baber/WOPTO huggingface dataset:
Patent KR-20000061477-A (KR)
Title: Adder
Inventor: LEE JAE YEON
IPC: G06F7/50
Filed: 1999-03-26
Abstract: PURPOSE: An adder is provided to reduce a propagation delay of a carry by a simple logic and also reduce a critical path of a carry causing the propagation delay so that it can make a design easy and perform a data process with a high speed when implementing a 32, 64 or more bit adder. CONSTITUTION: An adder comprises a high carry adder(40), a low carry adder(41), the first multiplexer(42) and the second multiplexer(43). The high carry adder(40) receives a high-in carry input signal, adds two data at the same bit figure, and outputs an addition value and a carry. the low carry adder(41) receives a low-in carry input signal, adds two data at the same bit figure, and outputs an addition value and a carry. The first multiplexer(42) receives the addition values from the high carry adder(40) and the low carry adder(41), and multi-transmits them by the carry input signal. The second multiplexer also receives the addition values from the high carry adder(40) and the low carry adder(41), and multi-transmits them by the carry input signal.
Patent KR-20000065817-A (KR)
Inventor: HAN SANG WON
IPC: E01F15/00
Filed: 1999-04-09
Abstract: PURPOSE: A median strip of an impact suction equipment is provided to absorb an impact-induced injury stepwise in a collision of a vehicle by employing an impact suction equipment in a space of a round rail integral with a guide rail. CONSTITUTION: In a head-on or side collision of a vehicle to a median strip, a bumper of the vehicle hits the curved surface of a round rail. The impact is absorbed through an inner space portion depending on the impact degree of the round rail. The round rail is distorted during passing through an absorbing zone to reduce the impact force and pushed inward. The continuous impact force is transferred to a contact portion between shock absorbing bumpers(40,40') to be reduced secondarily. The secondary impact force is reduced suddenly by the shock absorbing bumpers(40,40') and a fine rest impact force is transferred to a post.
Patent KR-20000066058-A (KR)
Inventor: LEE JEONG YEOL
IPC: G11B7/125
Filed: 1999-04-13
Abstract: PURPOSE: A recording optical power regulating apparatus and method regulate a recording optical power value by ensuring an OPC(Optimum Power Control) region for regulating an optical power within a data region. CONSTITUTION: An optical recording medium has a test region for regulating a recording optical power between data sections within a data recording region. The test region exists between the front and rear synchronous data. A recording optical power regulating method of an optical recording medium comprises the steps of: searching a margin region adjacent to a data section recorded on the optical recording medium; recording an optional data on the searched margin region by changing recording optical power values; and replaying the data recorded on the margin region, and detecting an optimum recording optical power value from a characteristic of the replayed signal. A recording optical power regulating apparatus of an optical recording medium comprises a recording/replaying unit for recording and replaying data on the optical recording medium; a servo controlling unit for shifting the recording/replaying unit to a margin region adjacent to the data section recorded on the optical recording medium; and an optical power controlling unit for recording a test data on the margin region by changing optical power values, and thus detecting an optimum recording optical power value.
Patent KR-19990087944-A (KR)
IPC: A61K31/727
Filed: 1999-04-20
Abstract: 본 발명은 항혈전 특성을 갖는 양친성 헤파린 유도체, 그의 제조방법 및 용도에 관한 것이다.   보다 상세하게는 환자의 치료에 주사용 항혈전제로 널리 사용되고 있는 헤파린에 소수성 개질물질을 공유결합시켜, 헤파린을 양친성화시킴으로써 유기용매에 대한 용해도를 증가시키거나, 위장막 흡수를 증가시킨 양친성 헤파린 유도체, 그의 제조방법 및 용도에 관한 것이다. 
     본 발명에서는 이러한 양친성 헤파린 유도체를 제조하기 위하여, 인체에 영향을 주지 않는 소수성 개질물질을 헤파린과 화학적으로 공유결합시킨다. 
     이러한 헤파린 유도체는 혈액과 접촉하는 모든 의료기기 및 인공장기의 표면개질에 사용하는 서방형 항혈전제로 사용할 수 있고, 경구용 항혈전제로 사용할 수 있으며, 타약물의 경구투여를 가능케하는 경구용 약물전달매체로 사용할 수 있다.
