baber/WOPTO huggingface dataset:
Patent TW-429313-B (TW)
Title: Front stage circuit of oscilloscope having automatic calibration function and its automatic calibration method
Inventor: TSAI JUNG-SHIAU
IPC: G01R15/08
Filed: 1999-04-14
Granted: 2001-04-11
Abstract: This invention is about front stage circuit of oscilloscope having automatic calibration function and its automatic calibration method, in which the inconvenience and inaccuracy caused by manual and eye-checked errors of the conventional calibration method can be avoided. The front stage circuit of oscilloscope is composed of attenuator, resistance converter, magnification rate amplifier, analog/digital (A/D) converter, feedback controller and digital/analog (D/A) converter. The attenuator is used to attenuate input signal such that input signal is within the admitted range. The resistance converter is connected with attenuator so as to increase input resistance of oscilloscope front stage circuit. The magnification rate amplifier is connected with resistance converter to amplify input signal stated above. The feedback controller provides predetermined signal to the attenuator and, according to the output of magnification rate amplifier through A/D converter, adjusts the compensation voltage of resistance converter, the compensation voltage of multiplier and the multiple number of gain through D/A converter.
Patent TW-401319-B (TW)
Title: A chemical solution treatment equipment
Inventor: NIIYAMA KISABURO
IPC: B05B15/00
Filed: 1999-04-15
Granted: 2000-08-11
Abstract: It is possible to provide a solution treatment equipment. Firstly, it is possible to eliminate the accumulation to unify the chemical processing.  Secondly, it is possible to eliminate the flow-out of the chemical solution in left-right of a wide direction. It is also possible to unify the chemical processing from this aspect. Thirdly, it is possible to realize the excellence in the equipment cost or setup space. Fourthly, furthermore, the chemical solution will not reach the rollers and wheels of the conveyer that may be spray-spread. Thus, its processing capability is upgraded. Fifthly, it is possible to eliminate the bending or spring-back of the substrate of printed circuit board. Sixthly, it is possible to prevent the gasification of the chemical solution. This chemical treatment equipment is comprising of: a tank 9 which is full with the same solution as the injected chemical solution; a conveyer 2 to transport the clamped substrate A mounted in the chemical solution B of tank 9; and a chemical solution injection device 10 such as the slit injection orifice or spray nuzzle which injecting the said fresh chemical solution B toward to the substrate A transported with a very small up-down interval L.
Patent TW-423114-B (TW)
Title: Method of place and route for integrated circuit
Inventor: LIOU WEN-CHIN
IPC: H01L21/82
Filed: 1999-04-30
Granted: 2001-02-21
Abstract: This invention provides the method of place and route for integrated circuit. This method has to consider the backend route rule before the layouts of poly silicon gate layer, diffusion region and isolation region. Besides the fulfillment of grid size with the conduction wire pitch, pattern similar to that on the western chessboard is used to confine the via hole position in between the connecting layers of inter metal wire and the connection cell is used as the automatic layout connection at the grid position that is allowed to form the via hole.
Patent TW-415038-B (TW)
Title: Semiconductor integrated circuit
Inventor: OHASHI MASAYUKI
IPC: H01L21/822
Filed: 1999-04-30
Granted: 2000-12-11
Abstract: This invention is to prevent the input characteristic of a reference-type input first-stage circuit from lacking of margin due to shifts in a power supply voltage or a GND level caused by position. A voltage generated by a reference potential generating circuit 1 is divided into reference potentials VREFA and VREFB by a resistance voltage divider R1-R8. In reference-type first-stage circuits A and B, an Al wiring is changed by selection circuits 4 and 5 through a master slice method, corresponding to input characteristics to select either of the reference potential VREFA and VREFB. In an evaluation test after a wafer process has been carried out, when the input characteristic of a reference-type input first-stage circuit lacks in margin, fuses F1 to F4 are fused for controlling.
