baber/WOPTO huggingface dataset:
Patent JP-H01192950-A (JP)
Title: Resin composition and building materials
Inventor: YOSHITANI SHOICHI
IPC: C08L29/04
Filed: 1988-01-29
Abstract: PURPOSE:To obtain such building materials that can keep the humidity in a room about constant by mixing a specific weight percentage of mineral system filler provided with fine holes having an absorption action into olefin vinyl alcohol copolymerization resin. CONSTITUTION:5-200weight% of mineral system filler provided with fine holes having an absorption action is mixed into 100weight% of olefin vinyl alcohol copolymerization resin to form resin composition. The resin composition has high mechanical strength and moisture absorption - and discharge efficiency. Accordingly, when it is used as building materials, water content is discharged in case indoor humidity is low, water content is absorbed in case indoor humidity is high, and a room temperature is kept about constant to improve living environment.
Patent JP-H02202524-A (JP)
Title: Silicone polymer containing fluoroalkyl group and production thereof
Inventor: SAWADA HIDEO
IPC: C08G77/48
Filed: 1989-01-31
Abstract: PURPOSE:To obtain a silicone polymer containing fluoroalkyl group, expressed by a specific structural formula, having excellent water and oil repellency and suitable as an electrically conductive material, resist material, etc.. by reacting a specific di(haloacyl) peroxide with a specific silicone polymer. CONSTITUTION:The objective silicone polymer containing fluoroalkyl group, having a polymerization degree of 2-1,000 and expressed by the structural formula III (R1 is H, 1-4C alkyl, phenyl or group of formula IV) can be produced easily in a short time by reacting a di(haloacyl) peroxide if formula I (X is H, F or Cl; n is 1-10) with a silicone polymer of formula II (R2 is H, 1-4C alkyl or phenyl) having a polymerization degree of 2-1,000 preferably in a solvent (e.g. 1,1,2-trichlorotrifluoroethane) under normal pressure at 0-100 deg.C for 3-10hr.
Patent JP-H07227770-A (JP)
Title: Catch adaptor
Inventor: TOMINAGA AKITO
IPC: B25B23/10
Filed: 1994-02-17
Abstract: PURPOSE:To greatly improve the operability of a driver, etc., by holding a screw, etc., by a proper holding force without needing any burdenwsome operation at the time of tightening or loosening operation of the driver, etc. CONSTITUTION:A cylindrical catch adaptor 10 made of plastic is provided with a connecting cylinder 12 and a holding cylinder 14. The connecting cylinder 12 is provided with a fitting cylindrical hole 12a having a diameter almost the same as the outer diameter of a driver tip part 15a and the holding cylinder 14 is provided with a screw holding cylindrical hole 14a having a diameter almost same as the maximum outer diameter of a screw head part. A small diameter part 17 and a tapered part 18 are formed between the connecting cylinder 12 and the holding cylinder 14. At the time of operating the driver, the screw head part is fitted into the holding cylinder 14 and the screw is held. When the catch adaptor 10 is manufactured, a cylindrical body made of plastic such as nylon and the like having a specified length is formed, the driver tip part and the screw head part are fitted in the specified positions of the cylindrical hole of this cylindrical body and shaped by heat.
Patent JP-S58137612-A (JP)
Title: Main bearing structure of v-type engine
Inventor: KIKUCHI KAZUHIRO
IPC: F02B75/22
Filed: 1982-02-10
Abstract: PURPOSE:To prevent the swinging movement of a bearing cap and also to prevent generation of noise by connecting a plurality of bearing caps to each other by a pair of beam members provided to be positioned on the extension of the cylinder centerline. CONSTITUTION:A plurality of bearing caps 4 are connected to each other by a pair of beam members provided to be positioned on the extension of the cylinder centerline (l). According to this construction, each bearing cap 4 is decreased of its quantity of deformation in the longitudinal direction of the main bearing part and in the torsional direction around the crank shaft 5 in a state where the each bearing cap 4 is clamped to a bulkhead 2 by means of a bolt 3. Particularly, since the beam 6 is provided to be positioned on the extension of the cylinder centerline (l), deformation in the vicinity of the main bearing against the combustion impact effected from the slant direction of the bolt 3 along the centerline (l) is suppressed, and the engine noise is reduced.