Patent KR-19990064628-A (KR)
IPC: B25B27/00
Filed: 1999-04-21
Abstract: 본 발명은 호스와 커넥터를 결합시키는 장치에 관한 것으로서, 더욱 구체적으로는 유압, 또는 공압장치등에 사용되는 호스를 연결하기 위하여 호스의 단부에 끼워주는 커넥터를 용이하게 호스에 삽입할 수 있어서 설치작업효율을 높일 수 있으며 또한 내구성을 제고할 수 있는 호스와 커넥터의 결합장치에 관한 것이다. 
     본 발명의 호스-커넥터 결합장치는, 내측으로 반원형공간이 형성되고 상부측에는 고정핀(24a)에 의하여 회동가능하게 고정되며 걸림홈(22)이 형성된 고정로드(20)를 가지는 외측커버(24)와, 상기 외측커버(24)의 하부측에 회동가능하게 힌지연결핀(30a)에 의하여 결합되고 외측커버(24)의 반원형공간과 형합되어 호스를 수납하는 호스수납부(28)를 형성하는 반원형공간을 가지며 상부측에는 상기 고정로드(20)의 걸림홈(22)과 결합되는 것으로 고정돌기(16)에 의하여 고정되는 걸림봉(18)을 가지며 타단부가 굴곡진 형상으로 그 안에 홈(26a)이 형성된 내측커버(26)와, 호스의 내측에 결합되는 커넥터(42)를 수납하는 것으로 상하부표면에 핀(38)이 고정되고 내측커버(26)를 향하는 가이드핀(30)이 관통되는 커넥터지지대(34)와, 상기 커넥터지지대(34)를 수납하기 위하여 측면과 전면의 3면이 개방되고 상부측면에 상기 핀(38)이 삽설되어 이동하는 장공(40)이 형성되며 타단부측으로 연장되어서 상기 내측커버(26)의 홈(26a)을 관통하여 연장되고 고정부(14)에 의하여 회동가능하게 연결되는 지지대수납부(32)와, 상기 내측커버(26)의 연장단부와 지지대수납부(32)의 연장단부에 각각 결합되는 한 쌍의 손잡이(12)로 구성됨을 특징으로 한다.
Patent KR-19990073094-A (KR)
Title: 합병정화조
IPC: C02F3/28
Filed: 1999-05-03
Abstract: 본 발명은 분뇨와 생활 잡배수를 동시에 처리하는 고효율 오수 정화조인 합병 정화조에 관한 것으로, 
     유량조정부(ⅠA)와, 혐기부(ⅠB)로 이루어진 제1 반응조(Ⅰ); 상기 혐기부(ⅠB)의 하층액을 공급받는 무산소부(ⅡA)와, 상부와 하부에 각각 통로를 형성한 격벽(5)에 의해 상기 무산소부(ⅡA)와 인접하는 폭기부(ⅡB)로 이루어져, 오수의 내부 순환 경로를 형성하는 제2 반응조(Ⅱ); 및, 상기 폭기부(ⅡB)의 하층액을 공급받고, 상기 폭기부(ⅡB)와 연결된 상부 통로(T2)를 통해 폭기부(ⅡB)와 동일 수위를 유지하며, 하단 슬러지 농축부의 배출구가 상기 유량조정부(ⅠA)의 상부로 연결되고, 처리수 배출구(1b)를 형성한 제3 반응조(Ⅲ);를 포함하도록 구성됨으로써, 
     각 반응조들이 3차원적으로 배치되고, 특히 제2 반응조인 무산소부와 폭기부의 오수가 내부 순환될 수 있도록 하여 보다 소형화할 수 있으며 처리효율 또한 향상시킬 수 있다.
Patent KR-19990088256-A (KR)
Title: 임피던스조정회로를갖는ｄ／ａ변환기회로
IPC: H03M1/78
Filed: 1999-05-13
Abstract: R-2R D/A형 변환기에는 기준전압입력단자의 임피던스를 고정하기 위한 임피던스조정회로가 제공된다.  임피던스조정회로는 제어회로, 스위치들(Sb 1 -Sb 3 ), 저항들(Rc 1 -Rc 3 )을 포함한다.  제어회로는 데이타라인을 통해 수신된 데이타(D0-D3)에 근거하여 제어신호들(CTL0-CRL2)을 발생한다.  각각의 스위치들(Sb 1 -Sb 3 )의 일단은 그라운드(GND)에 연결되어 있고, 스위치들은 제어신호들(CTL0-CRL2)에 의해 온/오프 제어된다.
