baber/WOPTO huggingface dataset:
Patent JP-S6212674-A (JP)
Inventor: KUMAGAI MASARU
IPC: C04B35/64
Filed: 1985-07-09
Abstract: (57)【要約】本公報は電子出願前の出願データであるた め要約のデータは記録されません。
Patent JP-H08320727-A (JP)
Title: Moving device
Inventor: MURATA MASANAO
IPC: G05D1/02
Filed: 1995-05-24
Abstract: PURPOSE: To evade a danger to circumferential people by stopping the execution of a program and stopping mechanical operation when a moving body receives a power failure signal from a power failure detecting means. CONSTITUTION: If a power failure occurs to facilities 102 during the execution of the program, the AC voltage that the power failure detector 5 detects is cut off and a detection signal (a) sent out to a controller part 3 becomes small. Consequently, the controller part 3 sends a power failure signal (c) out to a transmitter 4 and the signal is transmitted to the facilities 102 from a transmitting antenna 6. Then a receiver 10 on an unmanned carrier 101 receives the radio wave through a receiving antenna 11, converts the received radio wave into the power failure signal (c), and sends it out to a controller 110. The controller 110 once receiving the power failure signal (c) from the receiver stops the program from being executed and stops motors 108 and 108 being mechanical equipments from operating.
Patent JP-H10339046-A (JP)
Title: Assembled toilet box
Inventor: YAMADA MASAO
IPC: A47K11/00
Filed: 1997-06-09
Abstract: PROBLEM TO BE SOLVED: To provide an assembled toilet box in particular having light weight for easy transport and allowing an easy assembly, ensuring a stable installation and further allowing an economic fabrication, regarding an assembled toilet box. SOLUTION: The prescribed fold forming lines are provided on a corrugated board, and this board is folded along the lines. In addition, a bottom wall frame 8, right and left side wall frames 5 and 4, and a front wall board 2 detachably erected on the bottom wall frame 8, a ceiling wall frame 7 detachably connected to the right and left side wall frames 5 and 4, and the front wall board 2, and a rear wall board 6 held on the right and left side wall frames 5 and 4 with joint members 62, the front wall board 2 and a door 3, are thereby formed respectively so as to assemble a box body. Then, a toilet is arranged in the box body.
Patent JP-H0772317-A (JP)
Title: Production of sheet for light reflection
Inventor: TAKINO KATSUHIKO
IPC: B32B37/00
Filed: 1994-07-01
Abstract: PURPOSE:To reduce the cost by decreasing and simplifying production stages and eliminating the need for high accuracy in the process for production of the sheet for light reflection having air permeability. CONSTITUTION:The film for transfer formed by laminating a release layer, vapor deposited metallic foil 5 for transfer and an adhesive layer 4 on a base film is previously adhered to at least one surface of a base material 1 consisting of a woven fabric or non-woven fabric having through-meshes 7 in such a manner that the adhesive layer 4 comes into contact with the base material 1. After the base film and the release layer are peeled, the vapor deposited metallic foil 5 for transfer of the through-meshed parts is dislodged, to form both of the base material 1 and the vapor deposited metallic foil for transfer are formed to the same shape having the through-meshed parts.
Patent JP-S6042926-A (JP)
Inventor: JIEEMUSU AI BAATERUZU
IPC: F23N5/20
Filed: 1984-07-20
Abstract: (57)【要約】本公報は電子出願前の出願データであるた め要約のデータは記録されません。
Patent JP-H1066863-A (JP)
Title: Manufacture of ultrafine powder
Inventor: OTSUKA KENICHI
IPC: B01J19/00
Filed: 1997-06-09
Abstract: PROBLEM TO BE SOLVED: To enable the easy production of ultrafine powder of metal etc., by setting up specified pressure reducing conditions in a reactor when a gasified metal compound is introduced into a heated reactor with inactive carrier gas to produce metal or ceramic ultrafine powder by a gas phase thermochemical reaction. SOLUTION: Carrier gas 2 for carrying a metal compound which can be gasified easily and reaction gas 1 which reacts with the metal compound in a gas phase are introduced into a reactor 8 through a flow meter and a pressure control valve 4 respectively. In the reactor 8, the metal compound is placed in a container 5, and a reaction atmosphere is heated by electric furnaces 6, 7 installed around the reactor 8. Ultrafine powder produced by the reaction is cooled in a water-cooling part 9 and recovered by a filter 11. The residual gas which passed through the filter 11 is sucked by an aspirator 13 equipped with a vacuum pump 12. In this process, the pressure in the reactor 8 is controlled at 500-50Torr. In this way, the combination of nuclei is reduced, and the growth of particles is checked.
