baber/WOPTO huggingface dataset:
Patent TW-350821-B (TW)
Title: A manual guide vehicle and method for supplying the same with power
Inventor: PARK BTUNG-KWEN
IPC: H01R13/631
Filed: 1997-03-26
Granted: 1999-01-21
Abstract: A manual guide vehicle, including: a transport means for carrying the boxes containing a large number of samples pending for processing; a drive for driving the transport means; and a power supply for supplying power from an external unit to the drive, including the power supply the following: the first power supply, disposed onto the external unit for supplying power to the manual vehicle; and the second power supply disposed on the manual vehicle, for insertion into the first power supply for receiving of power coming from the external unit.
Patent TW-328655-B (TW)
Title: The thermally enhanced compact reformer
Inventor: MICHAEL S HSU
IPC: H01M8/24
Filed: 1997-04-02
Granted: 1998-03-21
Abstract: A plate reformer to reform the reaction article into reaction kinds during the operation process includes the following parts: The catalyst plate is combined with one or more kind catalyst article to promote reformation. And the thermal conducting plate is composed by several thermal-conductive materials. The catalyst plate and thermal-conductive plate are stacked alternately to form reformative structure. And the thermal-conductive plate can conduct & transfer the thermal energy into plane to support reformation process.
Patent TW-334645-B (TW)
Title: The integrated photo-receiver structure
Inventor: FANG YAN-KUN
IPC: H01L31/12
Filed: 1997-05-15
Granted: 1998-06-21
Abstract: An integrated photo-receiver structure, it is an application for opto-electronic integrated circuits with low cost and big area, and includes: - Switch. - Photodiode, is used for trigger the switch to directly or indirectly drive the external loading. - Si substrate, has grown switch and photodiode on it.
Patent TW-371360-B (TW)
Title: Method of measuring oxide film dielectric strength of semiconductor wafer
Inventor: MAEDA MASAHIKO
IPC: G01N1/32
Filed: 1997-05-27
Granted: 1999-10-01
Abstract: To prevent the contamination which might be caused by the sacrifice oxidation method by etching the surface of a semiconductor wafer under test to remove its working strain layer before forming a measuring element. Before forming a measuring element, a finish-polished semiconductor wafer under test is etched with an SC-1(NH4OH/H2O2/H2O) liq. To remove a surface working strain layer of the wafer, and GOI (oxide film dielectric strength characteristic) of each semiconductor wafer is measured to compute the non-defective ratio such that the finish-polished surface of the semiconductor wafer is etched to a depth of 10 nm or more to measure GOT (oxide film dielectric strength characteristic), thereby preparing a sample to evaluate the crystal quality. Thus it is possible to prevent the contamination which might be caused by the sacrifice oxidation method and improve the semiconductor wafer quality.
Patent TW-445316-B (TW)
Title: Cooling device for false twisting machine
Inventor: TAKAGI JUN
IPC: D02J13/00
Filed: 1997-05-29
Granted: 2001-07-11
Abstract: A cooling device for a false twisting machine having a fixed wall member 16 and movable wall members 18a and 18b which have faced side surfaces between which yarn treatment passageways 19a and 19b are formed. The facing side surfaces are formed with yarn contacting portions 16a1 and 16b1 and 18a-1 and 18b-1, which are spaced along the direction of the running of the yarn in the yarn treatment passageways. The arrangement of the yarn contacting portions are such that contact with the yarn occurs alternately between the fixed wall member 16 and movable wall members 18a and 18b. A sucking duct 14 is opened to the yarn treatment passageways 19a and 19b to generate flows of fluid transverse to the running direction of the yarn in the passageways 19a and 19b.
