baber/WOPTO huggingface dataset:
Patent TW-417197-B (TW)
Title: Wafer retainer and method for attaching/detaching the wafer retainer to/from polishing machine base plate
Inventor: KAWAHARA SHINICHIRO
IPC: C09J7/26
Filed: 1999-08-27
Granted: 2001-01-01
Abstract: A wafer retainer includes: a foam layer capable of adsorbing a wafer on a surface thereof in a detachable manner; a first pressure-sensitive adhesive layer formed on a back face of the foam layer; a support formed on a back face of the first pressure-sensitive adhesive layer; a second pressure-sensitive adhesive layer formed on a back face of the support for adhering to a base plate of a polishing machine; and a release sheet releasably attached to the second pressure-sensitive adhesive layer. The second pressure-sensitive adhesive layer includes an adhesive composition. The adhesive composition contains a pressure-sensitive adhesive and a side-chain crystallizable polymer so that the side-chain crystallizable polymer is present in an amount of about 1% to about 30% by weight based on the adhesive composition. The side-chain crystallizable polymer includes as a main component thereof an acrylic acid ester and/or methacrylic acid ester which has a straight-chain alkyl group including 16 or more carbon atoms as a side-chain.
Patent TW-467742-B (TW)
Title: Backrest cushion for use with a massaging apparatus and chair-type massaging apparatus
Inventor: INADA NICHIMU
IPC: A61H15/00
Filed: 1999-09-03
Granted: 2001-12-11
Abstract: The present invention provides a backrest cushion for use with a massaging apparatus, and a chair-type massaging apparatus. The backrest cushion includes cushioning portions capable of receiving the back of a user prior to massaging elements of a massaging apparatus at least opposite lateral sides of the massaging elements.
Patent TW-434604-B (TW)
Title: Supercapacitor structure and method of making same
Inventor: AMATUCCI GLENN G
IPC: H01G9/155
Filed: 1999-09-23
Granted: 2001-05-16
Abstract: Supercapacitor cell electrode and separator elements formulated as membranes of plasticized polymers matrix compositions are laminated with electrically conductive current collector elements to form flexible, unitary supercapacitor structures. The matrix plasticizer component is extracted from the laminate with polymer-inert solvent and replaced with electrolyte solution to activate the supercapacitor. Various arrangements of cell structure elements provide parallel and series cell structures which yield improved specific energy capacity and increased voltage output for utilization demands. The supercapacitor elements may also be laminated with similar polymeric rechargeable battery cell structures to provide hybrid devices capable of delivering both high energy and high power as needed in electronic systems.
Patent TW-432115-B (TW)
Title: Hyper-eutectic Al-Si alloy cast tube and method for making the same
Inventor: LIU CHUAN-SHENG
IPC: C22C21/02
Filed: 1999-10-01
Granted: 2001-05-01
Abstract: The present invention provides a hyper-eutectic Al-Si alloy cast tube and a method for making the same. The method comprises using a centrifugal casting method and a hyper-eutectic Al-Si alloy containing 15-40 wt% of Si at a suitable casting temperature and a spindle rotation speed to produce the abovementioned hyper-eutectic Al-Si alloy cast tube. The metallographic structure of the cast tube at a radial cross section, from the outer surface of the cast tube to the inner surface, essentially comprises the following four regions: (1) a hyper-eutectic solidification structure region including a coarse primary silicon and coarse needle-shaped eutectic silicon; (2) an eutectic solidification structure region including smaller needle-shaped eutectic silicon; (3) a hypo-eutectic solidification structure region including Α Al and needle-shaped eutectic Si; and (4) a three-phase mixture solidification structure region including Α Al, smaller primary silicon and coarser and larger eutectic silicon.
Patent TW-448500-B (TW)
Title: Method for patterning thin film
Inventor: MACHIDA MASAHIKO
IPC: H01L27/12
Filed: 1999-12-22
Granted: 2001-08-01
Abstract: The invented method for patterning thin film, which is used for patterning a thin film deposited on a substrate according to a pattern layer arranged on said thin film, is composed of the following steps. The first step is to dip the substrate in the first solution in order to etch thin film based on the pattern layer. The second step is to spread the second solution which has the same composition as the etching solution used in the third step on the thin film of substrate for cleaning the substrate. And, the third step is to dip the substrate in the third solution for further etching off the thin film.
