baber/WOPTO huggingface dataset:
Patent JP-S5758955-A (JP)
Title: Inclined sliding type slit nozzle
Inventor: FUKUOKA HIROMI
IPC: B22D11/06
Filed: 1980-09-24
Abstract: PURPOSE:To adjust the gap width of a slit opening finely by moving the 1st split body having a recess provided with 3 planes out of the 4 planes of the side walls enclosing the slit opening and the 2nd split body provided with the remaining one plane and fits slidably in said recess, relatively with each other thereby adjusting the gap increase to increase or decrease. CONSTITUTION:A nozzle having a slit opening of adjustable gap width is constituted by the combination of the 1st split body 1 having a recess 2 provided with 3 faces of the side walls enclosing the slit opening and the 2nd split body 4 fitting to said recess 2 provided with the remaining one face. The adjustment to increase or decrease the gap therebetween is accomplished by the opposite slopes of the bodies 1, 4 abutting slidably on both line sides of the transverse width of the slit opening. In this way, the 4 planes of the side walls enclosing the slit opening are the open outside surfaces of the separate split bodies, whereby machining of high accuracy is made possible and the fine adjustment is made possible by the relative movement of both bodies 1, 4 on the opposite slopes.
Patent JP-S5560183-A (JP)
Title: Flow layer type heat exchanger
Inventor: TAJIRI MITSUHIKO
IPC: F28D13/00
Filed: 1978-10-30
Abstract: PURPOSE: To improve efficiency and to simplify structure by letting particles forming a flow layer flow down to gas dispersion plate in where the high temperature gas side is up and the lower side is down.  
     CONSTITUTION: Gas dispersion plates 11 and 12 are set with a slop in direction from a duct of high temperature gas side to a duct of low temperature gas side. Flow layers 13 and 14 being less than approximately 20cm in the thickness are formed by letting particles flow down from an upper entrance 8, and the particles are circulated from an exist 10 to the entrance 8 by circulating device 15. The gas dispersion plates 11 and 12 release gas from gapes in heaped parts 16 and 17 like a roof tile. 
     COPYRIGHT: (C)1980,JPO&Japio
Patent JP-H0319313-A (JP)
Title: Manufacture of exposure mask
Inventor: JIYOOJI KEI SERAA
IPC: G03F1/22
Filed: 1990-05-24
Abstract: PURPOSE: To inexpensively manufacture a solid membrane suitable for X-ray lithography used for manufacturing IC, by forming a polycrystalline silicon area on the first surface of a substrate, coating the peripheral section of the second surface with a material which is hardly etched off, and then, forming a polycrystalline silicon membrane by etching the uncovered area and forming an X-ray damping area on the membrane. CONSTITUTION: A polycrystalline silicon layer 1 is formed on one main surface of a silicon oxide-containing substrate, and the peripheral area on the other main surface of the substrate opposite to the polysilicon area 1 is coated with a material which is hardly removed during etching treatment. After the peripheral section of the substrate is coated with an appropriate material, the substrate is subjected to selective etching. The etching treatment is continued until the uncovered area of the substrate is nearly completely etched off, and a structure containing the peripheral area 2 and a membrane 1 is obtained. Then, an X-ray damping material layer is formed on the membrane after the membrane is formed or on the material which is formed to the membrane before the membrane is formed by using the ordinary lithographic technique.
Patent JP-H0427302-A (JP)
Title: Mower and mowing
Inventor: ISHIDA MINORU
IPC: A01M21/02
Filed: 1990-05-23
Abstract: PURPOSE:To mow weeds by inclining a conveyer and a mown weed-supporting piece on the ground side toward the direction going away from the ground in the direction opposite to the traveling direction of a mower, moving a weed- pressing piece back and forth towards a receiving unit, gradually raising held weeds and pulling out the weeds. CONSTITUTION:A unit 6 capable of inclining a conveyer 5 in the direction opposite to the traveling direction of a mower so that the conveyor may gradually go away from the ground is equipped. Weeds are nipped between a weed- supporting piece 7 and a weeds-pressing piece 8 and gradually raised in the vertical direction in a nipped state, thus pulling out the roots of the weeds from the ground.
