baber/WOPTO huggingface dataset:
Patent JP-H08238073-A (JP)
Title: Composition for edible meat processing and method for treating processed edible meat
Inventor: YAKUSHIJI OSAMU
IPC: A23L17/00
Filed: 1995-03-03
Abstract: PURPOSE: To provide a method capable of obtaining meat processed products excellent in a water holding property and a binding property and having elasticity and good eat feeling without using a phosphoric acid salt. CONSTITUTION: This composition for an edible meat processing comprises (a) 100 pts.wt. at least one additive selected from starch, plant protein, gelatin, albumen, lactose and casein, (b) 10-60 pts.wt. (based on sodium carbonate) one carbonic acid salt selected from sodium carbonate, sodium hydrogencarbonate, potassium carbonate and potassium hydrogencarbonate, (c) 10-30 pts.wt. (based on ascorbic acid) one compound selected from ascorbic acid, sodium ascorbate and potassium ascorbate and (d) 1-20 pts.wt. (based on acetic acid) one compound selected from acetic acid, sodium acetate and potassium acetate.
Patent JP-H05237613-A (JP)
Title: Method for adding ca in tundish
Inventor: OSUGI HITOSHI
IPC: B22D11/10
Filed: 1992-03-02
Abstract: PURPOSE:To provide a method for adding Ca into a tundish, in which the adjustment of the Ca adding quantity is executed in on-line according to closing condition of an immersion nozzle and the addition of the necessary lower limit of Ca can do. CONSTITUTION:In the method for adding Ca into the tundish 4 at the time of continuously casting a steel by supplying the molten steel in the tundish 4 into a mold 6 through the immersion nozzle 7, Ca adding speed into the tundish 4 is automatically controlled according to the closing condition of the immersion nozzle.
Patent JP-S5816920-A (JP)
Inventor: ETSUCHI RESUTO
IPC: B60J10/79
Filed: 1982-03-19
Abstract: (57)【要約】本公報は電子出願前の出願データであるた め要約のデータは記録されません。
Patent JP-H06234056-A (JP)
Title: Metallic mold for casting and casting method
Inventor: TOFUN MASAHIDE
IPC: B22D18/02
Filed: 1993-02-10
Abstract: PURPOSE:To obtain a good quality cast product little in the entrapment of air into molten metal and without shrinkage and shrinkage cavity and to improve the yield of casting plan. CONSTITUTION:After a metallic mold for casting arranged so that a mating surface 7 in one set of vertical split metallic molds 1a, 1b for casting having a cavity 4 in the inner part is set in the vertical direction is tilted by 90 deg. angle in the prescribed direction, the molten metal is poured and filled up into a pouring basin part 5. Successively, after the metallic mold for casting is returned and stopped to/at the condition before tilting, a plunger 6 is passed through the pouring basin part 5 and inserted into a sprue 2 to press-feed the molten metal in the cavity.
Patent JP-S56141885-A (JP)
Title: Mortar lining method for inside surface of steel pipe
Inventor: NAGAMINE TSUNEO
IPC: B05D7/22
Filed: 1980-04-04
Abstract: PURPOSE: To form a lining layer stuck uniformly and firmly on the inside surface of a steel pipe by forcefully correcting the deformation or roundness of the section of the steel pipe together with the bend or straightness of the steel pipe and lining the steel pipe in the state that the central axis of the steel pipe to be rotated and the center of rotation are in alignment.  
     CONSTITUTION: While a steel pipe 1 which is put into a pair of halved die frames 8, 9 is being rotated, mortar is supplied into the steel pipe 1, whereby the inside surface thereof is lined. During this lining, the rate of eccentricity (e) and the permissible rate of thickness deviation Δta of the lining layer are maintained at the relation e=K(DΔta) n  (where 3/2<n<3) according to the diameter D of the steel pipe 1. As a result, while the bend, the longitudinal bend, deformation of section, etc. of the steel pipe 1 are being corrected and the state thereof is being maintained, the steel pipe is lined and the uniform lining layer is easily obtained. 
