baber/WOPTO huggingface dataset:
Patent TW-501084-B (TW)
Title: Method of driving AC-type plasma display panel and plasma display device
Inventor: NAGANO SHINICHIRO
IPC: G09G3/28
Filed: 2000-10-04
Granted: 2002-09-01
Abstract: An AC-type PDP in which adjacent two scanning lines share one sustain discharge electrode and a discharge separator for separating surface discharges in the adjacent scanning lines is driven as follows. In a writing period (04), the voltages at odd-numbered sustain discharge electrodes (J2n-1) are set to the voltage (H) and the voltages at even-numbered sustain discharge electrodes (J2n) are set to the voltage (M). At selection of odd-numbered scanning lines (S2n-1) in descending order, when image data (W) according to the scanning line (S2n-1) is applied to an address electrode (22), the voltages at the sustain discharge electrodes (J2n+1 and J2n) are changed to the voltages (M and L), respectively. In a polarity reverse period (RV), after a voltage (Voff) is applied to all the address electrodes (22) and the voltages at the sustain discharge electrodes (J2n-1 and J2n) are changed from the voltage (M) to the voltages (L and H), respectively, the voltages at the sustain discharge electrodes (J2n-1 and J2n) are returned to the voltage (M). In a writing period (E4), even-numbered scanning lines (S2n) are selected in ascending order conversely to the order in the writing period (04). With this operation, it is possible to enhance a display contrast, reduce a reactive power and stabilize a writing discharge.
Patent TW-464968-B (TW)
Title: Via etch post cleaning process
Inventor: LU HUNG-YUEH
IPC: H01L21/302
Filed: 2000-12-21
Granted: 2001-11-21
Abstract: This invention provides a cleaning method for wafer which has a tungsten metal layer, an oxide layer formed on the surface of the metal layer, a resist layer formed on the surface of the oxide layer and a via penetrating the resist layer and oxide layer to the tungsten metal layer though the predetermined surface expose process. The clean method consists of following steps. Firstly, a resist strip process is carried out to remove the resist layer and then a dry cleaning process is performed to remove polymer residues and to form compounds with water-solubility. Subsequently, a water cleaning process is conducted by immersing the wafer into deionized water to dissolve the water-soluble compounds and thus completely clean away any residue in via.
Patent TW-471961-B (TW)
Title: Elastically stretchable composite sheet and process for making the same
Inventor: KOBAYASHI TOSHIO
IPC: B32B7/022
Filed: 2001-01-18
Granted: 2002-01-11
Abstract: A sheet-like fibrous assembly (2) having an inelastic stretch ability is intermittently joined to at least one surface of an elastically stretchable sheet (3). The elastic sheet (3) is elastically stretchable at least 80% in one direction and the fibrous assembly (2) is curved between each pair of binding spots (4) adjacent to each other on the elastic sheet (3) so as to be stretchable in the one direction and comprises ethylene/propylene copolymer, ethylene/propylene/butene copolymer or a mixture of two or more of these copolymers at 100 to 10% by weight.
Patent TW-I222580-B (TW)
Title: System and method for H-tree signal layout
Inventor: COOKE LAURENCE H
IPC: G06F17/50
Filed: 2001-04-13
Granted: 2004-10-21
Abstract: A technique for constructing a balanced H-tree clock layout suited for application to clock signals in integrated circuits, but applicable to other signals requiring balanced distribution over a wide area, involves routing clock wires in a circuit design wherein internal circuit blocks are divided, to the extent possible, into groups having an equal number of circuit blocks. An upper H-tree clock layout structure is established using the center of mass of each of the circuit block groups as guideposts. Adjustments in wire length to balance the wires of the H-tree layout. A lower H-tree clock layout structure is established using center points between pairs of adjacent or nearby circuit blocks as guideposts for the endpoints of clock wires, and then routing, to the extent necessary, wire segments to the individual circuit blocks.