Patent TW-452703-B (TW)
Title: A system, method and article of manufacture for a simulation enabled accounting tutorial system
Inventor: ZORBA ALEXANDER
IPC: G09B7/04
Filed: 1999-12-22
Granted: 2001-09-01
Abstract: A system is disclosed that provides a goal based learning system utilizing a rule based expert training system to provide a cognitive educational experience. The system provides the user with a simulated environment that presents a business opportunity to understand and solve optimally. Mistakes are noted and remedial educational material presented dynamically to build the necessary skills that a user requires for success in the business endeavor. The system utilizes an artificial intelligence engine driving individualized and dynamic feedback with synchronized video and graphics used to simulate real-world environment and interactions. Multiple ""correct"" answers are integrated into the learning system to allow individualized learning experiences in which navigation through the system is at a pace controlled by the learner. A robust business model provides support for realistic activities and allows a user to experience real world consequences for their actions and decisions and entails realtime decision-making and synthesis of the educational material. An accounting tutorial system is enabled for providing active coaching on aspects of cost accounting including debit and credit processing, procedures for closing books, appropriate management of ledgers, assets and liabilities utilizing a t-account motif. Techniques for process sensitive help are also integrated into the system to provide contextual examples to guide a user in performing a task.
Patent TW-I269791-B (TW)
Title: omega-carboxyaryl substituted diphenyl ureas as raf kinase inhibitors
Inventor: KHIRE UDAY
IPC: C07C275/22
Filed: 2000-04-07
Granted: 2007-01-01
Abstract: This invention relates to the use of a group of aryl ureas in treating raf mediated diseases, and pharmaceutical compositions for use in such therapy.
Patent TW-464989-B (TW)
Title: Method of electrolytically forming conductor structures from highly pure copper when producing integrated circuits
Inventor: MEYER HEINRICH
IPC: C25D5/18
Filed: 2000-01-19
Granted: 2001-11-21
Abstract: The invention relates to a method of electrolytically forming conductor structures from highly pure copper on surfaces of semiconductor substrates (wafers) 1, which surfaces are provided with recesses 2, when producing integrated circuits. The method includes the following method steps: a. coating the surfaces of the semiconductor substrates 1, which are provided with the recesses 2, with a full-surface basic metal layer in order to achieve sufficient conductance for the electrolytic deposition; b. full-surface deposition of copper layers 3, of uniform layer thickness, on the basic metal layer by an electrolytic metal deposition method by bringing the semiconductor substrates into contact with a copper deposition bath, the copper deposition bath containing at least one copper ion source, at least one additive compound for controlling the physico-mechanical properties of the copper layers as well as Fe(II) and/or Fe(III) compounds, and an electric voltage being applied between the semiconductor substrates and dimensionally stable counter-electrodes, which are insoluble in the bath and are brought into contact therewith, so that an electric current flows between the semiconductor substrates 1 and the counter-electrodes; c. structuring the copper layer 3.
Patent TW-439130-B (TW)
Title: Method of manufacturing a gate structure for a semiconductor memory device with improved breakdown voltage and leakage rate
Inventor: DONG ZHONG
IPC: H01L21/28
Filed: 2000-02-11
Granted: 2001-06-07
Abstract: The invention is a method of manufacturing a semiconductor memory device using a novel intergate dielectric stack. A key feature of the invention is the novel O/N/SiON/O structure, forming a silicon oxynitride layer on the silicon nitride layer. The method begins by forming a first insulating layer and a first conductive layer on a semiconductor substrate having one conductivity type. A second insulating layer is formed on the first conducting layer by sequentially stacking: a first silicon oxide layer; a silicon nitride layer; a silicon oxynitride layer; and a second silicon oxide layer. A second conductive layer is formed on the second insulating layer. The first insulating layer, the first conductive layer, the second insulating layer, and the second conductive layer are patterned to form a floating gate, an intergate dielectric, and a control gate. Finally, a source and drain are formed to complete the memory device.
