baber/WOPTO huggingface dataset:
Patent JP-H07193499-A (JP)
Title: Atomic oscillator
Inventor: KOGA YASUYOSHI
IPC: H03L7/26
Filed: 1993-12-27
Abstract: PURPOSE:To improve stability of an output frequency in an atomic oscillator for generating optical/microwave double resonance by making a laser beam and a microwave incident an a double resonant cell. CONSTITUTION:A laser light source 21 for supplying a laser beam (c) to a double resonant cell 23 at the body 22 of the atomic osicllator is provided with a laser diode 4 for generating the laser beam (c) and an absorptive cell 6, in which the same absorptive gas as absorptive gas 11 sealed in the double resonant cell 23 together with buffer gas is sealed. By transmitting the laser beam (c) generated by the laser diode 4 through this absorptive cell 6, an optical frequency F of the laser beam (c) is controlled so as to be matched with a saturated absorptive line provided with an optical frequency FST closest to an optical frequency FC1 of a linear absorptive line shifted by the buffer gas of the absorptive gas 11 sealed in the double resonant cell 23.
Patent JP-H11156975-A (JP)
Title: Heat insulating member with high recycling properties
Inventor: TAKADA TAKESHI
IPC: F16L59/06
Filed: 1997-12-02
Abstract: PROBLEM TO BE SOLVED: To provide a heat insulating member with combined high heat insulating properties and high recycling properties by reducing the heat conduction by a metal plate forming the outer part to a maximum possible extent so that the member can withstand its proper use and at the same time, forming a honeycomb structure only of a material with high recycling properties. SOLUTION: This heat insulating member is of such construction that the interior is hermetically sealed with a stainless steel plate 2 with a paper honeycomb structure arranged internally and further, is maintained at an air pressure which is at most, equal to an atmospheric pressure. In addition, the stainless steel plate 2 is either of an austenite stainless steel plate whose plate thickness is 1/25 or less of the total thickness of the heat insulating member or a ferrite stainless steel plate whose plate thickness is 1/30 or less of the total thickness of the heat insulating member, or both of these stainless steel plates.
Patent JP-H04197477-A (JP)
Title: Apparatus for washing machining product
Inventor: TAKATSUKURI HIDEKI
IPC: B08B3/02
Filed: 1990-11-28
Abstract: PURPOSE:To reduce an insufficiently washed part as low as possible by mounting a first feed mechanism reciprocally feeding an object to be washed at a predetermined stroke and a second feed mechanism reciprocally feeding a jet nozzle and also mounting a control means altering the feed speed to a higher or lower speed than that in the previous process. CONSTITUTION:The feed stand 3 sent in a washing apparatus is sent at a first predetermined speed V1 from the door 9 side to the opposite side of a washing apparatus and, during this period, a pressurized washing solution is injected to an object W to be washed from upper, lower, left and right jet nozzles 7. When the object W to be washed reaches the opposite end part of the washing apparatus, compressed air is sent in a cylindrical member 11 to rotate a support table 2 by 90 deg.. Then, the feed stand 3 is sent toward the door 9 at the first speed V1 in the reverse direction. Since the jet nozzles 7 are driven to reciprocally slide at constant speed during this period, the jet position of the injected pressurized washing solution moves on a locus A1 in the reverse direction. The front and rear surfaces to which the pressurized washing solution is not injected in the previous process of the object W to be washed are washed during this period.
Patent JP-H04193687-A (JP)
Title: Steering operation structure for work vehicle
Inventor: MINAMI TERUO
IPC: B62D11/08
Filed: 1990-11-28
Abstract: PURPOSE:To eliminate a sense of inconguous feeling given to an operator and improve operationability by changing the sequence of a state, in which a side clutch is put into cut-off operation, and a state, in which a low-speed power transmission mechanism operates, so that a turning circle can be made smaller in accordance with the amount of operation of an operating lever, from the neutral position. CONSTITUTION:This structure is provided with side clutches 25R, 25L, which can freely transmit or cut off the power to selected, either one of the right and left traveling devices, and a low-speed powder transmission mechanism, which transmits to one of the two traveling devices the normal rotation power with a speed lower than that in the other traveling device. Next, a single operating lever 39 is linked with the side clutches 25R, 25L and the low-speed power transmission mechanism in such a manner that, when the operating lever 39 is operated from a neutral position N to a first swing position, R1, L1, the power to the side clutches 25R, 25L is cut off and, moreover, when the lever 39 is moved from the first swing position R1, L1 to the second swing position R2, L2, one of the two traveling devices is put into low-speed driving. This linkage is established by a mechanism containing both a first balance arm 35 fixed to an operating arm 28, which operates a variable relief valve 35, and a second balance arm 40.
