baber/WOPTO huggingface dataset:
Patent JP-S6073294-A (JP)
Title: Lamination type heat exchanger
Inventor: ASANO KAZUHIKO
IPC: F28D1/03
Filed: 1983-09-30
Abstract: PURPOSE:To cool high-temperature air efficiently and minimize the pressure loss of cooled air by a method wherein two sheets of aluminum plates, provided with cup-shape protuberances at both ends thereof, are opposed and welded to form a fluid path therein while the sets of the plates are laminated sequentially to use them as an intercooler. CONSTITUTION:Two sheets of the plate 1 are connected to form a fluid path 4 and the cup-shape protuberances 1a of respective sets are communicated to form an outlet path 20 and an inlet path 10. A fin 6 is arranged between respective sets of two sheets of plate 1. An inner fin 5 of rectangular waveform is arranged in the fluid path 4 and a relation between the height A and pitch P thereof is designed so as to be P=2-4mm. when A=4.3-5.8mm., P=4-6mm. when A=3.3- 4.3mm. and P=7-9mm. when A=2.3-3.3mm..
Patent JP-S57109341-A (JP)
Title: Semiconductor integrated circuit and manufacture thereof
Inventor: SERIKAWA TADASHI
IPC: C23C14/10
Filed: 1980-12-26
Abstract: PURPOSE:To easily perform a microscopic work on the SiO2 film for the subject semiconductor integrated circuit by a method wherein the SiO2 film of low density is formed using a magnetron sputtering method. CONSTITUTION:A substrate supporting pedestal 14 is placed in a magnetron sputtering container 11. Then, a substrate 15 is placed on the supporting pedestal 14, argon gas is brought in from a gas introducing port 16 and exhausted from an exhaust port 17. At this time, voltage is applied in between an electrode 12 and the container 11. Then, when the SiO2 film is formed on the substrate 11 while maintaining the argon pressure in the range of 0.6Pa-2.5Pa, the density of the SiO2 film is turned to 2.15-2.00g/cm<3>. A microscopic work by etching can be performed easily on the SiO2 film having the above density.
Patent JP-S6338866-A (JP)
Inventor: TANI SHUICHI
IPC: F25B13/00
Filed: 1986-08-04
Abstract: (57)【要約】本公報は電子出願前の出願データであるた め要約のデータは記録されません。
Patent JP-H0512554-A (JP)
Title: Signboard replacing structure for automatic vending machine
Inventor: MATSUMOTO YUTAKA
IPC: G07F9/10
Filed: 1991-06-28
Abstract: PURPOSE:To obtain signboard fixing structure capable of simply removing and replacing a large signboard. CONSTITUTION:A door latch body 10A is fixed to the door body side of a front door, a wide notch part 6 including the body 10A is formed on one side of a signboard 3, an operation panel part 5 on which a coin loading part or the like is formed is attachably/detachably engaged with a window D around the body 10A, and the signboard 3 is allowed to be fixed/replaced by detaching the panel part 5 to the front side.
Patent JP-H0740565-A (JP)
Title: Resistance value measuring device and thermal head
Inventor: HAYASHI JUNJI
IPC: B41J2/335
Filed: 1993-07-26
Abstract: PURPOSE:To obtain an absolute value of resistance value of a heating element with high precision and print without irregularity by reducing error in measurement caused by saturation voltage of transistor. CONSTITUTION:To a single transistor Trs in a drive IC 48 whose saturation voltage is regarded as almost the same, a reference resistance Rs whose resistance value is known is connected. A charging switch Sb is turned on and charging of a condenser 50 is started. After the condenser 50 is charged, the charging switch Sb is turned off and electric discharge of the condenser 50 is started through the reference resistance Rs. When a voltage of a non-inversion input terminal of a comparator 52 coincides with a reference voltage Vref, a discharging time Ts taken for it is measured by a resistance measuring section 43a. Likewise, the discharging times T1-TN by heating elements R1-RN are measured, and the resistance values r1-rn of the heating elements R1-RN are calculated by a formula r=T/Ts.Rs, which are written in a RAM 43b. At printing, an image data is corrected based on the resistance values r1-rn and printing is performed.