Patent TW-I275884-B (TW)
Title: Apparatus and method for injecting liquid crystal and sealing inlet for injecting liquid crystal
Inventor: CHOO DAE-HO
IPC: G02F1/1341
Filed: 2000-04-01
Granted: 2007-03-11
Abstract: Disclosed is an apparatus for integrating an injecting unit of liquid crystal material and a sealing unit of a liquid crystal injected inlet in a LCD panel where two transparent insulating substrates are attached with a cell gap. The apparatus comprises; a chamber having means for controlling internal pressure of the chamber; a panel moving means disposed in the chamber, for moving and rotating the LCD panel; a liquid crystal supplying means disposed in the chamber, for supplying liquid crystal material into a liquid crystal space between the two transparent insulating substrates; and a sealing means disposed in the chamber, for sealing the liquid crystal injected inlet.
Patent TW-499633-B (TW)
Title: Semiconductor device and timing control circuit
Inventor: FUNABA SEIJI
IPC: G06F12/00
Filed: 2000-05-02
Granted: 2002-08-21
Abstract: Control on the operation speed of a delay loop from the output of a variable delay circuit 103 to a delay control input of the variable delay circuit is performed. For example, frequency-dividing circuits 107, 109 are respectively disposed at the input and output of the variable delay circuit. A signal obtained by frequency-dividing a signal outputted from the variable delay circuit is supplied to one input of a phase comparator 104 through a virtual delay circuit 106. A signal obtained by frequency-dividing the input of the variable delay circuit is supplied to the other input of the phase comparator. Phase control is performed according to the result of comparison between the phases of both signals.
Patent TW-527428-B (TW)
Title: Method of forming a bonded sputter target/backing plate assembly
Inventor: KULKARNI SHAILESH
IPC: C23C14/34
Filed: 2000-06-12
Granted: 2003-04-11
Abstract: There is provided a method of forming a high strength atomic bond (20) between a sputter target (10) and backing plate (12) such that the microstructural characteristics of the sputter target material obtained by prior processing is not altered by the bonding process. There is further provided a method for bonding the target (10) to the backing plate (12) and forming a bonded target/backing plate assembly (30) having a greater target thickness for increased sputtering life, while maintaining the overall standard dimensions set by industry standards.
Patent TW-483809-B (TW)
Title: Workpiece transporting device
Inventor: YAZAWA TAKAYUKI
IPC: H01L21/687
Filed: 2000-08-04
Granted: 2002-04-21
Abstract: A workpece transporting device for taking out a workpiece such as a liquid crystal glass from a cassette and transporting the workpiece to a specified position capable of reducing the weight and deflection amount of an arm portion holding the liquid crystal glass, wherein a workpiece holding part of a hand holding the workpiece such as the liquid crystal glass is formed of a horizontal holding arm comprising a carbon fiber material extending horizontally, the horizontal holding arm comprises a horizontal arm part opposed to the workpiece and at least one folded part folded in the direction of crossing the horizontal arm part, and the surface of corner parts in a boundary between the folded parts and the horizontal arm part are formed in a fillet angle.
Patent TW-I226863-B (TW)
Title: Motor-assisted bicycle
Inventor: MARUYAMA TOMOYUKI
IPC: B62M6/55
Filed: 2000-10-12
Granted: 2005-01-21
Abstract: To provide a motor-assisted bicycle allowing a rider to easily stride across a body frame when getting on and off the bicycle, thereby improving the usability of the bicycle. A motor-assisted bicycle, on which a motor-driven assist unit 1 including a crank shaft 101 and a motor for generating assist-power to be imparted to the crank shaft 101 is mounted, has a downwardly projecting U-shaped body frame 2 connected to a head pipe 21. The motor is positioned rearwardly from the crank shaft 101; and the bottom of the U-shaped body frame 2 is positioned forwardly from the unit 1 and is also positioned under the crank shaft 101. Since the bottom, that is, the lowermost portion of the U-shaped body frame 2 can be lowered, the position of the obstacle to the rider's motion to get on and off the bicycle becomes lower, with a result that it is easy for the rider to stride across the U-shaped body frame, thereby improving the usability of the bicycle when the rider gets on and off the bicycle.