     COPYRIGHT: (C)1981,JPO&Japio
Patent JP-S55139555-A (JP)
Title: Gasket
Inventor: KUGURE TAKAHIRO
IPC: F16J15/12
Filed: 1979-04-12
Abstract: PURPOSE: To provide a gasket which is a hollow O-ring made of a metal tube with a prescribed outside diameter and a prscribed ratio of the outside diameter to the thickness and coated with a soft metal at a prescribed thickness on the outside surface and can be easily sealed up under severe service conditions.  
     CONSTITUTION: A soft metal or synthetic resin 3 is coated with a thickness of 10W 200μ on the outside surface of a hollow O-ring 2 made of an Ni-base alloy or stainless steel tube with an outside diameter of 3.0W20mm. The ratio of the outside diameter to the thickness of the tube is set at 0.18W0.5, preferably at 0.18W0.25. A gasket 1 is thus manufactured. To prepare the metal O-ring, a material is annularly shaped, cut off, electrically welded to minimize the production of burr on the inside of the material and ground. The soft metal or the like is then coated on the ground piece. 
     COPYRIGHT: (C)1980,JPO&Japio
Patent JP-H01221595-A (JP)
Title: Production of cast-coated paper
Inventor: KATSUMATA HITOSHI
IPC: D21H19/36
Filed: 1988-02-29
Abstract: PURPOSE:To obtain the subject coated paper having eliminated pinholes without impairing unique high glossiness, etc., by coating the surface of base paper with a water-based pigment coating, pretreating the coating layer with an aqueous solution of a specific metallic salt while the cast coating layer is in a wet state, then drying and rewetting the pretreated layer. CONSTITUTION:The surface of base paper is coated with a water-based pigment coating consisting essentially of a pigment and an adhesive to form a cast coating layer, which is then brought into pressure contact and dried with a heated metallic planished drum. In the process, the above-mentioned cast coating layer is then pretreated with an aqueous solution of a metallic salt, such as zinc salt, calcium salt or aluminum salt, (preferably zinc salt) while the afore- mentioned cast coating layer is in a wet or semidried state, subsequently dried and rewetted to afford the aimed coated paper.
Patent JP-H02220890-A (JP)
Title: Sublimable type thermal transfer recording medium
Inventor: MOCHIZUKI HIDEHIRO
IPC: B41M5/382
Filed: 1989-02-23
Abstract: PURPOSE:To perform recording with good hue and color density and to enhance light fastness and storage stability by making the concns. of an oxidation inhibitor, an ultraviolet absorber and an ultraviolet stabilizer in a dye supply layer higher than those in a dye transfer contributing layer. CONSTITUTION:An ink layer wherein a dye supply layer consisting of a sublimable dye and an org. binder contained in an undissolved granular state and a dye transfer contributing layer consisting of the sublimable dye and the org. binder contained in a molecularly dispersed state are laminated is provided on a substrate and at least one component among a sublimable oxidation inhibitor, an ultraviolet absorber and an ultraviolet stabilizer is contained in the dye transfer contributing layer and dye supply layer and the concn. thereof in the dye supply layer is made higher than that in the dye transfer contributing layer. By this method, the decomposition of the dye is prevented and the storage stability of a transfer sheet and the light fastness of transfer recording can be improved.
Patent JP-H11231631-A (JP)
Title: Image forming device
Inventor: TAMAKI SHINJI
IPC: G03G21/18
Filed: 1998-02-09
Abstract: PROBLEM TO BE SOLVED: To reduce an amount of useless toner remaining in a developing device when expendable parts including a developing device are replaced, to miniaturize the replaceable, expendable parts, and to reduce cost needed at the time of recovery. SOLUTION: The image forming device is equipped with a process cartridge 30 formed incorporating the developing device 3, which has a developing sleeve 4 for holding developer on its surface to carry it to a developing area opposite a photoreceptor 1, and a toner storage part 7, communicating with a toner cartridge 12, for storing toner replenished from the toner cartridge 12, and which supplies the toner in the toner storage part 7 to the developer. The toner cartridge 12 in which an opening 14 communicating with the toner storage part 7 is provided with a shutter 15 and the process cartridge 30 are independently attached/detached to/from a main body, and the toner storage capacity of the toner storage part 7 is smaller than the toner storage capacity of the toner cartridge 12.
