baber/WOPTO huggingface dataset:
Patent JP-2010197200-A (JP)
Title: Impeller device and method of manufacturing rotary impeller
Inventor: ODA SHOTA
IPC: G01B7/30
Filed: 2009-02-25
Abstract: <P>PROBLEM TO BE SOLVED: To provide an impeller device having high position precision of a magnetic detection member, such as a magnetic body, buried into a rotary impeller and high reliability to sealing of the magnetic detection member to be buried, and to provide a method of manufacturing the rotary impeller.  <P>SOLUTION: In the impeller device wherein one of a magnetic detecting element 40 for detecting a rotary position of the rotary impeller 30 and the magnetic body 36 paired with the magnetic detection element 40 is buried into the rotary impeller 30, the rotary impeller 30 is formed with a bottomed recessed part 301 having an opening 301a into which one of the magnetic body 36 and the magnetic detecting element 40 is inserted, and the opening 301a of the recessed part 301 is sealed with resin R injected by insert molding so that one of the magnetic detecting element 40 and the magnetic body 36 is buried in the rotary impeller.  <P>COPYRIGHT: (C)2010,JPO&INPIT
Patent JP-2010106355-A (JP)
Title: High strength high heat resistance copper alloy sheet
Inventor: OZAKI RYOICHI
IPC: C22F1/00
Filed: 2009-02-25
Abstract: <P>PROBLEM TO BE SOLVED: To provide a copper alloy sheet in which high strength satisfying the tensile strength of ≥750 MPa (≥220 Hv hardness) and high heat resistance are consistent, and further, the smoothness of an etched face is excellent.  <P>SOLUTION: The copper alloy sheet has a composition comprising prescribed quantity of at least one selected from Ni, Fe and Co as well as P, Sn, Zn and Cr, and in which the relation in a mass% ratio between at least one selected from Ni, Fe and Co, and P satisfies 4≤(Ni+Fe+Co)/P≤12 and also, 3≤Ni/(Fe+Co)≤12 is satisfied, and the balance Cu with inevitable impurities. In the alloy structure of the copper alloy sheet, the number of fine phosphide precipitated grains with a grain size of 1 to 20 nm is ≥300 pieces/μm<SP>2</SP>, the number of coarse crystallized/precipitated grains with a grain size of >100 nm is ≤0.5 piece/μm<SP>2</SP>, and the Sn content in the phosphide precipitated grains is ≥0.01 by a mass% ratio according to EDX (Energy Dispersive X-ray) spectrometry:Sn/(Ni+Fe+Co+P+Sn).  <P>COPYRIGHT: (C)2010,JPO&INPIT
Patent JP-2010197745-A (JP)
Title: Image forming device, and fixing method in image forming device
Inventor: USUI TAKASHI
IPC: G03G15/20
Filed: 2009-02-25
Abstract: <P>PROBLEM TO BE SOLVED: To provide an image forming device for decreasing the quantity of heat generated in a fixing section in the image forming device to save energy by preventing wasteful use of the heat generated in the fixing section of the image forming device.  <P>SOLUTION: In the image forming device 100, recording paper P to which an image is transferred by an image transfer section 6 is intermittently delivered at a transfer speed V1 at certain intervals in the order of transferring from the image transfer section 6 toward the fixing section 7, and conveyed at a fixing speed V2 and heated and fixed by the fixing section 7. The fixing speed V2 is set lower than the transfer speed V1.  <P>COPYRIGHT: (C)2010,JPO&INPIT
Patent JP-2010194216-A (JP)
Title: Washing machine
Inventor: WAKITA KATSUYA
IPC: D06F33/02
Filed: 2009-02-27
Abstract: <P>PROBLEM TO BE SOLVED: To improve the washing performance of a washing machine by appropriately controlling drum rotation speed though the behavior of clothes inside a drum during washing is not precisely comprehended in a conventional washing machine.  <P>SOLUTION: After weight of the laundry to be contained inside the drum 2 is grasped, a sum of vibration spectra of a frequency larger than a predetermined frequency obtained by a frequency component calculation part 8 according to vibration by rotation of the drum 2 is calculated, the rotation speed of the drum 2 is changed to increase the rotation speed of the drum 2 when the weight of the laundry is increased than a predetermined weight and to decrease the rotation speed of the drum 2 when the weight of the laundry is reduced than the predetermined weight, a sum of the vibration spectra of a frequency larger than the predetermined frequency is calculated by the frequency component calculation part 8, and the rotation speed of the motor is controlled so as to obtain the rotation speed of the drum whose sum is large. Thus, washing, mainly beat washing, is performed.  <P>COPYRIGHT: (C)2010,JPO&INPIT
Patent JP-2010196010-A (JP)
Title: Sulfonated hollow particle and method for producing the same, solid acid and proton conductive membrane comprising sulfonated hollow microparticle
