baber/WOPTO huggingface dataset:
Patent KR-20010037387-A (KR)
Inventor: HONG JI HUN
IPC: H01L21/68
Filed: 1999-10-16
Abstract: PURPOSE: A wafer counting device and a semiconductor arrangement equipment having the same are provided to measure correctly and easily the amount of loaded wafers without using a device such as an optical sensor. CONSTITUTION: A wafer counting device comprises a carrier support portion(70), a weight measurement portion, and an amount determination portion. The carrier support portion(70) supports a carrier for receiving a plurality of wafer. The weight measurement portion measures the total weight of the carrier located on the carrier support portion(70). The amount determination portion determines the amount of the wafers within the carrier on the basis of the measured weight from the weight measurement portion.
Patent KR-20010037393-A (KR)
Inventor: PARK GWI GEUN
IPC: F24F11/02
Filed: 1999-10-16
Abstract: PURPOSE: A method is provided to obtain a comfort environment by controlling the indoor fan and the outdoor fan in accordance with the pipe temperature and outdoor temperature. CONSTITUTION: A method comprises a step(200) of setting the heating operation temperature to an operation temperature for compressor and the compressor off temperature to the temperature which is z deg.C higher than the preset temperature; a step(203) of judging whether the indoor temperature is lower than the compressor on temperature; a step(206) of judging whether the indoor temperature is lower than the compressor off temperature if not; a step(212) of judging whether the compressor is operated at a frequency higher than that of the normal operation; a step(215) of judging whether 10 minutes have lapsed since operation of the compressor, if yes; a step(218) of initializing compressor operation flag and ending the operation if 10 minutes have lapsed; a step(221) of judging whether the value obtained by subtracting the indoor temperature from the compressor off temperature is higher than z deg.C; a step(236) of judging whether the compressor is operated at a frequency higher than that of the normal operation, if the value is higher than z deg.C; a step(242,239) of setting the target operation step of the compressor, if the compressor is not operated at a frequency higher than that of the normal operation; a step(224) of judging whether the value obtained by subtracting the indoor temperature from the compressor off temperature is higher than x deg.C, if it is judged in the step(221) that the value is lower than z deg.C; a step(227) of judging whether the compressor is operated at a frequency higher than that of the normal operation, if it is judged in the step(224) that the value is higher than x deg.C; and a step(233,230) of setting the target operation step of the compressor in accordance with the determination result of the step(227).
Patent KR-20000029171-A (KR)
Inventor: KIM GWANG NAM
IPC: H01L29/786
Filed: 1999-10-19
Abstract: PURPOSE: A method of forming a silicon oxide film is to provide superior property in insulting breakdown voltage and step coverage, to enhance the yield of a TFT(Thin Film Transistor) without causing any problem in treatment and cost aspect, and to be applied to both a gate oxide film and an interlayer dielectric film. CONSTITUTION: A two-frequency excited type plasma CVD(Chemical Vapor Deposition) apparatus(1) is used in forming a silicon oxide film, which comprises a high-frequency electrode(3), a susceptor electrode(6) and two matching boxes for impedance matching each electrode with a power supply, with one electrode constituting a tuning capacitor(20) of the matching box of a high-frequency side being the high-frequency electrode. A substrate(5) to be treated is placed on the susceptor electrode and a high-frequency power is applied to both the high-frequency electrode and the susceptor electrode. Simultaneously, a reaction gas consisting of the mixed gas of SiH4 gas and N2O gas is introduced into the apparatus to generate a plasma therein, forming the silicon oxide film on the substrate.