Patent KR-20000074273-A (KR)
Title: Cam switch for control circuit
Inventor: LEE HAN SIN
IPC: H01H19/63
Filed: 1999-05-19
Abstract: PURPOSE: A cam switch for a control circuit is provided to be useful for a mechanism having a motion angle except a particular angle and to reduce size by using several contact points having various angles with a single cam switch. CONSTITUTION: Plural cams(3) are mounted between upper/lower plates(1,2) and a cam shaft(4) interlocks with the cams(3) by penetrating there. Plural cam protrusions(3a) are formed on each cam(3) and teeth(3b) are provided around the circumference to assemble the cam protrusions(3a) at a desired angle of a mechanism. Toggle switches(5) are mounted under the cams(3) and each actuator(6) is located under the cam protrusions(3a). The toggle switches(5) are fixed between the plates(1,2) and plural an upper/a lower contacts(5a,5b) are mounted. The upper contact(5a) is contacted to open the lower contact(5b) when the actuator is not pressed. On the contrary, the upper contact is contacted and the lower contact is opened at the same time when the actuator is pressed.
Patent KR-20010001633-A (KR)
Inventor: LEE JONG HUN
IPC: G02B6/00
Filed: 1999-06-07
Abstract: PURPOSE: A face light source device is provided to maximize the optical efficiency of the face light source device by improving a structure of a prism unit group and maximizing the collecting efficiency of light. CONSTITUTION: A face light source device has a lamp(10) as a light source. Light from the lamp(10) is projected in a light incident plate(40) by reflecting from a reflecting plate(15a). A reflecting plate(50) and a diffusing plate(30) are formed in the light incident plate(40). A plastic light collecting plate(120) having a prism unit group(133) is arranged on the diffusing plate(30). The prism unit group(133) forms an oval curvature toward a wave-guided direction of light and an inclined face in the opposite direction. A vertical angle of the inclined face is formed under 20degrees. A refractive index of the light collecting plate is about 1.55 and a refractive index of the diffusing plate is about 1.
Patent KR-20010001914-A (KR)
Inventor: JUNG CHANG HUI
IPC: F24F13/08
Filed: 1999-06-09
Abstract: PURPOSE: A suction grille attachment/detachment structure is provided to prevent the suction grille from being damaged while allowing the suction grille to be easily attached/detached to/from the main body of air conditioner. CONSTITUTION: A structure comprises an installation base(11) installed beneath a main body(10) of air conditioner and which has a fixing groove(12) for insertion of a fixing portion(22) of a suction grille(20); a magnet(21) arranged at an upper inner surface of the suction grille to be attached to the left and right side surfaces of the main body of air conditioner; the fixing portion protruded from a lower end of the suction grille and which is inserted into the fixing groove of the installation base; and an iron member(15) arranged at a portion of the main body of air conditioner to correspond the magnet and which is coupled to the magnet. When the fixing portion of the suction grille is inserted to the installation base, and the top portion of the suction grille is moved toward the main body, an attraction is generated between the magnet attached to the suction grille and the iron member of the main body, thus maintaining the coupled state of the grille and the installation base.
Patent KR-20000006083-A (KR)
Title: Relief valve
Inventor: SAKAWA TOYOAKI
IPC: F16K17/06
Filed: 1999-06-10
Abstract: PURPOSE: A relief valve is provided to reduce the valid pressure receptive area, to prevent generation of the surge pressure, and to freely set up the pressure rise buffer time. CONSTITUTION: A relief valve comprises: a cylindrical case(1); a valve seat(2) fixed on the end of the case; a plunger(3) installed inside the case; a piston(4) installed inside the case; a coil spring(5) placed between the plunger and the piston; and a cap(6) fixed on the back end of the case.
Patent KR-20010003463-A (KR)
Inventor: LIM CHANG MUN
IPC: H01L21/311
Filed: 1999-06-23
Abstract: PURPOSE: A method for manufacturing a semiconductor device is provided to reduce the manufacturing cost of the semiconductor device by patterning a photoresist pattern with one etching process. CONSTITUTION: A material film having a relatively high reflection rate is formed on a semiconductor substrate(20). Then, the reflection rate of the material film is lowered by performing an amorphous process with respect to the surface of the material film. A photoresist pattern is formed on the amorphous material film. Then, the amorphous material film and the material film are etched such that the semiconductor substrate(20) is exposed by using the photoresist pattern as a mask. After that, the photoresist pattern is removed. The material film includes a nitride film(21).