Patent JP-S6430489-A (JP)
Title: Rotator roll controller
Inventor: MAKUTA HIROYUKI
IPC: H02P6/08
Filed: 1987-07-23
Abstract: PURPOSE:To control uneven rotation by using a storage means storing data of the same contents for individual motors varying in a coil conducting switching position and differing in a torque variation waveform. CONSTITUTION:An electronic commutator motor 3 has a rotor magnet 4 and a stator coil substrate 5 and is equipped with a rotating plate R, light-emitting elements LED and light-receiving elements P for detecting rotational positions. Also, a control circuit is formed by a motor driving circuit 6, waveform shaping circuits 8, 10, preset circuits 12-13, a counter 16, a latch circuit 17, a counter circuit system control pulse generator circuit 19, a storage means 20 and a gain control circuit 22. Further, even when the conducting switching position of a rotator is different from a regular conducting switching position, appropriate correction data are outputted from the storage means 20, of which address is designated in the manner of corresponding to the turning angle of said rotator and actual conducting switching position. As a result, it is possible to control uneven rotation and to realize stable rotation properties.
Patent JP-H0826946-A (JP)
Title: Cosmetic for hair of head
Inventor: OTA MASAKATSU
IPC: A61K8/00
Filed: 1994-07-12
Abstract: PURPOSE:To obtain a cosmetic for hair of the head, capable of improving the combing of the hair and having excellent conditioning effects by blending hydrogenated bisabolol therein. CONSTITUTION:This cosmetic for hair of the head is obtained by blending 0.01-20wt.% compound of the formula as an active ingredient therein. The moistness, smoothness, pliability and moderate tenseness (stiffness) are imparted to the hair of the head by blending the compound of the formula in the cosmetic for the hair of the head. Furthermore, a usually used optional ingredient is suitably blended with the compound of the formula as an essential ingredient to prepare the cosmetic according to a conventional method. Thereby, the cosmetic can be used as a hair lotion, a hair liquid, a milky lotion for the scalp, a hair cream, a shampoo, a hair rinse, a hair treatment, a hair foam, a hair spray, a perming agent, a, hair dye, etc.
Patent JP-S6075876-A (JP)
Inventor: UENO ATSUSHI
IPC: G09G5/00
Filed: 1983-09-30
Abstract: (57)【要約】本公報は電子出願前の出願データであるた め要約のデータは記録されません。
Patent JP-H06272052-A (JP)
Title: Secondary treating agent for zinc glossy chromate coating
Inventor: CHIBA SHOGO
IPC: C25D11/38
Filed: 1992-07-10
Abstract: PURPOSE:To form a Zn glossy chromate coating excellent in corrosion resistance while maintaining a beautiful blue chromate coating by treating with a secon dary treating agent containing 6-valuent Cr only or further a mineral acid or organic acid after Zn glossy chromate treating. CONSTITUTION:In washing, nitric acid activation treating, washing, glossy chromate treating, washing, secondary treating and hot air drying of a metallic member variously galvanized, such as galvannealing, electrogalvanizing, electroless galvanizing, etc., the secondary treatment is executed with the treating solution containing 10-900ppm 6-valent chrome from 6-valent supply source such as chromate anhydrate, dichromate, chromate or the like or furthermore containing 100-400ppm one or two kinds of the mineral acids such as sulfuric acid, hydrochoric acid, nitric acid, acetic acid or the like, or an organic acid at 10-80 deg.C for 1-10 seconds. The corrosion resistance of the Zn glossy chromate coating is improved and the beautiful blue chromate coating film is maintained.
Patent JP-H0824274-A (JP)
Title: Manufacture of dental wax mold
Inventor: KUBO FUMINOBU
IPC: A61K6/893
Filed: 1994-07-12
Abstract: PURPOSE:To eliminate warping of wax by a method wherein a paint which is adapted to leave no ashes in the baking at a specified temperature is applied after the coating of a gypsum model with a releasing agent and then, a molten wax applied to keep the molten wax from contacting the surface coated with the releasing agent directly. CONSTITUTION:In the production of a wax mold using a dental gypsum model, the gypsum model is coated with a releasing agent, a paint which is adapted to leave no ashes in the baking at 700 deg.C is applied on a coating surface and then, a molten wax is applied. The paint herein used is an emulsion type paint such as acrylate based emulsion, polyurethane emulsion or epoxy emulsion. Moreover, a wax emulsion is added to the emulsion type paint. Thus, the wax is prevented from contacting the releasing agent directly in the coating of the gypsum mold with the molten wax thereby eliminating a gap between the wax mold and the gypsum model and partial warping of the wax mold.
Patent JP-H06157637-A (JP)
Title: Method of reduction of residual volatile matter in polymer
Inventor: JIYON POORU SUKIRUBETSUKU
IPC: B01D3/34
Filed: 1993-07-26
Abstract: PURPOSE: To effectively reduce remaining monomers or the like by a method in which polymers containing remaining monomers or the like are first heated and pretreated under a reduced pressure, and then introduced into a flash room under an elevated temperature and a reduced pressure after a pressurized specific organic fluid is injected into them.  