Patent JP-H10235375-A (JP)
Title: Treatment of manganese-containing wastewater
Inventor: MIYASHITA HIROICHI
IPC: C02F1/64
Filed: 1997-02-28
Abstract: PROBLEM TO BE SOLVED: To provide a method by which manganese dissolved as ion, manganese suspended as a compound particle, or both are easily and reliably removed from wastewater containing manganese. SOLUTION: A ferric ion source is added to 1m<3> of manganese-containing wastewater as to adjust the ferric ion to be 5g or more and preferably 20g or less, the pH is adjusted to be 8.0-9.0, and after that, the produced precipitates are separated by solid-liquid separation. Ferric chloride, ferric sulfate, ferric nitrate, ferric hydroxide, etc., are examples of the ferric ion source. There is no problem to use ferrous chloride, ferrous sulfate, ferrous nitrate, ferrous hydroxide, and in this case, the ferrous ion is oxidized ferric ion after the ferrous ion source is added and pH adjustment should be carried out.
Patent JP-H11242235-A (JP)
Title: Manufacture of liquid crystal display device
Inventor: OGURA MASAFUMI
IPC: G09F9/00
Filed: 1998-02-26
Abstract: PROBLEM TO BE SOLVED: To prevent a conductive film pattern for forming the main part on a glass substrate on the outer side of an effective area from becoming the passage of static electricity and causing electrostatic defects to an image display part. SOLUTION: In the outer side area of the effective area 6 provided with the image display part 2 and a gate signal input terminal 3 and a source signal input terminal 4 connected to it, in forming the conductive film pattern 7 for performing the anodic-oxidation of the TFT of the image display part 2 on the glass substrate 1, the conductive film pattern 7 provided with a resistance value sufficient for preventing the electrostatic defects to the TFT part of the image display part 2 is formed. Further, the conductive film pattern 9 for capacitance formation is formed on the conductive film pattern 7 through an inter-layer insulation film 8.  A CR time constant is enlarged by the large resistance value of the conductive film pattern 7 to be the passage of the static electricity and capacitance, the steep input/output waveforms of the static electricity are delayed and made dull, an overcurrent is suppressed and a voltage is dropped.
Patent JP-S52128077-A (JP)
Title: Insulation gate type semiconductor device
Inventor: OKUMURA TOMISABUROU
IPC: H03F1/42
Filed: 1976-04-20
Abstract: PURPOSE:To secure an assured gate protection against high voltage by adding the back-to-back diode which features nearly identical breakdown voltage to both positive and negative voltage and also canclip the voltage applied to the gate at a nearly same level as the junction breakdown voltage.
Patent JP-H11241156-A (JP)
Title: Treatment of polyimide film
Inventor: FUJIMOTO KOJI
IPC: C09D179/08
Filed: 1998-02-26
Abstract: PROBLEM TO BE SOLVED: To obtain strong and stable adhesion between a polyimide film and a metal thin film at a low cost by applying a polyimide precursor on a substrate, drying, then, performing the precursor to heat treatment 1, forming a metal thin film on the treated polyimide film surface and performing the thin metal thin film to heat treatment 2 at a higher temp. then the heat treatment 1. SOLUTION: As for a polyimide precursor, photosensitive polyimide precursor varnish is preferably used. The temp. of heat treatment 1 is preferably made to 250 to 390 deg.C. By this heat treatment, the polyimide precursor is changed into a heat-resistant polymer. As for a metal thin film to be formed on the polyimide film, Cr is preferable especially from the viewpoint of adhesion property. The metal thin film is preferably formed by sputtering. Heat treatment 2 performed after the formation of the metal thin film is preferably carried out at a higher temp. than the temp. of the heat treatment 1 by >=20 deg.C and <=70 deg.C. The obtd. polyimide film preferably has <=25 ppm coefft. of linear expansion in average at 30 to 100 deg.C.