Patent TW-486398-B (TW)
Title: Electrode for machining a piece by electro-erosion and its process for production
Inventor: CHIRIOTTI NICOLAS
IPC: B23H7/24
Filed: 2000-11-16
Granted: 2002-05-11
Abstract: The wire electrode for machining a piece by electro-erosion comprises a metallic core (10) and a cladding (11) constituted by an alloy of manganese and zinc obtained by simultaneous electrolytic deposition at a thickness comprised between 1 and 40 micrometers. This cladding permits a substantial increase of the machining, particularly rough machining, performance, a considerable deformability of the wire, a high resistance to traction and stability of the cladding over time.
Patent TW-487626-B (TW)
Title: Injection moulding machines and related methods of use
Inventor: LAM MING MUI
IPC: B29C45/03
Filed: 2000-12-19
Granted: 2002-05-21
Abstract: The invention includes a multi injector moulding machine of at least two injectors where injection of material is able to be provided into moulding cavities which are formed between a first mould portion and a second mould portion or between these and a third mould portion; the machine being configurable in this respect in two modes of operation, wherein in the first and second modes the mould portions an be machine indexable relative to each other in at least two closed conditions, a first closed condition defining a first mould cavity tillable with a first material by a first injector and a second closed condition defining a second mould cavity fillable with a second material by a second injector and wherein the mould portions are movable so that a first material injected in the first mould cavity during a first mould closed condition can be carried into the second mould cavity so that part of the or each said second mould cavity can be filled with a second material during an ensuing second closed condition.
Patent TW-I287009-B (TW)
Title: Method for producing 8-hydroxyjulolidine and analogs thereof
Inventor: CHEN JAU-TSEN
IPC: C07D401/00
Filed: 2000-12-28
Granted: 2007-09-21
Abstract: This invention provides a method for producing 8-hydroxyjulolidine and analog thereof. This invention utilizes 3-aminophenol or 1,3-dihydroxy-5-aniline and 1,3-dihalo-propane or analog thereof to proceed the cyclization, which only needs one step reaction to synthesize the required cycloalkane-containing phenol compound and improves the producing efficiency. The compounds produced according to this invention have following chemical structure: wherein, R1 and R2 represent substituents such as hydrogen, halogen, hydroxyl or alkyl and so on. The method of this invention comprises the following chemical reaction: wherein, X and Y represent leaving groups such as halogen, acyloxy group, sulfonyl group or phosphonyl group and so on, and the definitions of R1 and R1 are the same as the previous. This invention also provides the method of producing the coumarin compound by further proceeding the addition of 8-hydroxyjulolidine and analogs thereof. The products and intermediate products produced by each method in this invention are also provided.
Patent TW-I287989-B (TW)
Title: Glyburide composition
Inventor: CAVE GILLIAN
IPC: C07C303/42
Filed: 2001-01-08
Granted: 2007-10-11
Abstract: The present invention relates to a physical form of the known drug substance glyburide, also known as glibenclamide, and chemically defined as 5-chloro-N-[2-[4-[[[(cyclohexylamino)-carbonyl]amino]sulfonyl]phenyl]ethyl]-2-methoxybenzamide (Merck Index, Tenth Edition, p. 642), as well as to dosage forms, e.g., tablets and capsules, incorporating said physical form of glyburide.
Patent TW-I290574-B (TW)
Title: Polishing slurry
Inventor: LIU LEI
IPC: C09G1/00
Filed: 2001-02-20
Granted: 2007-12-01
Abstract: The polishing slurry includes polishing particles having a mean particle diameter of less than about 5 mum. The slurry contains at least about 0.5 total weight percent oxidizer selected from at least one of the group consisting of HNO3, Ni (NO3)2, Al(NO3)3, Mg(NO3)2, Zn(NO3)2 and NH4NO3. A small but effective amount of a co-oxidizer selected from the group consisting of perbromates, perchlorates, periodates, persulfates, permanganates, ferric nitrate, cerium-containing salts, perbenzoic acids, nitrite compounds, perborate compounds, hypochlorite compounds, chlorite compounds and chloride compounds accelerates removal of substrates; and water forms the balance of the aqueous slurry.