Patent TW-442456-B (TW)
Title: Diaryl antimicrobial agents
Inventor: KANOJIA RAMESH M
IPC: C07D213/38
Filed: 1997-11-17
Granted: 2001-06-23
Abstract: A compound selected from those of the formula I, wherein L is selected from the group consisting of N, CH and C; G and E are independently selected from the group consisting of phenyl, phenylC1-4alkyl, pyridyl and thienyl; or may be taken together with L (when L is CH), to form J is CH or O; q is 0 or 1; m is 0-6; x is selected from the group consisting of O, S, NR and -C(O)NR- where R is hydrogen; Ar is phenylene; n is 0-6, A is selected from the group consisting of NR1R2, N+R1R2R3.Z-, formula, halogen, phthalimido and a heterocycle of monocyclic ring containing N atom, optionally substituted by formyl where: R1, R2, and R3 are independently selected from hydrogen and C1-6 alkoxycarbonyl; Z-is a pharmaceutically acceptable counterion; with the proviso that: when q is 1 and J is CH, L is CH, m is C, m is at least 1 and the dashed line is taken together with the solid line to form a double bond; when q is 1 and J is O, L is CH, m is at least 2 and the dashed line is absent; when q is 0, L is N or CH and the dashed line is absent; when q is 0, L is N or CH and the dashed line is absent; when q and m are 0, L is CH and when n is 0, A may also be hydroxy; and the pharmaceutically acceptable salts and prodrug forms thereof.
Patent TW-340053-B (TW)
Title: Reverse cleaning regeneration type exhaust emission control device
Inventor: SHIMADO KOJI
IPC: B01D46/44
Filed: 1997-07-01
Granted: 1998-09-11
Abstract: A sort of reverse cleaning regeneration type exhaust emission control device, including 2 discharge means in connection with the discharge inlet, including the first means A with a filter A1, disposed downstream of filter A1for closing of release valve A2, and injector A3 disposed between filter A1 and valve A2 for injection reverse cleaning air to filter A1, as well as the second means B including filter B1, disposed downstream of filter B1for closing of release valve B2, and injector B3 disposed between filter B1 and valve B2 for injection reverse cleaning air to filter B1, plus the third means C dispoed upstream of filter A1 and B1 at the discharge means extended from the discharge inlet, in connection with the 2 discharge means, including filter C1, disposed by any side of filter C1 and valve C2 crossing the means, and injector C3 disposed between filter C1 and valve C2 for transferring the combustion from the air inlet to filter C1.
Patent TW-I232104-B (TW)
Title: Compositions for the treatment of viral infections
Inventor: TSAI HSIU-HSIEN
Filed: 1997-07-09
Granted: 2005-05-11
Abstract: This invention relates to compositions derived from Chinese herbal medicines, medicinal plants and extracts thereof, and to their use for the treatment of animals infected with viruses, especially with hepatitis B virus (HBV), hepatitis C virus (HCV), and human immunodeficiency virus (HIV). More specifically, the compositions of the present invention are derived from various Chinese herbal medicines or medicinal plants which have a long history of human consumption. The compositions of the invention are obtained through specific techniques and have demonstrated outstanding efficacy for treating human HBV carriers and hepatitis C patients. Compositions according to the invention have also exhibited in vitro antiviral activities against murine leukemia virus (MuLV) and HIV. HIV is the virus known to cause acquired immunodeficiency syndrome (AIDS) in humans and AIDS presents special problems to the medical community which the present invention addresses.
Patent TW-406215-B (TW)
Title: Composition for anti-reflective coating material in lithographic process, and process for forming resist pattern
Inventor: MIZUTANI KAZUYOSHI
IPC: G03F7/09
Filed: 1997-07-31
Granted: 2000-09-21
Abstract: A composition for anti-reflective coating material is disclosed, comprising a polymer compound having repeating units having repeating units represented by the following general formulae (I) and (II), and optionally a melamine, guanamine, urea, phenol, naphthol or hydroxyanthracene compound substituted by at least one group selected from the group consisting of a methylol group and an alkoxymethyl group at two or more positions. The composition for anti-reflective coating material of the present invention is effective for the reduction of adverse effects of reflection by the substrate in a lithographic process using various radiations. A resist pattern formation process which comprises the use of the composition for anti-reflective coating material is also disclosed. Wherein R1 and R2 may be the same or different and each represent a hydrogen atom, a methyl group, a chlorine atom, a bromine atom or a cyano group; X represents a phenylene, -CO2-A-, -CONH-A-, -CO2CH2CH2NHCO2-A-, -CO2CH2CH2CONH-A-, -CONHSO2-A- (in which A represents a C6-14 aromatic ring having a valence of (n + 1); Y represents a hydrogen atom, -OH, OR<4> or -N(R5) (R6) (in which R4 represents a C1-20 hydrocarbon group, and R5 and R6 may be the same or different and each represent a C1-20 hydrocarbon group); z represents an organic functional group terminated by -CH2OR3 (in which R3 represents a hydrogen atom or a C1-20 hydrocarbon group); and n represents an integer of from 0 to 3, with the proviso that when n is 2 or 3, the plurality of Y's may be the same or different.
