Patent EA-002900-B1 (EA)
Title: Solid-state material
Inventor: KRUTOVA ELENA IGOREVNA
IPC: H01L41/335
Filed: 1998-12-30
Abstract: 1. A process for treating of a blank of solid state material, characterized by forming of pores in the surface layer of the blank material, said pores having a diameter of up to 200μm and the filling of the said pores with filaments made from a different material or from the same material as that of the blank. 2. A process in accordance with Claim 1, characterised in that several nanofilaments are placed in each pore. 3. A process in accordance with Claim 1 or 2, characterised in that the pores are formed in the material by electrical erosion treatment, and the filling of the pores is carried out by local ion precipitation of the filament material. 4. A process in accordance with any of Claims 1 to 3, characterised in that the material being treated is a ceramic material, and the material for filling the pores is metal. 5. A process in accordance with any preceding Claim, characterised in that the material being treated is piezo-ceramic. 6. A process in accordance with any of Claims 1 to 5, characterised in that the material for filling the pores is silver. 7. A process in accordance with any of Claims 1 to 5, characterised in that the material for filling the pores is gold. 8. A process in accordance with any of Claims 1 to 5, characterised in that the material for filling the pores is platinum. 9. A process in accordance with any of Claims 1 to 5, characterised in that the material for filling the pores is copper. 10. A process in accordance with any of Claims 1 to 3, characterised in that the material being treated is metal, and the material for filling the pores is a semiconductor material. 11. A process in accordance with any of Claims 1 to 3, characterised in that the material being treated is metal, and the material for filling the pores is a dielectric material. 12. A process for treating components, comprising: the formation of pores at least in the surface layer of the material from which the component being treated is made, said pores having a size of up to 200μm; filling the said pores with filaments made from a different material or from the same material as that of the component. 13. A process in accordance with Claim 12, characterised in that the pores are formed in the material of the component by electrical erosion treatment, and the filling of them is carried out by local ion precipitation of the filament material. 14. A process in accordance with Claim 12 or 13, characterised in that the component being treated is made of a ceramic material, and the pore-filling material is metal. 15. A process in accordance with Claim 13, characterised in that the component being treated is made of a piezo-ceramic material. 16. A process in accordance with Claim 14, characterised in that the material for filling the pores is silver. 17. A process in accordance with Claim 15, characterised in that the material for filling the pores is gold. 18. A process in accordance with Claim 15, characterised in that the material for filling the pores is platinum. 19. A process in accordance with Claim 15, characterised in that the material for filling the pores is copper. 20. A process in accordance with Claim 12 or 13, characterised in that the component being treated is made of metal, and the material for filling the pores is a semiconductor material. 21. A process in accordance with Claim 12 or 13, characterised in that the component being treated is made of metal, and the material for filling the pores is a dielectric material. 22. A solid state material, characterised in that pores with a diameter of 10 to 200μm are formed at least in a surface layer of the material, and filaments of a different material are placed in the pores. 23. A solid state material, characterised in that pores with a diameter of 10 to 200μm are formed at least in a surface layer of the material, and filaments of the same material are placed in the pores. 24. A material as claimed in Claim 22 or 23, characterised in that the pores have a depth from 100 to 1000μm. 25. A material as claimed in Claim 24, characterised in that it is a ceramic material, and the filaments filling the pores are made of metal. 26. A material as claimed in Claim 25, characterised in that it is piezo-ceramic. 27. A material as claimed in Claim 26, characterised in that the filaments filling the pores are made of silver. 28. A material as claimed in Claim 26, characterised in that the filaments filling the pores are made of gold. 29. A material as claimed in Claim 26, characterised in that the filaments filling the pores are made of platinum. 30. A material as claimed in Claim 26, characterised in that the filaments filling the pores are made of copper. 31. A material as claimed in Claim 22, characterised in that it is metal, and the filaments filling the pores are made of a semiconductor material. 32. A material as claimed in Claim 22, characterised in that it is metal, and the filaments filling the pores are made of a dielectric material.