Patent TW-499523-B (TW)
Title: Cycle sewing machine
Inventor: SHIINA TAKAYUKI
IPC: D05B3/14
Filed: 2001-04-03
Granted: 2002-08-21
Abstract: An object of the invention is to provide a cycle sewing machine in which thread trimming operation only is executed independent of the motion of a work clamp device when it is needed. A single-thread chainstitch sewing machine 100 includes thread trimming means having a movable knife 13, etc., a clamp lifting lever 5 to lift up a clamp mechanism 7 to press a fabric, a driving arm 4 for causing the trimming means and the lifting lever 5 to be operated according to the movement position in one direction of the arm 4, and a drive solenoid 1. The arm 4 sequentially moves from a standby position, to a trimming end position (a lifting start position), and to a lifting end position when moving in one direction. The machine further includes a CPU 53 for controlling the current duty ratio supplied to the solenoid 1 so that the arm 4 can stay at the lifting start position.
Patent TW-504845-B (TW)
Title: Thin film processing method and thin film processing apparatus
Inventor: TANABE HIROSHI
IPC: H01L21/268
Filed: 2001-05-17
Granted: 2002-10-01
Abstract: This invention relates to a thin-film processing method for processing a thin-film by irradiating a light beam for the thin-film. One irradiation unit of the light beam is composed of irradiation of a first light beam for the thin-film and irradiation of a second light beam for the thin-film. The irradiation of the second light beam starts with a time delay from the beginning of the irradiation of the first light beam for the thin-film. The thin-film is processed by repeating the irradiation of above-mentioned one irradiation unit. The first and second light pulses satisfy a relationship of (the pulse width of the first light pulse) > (the pulse width of the second light pulse). Preferably, the first and second light pulses further satisfy a relationship of (the irradiation intensity of the first light pulse) ≥ (the irradiation intensity of the second light pulse). A silicon thin-film having low trap state density can be formed by the light beam irradiation.
Patent TW-483777-B (TW)
Title: Paste coating machine
Inventor: KAWASUMI YUKIHIRO
IPC: G03F7/16
Filed: 2001-08-13
Granted: 2002-04-21
Abstract: The present invention comprises: a first setting mechanism for setting up a basic pattern for coating and drawing the paste pattern; a second setting mechanism for setting up the data set at the first setting mechanism as plural pattern data of the paste patterns to be coated on the same substrate; a third setting mechanism for setting the conditions of each paste pattern that is to be coated and drawn and making the coating conditions modifiable; and a fourth setting mechanism for setting a positional relationship of the plural paste patterns from the pattern data set at the second setting mechanism on the substrate, and coating the pastes according to the coating conditions along the track of the pattern data on the substrate while using the positional relationship set at the fourth mechanism to coat and depict the plurality of paste patterns. For example, when four paste patterns P1 to P4 to be coated and drawn on the substrate 22 are of the same shape, data that are common to (shared by) the paste patterns P1 to P4 are set up (by changing the coordinate positional data of the basic pattern or the vector data of the line data of the basic pattern). Such data are used to prepare the paste data used for coating and drawing the paste patterns P1 to P4. At such a status, and because the paste patterns P1 to P4 are of the same shape, even though the data of one basic pattern can be used as the data for the paste patterns P1 to P4, the coating positions of the paste patterns P1 to P4 on the substrate 22 are different. Therefore, the coating conditions are modified correspondingly according to the need.
Patent TW-587307-B (TW)
Title: Electronic device manufacture
Inventor: GALLAGHER MICHAEL K
IPC: H01L21/316
Filed: 2001-09-12
Granted: 2004-05-11
Abstract: Disclosed are methods of manufacturing electronic devices, particularly integrated circuits. Such methods include the use of low dielectric constant material prepared by using a removable porogen material.
Patent TW-512485-B (TW)
Title: Method for coating material with low dielectric constant at an elevated process yield
Inventor: CHEN YU-HUEI
IPC: H01L21/76
Filed: 2001-10-05
Granted: 2002-12-01
Abstract: The present invention discloses a method for coating a material with a low dielectric constant, particularly pre-wetting the surface of a wafer with the solvent of the material with a low dielectric constant prior to the process of coating the material with a low dielectric constant. Prior to the application of coating of a wafer, a pre-wetting process is carried out to increase the yield of coating. The method comprises: prior to coating a wafer, using the solvent of the material with a low dielectric constant to pre-wet the surface of the wafer; after the coating operation, performing a preliminary bake; introducing nitrogen to dry the solvent; and performing a curing stage to complete the coating process.