Patent SG-11201903896S-A (SG)
Title: Cobalt compounds, method of making and method of use thereof
Inventor: COOPER ALAN
IPC: C07F15/06
Filed: 2017-10-31
Abstract: INTERNATIONAL APPLICATION PUBLISHED UNDER THE PATENT COOPERATION TREATY (PCT) (19) World Intellectual Property 1111111111111 0 1101 010 11111 01101 0 1111111 11111 11111 3100 11111110 1111111111 Organization International Bureau (10) International Publication Number (43) International Publication Date .....0\"\"\" WO 2018/085257 Al 11 May 2018 (11.05.2018) WIPO I PCT (51) (21) International Application Number: (22) International Filing Date: (25) Filing Language: (26) Publication Language: (30) International Patent Classification: (71) Applicant: VERSUM MATERIALS US, LLC [US/US]; C23C 16/18 (2006.01) C23C 16/455 (2006.01) 8555 S. River Parkway, Tempe, AZ 85284 (US). C23C 16/16 (2006.01) C23C 16/50 (2006.01) (72) Inventors: COOPER, Alan, Charles; 107 S. Walnut C23C 16/34 (2006.01) CO7F 15/06 (2006.01) C23C 16/42 (2006.01) HO1L 21/285 (2006.01) Street, Macungie, PA 18062 (US). IVANOV, Sergei, Vladimirovich; 5215 Hoffman Drive, Schnecksville, PA 18078 (US). PCT/US2017/059257 (74) Agent: ROSSI, Joseph, D. et al.; Stradley Ronon Stevens & Young, LLP, 30 Valley Stream Parkway, Great Valley 31 October 2017 (31.10.2017) Corporate Center, Malvern, PA 19355 (US). English (81) Designated States (unless otherwise indicated, for every English kind of national protection available): AE, AG, AL, AM, AO, AT, AU, AZ, BA, BB, BG, BH, BN, BR, BW, BY, BZ, Priority Data: CA, CH, CL, CN, CO, CR, CU, CZ, DE, DJ, DK, DM, DO, 62/415,822 01 November 2016 (01.11.2016) US DZ, EC, EE, EG, ES, FI, GB, GD, GE, GH, GM, GT, HN, 15/792,092 24 October 2017 (24.10.2017) US HR, HU, ID, IL, IN, IR, IS, JO, JP, KE, KG, KH, KN, KP, KR, KW, KZ, LA, LC, LK, LR, LS, LU, LY, MA, MD, ME, MG, MK, MN, MW, MX, MY, MZ, NA, NG, NI, NO, NZ, (54) kr) precursor = tionalized W D aldehyde, Title: COBALT COMPOUNDS, METHOD OF MAKING AND METHOD OF USE THEREOF 120 80 40 - 20 : Described herein are cobalt compounds, processes for making cobalt compounds, and compositions comprising cobalt -film precursors used compounds are (alkyne) alkyl) cobalt tetracarbonyl. Examples of metal oxides, metal nitrides, and metal silicides. Functionalized ligands with groups such as amino, nitrile, imino, hydroxyl, esters, halogens, as uniformity, continuity, and low resistance. /1 -----. I 1 \ i l 1 i 1 / / / 0 >66 for depositing cobalt-containing dicobalt hexacarbonyl and carboxylic acids are used for selective deposition on certain surfaces and/or r M , 13% i I 1 I ! 37 ill% I / i I i I \ i -\". L----- --- •-._ ___ 150 260 253 36C1 ' 3'.0 -1C0 Temperature COI Figure 1 films (e.g., cobalt, cobalt oxide, cobalt nitride, etc.). Examples of cobalt compounds, cobalt enamine compounds, cobalt surfaces for deposition of metal-containing films include, - ct s W 1 2 - 0 8 . • 0 4 C3 0 D monoazadienes, and (film- but are not limited to, — Il IN (57) ir) el metal --.... metals, 1-1 cz such ei superior film properties C [Continued on next page] WO 2018/085257 Al MIDEDIMOMOIDEIREIDIONIMBEIDEMEnin OM, PA, PE, PG, PH, PL, PT, QA, RO, RS, RU, RW, SA, SC, SD, SE, SG, SK, SL, SM, ST, SV, SY, TH, TJ, TM, TN, TR, TT, TZ, UA, UG, US, UZ, VC, VN, ZA, ZM, ZW. (84) Designated States (unless otherwise indicated, for every kind of regional protection available): ARIPO (BW, GH, GM, KE, LR, LS, MW, MZ, NA, RW, SD, SL, ST, SZ, TZ, UG, ZM, ZW), Eurasian (AM, AZ, BY, KG, KZ, RU, TJ, TM), European (AL, AT, BE, BG, CH, CY, CZ, DE, DK, EE, ES, FI, FR, GB, GR, HR, HU, IE, IS, IT, LT, LU, LV, MC, MK, MT, NL, NO, PL, PT, RO, RS, SE, SI, SK, SM, TR), OAPI (BF, BJ, CF, CG, CI, CM, GA, GN, GQ, GW, KM, ML, MR, NE, SN, TD, TG). Published: — with international search report (Art. 21(3)) — before the expiration of the time limit for amending the claims and to be republished in the event of receipt of amendments (Rule 48.2(h))