Patent KR-20000011709-A (KR)
Inventor: CAHMBERRINTEEMOSISCHOT
IPC: H01L21/321
Filed: 1999-07-14
Abstract: PURPOSE: A slurry composition is provided which polishes a metal and silicon dioxide to same speed. CONSTITUTION: The slurry composition having pH 5- 11 comprises 0.2- 30 weight % of abrasive particles having 10- 10,000 nm size such as alumina, silica, zirconia, cerium oxide, titanium dioxide, ferric oxide and their compounds, and 1- 1,000 g/l of oxidizing agent such as potassium iodide, sodium iodide, cerium ammonium nitrate and potassium ferricyanate having a static etch rate of metal below 1,000 angstrom/hour, surfactant and ethylene oxide polymer, acrylic polymer, acrylamide polymer, vinyl alcohol polymer and their compounds more than one kind of polymer. An aqueous slurry contains organic diluent such as propylene carbonate, methanol, ethano, ethylene glycol, glycerol and their compounds.
Patent KR-20010010027-A (KR)
Inventor: LEE YUN SEONG
IPC: H01L21/76
Filed: 1999-07-15
Abstract: PURPOSE: A method for forming a trench isolation layer is provided to prevent a dent, generating between a trench isolation layer and an upper substrate. CONSTITUTION: A pad oxide layer(212) is formed on a semiconductor substrate(210). The first HTO(High temperature Oxide layer)(214), a silicon nitride layer, and an ARC(Anti-reflective Coating layer) are deposited by sequence on the pad oxide layer(212). By etching the ARC, the silicon nitride layer, and the first HTO(214), an opening is made. Using the ARC as a mask, the pad oxide layer(212) and the substrate(210) are etched, and a trench is built. An oxide layer(222) is vaporized inside of the substrate of the trench through a heat oxidization method. A liner(224) covers the whole substrate(210) including the trench. A trench isolation layer(226) is doped on the substrate(210) for filling up the trench. To expose the silicon nitride layer, the trench isolation layer(226), the liner(224), and the ARC are flattened by a CMP(Chemical Mechanical Polishing) method or a dry etch back step and the ARC is removed. Through a strip process, the silicon nitride layer and the liner are removed. When removing the liner, the liner is overetched and recessed, and a dent(D) is formed between the first HTO(214) and the trench isolation layer(226). The second HTO is vaporized on the whole substrate(210), and reclaims the dent(D). The second and the first HTO is erased with the dent(D) using a wet etch step.
Patent KR-20010010825-A (KR)
Inventor: KIM WON JU
IPC: H01L21/265
Filed: 1999-07-23
Abstract: PURPOSE: A uniformity control system of an ion beam is to prevent a process defective accident by sensing that the ion beam is moved to left and right edges of a wafer and rapidly stopping an operation of equipment when an X-scanning on entire surface of the wafer is impossible. CONSTITUTION: A system for controlling uniformity of an ion beam from an ion implantation device comprises: a scan plate(20) for X-scanning the ion beam; an acceleration column(30) for increasing an energy of the ion beam; a travelling faraday cup(40) for sensing the ion beam processed at the acceleration column at one side of a wafer(1); an ion beam sensor(70) for sensing the ion beam processed at the acceleration column at an opposite side of the wafer; and a dose integrator(41) for inputting the signal transmitted from the ion beam sensor and the travelling faraday cup and sensing an inflow amount of ion beam. The wafer is moved vertically by a linear motor(50) to Y-scan the ion beam on entire surface of the wafer.
