baber/WOPTO huggingface dataset:
Patent JP-S60218146-A (JP)
Title: Storage device address control system
Inventor: BABA NOBUYUKI
IPC: G06F12/02
Filed: 1984-04-13
Abstract: PURPOSE:To improve the economical efficiency of a computer or the like by using one address register for both the specification of a storage device address and a byte position in a buffer. CONSTITUTION:A writing address register is constituted of a high-order address register 11-1 holding a high-order digit part and a low-order address register 11-2 holding a low-order digit part. An output 30 from the low-order address register 11-2 specifies the byte position of the buffer 18 storing the output byte of a data processing part 17. The register 11-2 is counted up in each byte processing through an increment circuit 32. A carried value from the most significant digit at the increment operation of the register 11-2 is held by a carrying holding circuit 34 constituted of a flip flop and having an object to delay the carrying. Therefore, the carried value can be prevented from being immediately transmitted to the upper address register 11-1 and changed at its contents.
Patent JP-H05269775-A (JP)
Title: Hot press device and method
IPC: B29C43/58
Filed: 1992-03-30
Abstract: PURPOSE:To simultaneously press materials to be processed having different kinds of sizes using a hot press device having sufficient pressure resistance. CONSTITUTION:A movable plate 23, a movable hot plate 27 and an intermediate hot plate 29 are raised along a guide rail 59 and a ram 19 is stopped under a contact pressure of about 1kg/cm<2> to heat and soften a material to be processed. Nitrogen gas is supplied to a pressure container to raise the internal pressure thereof. The outflow of a resin is prevented by the pressure PN in the container 5 to prevent the generation of burr. The material to be processed is pressed by the reaction force PR generated in the material to be processed in the same way as such a case that the material to be processed is pressed by a hot plate. The pressure container 5 is excellent in pressure resistance as compared with a parallelepiped container constituted of a flat plate because the cylindrical body 11 having a high pressure-resistant shape, cylindrical shutter 45 and semioval mirror plate 9 of the container 5 are composed of a pressure- resistant member. Further, it is also unnecessary to excessively increase plate thickness.
Patent JP-H09262948-A (JP)
Title: Resin laminate and its application
Inventor: YAMAMOTO TETSUYA
IPC: B65D81/34
Filed: 1996-03-28
Abstract: PROBLEM TO BE SOLVED: To make heat resistance, transparency, flexibility, low temperature impact strength and hygiene improve by specifying the properties of a laminate in which the outer layer is formed from polypropylene, the intermediate layer is formed from elastomer, polyethylene, of polypropylene, and the inner layer is formed from propylene copolymer or polyethylene. SOLUTION: The outer layer of a laminate is formed from propylene homopolymer or propylene.'-olefin random copolymer which is prepared from at least 50 mole % propylene and ethylene or 4-8C α-olefin, at least one intermediate layer which constitutes the intermediate layer part is formed by selecting elastomer, polyethylene, and polypropylene, and the inner layer is formed from propylene.α-olefin random copolymer which is prepared from at least 50 mole % of propylene and ethylene or 4-8C α-olefin or polyethylene. The haze after retort sterilization treatment of the resin laminate is made not exceeding 30%, and the heat distortion temperature is made at least 121 deg.C.
Patent JP-S60216180-A (JP)
Inventor: SAKAKIBARA IWAO
IPC: C04B33/32
Filed: 1984-04-12
Abstract: (57)【要約】本公報は電子出願前の出願データであるた め要約のデータは記録されません。
Patent JP-S52249-A (JP)
Title: Process for preparing novel bicyclo 4.3.0 nonane derivatives
Inventor: INUKAI NORIKI
IPC: C07C405/00
Filed: 1975-06-19
Abstract: PURPOSE: Bicyclo [4.3.0] nonane derivatives shown by formula I (where R 7  and R 8  are OH or H), for instance, 3-(4-carboxy butylidene)-4βhexy1-7α, 9α-dihydroxy-1βH, 6αH-bicyclo [4.3.0] nonane. 
     COPYRIGHT: (C)1977,JPO&Japio
Patent JP-S56169944-A (JP)
Title: Blocking filter
Inventor: ARAKIDA RIHACHI
IPC: H04B3/56
Filed: 1980-06-02
Abstract: PURPOSE:To make the size small, by assembling a blocking filter to a circuit breaker used for power line carrier communication. CONSTITUTION:Components other than a coil L of a blocking filter are contained in an electric circuit component-containing section 13 in a molded circuit breaker S, and the coil L is wound on the iron core from a conductor 11 and it is connected to loads AO, WO, BO. By assembling the blocking filter to the circuit breaker S, the effect of a service entrance switch and a carrier high-frequency signal are prevented from being leaked externally through commercial power supply leads functionally.
