baber/WOPTO huggingface dataset:
Patent TW-577099-B (TW)
Title: Gas-insulated switch apparatus
Inventor: TAKAHOSHI MASAHIRO
IPC: H01H33/00
Filed: 2000-11-03
Granted: 2004-02-21
Abstract: In order to decrease the length of the connection mother line to obtain reduction of cost, plural T-branched breaker units 12 are arranged in a direction perpendicular to the branching direction. On the horizontal plane which has roughly same height as the T branching portion of the breaker unit 12, plural breaker units 12 are alternately and serially connected in a rectangular wave shape through the first connection mother line unit 14 and the second connection mother line unit 15. Thus, the first connection mother line 5 and the second connection mother line 6 are guided on a horizontal plane that has the same height as the T branching portion of the breaker unit 12, and are not guided in the vertical direction. Therefore, the length of the connection mother line can be decreased and the reduction of cost can be obtained.
Patent TW-I258475-B (TW)
Title: Novel benzoimidazole derivatives useful as antiproliferative agents
Inventor: BARTH WAYNE E
IPC: A61P13/12
Filed: 2000-11-24
Granted: 2006-07-21
Abstract: The invention relates to compounds of the formula 1, and to pharmaceutically acceptable salts, prodrugs and solvates thereof, wherein R1, R7, R8, R9, R10, and R11 are as defined herein. The invention also relates to methods of treating abnormal cell growth, such as cancer, in mammals by administering the compounds of formula 1 and to pharmaceutical compositions for treating such disorders which contain the compounds of formula 1. The invention also relates to methods of preparing the compounds of formula 1.
Patent TW-458858-B (TW)
Title: Case for storing a grinding wheel
Inventor: SHIGA YOSHIYUKI
IPC: B65D43/16
Filed: 2000-11-29
Granted: 2001-10-11
Abstract: A case for storing a grinding wheel which comprises an annular support member and a grinding means provided on the lower end face of the support member. The case includes a first case member and a second case member, the first case member and the second case member are connected to each other by a hinge member in such a manner that they can pivote relative to each other and selectively set to a close state for defining a closed storage space and to an open state for opening the storage space. A receiving means is provided on the first case member and a restricting means is provided on the second came member. The support member is held between the receiving means and the restricting means, and the grinding wheel is stored in the storage space, without allowing the first case member and the second case member to contact with the grinding means.
Patent TW-594877-B (TW)
Title: Semiconductor device manufacturing method and semiconductor manufacturing apparatus
Inventor: MATSUYAMA NAOKO
IPC: C23C16/40
Filed: 2001-01-16
Granted: 2004-06-21
Abstract: A method and apparatus for manufacturing a semiconductor device can achieve the formation of thin films in a uniform thickness on a substrate. The method and apparatus includes a film-forming process in which film-forming gases 14, 15 are caused to flow over a surface of a substrate 11 substantially in parallel therewith to form thin films on the substrate 11 surface. The film-forming process includes an initial film-forming step for forming a first thin film on the surface of the substrate 11, and a main film-forming step for forming, on the first thin film acting as a backing layer, a second thin film of a thickness greater than that of the first thin film under a second film-forming condition which differs from the first film-forming condition.
Patent TW-541373-B (TW)
Title: Friction feed wheel mechanism with vibration excitation
Inventor: SCHMODDE HERMANN
IPC: D04B15/48
Filed: 2001-02-08
Granted: 2003-07-11
Abstract: In connection with a vibration friction feed wheel mechanism, having a thread guide lever for inserting and removing a thread, the application of vibrations to the thread guide elements, or the application of vibrations to the thread feed wheel, is used to improve the removal properties of the friction feed wheel mechanism.
Patent TW-521202-B (TW)
Title: Notebook computer having separable cursor controller
Inventor: CHEN SU-YUN
IPC: G06F3/038
Filed: 2001-02-16
Granted: 2003-02-21
Abstract: A notebook computer having separable cursor controller is disclosed, whose cursor controller can be connected by wireless communication or electrical wire to control the cursor of notebook computer, which comprises a switching device, a wireless pointer and a wire pointer. For the operation of the cursor controller, the operation of wire pointer can be enabled by completing the electrical connection by connecting to the receiving chamber in the housing of notebook computer and disabling the wireless pointer by the switching device, or the operation of wireless pointer can be enabled by the switching device during separating the notebook computer, so as to achieve the purpose and function of the present invention.