Patent TW-505561-B (TW)
Title: A resin film having excellent embossing ability and make-up metal plate covered with said resin film
Inventor: IWASHITA HIROYUKI
IPC: B32B15/08
Filed: 1999-08-02
Granted: 2002-10-11
Abstract: It is an object to provide a resin film having excellent emboss ability and a make-up metal sheet covered with said resin film. It is another object to provide a resin film used for water proof building material such as bath unit and a make-up metal sheet covered with the resin film. A resin film of the present invention is characterized in that value related to DSC given by the following equation is 60 or less. Value related to DSC (DEG C)=Tmp-Tc2 where, Tmp (DEG C) is an endothermic peak temperature in the heating process measured by DSC, and Tc2 (DEG C) is an exothermic peak temperature in the cooling process measured by DSC.
Patent TW-425657-B (TW)
Title: Method for fabricating a semiconductor device
Inventor: HWANG CHUL-JU
IPC: H01L21/76
Filed: 1999-08-12
Granted: 2001-03-11
Abstract: A method for fabricating a semiconductor device is provided, in which a tantalum oxynitride film is used as a high-permittivity capacitor dielectric film. In the method of the present invention, all or some of the process steps required for the formation of the capacitor are conducted in situ in a same reactor, thereby the growth of a native oxide layer and the generation of contaminants can be effectively prevented. According to the present invention, the performance of the capacitor is greatly enhanced.
Patent TW-561314-B (TW)
Title: Resist material and pattern forming method
Inventor: WATANABE SATOSHI
IPC: G03F7/00
Filed: 1999-09-22
Granted: 2003-11-11
Abstract: This invention is to obtain a resist material by incorporating a specified fluorine-based surfactant which decreases the contact angle of the interface with water or the like on the resist material surface applied on a substrate with an increase of the added amount of the surfactant. The invented resist material has the following properties: a good film uniformity, free of coating defects, excellent wetting property with an alkali developer, increasing no particles in the solution, good storage stability, and having good sensitivity, resolution and reproducibility to high energy radiations. Thus, the invented resist material, due to these properties, is particularly suitable for the formation of fine patterns for the production of an ultra-LSI under the exposure of a laser light, in particular KrF, and ArF laser.
Patent TW-463147-B (TW)
Title: Tray with cassette opening mechanism
Inventor: LIANG RUEI-LIN
IPC: G11B17/00
Filed: 1999-11-17
Granted: 2001-11-11
Abstract: A tray with a cassette opening mechanism comprises: an arm installed on the tray body, and a torque spring. The arm can easily open the protective cover of the disk cassette installed in the tray body. When removing the disk cassette, the arm can restore to its original position due to the action of the torque spring. In comparison with a conventional complicated cassette opening mechanism, the present invention can achieve the same function with two elements, while solving the defects in design and application in a conventional cassette opening mechanism.
Patent TW-402492-B (TW)
Title: The manufacture method of the skidproof pad with environmental protection function
Inventor: SHIU TANG SHU-DUAN
IPC: A47G27/02
Filed: 1999-12-29
Granted: 2000-08-21
Abstract: This invention relates to a manufacture method of the skidproof pad with environmental protection function. The said manufacture method is mainly to immerse the reticular substrate in the coating material, and to let the denser portion of the substrate adhere to more coating material; Acrylamide emulsion resin is used as the major agent of the coating material for its and non-toxic gas producing property. The agent then is mixed with the aid agent, which is composed of hardening agent, catalyst, foaming agent and filler, in a specific gravity to form the vesicant coating material. The substrate is being heated and foaming after immersing in the coating material; And the positions, which adhere more coating materials, would blow into beehive-like bubble tissue. The concave surfaces on the outside wall of the bubble tissue compose individual vacuum suckers to adhere on the surface of contact object. The skidproof effect is elevated without viscidity and toxic gas production. It could replace the PVC (poly-vinyl chloride) product and supply the manufacture with: the housewares goods such as skidproof pad, lunch pad, tablecloth to achieve the global environmental protection purpose.
