracks prolong along the circumference direction. By rotating the cylindrical body 8 in one direction, the optical card l is displaced relatively for a recording or reproducing optical head, and the recording or the reproducing on the tracks is performed. Thus, the drive motion of the optical card 1 for recording/reproducing may be settled only by rotation driving at a fixed speed, and the necessity of repeating rapid reduction and rapid acceleration like usual reciprocal motion is eliminated.  Thus, the recording/reproducing speed of information is increased, and further, mechanical vibration caused by the reciprocal motion repeating rapid reduction and rapid acceleration is eliminated, and the drive mechanism is miniaturized, and power consumption is reduced.
Patent JP-H0876041-A (JP)
Title: Laser scanning optical device
Inventor: KATSURAGAWA TAKU
IPC: G02B7/02
Filed: 1994-08-31
Abstract: PURPOSE: To easily and accurately fix a toroidal lens at an optimum position. CONSTITUTION: As for this laser scanning optical device constituted of a light emitting part 1 emitting a laser beam, a toroidal lens 2 focusing the laser beam from the part 1 in the up-and-down direction, a polygon mirror 3 reflecting and scanning the laser beam transmitted through the lens 2, a polygon motor 4 rotating the mirror 3, an f-θ lens 5 focusing the laser beam reflected by the mirror 3, a synchronizing sensor 6 generating a synchronizing signal, a slit 7 adjusting the incident position of the light toward the sensor 6, and a chassis 8 holding the respective parts, and the lens 2 can move in the scanning direction, a wave-formed retaining groove is formed on both side surfaces of the base part of the lens 2, and a catch engaged with the retaining groove by energizing is provided.
Patent JP-H1175241-A (JP)
Title: Phs position information retrieval method
Inventor: HAGINO TERUO
IPC: H04W4/02
Filed: 1997-08-27
Abstract: PROBLEM TO BE SOLVED: To flexibly manage position information at a supervisory center side. SOLUTION: A supervisory center 1-5 manages each terminal 1-1 through the provision of a telephone number, notice period or time table and makes setup (1) with each terminal based on the table and sets the notice period or time to its outgoing subaddress for the notice, and each terminal 1-1 stores the notice period or time in its outgoing subaddress and each terminal 1-1 sends an ID of a PHS base station and its reception level having been received by its terminal as position information when the stored period or time comes round.
Patent JP-H0637334-A (JP)
Title: Structure of pressure sensor
Inventor: OIZUMI MAKOTO
IPC: G01L9/04
Filed: 1992-07-16
Abstract: PURPOSE:To enlarge a change in resistance by forming a rectangular diaphragm on the surface of a silicon wafer by anisotropic etching. CONSTITUTION:A rectangular diaphragm 3 of 1.4X2.1mm is formed on the surface side of a silicon wafer 2 by anisotropic etching. On the rear side, an insulating film 5 is formed by thermal oxidation or the like, polycrystalline thin film strain gages 1 are deposited thereon by P. C. V. D. or the like and patterned and thereby an SOI structure is prepared. Thereafter a protective film 6 of Si3N4 or the like and an electrode film 7 of Al or the like are formed and patterned 4 and thereby an active bridge is constructed. In this case, polycrystalline thin film strain gages 1 are disposed in parallel to a short side Al and a short side A2 of the diaphragm 3 and in the center between the short side A1 and the short side A2 so that they are in accord with the direction of a current and in such a manner that two of them are disposed in the vicinity of the center of the diaphragm and two in the vicinity of edges thereof. By making the direction of a higher stress be in accord with the direction of the current of the polycrystalline thin film strain gages 1, a change in the resistance of the poly-crystalline thin film strain gages 1 can be enlarged.