Patent TW-479270-B (TW)
Title: Method of wafer reclaim
Inventor: JANG CHING-YU
IPC: H01L21/00
Filed: 2001-03-23
Granted: 2002-03-11
Abstract: A method of wafer reclaim is disclosed, which at least comprises: providing a wafer; perform the first semiconductor manufacturing process to form a thin film layer on the wafer, most particles will be formed on the wafer at this time; perform chemical mechanical polishing process to reduce the size of part of the particles and remove part of the thin film layer; perform wet etching process to further remove the remaining particles and the residual thin film layer; performing cleaning process to clean the surface of the wafer; perform the second semiconductor manufacturing process to form a semiconductor structure on the wafer, also, the concept to substantially remove the thin film layer and particles by performing chemical mechanical polishing and wet etching process of the present invention can be extended to the method of cleaning wafer and planarize wafer.
Patent TW-504734-B (TW)
Title: Substrate processing device
Inventor: KAWAGUCHI YOSHIHIRO
IPC: H01L21/00
Filed: 2001-04-02
Granted: 2002-10-01
Abstract: This invention relates to a substrate processing device. A fin as a first guide member for guiding the atmosphere dispersed by the centrifugal force of a rotating substrate to a lower part of an inner wall of an outer cup is provided in the inner wall of the outer cup. Similarly, a fin as a third guide member for guiding the atmosphere dispersed by the centrifugal force of the rotating substrate to a lower part of an inner wall of an inner cup is provided at the inner wall of the inner cup. Under the outer cup and the inner cup, a fin is fixed to an upright wall in a way that the fin is astride the outer cup and the inner cup. Therefore, a dispersed mist in cup from adhering to a substrate again can be prevented.
Patent TW-535374-B (TW)
Title: Optical add/drop multiplexer apparatus, method of controlling the same and optical communication system
Inventor: TAKAHASHI KENICHIRO
IPC: H04B10/07
Filed: 2001-04-12
Granted: 2003-06-01
Abstract: In the OADM apparatus incorporates a reflecting filter having a tunable mechanism, part of an added or dropped signal light is branched and extracted as a monitor light, and the monitor light is further branched into two lights. One of the two lights after branching is passed through an optical filter having wavelength dependency. The monitor light that has passed through the optical filter and the other monitor light that has not passed through the optical filter are guided to detectors of a detection circuit. The ratio of optical power of the two monitor lights is obtained, and the tunable mechanism is controlled so that the value of the ratio may be a predetermined value.
Patent TW-563225-B (TW)
Title: Method of using a single chip process to manufacture a gate dielectric layer
Inventor: LUOH TUUNG
IPC: H01L21/76
Filed: 2001-05-17
Granted: 2003-11-21
Abstract: A kind of method for using a single chip process to manufacture a gate dielectric layer is disclosed in the present invention. The present invention includes two steps conducted in a single-wafer reaction room and a single-wafer rapid thermal reaction room, respectively. Firstly, a single silicon wafer is placed in the single-wafer reaction room and is followed by a nitridation process conducted to form a silicon oxide layer containing nitrogen on the surface of the silicon wafer. Afterward, the silicon wafer is placed in the single-wafer rapid thermal reaction room to perform an oxidation process along with the steam so as to oxidize the nitrogen-contained silicon oxide layer to form a silicon oxide layer having the silicon-oxy-nitride bottom layer for use as a gate dielectric layer.
Patent TW-503326-B (TW)
Title: High reflection mirror
Inventor: TATSUMI SHUMPEI
IPC: C23C14/08
Filed: 2001-05-23
Granted: 2002-09-21
Abstract: A high reflection mirror has a layer structure comprising on a substrate, a TiOx layer, an Ag layer, an Al2O3 layer and a TiO2 layer in this order, or alternatively on a substrate, an SiOx layer, a Cr layer, an Ag layer, an Al2O3 layer and a TiO2 layer in this order (1 ≤ x ≤ 2). An SiOy protective layer may be formed on the top TiO2 layer (1 ≤ y ≤ 2). The high reflection mirror shows a high reflectance and a high durability and can be produced at a lower cost because of the reduced number of layers.
