baber/WOPTO huggingface dataset:
Patent TW-430969-B (TW)
Title: Method for forming a contact hole on a semiconductor chip
Inventor: YANG CHAN-LON
IPC: H01L23/522
Filed: 1999-03-19
Granted: 2001-04-21
Abstract: The present invention provides a method for forming a contact hole on a semiconductor. The surface of the semiconductor chip is sequentially configured with a substrate, a silicon nitride layer,a silicon oxide layer and a photoresist layer. The photoresist layer includes a hole. The method comprises: performing an anisotropic etching process and removing downwardly the silicon oxide layer under the hole until reaching the surface of the silicon nitride layer so as to form a trench; then, performing a plasma washing process to completely remove the residual polymer at the bottom of the trench from the anisotropic etching process; then, performing another anisotropic etching process to continuously remove downwardly the silicon nitride layer at the bottom of the trench until reaching the substrate surface and forming the contact holes; finally, using another washing process to completely remove all the residual polymer material at the bottom of the contact hole. The method can make the trench and the bottom of the contact hole to have no residual polymer material.
Patent TW-530189-B (TW)
Title: Lithographic projection apparatus for imaging of a mask pattern and method of manufacturing a device using a lithographic projection apparatus
Inventor: BLEEKER ARNO JAN
IPC: H01L21/027
Filed: 1999-06-10
Granted: 2003-05-01
Abstract: A lithographic apparatus, e.g. using an electron beam, to expose a radiation sensitive layer on a substrate to the pattern on a mask comprising pattern areas and opaque support. The apparatus uses a beam having a trapezoidal profile to provide a more uniform exposure at sub-field stitches in the event of any positional inaccuracies. The trapezoidal beam profile is generated by changing the size or position of the illumination beam on the mask during the course of an exposure period.
Patent TW-385267-B (TW)
Title: Adjustable wrench
Inventor: HILLINGER GEORGE
IPC: B25B13/16
Filed: 1999-06-17
Granted: 2000-03-21
Abstract: An adjustable wrench utilizes a drive member housed in a wrench body. The drive member has a cylindrical drive element having external male threads formed thereon, onto which a guide block is mounted by means of a bore, within which female threads, complementary to the male threads, are formed extending longitudinally through the guide block, so that the drive element extends through the bore with the male and female threads in engagement with one another, whereby rotation of the drive element is operable to move the guide block longitudinally along the drive element. A drive knob is fixed to and manually operable for selectively rotating the drive element. A pair of alignment arms connect a movable jaw element to the guide block so that the movable jaw element faces and is displaced from the drive block in longitudinal alignment with the bore and is separated from the drive knob by the drive block. The drive knob is rotated to move the movable jaw toward and away from a fixed jaw element formed on the wrench body so as to be in longitudinal alignment with the movable jaw element and fixed in position in the wrench housing between the movable jaw and the guide block.
Patent TW-444199-B (TW)
Title: Recording medium for storing information for still picture, recording and/or reproducing method and apparatus therefor
Inventor: MOON SEONG-JIN
IPC: H04N5/76
Filed: 1999-06-22
Granted: 2001-07-01
Abstract: A recording medium for storing information for still pictures, and a recording and/or reproducing method and apparatus therefor are provided. In a writeable and rewriteable recording medium, data for a plurality of still pictures and audio data added thereto is stored in one file or a space having a logically one-dimensional order, rather than in each file, and still picture group information for separating the still picture data into within a predetermined maximum number of groups in order to manage the still pictures at a group level is then stored. Thus, large-capacity still picture data and audio data added thereto can be recorded and/or reproduced using the minimum amount of information. The still picture group information includes general information for a still picture group, containing the start position of the still picture group and the number of video parts in the still picture group, and information for a still picture, the information containing position information thereof. The general information for a still picture group includes the start position of a still picture in the still picture group. The information for a still picture and audio data includes the sizes thereof. Therefore, effective management of information is allowed.