Patent JP-H02179721-A (JP)
Title: Manufacture of bumper having closed section
Inventor: YAMAMOTO TOSHIAKI
IPC: B29C49/20
Filed: 1988-12-29
Abstract: PURPOSE:To make transfer of the surface of a die favorable, by a method wherein blow molding is performed after thin thermoplastic resin is made to run after the surface of the die of a blow molding die through vacuum molding by heating the thin thermoplastic resin. CONSTITUTION:Both ends of a polypropylene sheet are supported with supporting members 2, 2 as a skin material 1, which is arranged on a blow molding bottom force 3 which has a die surface 31 in a product form of the front of a bumper and bored a vacuum drawing hole 32 capable of performing vacuum molding. The same is heated close by the softening point by a heater H, sucked to a die surface side through the vacuum molding and the same is run after the mold surface 31 so that the same is stuck close to the die surface 31. Then an unnecessary part 11 of the skin material 1 is trimmed with a trimming mold 4. Then when the trimmed skin material 1 is not released from a die as the same is run after the die surface 31, a hollow material 6 made of polypropylene is trimmed interiorly, mold register of a top force 5 is performed, the inside of the hollow material 6 is pressurized and blow molding is performed, the hollow material 6 is expanded so that the hollow material 6 is run after the surfaces 31 of the top and bottom force and the surface of the bottom force is stuck close to the skin material 1. Then the skin material 1 is stuck close to the front of the front part of the bumper P having a closed section and a product whose mold transfer is favorable is completed by removing flashes 7.
Patent JP-H03191523-A (JP)
Title: Semiconductor manufacturing device
Inventor: YAMAMURA KIYOMI
IPC: H01L21/306
Filed: 1989-12-20
Abstract: PURPOSE:To enable the particles sticked on wafers to be reduced by a method wherein a solution flow rate control plate and a solution flow rate control part controlling the flow rate of a chemical solution after circulation are provided in a processing vessel. CONSTITUTION:The title device is provided with a drainage hole of a chemical solution after circulation arranged on the bottom part of a processing vessel 12 filling the role of a circulating filter ring, a solution flow rate control plate 17 feeding the chemical solution after circulation only to the wafers 11 shifted to a carrier 16 and a solution flow rate control part 18 avoiding the stagnation of the chemical solution in the part between the drainage hole and the solution flow rate control plate 17. In such an arrangement, the clean chemical solution after circulation can be fed to wafers 11 in high efficiency. Through these procedures, the particles sticked on the wafers 11 as well as the particles produced by the stagnated chemical solution 13 can be reduced.
Patent JP-H03193253-A (JP)
Title: Method for controlling surface temperature of continuous cast slab
Inventor: KONDO OSAMU
IPC: B22D11/22
Filed: 1989-12-20
Abstract: PURPOSE:To make the prescribed value or less of surface recuperative heat quantity on a cast slab itself and to produce the sound cast slab by obtaining the max. cooling water flow rate so that the presuming recovered heat quantity becomes the prescribed value or less and controlling the cast slab temp. taking the cooling water flow rate of the max. cooling water cooling flow rate or less as the set value. CONSTITUTION:The cast slab is divided into meshes based on thickness direction, besides steel kind, size thereof, length of secondary cooling zone and cooling intensity, etc., to calculate the cast slab temp. with enthalpy method. Whether deterioration of the quality of internal crack, etc., is developed or not with the recovered heat quality, is decided from relation equation between the temp. just before recuperating heat and the recuperative heat quantity on the cast slab. In the case, the recuperative heat quantity is the temp. affecting the cast slab quality, the set water flow rate is increased, and the temp. just before recuperating heat and the cast slab temp. after passing through secondary cooling zone are again obtd. Then, by repeating this operation until the temp. reaches the temp. at which the temp. does not affect the cast slab quality with the recuperative heat quantity, the set water flow rate is obtd.