Patent JP-S5835754-A (JP)
Title: Magnetic recorder and reproducer
Inventor: HASHIMOTO KOUSUKE
IPC: G11B15/44
Filed: 1981-08-24
Abstract: PURPOSE:To attain an automatic reversing with a simple mechanism, by picking up the revolution of an induction motor having a sprescribed slip with a synchronous motor turning a capstan shaft and driving a reel. CONSTITUTION:A coil housing 2 having a coil 4 and a magnetic flux detection element 5 is fixed to a base 11. A rotor 9 consisting of a rotor disc 7 and a rotor magnet 8 is fixed to a capstan shaft 6 one end of which is borne with a bearing 3. A rotor 10 made of a soft iron plate is inserted to an end 6b with step of a middle part of the capstan shaft 6 and is rotated with a prescribed slip with the rotor 9. A slip torque of the rotor 10 is delivered to one of gears 14b, 14c fitted to a shaking arm 14a via a pinion 13. The gears 14b, 14c are respectively geared with the gears (not shown) of supply and rewinding reels for forward or reversing. The tape running is controlled by controlling the direction and magnitude of a current flowing to the coil 4, allowing to form a simple automatic reverse mechanism.
Patent JP-H0427937-A (JP)
Title: Silver halide photographic sensitive material
Inventor: KURAKI YASUO
IPC: G03C1/85
Filed: 1990-05-23
Abstract: PURPOSE:To provide the photographic sensitive material having excellent antistatic performance without impairing transparency by applying a conductive layer consisting of granular or fibrous metal oxides essentially consisting of Zn, Ti, Sn, Al, In, Si, Mg, Ba, MO, W, and V on a primer consisting of a hydrophilic binder contg. an inorg. salt. CONSTITUTION:The conductive metal oxides to be applied on the primer layer consisting of the hydrophilic binder contg. the inorg. salt are the crystalline metal oxide particles. The particles which contain oxygen defects and contain a slight amt. of the different kinds of atoms forming the donor to the metal oxides to be used are more particularly preferable as the above-mentioned metal oxides. The examples of the metal oxides are preferably ZnO, TiO2, SnO2, Al2O3, In2O3, SiO2, MgO, BaO, MoO3, V2O5, etc., or the multi component oxides thereof and are more particularly preferably ZnO, TiO2 and SiO2. The volumetric resistivity of the fine particles of the metal oxides is preferably <=10<7>OMEGA-cm, more particularly preferably <=10<5>OMEGA-cm. The less generation frequen cies of static marks and dust sticking and the excellent transparency and adhe siveness are attained by incorporating the inorg. salts and the metal oxides into the specific layers in such a manner.
Patent JP-S62288106-A (JP)
Title: Production of ii-vi compound
Inventor: MOCHIZUKI KATSUMI
IPC: C01B19/00
Filed: 1986-06-09
Abstract: PURPOSE:To produce a high-purity II-VI compound preventing the hazard of burst, etc., by using a reaction vessel having a reaction part connected with a vapor-pressure controlling part and reacting a group II element with a group VI element. CONSTITUTION:The reaction vessel V is composed of a reaction part 1 made of quartz, etc., and a vapor-pressure controlling part 2 connected to the reaction part through a thin tube 3 made of quartz, etc. A boat 4 in the reaction part 1 is loaded with specific amounts of e.g. Cd and Te and evacuated to vacuum. Furnaces 5 and 6 are heated at equal heating rates and the reaction part 1 and the vapor-pressure controlling part 2 are heated at about 800 deg.C and maintained at the temperature for about 1 day. The temperature in the furnace 6 is maintained at the level and the furnace 5 is heated further and maintained at about 1,000 deg.C for 1 day then at about 1,100 deg.C for 1 day. The reaction of Cd with Te in the boat 4 proceeds under the condition to form a CdTe compound.
Patent JP-H01302170-A (JP)
Title: Semiconductor sensor apparatus
Inventor: TSUGAI MASAHIRO
IPC: G01P15/12
Filed: 1988-05-30
Abstract: PURPOSE:To judge a breakage of a sensor element caused by abnormality, by forming a plurality of piezoelectric resistances and detection resistances on a thin part forming deflecting part for detection of a signal of the semiconductor sensor element to compare the potential of a detection electrode with a set value in normal state. CONSTITUTION:A plurality of piezoelectric resistances 32 and one detection resistance 34a are formed on a thin part 31a for detection of signals of a semiconductor sensor element 31 and one detection resistance 34b if formed in a fixed section area. A detection voltage V3 as given when a cantilever beam 31 is normal can be set at a desired fixed value by selecting values of resistances R5 and R6. When the element is broken in a breakage forecast area H of the cantilever beam 31, a wire 35 in the area is cut off and the voltage V3 moves to a voltage value of an earth electrode Tg thereby allowing judgement of the breakage of the sensor element.