Patent JP-S6387485-A (JP)
Inventor: YAMAGISHI YASUYUKI
IPC: B66B1/18
Filed: 1986-10-01
Abstract: (57)【要約】本公報は電子出願前の出願データであるた め要約のデータは記録されません。
Patent JP-2000065685-A (JP)
Title: Method and apparatus for adjustment of position of light- source array
Inventor: KIMURA TETSUYA
IPC: G01M11/00
Filed: 1998-08-18
Abstract: PROBLEM TO BE SOLVED: To obtain a method and an apparatus in which the position of a light-source array can be adjusted at high speed and with high accuracy and whose costs can be reduced by a method wherein the position is adjusted on the basis of quantities of light of light beams which are passed through a plurality of aperture which are formed in corresponding positions on a scanning face and whose aperture area is different. SOLUTION: Quantities of light of four semiconductor lasers near the center of a semiconductor laser array 111 are captured by a photodetector 30 via a square hole 20. Positions in the X-axis direction and the Z-axis direction of the array 111 are adjusted roughly. Then, quantities of light of two laser beams near both ends in the X-axis direction are captured in the center in the Z-axis direction of the array 111 by optical sensors 3A, 3B via slits 2a, 2b, and the array 111 is turned around the Y-axis. In the same manner, quantities of light of two laser beams at both ends in the X-axis (or Z-axis) direction are captured by optical sensors 3C, 3D and 3E, 3F in the center in the Z-axis (or X-axis) direction of the array 111, and the array 111 is turned around the Z-axis and the X-axis).  Lastly, a prescribed quantity of light is captured by the optical sensors 3C to 3F via pinholes 2c to 2f, and the array 111 is moved to Y-axis direction.
Patent JP-S59121794-A (JP)
Inventor: SUZUKI KOUJI
IPC: H05B6/50
Filed: 1982-12-28
Abstract: (57)【要約】本公報は電子出願前の出願データであるた め要約のデータは記録されません。
Patent JP-H01111661-A (JP)
Title: Handle
Inventor: TAIMOSHII JIEEMUSU JIYONDOROU
IPC: E05B65/52
Filed: 1988-09-14
Abstract: PURPOSE:To permit an easy setting of a service position and a housing position, by the provision of a link member pivotally mounted between a handle member and sliding members, a biasing means to move the sliding members to an inward position and a latch means movable between an open and a close position. CONSTITUTION:One end of each of links 24 and 26 is pivotally mounted to the ends of a handle member 22 and the other end of each link is pivotally mounted to sliding members 40 and 42. A biasing means such as a spring 50 is mounted to the undersides of the sliding members 40 and 42 to permit their movement to the inward position. When a handle member 20 is located in a lower (housing) position, a latch moving means 30 is moved from its inward to outward position, whereby a strip (link) 60 can be moved as desired; whereas, when the handle member 20 is located in an upper (service) position, neither of the latch moving members 30 and 32 can move to the outward position. Therefore, with the handle member 20 located in the upper position, a latch 70 cannot be moved to a open (releasing) position by the latch moving means 30 and 32.
Patent JP-H1174165-A (JP)
Title: Manufacture of semiconductor device
Inventor: KARAKAMA SHUNSAKU
IPC: H01L21/02
Filed: 1997-08-27
Abstract: PROBLEM TO BE SOLVED: To provide a method of manufacturing a semiconductor device, wherein cracks are prevented from occurring in a passivation film due to the warpage of a semiconductor wafer, when a dielectric film formed on the rear of the semiconductor wafer is removed, and furthermore an electrode wiring layer is protected against disconnection induced by the cracks, so as to prevent the semiconductor device from deteriorating in manufacturing yield and reliability. SOLUTION: A thermal oxide film 12 formed on the surface of a semiconductor wafer 10 is covered with a silicon nitride film 16, and then a thermal oxide film 14 formed on the rear of the semiconductor wafer 10 is patterned, as well as the thermal oxide film 12 formed on the surface of the semiconductor wafer 10 and processed into thermal oxide films 14a. Therefore, the thermal oxide film 14 is lessened in volume, so that the tensile stresses imposed on the rear of the semiconductor wafer 10 are reduced. After the silicon nitride film 16 has been removed, the thermal oxide film 12 formed on the surface of the semiconductor wafer 10 is patterned into thermal oxide films 12a.