Patent TW-471157-B (TW)
Title: Nonvolatile semiconductor memory device
Inventor: NODA JUNICHIRO
IPC: H01L29/788
Filed: 2001-02-05
Granted: 2002-01-01
Abstract: The present invention relates to a nonvolatile semiconductor memory device. A page buffer register capable of storing one page writable data in the nonvolatile memory cells selected in accordance with the page address signal is installed in the bit line of the memory cell array. In order to sequentially load one page data stored in the page buffer register into each byte, an address register capable of inputting the page address signal and sequentially generating row address signal CAb of one page is installed. The selecting path circuit 9 is capable of switching the row address supplied from the external portion and the row address generated from the address register corresponding to the action mode. The control circuit 13 carries out the control in the switching mode so as to eliminate the entire data in the nonvolatile memory cell, which is selected by the page address signal, and then write into the entire data that is one page data loaded in the page buffer register 2.
Patent TW-525093-B (TW)
Title: PCMCIA compartment
Inventor: JENKINS MICHAEL DAVID
IPC: B42D15/10
Filed: 2001-02-26
Granted: 2003-03-21
Abstract: This is a compartment that provides for increased protection of PCMCIA cards when used in computers. The compartment is covered by a movable door which can be moved to accommodate various size PCMCIA cards with various type projections. Since the entire horizontal portion of a PCMCIA card will seat in the compartment, a firm support is provided for the entire card.
Patent TW-I241641-B (TW)
Title: Semiconductor integrated circuit patterns
Inventor: KUJI TATSUAKI
IPC: H01L21/027
Filed: 2001-03-20
Granted: 2005-10-11
Abstract: The present invention relates to a method of designing patterns of a semiconductor integrated circuit, the shape of each of a plurality of opening patterns formed by a plurality of contact holes is formed into a rectangular shape; and the contact holes are arranged in such a manner that a long side of each of the rectangular opening patterns is opposite to a long side of an adjacent rectangular opening pattern, and the positions of both ends of the long sides are trued up. Furthermore, a photomask is used for manufacturing a semiconductor integrated circuit as designed by the above method of designing patterns of a semiconductor integrated circuit, in which a plurality of rectangular opening patterns are provided thereon as a plurality of rectangular opening patterns for contact holes; and the a plurality of rectangular opening patterns are arranged in such a manner that adjacent long sides thereof are opposite to each other, and the position of both ends of each long side is trued up. Besides, a semiconductor device comprises a semiconductor integrated circuit designed by using a method of designing a semiconductor integrated circuit.
Patent TW-514684-B (TW)
Title: Etching gas assistant epitaxial method
Inventor: JANG LIANG-DUNG
IPC: C30B25/02
Filed: 2001-05-08
Granted: 2002-12-21
Abstract: The present invention relates to an etching gas assistant epitaxial method, which is accomplished by introducing etching gas into the processing chamber during epitaxial deposition process. Because the etching gas has different etching rates with respect to grains of different orientations, grains with different sizes and orientations are going to be removed by the etching gas and a fine epitaxial deposited layer can thus be obtained. Furthermore, the method of the present invention can be used for depositing epitaxy on mismached or amorphous substrates or films, such as oxide, nitride, and even metal substrates, to extend the applications of epitaxy.
Patent TW-544755-B (TW)
Title: Exposure method and exposure apparatus
Inventor: NISHI TAKECHIKA
IPC: G02B5/00
Filed: 2001-05-11
Granted: 2003-08-01
Abstract: An exposure apparatus transfers an image of a pattern on a reticle onto a wafer W by synchronously scanning the reticle and the wafer with respect to a projection optical system in a state in which the reticle is illuminated with an exposure light beam from an exposure light source subjected to pulse light emission via a fly's eye lens, a movable blind, a main condenser lens system, and a fixed blind. First and second uneven illuminance-correcting plates, on which shielding line groups for correcting convex and concave uneven illuminance are depicted, are arranged at a position defocused from a conjugate plane with respect to a pattern plane of the reticle. A third correcting plate for roughly correcting uneven illuminance is arranged at a position further defocused therefrom. It is possible to enhance the uniformity of the totalized exposure amount on the wafer or the telecentricity when the exposure is performed in accordance with the scanning exposure system.
