baber/WOPTO huggingface dataset:
Patent TW-341000-B (TW)
Title: The temperature compensating and amplifier circuit of pressure sensor
Inventor: Chen zheng-jiang
IPC: G10L19/04
Filed: 1997-07-15
Granted: 1998-09-21
Abstract: An amplifier circuit, it can be installed in pressure sensor, to supply electric power source for pressure sensor, and to amplify the output voltage of pressure sensor, correct offset output voltage, normalize the full span output voltage, and separately compensate the temperature for offset output voltage of pressure sensor and full span output voltage. The amplifier circuit includes:  The 1st net, is coupled to pressure sensor, for correcting the offset output voltage of pressure sensor;  The 1st temperature-compensating net, supplies the electric power source for pressure sensor, to compensate temperature for full span output voltage of pressure sensor;  The 2nd net, is coupled to pressure sensor, for amplifying the output voltage of pressure sensor, and normalizing the full span output voltage of pressure sensor;  The 2nd temperature compensating net, is coupled to 2nd net, to supply referencing voltage for 2nd net, to compensate temperature for offset output voltage of pressure sensor.
Patent TW-348078-B (TW)
Title: Cleaning method and cleaning apparatus for electronic components
Inventor: IMAOKA TAKAYUKI
IPC: H01L21/304
Filed: 1997-08-20
Granted: 1998-12-21
Abstract: A cleaning method for electronic components, which is a cleaning method for electronic components or components of an apparatus for producing the same, and comprises using a cleaning solution of ultrapure water dissolved with hydrogen, and a cleaning solution having a negative oxidation-reduction potential, to clean the electronic components.
Patent TW-424234-B (TW)
Title: Magnetic recording medium, method of fabricating magnetic recording medium, and magnetic storage
Inventor: MATSUDA YOSHIBUMI
IPC: C23C14/06
Filed: 1997-10-30
Granted: 2001-03-01
Abstract: A magnetic recording medium having first undercoating layers 40, 40' formed directly or via substrate face undercoating layers on a substrate 40, second undercoating layers 42, 42' directly formed on the first undercoating layers 40, 40', magnetic films 43, 43' formed on the second undercoating layers 42, 42', and protective films 44, 44' formed on the magnetic films 43, 43'. Clusters having a large amount of oxygen are dispersed on the boundary face of the first and second undercoating layers. Preferably, the first undercoating layer is made of an alloy which includes two kinds of elements in which the difference between oxide formation standard free energies <DELTA>G DEG of the elements at the temperature of 250 DEG C is large.
Patent TW-423257-B (TW)
Title: Method and device for transmission, encoding and decoding of image signal and recording and regeneration method for optical disk
Inventor: FUJIWARA YUJI
IPC: H04N7/26
Filed: 1997-12-05
Granted: 2001-02-21
Abstract: The present invention comprises: using motion vector detecting components for detecting motion vector of the first image signal with high resolution; the second image signal wiht low resolution components made from the first image signal; compensating the second image signal with the same pixel number as the first image signal as the image signal compensation components for signal compensation; calculating the differential between the first image signal and the compensation signal as the differential components of differential signal; and, the encoding component using the motion vector for encoding the differential signals in high efficiency; therefore, during encoding two types of image signal with different resolution, the invention can improve the precision of motion vector of the high resolution signals during encoding and because it is encoding the differential signals that it can reduce the encoding ration after encoding.
Patent TW-386900-B (TW)
Title: Developer solution centrally managing device for processing patterns
Inventor: KANAUCHI MASANOBU
IPC: G03F7/30
Filed: 1997-12-22
Granted: 2000-04-11
Abstract: A developer solution centrally managing device for processing patterns includes a first tank (12) for centrally gathering and temporarily storing developer solutions transferred from a plurality of development room (7), a second tank (22) for receiving a portion of developer solutions stored in the first tank (12), a third tank (68) for receiving portion of developer solutions stored in the second tank (22), a pH value gauging device (24) to measure the pH value of the developer solutions stored in said second tank (22), a concentration gauging device (26) to measure the concentration of resin contained in the developer solutions of said second tank (22), controlling valves (50, 52) to control the quantities of original developer and/or pure water to keep the gauging value measured by said gauging devices (24, 26) within a specific range, and a controlling valve (42) through which portion of developer solutions stored in the second tank (22) is transferred to the third tank (68) only when the quality of the developer solutions in the second tank (22) is within a certain range. Accordingly, the developer solutions for processing patterns can be managed centrally and make reusable developer solutions be used again as much as possible, and qualified developer solutions can be automatically provided to a plurality of treatment rooms.
