baber/WOPTO huggingface dataset:
Patent JP-S6285377-A (JP)
Title: Summing-up system which follows department hierarchical structure
Inventor: AOKI KANAE
IPC: G06Q50/00
Filed: 1985-10-09
Abstract: PURPOSE:To cope flexibly with a change of a department, and also to execute re-summing-up by tracing back to the beginning of a term, by defining in advance a department hierarchical structure independently entirely from a department code. CONSTITUTION:As for a hierarchical structure, a subordinate department of a department A1 consists of departments B1, B2 and B3, a subordinate department of the department B1 consists of departments C1, C2, and a subordinate department of the department B3 consists of departments D1, D2. A department structure which has been constituted in this way is stored in a hierarchical structure store part 3, also analyzed by a hierarchical structure analyzing part 4, and an execution format is stored in the store part 3 again. A hierarchical structure summing-up part 5 sums up numerical information by referring to the execution format of the store part 3, and stores it in a department information store part 6. In this way, in a management account field, the stored department hierarchical structure can be utilized as a means for summing up the expenses, etc. generated in the subordinate department, to a host department.
Patent JP-H0677972-A (JP)
Title: Communication system
Inventor: JINZAKI AKIRA
IPC: H04L12/42
Filed: 1992-08-25
Abstract: PURPOSE:To provide frame communication, which simplifies a communication control sequence and is easily made into hardware, concerning the communication system for performing communication between communication equipments connected to a network by using a frame such as a packet. CONSTITUTION:The frame transmitted from a communication equipment 101 at the transmission source is circulated through another communication equipment 101 connected to a network 102 and afterwards returned to the transmission source again. A communication frame transmitting means 108, communication flame reception repeating means 109, communication frame repeating means 110 and communication frame reception terminating means 111 connected to a network interface means 103 process the communication frame under simple control such as the reference or change of communicating state information at a communicating state information managing means 105. Comparatively complicated control such as the setting of communication data to a communication data storage means 104, correspondence between the communication data storage means 104 and the communicating state information managing means 105 or the retransmission processing of the frame is performed by a communication processing control means 107 independently of these respective means.
Patent JP-S59116732-A (JP)
Title: Variable power copying device
Inventor: TORIKAI AKIYOSHI
IPC: G03G15/04
Filed: 1982-12-24
Abstract: PURPOSE:To facilitate a registration by fixing an array group so that optical axes of respective arrays are coincident on the surface of a photosensitive body, and moving a light shielding means so that only the luminous flux of original image formation from a small-diameter image-forming element which is selected in the array group corresponding to magnification passes through the photosensitive body. CONSTITUTION:The array group 7 is fixed to a copying machine frame 1 so that the optical axes of arrays 8, 9, and 10 are nearly coincident on the photosensitive drum 11, and each array is isolated by a light shielding member. A lighting device 4 moves left and right so that the center of an opening part 5a coincides with the optical axis of the arrays 8, 9, or 10 according to selected magnification. When a table 3 reaches a switch 20, that is detected to energize a clutch which drives a regist roller 16, and consequently transfer paper is conveyed toward a transfer position. Placing the head of an original image in specific position relation (e.g. aligned) to the head of the transfer paper. A switch 20 is used to drive the regist roller 16 in common for a copy of any magnification.
Patent JP-S61102739-A (JP)
Title: Method of forming pattern
Inventor: YAMASHITA HIROSHI
IPC: G03F7/20
Filed: 1984-10-26
Abstract: PURPOSE:To form a fine pattern in submicron with high productivity by combining ultraviolet-beam exposure and electron-beam exposure. CONSTITUTION:Polymethyl methacrylate (PMMA)2 for a resist for positive type electron-beam exposure is applied onto an Si substrate 1, and pre-baked, and a novolac type positive type photo-resist 3 is applied onto PMMA2, and pre-baked. An opening pattern 4 is exposed by ultraviolet beams, and developed by using an organic alkali group developer, and the whole surface is irradiated by far ultraviolet beams while employing the novolac type positive type photo- resist 3 as a mask. When the whole is dipped in the developer again and the novolac type positive type photo-resist 3 is removed, PMMA 2 with an exposure section 5 for an opening exposed by far ultraviolet beams is exposed. An exposure section 6 for a fine opening is exposed by electron beams, and developed by methyl isobutyl ketone, thus acquiring a predetermined times pattern with a gate pad section and an opening 7 for a fine pattern.