Patent TW-589297-B (TW)
Title: Process for making iminodiacetic acid compounds from monoethanolamine substrates
Inventor: BERK HOWARD C
IPC: C07C227/12
Filed: 2001-05-15
Granted: 2004-06-01
Abstract: This invention is directed to a process for making an iminodiacetic acid compound from a monoethanolamine compound having the following formula: wherein R1 is hydrogen, hydrocarbyl, or substituted hydrocarbyl. The process comprises contacting the monoethanolamine substrate with a cyanide source and a formaldehyde source to form a N-cyanomethylated monoethanolamine intermediate, and contacting the N-cyanomethylated monoethanolamine intermediate with a hydroxide source and a metal-containing catalyst to form the iminodiacetic acid compound.
Patent TW-509813-B (TW)
Title: Fringe field switching mode liquid crystal display
Inventor: LIM KYU-HWAN
IPC: G02F1/1343
Filed: 2001-05-30
Granted: 2002-11-11
Abstract: The fringe field switching mode liquid crystal display of the present invention comprises a transparent insulating substrate; a plurality of gate bus line arranged in selected direction on the transparent insulating substrate, the gate bus line is arranged so that each element of the pair separated at a first distance is arranged a plurality of pairs at a second distance wider than a first distance; a plurality of common bus lines arranged on the centers of each gate bus line separated at the second distance, being in parallel with the gate bus line; a plurality of data bus lines arranged crossing with the gate bus line and common bus line to define a unit pixel; a thin film transistor disposed at the intersection of the gate bus line and data bus line; a counter electrode disposed in a unit pixel area and made of a transparent conductor, being in contact with the common bus line; and a pixel electrode overlapping with the counter electrode in the unit pixel and made of a transparent conductor, being in contact with the thin film transistor.
Patent TW-523667-B (TW)
Title: Shared directory management system and method of the same
Inventor: WU YU-FU
IPC: G06F17/30
Filed: 2001-05-31
Granted: 2003-03-11
Abstract: The present invention relates to a shared directory management system, which includes a storage, a first cluster server, a second cluster server, and a management module, wherein the storage includes a shared directory, in which the shared directory includes a first configuration set and a plurality of sub-directories, and each sub-directory includes a second configuration set. When the cluster server system is on a normal mode, the first cluster server controls the storage, and the management module uses a monitoring method to check the first configuration set for the shared directory in the storage and the second configuration set for each sub-directory. And, when the first configuration set for the shared directory and the second configuration set for each sub-directory occur an updating operation, an updated configuration set corresponding to the updating operation will be stored in a database; on the other end, when occurring a breakdown, the second cluster server controls the storage, and the management module will recover the first configuration set for the shared directory and the second configuration set for each sub-directory based on the updated configuration set stored in the database, and switch back to the normal mode.
Patent TW-570887-B (TW)
Title: Liquor bottle having ornaments and manufacturing method thereof
Inventor: YANG JAU-JI
IPC: B65D85/72
Filed: 2001-07-02
Granted: 2004-01-11
Abstract: Disclosed is a liquor bottle having ornaments and a manufacturing method thereof. The liquor bottle having ornaments includes: a bottle body for containing liquid, at a bottom of the bottle body being provided with a base projecting into an interior thereof, such that the bottle body forms a space for receiving liquid and an indent, characterized in that: around a peripheral wall of the indent is provided with an ornament pattern portion. This invention further discloses a method for manufacturing a liquor bottle having ornaments. The liquor bottle having ornaments of this invention is able to exhibit various patterns and colors to enhance the appearance of the bottle body, where the ornament patterns and the bottle are integrally formed without additional attachments to allow easy packing and convenience.
Patent TW-492930-B (TW)
Title: Vehicular rear wheel supporting device
Inventor: NAKAGAWA MITSUO
IPC: B62K25/20
Filed: 2001-07-03
Granted: 2002-07-01
Abstract: A vehicular rear wheel supporting device to share a vehicle body frame even if the diameter of a rear wheel is changed. In this vehicular rear wheel supporting device 80, a pivot member 81 is detachably attached to the rear part of a vehicle body frame 20, a swing member 91 is vertically swingingly attached to the pivot member 81, and a rear wheel is rotatably attached to the rear part of the swing member 91. A plurality of attaching parts 27 arranged one above the other are installed on the vehicle body frame 20. A plurality of attaching parts 27 arranged one above the other are selected according to the diameter of the rear wheel, the pivot member 81 is attached, and therefore, the attaching height of the pivot member 81 can be optionally adjusted.
