baber/WOPTO huggingface dataset:
Patent JP-H03145673-A (JP)
Title: Developing device
Inventor: SAITOU MITSUNAGA
IPC: G03G15/08
Filed: 1989-10-31
Abstract: PURPOSE:To obtain images of a high density which are distinct in the line images and are uniform in the solid images by incorporating a coupling agent and conductive fillers into the outer peripheral surface of a developing roller. CONSTITUTION:The coupling agent incorporated together with the conductive fillers into the surface of the developing roller is expressed by formula I. In the formula I, M denotes Si, Ti, Zr, Cr, P, Al, etc.; RX denotes a group having a hydrolyzing or condensing property, such as alkoxy group or acetoxy; R' denotes a hydrocarbon group which is substd. by NH2-; m and n demote 1 to 3 integer. An effective charge is applied to a toner in this way and the outputting of the sharp line images and the uniform solid images is possible.
Patent JP-H01128984-A (JP)
Title: Fluorane compound and coloring recording material using the same
Inventor: KAWAI HAJIME
IPC: C09B11/24
Filed: 1987-11-12
Abstract: NEW MATERIAL:A compound of formula I [R<1>, R<2> are halogen, 1-8C alkyl which may be substituted with alkoxy, 3-8C alkenyl, 5-7C cycloalkyl, furfuryl, tetrahydrofurfuryl, benzyl which may be substituted, phenyl which may be substituted, R<1> and R<2> may incorporate to form a heterocyclic ring]. EXAMPLE:2-(2',6,-Dimethylanilino)-6-diethylaminofluorane. USE:A color developer for color-developing recording materials. PREPARATION:A m-amophenol derivative of formula II is allowed to react with phthalic anhydride to give 2-(4-amino-2-hydroxy)benzoylbenzoic acid derivative of formula III. Then, the product is subjected to the condensation reaction with a diphenylamine derivative of formula IV (R is H, alkyl) such as 4- hydroxy-2',6'-dimethylphenylamine using a dehydrating agent such as sulfuric acid or chlorosulphonic acid.
Patent JP-H08148306-A (JP)
Title: Overcurrent protective element
Inventor: NAKAGAWA SHIRO
IPC: H01C7/02
Filed: 1994-11-21
Abstract: PURPOSE: To obtain a small-sized inexpensive protective element by arranging a conductive material, principally comprising a conductive polymer compound containing a dopant, between electrodes. CONSTITUTION: A pair of electrodes 2a, 2b, arranged on an insulating substrate 1, is connected with a conductive material 3 principally comprising a conductive polymer compound containing a dopant to form a thick film which is covered with a moisture-proof material 4, as required. The electrodes 2a, 2b are then connected with a terminal electrode 5. The protective element is fixed then with an electrode 7 for external connection extending from the upper side toward the side part of the terminal electrode 5 thence to the lower part of the board 1. This structure realizes a small-sized inexpensive protective element having low constant resistance which contributes to the safety of electronic apparatus trending toward significant size reduction.
Patent JP-H04160462-A (JP)
Title: Information processor
Inventor: YAMAGUCHI MASAHIKO
IPC: G06F15/02
Filed: 1990-10-23
Abstract: PURPOSE:To display a display screen corresponding to the current situation by associating the display contents of the information processor with the display contents of another device. CONSTITUTION:For example, when the display screen of A moves to an 8th page, the A sends a predetermined code to B - D with an infrared-ray signal to inform them that the display contents of the A move to the 8th page. A microcomputer 4 searches the memory in a part 4 for the contents of the 8th page in response to the signal received from a communication line 5 and displays the contents. When the contents are not stored on the memory in the part 4, the contents are read out of an IC card 3 and displayed.
Patent JP-H09104533-A (JP)
Title: Continuous powder supply device
Inventor: YAMAGUCHI HIROMI
IPC: B65G65/48
Filed: 1995-10-06
Abstract: PROBLEM TO BE SOLVED: To provide a continuous powder supply device in which disorder in transfer of powdery and granular material by high pressure air is eliminated, in which powdery and granular material can be uniformly and smoothly supplied from a discharge port of a storage room, and in which supply quantity precision is high. SOLUTION: Discharge chambers opened in bottom surfaces are continuously provided at a lower part of a storage room 1 to be communicated with a discharge port 2 of it, powdery and granular material supply plates 5 forming a powdery and granular material containing tanks are provided between blades 6 along its outer circumference, and an air release chamber 15 is provided before a discharge chamber 3 of a circular powdery and granular material carrying passage formed of the grain supply plates 5.