Patent JP-H0646684-A (JP)
Title: Material for agricultural use
Inventor: TAKAHASHI HIROSHI
IPC: A01G13/02
Filed: 1992-08-03
Abstract: PURPOSE:To provide a light-quality converting material for agricultural use, containing a pigment having a specific absorption peak wavelength, useful for the culture in a plastic greenhouse and giving fruits, flowers, etc., having high quality in a short time in high yield. CONSTITUTION:The objective material is produced by applying a pigment having an absorption peak wavelength of 380-500nm (e.g. Direct Fast Yellow GC and Direct Fast Orange) to a film, plate, woven fabric, etc., of polyethylene, polycarbonate, ethylcellulose polymer, etc., by coating, impregnation, etc., to form a pigment-containing synthetic resin layer having a thickness of preferably 30-150mum.
Patent JP-S6474002-A (JP)
Title: Auxiliary power-supply device for electric car for both ac and dc
Inventor: TSUCHIYA YOSHIHARU
IPC: B60L1/00
Filed: 1987-09-11
Abstract: PURPOSE:To prevent peak charge from being generated in an AC section without increasing the capacity of a dummy resistor, by setting a cooling auxiliary rotary machine to be the load of an inverter unit. CONSTITUTION:In a DC section, the DC power of input from a stringing is fed to an inverter unit via a contact on the DC side of AC/DC converters 18A-18C. In an AC section, the AC power of input from the stringing is fed to the inverter unit via a transformer 19, a rectifier 20, and a smoothing reactor 22. Then, the output of the inverter unit is fed to an inverter load and a cooling auxiliary rotary machine 22 via inverter transformers 10A, 10B. As a result, the inverter unit is not perfectly turned into that of a nonload, and even if a dummy resistor is released, overvoltage due to the peak charge of a filter capacitor can be suppressed.
Patent JP-H0968978-A (JP)
Title: Chorus effect imparting device
Inventor: NAGATA YUICHI
IPC: G10H1/36
Filed: 1995-09-04
Abstract: PROBLEM TO BE SOLVED: To provide a chorus effect imparting device with which the chorus effect having the ample attendance feel approximate to the attendance feel obtainable by the actual chorus is obtainable. SOLUTION: This chorus effect imparting device is constituted to release the chorus sounds of the respective parts formed by a chorus system CS from different speakers SP1 to SP4 through the output system of every part different from the system (main vocal system MS) of the respective vocal sounds. As a result, a user is able to enjoy the attendance feel approximate to the attendance feel obtainable by the actual chorus.
Patent JP-2000053091-A (JP)
Title: Oil feeding structure for small planing boat
Inventor: ASAKURA YUKIO
IPC: B63B19/00
Filed: 1998-08-11
Abstract: PROBLEM TO BE SOLVED: To provide an oil feeding structure for a small planing boat, which is capable of improving the appearance design of the small planing boat, discharging air from a tank well at the time of oil feeding, and performing smooth oil feeding. SOLUTION: Slopes 15 inclined downward toward the outside are formed in both sides of a portion between the housing portion B of a storage box 11, which is a highest part in a deck 2, and the housing portion S of a steering mechanism, oil feeding ports 9 and 10 are formed in both of these slopes and, from the oil feeding ports 9 and 10, first and second oil feeding pipe members 17 and 18 are connected to a fuel tank 7 and a lubricating oil tank 8 downward in a near vertical direction and substantially on a straight line.
Patent JP-2000063153-A (JP)
Title: Water-repelling substrate and its production
Inventor: AKAMATSU YOSHINORI
IPC: C09D5/00
Filed: 1998-08-11
Abstract: PROBLEM TO BE SOLVED: To provide a high-quality water-repelling substrate having high long- term durability and excellent abrasion resistance, light resistance chemical resistance, etc., and provide its production process. SOLUTION: A water-repelling liquid composed of a hydrolyzed or polymerized product of a silane compound having a fluoroalkyl group and expressed by the formula, CF3(CF2)m(CH2)2SiX3 ((m) is an integer of >=9; X is a halogen, isocyanate group or an alkoxy group) is applied to the surface of a substrate directly or on an undercoating layer of the substrate to fix the water-repelling coating film composed of a silane compound containing a long-chain fluoroalkyl group on the surface of the substrate.
