baber/WOPTO huggingface dataset:
Patent TW-360854-B (TW)
Title: Image processing device
Inventor: YAMAMOTO HITOSHI
IPC: G06T1/60
Filed: 1997-12-15
Granted: 1999-06-11
Abstract: An image processing apparatus performs one of reading and writing of pixel data for a predetermined number of pixels at one access to a frame buffer which stores the pixel data, the frame buffer comprising a memory to which access in a page mode can be performed. A pixel buffer portion comprises a plurality of stages of pixel buffers, each thereof storing the pixel data for the predetermined number of pixel data stored in each stage of the pixel buffer, and, in accordance with the determined number of pixel data, determines the number of times of CAS, which is the number of accesses which are performed successively for the same row address in one page mode operation when data is written in the fame buffer.
Patent TW-538012-B (TW)
Title: Lead and cadmium-free encapsulant composition
Inventor: DONOHUE PAUL C
IPC: C03C8/04
Filed: 1998-02-12
Granted: 2003-06-21
Abstract: A lead and cadmium-free encapsulant glass composition consisting essentially of by weight %, 60-80% Bi2O3, 6-14% SiO2, 5-12% B2O3, 5-10% Al2O3 and 0-4% ZnO.
Patent TW-374902-B (TW)
Title: CD for recording and re-generating
Inventor: TANOUE KOKI
IPC: G11B7/007
Filed: 1998-03-09
Granted: 1999-11-21
Abstract: The present invention aims to provide large-capacity recording and high-speed access and at the same time, being capable of executing highly reliable, accurate, high-speed and continuous data recording and re-generation. The execution is mainly a recording of lands and groves in mono-spiral being the head disposed in the saw-dented data area which is first divided into a plurality of annular areas where shift sectors are designated.
Patent TW-410471-B (TW)
Title: Manufacturing method for dual cylinder capacitor
Inventor: PENG NAI-JEN
IPC: H01L21/02
Filed: 1998-05-22
Granted: 2000-11-01
Abstract: A kind of manufacturing method for a dual cylinder capacitor which is to define a cylindrical oxide on the conductive layer; then, sequentially forming the silicon nitride spacer and the first oxide spacer on the outer side; using these structures as the hard mask to etch the conductive layer so as to separate the conductive layer to be formed as the bottom electrode; removing the oxide to leave the silicon nitride spacer; next, forming the second oxide spacer and the third oxide spacer on the side of nitride spacer; after removing the silicon nitride spacer, conducting etching on the conductive layer to form the dual cylinder bottom electrode.
Patent TW-434730-B (TW)
Title: Wafer cleaning device and tray used for the device
Inventor: SONODA HARUKI
IPC: H01L21/304
Filed: 1998-09-14
Granted: 2001-05-16
Abstract: The present invention provides a wafer cleaning device and tray used for the device, comprising a strip tray 12 and a cleaning tank 20. The strip tray 12 has a gripping grooves 12a for gripping both side ends of wafers 1 and encircling the outer peripheries of the wafers 1 so as to expose the upper and lower parts of the wafers 1. The cleaning tank 20 carries the wafers 1 housed in this tray 12 by robots 2 to clean the wafers 1. This tank 20 is provided with guides 22, which install the tray 12 in the tank 20, a bottom 26, which is formed into a roughly V shape together with the form of the bottoms of the wafers 1, and an outlet 24 for feeding a cleaning liquid within the tank 20. Moreover, the tank 20 is provided with overflow tanks 30 for housing the cleaning liquid, which flows from the tank 20, and these overflow tanks 30 are provided with a circulating line 32, which circulates again the cleaning liquid to the tank 20, and a pump 34 and a valve 36, which are mounted on this circulating line 32.
Patent TW-417347-B (TW)
Title: Brushless DC motor using permanent magnet
Inventor: HIRANO MASAHIRO
IPC: H02K1/16
Filed: 1998-09-15
Granted: 2001-01-01
Abstract: A brushless DC motor which comprises a stator, a stator iron core with three-phase armature winding, a rotator with permanent magnet which is rotatably installed in the stator; in which, the number of magnetic poles formed by the permanent magnet is 14 and the number of slots of stator iron core is 12, and the three phase armature winding is installed with centralized winding system in the plurality of slots.