Patent TW-451305-B (TW)
Title: Method of forming tungsten layers and laminate structure of tungsten layers
Inventor: AIBA YASUSHI
IPC: C23C16/08
Filed: 2000-01-11
Granted: 2001-08-21
Abstract: While supplying a process gas including a raw material gas formed by a fluorinated tungsten gas (e.g., WF6) and a reducing gas (e.g., H2 gas) for reducing the raw material gas, a tungsten layer is formed on the surface of an object to be processed (e.g., semiconductor wafer). Under such a condition, an intermediate tungsten film forming step is applied between a nucleated crystal film forming step for forming a nucleated crystal film of tungsten on the surface of the object to be processed and a main tungsten film forming step for forming a main tungsten film on the nucleated crystal film. The intermediate tungsten film forming step being compared with the main tungsten film forming step, a lessened flow ratio of the raw material gas to the reducing gas is used to form the intermediate tungsten film. Hence, the incubation time T2 after formation of the nucleated crystal film is obviated, which may enhance the overall average film forming speed. Besides, the uniformity of the film thickness among the objects to be processed can be improved.
Patent TW-432226-B (TW)
Title: Apparatus of optical image formation to improve the resolution
Inventor: KIKKO SHIGEO
IPC: G02B27/18
Filed: 2000-01-21
Granted: 2001-05-01
Abstract: Remove the part of image with larger curvature of field to provide an image formation apparatus with resolution improvement. The unity magnification imaging rod lens array (2) is made of lenses (1) having refractive index distribution in a radial direction in a line so that their optical axes may be parallel with each other in a row. And the optical image formation apparatus is manufactured by set object surface (3) and image surface (4) at each side of the rod lens array. Masks with rectangular opening (5) are installed at both ends of each rod lens to cover both ends in the Y-axis direction of rod lens (1). (the long direction of rod lens array (2))
Patent TW-541241-B (TW)
Title: Preliminary stage for mass production of (waterproof) paper bags
Inventor: LIN TIAN-LIANG
IPC: B31B21/60
Filed: 2000-07-14
Granted: 2003-07-11
Abstract: This invention is related to a preliminary stage for mass production of (waterproof) paper bags, comprising a multi-staged process in which number of manufacturing steps is reduced and manufacturing flow is shortened to thereby increase throughput, reduce costs and labors, thus giving remarkable process to the industry. The plastic film coating on an outer layer blocks water and moisture to thereby reduce fracturing caused by deterioration of the paper bag due to being softened by the moisture and objects drops, so as to prolong strength and service life of the paper bag to allow reuse by the users, remarkably enhancing the function and object of the associated industrial process.
Patent TW-I249551-B (TW)
Title: Method and composition for improving gas barrier properties of polymeric containers and films
Inventor: POLTZKER IRENE GREENWALD
IPC: C08K5/00
Filed: 2000-08-11
Granted: 2006-02-21
Abstract: A polymer composition and method for reducing the permeability of gases through molded polymeric containers and films by incorporating into the polymer from which the container or film is formed an effective amount of a barrier enhancing additive, such as monoesters of hydroxybenzoic acid and hydroxynaphthoic acid.
Patent TW-521532-B (TW)
Title: Subscriber station network control means and method for carrying out inter-frequency measurements in a mobile communication system
Inventor: PETERSSON JUSTUS
IPC: H04B7/005
Filed: 2000-08-21
Granted: 2003-02-21
Abstract: In a mobile communication system (T1) a time interval selection means (TIFM) in a network control means (RNC) determines a time interval and sends an indication about this time interval to a subscriber station (MS) in a time interval indication signal. A time interval signal determining means (TIFDM) in the subscriber station (MS) detects the time interval and an IF measurement means (IFMM) carries out inter-frequency/inter-system measurements in the detected time interval specified by the network control means (RNC). In this time interval the temporary reduction of the quality of service QoS on the communication connection (CC) is planed by the network control means (RNC). However, independent as to whether a delay-sensitive or loss-sensitive data transmission is carried out, the network control means (RNC) can make provisions in order to compensate the temporary reduction of the quality of service. Such procedure is superior to performing IF measurements in an idle time interval of a compressed time slot in which a temporary degradation of the quality of service must always be accepted due to a compressed mode of operation.