Patent JP-H08253536-A (JP)
Title: Polymer and hair-setting agent containing same as film-forming agent
Inventor: RAINAA BURANKENBURUKU
IPC: A61Q5/06
Filed: 1996-03-01
Abstract: PROBLEM TO BE SOLVED: To obtain a polymer desirable for use in a water-based hair setting agent by subjecting a mixture comprising a monomer selected from specified esters, a specified-group-containing vinyl monomer and optionally other monomers to a radical-initiated solution polymerization.  
     SOLUTION: A polymer is obtained by subjecting a mixture comprising 50-90 wt.% monomer selected from the group consisting of 1-18C alkyl esters of (meth)acrylic acid and vinyl esters of 2-10C saturated monocarboxylic acids, 10-25 wt.% sulfo vinyl monomer and 0-40 wt.% other monomers such as (meth) acrylic acid, (meth)acrylamide, a 3-8C N-alkylacrylamide and N-vinylpyrrolidone to a radical-initiated solution polymerization. This polymer is useful as a film forming agent used in a hair setting agent and having good setting properties, good water solubility and good driabilities. 
     COPYRIGHT: (C)1996,JPO
Patent JP-S59172235-A (JP)
Title: Etching method of semiconductor substrate according to gas plasma
Inventor: OKUTSU KINNOSUKE
IPC: H01L21/302
Filed: 1983-03-18
Abstract: PURPOSE:To reduce dispersion of an etching speed according to the variation with time of a chemical used for etching and dependence upon the pattern area, and to form the etching surface to be in the mirror condition having no roughness by a method wherein a semiconductor substrate is etched in plasma containing CF4 and O2. CONSTITUTION:A silicon oxide film 32 is formed on a silicon semiconductor substrate 31. A resist is applied on the silicon oxide film 32, and a pattern is formed with the resist according to the photo-etching method. The silicon oxide film 32 is etched using the resist thereof as a mask. After then, the resist thereof is removed. Then, the silicon semiconductor substrate 31 is put in an etching chamber 25 to be exposed in plasma of CF4 and O2. Accordingly, the silicon semiconductor substate 31 is etched making the silicon oxide film 32 as a mask. At this time, when the ratio of O2 and CF4 (O2/CF4) in plasma is made to 0.3- 0.7, the surface of the etched silicon semiconductr substrate 31 can be prevented from generation of roughness.
Patent JP-H07255039-A (JP)
Title: Television signal processor
Inventor: NUNOKAWA SATOSHI
IPC: H04N5/20
Filed: 1994-03-16
Abstract: PURPOSE:To provide a television signal processor which performs special effect processing for a television signal of high picture quality containing a horizontal and a vertical high frequency component by using a video special effect device for a standard television signal. CONSTITUTION:This television signal processor is equipped with an encoding device 1 which inputs the television signal SIN containing the horizontal and vertical higher frequency components than the standard television signal and separates it into a video signal S1 as a low frequency component corresponding to the standard television signal and a video signal S2 as a higher frequency component, 1st and 2nd special effect processors 2 and 3 which give special effects to the video signals S1 and S2 of the separated low-frequency and high- frequency components, and a decoding device 4 which converts the signal into a television signal in the original frequency band by putting the respective special effect processing outputs together.