Patent JP-H0567623-A (JP)
Title: Manufacture of semiconductor device
Inventor: TSUDA HIROSHI
IPC: H01L29/73
Filed: 1991-09-06
Abstract: PURPOSE:To suppress the irregularity of the diffusion layer of a semiconductor device, and to univocally determine DC characteristics. CONSTITUTION:After a silicon oxide film 3 has been formed on an N-type silicon substrate 1, a P-type base layer 2 is formed. An aperture 4 is perforated, and a polysilicon film 5 is formed. Using photoresists 9 and 10, arsenic ions are implanted into the aperture part where an emitter region 7 will be formed, boron ions are implanted into the aperture part 6 where a base-contact region will be formed, and then the ions are diffused by conducting a heat treatment.
Patent JP-H0898598-A (JP)
Title: Overexcitation limiting equipment of synchronous machine
Inventor: SHIMIZU MASANORI
IPC: H02P9/14
Filed: 1994-09-21
Abstract: PURPOSE: To allow overexcitation to the tolerable limit which is set for securing the stability of the electric system even if overexcitation is generated repeatedly and at the same time, secure the stability of the electric system. CONSTITUTION: In this system, an integrator 11 which determines an integrated value for field current which is used as a reference for a tolerable value of overexcitation of a field winding 2, a storage 13 which stores the integrated value, judging from charging of a capacitor due to the output of the integrated value, etc., and an adder 14 which adds the integrated value which is obtained from the integrator 11 to the stored value are provided. When an added value of the adder 14 exceeds a preliminarily set limit value, a field control limiting means 16 is caused to limit the field control by ar automatic voltage regulator 4.
Patent JP-H0677760-A (JP)
Title: Automatic frequency control circuit for filter circuit
Inventor: INAGAKI RYOSUKE
IPC: G11B20/00
Filed: 1992-08-26
Abstract: PURPOSE:To enable small-scale and high-accuracy control by comparing the phases of input and output signals from one filter and impressing the output to plural filters so as to respectively control the frequency characteristics of the plural filters. CONSTITUTION:The input and output signals of a first LPF 8A in a second filter circuit 8 are respectively impressed through amplifiers 31 and 32 to a phase comparator 33. With the comparison output (error signal) of this comparator 33, the cut-off frequency of a filter circuit 8A is controlled, and the frequencies of other filters 7A-7E and 8A-8E are automatically controlled. The filter 8A is constituted so as to have phase difference of almost 90 deg. between input and output terminals, and the cut-off frequency is set a little higher than 1.7MHz. A temperature compensating circuit 37 cancels fluctuation caused by the temperature characteristics of the respective filters 7A-7E and 8A-8E. Since the respective filters 7A-7E and 8A-8E are set at the almost equal frequency, the control signal for input and output signals of one of those filters can be used for properly controlling the other filter as well.
Patent JP-S61103964-A (JP)
Title: Epoxy clear coating
Inventor: NUMASHIMA MURAJI
IPC: C09D163/00
Filed: 1984-10-29
Abstract: PURPOSE:The titled coating that is obtained by using a specific polyamide resin as a curing agent and an epoxy resin as a base, thus giving coating films of high clarity and reduced discoloration. CONSTITUTION:The objective coating is obtained by using, as a curing agent, a polyamide resin which is prepared by polycondensation reaction between (A) a polymerized fatty acid which is composed of more than 90wt% of dimer, less than 10wt% of trimmer and the rest amount of monomer and hydrogenated, such as tall oil fatty acid and (B) a polyamine and, as a base, an epoxy resin. The mixing ratio is preferably 1/1-1/1.4 in epoxy equivalent/equivalent of amine active hydrogen atoms.