Patent JP-H04164120-A (JP)
Title: Initial setting method for opening/closing phase of rotary valve
Inventor: NAKAI HIDEO
IPC: F02B25/20
Filed: 1990-10-24
Abstract: PURPOSE:To simplify initial setting when phase control of a rotary valve is started by mounting the supporting shaft of the rotary on a phase variable mechanism under such condition as fixing the rotary valve to a housing by means of a pin for stopping rotation. CONSTITUTION:At the time of initial setting, a pin 18 for stopping rotation is inserted from a positioning hole 16A formed on a housing 16 into the positioning hole 3B of a rotary valve 3 so as to fix the rotary valve 3 to the housing 16. The supporting shaft 3A of the rotary valve 3 in this condition is mounted on a coupling which is mounted on the rotary shaft of an output gear 10 in a phase variable mechanism 5. When the phase variable mechanism 5 and the rotary valve 3 are integrated through the coupling, a valve which is read by the throttle sensor in the phase variable mechanism 5 is outputted to a control unit 15. It is thus possible to simplify initial setting for opening/ closing phase of the rotary valve 3.
Patent JP-H04160834-A (JP)
Title: Channel fault motice method in lan
Inventor: KUMETA YASUO
IPC: H04L12/40
Filed: 1990-10-24
Abstract: PURPOSE:To surely detect a fault group by storing information (number of times) representing occurrence of the fault group for a preset and revisable fault monitor time and counting number of times of occurrence of the fault group within the time. CONSTITUTION:The system realizing the method is provided with a receiver 1, a P fault group detection section 2 detecting a permanent (P) fault, a T fault group detection section 3 detecting a tentative (T) fault, a T fault group counter 4 and a T fault group timer 5, and also, latch circuits A6a, A6b storing respectively the occurrence of a fault, an OR circuit 7 ORing the outputs and outputting a channel fault signal C when the result is true, and a transmission line 8. Then information representing occurrence of a T fault group is stored for a preset fault monitor time able to be revised and the fault state is discriminated on the condition that the fault takes place for the revisable number of times or over. Thus, not only the P fault group but also the T fault group is surely detected.
Patent JP-2000110641-A (JP)
Title: Device for controlling fuel injection at starting internal combustion engine
Inventor: OTAKE YUKIO
IPC: F02D41/04
Filed: 1998-10-08
Abstract: PROBLEM TO BE SOLVED: To adjust a fuel injection amount to an appropriate amount at the time of starting without the necessity of the manual operation by an operator in a device for controlling fuel injection at starting an internal combustion engine. SOLUTION: This fuel injection control device 40 is equipped with a fuel metering mechanism 22, a bypass passage 58 bypassing the fuel metering mechanism 22 and a bypass control valve 60 arranged in the bypass passage 58. The fuel metering mechanism 22 delivers a fuel amount matched with an intake air amount to a flow divider 18 and ejects fuel from each injection nozzle 14. When an internal combustion engine is started, the bypass control valve 60 is opened to an opening according to a head temperature T and an engine speed NE, so that a fuel injection amount is increased.
Patent JP-H04160305-A (JP)
Title: Parallelism measuring apparatus
Inventor: YUMOTO HIDEAKI
IPC: G01B11/26
Filed: 1990-10-23
Abstract: PURPOSE:To arrange a parallel object and a perpendicular face correctly at right angles to each other thereby to measure the parallelism with high accuracy and in a simple manner by mounting a laser light emitter and a semiconductor position detector or a reflecting prism to the parallel object as a reference and the perpendicular surface. CONSTITUTION:A perpendicular face 8 is arranged at right angles to a parallel object 1 as a reference. A laser light emitter 5a and a semiconductor position detector 5b or a reflecting prism 9 are mounted on the perpendicular face 8, or the parallel object 1 or the other parallel object 2 as an object to be measured. The laser light emitted from 5a is reflected by the prism 9, and brought into the detector 5b, so that the position of the incident laser light is detected. In this case, if the positional relationship between the emitter 5a fixed at a predetermined position and the incident laser light is not changed all over the length of the parallel object 1 and at a plurality of points of the perpendicular surface 8, it is confirmed that the parallel object 1 is at right angles to the perpendicular face 8. Likewise, the perpendicularity of the face 8 to the parallel object 2 is measured. The parallelism of the parallel objects 1 and 2 can be measured highly accurately and simply based on the perpendicularity.