Patent JP-S5656254-A (JP)
Title: Silencer for electrostatic spray painting machine
Inventor: INOUE YOSHIMI
IPC: B05B5/04
Filed: 1979-10-15
Abstract: PURPOSE: To eliminate the sound of exhaust air by providing an exhaust port for air to an air motor and also drawing out one end of a flexible silencing hose whose other end is connected to the exhaust port.  
     CONSTITUTION: The electrostatic spray painting machine consists of an air motor 1, an air supplier 2 through which air to turn the air motor is supplied into the air motor, a rotary disk 3, a paint supplier 4 through which paint is supplied to the disk 3, and a high voltage generator 5 from which a high voltage is supplied to the disk 3. The air motor 1 is provided with the exhaust port 6 for air, and one end of a silencing hose 7 is connected to the exhaust port 6 and the other end is withdrawn to the open air. Thus, no discharge of air in a disk booth 25 occurs and no disturbance in paint being applied occurs during painting operation. 
     COPYRIGHT: (C)1981,JPO&Japio
Patent JP-H0427315-A (JP)
Title: Thresher
Inventor: SHOMURA TAKAO
IPC: A01F12/32
Filed: 1990-05-23
Abstract: PURPOSE:To provide a thresher so designed that a specific flow guide between a straw rack and lower side grain pan and grain sieve, thereby making screening operations in high accuracy irrespective of the amount of grain culms to be treated per unit time. CONSTITUTION:When the amount of grains to be treated on the upper grain pan 8 and a front straw rack 9 is small and low in flow level, a flow guide 20 is made projected to guide the grains to be treated to the lower grain pan 12. On the other hand, when being high in flow level, said guide 20 is made retreated to guide the grains to be treated to the lower grain pan 12 and a grain sieve 13, thus ensuring cloggings not to be caused.
Patent JP-S63300335-A (JP)
Title: Measurement system for number of times of instruction execution of program
Inventor: MURAKAMI KENICHI
IPC: G06F11/34
Filed: 1987-05-30
Abstract: PURPOSE:To obtain reference for the performance improvement of a program (specially, a control program) by outputting execution times by priority levels to a measurement result list to be edited and outputted. CONSTITUTION:A measurement result editing and output part 23 calculates the execution time of a priority level 1 (multiplies the number of times of execution in an instruction execution frequency storage array 61 by an execution time in an instruction execution time correspondence table 7 and totalizes multiplication results by the instructions), and edits and outputs the calculation result to an output device 8. The execution time of even the same instruction in the instruction execution time correspondence table 7 is different, so the execution times of the instructions are made to correspond by the kinds of the instructions and the kinds of computers, thereby measuring the execution time of each priority level by the kinds of the computers.
Patent JP-H01301711-A (JP)
Title: Production of copolyester
Inventor: KIDAI OSAMU
IPC: C08G63/66
Filed: 1988-05-31
Abstract: PURPOSE:To obtain the subject polymer excellent in moldability, elastic modulus, strength and elongation and suitable for a molding composition, a film, etc., by reacting and polymerizing a specified oligoester with an acyloxycarboxylic acid and a hydroxycarboxylic acid. CONSTITUTION:(A) An oligoester consisting of a repeating unit of formula I (R<1> is 6-20C aromatic group, etc.; R<2> is 2-40C aliphatic group, etc.) obtained by polycondensation between (i) a dicarboxylic acid such as terephthalic acid and (ii) a diol such as ethylene glycol, (B) an acyloxycarboxylic acid (e.g. p- acetoxybenzoic acid) expressed by formula II (R<3> is 6-20C aromatic group, etc.; R<4> is 1-8C alkyl group, etc.) and (C) a hydroxycarboxylic acid (e.g. 4-beta- hydroxyethoxybenzoic acid) of formula III (R<5> is 2-40C aliphatic group, etc.; R<6> is 6-20C aromatic group, etc.) are mixed and, e.g. reacted at 200-320 deg.C to provide the objective polymer.