Patent TW-505657-B (TW)
Title: Dolastatin 15 derivatives and pharmaceutical composition containing same
Inventor: RITTER KURT
IPC: A61K38/00
Filed: 1998-03-10
Granted: 2002-10-11
Abstract: The present invention relates to novel peptides useful as anti-cancer agents. The compounds of the invention are of formula I, A-B-D-E-F-G (I), A, B, D, and E are Α-amino acid residues. In one embodiment, F is an azacycloalkanecarboxylic acid residue. In this embodiment, G is a monovalent radical, for example, a hydrogen atom, an alkyl group, an aryl group, or a heteroaryl group. In another embodiment, F is an azacycloalkyl group and G is a heteroaryl group connected to F by a carbon-carbon bond. In another embodiment, the invention includes a method for treating cancer in a mammal, such as a human, comprising administering to the mammal an effective amount of a compound of formula I in a pharmaceutically acceptable composition.
Patent TW-587938-B (TW)
Title: Pharmaceutical composition for the treatment and/or prophylaxis of psychotic disorder
Inventor: PINDER ROGER MARTIN
IPC: A61P25/18
Filed: 1998-03-17
Granted: 2004-05-21
Abstract: The present invention relates to therapeutic combinations of mirtazapine and an antipsychotic agent, to pharmaceutical compositions containing said combinations and to their use in the treatment or prophylaxis of psychotic disorders. A pharmaceutical composition for the treatment and/or prophylaxis of a psychotic disorder, comprising mirtazapine and an antipsychotic agent selected from haloperidol, risperidone and quetiapine in association with one or more pharmaceutically acceptable carriers therefor, the composition containing mirtazapine and said antipsychotic agent in the amount of from 0.1 mg to 1 g respectively based on a unitary dosage form.
Patent TW-407302-B (TW)
Title: Photomask for use in manufacturing semiconductor and method of forming resist pattern
Inventor: HATAI TETSUYA
IPC: G03F1/36
Filed: 1998-03-19
Granted: 2000-10-01
Abstract: A photomask for use in manufacturing a semiconductor includes a chrome pattern serving as a mask pattern. The chrome pattern is formed so as to have a size substantially equivalent to a wavelength of an exposure light at an interval substantially equivalent to the wavelength. The chrome pattern includes a band-shaped first chrome pattern and a second chrome pattern having a side in the widthwise direction substantially orthogonal to the side in the lengthwise direction of the first chrome pattern. Then, auxiliary patterns of a size of not more than the wavelength of the exposure light, which have a function of reducing the exposure light or shifting the phase of the exposure light, are formed at both corners of the side of the second chrome pattern so as to partially overlap the second chrome pattern. When forming a resist pattern of a size substantially equivalent to the wavelength of the exposure light or a resist pattern at an interval substantially equivalent to the wavelength of the exposure light, the described photomask suppresses the backward shift of the corner of the first resist pattern corresponding to the auxiliary patterns as well as the deformation of the second resist pattern positioned apart from the corner by a distance substantially equivalent to the wavelength of the exposure light.
Patent TW-424111-B (TW)
Title: Pressure converter steel making method
Inventor: KITAMURA SHINYA
IPC: C21C5/35
Filed: 1998-03-20
Granted: 2001-03-01
Abstract: The present invention intends to provide a converter refining method capable of blowing molten steel with a low degree of super-oxidation with high productivity and high yield. A first aspect resides in a pressurized converter steel-making method for use in a top-and-bottom blowing converter, wherein a converter internal pressure P is set to a higher level than the atmospheric pressure, and a top-blown oxygen flow rate F and a bottom-blown gas flow rate Q are adjusted depending on changes of the converter internal pressure P. A second aspect resides in a pressurized converter steel-making method for use in a top-and-bottom blowing converter, wherein a converter internal pressure P is set to a higher level than the atmospheric pressure during the whole or a part of a blowing period, and a top-blown oxygen flow rate F, a bottom-blown gas flow rate Q and the converter internal pressure P are changed depending on a steel bath carbon concentration C.