Patent JP-H04164123-A (JP)
Title: Two-step supercharger of engine for vehicle
Inventor: INOUE TETSUKAZU
IPC: F02B37/00
Filed: 1990-10-24
Abstract: PURPOSE:To prevent interference caused by confluence of exhaust gas by allowing exhaust gas flows discharged to both exhaust systems to make a confluent flow in series to both exhaust turbines at the time of a low speed and a low load and on the other hand, by allowing them to flow in parallel and individually at the time of a high speed and a high load. CONSTITUTION:Exhaust systems 15, 17 for discharging exhaust gas supplied from a plurality of cylinders of an engine while dividing the same exhaust gas into two system lines, and two turbochargers 9, 7 in which turbine units 33, 41 are positioned individually in the exhaust systems 15, 17, are provided. Communicating passages 31, 23 and control valves 45, 47, 37, 39 are provided in both exhaust systems 15, 17. Opening/closing operations of the control valves 45, 47, 37, 39 are controlled by a control circuit 49 so as to make exhaust gas discharged to both exhaust 15, 17 to be confluent in series to both turbine units 33, 41 at the time of a low speed and a low load and on the other hand, to flow individually in parallel at the time of high speed and a high load. It is thus possible to prevent fault in which function reduction of the turbo chargers 9, 7 may take place by interference following confluence of exhaust gas at the time of high speed.
Patent JP-S63142178-A (JP)
Inventor: TAKEMURA YUKITO
IPC: B60J5/00
Filed: 1986-12-02
Abstract: (57)【要約】本公報は電子出願前の出願データであるた め要約のデータは記録されません。
Patent JP-H11204530-A (JP)
Title: Semiconductor element and preventing method of crack generated in insulating layer of semiconductor element
Inventor: HAN SEONG KIM
IPC: H01L23/498
Filed: 1998-10-09
Abstract: PROBLEM TO BE SOLVED: To prevent the generation of cracks in a CVD film of an insulating layer by improving the layout of multiple metal layers by arranging the space between respective metal wiring patterns formed at respective metal layers, so that the spaces are deviated for the respective metal layers respectively. SOLUTION: This semiconductor element is of a structure, wherein a first metal layer 21, a second metal layer 22 and a third metal layer 23 are insulated by insulating layers 24, 25 and 26 and laminated. The respective metal wiring patterns are overlapped and arranged so that a space d2 between a metal pattern 27 and a metal wiring pattern 27' formed on the respective metal layers and a space d2 between a metal wiring 28 and a metal wiring 28' are deviated. Thus, the laminated stress of the metal wiring patterns and the cracks of a CVD film due to thermal expansion and shrinkage can be prevented. In this case, it is preferable that the respective metal wiring patterns are respectively separated, so that the interval between the respective metal wiring patterns becomes about 4 μm or more.
Patent JP-H09122410-A (JP)
Title: Dust removing device for waterway
Inventor: KAMIYA YASUSHI
IPC: E02B9/02
Filed: 1995-11-06
Abstract: PROBLEM TO BE SOLVED: To control simply the release, backwash and the like in compliance with respective situations such as the passage of water, stop of water and the like by providing strainers in respective branch pipes and setting sluice valves in front and rear of respective strainers in a waterway consisting of two branch pipes or more and communication pipes communicating with the branch pipes respectively. SOLUTION: Water flowed from a one side main pipe 111 is introduced into a branch pipe 3 and a strainer 6 by blocking, for instance, a sluice valve 7, and flowed down to the other side main pipe 112 through a communicating pipe 4. Then a sluice valve 8 is blocked to introduce water flowed from the one side main pipe 111 into a branch pipe 2 and a strainer 5, passed through the communicating pipe 4 and flowed down to the other side main pipe 112. Then a sluice valve 9 is opened to discharge the water and foreign matters having flowed through the branch pipe 2 and the strainer 5 out of an opening 12 to the outside, while a sluice valve 10 is opened to discharge the water and foreign matters having flowed through the branch pipe 3 and the strainer 6 out of an opening 13 to the outside.
Patent JP-S63140535-A (JP)
Title: Dry etching method of metal silicide
Inventor: KUSAKABE KENJI
IPC: H01L21/3065
Filed: 1986-12-01
Abstract: PURPOSE:To allow chemical reaction only progress without generating reactive sputtering and nonreactive sputtering, and reduce the mechanical damage to metal silicide, by making silicon dioxide and hydrogen fluoride formed on the surface of metal silicide react repeatedly to produce volatile silicon tetrafluoride, and to remove the produced silicon tetrafluoride. CONSTITUTION:When molybdenum silicide wafer u is arranged in a reaction tube, and the atmosphere temperature in the tube is made, for example, higher than or equal to 650 deg.C, the molybdenum silicide is oxidized and molybdenum trioxide is produced, which is immediately sublimated. On the surface of molybdenum silicide after sublimation, a film of silicon dioxide is formed. Then the silicon dioxide and hydrogen fluoride supplied via a gas supply inlet Ii react with each other, and water and silicon tetrafluoride having high volatile property are produced. This silicon tetrafluoride immediately volatilizes, and the etching of silicon dioxide coating film progresses. After that, this process is repeated and molybdenum silicide is gradually subjected to etching.