Patent JP-S62179113-A (JP)
Title: Manufacture of semiconductor device and equipment therefor
Inventor: ISHII HITOSHI
IPC: H01L21/205
Filed: 1986-02-03
Abstract: PURPOSE:To selectively deposit a Ge layer successively by a method wherein, after a treatment has been performed using the gas composed of Ge and H, layers are processed with the gas composed of Ge and halogen, and H2 gas. CONSTITUTION:After the first Ge thin layer has been formed by performing only a simple cleaning of a substrate using hydrofluoric acid or by performing a process using the GeH4 gas with which the Ge layer can be selectively formed, the second Ge layer is formed on the first Ge layer by performing a process using GeCl4 gas and H2 gas. To be more precise, said layers are placed in a CVD (chemical vapor deposition) reaction furnace in which GeH4 gas, GeCl4 gas and H2 gas can be introduced, a treatment is performed at the substrate temperature of 450 deg.C or below in a GeH4 gas atmosphere, and the first Ge layer 13 is formed on the exposed surface only of an Si substrate 11. Subsequently, the second Ge layer 14 is formed on the surface of the first Ge layer 13 by peforming a treatment in the atmosphere of GeCl4 gas and H2 gas.
Patent JP-H06237198-A (JP)
Title: Inverse phase synthesis prevention circuit in sd system
Inventor: WAKUI TOSHIKAZU
IPC: H04Q9/00
Filed: 1993-02-09
Abstract: PURPOSE:To provide the inverse phase synthesis prevention circuit at a low cost with a simple and small sized circuit scale with respect to the inverse phase synthesis prevention circuit in the in-phase synthesis system for SD reception in radio communication. CONSTITUTION:The circuit is provided with a voltage generating circuit 1 generating a prescribed voltage V larger than a detection voltage (Vdi=Vd+ or -DELTAV) regarded to be an in-phase state or an opposite phase state at an output of a phase difference detection circuit 10 interlocked when the operating mode of a control section 22 generating a control signal C by an in-phase synthesis control circuit 20 is switched from the manual operation into the automatic operation (SW-1), and the generated voltage V is inputted to a window comparator 21 of the in-phase synthesis control circuit 20 in place of a detected output Vdi of the phase difference detection circuit 10 and an output of the comparator 21 is fed to a control section 22 driving an endless phase shifter 30 for time T sufficient for the conversion of automatic control via a time constant comprising C, R.
Patent JP-H08211455-A (JP)
Title: Finder device
Inventor: OCHIAI KAZUTAKA
IPC: G03B13/12
Filed: 1995-02-08
Abstract: PURPOSE: To eliminate the variable power of a finder image by release by making a finder cam transmitting the movement of a lens barrel to a finder lens have a cam surface different between a zooming part and a focusing part. CONSTITUTION: The cam surfaces 13a to 13b of a finder lever 13 orderly abut on a guide pin 12a implanted on a lens barrel cover 12, and the movement of the entire lens barrel is transmitted so that the finder lever 13 performs rotation. In the focusing area of step zoom, the lens barrel cover 12 is actuated in a range being a wide focusing cam 13a, a middle 1st focusing cam 13c, a middle 2nd focusing cam 13e and a tele-focusing cam 13g, but the finder lever 13 is not rotated even when the lens barrel performs focusing action. Then, in the zooming area of step zoom, the lens barrel cover 12 is actuated in the range being a wide zooming cam 13b, a middle zooming cam 13d and a tele- zooming cam 13f, and the finder lever 13 performs the rotation in accordance with the lift amount of each zoom.