Patent JP-H03274245-A (JP)
Title: Ferritic heat-resistant stainless steel excellent in low temperature toughness, weldability and heat resistance
Inventor: UEMATSU YOSHIHIRO
IPC: C22C38/48
Filed: 1990-03-24
Abstract: PURPOSE:To improve the low temp. toughness of a stainless steel and to prevent the weld high temp. cracks in a weld zone by compositely adding Mo and Cu to a steel and specifying the Mn/S ratio, Nb content or the like therein. CONSTITUTION:The compsn. of a ferritic heat-resistance stainless steel is formed of, by weight, <=0.03% C, 0.1 to 0.8% Si, 0.6 to 2.0% Mn, <=0.006% S, <=4% Ni, 17.0 to 25.0% Cr, 0.2 to 0.8% Nb, 1.0 to 4.5% Mo, 0.1 to 2.5% Cu, <=0.003% N and the balance Fe with inevitable impurites. In this compositional range, the Mn%/S% ratio is regulated to >=200, the content of Nb in accordance with a formula [Nb]=Nb%-8(C%+N%) is regulated to >=0.2 and the relationship of <=4 Ni%+Cu% is satisfied. If required, optimum amounts of one or more kinds among Al, Ti, V, Zr, W, B and rare earth elements are incorporated therein. This steel can be used for an exhaust gas purifying material in an internal combustion engine, a burning appliance or the like.
Patent JP-H01250025-A (JP)
Title: Measuring method for short light pulse
Inventor: NAGANUMA KAZUNORI
IPC: G01J11/00
Filed: 1988-03-30
Abstract: PURPOSE:To uses the full stroke of a fast moving base for measurement and to perform the measurement efficiently by correcting an error caused by variation in the moving speed of the fast moving base according to the measurement result of a relative optical path length difference or relative optical length difference varying speed. CONSTITUTION:The relative optical path length difference and relative optical path length difference varying speed are measured by a differentiator 31 and a differential transformer 30, an oscilloscope is swept corresponding to the measured relative optical pat length difference, and the cutoff frequency at the time of the separation of fast vibration components is varied by an AM modulator 35 corresponding to the relative optical path length difference varying speed. At the same time, the relative optical path length difference is measured and every time the relative optical path length difference is varied by a constant quantity, the differentiator 31 outputs a voltage pulse, so that the fast vibration component and a direct nearby component are separated and displayed in synchronism with a voltage pulse train generated as mentioned above.
Patent JP-H05304359-A (JP)
Title: Solder suck-up device
Inventor: FUKASE KEIJI
IPC: H05K3/34
Filed: 1991-04-08
Abstract: PURPOSE:To provide a solder suck-up device which completely removes, with ease, useless solders remained stuck within a through hole at one operation. CONSTITUTION:The first soldering iron 4 from the end surface of which high temperature gas far melting a solder blows off, the second soldering iron 9 which is placed facing, approximately, the top of the first soldering iron 4 and sucks both the high temperature gas blown off from the top surface of the first soldering iron 4 and the solder melted by the high temperature gas and a soldering iron driving mechanism 11 which relatively moves the first soldering iron 4 and the second soldering iron 9 back and forth are provided. So both sides are heated, and remaining stuck solder is melted. And the molten solder is pushed out by the high temperature gas being blown off on one side, and the pushed out molten solder is sucked up, as a result, the useless solder within a through hole is easily removed altogether.
Patent JP-S63258480-A (JP)
Title: Production of organometal and organobimetal compound
Inventor: TERII RII RASUMAN
IPC: C07F3/06
Filed: 1988-03-30
Abstract: A method for producing methyllithium solutions by reacting a methylhalide with a mixture of lithium metal and an aromatic hydrocarbon containing tetrahydrofuran.
Patent JP-H06260469-A (JP)
Title: Method and device for wet-treating substrate
Inventor: KOYANAGI TETSUO
IPC: B08B3/04
Filed: 1993-03-08
Abstract: PURPOSE:To prevent the formation of a natural oxide film on the surface of a wafer and to reduce the size of a system as a whole by housing wafers in a sealed tank of a single treatment solution and filling the tank with a plurality of kinds of treatment solutions by successively replacing older solutions with newer solutions. CONSTITUTION:After wafers W, W,... carried in from a preceding process are set in a substrate holding section in a treatment solution tank 5 manually or automatically by means of a carrying-in robot, the tank 5 is sealed. Then the wafers W, W,... are cleaned by filling the tank 5 with three kinds of cleaning solutions by successively replacing older solutions with newer solutions. For example, the wafers W, W,... are successively cleaned with HF, SC-1 solution (NH4OH+H2O2+ pure water), and SC-2 solution (HCl+H2O2+ pure water) in this order. Therefore, the wafers are cleaned by using a completely closed system.