Patent JP-H0567588-A (JP)
Title: Single wafer ion beam milling apparatus and holder for the same apparatus
Inventor: HASHIMOTO ISAO
IPC: H01L21/302
Filed: 1991-09-06
Abstract: PURPOSE:To curtail the time required by transfer of substrate and prevent contact of a part of a processing means within a processing chamber with the atmosphere by providing a means for controlling the interior to vacuum condition within a cassette and also providing sluice valves between respective chambers. CONSTITUTION:A cassette chamber 1, a robot chamber (load lock chamber) 2 and a processing chamber 3 are respectively sluiced by sluice walls 4a, 4b and apertures 5a, 5b formed at the sluice walls 4a, 4b are respectively opened or closed by sluice valves 6a, 6b. Moreover, the cassette chamber 1 is provided with an exhaust means 9 for evacuating the ineterior thereof to the vacuum condition and the robot chamber 2 is provided with a robot 10. Thereby, it no longer required to change the interior of cassette to the atmospheric condition and vacuum condition for each sheet of substrate and the time required for transfer of substrate can be curtailed. In addition, contact with atmosphere of a part of the processing means within the processing chamber can be prevented.
Patent JP-H1163405-A (JP)
Title: Bolt protecting cap and protecting structure of fluid-transporting tube in boiler using the same
Inventor: TOYAMA KAZUHIRO
IPC: F22B37/10
Filed: 1997-08-08
Abstract: PROBLEM TO BE SOLVED: To prevent the falling of a protective cap, and to make it securely fittable by forming a recessed groove in the direction parallel to the upper surface of the ceramic protective cap on the side surface thereof. SOLUTION: A ceramic protective cap 20 is formed in a complete circle shape having a recessed groove 22 on the side surface 21 of it in the direction parallel to the upper surface thereof and forms fluid transport tube covering parts 14 covering a pair of fluid transport tubes 6 arranged in parallel. The threaded part of a bolt 4 inserted through a bolthole 9 arranged to the central part of protruding part 3 positioning it between fluid transport tube covering parts 14 is screwed with a nut 8 provided to a storing part 10 through a washer 7 and engaging a protective cap 20 with the bolt 4 and a nut 8, the storing part 10 is filled with cement mortar 12. Therefore, the protective cap 20 can withstand the vibration of the fluid transport tubes 6, the adherence of it is increased and the falling of it is prevented.
Patent JP-2001049825-A (JP)
Title: Mortar texture finishing method using highly viscous setting retarder
Inventor: MIYATAKE TAKAMITSU
IPC: B28B11/08
Filed: 1999-08-11
Abstract: PROBLEM TO BE SOLVED: To prevent efflorescence of mortar by applying a highly viscous cement setting retarder which is obtained by adding a thickener to a liquid cement setting retarder while the mortar is in a wet state, and subjecting the mortar surface to texture processing such as scraping before being dried. SOLUTION: Mortar is applied to a predetermined wall surface, and while the applied mortar remains in a wet state, a required amount of a highly viscous cement setting retarder is evenly applied thereto, by means of a roller, a brush, or the like. Then, the highly viscous cement setting retarder is cured with a curing material, such as a felt heat insulator or a blue sheet, having high rain protective and draft-proof performance, in a manner being out of direct contact with the curing material, and when 12 to 36 hours have passed, the highly viscous cement setting retarder is sequentially peeled away range by range so that the cement is not dried during texture processing. Then, the mortar surface is roughly scraped by a soft rough scraping brush, and scratched by a hard scratching brush.  After the mortar surface is sufficiently dried, sand on the surface is removed with a plastering brush. Therefore, beautiful appearance of the mortar surface can be obtained without occurrence of efflorescence thereon.
Patent JP-H04107688-A (JP)
Title: Line segment picture element generator
Inventor: KITSUKI TOSHIAKI
IPC: G06T11/20
Filed: 1990-08-28
Abstract: PURPOSE:To calculate the train of approximate picture elements faithfully to a line segment, in which the coordinate values of starting and ending points are binary fixed point data, by changing the definition of the error item of Bresenham algorithm and changing initial setting. CONSTITUTION:The above generator is equipped with a coordinate input part 1, control signal generation part 2, starting point / ending point picture element calculation part 3, initial setting part 4, and picture element coordinate calculation part 5. The definition of the error item is changed so as to improve the Bresenham algorithm and so that the error item can be integral even to the starting and ending points of a line segment having binary fixed point coordinate values, and the initial set processing is changed for the initial setting corresponding to the deviation of the starting point from the integer coordinate point. Thus, when the coordinate data of a desired line segment or polygon to be drawn is a real number data originally, it is enough only to convert the coordinate data from the real number data to the binary fixed point data in comparison with the conventional preprocessing of converting the coordinate data to the real number data, and distortion caused by the conversion can be reduced.