Patent JP-H04245153-A (JP)
Title: Cathode-ray tube sealed by using epoxy resin-polyamide resin adhesive
Inventor: KIN KOUTOKU
IPC: H01J9/26
Filed: 1991-09-11
Abstract: PURPOSE: To improve productivity and reduce consumption of energy by sealing a funnel and a panel with (an adhesive) mainly composed of epoxy resin- polyamide resin. CONSTITUTION: In a cathode-ray tube comprising a funnel, a panel provided at an edge, of the funnel and an electron gun situated at the inside of a neck of the funnel, at least one of a connection between the funnel and the panel and a connection between a terminal end of the neck of the funnel and a stem of the electron gun is sealed with an adhesive of epoxy resin-polyamide resin. Accordingly, it is possible to reduce the sealing time by 2 hours or more and also reduce the sealing temperature by more 300 deg. or more. It is desirable to fix the ratio of epoxy resin and polyamide resin in a range from about 60:40 to about 80:20 on the base of the total weight of adhesive.
Patent JP-S6386127-A (JP)
Title: Production of optical information-recording medium
Inventor: OKAWA HIDEKI
IPC: B41M5/26
Filed: 1986-09-30
Abstract: PURPOSE:To uniformize optical characteristics and to improve stability by projecting light of a specific wavelength in parallel with a substrate at the time of charging the substrate into a vacuum vessel, sputtering Te and Se in gaseous hydrocarbon and forming a recording film thereon. CONSTITUTION:After the substrate 3 is mounted to a substrate rotor 2, the inside of a vacuum chamber 1 is evacuated to a vacuum. The gaseous hydrocar bon is then introduced from an introducing pipe 7 into the vessel and the sub strate 3 is rotated, then sputtering is executed by supplying electric power from a DC power source 5 in such a manner that a tellurium target 4 is a cathode. Laser light of <=300nm wavelength is projected from an excimer laser 10 in parallel with the surface of the substrate 3 simultaneously therewith. The org. tellurium compd. formed at the time of sputtering is thereby cracked and the Te and Se are straightly deposited on the substrate 3 to form the record ing film. The taking of the org. metal compd. into the recording film is, there fore, obviated, by which the optical characteristics are uniformized and the stability thereof is improved.
Patent JP-2001055586-A (JP)
Title: Coal-gasifying plant
Inventor: UEDA AKIO
IPC: C10J3/46
Filed: 1999-08-18
Abstract: PROBLEM TO BE SOLVED: To prevent char from flowing into equipments located in the downstream by immediately detecting a damage when a filter element placed in a char collecting equipment is damaged. SOLUTION: A fine coal particle 1 and an oxidant 2 are heated at a high temperature and gasified in a gasification furnace 10, the generated gas is then fed to a char collecting equipment 31 and the char in the gas is collected by a filter element 31 A. A high pressure gas is ejected from a line 38 to conduct back washing of the filter element 31A to peel the char. The peeled char is returned to the gasification furnace 10 via a line 5 for gasification.  In the outlet of the char collecting equipment 31 of the coal gasification plant are placed an auxiliary filter 100 which collects char scattering in case of a damage of the filter element 31 A, a differential pressure gauge 101 which detects differential pressure between the upstream portion and the downstream portion of the auxiliary filter 100 and a control system 103 which stops feeding the fine coal particle 1 and the oxidant 2 when the detected differential pressure exceeds a predetermined value.
Patent JP-S60128174-A (JP)
Inventor: NAKADA MINORU
IPC: B66B1/16
Filed: 1983-12-08
Abstract: (57)【要約】本公報は電子出願前の出願データであるた め要約のデータは記録されません。
Patent JP-H0538212-A (JP)
Title: Self-propelled transplantation machine
Inventor: YAMAZAKI TONARI
IPC: A01C11/02
Filed: 1991-09-11
Abstract: PURPOSE:To obtain the subject transplantation machine capable of stopping a planting part in the case of retreating the machine by placing a forcedly disconnectable one-way clutch in a ground-speed transmission system of a planting part. CONSTITUTION:A tamping wheel 111 is attached to a wheel stay 110 attached in a swingable manner to an intermediary shaft 11 at the back of a machine body 1. The intermediary shaft 11 is provided with a one-way clutch 115 which is connected in a forwarding stage. During the transplantation work, the planting part, etc., are driven by the rear wheel at the ground speed through the clutch to prevent the reverse rotation of the planting part. In case of manual retreating motion, the clutch is disconnected by a shifter 117 to prevent the driving of the planting part, etc.