Patent JP-2001110533-A (JP)
Title: Electric connector
Inventor: MIZUNO MASAHIKO
IPC: H01R24/00
Filed: 1999-10-07
Abstract: PROBLEM TO BE SOLVED: To reduce excessive insertion force generated when the two housings, accommodating many connection terminals, are fit in together. SOLUTION: First, 6 connection terminals 13, 19 are inserted and insertion force F reaches a peak value of Fm=3.9 Kgf. When the peak goes down to Fr=2.54 Kgf, 10 connection terminals 13', 19' are inserted and the insertion force F reaches a peak value Fm=3.5 Kgf. When the peak value Fm goes down to Fr=2.28 Kgf, 6 connection terminals 13', 19' are inserted and the insertion force F reaches a maximum value of Fm=2.1 Kgf. The above structure can make a maximum insertion force about 73% of the one in the configuration where the insertion force F becomes maximum at the same time.
Patent JP-S62147461-A (JP)
Title: Image recorder
Inventor: TANIGUCHI ISAO
IPC: G03C1/00
Filed: 1985-12-20
Abstract: PURPOSE:To realize automation by providing a heat developing device which hardens and fixes a part corresponding to a latent image formed on a photosensitive pressure- sensitive development material and a transfer device which superposes an image receiving material on the photosensitive pressure-sensitive development material after development and pressing them. CONSTITUTION:A heat developing device 40 is arranged in front of an exposure sensitive material support roll 26, a guide device 54 which guides a photosensitive material S sent from the exposure sensitive support roll 26 onto a heat roll 44 and separates the photosensitive material S from the heat roll 44 after heat development and a vertical guide device 58 which guides the developed photosensitive material S sent by a support roll 49 and a nip roll 52 to an exist 56 are provided, and a photosensitive material front end detection sensor 60 is provided at the exit 56. An image receiving paper feed device 72 is arranged by a photosensitive material and image receiving paper superposing device 70 and the image receiving paper C is about 6mm smaller in width than the photosensitive material S and superposed by the photosensitive material and image receiving paper superposing device 70 so that the image receiving paper C is in the breadthwise center of the photosensitive material S. A transfer device 88 is provided under the photosensitive material and image receiving paper superposing device 70.
Patent JP-H01160959-A (JP)
Title: 4-formylaminopiperidine derivative, its use as stabilizer and orgnaic material stabilized thereby
Inventor: AREKISANDAA AUMIYURAA
IPC: C08K5/34
Filed: 1988-11-14
Abstract: NEW MATERIAL: A compound expressed by formula I ((n) is 1 or 2;  1 - 4  are each 1-4C alkyl, R 1  and R 2 , R 3  and R 4  together form tetramethylene, pentamethylene; R 5  is H a 1-4C alkyl; R 6  is H, 1-22C alkyl, 3-22C alkenyl, phenylalkyl, alkanoyl, cyanoalkyl, hydroxyalkyl, etc.; when (n) is 1, Y is H, alkyl, alkenyl, phenyl, etc., and when (n) is 2, Y alkylene, phenylalkylene, phenylene, etc.), and its acid addition salt.  
     EXAMPLE: 4-(Formylamino)-2,2,6,6-tetramethylpiperidine.  
     USE: Stabilizer for organic polymer.  
     PREPARATION: A compound of formula I is obtained by allowing the compound of formula II to react with formic acid or formate in the presence of or non-existence of catalyst (preferably, ortho-titanic acid butylester). 
     COPYRIGHT: (C)1989,JPO
Patent JP-S62147475-A (JP)
Title: Polishing material for electrophotographic sensitive body and its production
Inventor: YOSHITOMI TOSHIHIKO
IPC: G03G21/00
Filed: 1985-12-20
Abstract: PURPOSE:To prevent the image flow of an amorphous silicon electrophotographic sensitive body under high humidity and to improve the printing resistance thereof by carrying a polishing material which induces a slid phase reaction with the surface material of the a-Si photo sensitive body on a base. CONSTITUTION:The release agent is coated on the inside surface of a cylindrical metallic mold and a degreased stainless steel round bar 1 is fixed to the axial central part of the mold. The prepd. stock of an urethane foam is poured into the mold and after the mold is closed, the stock is made to foam in the mold by which the urethane foam 2 is coated on the outside circumference of the bar 1. 190g Barium carbonate and 218g methyl ethyl ketone are shaken and uniformly dispersed in 25g 40% soln. of toluene:cyclohexanone=1:1 (by weight) of a thermoplastic urethane elastomer by a paint dispersing machine using glass beads. The polishing powder dispersion of BaCO3 is uniformly impregnated on the surface layer of the roll-shaped foam and the solvent is forcibly dried and removed to form the roll-shaped abrasive material. The abrasive material extremely effective for the image flow of the a-Si photosensitive body is thus obtd.