Patent TW-508761-B (TW)
Title: Manufacturing method of self-aligned mask type ROM
Inventor: WANG LIN-SUNG
IPC: H01L21/8246
Filed: 1999-09-09
Granted: 2002-11-01
Abstract: A manufacturing method of self-aligned mask type ROM is disclosed, which comprises forming a gate stack layer on the substrate for use as the word line, wherein the gate stack layer comprises a gate oxide layer, a gate conductive layer and a gate cap layer; then forming a gate spacer on the sidewall of the gate stack layer; passivating an insulating layer on the substrate; planarizing this insulating layer until the gate cap layer is exposed; then forming a patterned photoresist layer on the substrate to define the ion implantation block; removing only the gate cap layer in the ion implantation block by using the patterned photoresist layer as the mask in accordance with an etchant with high selectivity; implanting ions into the substrate in the ion implantation block using the patterned photoresist layer as the mask for completing the programming step; then, removing the photoresist layer.
Patent TW-483921-B (TW)
Title: Flame-retardant thermoplastic resin composition
Inventor: NODERA AKIO
IPC: C08K3/34
Filed: 1999-09-29
Granted: 2002-04-21
Abstract: Provided are a flame-retardant thermoplastic resin composition comprising 100 parts by weight of a resin mixture of (A) from 50 to 95% by weight of a polycarbonate resin and (B) from 5 to 50% by weight of a styrenic resin, from 0.1 to 10 parts by weight of c red phosphorus, and from 5 to 50 parts by weight of (D) talc, and its injection moldings. The composition comprising a polycarbonate resin and a styrenic resin is troubled little by red coloration with red phosphorus therein. The composition can be well molded into pale color or light color moldings. The color tone and the outward appearance of the moldings are both good, and the heat resistance, impact resistance, rigidity and even the flame retardancy of the moldings are much improved. In the composition, red phosphorus is preferably stabilized.
Patent TW-457306-B (TW)
Title: Electrode assembly for electrical resistance heater used in crystal growing apparatus
Inventor: CHERKO CARL F
IPC: C30B15/14
Filed: 1999-10-20
Granted: 2001-10-01
Abstract: An electrode assembly for use with an electrical resistance heater mounted in a housing of a crystal puller used for growing monocrystalline silicon ingots according to the Czochralski method comprises an electrode having a first end in electrical connection with the heater within the housing and an outer end. The electrode extends through the crystal puller housing such that the outer end of the electrode is generally external of the housing. The portion of the electrode within the housing is generally solid in cross-section along the entire length of said portion and free of any internal cooling passages. An electrical conductor is electrically connected to a portion of the electrode extending externally of the housing for supplying electrical current to the electrode from a source of electrical current for conduction inward along the electrode to the heater located in the housing. The electrical conductor is also in thermally conductive engagement with external portion of the electrode and has an internal passage extending therethrough for receiving cooling media in the conductor for use in extracting heat from the external portion of the electrode.
Patent TW-I228625-B (TW)
Title: Display device
Inventor: YAMAZAKI SHUNPEI
IPC: H01L21/77
Filed: 1996-11-15
Granted: 2005-03-01
Abstract: A resin material having a small relative dielectric constant is used as a layer insulation film 114. The resin material has a flat surface. A black matrix or masking film for thin film transistors is formed thereon using a metal material. Such a configuration prevents the problem of a capacity generated between the masking film and a thin film transistor.
Patent TW-457202-B (TW)
Title: Motion sensor for use with a bicycle sprocket assembly
Inventor: FUKUDA MASAHIKO
IPC: G01P3/487
Filed: 1999-11-02
Granted: 2001-10-01
Abstract: A sensor retainer for a bicycle sprocket assembly includes an annular member for mounting and rotating coaxially with the bicycle sprocket assembly and a sensor element fixed to the annular member. Alternatively, the sensor retainer may include a fixing member for mounting a derailleur or other transmission to a bicycle frame and a sensor element mounted to the fixing member.
