Patent SG-11201901731W-A (SG)
Title: Endpoint detection algorithm for atomic layer etching (ale)
Inventor: CHEN YAN
IPC: H01L21/66
Filed: 2017-08-31
Abstract: INTERNATIONAL APPLICATION PUBLISHED UNDER THE PATENT COOPERATION TREATY (PCT) (19) World Intellectual Property 111111111111111111111010111 0111110111111H011111111111011111011H1111111111110111111 Organization International Bureau (10) International Publication Number (43) International Publication Date .....0 WO 2018/045197 Al 08 March 2018 (08.03.2018) W I PO I PCT (51) International Patent Classification: Nuez Common, Fremont, California 94539 (US). FERNS, HO1L 21/66 (2006.01) H01L 21/3065 (2006.01) Jason; 842 Nisqually Drive, Sunnyvale, California 94087 (21) International Application Number: (US). PCT/US2017/049663 (74) Agent: MITROVIC, Andrej; Tokyo Electron U.S. Hold- ings, Inc., 2400 Grove Blvd., Austin, Texas 78741 (US). (22) International Filing Date: 31 August 2017 (31.08.2017) (81) Designated States (unless otherwise indicated, for every (25) Filing Language: English kind of national protection available): AE, AG, AL, AM, AO, AT, AU, AZ, BA, BB, BG, BH, BN, BR, BW, BY, BZ, (26) Publication Language: English CA, CH, CL, CN, CO, CR, CU, CZ, DE, DJ, DK, DM, DO, (30) Priority Data: DZ, EC, EE, EG, ES, FI, GB, GD, GE, GH, GM, GT, HN, 62/382,904 02 September 2016 (02.09.2016) US HR, HU, ID, IL, IN, IR, IS, JO, JP, KE, KG, KH, KN, KP, KR, KW, KZ, LA, LC, LK, LR, LS, LU, LY, MA, MD, ME, (71) Applicant: TOKYO ELECTRON LIMITED [JP/JP]; MG, MK, MN, MW, MX, MY, MZ, NA, NG, NI, NO, NZ, Akasaka Biz Tower, 3-1 Akasaka 5-chome, Minato-ku, OM, PA, PE, PG, PH, PL, PT, QA, RO, RS, RU, RW, SA, Tokyo 107-6325 (JP). SC, SD, SE, SG, SK, SL, SM, ST, SV, SY, TH, TJ, TM, TN, TR, TT, TZ, UA, UG, US, UZ, VC, VN, ZA, ZM, ZW. (71) Applicant (for JP only): TOKYO ELECTRON U.S. HOLDINGS, INC. [US/US]; 2400 Grove Boulevard, (84) Designated States (unless otherwise indicated, for every Austin, Texas 78741 (US). kind of regional protection available): ARIPO (BW, GH, GM, KE, LR, LS, MW, MZ, NA, RW, SD, SL, ST, SZ, TZ, (72) Inventors: CHEN, Yan; 10600 S Foothill Blvd., Cuperti- UG, ZM, ZW), Eurasian (AM, AZ, BY, KG, KZ, RU, TJ, — no, California 95014 (US). TIAN, Xinkang; 43788 Paso = = (54) Title: ENDPOINT DETECTION 300 = Intensity = = = = = 302 = = = _ = _ = 306-2 306-4 I 1 ALGORITHM FOR 304-2 304-4 % ATOMIC — — 1 LAYER ETCHING (ALE) 304-n 308 312 .., ... 1, ........ rt .. 310 Time (sec) 11 306-n Ir ---- 0'1 ,-, FIG. 3 kr) 71' (57) : Described herein are architectures, platforms and methods for determining endpoints of an optical emission spectroscopy © - ---- GC (OES) data acquired from a plasma processing system. The OES data, for example, includes an absorption - step process, a desorption - step process, or a combination thereof. In this example, the OES data undergoes signal synchronization and transient signal filtering © prior to endpoint determination, which may be implemented through an application of a moving average filter. ei C [Continued on next page] WO 2018/045197 Al MIDEDIMOMOIDEIREEMOOVIVIDEOHMOHnin TM), European (AL, AT, BE, BG, CH, CY, CZ, DE, DK, EE, ES, FI, FR, GB, GR, HR, HU, IE, IS, IT, LT, LU, LV, MC, MK, MT, NL, NO, PL, PT, RO, RS, SE, SI, TR), OAPI (BF, BJ, CF, CG, CI, CM, GA, GN, SK, SM, GQ, GW, KM, ML, MR, NE, SN, TD, TG). Published: — with international search report (Art. 21(3))