Patent SG-11201807364V-A (SG)
Title: Use of a chemical mechanical polishing (cmp) composition for polishing of cobalt and / or cobalt alloy comprising substrates
Inventor: LAUTER MICHAEL
IPC: C09G1/04
Filed: 2017-03-13
Abstract: INTERNATIONAL APPLICATION PUBLISHED UNDER THE PATENT COOPERATION TREATY (PCT) (19) World Intellectual Property -, Organization 11111111011110111010101111101011111011101111101010111111101011111101111011111 International Bureau .. .... ..Yejd (10) International Publication Number ..... ... (43) International Publication Date WO 2017/162462 Al 28 September 2017 (28.09.2017) WIP0 I PCT (51) International Patent Classification: (74) Agent: BASF IP ASSOCIATION; BASF SE, G-FLP - CO9G 1/04 (2006.01) C006, 67056 Ludwigshafen (DE). (21) International Application Number: (81) Designated States (unless otherwise indicated, for every PCT/EP2017/055826 kind of national protection available): AE, AG, AL, AM, AO, AT, AU, AZ, BA, BB, BG, BH, BN, BR, BW, BY, (22) International Filing Date: BZ, CA, CH, CL, CN, CO, CR, CU, CZ, DE, DJ, DK, DM, 13 March 2017 (13.03.2017) DO, DZ, EC, EE, EG, ES, FI, GB, GD, GE, GH, GM, GT, (25) Filing Language: English HN, HR, HU, ID, IL, IN, IR, IS, JP, KE, KG, KH, KN, KP, KR, KW, KZ, LA, LC, LK, LR, LS, LU, LY, MA, (26) Publication Language: English MD, ME, MG, MK, MN, MW, MX, MY, MZ, NA, NG, (30) Priority Data: NI, NO, NZ, OM, PA, PE, PG, PH, PL, PT, QA, RO, RS, 62/311,656 22 March 2016 (22.03.2016) US RU, RW, SA, SC, SD, SE, SG, SK, SL, SM, ST, SV, SY, TH, TJ, TM, TN, TR, TT, TZ, UA, UG, US, UZ, VC, VN, (71) Applicant: BASF SE [DE/DE]; Carl-Bosch-Strasse 38, ZA, ZM, ZW. 67056 Ludwigshafen am Rhein (DE). (84) Designated States (unless otherwise indicated, for every — (72) Inventors: LAUTER, Michael; Gontardstrasse 4, 68163 kind of regional protection available): ARIPO (BW, GH, Mannheim (DE). GUEVENC, Haci Osman; Langer Anger GM, KE, LR, LS, MW, MZ, NA, RW, SD, SL, ST, SZ, 109, 69115 Heidelberg (DE). SIEBERT, Max; Voelk- TZ, UG, ZM, ZW), Eurasian (AM, AZ, BY, KG, KZ, RU, linger Strasse 20, 67063 Ludwigshafen (DE). LAN, TJ, TM), European (AL, AT, BE, BG, CH, CY, CZ, DE, Yongqing; Christoph-Kroewerath-Str. 77, 67071 Ludwig- DK, EE, ES, FI, FR, GB, GR, HR, HU, IE, IS, IT, LT, LU, shafen (DE). USMAN IBRAHIM, Sheik Ansar; Naam- LV, MC, MK, MT, NL, NO, PL, PT, RO, RS, SE, SI, SK, sesteenweg, 3001Z HEVERLEE (BE). GOLZARIAN, SM, TR), OAPI (BF, BJ, CF, CG, CI, CM, GA, GN, GQ, Reza M.; 4201 NW 179th Place, Washington, Portland, GW, KM, ML, MR, NE, SN, TD, TG). 97229 (US). WEI, Te Yu; 6F.-23, No.111, Wenhua 7th Rd., Guishan Dist., Taoyuan City, 333 (TW). Published: = — with international search report (Art. 21(3)) = = = = = = = = = = = 1-1 ei iv ei 1-1 (54) Title: USE OF A CHEMICAL MECHANICAL POLISHING (CMP) COMPOSITION FOR POLISHING OF COBALT AND / 11 OR COBALT ALLOY COMPRISING SUBSTRATES © ei (57) : Use of a chemical mechanical polishing (CMP) composition (Q) for chemical mechanical polishing of a substrate (S) en. ) comprising (i) cobalt and/or (ii) a cobalt alloy, wherein the CMP composition (Q) comprises (A) Inorganic particles (B) a poly(amino acid) and or a salt thereof (C) at least one amino acid, (D) at least one oxidizer (E) an aqueous medium and wherein the CMP composition (Q) has a pH of from 7 to 10.