Patent JP-H03227978-A (JP)
Title: Pyrimidine derivative, preparation thereof and herbicide containing the same
Inventor: TAKEMATSU TETSUO
IPC: C07D239/48
Filed: 1990-02-01
Abstract: NEW MATERIAL:A compound of formula I [R<1> is a group of formula II (X<1> is H, halogen, 1-4C alkyl, 1-4C alkoxy, 1-4C alkylthio, 1-4C haloalkyl; m is 1-5), or formula III(X<2> is X<1>; n is 1-4; Z is O,S); R<2> is halogen, 1-4C alkyl, 1-4C haloalkyl]. EXAMPLE:2-Amino-6-(3',5'-dimethylphenoxy-1-methyl-ethylamino)-4- trifluorvemethyl pyridine. USE:A herbicide. Useful as a highly selective herbicide not having any chemical injury against rice. PREPARATION:An amine compound of formula: R<1>-NH2 is reacted with an aminohalogenopyrimidine of formula IV (X<3> is halogen) in the presence of a dehydrohalogenation agent (e.g. NaOH or KOH) to provide the compound of formula I.
Patent JP-H10224237-A (JP)
Title: Radio transmitter
Inventor: ARAI SATOSHI
IPC: H04B1/04
Filed: 1997-02-03
Abstract: PROBLEM TO BE SOLVED: To reduce higher harmonic spurious and direct current offset without attenuating a signal of a desired frequency by providing a filter that eliminates a higher harmonic component from a signal that is subject to orthogonal modulation and a direct current interrupting means that eliminates a direct current component. SOLUTION: In a radio transmitter, which transmits an intermediate frequency signal that is undergone orthogonal modulation of a baseband signal by an orthogonal modulator 20 with an up converter 60, a 1st LPF 40 suppresses higher harmonic spurious signal from a signal that is subject to orthogonal modulation. Next, a direct current interrupting part 50 which interrupts direct current offset is provided. The part 50, whose that is connected between emitters of a pair of transistors of a voltage-current converting part of a buffer that is provided on a preceding stage of an up converter 60 is at 0Hz and whose pole exists between 0Hz and fIF, is an impedance element or a circuit. This interrupts a direct current component that has zero point and acquires a desired frequency characteristic, which has a gain in fIF neighborhood together with the LPF 40.
Patent JP-S58136356-A (JP)
Inventor: MATSUSHITA YASUHISA
IPC: A61J1/05
Filed: 1982-02-08
Abstract: (57)【要約】本公報は電子出願前の出願データであるた め要約のデータは記録されません。
Patent JP-H09197750-A (JP)
Title: Image forming device
Inventor: TSURUYA SATOSHI
IPC: G03G21/00
Filed: 1996-01-12
Abstract: PROBLEM TO BE SOLVED: To excellently recover toner remaining on an intermediate transfer body after a secondary transfer, to solve such broblem that the number of output sheet in a specified time is reduced at the time of consecutively forming images as well and further, to dispense with a waste toner container attached to the intermediate transfer body. SOLUTION: A rotatable temporary toner recovering member 120 is disposed so that it is able to freely come into contact/to be separated from an intermediate transfer body 105 at a position of the downstream side from a secondary transfer part and the upstream side from a primary transfer part. After the transfer is started, the recovering member 120 starts to come into contact with the image region of the intermediate transfer body 105 and simultaneously, an electric field in the direction of recovering the toner is applied between the recovering member 120 and the transfer body 105, to recover the toner remaining in the image region, after the secondary transfer, onto the recovering member 120.  After the secondary transfer is completed, the electric field in the direction of discharging the toner is applied between the recovering member 120 and the transfer body 105, to discharge the recovered toner from the recovering member 120 to the transfer body 105, the contact of the recovering member 120 with it is released and simultaneously, the application of the electric field is stopped so that the discharged toner is returend to a photoreceptor drum 101 by the potential difference between the transfer body 105 and the drum 101, to be captured and recovered by the cleaning means of the drum 101.