Patent KR-20010011494-A (KR)
Inventor: KOO YEONG MO
IPC: H04N7/015
Filed: 1999-07-28
Abstract: PURPOSE: A receiving device of a digital TV is provided to use a four-level slicer in a channel equalizing process when reliability of a predicted value is high, after predicting a register value of a trellis coder in a transmitting side, and to use an eight-level slicer when the reliability of the predicted value is low, so as to minimize decision errors of slicers to prevent a deterioration of a signal to noise ratio(SNR), which is caused by a noise amplification of a feedback filter in a channel equalizer, even in a channel having a severe ghost, to improve the capacity of the channel equalizer. CONSTITUTION: A feed forward filter(74-1) attenuates the influence of a near ghost. A feedback filter(74-7) attenuates the influence of a remote ghost. An adder(74-2) adds an output of the feed forward filter(74-1) to an output of the feedback filter(74-7). The first to the third slicer(74-3-74-5) decide the added output of the adder(74-2) with a nearest signal level. A multiplexer(MUX)(74-6) selects one of outputs of the first to the third slicer(74-3-74-5) according to the output of a slicer predictor(75), and feeds back the selected output to the feedback filter(74-7).
Patent KR-20000017218-A (KR)
Inventor: WAILDASINE RICHARD E
IPC: A23L2/02
Filed: 1999-08-10
Abstract: PURPOSE: A continuos flowing method is provided for reducing the activity of microorganisms and/or enzymes in liquid product by using the pressurized carbon dioxide. CONSTITUTION: The method comprises: mixing the flow of pressurized liquid carbon dioxide and the flow of pressurized liquid product such as an orange juice at a temperature not freezing the liquid product; passing the mixture through a reaction section by the pressure of about 300-20000 psia for about 5 seconds to 30 minutes; reducing the pressure of the mixture to vaporizing liquid carbon dioxide; and heating the mixture at a temperature between the freeze point of the product and about 60°C for preventing the freeze of the liquid product due to the cooling of the carbon dioxide.
Patent KR-20010018961-A (KR)
Inventor: JUNG IN MO
IPC: A23G9/04
Filed: 1999-08-24
Abstract: PURPOSE: A method for preparing a kind of ice cream made from an aqueous solution of silk amino acid containing free amino acid and optionally milk fat is provided to serve high functional ice cream products promoting physical health of women and children. CONSTITUTION: The method includes the following steps: (i) removing sericin from silk fibroin protein; (ii) getting an aqueous solution of silk amino acid of pH 7 by adjusting concentration of the protein to 10 by adding 0.5N hydrochloric acid to the silk fibroin protein, hydrolyzing at 121deg.C for 4hr and adding 9M of sodium hydroxide to the protein; (iii) decolorizing and deodorizing the aqueous solution and passing the solution through an electric dialyzing device or a gel filtering device; (iv) mixing 0.5-2wt% of condensed solution of apple, 23-35wt% of raw cream, 9-12wt% of powdered nonfat milk, 5-13wt% of sugar, 4-7wt% of starch syrup, 0.2-0.6wt% of emulsion stabilizer, 0-2wt% of hydrous crystalline dextrose, 0-7wt% of oligosaccharide, 0-0.2wt% of spice, and refined water at 60-65deg.C for 20-40min; (iv) homogenizing and sterilizing the mixture at 85-90deg.C for 20-30sec before cooling; and then (v) adding 2-6wt% of the aqueous solution(18brix) to the mixture and aging at 2-6deg.C for 4-12 hr before freezing and increasing the quantity of the mixture of ice cream to a rate of 50-150%. The ice cream not containing milk fat comprises 5-2wt% of condensed solution of apple, 9-12% of coconut hardened oil, 9-12wt% of powdered nonfat milk, 5-13wt% of sugar, 4-7wt% of starch syrup, 0.2-0.6wt% of emulsion stabilizer, 0-2wt% of hydrous crystalline dextrose, 0-7wt% of oligosaccharide, 0-0.2wt% of spice, and refined water. The emulsion stabilizer includes 22.5% of guar gum, 19.5% of locust bean gum, 4.5% of carrageenan, 3.5% of Tamarind gum and 50% of Glycerin fatty acid ester.
Patent KR-20010027849-A (KR)
Inventor: AHN YONG CHEOL
IPC: H04L12/28
Filed: 1999-09-16
Abstract: PURPOSE: A method for implementing a home wireless communication network using a bluetooth is provided to set up one bluetooth module as a central controller, and to previously set up a protocol and a packet for controlling a wireless telephone and a remote controller, then to set up the protocol to the bluetooth module of home appliances using a remote controller. CONSTITUTION: A main controller(73) sets up one bluetooth module among home wireless terminals as a central controller, and previously sets up a protocol and a packet for controlling a wireless telephone and a remote controller, then performs a wireless telephone and a remote controller operation. The main controller(73) previously sets up the protocol to bluetooth modules of home appliances using a remote controller, and performs the remote controller operation according to the packet supplied from the central controller.
