Patent SG-11201906423Y-A (SG)
Title: Identifying process variations during product manufacture
Inventor: GRUNZWEIG TZAHI
IPC: H01L21/67
Filed: 2018-02-07
Abstract: r Controller 140 150 141 130 Focus Detector 03 1 -1 Polarizer Ring Aperture Field Stop 143 Analysis unit 100 — N o. 153 110 105 Camera 151 Spectrometer 127 127 123 128 124 > 7 136 137 135 Wafer I 103 FIG. 'IA 104 4 To imaging system (FIG. 1B) 1-1 00 (12) INTERNATIONAL APPLICATION PUBLISHED UNDER THE PATENT COOPERATION TREATY (PCT) (19) World Intellectual Property Organization International Bureau (43) International Publication Date 16 August 2018 (16.08.2018) WIP0 1 PCT ill~~~~~~~~ 0111111010VIIIOH olo DID mil mum ono iflo oimIE (10) International Publication Number WO 2018/148318 Al (51) International Patent Classification: H01L 21/02 (2006.01) HOlL 21/67 (2006.01) (21) International Application Number: PCT/US2018/017273 (22) International Filing Date: 07 February 2018 (07.02.2018) (25) Filing Language: English (26) Publication Language: English (30) Priority Data: 62/457,781 10 February 2017 (10.02.2017) US 62/591,088 27 November 2017 (27.11.2017) US (71) Applicant: KLA-TENCOR CORPORATION [US/US]; Legal Department, One Technology Drive, Milpitas, Cali- fornia 95035 (US). (72) Inventors: GRUNZWEIG, Tzahi; 203 NE 55th Avenue, Hillsboro, Oregon 97124 (US). GUTMAN, Nadav; 11 Dror Unit 12, 3091784 Zichron Ya'agov (IL). STANIU- NAS, Claire E.; 2461 Falls Street, Forest Grove, Ore- gon 97116 (US). MARCIANO, Tal; Yaar Odem 32/10, 2069200 Yokneam (IL). SHUALL, Nimrod; 10773 SW Heron Circle, Beaverton, Oregon 97007 (US). (74) Agent: MCANDREWS, Kevin et al.; KLA-TENCOR CORPORATION, Legal Department, One Technology Dri- ve, Milpitas, California 95035 (US). (81) Designated States (unless otherwise indicated, for every kind of national protection available): AE, AG, AL, AM, AO, AT, AU, AZ, BA, BB, BG, BH, BN, BR, BW, BY, BZ, CA, CH, CL, CN, CO, CR, CU, CZ, DE, DJ, DK, DM, DO, DZ, EC, EE, EG, ES, FI, GB, GD, GE, GH, GM, GT, HN, HR, HU, ID, IL, IN, IR, IS, JO, JP, KE, KG, KH, KN, KP, KR, KW, KZ, LA, LC, LK, LR, LS, LU, LY, MA, MD, ME, (54) Title: IDENTIFYING PROCESS VARIATIONS DURING PRODUCT MANUFACTURE (57) : Systems and method are presented for identifying process variations during manufacture of products such as semicon- ductor wafers. At a predetermined stage during manufacture of a first products, images of an area of the first product are obtained using different values of at least one imaging parameter. The images are then analyzed to generate a first contrast signature for said first product indicating variations of contrast with said at least one imaging parameter. At the same predetermined stage during manufacture of a second product, images of an area of said second product are obtained corresponding to said area of said first product using different values of said at least one imaging parameter. The images are analyzed to generate a second contrast signature for said second product indicating variations of contrast with said at least one imaging parameter. The first and second contrast signatures are compared to identify whether a variation in process occurred between manufacture of said first and second products. [Continued on next page] WO 2018/148318 Al MIDEDIMOMOIDEIREEMOMOIOHIMMIOMMOIMEN MG, MK, MN, MW, MX, MY, MZ, NA, NG, NI, NO, NZ, OM, PA, PE, PG, PH, PL, PT, QA, RO, RS, RU, RW, SA, SC, SD, SE, SG, SK, SL, SM, ST, SV, SY, TH, TJ, TM, TN, TR, TT, TZ, UA, UG, US, UZ, VC, VN, ZA, ZM, ZW. (84) Designated States (unless otherwise indicated, for every kind of regional protection available): ARIPO (BW, GH, GM, KE, LR, LS, MW, MZ, NA, RW, SD, SL, ST, SZ, TZ, UG, ZM, ZW), Eurasian (AM, AZ, BY, KG, KZ, RU, TJ, TM), European (AL, AT, BE, BG, CH, CY, CZ, DE, DK, EE, ES, FI, FR, GB, GR, HR, HU, IE, IS, IT, LT, LU, LV, MC, MK, MT, NL, NO, PL, PT, RO, RS, SE, SI, SK, SM, TR), OAPI (BF, BJ, CF, CG, CI, CM, GA, GN, GQ, GW, KM, ML, MR, NE, SN, TD, TG). Published: — with international search report (Art. 21(3))