Patent JP-H09243514-A (JP)
Title: Method and apparatus for measuring diopter of viewing lens
Inventor: UEDA TAKESHI
IPC: G01M11/00
Filed: 1996-03-04
Abstract: PROBLEM TO BE SOLVED: To obtain an apparatus for measuring the diopter of a viewing lens' which rapidly and accurately measures the diopter of the lens so as not to cause the 'irregularity' due to a measuring operator to occur. SOLUTION: In the state that a viewing lens 12 is not inserted into a measuring optical system having a collimating lens 7, a focusing lens 9 and a photoreceiver 14, the images of linear slits 5a, 5a' are focused on the photoreceiver 14. In this case, the area S surrounded by the relative curve regarding a modulation transfer function with the space frequency of a measuring optical system and a test charge as objects and the two coordinate axes of a rectangular coordinate graph is obtained, a moving type photodetector support base 15 is moved to the position on the optical axis that the area S becomes maximum, and the measuring reference position is set. Then, in the state that the lens 12 is inserted into the measuring system, the area S is obtained, and the base 15 is moved to the position where the area S becomes maximum.  The diopter of the lens is measured based on the positional difference between the position at this time and the standard position.
Patent JP-H11270698-A (JP)
Title: Assembling method and structure of mechanical seal
Inventor: MURAKAMI ARATA
IPC: F16J15/34
Filed: 1998-03-24
Abstract: PROBLEM TO BE SOLVED: To prevent effectively the leakage of a material such as a sealing agent from a bearing part of a production facility and maintain the withstand ability even in case a high internal pressure acts on the seal part. SOLUTION: A side frame 5 furnished with a guide groove 4 is fitted on a bearing seal part of a drive shaft 2 protruding from a mixer casing 1 and fastened to the side wall of the mixer casing 1 using a fastening member 6 such as bolt. The guide groove 4 admits insertion of a first sealing member 7 such as U-form seal packing set from the side with casing 1, a holding member 7a for the first seal member 7, a resilient member 8 such as spring to press the first seal member 7 always toward the casing 1 through the holding member 7a, and a holding and fixing frame 10 to adjust the resilience of the member 8, wherein the frame 10 is removably fixed to the side face of the side frame 5 by a fastening means 11 such as bolt.
Patent JP-S62231588-A (JP)
Title: Piezoelectric wave transmitter
Inventor: OGURA KOJI
IPC: H04R17/00
Filed: 1986-03-31
Abstract: PURPOSE:To drop an auxiliary vibration in an auxiliary pole compared with a main vibration in a main pole and to improve a directional characteristic by forming a piezoelectric board used by a piezoelectric wave transmitter in such a way that its center is thin and becomes thick toward its periphery, and impressing and polarizing a voltage on the upper and lower surfaces of an electrode. CONSTITUTION:The electrodes 4 and 4 are formed with conductive rubber or the like on the upper and lower surfaces of a piezoelectric rubber sheet 1. By connecting a DC power source 5 to the electrodes 4 and 4, a voltage is impressed and polarized in the thickness direction. The polarized voltage is uniformly impressed in the surface direction of the piezoelectric rubber sheet 1. As a result the supply amount of the voltage per the unit thickness becomes maximum in the center and decreases toward the periphery. Accordingly the high polarized voltage is impressed on the center of the piezoelectric rubber sheet 1, whereas the low polarized voltage is impressed on the periphery. When the directional characteristic of the piezoelectric rubber sheet 1 after polarization is tested with a flat surface 3 as a wave transmitting surface, the auxiliary vibration is suppressed below-30 dB, which means that it substantially decreases, and therefore the improvement in the directivity can be recognized.
Patent JP-S60218866-A (JP)
Title: Complementary mos semiconductor device
Inventor: NAGAO SHIGEO
IPC: H01L27/092
Filed: 1984-04-13
Abstract: PURPOSE:To prevent the occurrence of a latch-up phenomenon without reducing the integration degree, by providing the thickness of a semiconductor layer having low impurity concentration, in which MOS transistors are formed, so that the impurities of a substrate do not reach the surface of the semiconductor layer. CONSTITUTION:Ions are implanted in a P type silicon substrate 6 having high impurity concentration, and an embedded layer 7 having high inpurity concentration is formed. A P type silicon part is epitaxially grown. A semiconductor layer 8 having low impurity concentration is formed to a width so that the impurities of the substrate 6 do not reach the surface. Phosphorus ions are implanted, and an island region 9 including the embedded layer 7 is formed. A field oxide film 12 is formed. An N-channel MOS transistor is formed in a region 8a. A P-channel MOS transistor is formed in the island region 9 including the embedded layer 7. The resistance of the semiconductor substrate is made low and the island region is made deep. Thus a latch-up phenomenon can be made hard to occur to a large extent.