Patent TW-I288431-B (TW)
Title: Method and apparatus for marking in identification mark in a wafer
Inventor: JEONG SIL-GUN
IPC: B23K26/00
Filed: 2001-06-06
Granted: 2007-10-11
Abstract: Disclosed are a method and an apparatus for marking an identification mark on a wafer. After the wafer is aligned, a laser beam is radiated onto a predetermined portion on the wafer so that the identification mark is engraved on the wafer. While the laser beam is being radiated, a gas blows towards the predetermined portion on the wafer so as to remove the particles which are created on the surface on the wafer caused by the radiation of the laser beam. An exhausting section is provided to exhaust the gas including the particles. Accordingly, the particles are prevented from sticking on the surface on the wafer, so the failure of a device caused by the particles can be prevented when the following processes are carried out.
Patent TW-523905-B (TW)
Title: Semiconductor device and its manufacturing method
Inventor: KOIKE HIDETOSHI
IPC: H01L23/525
Filed: 2001-07-10
Granted: 2003-03-11
Abstract: The present invention provides a kind of semiconductor device and its manufacturing method. The semiconductor device has an opening window for melting the fuse, in which the manufacturing process is simplified and is capable of reducing the cost. The positions of the sidewall 44 of the second protection insulation film 42 on the opening window and the sidewall 45 of the first protection insulation film 39 are continuous such that there is no step difference. Therefore, the phenomenon of narrow fuse-window opening caused by the extrusion of polyimide inside the fuse-window due to the occurrence of unsuitable polyimide will not occur. Additionally, according to the invented manufacturing method of semiconductor device, the second protection insulation film 42 is used as a mask to etch the first protection insulation film 39, thin silicon nitride film 38, and the interlayer protection film 34 of the fuse-window opening portion simultaneously such that it is not necessary to increase one photolithography etching step for the fuse-window in the manufacturing process of soldering pad opening or the other manufacturing process. Therefore, the manufacturing process is simplified and the cost can be reduced. Furthermore, in the other method, the first protection insulation film and thin silicon nitride film of the fuse window are etched when forming the soldering pad opening; then the polyimide mask is used to etch the interlayer insulation film such that it is not necessary to increase one photolithography etching step for the metal fuse-window when manufacturing the soldering pad opening.
Patent TW-515098-B (TW)
Title: Heterojunction tunneling diodes and process for fabricating the same
Inventor: EL-ZEIN NADA
IPC: H01L29/88
Filed: 2001-07-23
Granted: 2002-12-21
Abstract: High quality epitaxial layers of compound semiconductor materials can be grown overlying large silicon wafers by first growing an accommodating buffer layer on a silicon wafer. The accommodating buffer layer is a layer of monocrystalline oxide spaced apart from the silicon wafer by an amorphous interface layer of silicon oxide. The amorphous interface layer dissipates strain and permits the growth of a high quality monocrystalline oxide accommodating buffer layer. Any lattice mismatch between the accommodating buffer layer and the underlying silicon substrate is taken care of by the amorphous interface layer.
Patent TW-501967-B (TW)
Title: Multiple wafer lift apparatus and associated method
Inventor: TAYLOR WILLIAM N JR
IPC: H01L21/683
Filed: 2001-10-03
Granted: 2002-09-11
Abstract: An apparatus and associated method for transporting a first substrate and a second substrate relative to a cell. The cell contains a pedestal that is configured to interact with a single substrate. When swapping wafers in a cell, a first substrate is displaced from the pedestal to a remote location and a second substrate is inserted into the cell and onto the pedestal. The first substrate is then removed from the cell.
Patent TW-I231445-B (TW)
Title: Image processor, image processing method, recording medium and semiconductor device
Inventor: OHBA AKIO
IPC: G06T7/00
Filed: 2001-10-05
Granted: 2005-04-21
Abstract: The present invention provides an image processor to use images taken by an image pickup device, etc. as an input interface to enter commands, etc. The present invention provides an image processor that includes image capturing means for capturing a mirrored moving image partially including a moving target, image generating means for generating an object image expressing a predetermined object according to the movement of the target included in the mirrored moving image captured by the image capturing means and controlling means for combining the object image generated by this image generating means with the captured mirrored moving image and displaying the combined image on a predetermined display device.