Patent JP-H11241168-A (JP)
Title: Surface treating device and surface treating device by arc discharge and its method
Inventor: YAMAMOTO HIROSHI
IPC: C23C16/448
Filed: 1998-02-26
Abstract: PROBLEM TO BE SOLVED: To execute surface treatment of high quality at a high speed. SOLUTION: The distance (d) from the position at which a gaseous starting material 1 is plasmatized (a plasma arc jet flow 2) to the surface 3a of a substrate 3 is set to a distance (dc) in which the gaseous starting material 1 does not move to a state of being rebonded from the plasma state. Furthermore, the place other than a torch 4 is provided with an anode 11 different from an anode 7 in the torch 4 (the anode 11 in an another torch 8) distantly from a cathode 6 in the torch 4 by a prescribed distance A or above. Then, arc discharge 16' is generated on the space between the cathode 6 in the torch 4 and the anode 11 provided on the place other than the torch 4, and by a gas 2 for forming plasma jetted from the nozzle 5 of the torch 4, a plasma arc jet flow 16 of a prescribed length A or above is formed.  The plasma arc jet flow 16 of the prescribed length A or above formed in this way is fed with the gaseous starting material 1, the gaseous starting material 1 is plasmatized, and the plasmatized gaseous starting material 1' reaches the substrate 3.
Patent JP-S54137081-A (JP)
Title: Manufacturing of laminated insulation paper
Inventor: KUSANO TETSUO
IPC: B32B27/10
Filed: 1978-04-17
Abstract: PURPOSE: To manufacture the title insulation paper having excellent oil resistance and heat resistance, by laminating an insulation paper to a polypropylene film impregnated with a specific organic compound, and irradiating the laminate with electron beam.  
     CONSTITUTION: Polypropylene pellet added with 0.1W10 PHR of an organic compound having two or more reactive double bonds, e.g. trimethylolpropane triacrylate, etc., is fed to the hopper 2 of an extruder 1, and extruded as a film 4 through a T-die 3. While the extruded film 4 is still soft, it is laminated with two sheets of insulation paper 5, 5', and pressed. The laminate thus obtained is irradiated with 1W20 Mrad of electron beam generated by an electron accelerator 8 to crosslink the film 4.  
     USE: Insulator of power cable, etc. 
     COPYRIGHT: (C)1979,JPO&Japio
Patent JP-S51121835-A (JP)
Title: A gas leak preventing apparatus by feed cut off
Inventor: OOMORI HIDEO
IPC: F23N5/24
Filed: 1975-04-17
Abstract: PURPOSE: A safety apparatus by cut off of fas feeding in a gas leak accident. 
     COPYRIGHT: (C)1976,JPO&Japio
Patent JP-H03249155-A (JP)
Title: Method for heat treating metallic chromium formed body
Inventor: MATSUDA FUKUHISA
IPC: C22F1/02
Filed: 1990-02-28
Abstract: PURPOSE:To prevent the generation of cracks in a formed body at the time of welding by subjecting a metallic Cr formed body in which the total content of O, Al and Si is limited to heat treatment at a specified temp. in a reducing atmosphere. CONSTITUTION:The total content of O, Al and Si in a metallic Cr formed body is limited to <=530ppm. This metallic Cr formed body is subjected to heat treatment at >=1300 deg.C in a reducing atmosphere. Preferably, it is heated at 1300 to 1600 deg.C for >=1hr. The metallic Cr formed body heat-treated by the above method can suitably be used as the material for ordinary TIG welding and EB welding. A good weld bead free from the generation of cracks in a weld zone at the time of welding can be obtd.
Patent JP-S56142016-A (JP)
Title: Production of mold for linear fresnel condenser
Inventor: NADAGUCHI AKIRA
IPC: B29C33/00
Filed: 1980-04-07
Abstract: PURPOSE: To obtain a Fresnel zone surface of mirror finish in one step while using as usual a conventional cutting tool on a conventional machine tool such as a lathe by a method wherein a Fresnel thin layer is formed on a surface of a cylindrical drum, then the layer is stripped and developed into a desired shape to obtain a mold.  