Patent JP-S5274687-A (JP)
Title: Process for preparing ethylene polymers
Inventor: YOKOYAMA MASUZOU
IPC: C08F4/62
Filed: 1975-12-19
Abstract: PURPOSE: To prepare ethylene polymers with industrial advantages, by using a catalyst consisting of a Philips catalyst and a specific compound. 
     COPYRIGHT: (C)1977,JPO&Japio
Patent JP-S5941556-A (JP)
Inventor: TOUMA TAKESHI
IPC: E04B9/00
Filed: 1982-08-30
Abstract: (57)【要約】本公報は電子出願前の出願データであるた め要約のデータは記録されません。
Patent JP-S5941927-A (JP)
Title: A/d converting device of output of variable resistor
Inventor: TOMIZAWA NAOMI
IPC: F02D45/00
Filed: 1982-09-02
Abstract: PURPOSE:To eliminate the influence of a power source voltage and a resistance value and to subject a ratio of voltage division to A/D conversion with high precision, by inputting the reference voltage of an A/D converter to a current amplifier having no voltage gain, and using the output voltage of this amplifier as a voltage source of a variable resistor to subject a voltage division point of the resistor to A/D conversion. CONSTITUTION:An A/D conversion device of the output of a variable resistor 2 is provided with a current amplifier 4 having no voltage gain to which a reference voltage Vref used to an A/D converter 3 is inputted. This reference voltage Vref is set to a voltage obtained by dividing a voltage VCC from a power supply line 1 by resistance Rc and Rd, and the output voltage of the amplifier 4 is used as the voltage source of the variable resistor 2, and a voltage division point Rs of the variable resistor 2 is subjected to A/D conversion by the converter 3. The influences due to the change of the power source voltage VCC and the resistance value of the variable resistor 2 is eliminated to subject the ratio of voltage division of the variable resistor 2 to A/D conversion with high precision.
Patent JP-2000336361-A (JP)
Title: Monostable, ferroelectric, liquid crystal display
Inventor: NISHIMURA TEIICHIRO
IPC: G02F1/13
Filed: 1999-05-31
Abstract: PROBLEM TO BE SOLVED: To obtain the subject liquid crystal display, improved in monostability and capable of realizing a peculiarly stable monostability mode, by including a compound having a tricyclic biphenyl pyrimidine structure, wherein at least one of the alkyl chains bound to the structure terminals has an even number of carbon atoms. SOLUTION: This monostable, ferroelectric, liquid crystal display includes a pair of substrates treated to be monoaxially oriented and arranged to face each other in such a way that the orientation-treated directions are essentially in parallel to each other, with a ferroelectric, liquid crystal material having the chiral smectic C phase put between the substrates, wherein the ferroelectric, liquid crystal material is a liquid crystal composition containing a compound having a tricyclic biphenyl pyrimidine structure with alkyl chains bond to the terminals, at least one of the alkyl chains having an even number of carbon atoms, preferably shown by the formula [(m) and (n) are each an integer, at least one of these integers is an even number].  The liquid crystal composition preferably contains a chiral component showing spontaneous polarization and bicyclic phenyl pyrimidine, in addition to the above compound.
Patent JP-S5484480-A (JP)
Title: Inserting method for mangetic stick
Inventor: ARAI FUMIO
IPC: H01L21/68
Filed: 1977-12-19
Abstract: PURPOSE: To increase an insertion rate by magnetizing upper and lower leads before insertion with confronting surfaces of them different in polarity and by vibrating the upper lead after the insertion when dropping sequantial several magnetic sticks, leads of a galss-sealed diode into the same hole.  
     CONSTITUTION: At ceiling 33 of container box 34 where upper and lower leads 2 and 3 are installed, permanent magnet 36 with the S pole at the entire lower region is arranged and at bottom board 32, permanent magnet 37 with the N pole at the entire lower region is also arranged. In this constitution, leads 2 and 3 are installed in two boxes 43 and made to stand by magnetism; the lower terminal of lead 2 is magnetized into the S pole, and the upper terminal of lead 3 is into the N pole. Next, those leads are extracted from boxes 43, and lead 2 is dropped into guide hole 19 of main jig body 8, which is moved to the supply station of lead 3. Next, glass pipe 6, semiconductor element 1 and lead 3 are dropped into containing hole 17 of guide hole 19 and vibrations are given by guide 70, thereby fixing tham at normal positions. 