Patent TW-452619-B (TW)
Title: Foot stepping water-closet water flush switch with flush memory function
Inventor: SU CHI-TZUNG
IPC: E03D5/08
Filed: 2000-09-19
Granted: 2001-09-01
Abstract: This invention is of a foot stepping flush-memory-functional water-closet water flush switch consisting of a base seat, a top cover, and a driving valve set. The outlet of base seat is normally closed by braking block of the driving valve set, and is open to let water flow through it while the step rod is stepped and the braking block is accordingly lifted up. A top needle is settled inside the driving rod of valve set. A top cover and a braking block are settled on the top and bottom sides of the driving rod respectively with a hole in the center of the top cover for the top needle to rest and close against it. With the mechanism mentioned above, user steps the step rod, as there is no water, the top needle will be lifted up due to zero water pressure. It closes the hole of the top cover to stop any descending of the driving rod and braking block to let the water outlet keep open until water supplied again. So the flush action will start as soon as the water supply begins and the driving rod and braking block descends; and this is how the flush memory functions.
Patent TW-511257-B (TW)
Title: Flip-chip mounting method for decreasing conducting resistance in power transistor of charging battery protection circuit
Inventor: JIAN FENG-TZUO
IPC: H01L21/60
Filed: 2000-12-11
Granted: 2002-11-21
Abstract: A kind of flip-chip mounting method for decreasing conducting resistance in power transistor of charging battery protection circuit is disclosed in the present invention. The protection circuit includes power field effect transistor (FET) and protection IC. The mounting steps are shown in the following. At first, in the wafer manufacturing process, the drain metal contacts for every two transistors are connected in series to form a chip unit. Then, by using the soldering head, metal wires are soldered to the contact of each chip unit so as to form the soldering metal bump on the source and the gate, respectively. The wafer is cut to form bare chip units, in which each bare unit has two drains connected in series. A solder wetting process is then conducted onto the chip unit such that solder balls are adhered to the soldering metal bumps of the contacts. The positioning points of the printed circuit board (PCB) are coated with glue material. A flip-chip process is then performed onto the bare chip unit to make the drain face upwards such that the soldering balls are mounted by aligning the positioning points of PCB. At last, after heated and pressed through the baking oven, the soldering balls are melted, and glue material is solidified and fixed such that the chip unit is soldered to the contacts of the PCB. Thus, by using the steps outlined above, it is capable of omitting wire bonding and packaging steps of power FET. Therefore, the production cost is decreased, the protection circuit volume is diminished, and the conducting resistance of power FET can be further decreased.
Patent TW-501117-B (TW)
Title: Optical record carrier and scanning device
Inventor: STEK AALBERT
IPC: G11B7/24097
Filed: 2000-12-29
Granted: 2002-09-01
Abstract: An optical record carrier is described comprising a track for carrying data encoded in optical marks. A parameter of the track has a periodic variation for generating a varying signal when scanning the track, for example a variation of the center of a pre-groove usually called wobble. The track further comprises reference elements, e.g. headers, interrupting the periodic variation. The phase of the periodic variation after the reference elements is indicative of a property of the record carrier for controlling the scanning of the record carrier in dependence of said property. In particular the phase may indicate whether or not the bottom of the pro-groove is closer to the scanning beam entry side of the disc. Further a scanning device is described comprising a detector for detecting said phase based on the varying signal. The device adapts its scanning control means to the indicated property.
Patent TW-496973-B (TW)
Title: Fiber alignment element of integrated micro ball lens
Inventor: LIN YU-SHENG
IPC: G02B6/10
Filed: 2001-01-10
Granted: 2002-08-01
Abstract: The structure of fiber alignment element of the integrated micro ball lens comprises a substrate, on the proper position of which a plurality of V-shaped grooves or a plurality of wave-guides arranged in a matrix are etched. After lithography process and heating treatment, a first polymer layer and a highly transmissive second polymer layer applied to the surface of the substrate may form at least a base and a micro ball lens between the opposite V-shaped grooves or wave-guides arranged in a matrix. In each V-shaped groove, an optical fiber is provided, while the micro ball lens, the grooves and the optical fiber or optical wave-guides are covered with an upper cap. By properly arranging the micro ball lens and the grooves, it is possible to complete the alignment of the optical fibers or optical wave-guides disposed on both sides of the micro ball lens and result in a structure of fiber alignment element. Accordingly, it is possible to provide a simplified process and achieve the production of such fiber alignment element in an integrated batch manner.