Patent KR-20010028157-A (KR)
Inventor: KIM YUN GI
IPC: C01F7/66
Filed: 1999-09-18
Abstract: PURPOSE: A method for preparing aluminum nitride by using plazma and a device therefor are provided which are able to form an aluminum nitride layer having more than several microns on the surface of the aluminum or an alloyed aluminum regardless of the presence of an aluminum oxide layer or non-nitrified aluminum materials. CONSTITUTION: The method comprises steps of: (i) after placing a sample to be nitrified in a chamber and making the chamber vacuum, pouring nitrogen gas into the chamber; (ii) applying voltage to the sample to form nitrogen plazma therearound and pouring the nitrogen ion into the inside of the sample to form aluminum nitride layer; (iii) after cutting off the voltage of the step (ii) and exhausting gas inside the chamber to make the chamber vacuum, pouring an inert gas into the chamber and heating the chamber to increase the temperature of the sample; (iv) applying voltage to the sample to form inert gas plazma around the sample and removing an aluminum oxide layer and non-nitrified aluminum material layer from the surface of the sample by sputtering action of the inert gas ion to expose the aluminum nitride layer; (v) after cutting off the voltage of the step (iv) and exhausting gas of the chamber to make the chamber vacuum, pouring nitrogen gas into the chamber and heating the chamber to increase the temperature of the sample to a plazma nitrification temperature; (vi) applying voltage to the sample to form nitrogen plazma around the sample and growing the aluminum nitride layer of the sample by diffusion of nitrogen atom by the nitrogen plazma; (vii) after growing the aluminum nitride layer of the sample to have a fixed thickness and cutting off the voltage applied to the sample, making the inside of the chamber vacuum; and (viii) pouring nitrogen gas into the inside of the chamber to cool the sample. The device for forming an aluminum nitride comprises: (i) a chamber(10); (ii) a negative plate(12); (iii) a negative plate supporting pole(14); (iv) a vacuum pump(20); (v) a pipe(22); (vi) a manometer(24); (vii) a pressure control valve(26); (viii) a hot wire(30); (ix) a gas supplying device(40); (x) a gas injecting tube(42); (xi) a cathode electrode(50); (xii) a high-voltage pulse direct current power source supplying device(52); (xiii) a low-voltage pulse direct current power source supplying device(54); (xiv) a cathode power source changing switch(56); (xv) a direct-contact type thermometer(62); (xvi) a temperature measuring device(62); (xvii) an rf power source supplying part(70); (xviii) an rf power source control part(72); (xix) an rf antenna(74); and (xx) an rf electrode(76).
Patent KR-20010028701-A (KR)
Inventor: KWON SEOK HYEONG
IPC: H04B7/26
Filed: 1999-09-22
Abstract: PURPOSE: A method for performing a handoff in a wireless communication system is provided to add a speech path according to a forward link signal, and to add, maintain or terminate the speech path according to a reverse link signal or a message of repeatedly requesting a connection of the speech path. CONSTITUTION: A base station receives a message requesting a handoff according to a signal received at a terminal(200) and adds another speech path according to the received message(210). The base station drives a timer for a termination to a previous speech path(220) and transmits an HDM(Hand-off Direction Message) to the terminal(230). If a traffic signal from the terminal is received through the added reverse speech path in a predetermined time, the previous speech path is terminated(240). If the traffic signal is not received, the previous speech path is maintained(240).
Patent KR-20010037007-A (KR)
Inventor: KOO JEONG HUN
IPC: H01L21/304
Filed: 1999-10-13
Abstract: PURPOSE: A method for processing a surface of a silicon wafer to measure resistivity is provided to eliminate the need to clean the silicon wafer by using deionized water after the first surface treatment, by using only one kind of chemicals. CONSTITUTION: A silicon wafer is prepared. Surfactant is firstly supplied to the surface of the silicon wafer so that the silicon wafer firstly reacts with the surfactant. The silicon wafer is dried. The surfactant is secondly supplied to the surface of the silicon wafer so that the silicon wafer secondly reacts with the surfactant. The surfactant remaining on the silicon wafer is eliminated.