Patent TW-429615-B (TW)
Title: Fabricating method for the capacitor of dynamic random access memory
Inventor: LIAU WAN-CHUEN
IPC: H01L21/02
Filed: 1999-11-06
Granted: 2001-04-11
Abstract: This invention is about a fabricating method for the capacitor of dynamic random access memory. At first, the lower insulation layer that is used to cover transistor and bit line, etch stop layer and upper insulation layer are sequentially formed on substrate. A photoresist layer with opening is formed on the surface of upper insulation layer. Through the opening of photoresist layer, wet etching process is performed to etch upper insulation layer till etch stop layer in order to form a bowl-shaped opening. Then, through the opening of photoresist layer and the bowl-shaped opening, dry etching process is used to etch the etch stop layer stated above and the lower insulation layer till the source/drain region of transistor in order to form a contact window. After removing the photoresist layer, the conduction layer is conformably formed on the upper insulation layer surface and is used to fill up contact window. After this conduction layer is defined, the dielectric layer and another conduction layer are formed sequentially so as to form bowl-shaped capacitor. By using wet etching and dry etching methods, the process stated above is simpler and the area of capacitor can be increased effectively. The formation of bowl-shaped opening can decrease the etching step height of contact window. The design of stop layer can avoid the bridge connection between bit line and the lower electrode plate.
Patent TW-432403-B (TW)
Title: Chip-type high-precision low-resistance device and its fabricating method
Inventor: SHIU KANG-NENG
IPC: H01C7/06
Filed: 1999-11-18
Granted: 2001-05-01
Abstract: This invention is about chip-type high-precision low-resistance device and its fabricating method. After the roll of alloy metal wire material with extremely low temperature coefficient of resistance is rolled to form thin plate shape or the roll of alloy metal plate material with extremely low temperature coefficient of resistance is directly used, the pressing process is used to form the outlook of device. Then, the insulating coating is fabricated to cover the electrode so as to form the device.
Patent TW-514780-B (TW)
Title: Method and apparatus using a distributed system structure to support bus-based cache-coherence protocols for symmetric multiprocessors
Inventor: ALVAREZ MANUEL
IPC: G06F12/08
Filed: 2000-03-29
Granted: 2002-12-21
Abstract: A method and apparatus for a large-way, symmetric multiprocessor system using a bus-based cache-coherence protocol is provided. The distributed system structure contains an address switch, multiple memory subsystems, and multiple master devices, either processors, I/O agents, or coherent memory adapters, organized into a set of nodes supported by a node controller. Each of the processors may have multiple caches. The address switch connects to each of the node controllers and to each of the memory subsystems, and each of the memory subsystems connects to the address switch and to each of the node controllers. The node controller receives commands from a master device and queues commands received from a master device. The node controller has a deterministic delay between latching a snooped command broadcast by the address switch and presenting the command to the master devices on the node controller master device buses. The memory subsystems contain a memory controller and a fixed delay pipe from the address port to the memory controller so that the memory subsystem has a deterministic delay between receiving a command from the address switch and presenting the command to the memory controller. The buses between the master devices, the node controllers, the address switch, and the memory subsystems are operable using a variety of bus protocols.
Patent TW-421714-B (TW)
Title: A desiccant bag, capable of indicating humidity percentage
Inventor: UEMURA HIROSHI
IPC: G01N25/62
Filed: 2000-05-09
Granted: 2001-02-11
Abstract: This invention is a desiccant bag, which can indicate relative humidity. The desiccant bag is put in packing container with food and electrical devices, in order to keep a suitable humidity. On the bag surface of the desiccant, several humidity indication tapes are attached. According to the color change of those humidity indication tapes, different percentage of relative humidity can be obtained.
Patent TW-478044-B (TW)
Title: Automatic monitoring method and system of plasma chemical vapor deposition equipment
Inventor: WANG YU-SHENG
IPC: C23C16/52
Filed: 2000-05-26
Granted: 2002-03-01
Abstract: The present invention is an automatic monitoring method and system of plasma chemical vapor deposition equipment, which comprises: proving an optical processing mode directly capturing radiated optical signal from the reaction chamber; process the signal through the electro-optical converter; connect the converted electronic digital signal to the CPU; proceed the reading, analyzing, judging and control of this plasma radiation information; the characteristic of the present invention is: it is set to be in the energy-saving mode without operation, processing information when it is in the idle state, but it can automatically proceed the reading, analyzing, judging and control of this plasma radiation information after it receives the preset signal of plasma operation.