     CONSTITUTION: A brass sheet 3 is wound around the surface of the cylindrical drum 1, then both ends of the sheet 3 are folded into an angular groove 2 of the drum 1 and fixed in situ by a wedge 4. The drum 1 is worked on the conventional lathe to conduct simultaneously a shaping and a mirror finishing of the surface of the sheet 3 by a diamond cutting tool in the usual manner, thereby cutting Fresnel grooves on the surface. The Fresnel thin layer 3 thus obtained is stripped from the surface of the drum 1, is then developed into the desired shape (a curved or plane surface) and is reinforced 6 by backing, and the Fresnel surface is bright plated with hard chromium to obtain the mold. The mold is used as a lower mold for molding a curved Fresnel lens which has a smooth surface on its upper side and a Fresnel surface on its lower side. 
     COPYRIGHT: (C)1981,JPO&Japio
Patent JP-S56141614-A (JP)
Title: Surface wave equipment
Inventor: KADOTA MICHIO
IPC: H03H9/145
Filed: 1980-04-07
Abstract: PURPOSE:To continuously adjust the passing band width, by shortening the electrode finger of the outermost side of a comb line electrode. CONSTITUTION:An interdigital electrode 2 is formed on the piezoelectric substrate 1. The electrode is constituted in the form of one pair of comb line electrodes being mutually inserted. The finger length of the outermost electrode finger 5 of the electrode 2 is cut off in the middle, and it is shorter than other electrode fingers. According to such a constitution, it is possible to realize an intermediate band width  between a state that the electrode fingers have been complete and a state that they  have been incomplete. When length of the electrode finger is adjusted in various  ways, it is possible to realize a surface wave equipment having a suitable band  width.
Patent JP-H01223655-A (JP)
Title: Rotary head system audio recording and reproducing device
Inventor: KANESHIGE TOSHIHIKO
IPC: G11B15/467
Filed: 1988-03-01
Abstract: PURPOSE:To faithfully detect an automatic track finding (ATF) pilot signal by detecting a zero crossing point of a reproducing RF signal and setting its section as an ATF pilot signal area, when the time between the zero crossing points has satisfied a prescribed condition. CONSTITUTION:From a reproducing RF signal from an input terminal 10, a time interval Tn of a rise/fall edge is measured, based on a measuring clock from a terminal 14 by an inter-edge time measuring instrument 13. Subsequently, by a condition deciding circuit 17, a latch signal L is outputted only in case when Tn is within a prescribed range, and a difference of a measured value is below a prescribed value. In such a way, when the signal L has continued by a prescribed number of times through registers 231-23n and an averaging circuit 24, it is regarded as an ATF signal, and a discrete value of its period is outputted. Accordingly, even if a relative speed of a head and a tape is varied, an ATF pilot signal can be detected faithfully.
Patent JP-S59174582-A (JP)
Inventor: SETO SACHIO
IPC: C04B37/02
Filed: 1983-03-22
Abstract: (57)【要約】本公報は電子出願前の出願データであるた め要約のデータは記録されません。
Patent JP-S58164443-A (JP)
Title: Seat revolving device
Inventor: OOSHIRO HIDEYUKI
IPC: B60N2/90
Filed: 1982-03-23
Abstract: PURPOSE:To simplify the construction and at the same time obtain a light  weight and low cost seat revolving device by a structure wherein the locking  devices are provided between seat tracks and a seat side member. CONSTITUTION:A right and a left seat tracks 1 and 2 and a sliding locking mechanism 3 are provided. A lower bracket 4 is lain between the seat tracks 1 and 2 and a pivoting bracket 5 is provided on the upper side of the bracket 4 and both the brakets 4 and 5 are pivotally attached with each other by means of a pin 6. The pivoting bracket 5 is fixed to a seat frame 7, which is rendered to be pivotable. A pivoting locking device 12 is provided between the seat track 2 and the one side of the seat frame 7. The locking device 12 comprises a striker pin 13 installed on the seat track 2 and a locking mechanism 14 provided on the seat frame 7.