Patent KR-20010037814-A (KR)
Inventor: JUNG HUI DON
IPC: B23K26/04
Filed: 1999-10-20
Abstract: PURPOSE: An apparatus for controlling the position of a processing nozzle in a laser processing machine is provided improve processing performance and protect a nozzle head by accurately setting and maintaining a distance between the nozzle head of the laser processing machine and a material processed as a focal length of a lens in a laser processing machine cutting or welding the material processed using a laser beam. CONSTITUTION: In an apparatus for controlling the position of a processing nozzle in a laser processing machine in which processing such as cutting or welding is performed by irradiating a laser beam generated from a laser generator onto an object material processed through a processing nozzle, and the position transfer of the processing nozzle is controlled so that a focus of the laser irradiated on the object material processed through a focus lens (4) of the processing nozzle is formed on the surface of the material processed, the apparatus comprises a tracking detector (7) mounted on the outer wall of the processing nozzle for detecting whether or not a distance between the processing nozzle and an object material processed is a focal length of the focus lens according to the image of a laser beam reflected and inputted by irradiating the laser beam onto the object material processed; and a servo driving part vertically transferring the processing nozzle so that the processing nozzle is constantly maintained in a length corresponding to the focal length of the focus lens of the object material processed according to the detecting signal of the tracking detector.
Patent KR-20000035658-A (KR)
Inventor: KOBAYASHI MASATO
IPC: H01L21/768
Filed: 1999-11-24
Abstract: PURPOSE: A semiconductor device fabricating method is provided to bury a copper film at a concave portion of a wiring groove or a connection hole without a void, and to realize a high throughput. CONSTITUTION: In a semiconductor device fabricating method, an insulation film(2) is formed on a semiconductor substrate(1), and a concave portion is formed in the insulation film(2). A barrier film(3) is formed on a surface of the insulation film(2) comprising the concave portion(5). A first copper film(4a) is deposited over the surface of the insulation film(3) by an organic metallic chemical vapor deposition method while the semiconductor(1) is heated at a first temperature. A second copper film(4b) is deposited on the first copper film(4a) so as to have a thickness sufficient to bury the concave portion(5) by use of organic metallic chemical vapor deposition method, while the semiconductor(1) is heated at a second temperature which is higher than the first temperature.
Patent KR-20010064719-A (KR)
Inventor: KIM DONG SEONG
IPC: H03L5/00
Filed: 1999-12-18
Abstract: PURPOSE: A method of protecting and controlling overcurrent using IIC data communication is provided which detects a data communication error in a microcomputer, an IC processing data through IIC data communication and other means to judge if a load is in abnormal state, ad prevents a power supplying unit from being damaged when overload is applied to the secondary load. CONSTITUTION: It is judged if there is a data communication error in the first step. When it is judged that there is a data communication error, refresh data is transmitted to an IC or other means at which the error is generated to confirm the communication error in the second step. When the communication error is continuously generated even though the refresh data is sent, an error flag is set and the second step is repeated until the communication error is not generated. When the error flag is maintained until a predetermined setting time, the error is judged to be system overload to cut off input AC power. When the communication error is interrupted within the predetermined setting time and communication returns to the normal state, the error flag is initialized and the first step is repeated.
Patent KR-20010064862-A (KR)
Inventor: LEE SEONG BIN
IPC: H05K7/20
Filed: 1999-12-20
Abstract: PURPOSE: An electrical component chamber cooling structure for combination hood/microwave oven is provided to achieve an improved cooling efficiency by allowing the magnetron to be directly cooled by the air produced from the cooling fan, while minimizing air flow resistance. CONSTITUTION: A cooling structure comprises a magnetron(34) mounted in an electrical component chamber(40) of a microwave oven and which oscillates microwave; and a cooling fan(30) interposed between the magnetron and the grille, at the front upper portion of the electrical component chamber, and which is installed to be slightly inclined toward the magnetron arranged in the rear lower portion of the electrical component chamber. The cooling fan is disposed in the vicinity of a grille(32) mounted at the front upper end of the microwave oven, thus minimizing flow resistance of the air being sucked by the cooling fan through the grille. Since the air flow produced from the cooling fan directly cools the magnetron, maximized cooling efficiency is obtained.