Patent TW-407174-B (TW)
Title: Printable material
Inventor: KRONZER FRANCIS JOSEPH
IPC: D21H21/22
Filed: 1998-04-01
Granted: 2000-10-01
Abstract: A printable material which includes a flexible first layer having first and second surfaces and a second layer. The first layer may be a film or a cellulosic nonwoven web. The second layer overlays and is bonded to the first surface of the first layer and includes a nonwoven web. The first layer has a basis weight of from about 20 to about 140 grams per square meter. The thermoplastic polymer has a melting point of from about 90 DEG C to about 250 DEG C and the second layer has a basis weight of at least about 10 grams per square meter. The first layer may be a cellulosic nonwoven web, such as a latex-impregnated paper. The second layer may be thermally bonded to the first layer or bonded by an adhesive. A release layer may be present between the first layer and the heat-activated adhesive. The second layer may contain from about 0.1 to about 2.0 percent by weight, based on the weight of the second layer, of a material which increases the viscosity of an ink jet ink when printed on the second layer. The second layer also may contain from about 0.1 to about 5 percent by weight, based on the weight of the second layer, of a cationic polymer. When the second layer is prepared from a thermoplastic polymer, the ink jet printable material may be used s a heat transfer material. Methods of preparing the printable material also are described.
Patent TW-541496-B (TW)
Title: Micro-computer and electronic machine
Inventor: KUDO MAKOTO
IPC: G06F9/312
Filed: 1998-04-02
Granted: 2003-07-11
Abstract: The present invention relates to micro-computer and electronic machine and aims to provide a micro-computer that can perform simple and high-speed extension of process data including symbols. The micro-computer (10) has a central processing unit (CPU, 20) that is used for interpreting and executing the load commands for transmitting the process data stored in the random access memory (RAM, 24) to the register providing the process data. The CPU (20) includes a command interpretation part (40) and an extension part (50). The command interpretation part (40) not only can interpret the load commands and output the data read address signals but also, at the same time, can output symbols corresponding to the process data and extending-formed extension control signals. Based on the data read address, the extension part (50), being connected via the CPU (20) and bus cables, performs at least one of the extension processes, including the zero extension and the symbol extension, on the process data read by the RAM (24) in accordance with the extension control signals up to the specified process bit number before outputting the process data to the CPU (20).
Patent TW-411551-B (TW)
Title: Method for forming sidewall spacers using frequency doubling hybrid resist and device formed thereby
Inventor: BROWN JEFFREY S
IPC: H01L21/027
Filed: 1998-06-17
Granted: 2000-11-11
Abstract: The preferred embodiment of the present invention overcomes the disadvantages of the prior art by using hybrid resist to define a sidewall spacer region and form a new type of sidewall spacer. The preferred method allows for more controlled doping at the gate-source and gate-drain junctions by defining sidewall spacer troughs using hybrid resist. Implants can then be made through the troughs to precisely control the doping at the gate junctions. Additionally, sidewall spacers can then be formed in the sidewall spacer troughs. The dimensions of the sidewall spacers is determined by the hybrid resist and can thus be made smaller than traditional resist processes. Additionally, forming the sidewall spacers using hybrid resist allows for their width to be determined independent of the depth of the gate material.
Patent TW-466442-B (TW)
Title: Byte synchronization system an method using an error correcting code
Inventor: BLAUM MARIO
IPC: H04J3/06
Filed: 1998-07-03
Granted: 2001-12-01
Abstract: A byte synchronization detection system and method in which a vector subtractor circuit determines an error vector between a current read data pattern and a synchronization bit pattern, and an offset adder circuit determines a Hamming Distance of the next read data pattern by adding the difference between the Hamming Distance from current error vector to the synchronization bit pattern and the Hamming Distance from the next error vector to the synchronization bit pattern. The Hamming Distance is determined by selected elements of the error vector which are the output from the vector subtractor circuit. The offset adder circuit determines a difference between the Hamming Distance of the current read data pattern and of the next read data pattern. The synchronization bit pattern is between 16 and 18 bits in length, inclusive. This approach reduces the probability of synchronization failure and/or mis-synchronization about 4 orders of magnitude over conventional approaches, while also reducing the length of the byte synchronization pattern to 16 bits.