Patent JP-H0428236-A (JP)
Title: Manufacture of semiconductor device
Inventor: OKUDA YASUSHI
IPC: H01L29/78
Filed: 1990-05-23
Abstract: PURPOSE:To realize the miniaturization and speedup of a field-effect transistor by a method wherein an impurity is ion-implanted in the surface of a semiconductor substrate from over a film, which is formed in such a way that the semiconductor substrate is exposed and has a prescribed film thickness, perpendicularly to the width direction of a channel and at a prescribed tilt angle. CONSTITUTION:Element isolation regions 4 and source and drain layers 6 are formed on and in the surface of a semiconductor substrate 1. Then, a silicon oxide film 7 is deposited on the whole surface by a desired film thickness and moreover, a desired region only, which is located at a gate electrode formation part 8, of the film 7 is selectively removed to expose the substrate 1. Then, the surface of the substrate 1 is thinly oxidized for protection and ions are implanted perpendicularly to the lengthwise direction of a channel to form a P<+> buried layer 9. Subsequently, a channel part 10 is formed. Moreover, arsenic ions (As<+>) are ion-implanted from both directions of the source and drain layers 6 perpendicularly to the width direction of the channel and at a desired incident angle (e.g., 45 degrees) to the surface of the P-type semiconductor substrate 1, whereby when N<-> semiconductor layers 11 are formed, the film 7 constitutes a barrier and a region, in which the arsenic ions (As<+>) are not implanted, is formed. As a result, the source and drain layers 6 can be precisely formed at specified regions in the gate electrode formation part.
Patent JP-S5923099-A (JP)
Title: Fan of the type in which its blades are turned directly
Inventor: KOJIYOU SHIGERU
IPC: F04D25/06
Filed: 1982-07-28
Abstract: PURPOSE:To obtain a fan of the type coupled with a motor as a unit, which can be operated highly efficiently, by turning blades directly by disposing a rotor around the periphery of the fan blades and disposing a stator in the manner of holding the rotor from the opposite sides thereof. CONSTITUTION:A rotor 1 (ring-like copper plate) is disposed around the periphery of fan blades 3 which are turned around a shaft 5, and a stator 2 (iron core in the form of a flat plate having three-phase winding wound therearound) is disposed in the manner of holding the stator 1 from both sides thereof, thus making the circumferential portions of the blades 3 function as a linear motor. This linear motor produces a magnetic field shifted laterally in the plane of the iron core in the form of a flat plate, and the rotor 1 is moved by the magnetic attractive force of the magnetic field. That is, the rotor 1 is turned by reason of its ring-like form. Thus, since the blades 3 are turned directly, the loss due to wear of a belt and slippage between the belt and pulleys can be eliminated, so that the fan can be operated efficiently and safely.
Patent JP-H08330391-A (JP)
Title: Picking-up device and method
Inventor: HONDA MOTOHARU
IPC: H01L21/68
Filed: 1995-05-31
Abstract: PURPOSE: To improve the index of chips, during the picking-up operation of a first chip, by holding in a waiting state an adjacent second chip to the first chip which precedes the first chip, after determining its quality based on its precedent recognition data, and by increasing the speeds of the picking-up operations of the chips. CONSTITUTION: Many chips arranged in an array state are photographed, and while the qualities of the chips are sensed based on their picture recognition data in a photographed camera visual field m, the chip of a good quality is disposed in the center of the camera visual field m to be picked up in succession. In that case, setting three adjacent chips T0 -T2 along the sensing direction of the chips in the camera visual field m, their picture recognitions are performed. Further, during the picking-up operation of the one chip T1 present in the center of the camera visual field m, the adjacent chip T2 to the chip T1 which precedes the chip T1 along the sensing direction is held in a waiting state, after the quality of the chip T2 is determined by performing its picture recognition in the camera visual field m and based on this precedent recognition data from the camera visual field m.
Patent JP-S61291779-A (JP)
Title: Method and apparatus for converting energy using gas selecting permeable material
Inventor: FUKAYA TOSHIO
IPC: F03G7/00
Filed: 1985-06-19
Abstract: PURPOSE:To utilize effectively energy by producing differential pressure between gas components through a gas selecting permeable material and converting this differential pressure to energy easy to utilize. CONSTITUTION:An upper portion of a container 1 is constituted from a gas selecting permeable material 2 like polyimide resin film reinforced with a perforated glass for example. This container 1 is disposed in the atmosphere which makes the gas selecting permeable material 2 less permeable, and gas component GA such as permeable carbon dioxide, herium, neon, is enclosed in the container 1. this gas component GA permeates through said material 2 to produce differential pressure between the atmosphere and the interior of the container 1 to pump up water into the container 1 through a pipe with this differential pressure.