Patent TW-387817-B (TW)
Title: Air purifier
Inventor: OBIKANE MASAHITO
IPC: B01D47/00
Filed: 1998-10-07
Granted: 2000-04-21
Abstract: The present invention provides an air purifier which can be simply used in ordinary homes, offices, etc., even when it is a system using a liquid especially, water and is more miniaturized and inexpensive. Solutions: Water stored in a water tank 2 and set at a quantity within a specified range, a rotating body 7 for forming countless fine water drops by spraying the water in a closed space 4, a fan 12 for delivering open air into the closed space 4 under a condition where it is filled with countlessly broken fine water drops formed by the rotating body 7, a gas-water separating tower 5 for performing gas-water separation of air containing the countlessly broken fine water drops and a guide 19 for guiding the air which passes through the gas-water separating tower 5 into open air, are provided and pins 33 whose lower part sides are immersed in the water in the water tank 2 and with the upper part of which water pumped up and sprayed collides, are provided.
Patent TW-460409-B (TW)
Title: Process for preparing boron-trifluoride and sulphuric acid from technical boron-trifluoride hydrate and oleum
Inventor: CHALIEUX JEAN-PAUL
IPC: C01B17/74
Filed: 1998-11-30
Granted: 2001-10-21
Abstract: The invention relates to the preparation of BF3 and H2SO4 of commercial grade from boron trifluoride hydrate effluents containing organic impurities. The process consists essentially in reacting the said effluent with oleum, in recovering the gaseous boron trifluoride thereby liberated and in subjecting the sulphuric acid by-product to treatment with hydrogen peroxide and to purging with air.
Patent TW-465066-B (TW)
Title: Electronic component with tin-nickel alloy treated surface
Inventor: FUKUI KUNIHIKO
IPC: C23C30/00
Filed: 1998-12-10
Granted: 2001-11-21
Abstract: This invention describes electronic component with tin-nickel alloy treated surface. A tin-nickel alloy containing not less than 75 weight % and less than 100 weight % of tin with the balance of nickel. The alloy is used, for example, for formation of a surface treatment layer (10) of an electronic component (1) which is to be soldered onto a substrate (5) with the use of the surface mount technology. The surface treatment layer (10) preferably has a thickness of not less than 0.1 μm and less than 0.5 μm. The electronic component (1) preferably further includes a nickel plating layer as an underlying layer (11) interposed between a base (9) of the component (1) and the surface treatment layer (10).
Patent TW-486774-B (TW)
Title: Shallow trench isolation technique joining field oxide layer
Inventor: LI HAU-MING
IPC: H01L21/762
Filed: 1998-12-19
Granted: 2002-05-11
Abstract: This invention provides a shallow trench isolation technique joining field oxide layer. A pad oxide layer and a mask layer are formed on a given substrate and the mask layer is patterned to form an opening. A spacer is formed on the exposed sidewall of the opening of the mask layer, which is used as mask to perform etching process to form a trench in the substrate. A liner oxide layer and an insulation layer are formed sequentially in the trench. The mask layer and the spacer are removed and another mask layer is formed on the substrate. This mask layer has an opening exposing the insulation layer in the trench and part of pad oxide layer on the substrate surface. The second mask layer is used as mask to remove the exposed pad oxide layer in the opening and a thermal oxidation process is carried out to form an oxide layer on the substrate exposed through the opening. Finally, the second mask layer and the pad oxide layer are removed to complete the manufacture of the shallow trench isolation.
Patent TW-526245-B (TW)
Title: Asymmetrical reactive red dye, composition containing the same and preparation method thereof
Inventor: YE MING-MEI
IPC: C09B62/03
Filed: 1999-03-12
Granted: 2003-04-01
Abstract: A reactive red dye has a following formula (I), in which R, X, A and A' are defined as mentioned in the invention description document. This type of dye can be used for dyeing and printing cellulose fiber such as cotton, artificial cotton, linen and artificial linen. This invention also relates to a composition containing formula (I) and the preparation method of the composition.
Patent TW-I224088-B (TW)
Title: Process for the preparation of malononitrile
Inventor: CHEN PETER
IPC: C07B61/00
Filed: 1999-03-16
Granted: 2004-11-21
Abstract: A novel process for the preparation of malononitrile involves subjecting an isonitrile, optionally in the presence of a nitrile, to a high-temperature treatment.
Patent TW-423170-B (TW)
Title: High power ultrasonic transducer
Inventor: NILSSON BO
IPC: H01L41/09
Filed: 1999-05-10
Granted: 2001-02-21
Abstract: A method to improve the high output characteristics of a ultrasonic transducer 1 by urging a cooling gas 13 to flow through the transducer, thereby passing a cooling member 18 between each adjacent pair of piezoelectric elements 6, 7. In a preferred embodiment sulfurhexafluoride (SF6) is used as cooling gas.
