Patent GB-1041532-A (GB)
Title: Polish compositions
IPC: C09G1/12
Filed: 1963-01-22
Abstract: A polish comprises (A) from 0.1 to 99% (by wt.) of an organosiloxane-oxyalkylene block copolymer (see Division C3), (B) from 0 to 50% of a wax and (C) from 0 to 99% of an inert organic liquid.  Waxes (B) specified are high M.W. poly-oxyalkylene glycols, beeswax, carnauba wax, ozokerite, microcrystalline h.c. waxes, chlorinated paraffin waxes, petroleum waxes, aliphatic h.c. waxes made by the Fischer-Tropsch process, hydrogenated castor oil, myristic acid and palm wax.  Inert organic liquids specified are hexane, cyclohexane, isooctane, petroleum ether, mineral spirits, decane and turpentine.  Optional ingredients specified are abrasive cleansers, e.g. finely divided silica, clay, diatomaceous earth and pumice, water (a wax must be present when water is used), stabilizers, e.g. triethanolamine lauryl sulphate, polyacrylic acid, carboxymethylcellulose, and alkylphenyl ethers of polyoxyalkylene glycols, and emulsifying and dispersion agents of the non-, cat- and an-ionic types.  Gaseous propellants may also be added when polishes in aerosol form are required. Examples are given.  Reference has been directed by the Comptroller to Specification 916,561.ALSO:A polish comprises (A) from 0.1 to 99% (by wt.) of a block copolymer comprising (1) at least one siloxane block containing at least 2 units of the formula <FORM:1041532/C3/1> , wherein each R is a monovalent saturated or unsaturated hydrocarbon (h.c.) or halo-h.c. or divalent h.c. radical, the block containing at least 1 siloxane unit in which at least 1 R radical is a divalent h.c. radical, and (2) at least one oxyalkylene block containing at least two -R1O- radicals, wherein R1 is an alkylene radical, the siloxane and oxyalkylene blocks being interconnected by the divalent h.c. radical, (B) from 0 to 50% of a wax and (c) from 0 to 99% of an inert liquid organic compound.  The siloxane blocks may also contain <FORM:1041532/C3/2> units, wherein e is 0, 1 or 2, f is 1 or 2 and the sum e + f is 1, 2 or 3. Waxes specified are high M.W. poly-oxyalkylene glycols, beeswax, carnauba wax, ozokerite, microcrystalline h.c. waxes, chlorinated paraffin waxes, petroleum waxes, aliphatic h.c. waxes made by the Fischer-Tropsch process, hydrogenated castor oil, myristic acid and palm wax. Inert organic liquids specified are hexane, cyclohexane, iso-octane, petroleum ether, mineral spirits, decane and turpentine.  The polish may also contain, as optional ingredients, up to 30% of an abrasive cleanser, e.g. finely divided silica, clay, diatomaceous earth and pumice, up to 99% of water, in which case a wax must be present, and up to 15% of stabilizers, e.g. triethanolamine lauryl sulphate, polyacrylic acid, carboxymethylcellulose and alkylphenyl ethers of polyoxyalkylene glycols, and emulsifying and dispersion agents of the non-ionic, cationic and anionic types.  When the polish is to be used in aerosol form gaseous propellants such as CO2 and conventional halo-hydrocarbons may be added.  Examples are given.  Uses.-For polishing floors, furniture, metal surfaces, such as Cr, Ag or Ni surfaces, or painted, varnished or lacquered surfaces.  Reference has been directed by the Comptroller to Specification 916,561.