Patent SG-11201908581Y-A (SG)
Title: Apparatus, method and system for measuring the influence of ophthalmic lens design
Inventor: COLLINS MICHAEL JOHN
IPC: A61B3/14
Filed: 2018-03-15
Abstract: 436-14-ir.Pm. 167 Figure IA 160 150 1119 . 1 xavefront rrt DefunnAlc ll6 110 112 115 <---300S 13 ; ;commuter I I I Figur e W O 20 18/ 165 697 Al 300S (12) INTERNATIONAL APPLICATION PUBLISHED UNDER THE PATENT COOPERATION TREATY (PCT) (19) World Intellectual Property Organization International Bureau (43) International Publication Date 20 September 2018 (20.09.2018) WIP0 I PCT ill~~~~~~~~ 0111111010VIIIOH olo mil oilimommo oimIE (10) International Publication Number WO 2018/165697 Al (51) International Patent Classification: GO2B 27/10 (2006.01) A61B 3/14 (2006.01) A61B 5/04 (2006.01) (21) International Application Number: PCT/AU2018/000034 (22) International Filing Date: 15 March 2018 (15.03.2018) (25) Filing Language: English (26) Publication Language: English (30) Priority Data: 2017900907 15 March 2017 (15.03.2017) AU (71) Applicant: QUEENSLAND UNIVERSITY OF TECH- NOLOGY [AU/AU]; 2 George Street, Brisbane, Queens- land 4000 (AU). (72) Inventors: COLLINS, Michael John; 1424 Mt Nebo Road, Jollys Lookout, QLD 4520 (AU). DAVIS, Brett Ashley; 56 Barter Avenue, Holland Park, QLD 4121 (AU). Yl, Fan; 53 Remick Street, Stafford Heights, QLD 4053 (AU). (74) Agent: WARDEN-HUTTON, Paul David; Houlihan2, PO Box 611, Balwyn North, VIC 3104 (AU). (81) Designated States (unless otherwise indicated, for every kind of national protection available): AE, AG, AL, AM, AO, AT, AU, AZ, BA, BB, BG, BH, BN, BR, BW, BY, BZ, CA, CH, CL, CN, CO, CR, CU, CZ, DE, DJ, DK, DM, DO, DZ, EC, EE, EG, ES, FI, GB, GD, GE, GH, GM, GT, HN, HR, HU, ID, IL, IN, IR, IS, JO, JP, KE, KG, KH, KN, KP, KR, KW, KZ, LA, LC, LK, LR, LS, LU, LY, MA, MD, ME, MG, MK, MN, MW, MX, MY, MZ, NA, NG, NI, NO, NZ, OM, PA, PE, PG, PH, PL, PT, QA, RO, RS, RU, RW, SA, SC, SD, SE, SG, SK, SL, SM, ST, SV, SY, TH, TJ, TM, TN, TR, TT, TZ, UA, UG, US, UZ, VC, VN, ZA, ZM, ZW. (84) Designated States (unless otherwise indicated, for every kind of regional protection available): ARIPO (BW, GH, GM, KE, LR, LS, MW, MZ, NA, RW, SD, SL, ST, SZ, TZ, UG, ZM, ZW), Eurasian (AM, AZ, BY, KG, KZ, RU, TJ, TM), European (AL, AT, BE, BG, CH, CY, CZ, DE, DK, EE, ES, FI, FR, GB, GR, HR, HU, IE, IS, IT, LT, LU, LV, MC, MK, MT, NL, NO, PL, PT, RO, RS, SE, SI, SK, SM, TR), OAPI (BF, BJ, CF, CG, CI, CM, GA, GN, GQ, GW, KM, ML, MR, NE, SN, TD, TG). Published: — with international search report (Art. 2 I (3)) (54) Title: APPARATUS, METHOD AND SYSTEM FOR MEASURING THE INFLUENCE OF OPHTHALMIC LENS DESIGN (57) : A method for measuring an influence of an ophthalmic lens design is disclosed. The method comprises splitting an optical light beam into a wavefront measurement light path and a wavefront modu- lation light path; implementing the ophthalmic lens design in an adap- tive optics device positioned in the wavefront modulation light path; and obtaining ocular biometric data in the ocular biometric and wavefront measurement light path to measure the influence of the ophthalmic lens design. Also disclosed are an apparatus and a system for measuring an influence of an ophthalmic lens design along with a method for assem- bling the device and system. The ocular biometric device may be an in- terferometer and the adaptive optics device may comprise one or more wavefront shapers.