Patent JP-H04309280-A (JP)
Title: Manufacture of distributed feedback semiconductor laser
Inventor: HIRATA SHOJI
IPC: H01S5/00
Filed: 1991-04-08
Abstract: PURPOSE:To obtain an active layer having a good crystallinity by forming a grating in a guide layer on the active layer after the active layer is once formed on the main surface of a flat mesa projection by a metal organic chemical vapor deposition (MOCVD) method. CONSTITUTION:When an MOCVD method is used, slopes 9A and 9B respectively composed of (111)B planes are spontaneously produced on a stripe-like mesa projection 2 and semiconductor multilayered structure sections 20 are separately formed on both sides of the projection 2 when the crystal face of a substrate 1 and the extended direction of the projection 2 are selected. Then the flat section of a guide layer 15 is exposed by only selectively etching a selective etching layer 15 on a guide layer 14 on the projection 2 and a grating 13 is formed on the exposed flat section of the layer 14. Therefore, an active layer 4 having a good crystallinity can be obtained.
Patent JP-H01247109-A (JP)
Title: Preparation of polished tile having pattern
Inventor: NAKAJIMA KAZUYUKI
IPC: B28B1/26
Filed: 1988-03-29
Abstract: PURPOSE:To prepare a polished tile having transparency, depth and massive feeling in the pattern part thereof and excellent in decorativeness, by subjecting a composition, which is prepared by mixing a damp-dried lumps composed of the same raw material as a slip with the slip, to cast molding. CONSTITUTION:At the time of the molding of a molded body prepared by a slip cast molding method using a gypsum mold, a slip of a raw material for tile soil composed of china clay, clay and feldspar, pref., a raw material for tile soil easy to be formed into porcelain by baking and damp-dried lumps composed of the same raw material as the slip are used as a casting raw material. The semi-dried lumps can be easily obtained by dehydrating the slip according to a proper method and the water content thereof is especially pref. set to about 12-20wt.%. The obtained molded body is dried and baked until formed into porcelain to obtain a baked tile. When the surface of the baked tile is polished, the lump surface parts of the damp-dried lumps appear as a pattern and a polished tile having a beautiful pattern can be obtained.
Patent JP-S60243022-A (JP)
Inventor: TOOMASU KITSUSERU
IPC: A61K38/16
Filed: 1985-04-08
Abstract: (57)【要約】本公報は電子出願前の出願データであるた め要約のデータは記録されません。
Patent JP-H04308125-A (JP)
Title: Conveying device
Inventor: OSHIMA JINICHIRO
IPC: H01L21/677
Filed: 1991-04-08
Abstract: PURPOSE:To miniaturize a device by omitting an electromagnet for preventing the rotation of a cylindrical levitation body. CONSTITUTION:Four projections 22-25 are provided on the outer periphery of a levitation body 1. The projections 22-25 are formed to face cores 16a-19a of electromagnets 16-19 over the longitudinal direction of the levitation body 1. The magnetic force of the electromagnets 16-19 is concentrically applied to the projections 22-25. The rotation of the levitation body 1 around the axis 01 is prevented by the so-called electromagnetic aligning property.
Patent JP-H0795890-A (JP)
Title: Bidirectional promoter of pcbab and pcbc gene of acremonium chrysogenum and use thereof
Inventor: URURITSUHI KIYUTSUKU
IPC: C12Q1/68
Filed: 1994-03-22
Abstract: PURPOSE: To provide a new promoter useful for quantitatively measuring the expression of proteins in Acremonium chrysogenum and Aspergillus niger or the expression of a reporter gene in the Acremonium chrysogenum.  
     CONSTITUTION: A DNA segment of 1237 bases of the formula or a DNA segment having its partial sequence and a bi-directional promoter activity. The DNA segment is contained in a genetic region between pcbAB gene and pcbC gene in Cephalosporium acremonium, and is prepared by chemical or genetic operations. 