Patent TW-372953-B (TW)
Title: Coproduction of 6-aminocapronitrile and hexamethylenediamine
Inventor: LUYKEN HERMANN
IPC: B01J23/78
Filed: 1997-11-07
Granted: 1999-11-01
Abstract: A process for coproduction of 6-aminocapronitrile and hexamethylenediamine starting from a mixture comprising a phosphorus-containing compound and essentially adiponitrile and obtained by reaction of butadiene with hydrocyanic acid in the presence of a catalyst comprising a phosphorus-containing compound comprises: (1) reducing the weight proportion of phosphorus-containing compound, calculated as phosphorus, in the mixture, (2) partially hydrogenating the resulting mixture in the presence of a catalyst to form an alpha, omega-aminonitrile, and (3) removing 6-aminocapronitrile and hexamethylenediamine from the mixture.
Patent TW-343931-B (TW)
Title: Device for processing substrate
Inventor: DR JOHN OSHINOWO
IPC: H01L21/683
Filed: 1997-10-15
Granted: 1998-11-01
Abstract: A device for processing a substrate (9), which comprises a container (1) containing a processing fluid and at least one vertically movable substrate holder (8), which is characterized in that substrate sidewalls (6,7) capable of moving vertically with the substrate are installed between the substrate (9) and the container wall surfaces (4,5) and parallel to the substrate (9).
Patent TW-335341-B (TW)
Title: A hanger
Inventor: IKEMOTO TATSUYA
IPC: A47G25/02
Filed: 1997-11-13
Granted: 1998-07-01
Abstract: A sort of hanger, including: the hanger body H, having the left and right slant ribs 1, 1; and the horizontal rod 2, for connection of the lower part 1a, 1a of the left and right slant ribs 1, 1; with a necktie holder 3 in the formed triangle area E and/or holder of minor items 36, for housing neckties.
Patent TW-355897-B (TW)
Title: Telephone dialer having true redial function
Inventor: WU MENG-CANG
IPC: H04M1/23
Filed: 1997-11-14
Granted: 1999-04-11
Abstract: A telephone dialer with true redial function, comprising: a key detection control circuit to judge whether the key pressing are effective and produce the control signal needed; a key-in and release interval counter circuit for measuring the time length of key pressing and time length of key release; a key-in and release time interval storage circuit for storing the time length data measured by the counter circuit in sequence; a complex frequency time and interval counter circuit for receiving the key-in time length and key release time length data sent in by the storage circuit and converting them into actual time data so as to control the complex frequency time length and complex frequency time length of temporary hold of output sent out by the dialer; constituting a telephone dialer capable of programming and redialing with input key-in rate and key-in interval.
Patent TW-353212-B (TW)
Title: Control system and method for semiconductor integrated circuit test process
Inventor: CHEONG KWANG-YUNG
IPC: H01L21/02
Filed: 1997-12-22
Granted: 1999-02-21
Abstract: A test control system for semiconductor integrated circuit test process, the control system comprising: a plurality of testers for testing electrical characteristics of IC devices; a host computer for processing data transmitted from the plurality of testers and for creating a number of databases; a plurality of distributed computers for monitoring the test progress and analyzing the test results using the databases stored in the host computer; and a network for interconnecting the plurality of testers, the host computer and the plurality of distributed computers.