Patent TW-483068-B (TW)
Title: Process for forming nanoporous dielectric coating on substrate and semiconductor device produced thereby
Inventor: WU HUI-JUNG
IPC: C08G77/02
Filed: 1999-08-17
Granted: 2002-04-11
Abstract: A process for forming a nanoporous dielectric coating on a substrate. The process includes either (i) combining a stream of an alkoxysilane composition with a stream of a base containing catalyst composition to form a combined composition stream; immediately depositing the combined composition stream onto a surface of a substrate and exposing the combined composition to water (in either order or simultaneously); and curing the combined composition; or (ii) combining a stream of an alkoxysilane composition with a stream of water to form a combined composition stream; immediately depositing the combined composition stream onto a surface of a substrate; and curing the combined composition.
Patent TW-513382-B (TW)
Title: Purification of gases
Inventor: HSIUNG THOMAS HSIAO-LING
IPC: C01B32/50
Filed: 1999-12-03
Granted: 2002-12-11
Abstract: Carbon monoxide is removed from air prior to cryogenic separation of oxygen and nitrogen. Feed air is compressed and the heat of compression is used without further heating to drive catalytic oxidation of CO to CO2 over a Pd and/or Pt on alumina catalyst followed by adsorption of water initially present and then either adsorption of hydrogen or oxidation of hydrogen to water and its removal by adsorption, along with carbon dioxide.
Patent TW-472502-B (TW)
Title: High pressure mercury vapor discharge lamp and lamp unit
Inventor: KAI MAKOTO
IPC: H01J61/86
Filed: 2000-02-08
Granted: 2002-01-11
Abstract: A high pressure mercury vapor discharge lamp of a short arc type having a pair of electrodes in a light emitting tube filled with mercury vapor, a rare gas and the like is operative, for example, at a lamp current of not lower than about 1.5 A or at a lamp voltage/lamp current value of not greater than about 37.5 [V/A]. An inter-electrode spacing is determined so that a rated power per unit arc length P/d is not smaller than 88 [W/mm] and a tube wall load Pw (rated power/interior surface area of the light emitting tube) is not greater than 1.0 [W/mm<SP>2</SP>]. Thus, the lamp can be provided which is operative at a high lamp power such as of not lower than 125 W even with a relatively low lamp voltage, and features a small arc length, a great light flux per unit arc length with no possibility of breakage of the light emitting tube.
Patent TW-448527-B (TW)
Title: Wafer level testing structure
Inventor: LIOU AN-HUNG
IPC: H01L21/66
Filed: 2000-02-21
Granted: 2001-08-01
Abstract: This invention is about the wafer level testing structure that is built on a wafer. The wafer contains several dies, dicing regions located in between the dies, and the peripheral region of wafer, in which plural bonding pads are formed on each die. In addition, this wafer level testing structure includes the followings: the insulating layer, which is located on the wafer and has the conducting wire structure; the utilization bump, which is located on the insulating layer that is on top of the die; the testing bump, which located is on the insulating layer that is on top of the dicing region; and the burn-in testing bump, which is located on the insulating layer that is on top of the wafer peripheral region. The conducting wire structure yet includes several conducting wires such as the first conducting wire, the second conducting wire, and the third conducting wire. The first conducting wire is used for the corresponding electric connection between the bonding pad and the utilization bump. The second conducting wire is used for the corresponding electric connection between the bonding pad and the testing bump. The third conducting wire is used for the corresponding electric connection between the bonding pad and the burn-in testing bump.
Patent TW-444107-B (TW)
Title: Constant velocity universal joint
Inventor: KURA HISAAKI
IPC: F16D3/205
Filed: 2000-03-03
Granted: 2001-07-01
Abstract: A constant velocity universal joint with a further reduction in inductive thrust and slide resistance. The constant velocity universal joint comprises: an outer joint member 10 having three track grooves 12 each having circumferentially-opposed roller guideways 14; a tripod member 20 having three radially-projecting trunnions 22; a roller 34 inserted in each of the track grooves 12; and a ring 32 fitted on each of the trunnions 22 to support the roller 34 rotatably, the roller 34 being movable in axial directions of the outer joint member 1 along the roller guideways 14. Here, the inner periphery of the ring 32 is shaped arcuate and convex in section. The outer periphery of each of the trunnions 22 is shaped straight in longitudinal section, as well as formed in cross section so as to make a contact with the inner periphery of the ring 32 along a direction perpendicular to the axis of the joint and create a clearance with the inner periphery of the ring 32 in an axial direction of the joint.