Patent KR-20010063661-A (KR)
Inventor: KIM DAE HUI
IPC: H01L21/28
Filed: 1999-12-23
Abstract: PURPOSE: A method for manufacturing a damascene pattern of a semiconductor device is provided to guarantee stability of a damascene process while improving reliability and yield, by forming the damascene pattern by a simplified process. CONSTITUTION: An oxide layer is formed on a substrate(11). The first photoresist layer pattern(13) defining a trench in which a metal interconnection is to be formed, is formed on the oxide layer. The second photoresist layer pattern(14) defining a contact hole(16) is formed on the entire surface including the first photoresist layer pattern. A hole(15) is formed on the oxide layer by using a process for etching the oxide layer using the second photoresist layer pattern. The second photoresist layer pattern is removed. The process for etching the oxide layer using the first photoresist layer pattern is performed regarding the hole portion having the oxide layer until the substrate is exposed, so that a damascene pattern(167) is formed.
Patent KR-20010057508-A (KR)
Inventor: KIM SANG CHEL
IPC: B23Q15/00
Filed: 1999-12-23
Abstract: PURPOSE: A facing unit driving controller improves accuracy on the home position control of mechanical parts composing a spindle unit to improve processing degree and stability of workpiece. CONSTITUTION: A facing unit controller comprises a screw micro column(24), a limit switch touch plate(26) and a stopper. The screw micro column(24) is installed on a cylinder housing on the side of the end part of a cylinder(7) engaged with one end of a main shaft on a shaft. The limit switch touch plate(26) moves interlocked with the moving stroke of the screw micro column(24). The stopper is installed inside the screw micro column(24) parallel with the shaft of the cylinder(7). The screw micro column(24) is installed to a main shaft hydraulic cylinder of a spindle unit to maintain accuracy even under the repeated operating condition of the hydraulic cylinder for accurate position control.
Patent KR-20010061394-A (KR)
Inventor: JANG YUN SU
IPC: H01L27/04
Filed: 1999-12-28
Abstract: PURPOSE: A protective circuit for an electro-static discharge in a flash memory device is provided to increase the current pass area and to improve the ESD(electro-static discharge) property by inserting a switching gate which connects an ESD zapping metal pad with an internal cell electrically. CONSTITUTION: The first transistor(202) and the second transistor(203) are formed on an active region(201A). The first transistor(202) is driven by the voltage applied in an input pad, and connected between a power source terminal(Vcc) and a n+ junction region via a power source voltage metal line(204). The second transistor(203) is driven by the voltage applied in an input pad, and connected between the n+ junction region and a ground terminal(Vss) connected to a ground voltage metal line(205). An ESD zapping metal pad(206) is connected to the n+ junction region formed in the second active region(201B). A switching gate(207) switches the connection between the ESD zapping metal pad(206) and an internal circuit.
Patent KR-20010065313-A (KR)
Inventor: YE JONG IL
IPC: F04D29/00
Filed: 1999-12-29
Abstract: PURPOSE: A compressor having a proximity sensor for a turbo refrigerator is provided to recognize an abrasion degree of a thrust bearing while operation by using a proximity sensor, thereby expecting a repair time and preventing the stopping of the turbo refrigerator due to an abnormal operation. CONSTITUTION: A compressor having a proximity sensor for a turbo refrigerator includes a proximity sensor(20) bolt-coupled with a cover(30) of a gear casing(18) in an axial direction of a high speed shaft(5), wherein a sensor shaft(22) of the proximity sensor senses a thrust bearing(12) approaching nearby for measuring an abrasion amount of the thrust bearing, and a lead wire(23) of the proximity sensor is led outside via a wire hole(40) formed on a wall of a motor support, the wire hole being sealed by a sealing material(41).
Patent KR-20010058870-A (KR)
Inventor: JIN SEONG AE
IPC: G06F9/32
Filed: 1999-12-30
Abstract: PURPOSE: A method for processing data of a processor is provided to increase the reliability and the efficiency of an application program including a repeat block command by removing a restriction of the number of command which the repeat block command has. CONSTITUTION: A repeat count value is set up. A repeat block command fetched from a memory is decoded. A repeat termination and a repeat start address are set up. The first command of the repeat block is fetched. The first command is decoded and executed. The second command is fetched. A memory address for fetching the second command is corresponded to the repeat termination address. It is checked whether the first command is a command for non-linearly changing an execution order of a program. In case that the first command is the command for non-linearly changing the execution order, a memory address of the second command is stored.