Patent JP-S62179158-A (JP)
Title: Manufacture of mis-type semiconductor device
Inventor: MORIYAMA ICHIRO
IPC: H01L29/78
Filed: 1986-01-31
Abstract: PURPOSE:To facilitate the manufacture by a method wherein, after a gate electrode, a gate insulation film and a semiconductor film are formed first on a substrate, a positive-type resist is applied by coating on the upper side of the substrate with the gate electrode used as a mask, and then the resist is exposed to light from the back side to form a resist pattern identical with the gate electrode. CONSTITUTION:After a molybdenum gate electrode 2 is patterned on a quartz substrate 1, a gate silicon oxide film 3 corresponding to a gate insulation film and a polycrystalline silicon film 4 are formed, and then a part of the polycrystalline silicon film 4 corresponding to an element region is patterned. After a positive-type resist is applied subsequently, exposure to light is executed from the back side of the substrate. On the occasion, the exposure is so made that no light goes through the molybdenum gate electrode 2. Next, the positive- type resist film 5 is patterned by developing the substrate, then phosphorus is introduced with this film used as a mask, and lastly the positive-type resist is exfoliated. In this way, an N-channel MOS-type semiconductor device having the molybdenum gate electrode in the lower part can be manufactured.
Patent JP-S52105184-A (JP)
Title: Novel morpholine derivatives
Inventor: KOJIMA YOSHIYUKI
IPC: C07D413/06
Filed: 1976-02-26
Abstract: PURPOSE: Morpholine derivatives I (R 1  is H or lower alkyl; R 2  is H, lower alkyl, lower alkenyl or aryl-lower-alkyl, etc.; A is lower alkylene; B is -CH 2 CH 2 -, -CH=CH-, etc.; C 1  and C 2  are 1,2-phenylene or substituted 1,2phenylene; D-E-is >CH-CH 2 -or >C=CH-), e.g. 5-(4benzylmorphorine-2-yl)methylidene-10,11-dihydro-5H-dibenzo [a,d] cycloheptene. 
     COPYRIGHT: (C)1977,JPO&Japio
Patent JP-H10223501-A (JP)
Title: Method of forming resist pattern and manufacture of semiconductor integrated circuit
Inventor: ONOZUKA TOSHIHIKO
IPC: G03F7/039
Filed: 1997-02-03
Abstract: PROBLEM TO BE SOLVED: To provide a technique for forming a highly accurate pattern on a semiconductor wafer, using a chemical amplification type reactive resist. SOLUTION: Immediately after exposing a chemical amplification type reactive resist 2 applied to a semiconductor wafer 1, the wafer is left in a vacuum so as to have a residual resist solvent 9 diffused which is contained in this resist 2 in the thickness direction of the resist 2. The wafer 1 is baked at a low temp. of 90 deg.C or less to minimize the lateral diffusion of a catalyst 4, thereby reacting the catalyst 4. This improves the resolution of the reactive type resist 2.
Patent JP-S58138035-A (JP)
Title: Semiconductor device and manufacture thereof
Inventor: FUJIMOTO YOSHIHARU
IPC: H01L21/322
Filed: 1982-02-12
Abstract: PURPOSE:To eliminate the leak current and thus obtain easily a semiconductor device which captures impurity ions and has less leak current by a method wherein a polycrystalline Si layer is provided on the back surface, then a polycrystalline Si layer is adhered on the back surface, and thereafter a high temperature heat treatment is performed. CONSTITUTION:The numeral 1 repersents a semiconductor substrate, 2 an element forming surface, and 3 the polycrystalline Si layer formed on the back surface of the semiconductor substrate. The polycrystalline Si layer can be formed by a various kind of method. This polycrystalline Si layer is formed in contact with the Si substrate directly. It is desired that the thicknes thereof is a thickness whereon a polycrystalline Si layer remains at the stage that the element process is finished. E.g., if a polycrystalline Si layer of 5-10mum is formed on the back surface before the element formation, the polycrystalline Si layer keeps the gettering function to the last without being entirely consumed, e.g. even in a process for the element of a structure wherein a thick oxide film in an oxidation resisting mask is buried, and therefore a semiconductor device agreed with the desired purpose can be formed.