Patent TW-494644-B (TW)
Title: Method for selecting access register
Inventor: LIANG JING-JE
IPC: G06F9/30
Filed: 2001-07-09
Granted: 2002-07-11
Abstract: A method for selecting access register is disclosed, which includes the following steps: first, converting the original register file with six modes into the register file with two modes based on the conversion mode; selecting the conversion mode 0 or the conversion 1 according to the selection mode bit; if selected with the conversion mode 0, selecting the real register or a program counter of conversion mode 0 according to the bit of the selection register; if selected with the conversion mode 1, selecting the real register or one of the virtual program counter of conversion mode 1 according to the bit of the selection register; and, proceeding with the access operation.
Patent TW-497993-B (TW)
Title: Paint production method, painting method and paint production data management system
Inventor: ANDO YOSHIO
IPC: C09D7/80
Filed: 2001-07-12
Granted: 2002-08-11
Abstract: The present invention relates to a color paint system, communications network and paint production data management system, in which a paint producer and color painter exchange information necessary to produce the paint, such as the object to be painted, the paint conditions, the paint, the color, etc., via the communications network and paint is produced that matches the color concept proposed by the color painter on the basis of the information exchanged.
Patent TW-548087-B (TW)
Title: Cooking utensil
Inventor: SUZUKI AKIRA
IPC: F24C3/12
Filed: 2001-07-13
Granted: 2003-08-21
Abstract: The object of the present invention is to simply and correctly perform the count of the period of time actually elapsed. The solution of the present invention is that after it is confirmed that oil reaches a predetermined temperature in S5, a predetermined amount of foodstuff is charged into an oil tank, and when a switch is pushed in S7, a cooking timer starts with a preset time and concurrently the count of the actually elapsed time also starts in S8. At this time, an operation panel displays the count of the cooking timer and that of the actually elapsed time on displays adjacent to each other. When it is determined that the cooking timer reaches the conclusion of the predetermined elapsed time in S9, the count of the really elapsed time is also stopped and displayed on the display in S10.
Patent TW-529035-B (TW)
Title: Device and method for repairing inside of reactor pressure vessel
Inventor: KUROSAWA KOUICHI
IPC: G21C19/02
Filed: 2001-09-20
Granted: 2003-04-21
Abstract: An opening portion 3 is produced by cutting a recirculating piping 72 connected to a recirculating nozzle 2 of a reactor pressure vessel 1. A repairing device is brought into an annulus 10 of the reactor pressure vessel 1 from the opening 3, thereby repairing the annulus 10.
Patent TW-522243-B (TW)
Title: Burn-in oven for testing electronic devices
Inventor: LEE CHEN-TSAI
IPC: G01R15/12
Filed: 2001-09-27
Granted: 2003-03-01
Abstract: A burn-in oven for testing electronic devices is provided. The burn-in oven comprises a housing, at least a first track, at least a second track, at least a burn-in board and a plurality of electrical connectors. The first track is disposed on an inner wall of the housing and the second track is disposed on an opposite inner wall of the housing. The burn-in board is moveably supported on a pair of the first track and the second track. The burn-in board contains a top surface and a bottom surface. The plurality of electrical connectors are disposed on the bottom surface of the burn-in board. Each electrical connector receives an electronic device to provide electric contact to the electrical connector, so as to proceed a burn-in test.
Patent TW-I258835-B (TW)
Title: Electrochemical plating buffering semiconductor structure and interconnection process
Inventor: LIU CHUNG-SHI
IPC: H01L21/768
Filed: 2001-10-02
Granted: 2006-07-21
Abstract: An interconnection process includes the following steps: at first, providing an inter-metal dielectrics containing wafer. Subsequently, onto the afore-mentioned inter-metal dielectrics surrounding the wafer are formed with a plurality of copper plug sets, each of which comprises a plurality of copper plugs. Afterwards, onto the afore-mentioned copper plug a plurality of copper connection pads are formed, with the top of which is cut at the same level with the top of the afore-mentioned inter-metal dielectrics. Subsequently, onto the tops of inter-metal dielectrics and copper connection pad the barrier layer is formed, onto which is formed with the copper seed layer. Then, by means of the electrochemical plating instrument, the electrochemical plating process is carried out to form the copper layer, at the same time when the electrode of the above-mentioned electrochemical plating instrument touches and connects to the copper bond pad. Finally, the chemical mechanical polishing process is carried out on the copper layer.