Patent KR-20010058957-A (KR)
Inventor: KIM TAE U
IPC: H01L21/76
Filed: 1999-12-30
Abstract: PURPOSE: A method for manufacturing a semiconductor device is provided to improve the capacity of a semiconductor device by preventing increasement of junction leakage current. CONSTITUTION: A pad oxide layer and a pad nitride layer are laminated on a semiconductor substrate(31). A trench(200) is formed by performing a photo etching process using an isolation mask. The trench(200) is buried by an oxide layer(33). The oxide layer(33) is flattened and etched. The pad oxide layer and the pad nitride layer are removed. A gate oxide layer(35) and a gate electrode are formed on the whole structure. The first and the second interlayer dielectrics(37,39) are formed on the whole structure. A lower insulating layer(41) is formed on the second interlayer dielectric(39). The second interlayer dielectric(39) is exposed by etching the lower insulating layer(41). A contact hole(43) is formed by performing the etching process.
Patent KR-20000052790-A (KR)
Title: Production of aromatic carboxylic acids
Inventor: DONALDSON PETER ANTHONY
IPC: C07C51/43
Filed: 1997-10-08
Abstract: PURPOSE: Provided is a production of aromatic carboxylic acids such as terephthalic acid and isophthalic acid. CONSTITUTION: In the production of aromatic carboxylic acids such as terephthalic acid by the liquid phase oxidation of a precursor thereof, a slurry of the carboxylic acid crystals in an aliphatic carboxylic acid-based mother liquor is withdrawn from the oxidation reactor (50), cooled and passed to a solids-liquid separation unit (66) to separate mother liquor from the aromatic carboxylic acid crystals. Following cooling, the slurry is managed to secure reduction in the extent to which small particles present in the slurry interfere with the solids-liquid separation process. in which at least 1% by weight (more preferably at least 1.5 wt%) of the aromatic carboxylic acid contained in the slurry withdrawn from the oxidation reaction zone per unit time is separated, predominantly in the form of small particles, from the remaining aromatic carboxylic acid slurry downstream of the cooling/precipitation process so as to reduce the small particle content of the filter cake formed in the solids-liquid separation unit(s), the separated fraction optionally being recycled at least in part to the reaction for the production of the aromatic carboxylic acid.
Patent KR-20000057284-A (KR)
Title: Helical computed tomography with asymmetric detector system
Inventor: RUTH CHRISTOPHER C
IPC: A61B6/03
Filed: 1997-11-10
Abstract: PURPOSE: An improved method of and apparatus for helical scanning is provided to generate a tomogram from all the data collected by an asymmetric detector system using a helical halfscan technique. CONSTITUTION: A scanner(200) includes asymmetric detector system(14), a helical weighting system(210), a parallel beam converter(212), an equi-angle interpolator(214), a prior art isocenter interpolator(216), and a back projector(220). The symmetric detector system(14) collects the fan beam projection data and applies it to the helical weighting system(210). The latter applies the feathered weights for the HA scan to the fan beam projection data. The weighted projection data is then applied to the parallel beam converter(212) which reorders and interleaves the fan beam projection data to generate parallel beam projection data. The equi-angle interpolator(214) receives the parallel beam projections and generates therefrom equi-angle projections by filling in the undefined data points in the exterior regions of the parallel beam projections. The isocenter interpolator(216) receives the equi-angle projections and generates therefrom isocenter projections. The back projector(220) receives the isocenter projections and generates a tomogram from this data using a parallel beam reconstruction algorithm.