Patent TW-423017-B (TW)
Title: Circuit connection and method for connecting circuits
Inventor: OKAMOTO YOSHINARI
IPC: H01J9/14
Filed: 1998-01-09
Granted: 2001-02-21
Abstract: The object of the present invention is to provide a circuit connection and method for reliably performing the formation of a grid and wiring connection between the grid and a wiring conductor on a base board without causing connection failure. First, a grid wiring pattern 5 of a prescribed pattern shape is formed on an anode base board 2, and an insulating layer 7 having a through hole 6b is formed on the anode base board 2 so that the grid wiring pattern 5 faces to a wiring place. The through hole 6b is filled with a conductive material 28, and a frame-shaped grid connecting rib 27 is printed and formed on the insulating layer 7 so as to surround the conductive material 28 on the through hole 6b. The grid connecting rib 27 is integrally connected to a rib to form a display pattern through a deriving rib 16 formed by printing simultaneously. Conductive paste is integrally printed and formed on top upper surfaces 16a and 27a of the respective ribs 16 and 27 and in a frame 27b of the grid connecting rib 27. Therefore, the formation of a grid 31 and the electric connection between the grid 31 and a grid wiring conductor 29 are performed at a time.
Patent TW-373385-B (TW)
Title: Image treating method
Inventor: Wu ming-wei
IPC: H04N1/40
Filed: 1998-03-06
Granted: 1999-11-01
Abstract: The image treating method of this invention is using special treating method to adjust gray value of bad pixel for CIS mold, to raise image quality. The method is to analyze whether special type exist or not first, if yes, then to calculate new value pf bad pixel with special type, if no, then to analyze gray difference value of effective images at left and right; if the difference value if smaller than set up value, then to calculate new value with bilinear, if greater than the set up value, to calculate new value of bad pixels according to different proportional value in accordance with the gray value of bad pixels. If the difference of new value calculated with bilinear and the original value is too big, then to calculate new value of bad pixels according to different proportional values in accordance with gray value of bad pixels.
Patent TW-434840-B (TW)
Title: Method for fabricating microstructure
Inventor: TOBBEN DIRK
IPC: H01L27/108
Filed: 1998-03-26
Granted: 2001-05-16
Abstract: A method for forming a microstructure includes photolithographically forming a vertically extending post on a portion of a surface of a substrate to provide a first structure. A flowable, sacrificial material is deposited over a surface of the first structure. The flowable, sacrificial materially flows off the top surface and sidewall portions of the post onto adjacent portions of the surface of the substrate to provide a second structure. A non-sacrificial material is deposited over a surface of the second structure. The non-sacrificial material is deposited to conform to the surface of the second structure. The non-sacrificial is deposited over the sacrificial material, over the sidewall portions and over the top surface of the post. The deposited sacrificial material is selectively removed while the non-sacrificial material remains to form a third structure with a horizontal member provided by the non-sacrificial material. The horizontal member is supported a predetermined distance above the surface of the substrate by a lower portion of the post. The flowable material is a flowable oxide, for example, hydrogensilsesquioxane glass, and the post has a width less than 20 mu m. The resulting structure, formed with a single photolithographic step, is used for supporting a capacitor deposited over it. The capacitor is formed as a sequence of deposition steps; i.e., deposition a first conductive layer over a surface of the support structure; depositing a dielectric layer over the conductive layer; and depositing a second conductive layer over the dielectric layer.
Patent TW-388138-B (TW)
Title: A polyvinylidene fluoride metal-adhesive composition and an electrode for a battery
Inventor: MIYAKI YOSHIYUKI
IPC: H01M10/0525
Filed: 1998-05-05
Granted: 2000-04-21
Abstract: The present invention has the objective of offering a metal-adhesive polyvinylidene fluoride composition provided with the solvent resistance and the mechanical/thermal properties inherently possessed by polyvinylidene fluoride resin; and a method for the production thereof; and also, by employing this composition as an electrode binding agent for batteries, obtaining battery electrodes of enhanced adhesion between the electrode active material and the current collector. A polyvinylidene fluoride metal-adhesive composition where, in a composition composed of vinylidene fluoride homopolymer and vinylidene fluoride copolymer, one or both of these polymers has/have functional groups which show metal-adhesion, and the vinylidene fluoride copolymer content is from 0.5 to 50 wt% of the total; and an electrode where, in an electrode for a battery in which an electrode compositional material layer comprising at least electrode active material layer comprising at least electrode active material and binding agent is formed on the surface of a current collector, there is employed as the binding agent the aforesaid polyvinylidene fluoride metal-adhesive composition.