Patent JP-H1081069-A (JP)
Title: Optical recording medium
Inventor: KADOTA ATSUSHI
IPC: G11B7/249
Filed: 1997-01-20
Abstract: PROBLEM TO BE SOLVED: To realize excellent light resistance and highly sensitive and favorable record reproducing characteristics by a method wherein a recording layer containing specified azo-metal complex-based coloring matter is provided. SOLUTION: A recording layer contains azo metal-complex-based coloring matter obtained by reacting azo compound represented by the formula with metal compound. In the formula, Q1 represents a group of atoms necessary for the formation of an aromatic ring together with two carbon atoms, Z represents a group having active hydrogen, A represents carbon atom or heteroatom, Q2 represents a group of a atoms necessary for the formation of an aromatic ring together with two carbon atoms and A, Q3 represents a group of atoms necessary for the formation of an aromatic ring together with carbon atom, nitrogen atom and A and the aromatic ring completed by Q2 and the aromatic ring completed by Q3 from condensed rings. As a result, excellent characteristics such as high recording sensitivity and small jitter and the like are realized.
Patent JP-S62179398-A (JP)
Title: Production of beta-urogastrone
Inventor: OKAI HIDEO
IPC: C07K14/485
Filed: 1986-01-31
Abstract: PURPOSE:To discharge beta-urogastrone to the outside of mold and to collect it readily, by cultivating Escherichia coil which is transformed with a beta- urogastrone secretion and manifestation type vector. CONSTITUTION:A vector containing a DNA base sequence to code fused polypeptide wherein a DNA base sequence to code signal peptide is directly bonded to a DNA base sequence to code beta-urogastrone is formed and Escherichia coli is transformed with it. Plasmid pUG201 can be used as a vector. The vector is transduced into Escherichia coli HB101 strain. The plasmid pUG201 containing strain is deposited as HB101[pUG201] with Fermentation Research Institute (RERMBP-681).
Patent JP-H07229597-A (JP)
Title: Membrane structure for low temperature tank
Inventor: NISHIOKA NOBUYUKI
IPC: B65D90/06
Filed: 1994-02-18
Abstract: PURPOSE:To shorten a term of works and to improve fatigue strength and reliability by greatly reducing the length of a welding line and using a bent-up rib lap joint. CONSTITUTION:In a low temperature tank storing low temperature liquid, multi- groove rib sheets l, in each of which lateral bent-up ribs 16 are formed in plural rows by process of bending in a single long plate, bent ribs 2, in each of which a bent-up rib 16 is arranged in the lateral direction and U-shaped notch parts are arranged in the central parts of both upper and lower side parts, bent-up rib sheets 3, in each of which the bent-up rib 16 is arranged in the vertical direction and triangular notch parts are arranged in both right and left side parts, and triangular connection pieces 4, in each of which the bent-up rib 16 is arranged in the lateral direction, are assembled so that a grid bent-up rib 16 is formed.
Patent JP-H10216581-A (JP)
Title: Speed sprayer
Inventor: TAKIZAWA OSAMU
IPC: A01M7/00
Filed: 1997-02-04
Abstract: PROBLEM TO BE SOLVED: To prevent the adhesion of a chemical liquid on a cabin window, improve visual recognition properties and make the operation of a speed sprayer easy by using a cabin type speed sprayer. SOLUTION: In a speed sprayer with a cabin 10 formed on a main body front section, a water jet section 28 for cleaning a glass face by jetting water onto the glass face following the reciprocating movement of a wiper 16 is formed on the wiper 16 provided on a window of the cabin 10, and a recovery gutter 24 for recovering water jetted from the above wiper 16 is formed on the lower section of the above window and the water recovered by the recovery section is jetted again out of the above jet section 28.