Patent TW-465011-B (TW)
Title: Transfer device for subjects to be processed and semiconductor manufacturing apparatus with the device
Inventor: SAEKI HIROAKI
IPC: H01L21/677
Filed: 2000-07-26
Granted: 2001-11-21
Abstract: This invention is directed to a wafer transfer device with a structure that utilizes a linear motor to cause a wafer transfer robot to reciprocate along a linear line. The object of the invention is to ensure that dust does not adhere to wafers in the wafer transfer device. According to the invention, a securing base 9 mounted on a secondary side (11) of a linear motor (M) for driving a wafer transfer robot (R) to reciprocate linearly is mounted along the width and longitudinal direction of a device body (1) of a wafer transfer device (A) such that dust falling down with the air currents of clean air (K) supplied by a clean air supply device (4) will not accumulate on the securing base (9) and the secondary side (11) and can be directly sucked and discharged via an exhaust fan (5) disposed at the bottom portion (1c) of the device body (1).
Patent TW-508408-B (TW)
Title: Pump with a pulsation suppression device
Inventor: NISHIO KIYOSHI
IPC: F04B9/125
Filed: 2000-09-15
Granted: 2002-11-01
Abstract: The invention relates to a pump with a pulsation suppression device of which the object is to provide a pump with pulsation suppression device that can further enhance the effect of suppressing pulsation. To summarize the structure of the present invention, a pump head wall 1 with inflow passage 2 and outflow passage 3 is positioned at a central location. In one side portion of the pump heat wall 1, a first bellows 7 which is driven so as to extend and contract by an air cylinder portion 14, and check valves 16a and 16b which alternately open and close a pump working chamber 9a are disposed to constitute a reciprocal pump portion 4. In the other side portion of the pump head wall 1, a pulsation suppressing portion 5 is configured so as to have a second bellows 18 that is extendable and contractible, and that forms: a liquid chamber 20a which can temporarily store liquid that is to be discharged from the pump portion 4; and an air chamber 20b which is isolated from the liquid chamber 20a. The pulsation suppressing portion absorbs pulsation of the liquid which is discharged from the pump portion 4, by a change in the capacity of the liquid chamber 20a. The extension rate of the second bellows 18 is set to be larger than that of the first bellows 7.
Patent TW-I266772-B (TW)
Title: Soft contact lenses
Inventor: VANDERLAAN DOUGLAS G
IPC: G02C7/04
Filed: 2000-11-03
Granted: 2006-11-21
Abstract: A soft contact lens containing a silicone-hydrogel made by curing a reaction mixture containing a silicone-containing monomer.
Patent TW-479013-B (TW)
Title: Method of fabricating an electronic component and apparatus used therefor
Inventor: TAKEHARA MASATAKA
IPC: H01L21/56
Filed: 2000-11-07
Granted: 2002-03-11
Abstract: The present invention provides a method of fabricating an electronic component, using a tool (3) to pressing a chip (2) against a substrate (1) and heating the same, connecting a chip electrode (18) and a substrate electrode (5) together via a bump (4), placing the substrate (1) in alignment with a die alignment plane (P.L.) for an upper die (20) and a lower die (21), clamping the upper die (20) and the lower die (21) to form a cavity (24) and exhausting the cavity (24) via an exhaust pole (25) to vacuum the same, and injecting melted resin (26) into the cavity (24) and curing the melted resin (26) to provide sealing resin (8). Then, in a predetermined ambient at a predetermined temperature the substrate (1) is pressed against a test board (10) and a predetermined electrical signal is applied from the test board (10) via an external electrode (19) to the chip (2) to test an operation of an electronic component configured of a unit region (7) of the substrate (1) and the chip (2), and cutting along virtual line (9) completes the electronic component. Thus, a plurality of chips (2), and can be resin-sealed collectively with high precision and a plurality of electronic components can be burnt in. As a result, in mounting the chip (2) to the substrate (1), sealing the same with resin and burning in the same to provide an electronic component, the electronic component can be efficiently fabricated, with the sealing resin having a dimension with high precision.