Patent JP-H11104536-A (JP)
Title: Marking device
Inventor: MATSUMOTO KENJI
IPC: B05B15/04
Filed: 1997-10-06
Abstract: PROBLEM TO BE SOLVED: To provide an on-demand type paint marking device which is free of clogging of a nozzle. SOLUTION: The on-demand type paint marking device is provided with a sealing member 12 for sealing a wall 4 and a plunger 8 to each other in the central part in the longitudinal direction of the plunger 8. A washing liquid passage 13 which runs the center of the plunger 8 from an opening 13' existing on the circumferential surface of the plunger part nearer the other end side than the sealing member 12 and penetrates the plunger 8 to a valve center exists at the plunger 8. A washing liquid chamber 14 which houses the plunger part on the other end side having the opening 13' exists therein. The passage 6 is closed after the paint is ejected and, thereafter, the washing liquid is forcibly fed through the washing liquid passage 13 to the nozzle 5, by which the nozzle 5 is washed.
Patent JP-H05129594-A (JP)
Title: Manufacture of semiconductor device
Inventor: AYUKAWA AKITSU
IPC: H01L29/78
Filed: 1991-11-01
Abstract: PURPOSE:To prevent generation of a crystal defect and to improve the yield by forming by the steps of first heat treating parts to become source and drain regions by ion implanting an impurity, forming a bit line and second heat treating it. CONSTITUTION:An SiO2 film is deposited on a silicon substrate 1 and a gate electrode 3, and a sidewall 4 made of SiO2 is formed on the electrode 3. A first heat treatment is conducted so as to ion implant an impurity in source and drain regions on the electrode 3 and the substrate 1 through a polysilicon 6 and to diffuse the impurity. Further, a WSi film 9 is formed on the polysilicon 6 to form a bit line 10. Then, a second heat treatment is conducted to oxidize tungsten. Thus, a crystal defect such as a stacking fault defect, etc., can be prevented, and the line 10 of a low resistance can be simultaneously formed.
Patent JP-H06177120-A (JP)
Title: Deposition of interlayer dielectric film
Inventor: GOCHO TETSUO
IPC: H01L21/316
Filed: 1992-10-27
Abstract: PURPOSE:To deposite an interlayer dielectric film having gettering function of Na by depositing undoped SiO2 using an organic metal compound, adsorbing the dopant into the undoped SiO2, and repeating the steps a plurality of times thereby embedding a level difference part of wiring having high aspect ratio without producing any void. CONSTITUTION:Undoped SiO2 is deposited on a substrate having level difference by atmospheric pressure O3/TEOS-CVD and doping gas (pH3) 14 is fed on the undoped SiO2 13 to be absorbed therein. This step is repeated a plurality of times. Heat treatment is then carried out in N2 atmosphere thus obtaining a flat interlayer dielectric film uniformly diffused with dopant. This method prevents open circuit of wiring to enhance reliability of wiring and since an interlayer dielectric film having gettering function of Na can be deposited, device characteristics such as transistor characteristics can be prevented from deteriorating.
Patent JP-2000114667-A (JP)
Title: Superlattice structure and semiconductor laser device
Inventor: OBUCHI MARI
IPC: H01S5/34
Filed: 1998-10-09
Abstract: PROBLEM TO BE SOLVED: To improve the transition possibility by laminating one or more Si1-XCX atom layers (x is compsn. ratio of C) and one or more Si atom layers so that the atom layer number per period is a specified multiple. SOLUTION: A superlattice structure is formed on a Si substrate having the orientation (111) and composed of alternately laminated one or more Si1-XCX atom layers 22 (x is compsn. ratio of C) and one or more Si atom layers 24, so that four multiples of layers contained in the atom layers 22, 24 in total are constituted as one period. The compsn. ratio of C of the Si1-XCX atom layer 22 is approximately 0.25 or approximately 0.0625 and it forms a hexagonal lattice. Owing to the zone holding effect of the energy band, the bottom of the valence band can be aligned with a specified point to improve the transition possibility.