Patent TW-I245493-B (TW)
Title: Apparatus for calibrating a charge pump and method therefor
Inventor: HSU TSE-HSIANG
IPC: H03L7/089
Filed: 2001-10-24
Granted: 2005-12-11
Abstract: Disclosed is an apparatus for calibrating a charge pump and method therefore. The signal calibration apparatus includes a detecting circuit, a current adjusting circuit, and a calibrating circuit, wherein the detecting circuit is coupled to the charge pump for outputting a detecting signal according to the direction and magnitude of the current, the current adjusting circuit is coupled to the detecting circuit for outputting a calibrating signal according to the polarity and magnitude of the slew rate of the detecting signal; and the calibrating circuit consists of a first calibration current source and a second calibration current source, which are respectively coupled to the charge pump and the current adjusting circuit for adjusting the calibrating current based on the calibrating signal so as to minimize the output current of the charge pump.
Patent TW-I224686-B (TW)
Title: Polarizer
Inventor: UMEMOTO SEIJI
IPC: G02B5/30
Filed: 2001-11-08
Granted: 2004-12-01
Abstract: There is provided a polarizer constituted by: a polarizing element; and at least one transparent protective film constituted by two layers of retardation films with an in-plane retardation in a range of from 190 to 320 nm with respect to light having a wavelength of 550 nm, the transparent protective film being bonded onto one of opposite surfaces of the polarizing element so that a slow axis of each of the retardation films is parallel with an absorption axis of the polarizing element, the two layers of retardation films being constituted by a combination of a retardation film with Nz of from 0.65 to 0.85 and a retardation film with Nz of from 0.15 to 0.35 on the condition of nx > ny and Nz=(nx-nz)/(nx-ny) in which nx and ny are in-plane refractive indices of each of the retardation films respectively, and nz is a refractive index in a direction of thickness of each of the retardation films.
Patent TW-534986-B (TW)
Title: Inspecting apparatus and inspecting method for circuit board
Inventor: YAMAOKA SHUJI
IPC: G09G3/00
Filed: 2001-11-16
Granted: 2003-06-01
Abstract: The purpose of the present invention is to provide an apparatus and method for inspecting a circuit board at a high speed. An LCD driver module 100 as an object to be inspected has an onboard LCD driving LSI 110. One circuit-wiring 111 is connected to SEG terminals, and another circuit-wiring 112 is connected to COM terminals of the LSI 110. An inspection apparatus 1 generates an LSI drive signal and sends it to input terminals 113 of the LSI 110. Sensors 2, 3 are positioned oppositely to the circuit-wirings 111, 112, respectively, in a non-contact manner. Each of the sensors 2, 3 detects voltage changes in the corresponding circuit-wirings 111, 112 caused by driving the LSI 110, and the detected signals are analyzed by the inspection apparatus 1.
Patent TW-522670-B (TW)
Title: Radio link monitoring in a telecommunications network
Inventor: TORSNER JOHAN
IPC: H04L12/56
Filed: 2001-11-26
Granted: 2003-03-01
Abstract: A method of inspecting a communication link between a UE and a radio access network (RAN) of a mobile telecommunications network. A protocol data unit (PDU) containing a loop request is sent from an RLC entity located at a serving RNC of the RAN to a peer RLC entity located at the UE. The loop PDU is received at said peer RLC entity and recognised as containing a loop request. In response to the loop request, the receiving RLC entity automatically sends a response PDU from the RLC entity at the UE to the RLC entity of the RAN.
Patent TW-519773-B (TW)
Title: LED with high heat conductivity
Inventor: WU TZU-YE
IPC: H01L33/00
Filed: 2001-11-27
Granted: 2003-02-01
Abstract: The present invention relates to an LED design with high heat conductivity, which comprises a bowl slot on the substrate of the anode/cathode circuit, and one or plural LED chips disposed on the bowl slot, wherein the LED chip is connected to the anode circuit or cathode circuit by conducting wires, and the LED is covered with encapsulant, which is characterized in that the substrate has a circuit layer with a good electrical and heat conductivity to form the anode/cathode circuit on the base layer having good heat conduction effect but is insulative, and has a circuit layer with a good electrical and heat conductivity for the leads to conduct to the conductive layer of the circuit layer.