Patent TW-534917-B (TW)
Title: Method of production of composited particle, composited particle produced by this method and aqueous dispersion for chemical mechanical polishing containing this composited particle, and its method of production
Inventor: NISHIMOTO KAZUO
IPC: H01L21/321
Filed: 2000-11-21
Granted: 2003-06-01
Abstract: An object of the present invention is to provide a method for producing a composited particle in which an inorganic particle is not released, a composited particle produced by this method, and an aqueous dispersion for CMP containing this composited particle. The method for producing a composited particle of the present invention comprises forming a preliminary particle by adhering one or more types of inorganic particles on at least a part of the surface area of a polymer particle, then, polycondensing at least one selected from among organosilicon compounds and organometal compounds in the presence of the above-mentioned preliminary particle. Another object of the present invention is to provide a method for producing an aqueous dispersion for CMP in which generation of a coagulates in production is prevented. In the method for producing an aqueous dispersion for CMP of the present invention, the pH of an aqueous dispersion containing polymer particles and inorganic particles having a zeta potential of the same sign as that of said polymer particles is so changed that the zeta potential of said polymer particles and the zeta potential of said inorganic particles are of opposite signs, to form composite particles composed of the said polymer particles and the said inorganic particles.
Patent TW-494020-B (TW)
Title: Cleaning solution for cleaning the surface of polysilicon film after chemical mechanical polishing
Inventor: LEI TIAN-FU
IPC: B08B3/00
Filed: 2000-12-14
Granted: 2002-07-11
Abstract: A cleaning solution for cleaning the surface of a polysilicon film after a chemical mechanical polishing (CMP) comprises adding a surfactant and a chelating agent into an alkaline dilute ammonia aqueous solution, in which the surfactant is used to increase the efficiency in particle removal, and the chelating agent is used to reduce the contamination of metal ions, thereby conspicuously increasing the quality of the oxidized silicon film on the polysilicon film.
Patent TW-478118-B (TW)
Title: High density design for organic chip carriers
Inventor: CARDEN TIMOTHY F
IPC: H05K1/18
Filed: 2000-12-27
Granted: 2002-03-01
Abstract: An organic integrated circuit chip carrier for high density integrated circuit chip attach, wherein the contact pads or microvias which provide electrical interconnections to external circuitry are located in a first array pattern, while the plated through holes or through-vias are located in a second array pattern. This allows utilization of wiring channels within the chip carrier in which signal wiring traces can be routed.
Patent TW-552245-B (TW)
Title: Alkali-free aluminoborosilicate glasses
Inventor: PEUCHERT ULRICH
IPC: C03C3/091
Filed: 2001-01-02
Granted: 2003-09-11
Abstract: The invention relates to an alkali-free alurninoborosi1icate glass having a coefficient of thermal expansion alpha20/300 of between 2.8x10<-6>/K and 3.8x10<-6>/K, which has the following composition (in % by weight, based on oxide): SiO2 > 58-65, B2O3 > 6-11.5, MgO 4-8, BaO 0- < 0.5, ZnO 0-2 and Al2O3 > 14-25, CaO 0-8, SrO 2.6- < 4, with BaO+SrO > 3, or Al2O3 > 14-25, CaO 0- < 2, SrO > 0.5- < 4, or Al2O3 > 21-25, CaO 0-8, SrO > 2.6- < 8, with BaO+SrO > 3, and which is highly suitable for use as a substrate glass both in display technology and in thin-film photovoltaics.
Patent TW-491937-B (TW)
Title: Method and device for measuring thickness of liquid crystal layer
Inventor: DOHI ATSUSHI
IPC: G02F1/13
Filed: 2001-01-31
Granted: 2002-06-21
Abstract: According to a method of measuring a thickness, to measure a thickness d of a liquid crystal layer 11, a property of reflected light is utilized, in that the light returns maintaining the same polarizing plane as that of an entrance when a polarizing plane-maintaining condition is satisfied in which a difference in optical path lengths between an ordinary ray and an extraordinary ray of the reflected light is a sum of an integer multiple of the wavelength and a half-wavelength or an integer multiple, to find a wavelength at which the polarizing plane-maintaining condition is satisfied. A reasonable Δn.d is thereby found. This is performed for a plurality of wavelengths to find a relational expression of a wavelength and Δn.d. A known combination of a wavelength λ and Δn is assigned to the relational expression to find d.