     CONSTITUTION: Polymers or polymer blends containing remaining monomers, dimers, trimers and solvents are treated by heat under a reduced pressure to reduce the remaining monomers, solvents or the like to less than 2% by weight. The polymers are then heated to 200 to 270°C and an organic fluid selected from 1-4C alkanols and ketones in an amount of more than the remaining monomers, solvents or the like but less than 10% by weight is injected into the polymers at the temperature of 200 to 270°C and the pressure of 35.15 to 105.46 kg/cm 2 . Finally, the polymers, in the form of strands, are vertically passed through flash room devolatilizer which is kept at the temperature of 200 to 270°C and the pressure of less than 8 mmHg to reduce the amount of the remaining monomers and solvents to less than 500 ppm. 
     COPYRIGHT: (C)1994,JPO
Patent JP-S5887354-A (JP)
Inventor: SATOU MASAAKI
IPC: D05C9/02
Filed: 1981-11-17
Abstract: (57)【要約】本公報は電子出願前の出願データであるた め要約のデータは記録されません。
Patent JP-S6161259-A (JP)
Title: Recording disk reproducing device
Inventor: KAWAMURA ICHIRO
IPC: G11B17/04
Filed: 1984-09-03
Abstract: PURPOSE:To eliminate a necessity to take an empty case out from a reproducing device and to store it by taking out from a case of recording media and containing an empty case automatically. CONSTITUTION:A case 2 is inserted from an inserting port 51 to a case connecting expanding mechanism 60, and the case is almost fixed to a movable base 80. A motor 114 is operated, and a disk sandwiching mechanism 90 holds a cover 3 and a disk 6, pulls them out from the case 2 and a center of a turn table 130 and a center of a disk 6 come to the almost corresponding position. A mounting ring 133 rises, the disk 6 is held, the disk sandwiching mechanism 90 is shifted in the backward direction, the mounting ring 133 falls and the disk 6 is mounted onto the turntable 130. A motor 803 is operated, a guide 800 of a movable base 80 is shifted in the X2 direction and the case 2 is pulled in a main body 50. Thus, reproduction can be executed without removing an empty case.
Patent JP-S6342637-A (JP)
Inventor: MUTO HARUO
IPC: A01G33/02
Filed: 1986-08-07
Abstract: (57)【要約】本公報は電子出願前の出願データであるた め要約のデータは記録されません。
Patent JP-H0934525-A (JP)
Title: Robot controller
Inventor: SAISAKA NORIAKI
IPC: G05B19/4093
Filed: 1995-07-20
Abstract: PROBLEM TO BE SOLVED: To automatically correct the moving locus of a robot to shorten the robot teaching time and to enable a beginner to acquire the robot teaching method in a short period by automatically calculating a new track of the robot moving path based on the path number and the correction value of the moving path to be corrected. SOLUTION: A path number designation means is prepared to input the number of a moving path to be corrected, together with a correction value input means which inputs the correction value of the moving path. A path movement key 4f which instructs the path movement correction can attain its work when both number and correction value are set for the moving path to be corrected. At the same time, a path rotation key 4g which instructs the rotary correction of the path can attain its work when the number, the rotational direction and the rotational angle are designated for the path to be corrected. Then the path number or the path movement value, the rotational angle, etc., are inputted by means of the numerical value setting keys 4h. When a store key 41 is depressed the teaching data including the correction are stored.
Patent JP-2001009374-A (JP)
Title: Surface mounting-type piezoelectric oscillator and sealing method therefor
Inventor: TANAKA TAKAMASA
IPC: G01C19/56
Filed: 1999-06-30
Abstract: PROBLEM TO BE SOLVED: To enlarge the joint area between a sealing part and a sealing material and restrain the generated leakage by the enlarged area to miniaturize a surface mounting-type piezoelectric oscillator by forming grooves in a sealing part for a retainer base for surface mounting which stores and retains a piezoelectric element and a sealing part between the retainer base and a lid to be arranged on the upper surface of the retainer base. SOLUTION: Grooves 5a, 6a are formed in the sealing part of a retainer base 5 for surface mounting where a storage part for a piezoelectric element 1 is formed and a sealing part between the retainer base 5 and a lid 6 to be arranged on the upper face of the retainer base 5 respectively. At the same time, the grooves 5a, 6a and the sealing parts are filled with a sealing material 7. In this case, the retainer base 5 for surface mounting is formed of an insulating member such as glass or ceramics. However, when an eutectic alloy is used as the sealing material 7, the sealing part is treated by plating, metallizing or any other means so that the sealing material 7 can be welded.  Thus it is possible to enlarge the joint area between the sealing parts of the retainer base 5 and the lid 6 and the sealing material 7 and thereby restrain the generated leakage by this enlarged area to achieve the miniaturization of a surface mounting-type piezoelectric element.