Patent KR-20000070275-A (KR)
Title: 정제 방법
IPC: C07D501/12
Filed: 1998-01-14
Abstract: N,N-디아세트아미드 용매화물 형태의 결정성 2-(아미노티아졸-4-일)-2-(t-부톡시카보닐메톡시이미노)아세트산-S-머캅토벤조-티아졸릴에스테르 ; 7-[2-(아미노티아졸-4-일)-2-(카복시메톡시이미노)아세트아미도]-3-비닐-3-세펨-4-카복실산의 화학식 N(R 1 )(R 2 )(R 3 ) (R 1 , R 2 및 R 3 는 다양한 의미를 갖는다)의 아민과의 결정성 염 ; 7-[2-(2-아미노티아졸-4-일)-2-(카복시메톡시이미노)아세트아미도]-3-비닐-3-세펨-4-카복실산의 결정성 황산 부가염 ; 및 
     이들 염의 예를 들어 3수화물 형태의 세픽심 제조에 있어서의 용도.
Patent KR-20000070295-A (KR)
IPC: F16L11/12
Filed: 1998-01-16
Abstract: 본 발명은 예컨대, 차량용 배기 시스템의 부품을 따라 발생되는 진동을 흡수하기 위한 신축성 커플러 장치(10)에 관한 것이다.  제 1 및 제 2 어댑터 부재(14,15)들은 배기시스템의 두 부품사이의 축방향 및 휨의 상대적인 운동을 조절하도록 함께 연결된다.  어댑터 부재(14,15)에 함께 결합된 하나 이상의 탄성 스페이서 부재(27)들은 한 어댑터 부재(14)에서 다른 어댑터 부재(15)로 진동이 전달되는 것을 실질적으로 방지한다.  축방향 바이어스를 부여하기 위한 수단(50)은 예비하중의 중립 위치로부터 신축성 커플러 장치의 압축 및/또는 신장에 탄성 내력을 제공하도록 제공된다.
Patent KR-20010005920-A (KR)
Title: 헤드폰장치
IPC: H04S7/00
Filed: 1999-02-02
Abstract: 4채널의 입력오디오신호에 소정의 신호처리를 행하는 신호처리회로와, 이 신호처리회로의 출력신호가 공급되는 헤드폰과, 리스너의 머리의 회전을 검출하는 검출수단과를 설치한다.     신호처리회로에는, 4채널의 입력오디오신호에 음원에서 좌측귀 및 우측귀까지의 두부전달함수를 시간영역으로 변환한 임펄스응답을 콘벌루션하는 디지털필터와, 시간차의 부가회로와, 레벨차의 부가회로와를 설치한다.    부가회로에 있어서, 이것을 통과하는 신호의 시간차 및 레벨차를 검출수단의 검출출력에 따라서 제어한다.
Patent KR-20010006167-A (KR)
Title: 수중유 형 유화 조성물
IPC: A61K8/67
Filed: 1999-02-08
Abstract: 본 발명은 비타민 A의 지방산 에스테르의 항산화 수단과 함께 비타민 A의 지방산 에스테르의 가수분해 방지 수단을 포함하는, 비타민 A의 지방산 에스테르를 함유하는 수중유 형 유화 조성물에 관한 것이다.  비타민 A의 지방산 에스테르는 안정화되어 있는 해당 조성물은 특히 외용 조성물로서 유용하다.
Patent KR-20010013157-A (KR)
Inventor: KOICHI MUKASA
IPC: G11B5/02
Filed: 1999-02-09
Abstract: A method and apparatus for high-density magnetic recording carried out in spins. A recording media (1) has recording tracks (3) composed of an array of recorded spins (2). The recording media (1) comprises very thin magnetic film on which an array of positive and negative spins (2) are recorded.
Patent KR-20010014078-A (KR)
Inventor: DAWSON MICHAEL JOHN
IPC: C12P13/00
Filed: 1998-08-20
Abstract: The present invention relates to a process for the production of substantially enantiomerically pure intermediates of formula (IV), wherein P is an activating and protecting group, from their racemates by treating the mixture with an acylase enzyme derived from Bacillus sp..