Patent TW-505757-B (TW)
Title: Pinch valve
Inventor: FURUKAWA SHIGENOBU
IPC: F16K7/07
Filed: 2001-12-05
Granted: 2002-10-11
Abstract: A pinch valve according to the invention comprising an elastic tube body 1; a cylinder body 4 having a cylinder portion 2 and a cylinder cap 3; a piston 11 sliding on the inner periphery of the cylinder body; a pressing piece 15 fixed to a connecting portion 13 suspended from the piston; a body 16 joined to the cylinder body and having a groove 17 to receive the tube body; a pair of coupling carriers 20 engaged with the groove of the body and having through holes 26 to receive the tube body 1; first and second spaces 8 and 7 respectively formed above and under the piston 11; and a pair of air openings 10 and 9 respectively communicating with the first and second spaces 8 and 7; so that the whole pinch valve is compactly constituted.
Patent TW-507031-B (TW)
Title: Method for producing composite fiber yarn
Inventor: SHIAU DENG-PO
IPC: D02J13/00
Filed: 2001-12-25
Granted: 2002-10-21
Abstract: A method for producing a composite fiber yarn comprises collecting filament clusters into a bundle A; extruding and wrapping B; first cooling C; cutting D; secondary cooling E; and winding F, in which a plurality of filaments or yarn clusters are used as the outside of the strip-like inner layer. An extrusion is used to wrap a plastic material having a low melting point as the outside layer. Two sets of opposite slant tools of a surface cutter are used to cut the outside layer in order to generate an approximately rhombus cutting mark. The cutting mark on the surface of the outside layer can reduce the hardness of the outside layer caused by the material used, and the diameter of the outside layer formed by extrusion can be constant.
Patent TW-I244678-B (TW)
Title: Correcting the polygon feature pattern with an optical proximity correction method
Inventor: HSIEH CHANG-JYH
IPC: H01L21/027
Filed: 2001-12-28
Granted: 2005-12-01
Abstract: The present invention is provided a method to use a pattern section without extra serif to correct the polygon feature pattern with at least one inner corner. Such that the polygon feature pattern with at least one inner corner can achieve effectively OPC (optical proximity correction) without adding any extra data point. Therefore, the present invention can instead of the conventional serif and achieves the effective OPC. In addition, the mask writing time is also improved since the original feature pattern is divided into a few rectangular-shaped mask writing units or trapeze-shaped mask writing units for regular mask writing, and the inner corner is/are not in the middle of each divided mask writing units. The mask inspection is also simplified and easier to calibration since a simple geometry other than complex serif is used.
Patent TW-I245031-B (TW)
Title: Synthesis of vicinal difluoro aromatics and intermediates thereof
Inventor: LAI GAURI SANKAR
IPC: C07B61/00
Filed: 2002-01-22
Granted: 2005-12-11
Abstract: A method of preparing vicinal difluoro aromatic compounds in high yield from hydroxy aromatic compounds and a method of preparing intermediates thereof. The hydroxy aromatic compound can be a mono-, bi- or tricyclic aromatic in which the rings are separate or fused. One or more of the rings can contain heteroatoms, such as oxygen, nitrogen, or sulfur, and can contain one or more substitutions, in addition to the hydroxy substitution.
Patent TW-I276623-B (TW)
Title: Reaction control method and control apparatus
Inventor: NAKAJIMA HIDEHIKO
IPC: C07C45/50
Filed: 2002-02-26
Granted: 2007-03-21
Abstract: While supplying methanol and carbon monoxide via feed lines 17 and 19, respectively, to a liquid phase reaction system 3 including a carbonylation catalytic system, and maintaining a substantially constant liquid level of the reaction system, part of the reaction mixture containing the produced acetic acid is drawn out from the reaction system and supplied to a flash distillation column 4, and the high boiling point component, which contains the carbonylation catalytic system that has been separated by the flash distillation, is circulated to the reaction system 3 by means of a circulation line 21. At circulation line 21, the flow rate is detected by a flow rate sensor F3 and the temperature is detected by a temperature sensor T2, and based on the detection data, a control unit 8 is used to control the temperature of the circulated high boiling point component by means of a temperature regulating unit 6 and thereby to suppress temperature and pressure fluctuations of the above-mentioned reaction system. According to the present invention, restraint and stabilization of temperature and pressure fluctuations in a liquid phase reaction system (such as a carbonylation reaction system, etc.) can be realized.