Patent SG-11201900623P-A (SG)
Title: Position sensor, lithographic apparatus and method for manufacturing devices
Inventor: HUISMAN SIMON
IPC: G03F9/00
Filed: 2017-06-30
Abstract: WO 18/0 41440 Al (12) INTERNATIONAL APPLICATION PUBLISHED UNDER THE PATENT COOPERATION TREATY (PCT) (19) World Intellectual Property Organization International Bureau (43) International Publication Date 08 March 2018 (08.03.2018) W I PO I PCT D IVIIl °nolo mull Ho Ho Ho lio imio oimIE (10) International Publication Number WO 2018/041440 Al 530a2 5306 514b (51) International Patent Classification: G03F 9/00 (2006.01) (21) International Application Number: PCT/EP2017/066321 (22) International Filing Date: 30 June 2017 (30.06.2017) (25) Filing Language: English (26) Publication Language: English (30) Priority Data: 16186333.7 30 August 2016 (30.08.2016) EP (71) Applicant: ASML NETHERLANDS B.V. [NL/NL]; P.O. Box 324, 5500 AH Veldhoven (NL). (72) Inventors: HUISMAN, Simon, Reinald; P.O. Box 324, 5500 AH Veldhoven (NL). MATHIJSSEN, Simon, Gijs- bert, Josephus; P.O. Box 324, 5500 AH Veldhoven (NL). GOORDEN, Sebastianus, Adrianus; P.O. Box 324, 5500 AH Veldhoven (NL). AKBULUT, Duygu; P.O. Box 324, 5500 AH Veldhoven (NL). POLO, Alessandro; P.O. Box 324, 5500 AH Veldhoven (NL). (74) Agent: KETTING, Alfred; P.O. Box 324, 5500 AH Veld- hoven (NL). (81) Designated States (unless otherwise indicated, for every kind of national protection available): AE, AG, AL, AM, AO, AT, AU, AZ, BA, BB, BG, BH, BN, BR, BW, BY, BZ, CA, CH, CL, CN, CO, CR, CU, CZ, DE, DJ, DK, DM, DO, DZ, EC, EE, EG, ES, FI, GB, GD, GE, GH, GM, GT, HN, HR, HU, ID, IL, IN, IR, IS, JO, JP, KE, KG, KH, KN, KP, KR, KW, KZ, LA, LC, LK, LR, LS, LU, LY, MA, MD, ME, MG, MK, MN, MW, MX, MY, MZ, NA, NG, NI, NO, NZ, OM, PA, PE, PG, PH, PL, PT, QA, RO, RS, RU, RW, SA, SC, SD, SE, SG, SK, SL, SM, ST, SV, SY, TH, TJ, TM, TN, TR, TT, TZ, UA, UG, US, UZ, VC, VN, ZA, ZM, ZW. (84) Designated States (unless otherwise indicated, for every kind of regional protection available): ARIPO (BW, GH, GM, KE, LR, LS, MW, MZ, NA, RW, SD, SL, ST, SZ, TZ, UG, ZM, ZW), Eurasian (AM, AZ, BY, KG, KZ, RU, TJ, TM), European (AL, AT, BE, BG, CH, CY, CZ, DE, DK, EE, ES, FI, FR, GB, GR, HR, HU, IE, IS, IT, LT, LU, LV, MC, MK, MT, NL, NO, PL, PT, RO, RS, SE, SI, SK, SM, TR), OAPI (BF, BJ, CF, CG, CI, CM, GA, GN, GQ, GW, KM, ML, MR, NE, SN, TD, TG). Published: — with international search report (Art. 2 I (3)) (54) Title: POSITION SENSOR, LITHOGRAPHIC APPARATUS AND METHOD FOR MANUFACTURING DEVICES (57) : An alignment sensor in a lithographic apparatus comprises 518 an optical system (500; 600) configured to deliver, collect and process ra- 530a1 516 r514a diation selectively in a first waveband (e.g. 500-900 nm) and/or in a sec- and waveband (e.g. 1500-2500 nm). The radiation of the first and second wavebands share a common optical path (506-508; 606) in at least some portion of the optical system, while the radiation of the first waveband is 542 processed by a first processing sub-system (552a) and the radiation of the second waveband (552b) is processed by a second processing sub-system. The processing subsystems in one example comprise self-referencing inter- ferometers (556a/556b; 656a/656b). The radiation of the second waveband 560a allow marks to be measure through an opaque layer (308) such as carbon hard 558 mask. Optical coatings and other components of each processing sub-system 557a can be tailored to the respective waveband, without completely duplicating the optical system. 532 _J 500 Fig. 5