Patent TW-519671-B (TW)
Title: Passive bipolar arc control system and method
Inventor: SELLERS JEFF C
IPC: H01J37/34
Filed: 2001-10-04
Granted: 2003-02-01
Abstract: A method and system for controlling arcs in a DC sputtering system with a passive circuit is presented. The arc control system includes a sputtering chamber that houses an anode and a sputtering target formed from a target material and serving as a cathode. A DC power supply provides a DC voltage between the cathode and anode such that a cathode current flows from the anode to the cathode. A resonant network is coupled between the DC power supply and the chamber. The resonant network has sufficient Q so that in reaction to an arc, the cathode current resonates through zero, causing a positive voltage to be applied between the cathode and anode. A reverse voltage clamp is coupled across the resonant network to clamp the cathode voltage to a predetermined reverse voltage. The reverse cathode voltage inhibits subsequent arcing by positively charging insulated deposits on the sputtering target. The arc control system limits the quantity of energy that is dissipated by the arc.
Patent TW-520553-B (TW)
Title: Method of manufacturing a contact of a semiconductor device using cluster apparatus having at least one plasma pretreatment module
Inventor: CHUNG SEUNG-PIL
IPC: H01L21/768
Filed: 2001-11-08
Granted: 2003-02-11
Abstract: A method of manufacturing a contact of a semiconductor device includes a series of pretreatment processes each performed in a plasma pretreatment module. A semiconductor substrate has an interlayer formed on an underlayer of a material containing silicon. A contact hole is formed in the interlayer to expose a surface of the underlayer. Subsequently, the semiconductor substrate is loaded into a plasma pretreatment module. The photoresist pattern is removed by ashing in the plasma pretreatment module. A damaged layer at the surface exposed by the contact hole is then removed in the plasma pretreatment module. Subsequently, the semiconductor substrate is pre-cleaned in the plasma pretreatment module. The semiconductor substrate is then transferred, while in a vacuum, to a deposition module. There, an upper layer is formed on the substrate to fill the contact hole.
Patent TW-515745-B (TW)
Title: Barrel assembly
Inventor: KESTLE MARTIN
IPC: B22D17/30
Filed: 2001-11-30
Granted: 2003-01-01
Abstract: The invention relates broadly to injection molding machines and more particularly to a novel barrel assembly for use in an injection unit of an injection molding machine. Barrels are conventionally mounted at an end in a carriage of an injection unit. Axial carriage force is directed along the entire length of the barrel which requires a thick barrel wall to withstand the axial carriage force. A barrel assembly is disclosed having a first barrel coupler and a second barrel coupler. The first barrel coupler secures the barrel intermediate the ends of the barrel to a carriage. The second barrel coupler retains an end of the barrel in the carriage preventing rotation of the barrel during operation. The barrel section between the first barrel coupler and an end of the barrel is isolated from axial carriage force in operation.
Patent TW-527788-B (TW)
Title: A method and an apparatus for a waveform quality measurement
Inventor: MONTOJO JUAN
IPC: H04B17/00
Filed: 2001-12-14
Granted: 2003-04-11
Abstract: A method and an apparatus for waveform quality measurement are disclosed. An actual signal, representing a waveform channelized both in time and in code is generated by, e.g., an exemplary HDR communication system. Test equipment generates an ideal waveform corresponding to the actual waveform. The test equipment then generates an estimate of offsets between parameters of the actual waveform and the ideal waveform, and the offsets are used to compensate the actual waveform. The test equipment then evaluates various waveform quality measurements utilizing the compensated actual waveform and the corresponding ideal waveform. Definitions of the various waveform quality measurements as well as conceptual and practical examples of processing of the actual waveform and the corresponding ideal waveform by the test equipment are disclosed. The disclosed method and apparatus may be extended to any waveform channelized both in time and in code regardless of the equipment that generated the waveform.