Patent TW-462063-B (TW)
Title: Nuclear reactor cooling apparatus and its operation method
Inventor: ISHIBASHI FUMIHIKO
IPC: G21C19/02
Filed: 2001-01-30
Granted: 2001-11-01
Abstract: The present invention relates to a kind of cooling apparatus for nuclear reactor and its operation method, in which the dosage infected by the radiation for the operators in the nuclear reactor can be reduced when working for the operation in the route of nuclear reactor pressure tank. In addition, the destruction heat can be removed without damaging the fuel assembly body or the operation of exchanging control rod. In the nuclear reactor building, the nuclear reactor well 4 and fuel pool 5 are constructed. The circulating pipeline 17 of fuel pool and the system pipeline 23, 24 of nuclear reactor, which is used to remove the residual heat of the nuclear reactor, for the cooling and cleaning system pipeline 8 are installed at the down-stream side of the pressure adjustment tank 7 adjacent to the gap of the fuel pool 5, in which the outlet side of the fuel pool circulating pipeline 17 is installed inside the nuclear reactor well 4 and the outlet side of the system pipeline 23, 24 for removing the residual heat of the nuclear reactor is installed inside the fuel pool 5. In addition, the radiation covering-layer is contained in the reactor water inside the nuclear reactor pressure tank 1 so as to prevent the radiation from piling up at the bottom portion of the nuclear reactor well 4 and to decrease the dosage infected by the radiation for the operators.
Patent TW-506043-B (TW)
Title: Method of fabricating a stacked poly-poly and MOS capacitor using a SiGe integration scheme
Inventor: COOLBAUGH DOUGLAS D
IPC: H01L21/02
Filed: 2001-01-31
Granted: 2002-10-11
Abstract: A stacked poly-poly/MOS capacitor useful as a component in a BiCMOS device comprising a semiconductor substrate having a region of a first conductivity-type formed in a surface thereof; a gate oxide formed on said semiconductor substrate overlaying said region of first conductivity-type; a first polysilicon layer formed on at least said gate oxide layer, said first polysilicon layer being doped with an N or P-type dopant; a dielectric layer formed on said first polysilicon layer; and a second polysilicon layer formed on said dielectric layer, said second polysilicon layer being doped with the same or different dopant as the first polysilicon layer.
Patent TW-536448-B (TW)
Title: Chemical-mechanical polishing table
Inventor: LI CHI-HUAN
IPC: B24B7/24
Filed: 2001-02-14
Granted: 2003-06-11
Abstract: Disclosed is a chemical-mechanical polishing table, including: a cylindrical disc with a plurality of concentric channels formed on a surface thereof, and a metal ring provided in the channels on the disc surface and featuring heat-expansion and cold-shrinking characteristics. By locally adjusting currents applied to the metal rings and adjusting the heights of the metal rings, local heights of the polishing pads may be adjusted. The polishing amount at various regions of wafers may be indirectly controlled by controlling the surface profiles of the polishing pads to a specific distribution.
Patent TW-I238235-B (TW)
Title: Optical system having dual ellipsoidal reflectors
Inventor: LI KENNETH K
IPC: F21Y101/00
Filed: 2001-03-12
Granted: 2005-08-21
Abstract: A condensing and collecting optical system includes a first reflector and second reflector. The first and second reflectors and includes a portion of an ellipsoid of revolution having two focal point and an optical axis. A source of electromagnetic radiation is placed at one of the focal points of the first reflector to produce radiation that converges at the second focal point of the first reflector. The second focal points of the reflectors coincide. The second reflector is positioned to receive the radiation after it passes through a second focal point of the second reflector and focuses the radiation toward a target positioned at the first focal point of the second reflector. To achieve maximum illumination at the target, the first and second reflectors are substantially of the same size and shape and positioned in optical symmetry with respect to one another so that radiation reflected from a surface portion of the first ellipsoidal reflector is thereafter reflected from a corresponding surface portion of the second ellipsoidal reflector to achieve unit magnification between the source and its focused image. The ellipsoid reflectors may include non-ellipsoidal portions or may be approximated by spherical or toroidal reflectors.