Patent SG-11201808692Q-A (SG)
Title: Use of a chemical mechanical polishing (cmp) composition for polishing of cobalt and / or cobalt alloy comprising substrates
Inventor: REICHARDT DR
IPC: H01L21/321
Filed: 2016-04-27
Abstract: INTERNATIONAL APPLICATION PUBLISHED UNDER THE PATENT COOPERATION TREATY (PCT) (19) World Intellectual Property 111111101111 0 DOI 01011111010111011101111101110101111100111110110111111 Organization International Bureau (10) International Publication Number (43) International Publication Date ......0\" WO 2017/186283 Al 02 November 2017 (02.11.2017) W I PO I PCT (51) International Patent Classification: TR), OAPI (BF, BJ, CF, CG, CI, CM, GA, GN, GQ, GW, C09G 1/02 (2006.01) H01L 21/321 (2006.01) KM, ML, MR, NE, SN, TD, TG). (21) International Application Number: PCT/EP2016/059363 Published: — with international search report (Art. 21(3)) (22) International Filing Date: 27 April 2016 (27.04.2016) (25) Filing Language: English (26) Publication Language: English (71) Applicant: BASF SE [DE/DE]; Carl-Bosch-Str. 38, 67056 Ludwigshafen (DE). (72) Inventors: REICHARDT, DR.,, Robert; Fritz-Leder- le-Str. 6a, 67071 Ludwigshafen (DE). SIEBERT, DR.,, Max; Friedrich-Profit-Str. 41, 67063 Ludwigshafen (DE). LAN, Yongqing; Christoph-Krowerath-Str. 77, 67071 Ludwigshafen (DE). LAUTER, DR., Michael; Gontard- str. 6, 68163 Mannheim (DE). USMAN IBRAHIM, Sheik Ansar; Naamsesteenweg, 3001Z Heverlee (BE). _ GOLZARIN, Reza; 4201 NW 179th Place, Portland, Ore- gon — 97229 (US). GUEVENC , DR., Haci Osman; Langer = Anger 109, 69115 Heidelberg (DE). PROELSS, DR., Ju- lian; Bennigsenstr. 40, 67549 Worms (DE). LEUNISSEN, _ DR.,, Leonardus; Biirgermeister-Fries-Str. 13a, 67069 Ludwigshafen (DE). (74) Agent: BASF IP ASSOCIATION; BASF SE, ZRX-0006, 67056 Ludwigshafen (DE). = (81) Designated States (unless otherwise indicated, for every = kind of national protection available): AE, AG, AL, AM, = — AO, AT, AU, AZ, BA, BB, BG, BH, BN, BR, BW, BY, BZ, CA, CH, CL, CN, CO, CR, CU, CZ, DE, DK, DM, DO, DZ, = _ EC, EE, EG, ES, FI, GB, GD, GE, GH, GM, GT, HN, HR, = HU, ID, IL, IN, IR, IS, JP, KE, KG, KN, KP, KR, KZ, LA, LC, LK, LR, LS, LU, LY, MA, MD, ME, MG, MK, MN, = MW, MX, MY, MZ, NA, NG, NI, NO, NZ, OM, PA, PE, = _ PG, PH, PL, PT, QA, RO, RS, RU, RW, SA, SC, SD, SE, _ = SG, SK, SL, SM, ST, SV, SY, TH, TJ, TM, TN, TR, TT, TZ, = UA, UG, US, UZ, VC, VN, ZA, ZM, ZW. = — Designated States indicated, (84) (unless otherwise for every = — kind of regional protection available): ARIPO (BW, GH, = GM, KE, LR, LS, MW, MZ, NA, RW, SD, SL, ST, SZ, TZ, UG, ZM, ZW), Eurasian (AM, AZ, BY, KG, KZ, RU, TJ, TM), European (AL, AT, BE, BG, CH, CY, CZ, DE, DK, — EE, ES, FI, FR, GB, GR, HR, HU, IE, IS, IT, LT, LU, LV, 1-1 MC, MK, MT, NL, NO, PL, PT, RO, RS, SE, SI, SK, SM, r) M QC (54) Title: USE OF A CHEMICAL MECHANICAL POLISHING (CMP) COMPOSITION FOR POLISHING OF COBALT AND / V::+ el OR COBALT ALLOY COMPRISING SUBSTRATES *t (57) : Use of a chemical mechanical polishing (CMP) composition (Q) for chemical mechanical polishing of a substrate (S) 1-1 —. comprising (i) cobalt and/or (ii) a cobalt alloy, wherein the CMP composition (Q) comprises (A) Inorganic particles (B) an anionic IN surfactant of the general formula (I) R-S wherein R is C5-C20-alkyl, C5-C20-alkenyl, C5-C20-alkylacyl or C5-C20-alkenylacyl and S is 0 a sulfonic acid derivative, an amino acid derivative or a phosphoric acid derivative or salts or mixtures thereof (C) at least one amino N acid, (D) at least one oxidizer (E) an aqueous medium and wherein the CMP composition (Q) has a pH of from 7 to 10. C