Patent JP-H0954431-A (JP)
Title: High resistance black radiation sensitive resin composition, black hardened film and black image forming method
Inventor: KOYANAGI TAKAO
IPC: C09D7/12
Filed: 1995-08-18
Abstract: PROBLEM TO BE SOLVED: To provide a black radiation sensitive resin compsn. having high resistance, excellent in photosensitivity, light shielding property and dispersion stability, capable of easily producing a high definition black matrix and useful to produce a color filter, a sensor, etc. SOLUTION: This compsn. consists of a compd. and/or a resin capable of causing a crosslinking reaction when irradiated optionally as a combination with other radiation sensitive resin and titanium black surface-treated with a silane compd. or consists of a compd. and/or a resin capable of causing a crosslinking reaction when irradiated, titanium black surface-treated with a silane compd., carbon black and an org. pigment blackened by mixing different colors. A pattern is formed using this compsn.
Patent JP-H0877240-A (JP)
Title: Logical simulation method for lsi
Inventor: SUGANO SATOSHI
IPC: G06F17/50
Filed: 1994-09-01
Abstract: PURPOSE: To perform high-precision logical simulation matching a circuit simulation result in a short time with a small number of parameters by calculating the delay time required for the output voltage value of a CMOS gate to vary as specified on the basis of specific conditions. CONSTITUTION: Output load capacity CL and an input transition time TTi are given and the delay time (t) required for the output voltage value of the CMOS gate to reach V0 is calculated from an equation with a small number of parameters. Here, VTH is the threshold value of a MOS transistor(TR), a is the gradient of ln1IDS and ln1VGS-VTH1, and β is the utilization coefficient of the MOS TR. For the equation, a value which is closer to that of an actual device is used as the gradient of the drain current and gate voltage of the MOS TR in consideration of the input transition time TTi. Consequently, the high-precision simulation well matching the circuit simulation result can be performed in a short time with a small number of parameters.
Patent JP-2000208268-A (JP)
Title: Light emitting element
Inventor: TOMINAGA TAKESHI
IPC: G09F13/22
Filed: 1999-08-19
Abstract: PROBLEM TO BE SOLVED: To provide a red light emitting element having high color purity by including at least a naphthalimide derivative having a fluorescence peak wave length being in a specific range and a compound having a pyrromethene skeleton or the metallic complex. SOLUTION: A light emitting material emits the light in a peak wave length of 580 nm to 720 nm by electric energy. This light emitting material includes a naphthalimide derivative having a fluorescent peak wave length of 540 nm to 720 nm and a compound having a pyrromethene skeleton or the metallic complex. The pyrromethene skeleton is expressed by the formula. In the formula, R1 to R7 may be the same or may be different, and are hydrogen, alkyl, alkoxy, halogen, aryl, aralkyl, alkenyl or the like, X is carbon or nitrogen, but in the case of nitrogen, R7 does not exist. B, Be, Mg, Cr, Fe, Co, Ni, Cu, Zn, Pt or the like are desirably cited as metal capable of coordinating with the metallic complex.