Patent TW-442571-B (TW)
Title: Method for the production of liquid metal and plant for carring out the same
Inventor: SCHREY GUENTER
IPC: C21B13/14
Filed: 1998-07-09
Granted: 2001-06-23
Abstract: In a method for the production of liquid metal, in particular liquid pig iron (9) or liquid steel pre-products, from metal carriers, in particular partially reduced or reduced sponge iron (3), in a melter gasifier (1) in which with supply of a carbon-containing material at least partially formed of fine coal (16) and coal dust (13) and with supply of oxygen or oxygen-containing gas the metal carriers are melted in a bed (4) of the carbon-containing material at the simultaneous formation of a reducing gas, optionally upon previous final reduction, fine coal (16) and coal dust (13) which are being charged, are mixed with bitumen (20) in the hot state, after undergoing a drying operation, and subsequently are cold-briquetted, and the briquettes (25) thus formed are charged to the melter gasifier (1) in the cold state and in the melter gasifier (1) are subjected to shock-heating.
Patent TW-409398-B (TW)
Title: Semiconductor device
Inventor: TSUKIDE MASAKI
IPC: H01L27/02
Filed: 1998-07-23
Granted: 2000-10-21
Abstract: This invention utilizes a first transistor (TR1) in which a central impurity area 2b is connected with a power source node, and both side impurity areas 2a and 2c are connected with an output node, and a second transistor in which a central impurity area 2e is connected with the output node, and both side impurity areas 2d and 2f are connected with the power source node. In transistor arrangement, the transistors are arranged so that the impurity area connected with the power source node can be arranged so as to be made adjacent or faced to the impurity area connected with the output node. Through the parasitic field transistor, it is able to reduce a layout area of an output circuit without lowering any electrostatic breaking resistance.
Patent TW-409462-B (TW)
Title: Level shift circuit having plural level shift stage stepwise changing potential range without applying large potential difference to component transistors
Inventor: NAKAMURA HIROISA
IPC: H03K3/356
Filed: 1998-09-16
Granted: 2000-10-21
Abstract: A level shift circuit has plural level shift stages (10/11/12) connected in series between an input node (N10) and an output node (N11) for producing an output signal (S13), and a first level shift stage (10), an intermediate level shift stage (11) and a final level shift stage (12) produce a first intermediate signal (S11) changed between a positive power level (Vcc) and a first negative level (-Vpp/2) from an input signal (S10) changed between the positive power level and the ground level (GND), a second intermediate signal (S12) changed between the ground level (GND) and the first negative level (-Vpp/2) from the first intermediate signal and an output signal (S13) changed between the ground level and a second negative level (-Vpp) twice large in absolute value than the first negative level, thereby preventing the component field effect transistors (10b-10e/11a-11b/12b-12e) from the large potential difference between the positive power level and the second negative level.
Patent TW-445533-B (TW)
Title: Wafer transfer alignment system
Inventor: LAI JIAN-SHING
IPC: H01L21/304
Filed: 1998-10-06
Granted: 2001-07-11
Abstract: A wafer transfer alignment system is applied for chemical mechanical polishing process. When the robot is picking up the wafer from the wafer storage, the system employs the magnetic pillar transfer alignment device configured under the alignment device at the periphery of the wafer storage to conduct the alignment operation and positional compensation on the wafer. The position for the robot to pick up the wafer will be kept the same each time and preventing the machine shutdown or breakage caused by the wafer shift.
Patent TW-591108-B (TW)
Title: Mutated hydroxyphenylpyuvate dioxygenase, DNA sequence and isolation of plants which contain such a gene and which are tolerant to herbicides
Inventor: BOUDEC PHILIPPE
IPC: C12N15/01
Filed: 1998-11-07
Granted: 2004-06-11
Abstract: The present invention relates to a nucleic acid sequence encoding a mutated hydroxyphenylpyruvate dioxygenase (HPPD) which exhibits improved tolerance to HPPD inhibitors, to a chimeric gene which comprises this sequence as the coding sequence and to its use for isolating plants which are resistant to certain herbicides.