     COPYRIGHT: (C)1979,JPO&Japio
Patent JP-H07331408-A (JP)
Title: High damping alloy steel member having wear resistance and its production
Inventor: OYAMA MOTOAKI
IPC: C23C4/08
Filed: 1994-06-10
Abstract: PURPOSE:To produce a high damping alloy steel member excellent in wear resistance by film-forming an Ni-base or Co-base self-fluxing alloy on the surface of a high damping alloy steel member by thermal spraying. CONSTITUTION:The surface of a high damping alloy steel member is thermally sprayed with an Ni-base or Co-base self-fluxing alloy to execute film forming. The Ni-base self fluxing alloy is essentially contg. O to 20% Cr, 1.0 to 4.5% B, l.5 to 5.0% Si, <=1.1% C, <=5% Fe, <=1% Co, <=4% Mo, <=4% Cu, and the balance Ni. Moreover, the Co-base self-fluxing alloy is essentially contg., by weight, 0 to 30% Ni, 16 to 24% Cr, 1.5 to 2.4% B, 1.5 to 4.5% Si, <=1.5% C, <=5% Fe, <=7% Mo, 4 to 15% W, and the balance Co. After the film forming by thermal spraying, fusing treatment is executed at about 950 to 1250 deg.C, by which the high damping allay steel member improved in wear resistance while its high damping capacity is maintained can be obtd.
Patent JP-2000339147-A (JP)
Title: System for supporting estimation of software development costs and recording medium
Inventor: ISHIKAWA FUJIKO
IPC: G06Q50/10
Filed: 1999-05-31
Abstract: PROBLEM TO BE SOLVED: To improve the precision of estimation by preparing estimation corresponding to various kinds of conditions under development. SOLUTION: A relation approximate formula database 15 stores a relational approximate formula preliminarily calculated from corresponding result information for each factor information. Then, a controller 8 receives the input of a condition under development and specification information, and calculates the number of FP(function points), and calculates the estimated number of processes by assigning the calculated number of FP to the relational approximate formula corresponding to the factor information matching with the condition.
Patent JP-S5275918-A (JP)
Title: Infrared video equipment
Inventor: HIDAKA HIROSHI
IPC: H04N5/222
Filed: 1975-12-22
Abstract: PURPOSE: To improve S/N by obtaining constant accord of electric signal phase with simple structure and without using any delay element, by providing plural infrared luminescent elements which correspond to double reflection surface and each reflection surface to scanning mirror of infrared video equipment. 
     COPYRIGHT: (C)1977,JPO&Japio
Patent JP-S63314714-A (JP)
Title: Manufacture of transparent electricity conducting film
Inventor: NISHIDA HIDEAKI
IPC: H01B13/00
Filed: 1987-06-18
Abstract: PURPOSE:To easily obtain a transparent electricity conducting film having a resistance approximately equal to that of a transparent electricity conducting film made with physical means by irradiating ultraviolet rays on the transparent electricity conducting film finished with thermal decomposition and sintering in the air or under a condition of being shut off from the air for at least one minute, thereby reducing the resistance extremely. CONSTITUTION:A transparent electricity conducting film is made by printing a glass plate with an ink made by solving indium 2-ethyl hexanonic acid added with 5mol% of tin 2-ethyl hexanonic acid into a petroleum-based solvent and baking them at 530 deg.C. The film is then irradiated with ultraviolet rays from a high pressure mercury-vapor lamp, if necessary also from the reverse side of the glass. In this way, excess oxygen in the film is reduced and the resistance of the film is reduced down to the value the compound has by nature.
Patent JP-H0315494-A (JP)
Title: Dry cleaner
Inventor: SUGA TADATOSHI
IPC: D06F43/06
Filed: 1989-06-13
Abstract: PURPOSE:To reduce time and labor for cleaning the inside of a solvent tank by forming a restricting unit, which reduces the sectional area of a flow path reaching a drawing out port of a solvent from its introducing port, in the solvent accumulating tank. CONSTITUTION:In a solvent tank 1, each introducing port 11, 12 of a solvent from a fluid discharge path 6 and a bypass path 9 is provided in a corner part, and a drawing out port 13 of the solvent to a fluid Supply path 3 is provided in a corner part diagonally opposed to the introducing ports 11, 12. Further in space between the introducing ports 11, 12 and the drawing out port 13, partitioning walls 15..., spaces 14... alternately between the wall 15 and any of side walls, are vertically provided, thus in the solvent tank 1, an overflowing path 16, reaching the drawing out port 13 from the introducing ports 11, 12, is formed. The solvent, introduced from the introducing ports 11, 12, is drawn out from the drawing out port 13 to pass through the overflowing path 16 by suction force of a pump 4. The sectional area of a flow path is decreased by forming the overflowing path 16 in the solvent tank 1, and it is placed in a condition, with sludge prevented from its easy accumulation, by increasing a flow speed.