Patent KR-20010020524-A (KR)
Title: 산화될 수 있는 층을 갖는 세라믹
IPC: C04B41/87
Filed: 1999-04-27
Abstract: 본 발명에 따르는 제품은 실리콘-함유 기판 및 외부 환경/열 차단 피막을 포함한다.  외부 환경/열 차단 피막은 환경 산화제의 확산에 대해 투과성이고 실리콘-함유 기판은 산화제와의 반응에 의해 산화되어 하나 이상의 기체상 생성물을 형성한다.  본 발명에 따르는 제품은 실리콘-함유 기판과 산화제가 반응하기 전에 우선적으로 산화제와 반응하여 비기체 생성물로 산화될 수 있는 환경/열 차단 피막과 실리콘-함유 기판 사이의 중간 층/피막을 포함한다.  제품을 제조하는 방법은 산화제와의 반응에 의해 하나 이상의 기체상 생성물로 산화될 수 있는 실리콘계 기판을 형성하는 단계; 및 중간 층/피막을 상기 기판상에 피복하는 단계를 포함하고, 이때 중간 층/피막은 실리콘-함유 기판과 산화제가 반응하기 전에 우선적으로 산화제와 반응하여 비기체상 생성물로 산화될 수 있다.
Patent KR-20010020548-A (KR)
IPC: B29C43/18
Filed: 1998-08-06
Abstract: 본 발명은 복수의 폴리머판과 도전성 금속판을 교대로 적층하여 이루는 적층체를 예열하기 위한 방법, 적층체의 제조방법 및 제조장치에 관한 것으로서, 본 발명은 적층체의 적층방향에 전극을 통하여 고주파 전압을 인가함으로써 폴리머판을 유전가열하는 예열방법, 적층체의 적층면을 위요하는 고리형상의 수용체에 수용한 상태에서 적층체의 적층방향에 전극을 통하여 고주파 전압을 인가함으로써 폴리머판을 유전가열함과 동시에, 적어도 고주파 전압의 인가 종료후에 적층체를 적층방향으로 가압하는 적층체의 제조방법 및 장치에 관한 것을 특징으로 한다.
Patent KR-20010068464-A (KR)
Title: Manhole clip for electrical communication
Inventor: YOON I DONG
IPC: E02D29/14
Filed: 2000-01-06
Abstract: PURPOSE: A manhole lifting clip is provided to prevent the inflow of raindrops into a manhole and to gradually lift the manhole when a road is paved again. CONSTITUTION: A manhole lifting clip(1) is produced at the same standard as an upper body(100). A circular seating portion(2) to be inserted inside an outer portion(101) of the upper body(100) and a circular accepting groove to accept the outer portion(101) are formed under the manhole lifting clip(1). A large supporting sill and a small supporting sill are formed on the circular seating portion(2). A large packing groove is formed in the large supporting sill to be inserted a large packing. A small packing groove is formed under the circular seating portion(2) to be inserted a small packing(8). A circular hanging sill is formed in the circular seating portion(2) to support an auxiliary lid(200). An outer protrusion(9) to be extended from the circular seating portion(2) and the large supporting sill is protruded on the circular accepting groove. A rotation preventing groove is formed inside the outer protrusion(9) to be combined with a rotation preventing protrusion to be protruded from a rim portion(301) of a manhole lid(300).
Patent KR-20010069142-A (KR)
Title: Apparatus for detecting sync signal of digital tv
Inventor: HONG SEONG RYONG
IPC: H04N21/434
Filed: 2000-01-12
Abstract: PURPOSE: An apparatus for detecting a synchronization signal of a digital television is provided to detect stably a synchronous signal under a serious ghost environment. CONSTITUTION: A 512-tap correlation portion(501) calculates a correlation between a signal received in symbol units and a preset field synchronization signal and outputs the correlation. A maximum value detector(502) detects a location of a symbol with the maximum correlation. A synchronous lock signal generator(503) checks reliability for the position of the symbol detected in the maximum value detector(502) and generates a synchronous lock signal. A synchronous location controller(504) calculates a relative location of the symbol with the maximum correlation according to the synchronous lock signal and generates a corresponding synchronous signal.