Patent JP-H0351771-A (JP)
Title: Sensor measuring apparatus
Inventor: SEKIYAMA MASAO
IPC: G01R15/08
Filed: 1989-07-19
Abstract: PURPOSE:To measure various sensor outputs by the same circuit by providing an offset part converting various sensor outputs to potential differences to amplify the differences to a definite level and shifting the level of the selected potential difference. CONSTITUTION:Various sensor outputs 11 - 1n of temp., humidity, pressure, a current or the like pass through filters 21 - 2n to be converted to potential differences by potential difference converting parts 31 - 3n. The potential differences different in level are amplified to a definite level by mu-factor parameters 41A - 4nA. One potential difference is selected from a plurality of the inputted potential differences by a multiplexer 5 and shifted by the offset parameters 61A - 6nA corresponding to various sensor outputs 11 - 1n to be normalized and converted to a digital value by an A/D converting part 7 to be displayed on a display part 8. Therefore, it is unnecessary to provide a sensor input/output circuit different for each sensor.
Patent JP-S6160367-A (JP)
Inventor: TSUNEHIRO MITSUTOSHI
IPC: B61D37/00
Filed: 1984-09-03
Abstract: (57)【要約】本公報は電子出願前の出願データであるた め要約のデータは記録されません。
Patent JP-H0513379-A (JP)
Title: Dry etching method
Inventor: KADOMURA SHINGO
IPC: H01L21/302
Filed: 1991-06-29
Abstract: PURPOSE:To attain to the rapidity, high selectivity, low pollution level and low damage degree to an underneath silicon base material in the anisotropical dry etching step of a SiO2 base material layer. CONSTITUTION:The title etching method is divided into two phases, i.e., in the first step, about 90% of the layer thickness of a SiO2 interlayer insulating film 3 is removed using a non-carbon base non-deposit fluorine compound such as SF6 or NF3 and then in the second step, the residual about 10% is removed using S2F2/H2 mixed gas. Furthermore, in the first step, the rapid etching work is made feasible using SFx<+>, NFx<+>, etc., in large mass capable of mass production. At this time, the etching step is stopped before the underneath material layer is exposed neither causing any damage nor any carbon pollution at all to an impurity diffused region 2. On the other hand, in the second step, the high selectivity to said material layer meeting the requirements for the high S/F ratio can be attained. Furthermore, the deposited S can be sublimated to be removed by heating step causing no pollution at all.
Patent JP-2001013257-A (JP)
Title: Sealing execution method of spring and gas in earthquake observation well and plug structure used for it
Inventor: KIMURA TERUHIRO
IPC: E21B33/10
Filed: 1999-06-30
Abstract: PROBLEM TO BE SOLVED: To achieve double sealing by bringing the O ring of a plug structure closer to the inner surface of the through hole of a sub pipe and connecting an external thread to the through hole of the sub pipe with a screw, and removing the plug structure from a fitting rod and remaining it in the sub pipe. SOLUTION: A plug structure 10 is detachably mounted to the lower end of a fitting rod 55 and is inserted through the inside of a number of casing pipes and installation cases. After an external screw part 14a of the plug structure 10 hits against the upper end of the through hole of the sub pipe, the fitting rod 55 is rotated in the direction of a left screw, and an external thread part 14a of an inverse conical part 14 is screwed into the through hole. An O ring 16 of the plug structure 10 adheres to the inner surface, and the plug structure 10 is removed from the fitting rod 55 while the external thread part 14a is screwed into the through hole of the sub pipe. Then, the fitting rod 55 is pulled up, the plug structure 10 remains while being connected to the sub pipe with a screw, thus achieving the double sealing structure of sealing by a seal pipe and sealing by the O ring 16.
Patent JP-H0630242-A (JP)
Title: Image output processing circuit
Inventor: OOMI IKUHIRO
IPC: G09G5/36
Filed: 1992-07-13
Abstract: PURPOSE:To take the OR of a thinning-out line with a line before or behind the line without using line memory, etc., and with simple circuit configuration and to reduce line density without deteriorating picture quality by preventing the black data of the thinning-out line from being omitted. CONSTITUTION:Smoothed image data outputted from pattern memory 32, after being latched with a pattern latch 61, is supplied to an ordinary data selector 62 and a data selector 63 in two-line OR mode, respectively. The ordinary data selector 62 outputs pixel data by arranging in sequence of scan. The data selector 63 in two-line OR mode thins-out the picture element data in a subscan direction by taking the OR of the pixel data neighbored in the subscan direction. An output image signal from which a desired line is thinned-out can be obtained by switching the output of the selector 62 or the selector 63 at a prescribed timing by a 2-1 selector 64.