Patent JP-H02311333-A (JP)
Title: Preparation of antifogging glass
Inventor: NAKAMURA ICHIRO
IPC: C03C17/42
Filed: 1989-05-26
Abstract: PURPOSE:To contrive to improve the mar-proof property of an antifogging glass by treating the metal oxide layer-formed surface of a glass substrate with a treating agent containing an aliphatic hydrocarbon having one or more hydroxyl groups and any other functional group and/or an aliphatic hydrocarbon having only plural hydroxyl groups. CONSTITUTION:The monolayer film of a metal oxide such as SiO2 or the laminate film having the layer of the metal oxide at the topmost layer thereof is formed on a glass substrate comprising optical glass made of borosilicate or plate glass by a sol-gel method, etc. The film-formed glass substrate is immersed at 50 to 60 deg.C for >=5min in a treating solution containing an aliphatic hydrocarbon having one or more of hydroxyl groups and a functional group other than the hydroxyl group such as nitroethanol and/or an aliphatic hydrocarbon having three or more of the hydroxyl groups and not having any other functional group such as glycerol, diluted with an organic solvent to give the concentration of the hydrophilic organic hydrocarbon of >=10wt.%, and adjusted to a pH of 7 to 12. The treated glass substrate is lifted up from the treating solution and washed with water to provide the antifogging glass having excellent mar-proof property.
Patent JP-S62290732-A (JP)
Title: Production of low-hardness rubber abrasive
Inventor: AOSHIMA MASASHI
IPC: C09K3/14
Filed: 1986-06-10
Abstract: PURPOSE:To produce the title abrasive excellent in flexibility and elasticity, by incorporating a polymeric elastomer which does not crosslink with a crosslinking agent. CONSTITUTION:Abrasive grains (e.g., diamond dust), a crosslinking agent, 100pts. wt. binder rubber which can crosslink with the crosslinking agent (e.g., butadiene rubber), 20-100pts.wt. polymeric elastomer which does not crosslink with the crosslinking agent (e.g., ethylene/alpha-olefin copolymer) and, optionally, carbon black, a white pigment (e.g., clay), a crosslinking accelerator, a crosslinking aid, a process oil, a low-MW plasticizer, an antioxidant, etc., are mixed together and molded. The obtained molding is crosslinked.
Patent JP-S61292943-A (JP)
Title: Filler for resin sealed type semiconductor device
Inventor: MATSUKAWA KEIZO
IPC: H01L23/29
Filed: 1985-06-21
Abstract: PURPOSE:To avoid the disconnection of a wiring layer by coating the surfaces of fillers for a semiconductor sealing material with a synthetic resin film, which is softer than a passivation film, does not contain an alpha-ray generation source and has high purity. CONSTITUTION:Fillers 10 are manufactured by coating the surface of fillers 11 with coatings 12. The coating 12 must be softer than a passivation film, and the coating the surfaces of the fillers must be softer than the passivation film because the passivation film cannot absorb stress when the sharp corners of the fillers are brought into contact with the passivation film. A material having high purity which does not contain an alpha-ray generation source is proper as the coating 12. Resin seal type semiconductor devices can be acquired in such a manner than semiconductor elements 14 are mounted to multiple lead frames 15, the elements 14 and the lead frames 15 are wire-bonded by connector wires 16 and said element assemblies are introduced into a molding die, transfer- molded with a sealing resin 13 to which the fillers 10 are added, and cut and separated severally.
Patent JP-S6025234-A (JP)
Title: Microwave plasma processor
Inventor: FUJIMURA SHIYUUZOU
IPC: H01L21/302
Filed: 1983-07-21
Abstract: PURPOSE:To improve excitation efficiency, and to contrive to hold long life of a penetrating window and other parts, etc. of a microwave plasma processor by a method wherein an inside wall is provided inside of the wall of a process chamber to perform the plasma process of a processing sample by converting gas of a plasma generating part into plasma, and reaction gas is guided to the microwave penetrating window face along the inside wall. CONSTITUTION:An inside wall 10 is provided inside of the peripheral side wall 11 of a plasma generating chamber 3, and reaction gas is introduced into space between the outside wall 11 thereof. An O-ring is provided at the top part of the inside wall 10 thereof, a circular slit 13 is formed along a top wall 12 holding a penetrating window 1, and gas to be converted into plasma is jetted from the slit thereof. Because gas jetted from the slit 13 flows along the top wall 12, the top wall 12 is cooled, gas before conversion into plasma comes not in contact directly with the penetrating window, and rapidly cooling of the penetrating window is avoided. The penetratig window is not damaged even when it is formed of alumina, and moreover even when a quartz penetrating window is used, because it is held at a low temperature, etching is hard to be generated.
Patent JP-S6024736-A (JP)
Inventor: GIRUBAATO CHIYAARUSU HAAMERING
IPC: H03D7/14
Filed: 1984-06-27
Abstract: (57)【要約】本公報は電子出願前の出願データであるた め要約のデータは記録されません。