Patent SG-11201804232Q-A (SG)
Title: Methods and patterning devices and apparatuses for measuring focus performance of a lithographic apparatus, device manufacturing method
Inventor: HINNEN PAUL
IPC: G03F7/20
Filed: 2016-12-06
Abstract: INTERNATIONAL APPLICATION PUBLISHED UNDER THE PATENT COOPERATION TREATY (PCT) (19) World Intellectual Property Organization International Bureau (10) International Publication Number (43) International Publication Date WO 2017/108395 Al 29 June 2017 (29.06.2017) WIPO I PCT 11111111111111011011111111111010111110 III 0101111111111011111111111111111111110111111 41 y--416 (51) International Patent Classification: GO3F 7/20 (2006.01) (21) International Application Number: PCT/EP2016/079948 (22) International Filing Date: 6 December 2016 (06.12.2016) (25) Filing Language: English (26) Publication Language: English (30) Priority Data: 15201611.9 21 December 2015 (21.12.2015) EP (71) Applicant: ASML NETHERLANDS B.V. [NL/NL]; P.O. Box 324, 5500 AH Veldhoven (NL). (72) Inventors: HINNEN, Paul, Christiaan; P.O. Box 324, 5500 AH Veldhoven (NL). MATHIJSSEN, Simon, Gijs- bert, Josephus; P.O. Box 324, 5500 AH Veldhoven (NL). GOOSEN, Maikel, Robert; P.O. Box 324, 5500 AH Veldhoven (NL). VAN DER SCHAAR, Maurits; P.O. Box 324, 5500 AH Veldhoven (NL). DEN BOEF, Arie, Jeffrey; P.O. Box 324, 5500 AH Veldhoven (NL). (74) Agent: BROEKEN, Petrus; P.O. Box 324, 5500 AH Veldhoven (NL). (81) Designated States (unless otherwise indicated, for every kind of national protection available): AE, AG, AL, AM, AO, AT, AU, AZ, BA, BB, BG, BH, BN, BR, BW, BY, BZ, CA, CH, CL, CN, CO, CR, CU, CZ, DE, DJ, DK, DM, DO, DZ, EC, EE, EG, ES, FI, GB, GD, GE, GH, GM, GT, HN, HR, HU, ID, IL, IN, IR, IS, JP, KE, KG, KN, KP, KR, KW, KZ, LA, LC, LK, LR, LS, LU, LY, MA, MD, ME, MG, MK, MN, MW, MX, MY, MZ, NA, NG, NI, NO, NZ, OM, PA, PE, PG, PH, PL, PT, QA, RO, RS, RU, RW, SA, SC, SD, SE, SG, SK, SL, SM, ST, SV, SY, TH, TJ, TM, TN, TR, TT, TZ, UA, UG, US, UZ, VC, VN, ZA, ZM, ZW. (84) Designated States (unless otherwise indicated, for every kind of regional protection available): ARIPO (BW, GH, GM, KE, LR, LS, MW, MZ, NA, RW, SD, SL, ST, SZ, TZ, UG, ZM, ZW), Eurasian (AM, AZ, BY, KG, KZ, RU, TJ, TM), European (AL, AT, BE, BG, CH, CY, CZ, DE, DK, EE, ES, FI, FR, GB, GR, HR, HU, IE, IS, IT, LT, LU, LV, MC, MK, MT, NL, NO, PL, PT, RO, RS, SE, SI, SK, SM, TR), OAPI (BF, BJ, CF, CG, CI, CM, GA, GN, GQ, GW, KM, ML, MR, NE, SN, TD, TG). [Continued on next page] (54) Title: METHODS AND PATTERNING DEVICES AND APPARATUSES FOR MEASURING FOCUS PERFORMANCE OF A LITHOGRAPHIC APPARATUS, DEVICE MANUFACTURING METHOD (57) : A lithographic apparatus (LA) prints product features and at least one focus metrology pattern (T) on a substrate. The focus metrology pattern is defined by a reflective reticle and printing is performed using EUV radiation (404) incident at an oblique angle (0). The focus metrology pattern 406 comprises a periodic array of groups of first features (422). A spacing (SI) 404 between adjacent groups of first features is much greater than a dimension 402 (CD) of the first features within each group. Due to the oblique illumination, the printed first features become distorted and/or displaced as a function of 416-- ) _._ focus error. Second features 424 may be provided as a reference against which displacement of the first features may be seen. Measurement of this 414 410 408 distortion and/or displacement may be by measuring asymmetry as a prop - erty of the printed pattern. Measurement can be done at longer wavelengths, for example in the range 350-800 nm. W O 20 17 / 108395 Al SO Fig. 4 WO 2017/108395 Al MIDEDIMOMMION0101301011MBIMERVOIMIE Published: — with international search report (Art. 21(3))