Patent JP-S6341806-A (JP)
Title: Connecting method for optical fiber
Inventor: KITAZAWA SHINICHI
IPC: G02B6/24
Filed: 1986-08-08
Abstract: PURPOSE:To easily connect the end parts of optical fibers by inserting an optical fiber into one end of a heat contractive tube, contracting the tube with heat, inserting the other optical fiber from the other end of the tube, and abutting and fixing the end faces of both the optical fibers. CONSTITUTION:When only the optical fiber 2 with a large diameter is inserted into one end part of the heat contractive tube 1, adhesive 3 is applied if necessary and the tube with said state is heated, the tube 1 is contracted and the optical fiber 2 is clamped with the tube 1. Simultaneously with said heat compression, the other end side is shaped as a small diameter, but the center of its section almost coincides with the axis of the optical fiber 2. Thereby, the optical fiber 2' with a thin diameter is inserted into the other end of the tube 1 contracted into a small diameter and fixed with the adhesive 5 under the state. Consequently, both the optical fibers are completely connected.
Patent JP-S57111672-A (JP)
Title: Generating device information storage card
Inventor: YAZAWA MIWAKO
IPC: G06K17/00
Filed: 1980-12-29
Abstract: PURPOSE:To achieve accurate information control without any error while facilitating the generation of cards, by obtaining information storage cards only by scanning the contents of documents, etc., which correspond to items required for the information control, by an inputting means. CONSTITUTION:After a switching device 2 is set in item mode, the title part of a basic card is scanned by input equipment 1. An information processor 4 discriminates the item mode and instructs output equipment 5 to output data on the upper part of a card in output format stored in a memory 3. Consequently, the output equipment 5 outputs the item on the information storage card. Then, the switching device 2 is set in contents mode and a document is scanned by the input equipment 1. Consequently, the information processor 4 instructs the output equipment 5 to output a KANJI (Chinese character) input following the previously outputted title in output format sotred in the memory 3.
Patent JP-H05251340-A (JP)
Title: Manufacture of semiconductor device
Inventor: YAMAZAKI SHUNPEI
IPC: H01L21/20
Filed: 1991-06-28
Abstract: PURPOSE:To reduce the density of an unpaired bonding hand and to promote the rearrangement of atoms in a short-range order by a method wherein a semiconductor having an amorphous structure is heated at a specific temperature or higher and at a crystallization temperature or lower. CONSTITUTION:A silicide gas is formed in a thickness of especially 1 to 5mum by a glow discharge method or a plasma CVD method. For a semiconductor film 1, a sputtering method, a vacuum deposition method or a low-pressure CVD method may be used. In an AIR-grown state, 1 to 50% of SAS is mixes with AS. Alternatively, SAS is brought close to 100% of SAS. In order to change one part of it to SAS, it is heated at a temperature of 200 deg.C or higher which is a low temperature as compared with a crystallization temperature, and its atmosphere is set in such a way that a mixed state of H and He is changed to a plasma by means of inducing energy. Thereby, the unpaired unbonded hands of the title semiconductor device are reduced, the electric conductivity of the title semiconductor device is enhanced, and the carrier mobility of the title semiconductor device is enhanced.
Patent JP-H11340197-A (JP)
Title: Producing method for semiconductor device
Inventor: SHUTO MITSUKO
IPC: H01L21/302
Filed: 1998-05-28
Abstract: PROBLEM TO BE SOLVED: To provide an etching method capable of providing a perpendicular form while preventing the protrusion of an underlying film and the generation of a particle in the case of etching a silicon nitride film. SOLUTION: On a lower electrode 2 of an etcher having an upper electrode 1 connected with a high frequency electrode 3 and a lower electrode 2 connected to the ground inside a chamber 4, a substrate 5 to be etched laminating and forming a silicon oxide film and a silicon nitride film on a silicon substrate in this order is placed in a state of keeping pressure inside the chamber 4 higher than 300 m Torr at least. As etching gas 6, SF6 gas and He gas are supplied in the partial pressure ratio of 1:1 from a gas introduction part 13 provided at the upper part of the etcher and after the atmosphere inside the chamber 4 is stabilized, a voltage is applied to the upper electrode 1 by the high frequency power source 3.