     COPYRIGHT: (C)1995,JPO
Patent JP-S60218354-A (JP)
Title: 4-(9',10',12',13',15',16'-hexabromostearoyl)-veratrol
Inventor: TERADA AKIRA
IPC: C07C45/46
Filed: 1984-04-14
Abstract: NEW MATERIAL:A compound shown by the formula I . USE:An intermediate for preparing a synthetic urushiol analog. PREPARATION:Veratrol shown by the formula 2 is reacted with 9,10,12,13,15, 16-hexabromostearoyl chloride shown by the formula 3 in the presence of a Friedel.Crafts catalyst to give a compound shown by the formula I . A protonic acid such as hydrogen fluoride, etc. as well as a Lewis acid such as anhydrous AlCl3, iron chloride, boron trifluoride, etc. can be used as the catalyst. Nitrobenzene, nitromethane, or CS2 is suitable as a solvent.
Patent JP-H01248527-A (JP)
Title: Treatment of semiconductor wafer
Inventor: SUMIYA HIROSHI
IPC: H01L21/306
Filed: 1988-03-29
Abstract: PURPOSE:To allow highly efficient and accurate selective removal of a protective film such as a silicon oxide film covering the rear of a semiconductor wafer by attaching corrosion resistant plates to both sides of the semiconductor wafer interposing an unetched viscous composition therebetween, dipping the semiconductor wafer in an etching solution, and removing redundant part of the oxide film around the peripheral part of the semiconductor wafer. CONSTITUTION:A semiconductor wafer 2 has corrosion resistant plates 6 attached to both sides thereof after being wetted by an unetched solution or viscous substance such as water 4. The semiconductor wafer 2 sequentially has the corrosion resistant plates 6 attached after being wetted by water 4 so as to be formed into a laminate X with tens to hundreds of layers. The laminate X is clamped after being placed between a fixed support wall 8 and a movable clamping wall 10 of a clamping device Y and then is dipped into an etching solution W within a container H with the semiconductor wafers 2 and the corrosion resistant plates 6 completely in contact. Under this condition, and part of the semiconductor wafer 2 which is not in contact with the corrosion resistant plates 6, i.e., its peripheral part 12 is exposed to the etching solution W, whereby the oxide film on the peripheral part 12 can be removed.
Patent JP-H06291493-A (JP)
Title: Substrate carriage method
Inventor: KAJIYAMA MASAYUKI
IPC: H05K13/08
Filed: 1993-04-01
Abstract: PURPOSE:To provide a method of carrying a substrate efficiently even if it is diversified small-quantity production without interposing hands, in an electronic component mounter. CONSTITUTION:A second substrate detecting means 9 judges whether the next substrate arrives at the position of the first substrate detecting means 7 within the time required for one-cycle operation of of a carry arm 6 after mounting a component on the substrate on an X-Y table, and in case that there is a substrate which has arrived at it; this waits the arrival of the next substrate, and in case that there is no substrate, this starts the operation of the carry arm 6 at that point of time.
Patent JP-S5410393-A (JP)
Title: Preparation of vinyl chloride-type polymer
Inventor: KURIMOTO KAZUHIKO
IPC: C08F14/06
Filed: 1977-06-27
Abstract: PURPOSE: To prepare easily a vinyl chloride polymer having a low polymerization degree by adding a small amount of the specific sulfide compound to the polymerization system as a chain transfer agent, there by reducing the probelms such as treatment of toxic gases, discharge of polluting waste water, etc. 
     COPYRIGHT: (C)1979,JPO&Japio
Patent JP-H07282788-A (JP)
Title: Alkaline manganese dry cell
Inventor: ISHII AYAKO
IPC: H01M6/08
Filed: 1994-04-14
Abstract: PURPOSE:To prevent the outside leak of gas by hindering the contact of hydrogen gas with a sealing body by a dimethylsilicone oil film to accumulate the hydrogen gas in a vessel when the hydrogen gas is generated due to the errosion of the grain state zinc of a negative electrode agent, dissolving part of the hydrogen gas into the dimethylsilicone oil film. CONSTITUTION:First, manganese dioxide and carbon are mixed to produce a positive electrode mixture 2. While grain state zinc excluding mercury, a potassium hydroxide solution, and thickener composed of polyacrylic acid are mixed to product a gel state negative electrode agent 3. Dimethylcilicone oil having a viscosity of e.g. 50-100cSt is applied to the part of a nylon-resin-made sealing body 6, having a column shape and a through hole in the middle, facing to a cell inside surface. Then the positive electrode mixture 2 is housed in the outer side of a synthetic-resin-made separator 4 in a metallic cell can body, and the negative electrode agent 3 is housed in the inner side. A sealing body is arranged in the opening part of this can body, and a dish state bottom plate is fixed to the opening part of the can body 1 by calking fixing to manufacture a LR6 type alkaline manganese dry cell.