Patent JP-S5940276-A (JP)
Title: Apparatus for calculating collector loss
Inventor: JIKOU HIDEYASU
IPC: G01R31/26
Filed: 1982-08-31
Abstract: PURPOSE:To accurately calculate collector loss, by such simple constitution that the collector loss corresponding to output voltage or the like preliminarily stored in a memory means is read out through detecting output voltage or the like. CONSTITUTION:When the output voltage of an electric power amplifier 1 is applied through an A/D converter 3, collector loss is read out from a memory part where the collector loss corresponding to the output voltage of a microcomputer 4 is preliminarily stored to be outputted from a D/A converter 5. Therefore, the collector loss of the output transistor of the electric power amplifier 1 is calculated accurately by simple constitution. In addition, even if the collector loss corresponding to an output current is stored to be read out by the detecting output current, a similar result is obtained.
Patent JP-H01320756-A (JP)
Title: Battery
Inventor: AKIYAMA TOMOYUKI
IPC: H01M10/0568
Filed: 1988-06-22
Abstract: PURPOSE:To make a light battery having large capacity by using a carbonic substance which dispersed conductive high polymers as a positive electrode. CONSTITUTION:As a positive electrode, a carbonic substance which dispersed conductive high polymers is used. For the carbonic substance, any will do so long as it is conductive for electrons, for example, fibered substances such as carbon fibers, carbon felt, and non-woven fabric, or porous substance in the form of particle or powder, or the like is used. Fine powder is used for conductive high polymers. Further, when dispersing conductive high polymers into the carbonic substance, binder is used. As a method of dispersing the conductive high polymers into the carbonic substance, solvent is used to disperse. For example, the method that the binder and the conductive high polymers are dissolved or dispersed in solvent and this solvent is dropped to the carbonic substance to make it penetrate into that or the method that the carbonic substance is soaked in the solvent is used.
Patent JP-S6131386-A (JP)
Title: Vapor phase epitaxial growth process
Inventor: KITAJIMA HIROSHI
IPC: C30B19/00
Filed: 1984-07-23
Abstract: PURPOSE:To retard the growth of facet by dipping a single crystal silicon substrate having surface coated partly with an insulative film in an anisotropic etching soln. to execute etching of silicon at the exposed part and executing selective epitaxial growth of silicon. CONSTITUTION:A silicon oxide film 7 is formed on the surface of a silicon wafer 6, and an opening part 8 having an almost perpendicular side wall is formed by reactive ion etching. When the substrate is dipped in an anisotropic etching soln. capable of exposing selectively a (111) face, a (100) face 9 is exposed on the base surface and a (111) face 10 is exposed on the side surface. An epitaxial layer 11 is formed by executing selective epitaxial growth of silicon thereon.
Patent JP-H024269-A (JP)
Title: Photoresist removing method
Inventor: HARAZONO MASAAKI
IPC: G03F7/42
Filed: 1988-06-22
Abstract: PURPOSE:To perfectly decompose and remove a photoresist film on a semiconductor base plate by coating said base plate with the photoresist film, and coating the surface of a photoresist pattern obtained by exposure and development with sulfuric acid, and heating the base plate to a prescribed temperature to accelerate decomposition of the photoresist. CONSTITUTION:The rotated silicon wafer 1 is coated with a prescribed amount of hot concentrated sulfuric acid 9 always kept at high concentration by storing it in an airtightly closed vessel immediately before dehydrating and decomposing the photoresist 3 with the hot concentrated sulfuric acid, and heated with an infrared lamp 7 and a heater 12 to accelerate the dehydration and decomposition reaction of the photoresist 3, and thus it is perfectly decomposed. Then, the sulfuric acid 9 containing decomposed photoresist 3 is washed off by spraying pure water 15 over the whole surface of the wafer 1 while it is rotated, and the water 15 remaining can be removed by rotating the wafer 1 at high speed, thus permitting the residual photoresist 3 on the wafer 1 to be removed to a high cleanliness.