Patent JP-H01179367-A (JP)
Title: Manufacture of thin film transistor
Inventor: KODAMA NORIAKI
IPC: H01L29/786
Filed: 1987-12-30
Abstract: PURPOSE:To obtain excellent reproducibility, by forming selectively materials containing impurities in such a way that side walls insulation films are formed only at the side faces of a gate electrode and forming a source and drain after diffusing the impurities from these materials to conductive thin films. CONSTITUTION:A gate insulation film 3 is formed at the surface of a gate electrode 2 which is formed selectively on an insulating substrate 1. Further, a conductive thin film 4 is formed on the gate insulating film 3. Then, an insulation film 5 is formed on the conductive thin film 4 and side wall insulation films 6 are formed by treating the insulation film 5 with an anisotropic etching. After that, a solution having a silicon compound containing conductive-type impurities as principal components is spread on the conductive thin film 4 as well as the side wall insulation films 6 and a silicide oxide 7 is formed by heat treatment at a low temperature. The surface of the conductive thin film 4 is exposed by etchback of the silicide oxide 7. And then, the conductive impurities are diffused to the conductive thin film 4 heat treatment at a high temperature. In such a case, a source 8 and drain 9 having offset regions at both sides of the gate electrode are formed by the side wall insulation films 6. Thus, a thin film transistor having an offset structure that is superior in reproducibility is obtained.
Patent JP-H11150105-A (JP)
Title: Apparatus for manufacturing semiconductor
Inventor: KOOTANI SHUICHI
IPC: C23C14/34
Filed: 1997-11-18
Abstract: PROBLEM TO BE SOLVED: To improve the uniformity of a selection rate at dry etching, to improve the accumulating speed of a chemical vapor phase epitaxy apparatus, to improve the uniformity of the sputtering speed of a sputter apparatus, and to improve the uniformity of the oxidizing speed of a diffusing apparatus. SOLUTION: This apparatus is provided with a stage 6 as a lower electrode on which a semiconductor wafer is mounted, and a chamber vessel 1 arranged so as to lover the stage 6. The etching processing of the semiconductor wafer on the stage 6 is carried out through plasma obtained by impressing a high frequency voltage from the upper part of the chamber vessel to which gas has been introduced. In this case, each resistance heater 2 is constituted of an arrangement in parallel at the stage 6 and each part constituting the chamber vessel 1 other than the vessel.
Patent JP-H11149003-A (JP)
Title: Optical prism, lens frame and optical assembly
Inventor: KOBAYASHI HIROMASA
IPC: G02B27/00
Filed: 1997-11-17
Abstract: PROBLEM TO BE SOLVED: To provide an optical prism of the kind with which the easiness of manufacture is made compatible while securing positioning accuracy with a video display element in the case of being applied as the optical components of a device for the field of an office automation equipment and the various kinds of other purposes, and a lens frame applied to the optical prism and an assembly incorporating the optical prism and the lens frame. SOLUTION: This prism is the optical prism 100 constituted so as to emit incident light from an incident plane 12 suitable to make light from a liquid crystal display 20 incident as emitted light from a specified light-emitting surface 14 by reflecting it twice or more by its inside, and the optical prism is used by coupling with the lens frame 30 constituted so as to be suitable to it, and projecting parts 90L and 90R to attach the prism at the lens frame are formed on a side face formed in a direction crossing with the directions of the incident plane 12 and the light-emitting surface 14.
Patent JP-H05146145-A (JP)
Title: Control circuit for switching regulator
Inventor: MATSUMOTO TETSUYA
IPC: H03M1/00
Filed: 1991-11-21
Abstract: PURPOSE:To provide a control circuit for a switching regulator in which fluctuation due to noise, temperature change, aging change is small and a stable output is obtained. CONSTITUTION:A control circuit for a switching regulator comprises an A/D converter 11 for converting an input voltage into a digital signal, an error amplifier 15 for calculating a difference between an output signal of the converter 11 and target data externally input to multiply it by a coefficient, and a Shanon rack type D/A converter 14 for converting the output signal of the amplifier 15 into a pulse width. The amplifier 15 has a constant adder 12 and a constant multiplier 13, and calculates base on the constants inputted and set from the exteriors.