Patent JP-S6385480-A (JP)
Title: Projecting device
Inventor: HOSOBANE MINORU
IPC: G01T1/161
Filed: 1986-09-30
Abstract: PURPOSE:To calculate distribution to plural sampling points at a high speed by calculating previously the values of the respective distribution quantities of plural positions of pixels and storing as a table, and reading the table of projection directions and object pixels of projection. CONSTITUTION:The value of the projection quantity of every finite number of positions is written previously in a distribution memory 5 according to the distribution of the projection quantity of one pixel determined by a projection direction. When a projection direction and a pixel position are specified, the projection position of the center point of the pixel and sampling points at its periphery are calculated by an address calculator 2. A projection value of each position of a pixel in the due projection direction is read out of the distribution memory 5 and added by an adder 6 and the quantity of distribution to respective sampling points is calculated by a distribution calculator 3. The concentration distribution of nuclear species stored in a tomographic image memory 1 is read out and the concentration value regarding this pixel is multiplied by the distribution quantity by multipliers 8 and 9, and the results are stored in a synogram memory 12.
Patent JP-H0577035-A (JP)
Title: Reflow apparatus
Inventor: MATSUMOTO MASAYA
IPC: H05K3/34
Filed: 1991-09-12
Abstract: PURPOSE:To obtain a reflow apparatus resisting to the change of conditions and the disturbance by using plural factors, such as N2 flow rate, surrounding temp., number of the revolution of a fan, giving effect to the temp. in the reflow apparatus as the additional factors. CONSTITUTION:Temp. measuring means (1-1) are arranged in a preheating furnace 6, soldering heating furnace 7 and cooling chamber 8 and also an N2 flow rate measuring means (1-2), surrounding temp. measuring means (1-3) and the number of the revolution of the fan measuring means (1-4) are arranged. In a control part 9, a fetching means fetching the measured data as the factor, a tuning means for control rule and a calculating means are arranged. The measured result in the measuring means is fetched into the fetching means as the operational quantity calculating factor and transmitted to the calculating means, and the control rule in the calculating means is inputted into the tuning means. By using a fuzzy control theory with the operational quantity calculating factor, the operational quantity is calculated with the calculating means and by the operational quantity, the temp. control is executed with the control part 9.
Patent JP-H0788754-A (JP)
Title: Polishing device
Inventor: ARIMOTO YOSHIHIRO
IPC: H01L21/304
Filed: 1993-09-20
Abstract: PURPOSE:To provide uniform polishing further with small damage, in a polishing device for flattening a surface of semiconductor wafer or the like formed with a coating film. CONSTITUTION:A disk 13 and a weight 15 are mounted on an intermediate part of a lever 14, having a supporting point in one end part, and on the other end part respectively, to fix a magnet 18 to a lower part of the weight 15, and an electromagnet 19 is arranged adjacent to the lower of the magnet 18. A workpiece polished object (wafer) 1 is mounted on a lower surface of the disk 13, to polish the wafer pressed to a rotating polishing cloth 12. Here when electrified the electromagnet 19, attractive or repulsive force is generated between the magnet 18 and the electromagnet 19, and this force is overlapped with gravitational force of the weight 15, to adjust a polishing pressure. The polishing pressure can be controlled by an electrification current of the electromagnet 19.
Patent JP-H09132521-A (JP)
Title: Long acting composition for rectal administration
Inventor: KONDO YASUSHI
IPC: A61K31/135
Filed: 1996-09-03
Abstract: PROBLEM TO BE SOLVED: To obtain a composition, hardly diffusing a medicine from a rectal tissue and enhanced in persistence of the medicine in the rectal tissue by using the medicine used for hemorrhoids or cancer of the rectum with a specific base and a vasoconstrictor in combination. SOLUTION: This long acting composition for rectal administration is obtained by using a therapeutic agent for rectal tissues and a retentive base ingredient for rectal administration and a vasoconstrictor in combination. One or more acrylic acid polymer, an alkali metallic salt of a polygum, a a phyllosilicate mineral and an acrylated starch are preferred as the retentive base ingredient for the rectal administration. Among them, the acrylic acid polymer is preferred (a carboxyvinyl polymer is especially preferred). One or more of tetrahydrozoline hydrochloride, naphazoline hydrochloride or oxymetazoline hydrochloride are preferably used as the vasoconstrictor. The acrylic acid polymer is blended in an amount of 0.1-20wt.% based on the total amount of the composition and the vasoconstrictor is blended in an amount of 0.005-2.0wt.% based on the total amount of the composition.