Patent JP-S5855346-A (JP)
Title: Treatment of surface of glass containing alkali metal
Inventor: NISHIKAWA SHIYOUZABUROU
IPC: C03C15/00
Filed: 1981-09-25
Abstract: PURPOSE:To prevent elution of alkali, by immersing a glass contg. an alkali metal in an aq. silica-saturated soln. of hexafluorosilicic acid contg. boric acid, and heating a silica film produced on the glass surface to form a fast silica film on the surface. CONSTITUTION:A glass contg. an alkali metal is immersed in a treating soln. made by adding boric acid to an aq. hexafluorosilicic acid saturated with silica to produce a silica film on the glass surface. This silica film is treated under heating resulting in forming a fast silica film. This reason is presumed that fluorine of the hexafluorosilicic acid reacts with the boric acid to be added, and the produced silica deposits on the glass surface, and treatment of it under heating causes dehydration reaction of OH groups contained to increase bonding of the silica. This process does not require a vacuum space, and it can easily treat a large size glass plate in a low cost equipment. It is superior to the vacuum evaporation or sputtering method in this point.
Patent JP-H11291-A (JP)
Title: Vacuum cleaner
Inventor: AKINAGA TAKAHIKO
IPC: A47L9/00
Filed: 1997-06-10
Abstract: PROBLEM TO BE SOLVED: To prevent the generation of abnormality at a motor even at the time of sucking toner power or metallic powder by providing a space which air sucked by a fan never enters and arranging the motor in the space. SOLUTION: A vent is provided between a first room 200 housing a bag-type filter 108 and a second room 210 provided with the fan 107, a through hole for allowing the shaft of the motor 105 being the rotary shaft of the fan 107 is provided on an interrupting wall between the second room 210 and a third room 220 which air sucked by the fan 107 never enters and the motor 105 is arranged in the room 220. An air-cooling fan 106 is rotated by this motor 105 to suck air into the third room 220 through an air-cooling suction vent 103. After cooling the motor 105 with this air, the air is discharged from an air- cooling exhaust vent 104. Thereby, toner powder, etc., is prevented from entering the third room 220 to prevent the generation of abnormality at the motor 105.
Patent JP-H04353421-A (JP)
Title: Coextruded multilayered film structure and its manufacturing process
Inventor: ROBAATO JIYON BURENBERUGU
IPC: B32B27/00
Filed: 1991-05-28
Abstract: PURPOSE: To hold adhesive properties even after aging or retorting with excellent adhesive properties between multilayers by preparing a composition to contain 10 to 30 wt.% of composition of a second layer in a first layer and the first layer in the second layer, and forming a film obtained by co-extruding and superposing the first layer and the second layer components. CONSTITUTION: When a first layer is a film forming polymer or copolymer and a second layer is a film forming polymer or copolymer Y, X of 70 to 90 wt.% of the first layer, Y of 30 to 10 wt.%, Y of 70 to 90 wt.% of the second layer and X of 30 to 10 wt.% are co-extruded to form a multilayer film. In the case of a two-layer film, an extrudate from an extruder 310 is passed through a conduit 317 to a die 710, an extrudate from an extruder 510 is passed through a conduit 517 to the die 710. Two molten layer films are output from the die 710, passed over a cooling roll 30 rotating in a direction of an arrow 40, and the film 50 is separated in a direction of an arrow 60.
Patent JP-H101483-A (JP)
Title: Production of allylsilane compound
Inventor: SAKURAI HIDEKI
IPC: C07F7/12
Filed: 1996-06-13
Abstract: PROBLEM TO BE SOLVED: To obtain an allylsilane compound useful as a material for silicones having functional unsaturated hydrocarbon groups as well as a reagent for organic syntheses by reaction of a chlorosilane compound with a specific compound under a specific condition. SOLUTION: This allylsilane compound of formula of Am Pn SiCl4 (A is an allyl, 1-methyl-2-propenyl, or 2-methyl-2-propenyl; (n) is 1-3) is obtained by making a chlorosilane compound of formula: Rn SiCl4-n (R is H or a 1-10C hydrocarbon; (n) is 0-3) react with an allyl halide, 3-halogeno-1-butene or 3-halogeno-2- methyl-1-propene at 60-150 deg.C in a dipolar aprotic organic solvent (e.g. 1,3- dimethyl-2-imidazolidinone) in the presence of metal zinc, thereby enabling easy production of a highly safe allyl silane compound under condition of mild reaction.
Patent JP-S6151572-A (JP)
Inventor: HANSU KURISUTOFU KURAIN
IPC: G01P3/483
Filed: 1985-07-12
Abstract: (57)【要約】本公報は電子出願前の出願データであるた め要約のデータは記録されません。
Patent JP-S626537-A (JP)
Inventor: ANDORIYUU GOODON FURANSHISU DE
IPC: H03M1/00
Filed: 1986-06-27
Abstract: (57)【要約】本公報は電子出願前の出願データであるた め要約のデータは記録されません。