Patent TW-440653-B (TW)
Title: Turbine blade
Inventor: PHILLIPSEN BENT
IPC: F01D5/14
Filed: 2000-03-21
Granted: 2001-06-16
Abstract: The object of the invention is to achieve a further improvement in efficiency for a turbine blade which is provided with a bracket arranged in the tip region of the blade and projecting beyond the blade profile. To this end, the bracket (10) is formed merely in a section (11) of a surface region (13) of the pressure side (8), the surface region (13) being enclosed by an imaginary chord (12) bearing against the pressure side (8) of the blade body (4) both in the region of the leading edge (5) and in the region of the trailing edge (6).
Patent TW-448249-B (TW)
Title: Sequential hydride vapor phase epitaxy
Inventor: SOLOMON GLENN S
IPC: H01L33/32
Filed: 2000-04-18
Granted: 2001-08-01
Abstract: A method for forming a relatively thick epitaxial film of a III-V compound on a non-native substrate involves sequentially forming a plurality of epitaxial layers on the substrate at a growth temperature. By cooling the substrate and each sequentially grown epitaxial layer to a sub-growth temperature prior to resumption of epitaxial growth, stress within the sample (due to thermal mismatch between the substrate and the epitaxial layer) is periodically relieved. Sequential epitaxial growth is combined with system etching to provide an epitaxial layer which not only has a lower propensity to shatter, but also exhibits improved surface morphology. Sequential hydride vapor-phase epitaxy using HCl as both source gas and etchant, allows integration of sequential deposition and system etching into a single process.
Patent TW-447156-B (TW)
Title: Nonaqueous electrolyte secondary battery
Inventor: NUMATA TATSUJI
IPC: H01M10/05
Filed: 2000-04-24
Granted: 2001-07-21
Abstract: A nonaqueous electrolyte secondary battery uses a lithium manganese composite oxide as its positive electrode active material, and is improved in cycle life at a high temperature, and also improved in capacity retention properties. A negative electrode active material of the battery is capable of doping and undoping a lithium ion. The battery contains in its inside at least one of: an oxide of at least one element selected from the group consisting of La, Sr, Nd, and Sm; a carbonate of at least one element selected from the group consisting of La, Sr, Nd, and Sm; and, a composite oxide of manganese combined with at least one element selected from the group consisting of La, Sr, Nd, and Sm. The battery uses an electrolyte, the electrolyte containing LiPF6 or LiBF4 as its supporting salt.
Patent TW-550258-B (TW)
Title: 4-phenyl-pyrimidine derivatives
Inventor: BOS MICHAEL
IPC: A61P25/24
Filed: 2000-05-22
Granted: 2003-09-01
Abstract: The invention relates to compounds of the formula wherein R1 is hydrogen or halogen; R2 is hydrogen, halogen, lower alkyl or lower alkoxy; R1 and R2 may be together with the two carbon atoms -CH=CH-CH=CH-; R3 is halogen, trifluoromethyl, lower alkyl or lower alkoxy; R4/R4"" are independently from each other hydrogen or lower alkyl; R5 is lower alkyl, lower alkoxy, amino, phenyl, hydroxy-lower alkyl, cyano-lower alkyl, carbamoyl-lower alkyl, pyridyl, pyrimidyl, -(CH2)n-piperazinyl, which is optionally substituted by one or two lower alkyl groups or by hydroxy-lower alkyl, -(CH2)n-morpholinyl, -(CH2)n-piperidinyl, -(CH2)n+1-imidazolyl, lower alkyl-sulfanyl, lower alkyl-sulfonyl, benzylamino, -NH-(CH2)n+1N(R4"")2, -(CH2)n+1N(R4"")2, -O-(CH2)n+1-morpholmyl, -O-(CH2)n+1-piperidmyl or -O-(CH2)n+1N(R4"")2, wherein R4"" is hydrogen or lower alkyl; and n is 0-2; X is -C(O)N(R4"")- or -N(R4"")C(O)-; and to pharmaceutically acceptable acid addition salts thereof. It has been shown that the compounds have a good affinity to the NK-1 receptor and may therefore used for the treatment of diseases related to this receptor.
Patent TW-454242-B (TW)
Title: Photomask, semiconductor device, and method for exposing through photomask
Inventor: KAWACHI TOSHIHIDE
IPC: G03F1/42
Filed: 2000-06-05
Granted: 2001-09-11
Abstract: The present invention provides a photomask, a semiconductor device, and a method for exposing through the photomask. The photomask comprises a photomask substrate, and an on-mask circuit area including an on-mask circuit pattern and an on-mask test mark area including an on-mask test pattern, both formed on the surface of the substrate, wherein the photomask substrate further includes an on-mask photolithography screening mark area including an on-mask comparison pattern and an on-mask screening pattern, the on-mask comparison pattern has substantially the same configuration as at least a part of the on-mask circuit pattern, and the on-mask screening pattern has substantially the same configuration as at least a part of the on-mask test pattern. The present invention allows it to measure the actual displacement generated from an overlaying (i.e. alignment) process for the purpose of eliminating of an the overlay displacement which can take place in a photolithography process.