Patent JP-H07188555-A (JP)
Title: Resin composition and molding
Inventor: KOBAYASHI KAZUHIKO
IPC: B29C45/00
Filed: 1993-12-27
Abstract: PURPOSE:To obtain a resin composition, excellent in heat and impact resistances, strength, rigidity, dimensional stability, molding processability and surface smoothness and useful as a material for lamp reflectors, etc., by melt kneading a mixture composed of a polyphenylene sulfide resin, etc., in a specific proportion. CONSTITUTION:This resin composition is obtained by melt kneading a mixture composed of (A) 20-70wt.% polyphenylene sulfide resin containing >=90mol% recurring unit expressed by, e.g. the formula, (B) 1-20wt.% whiskery aluminum borate reinforcing material having, e.g. 0.3-1.2mum average fiber diameter and 10-40mum average fiber length and (C) 29-79wt.% nonflbrous inorganic filler such as sericite or kaolin. Furthermore, this molding is obtained by injection molding the resin composition.
Patent JP-H02178631-A (JP)
Title: Thin-film diode substrate for liquid crystal display
Inventor: KATO TOSHIAKI
IPC: G02F1/136
Filed: 1988-12-29
Abstract: PURPOSE:To relieve the position accuracy of patterning of the thin-film diode substrate for liquid crystal display in which the thin semiconductor films of respective diodes extend between a light transparent substrate and metallic wirings by forming the insulating compd. of a semiconductor material on the side faces of the thin semiconductor films in contact with the metallic wirings. CONSTITUTION:Transparent electrodes 4 are formed on the glass substrate and a (p) layer 11, an (i) layer 12, an (n) layer 13, and an Al layer 7 are successively formed by a plasma CVD method thereon. These films are then patterned by photoetching while the Al layer 7 is shifted in one way from the transparent electrodes 4. The substrate is thereafter exposed to the plasma of oxygen or nitrogen, by which the part of the a-Si film 10 near the side faces thereof is converted to the insulating film 8 consisting of the silicon oxide film or silicon nitride film. The insulating compd. 8 formed on the side faces blocks the leak current or short circuiting in the transverse direction between the metallic wirings and the lower transparent electrodes of the diodes. The generation of the leak current in the transverse direction is obviated even if light is made incident to the light transparent substrate from the rear surface thereof. The need for providing a costly exposing equipment for photolithography of the insulating film requiring the strict position accuracy is eliminated in this way.
Patent JP-H06178980-A (JP)
Title: Electrolytically ionized water forming device
Inventor: YAMAGUCHI SHIYUUJI
IPC: C02F1/46
Filed: 1992-12-14
Abstract: PURPOSE:To easily and rapidly wash away the scale, rust, fur, etc., sticking and depositing electrodes, diaphragm and cell wall, etc., during the formation of electrolytically ionized water. CONSTITUTION:This electrolytically ionized water forming device is constituted by disposing the cathode electrode 3 and the anode electrode 4 so as to face each other via the diaphragm 2 within an electrolytic cell 1, supplying city water, etc., from a water feed port 1a into this cell and energizing the electrodes 3 and 4 between each other from energizing power sources 6, 7, 8, 9 to form the alkaline ionized water in a cathode chamber and acidic water in an anode chamber by an electrolysis and electric osmosis effect and utilizing the ionized water and the acidic water by discharging the water respectively from discharge ports 1b and 1c. This electrolytically ionized water forming device is provided with a polarity changeover device 12 for changing over energizing polarity in a circuit for energizing the cathode and anode electrodes 3, 4 from the above-mentioned energizing power sources. The forming device is washed by repetitively acting the cathode electrolysis and the anode electrolysis thereon while the polarity changeover device 12 is changed over alternately to positive and reverse when the pulse signals of the time intervals t1, t2 set by digital switches 20, 21 are supplied to a driver 13 by the operation of a control circuit 14 during the washing time T set by a digital switch 26 at the time of washing the device by closing a washing switch 15.