Patent JP-H0955372-A (JP)
Title: Plasma treatment apparatus
Inventor: INOUE HIROYUKI
IPC: H01L21/302
Filed: 1995-08-11
Abstract: PROBLEM TO BE SOLVED: To obtain a plasma treatment apparatus which restrains a semiconductor wafer form being damaged electrically by a method wherein, when the semiconductor wafer is treated with a plasma inside a reaction tube, an abnormal discharge inside an inside tube used to house the wafer and the leak of a plasma are suppressed. SOLUTION: A plasma treatment apparatus is provided with an inside tube 3 which is installed inside a reaction tube 2 so as to house a plurality of semiconductor wafers 6 and which comprises a plurality of hole parts 4 through which active-species radicals can be passed and with a plurality of ring disk-shaped plasma generation electrodes 7a, 7b which are stacked and arranged along the length direction between the reaction tube 2 and the inside tube 3 and whose electric field is the length direction with reference to the inside tube 3. A reaction gas is introduced from a gas introduction tube 10, high-frequency power is applied to the respective electrodes 7a, 7b by a high-frequency power supply 9, and a plasma P is generated between the respective electrodes 7a, 7b.  Since electric-field directions E1 between the respective electrodes 7a, 7b do not have a component in a direction toward the center of the inside tube 3, the plasma P is confined between the electrodes 7a, 7b, and the wafers 6 are treated only with the active-species radicals which have passed the hole parts 4 in the inside tube 3.
Patent JP-H0869776-A (JP)
Title: Metal halide lamp for liquid crystal projector
Inventor: SAKUGI KYOICHI
IPC: H01J61/20
Filed: 1994-08-30
Abstract: PURPOSE: To facilitate the starting operation of a metal halide lamp throughout the lifetime period by subjecting a powder of a heat resistant compound and a powder of halides containing light emitting substance to a compression molding process, and consolidating them and encapsulating in a discharge vessel. CONSTITUTION: A powder of heat resistant oxide, boride, or nitride of aluminum, titanium, zirconia, etc., is mixed with a powder of halogen compounds containing a light emitting substance such as dysprosium iodide, neodymium iodide, cesium iodide, etc., in a specified mix proportion by weight. Pellets formed by compression molding are put in a discharge vessel 1 through an exhaust pipe 6 and sealed. Then mercury and argon gas are encapsulated in the discharge vessel 1, and the end of the exhaust pipe 6 is sealed. Thereby the light emitting substance as additives emit light sufficiently, and heat resistant oxides, etc., remain as shell and serve as bulk material. Accordingly the impurities in the tube are adsorbed so that the starting operation is facilitated.
Patent JP-H0566040-A (JP)
Title: Range hood
Inventor: TSUTSUI OSAMU
IPC: B01D46/18
Filed: 1991-09-06
Abstract: PURPOSE:To completely remove contamination of a filter, reduce the cost with a compact design, and eliminate bad affection onto electronic devices in a range hood including a filter cleaning mechanism CONSTITUTION:A range hood body 1 includes an exhaust fan 2 and an exhaust fan 2 driving motor 3. Further, a filter 6 is disposed between the exhaust fan 2 and an air suction inlet 5 in the range hood body 1, and a cleaning nozzle 9a is provided to clean the filter 6.
Patent JP-H0391927-A (JP)
Title: Etching process for semiconductor wafer
Inventor: SUZAKI SHINZO
IPC: H01L21/306
Filed: 1989-09-04
Abstract: PURPOSE:To enable the bubbles produced during etching reaction process to be made fugacious outside the reaction system by a method wherein III-V compound semiconductor wafer is vibrated at a high frequency during the etching process. CONSTITUTION:III-V compound semiconductor wafer is high-frequency oscillated during etching process. That is, a semiconductor wafer 1 is immersed in a megasonic cleaner filled up with an etchant or a vessel containing the etchant and the semiconductor wafer 1 is immersed in the water filling up the megasonic cleaner so that the etchant may be agitated with the oscillation by the megasonic cleaner to cause an etching reaction. Through these procedures, the hydrogen bubbles produced in a V-shaped groove 3 and sticked to the surface are discharged out of the groove 3 so that the feeding of reactive material and the discharging of produced material may be performed immediately thereby enabling the diffusion determining rate to be restored to the reaction determining rate.