Patent TW-I234591-B (TW)
Title: An acid bath for electrodeposition of glossy gold and gold alloy layers and a gloss additive for same
Inventor: MANZ UWE
IPC: C25D3/48
Filed: 2000-06-12
Granted: 2005-06-21
Abstract: The invention provides an acid bath for the electrodeposition of glossy gold and gold alloy layers and a gloss additive for same. By using compounds of the formula I: R-SOm-H, in which m is the number 3 or 4 and R represents a straight-chain or branched or cyclic alkyl group with up to 20 carbon atoms and, in the event that m=4, also an aryl or heteroaryl group with up to 10 carbon atoms, which may be optionally substituted once or several times with straight-chain or branched alkyl groups with 1 to 14 carbon atoms, as a further gloss additive, the current density/working range is extended with a small negative effect when the pH is changed and the current efficiency and deposition performance is increased.
Patent TW-460279-B (TW)
Title: System, apparatus, and method for correcting vision using electro-active spectacles
Inventor: BLUM RONALD D
IPC: A61B3/103
Filed: 2000-07-01
Granted: 2001-10-21
Abstract: An electro-active spectacle lens is disclosed. The disclosed lens includes a first lens optic. The disclosed lens also includes a first electro-active zone positioned in a cooperative relationship with the first lens optic. In certain embodiments, the electro-active lens includes a range finder positioned in a cooperative relationship with the electro-active lens.
Patent TW-I290152-B (TW)
Title: Process for the production of modified polycarbonates
Inventor: KRATSCHMER SILKE
IPC: C08G64/20
Filed: 2000-07-17
Granted: 2007-11-21
Abstract: The invention comprises a melt transesterification process for the production of polycarbonates. Process for the production of polycarbonates from bisphenols, preferably from bisphenol A, and carbonic acid diesters, in the presence of an alkyl group-substituted phenol as a chain terminator, wherein the phenol used as chain terminator may be introduced in free form or as a compound transesterifiable under the conditions of synthesis, characterized in that phosphonium salts are used as the catalyst.
Patent TW-494709-B (TW)
Title: Electrode used for producing plasma body, plasma processing equipment using said electrode and plasma process using said equipment
Inventor: NAKAMURA KOSUKE
IPC: H01J37/32
Filed: 2000-07-27
Granted: 2002-07-11
Abstract: A plasma processing equipment is disclosed, which comprises plural pairs of electrodes to generate plasma; a chamber to accommodate these electrodes; a gas supply device to supply the plasma generation gas such as rare gas to the chamber; and a power supply to apply a pulse-like or AC voltage between these electrodes, so as to generate dielectric barrier discharge plasma between the high voltage electrodes under atmospheric pressure to give plasma treatment to a material introduced between the electrodes. At least one of the electrodes has a tube-like electrode substrate, and a thermally melted coating of glass-based material on at least an exterior surface exposed on the tube-like electrode to form a protection layer. The endurance voltage of the protection layer is in the range between 1 to 50 KV.
Patent TW-480514-B (TW)
Title: Method of manufacturing a glass substrate for displays and a glass substrate for displays manufactured by same
Inventor: KUZUWA SADAO
IPC: H01J17/16
Filed: 2000-09-26
Granted: 2002-03-21
Abstract: A method of manufacturing a glass substrate for displays is provided, which allows efficient and inexpensive removal of at least a reducing heterogeneous layer formed on the top surface of the glass substrate, and a glass substrate for displays manufactured by the same method. A glass substrate is prepared by the float method. The reducing heterogeneous layer formed on the top surface of the glass substrate is removed by etching using an etchant which is mainly composed of hydrofluoric acid.
Patent TW-477842-B (TW)
Title: A method for controlling drive of a weaving machine and a cutter for use in the machine for cutting warp
Inventor: ANADA MASARU
IPC: D03D49/70
Filed: 2000-10-09
Granted: 2002-03-01
Abstract: After an abnormal weft yarn is picked up and removed, a weaving machine is backwardly operated to come into a standby position. Thereafter, the weaving machine is forwardly operated to come into a cutting position in operative relationship with a reed 21 to allow the weft yarn to be fed from a weft nozzle 22 to a cutting zone of a weft yarn cutter 31 where the weft yarn is then cut. The weaving machine is backwardly operated to come into a normal operation after hitting the reed 21. The starting operation of the weaving machine is simplified, thereby assuring an improved starting operation.