Patent JP-H09176725-A (JP)
Title: Method for simultaneously desulfurizing and dehydrogenizing molten steel
Inventor: HARASHIMA KAZUMI
IPC: C21C7/00
Filed: 1995-12-21
Abstract: PROBLEM TO BE SOLVED: To provide a method for efficiently and simultaneously executing desulfurizing and dehydrogenating reactions of molten steel. SOLUTION: At the time of simultaneously executing the desulfurizing and the dehydrogenating treatments of the molten steel charged into a ladle by applying a lime-base refining agent powder blowing method, an immersion tube is dipped into the molten steel from the upper part of the ladle and set at a blowing powder rising position. Partial pressure of oxygen in the atmosphere in the immersion tube is reduced to <=0.01(atm) and the diameter (d) of the immersion tube is controlled to satisfy the following relation with respect to the powder blowing depth H. Further, one or more, notched parts are arranged at the upper end of the outer periphery of the ladle to continuously discharge the produced slag out of the ladle. d>=D=2×xtan(12 deg.)×xH+Ld, wherein, H is the powder blowing depth and Ld is the diameter of the blowing lance.
Patent JP-H0844493-A (JP)
Title: Portable touch-pad-driven computer device
Inventor: SUTEIIBUN BISETSUTO
IPC: G06F3/048
Filed: 1994-12-05
Abstract: PURPOSE: To provide an input transducer for a portable computer device with few number of parts and at low cost. CONSTITUTION: A portable computer device is provided with a thin enclosure having two main opposing faces. A display screen is mounted on the first main opposing face of the enclosure, and a touch high sensitive object position detection inputting device is mounted on the second main opposing face of the enclosure. A computer device circuit, circuit for interfacing the touch high sensitive object position detector with the computer device circuit, and circuit for driving the display screen and all mounted in the enclosure.
Patent JP-H07273207-A (JP)
Title: Intermetallic anti-fuse with edge stop layer
Inventor: UENNJIEI CHIEN
IPC: H01L23/522
Filed: 1994-12-15
Abstract: PURPOSE: To provide an antifuse structure in which control of programming voltage is extremely facilitated. CONSTITUTION: A nitride (first nitride layer), an a-Si (first a-Si layer), a nitride (second nitride layer) and a-Si (second a-Si layer) are deposited flatly on a first metallization layer 52. A dielectric layer is then formed on the upper surface of the second a-Si layer, and a via 70 is opened in the dielectric layer using an etch gas eroding a part of the second a-Si layer practically functioning as a sacrificial etch stop layer. Subsequently, a titanium layer is formed to cover the via 70 and caused to react thermal on the remaining part of the second a-Si layer thus forming a conductive titanium silicide region 76 of identical thickness as that of the second a-Si layer at the part of the via 70. The reaction is self-controlled and stopped at the second nitride layer. Finally, a second metallization layer 80 is formed, while covering the via 70.
Patent JP-H03271270-A (JP)
Title: Preparation of sulfoxonium salt
Inventor: EDOWAADO AABINGU
IPC: C08F2/44
Filed: 1990-11-29
Abstract: PURPOSE: To improve the yield of the subject compound effectively used as a photopolymerization initiator for cation-polymerizable materials, by oxidizing a triaryl sulphonium salt under a basic condition in a solvent other than a ketone in the case of preparation of the subject compound from the sulphonium salt.  
     CONSTITUTION: The triaryl sulphonium salt as a material is oxidized by using a peracid under basic conditions in a solvent other than a ketone, to form a desired compound. As the peracid, m-chloroperbenzoic acid, magnesium monoperoxy-phthalic acid salt or the like can be preferably used in somewhat excess than an amount necessary for oxidation. As the basic conditions, for example, sodium hydroxide or potassium carbonate is preferably used, and the used amount of the same is preferably a little more than that of the peracid. As the solvent, alcohol is preferably used. The reaction temperature is preferably an ambient temperature. 
     COPYRIGHT: (C)1991,JPO
Patent JP-H09179959-A (JP)
Title: Drawing data base system
Inventor: YONEYAMA KIYOSHI
IPC: G06T1/00
Filed: 1995-12-21
Abstract: PROBLEM TO BE SOLVED: To quickly read out or write data constituting a drawing and to obtain flexible data structure by including the primitive data of each reference graphic unit in segment data. SOLUTION: A buried line is managed as 'segment' in a facility drawing data base system. About the segment, 'segment number', 'record length', 'the number of primitives', 'layer number', 'cell number', and the reference coordinates or the like of the segment are stored in a header. The data base system accesses a storage device in each segment. Primitives specified by 'the number of primitives' belonging to the segment and stored in the header follow the header. The primitive data are prepared in each constitutional element, and in this case, three straight lines A to C constitute a buried line as primitive data.