Patent TW-533138-B (TW)
Title: Biaxially oriented polyester film for thermal transfer ribbon
Inventor: MIZUTANI KEI
IPC: C08J5/18
Filed: 1998-11-17
Granted: 2003-05-21
Abstract: A film free from the problem of the generation of abrasion powder on an inner part of a transporting system contacting with the surface of a ribbon in a heat-sensitive transfer printer in the case of using the film as a heat-sensitive transfer ribbon and giving a heat-sensitive transfer ribbon having remarkably improved windability is produced by using a biaxially oriented polyester film having a thickness of from 1.0 to 10.0 mum and composed of a polyester composition containing two or more kinds of inert particles having different average particle diameters and each containing at least one kind of element selected from Al, Si, Ca and Mg, characterized in that the center-line average roughness (Sra) and the 10 points average roughness (SRz) of the film surface are 10 to 80 nm and 70 to 1,500 nm, respectively, the air-escaping rate between films is 20 to 120 mmHg/hr, and the end staggering width is 0 to 500 mum when a film roll slit to 1/2 inch wide is wound at a speed of 250 m/min.
Patent TW-420906-B (TW)
Title: Zero power power-on-reset circuit
Inventor: PATHAK JAGDISH
IPC: H03K17/22
Filed: 1998-11-25
Granted: 2001-02-01
Abstract: A power-on-reset circuit includes a first Charging stage for building up a charge during power up.  The rising voltage of the first charging stage is sensed and used to control means for charging up a second charging stage. When the second charging stage reaches a first voltage level, a circuit is tripped to pull the potential of the first to ground. The grounding of the first charging stage is fed back to the charging means which shuts off its power burning components and maintains the first voltage level at the second charging stage.
Patent TW-503245-B (TW)
Title: π complex compounds of transition metals
Inventor: OSTOJA-STARZEWSKI KARL-HEINZ A
IPC: C07F17/00
Filed: 1998-12-11
Granted: 2002-09-21
Abstract: π complex compounds of transition metals of the formula in which π is a n system, D is a donor atom and A is an acceptor atom, D and A being linked by a reversible coordinate bond in such a way that the donor group takes on a (partial) positive charge and the acceptor group a (partial) negative charge, and on the one hand the n system and on the other hand the acceptor group 6f the donor group being bonded to the transition metal, M is a transition metal of subgroup III, IV, V or VI of the periodic table of the elements (Mendeleeff), X is one anion equivalent and n is the number zero, one, two, three or four, depending on the charge of M and the charge of π, are novel. The novel π complex compounds are suitable as catalysts for the (co)polymerization of olefins, cycloolefins, alkynes, diolefins, vinyl esters and vinylaromatics.
Patent TW-368575-B (TW)
Title: Fill valve
Inventor: GIL AMOS
IPC: F16K31/383
Filed: 1999-01-25
Granted: 1999-09-01
Abstract: A fill valve for controlling the filling of a fluid reservoir such as a cistern. The valve minimizes the time needed to fill the reservoir by maintaining maximum fluid flow through the valve until instantaneous shut off of the fill valve once the reservoir is filled. The fill valve includes a reciprocating valve head carried on a valve stem connected to a float arm for determining the fluid level within the reservoir. The valve head is disposed within an enclosure having grooves for conducting fluid flow past the valve head to create a back pressure behind the valve head. The valve stem seals a passageway through the valve head which operates as a pilot valve during opening and closing of the valve.
Patent TW-559623-B (TW)
Title: Lipopeptide antibiotic calcium salts, process for their preparation, and their use
Inventor: VERTESY LASZLO
IPC: A61K38/12
Filed: 1999-02-23
Granted: 2003-11-01
Abstract: The present invention relates to a calcium salt of the compound of the formula II in which R1 is a straight-chain or branched, saturated or unsaturated aliphatic acyl radical having 8 to 22 carbon atoms, which can optionally be interrupted by one or more phenyl or cycloalkyl groups or linked to such groups and can furthermore be optionally interrupted by oxygen, a process for its preparation and its use as a pharmaceutical.