Patent JP-H09210387-A (JP)
Title: Indoor far infrared heater
Inventor: YADA HAJIME
IPC: F24D15/00
Filed: 1996-02-07
Abstract: PROBLEM TO BE SOLVED: To make it possible to immediately warm by heat beam only by turning ON a switch by obliquely disposing a far infrared panel heater at a ceiling by using the heater as a heating source. SOLUTION: When a far infrared panel heater is installed on a ceiling in a room to radiation heat in the room, the heater is obliquely disposed on the ceiling surface. A triangular protrusion formed of central far infrared panels 1, 2 at the center in the room is constituted so that the center of the room can be sufficiently radiation heated by the heater. Corner far infrared panels 3, 4 are obliquely disposed at the corners in the room so that the directions are directed toward the center of the room. The panels 1, 3 disposed at the center of the room are also obliquely disposed, and both the panels 1, 2 are obliquely disposed back to back.
Patent JP-H01196856-A (JP)
Title: Formation of bump for semiconductor device
Inventor: HARADA SHIGEKI
IPC: H01L21/301
Filed: 1988-02-02
Abstract: PURPOSE:To prevent the warpage of a semiconductor wafer, and to facilitate the mask alignment of a mask for forming a bump by parting and shaping a film composed of a high molecular compound in the greater part of regions except a partial region on a dicing line. CONSTITUTION:A film 4 consisting of a high molecular compound is shaped onto a semiconductor wafer 1 on which an electrode 2 and a surface stabilizing film 3 are formed. The film 4 is patterned by using a first mask having a crossed type pattern and a pattern shaped. An opening 5 is formed in a region corresponding to the electrode 2 in the film 4. The film 4 is gotten rid of, and a trench 19 is shaped. A metallic film 6 is formed, and a high molecular compound film 7 is shaped. The film 7 is patterned by employing a second mask having a crossed pattern and a pattern formed. An opening 11 is shaped to a resist film 10, and a bump 12 is formed brought into contact with a barrier metallic film 9 through plating, using the film 10 as a mask. Accordingly, the mask alignment of a mask for forming the bump is facilitated.
Patent JP-S56117630-A (JP)
Title: Filling machine for foaming resin
Inventor: INA FUMIO
IPC: B29C31/00
Filed: 1980-02-21
Abstract: PURPOSE:To make possible miniaturization by providing the internal diameter of the nose of an internal cylinder with a slight clearance left against a receded plunger and making the rear end of a cylindrical space, communicate with a resin heads feed input and the front end with a jet nozzle respectively. CONSTITUTION:Foam resin beads filling machine is installed running through a mold vapor chamber 26 with the former's jet nozzle 23 fitted into a feedstock feed inlet on a mold 27. An air is discharged from an air feed and discharge port 12 and a compressed air is fed through the air feed and discharge port. The compressed air flows into a narrow clearance expanded part 15, retroceding a piston 13. If the piston 13 retroceded as fat as it could, the compressed air spews toward the jet nozzle 23 from a narrow clearance 28 through a narrow clearance 18. This jet stream creates a negative pressure inside a cylindrical spece 19, causing resin beads to be sucked in, entrained by air. Then the said beads find their way into a mold 27 from the jet nozzle 23 after passing through a bead feed port 16 and a cylindrical space 9. When this feed is completed, the air feed and discharge port 12 is switched to an air discharge position, and at the same time, air is fed from the air feed and discharge port 12. Following this process, the piston 13 moves forward and the plunger 22 closes the jet nozzle.