Patent TW-502024-B (TW)
Title: A tricyclic pyridazole derivative
Inventor: KUBOTA HIDEKI
IPC: C07D495/04
Filed: 1998-06-05
Granted: 2002-09-11
Abstract: A tricyclic pyridazole derivative of the formula (I) (wherein Hot: 5 membered heterocycle containing 1 to 3 hetero atom selected from N, O or S, A: straiyht or branched lower alkylene, R: H, lower alkylen, halogen, hydroxy or lower alkoxy), or the pharmacentically acceptable salt thereof, having a strong affinity and selectivity to 5-HT2C receptor and useful for treating central nerve system disease, such as sexual disfunction, inappetence, anxiety, depressive and insomnia.
Patent TW-368570-B (TW)
Title: Shift cut-over apparatus for torque converter
Inventor: UMEZAWA KAZUNORI
IPC: F16H61/00
Filed: 1998-07-17
Granted: 1999-09-01
Abstract: The present invention is to provide a shift cut-over apparatus for torque converter which reduces the number of shift lever to only one and is capable of preventing malfunction. The tip of shift-lever is connected with second oscillation shaft to oscillate vertically relative to head member 10, and oscillates on both sides integrally with the first oscillating shaft 6 as its center. The tip of the head member will have the oscillation position of shift lever secure at any one of neutral position, F1, F2, R1 or R2 after the click ball is pressed down to the click slot, and shifts the shift switch with reference to each position with the tip of head member. The engagement plate disposed at the tip portion of shift lever will so restrict that when the first engagement potion contacts the step portion or step portion of the step-wise guide and cannot run on to upper steps or after shift lever is oscillated upward. The second engagement portion will, when the shift lever is oscillated upward, and goes down to the side of jump restriction projection, shift lever is rotated and restored the upper steps and to the direction of the neutral position, the rotation is suspended till the shift lever drops into the lower step.
Patent TW-402756-B (TW)
Title: Method and apparatus for polishing and cleaning semiconductor wafers
Inventor: FISHKIN BORIS
IPC: H01L21/677
Filed: 1998-08-03
Granted: 2000-08-21
Abstract: A wafer cleaning apparatus 20 for polishing and cleaning semiconductor wafers 25 comprises a polishing station 30, and one or more cleaning stations 35, such as sonic cleaning stations 75, holding stations 80, rinsing station 85, soaking stations 88, or drying stations 90. A robot transport system 40 (1) transports first wafers 25a into the cleaning station for processing of the first wafers 25a in the cleaning station; (2) transports second wafers 25b into the cleaning station while the first wafers 25a are still being processed in the station; (3) transports the first wafers 25a out of the cleaning station after the first wafers 25a have completed processing, and while the second wafers 25b are still being processed; and (4) transports the second wafers 25b out of the cleaning station after the second wafers 25b have completed processing. The robot transport system 40 can transfer additional sets of wafers 25c into the cleaning station, while the first and/or second wafers 25a, 25b are being processed to further increase process throughput.
Patent TW-426840-B (TW)
Title: Driving device and method of plasma display panel which can remove the dynamic false contour
Inventor: HUANG R-FENG
IPC: G09G3/28
Filed: 1998-09-02
Granted: 2001-03-21
Abstract: The present invention relates to a driving device and method of plasma display panel which can remove the dynamic false contour. The plasma display panel is composed of a plurality of (e.g. 600 stripes) of display lines. These display lines reset, scan, sus-frame to complete a subfield. In addition, a complete frame is composed of a plurality of subfields (e.g. 8 in 256-gray scale), the sus-frame time of each subfield is based on a preset ratio to form a plurality of gray scales. The present invention has the following procedures: first, alternatively divide these display lines into a plurality of display line groups; then let these display line groups discharge based on the sus-frame time ratio or sequence of different subfields in each complete frame.
Patent TW-411481-B (TW)
Title: An inductance device
Inventor: ZHOU SHU-ANG
IPC: H01L23/522
Filed: 1998-09-04
Granted: 2000-11-11
Abstract: The invention relates to an inductance means (10) comprising a first and a second terminal (20, 30) and two conductors (40, 50). Each conductor forms a loop between the terminals (20, 30) such that a current (i1) provided to the first terminal is divided between the conductors (40, 50). Each current (i2, i3) generates a magnetic field (240, 250). The conductors are disposed such that the combined magnetic field generated by the conductor currents (i2, i3) in a space between the conductors is greater than the magnetic field generated by each of the conductors in that space.