Inventor: NODA IPPEI
IPC: H01B1/06
Filed: 2009-02-27
Abstract: <P>PROBLEM TO BE SOLVED: To provide an industrially advantageous solid acid catalyst with which a process such as neutralization or salt removal is not necessary for separation-recovery, and a target product is produced without producing unnecessary by-products while energy is conserved; to provide a solid acid having high proton conductivity and excellent heat resistance; and to provide a method of producing at low cost and with ease.  <P>SOLUTION: The sulfonated hollow particles insoluble in a polar solvent, which is obtained by sulfonating an aromatic ring in an organic group of the hollow particles comprising crosslinked polysiloxane structure in which a carbon atom of the organic group is directly bonded to a silicon atom, provides a solid acid having high acid value and high sulfur content, and desired acidity is accurately and easily obtained by virtue of structural characteristics of the crosslinked organic siloxane structure.  <P>COPYRIGHT: (C)2010,JPO&INPIT
Patent JP-2010194263-A (JP)
Title: Display data management system
Inventor: IIDA ZUISHO
IPC: A63F7/02
Filed: 2009-02-27
Abstract: <P>PROBLEM TO BE SOLVED: To respond to the need of a player who wants to know a game history before movement.  <P>SOLUTION: A display data management system includes: a plurality of game machines 2 arranged in a plurality of machine arrangement places 1 with intrinsic machine number assigned thereto; a plurality of game information display devices 3 arranged corresponding to the respective machine arrangement places 1, so as to store game history information of the game machines 2 arranged in the machine arrangement places 1 as display data, and displaying the information in a display part; and a display data management device 5 to be communicably connected to the respective game information display devices 3 via a network 4. When the existing game machine 2 is moved to another machine arrangement place 1 in changing the arrangement of the game machines 2, the display data management device 5 moves the display data, which is stored in the game information display device 3 corresponding to the machine arrangement place 1 before movement, to the game information display device corresponding to the machine arrangement place 1 after movement.  <P>COPYRIGHT: (C)2010,JPO&INPIT
Patent JP-2010205870-A (JP)
Title: Electrolyte additive for electric double-layer capacitor, electrolyte, and electric double-layer capacitor
Inventor: SHIRAISHI SOJI
IPC: H01G11/30
Filed: 2009-03-03
Abstract: <P>PROBLEM TO BE SOLVED: To provide an electrolyte additive with which a high-performance electric double-layer capacitor having excellent durability to high-voltage charging at higher temperature as compared with the conventional art can be obtained, and to provide an electrolyte and the electric double-layer capacitor.  <P>SOLUTION: For the electric double-layer capacitor having a polarizable electrode immersed in an electrolyte, an electrolyte which contains an electrolytically polymerizable polymerprecursor by a 0.005 to 0.05M concentration as an additive is used, and initial charging is performed to electrolytically polymerize the electrolytically polymerizable polymerprecursor contained in the electrolyte; and a polymer produced by the electrolytic polymerization is deposited on an electrochemically active point present on a positive electrode-side polarizable electrode surface to coat the electrochemically active point with the polymer.  <P>COPYRIGHT: (C)2010,JPO&INPIT
Patent JP-2010201359-A (JP)
Title: Exhaust gas purification catalyst and exhaust gas treatment apparatus using the same
Inventor: SHIBATA MASAHITO
IPC: B01J23/44
Filed: 2009-03-04
Abstract: <P>PROBLEM TO BE SOLVED: To provide a catalyst for appropriate purification of an exhaust gas, while using a reduced amount of a noble metal as a catalytic active component.  <P>SOLUTION: The exhaust gas purification catalyst is used for purification of the exhaust gas exhausted from an internal combustion, wherein the support amounts of the noble metal as the catalytic active component are different at the exhaust gas inlet side and at the exhaust gas outlet side. In the catalyst, CO is oxidized, and HC and NOx are efficiently purified, meanwhile the reduced amount of the noble metal is used, thus reducing material cost and the manufacturing cost of the catalyst.  <P>COPYRIGHT: (C)2010,JPO&INPIT
Patent JP-2009302511-A (JP)
Title: Bump, manufacturing method for the bump, and mounting method for substrate having the bump formed
Inventor: KOGASHIWA TOSHINORI
IPC: H01L21/60
Filed: 2009-03-06
Abstract: <P>PROBLEM TO BE SOLVED: To provide a bump which is formed on a substrate to be used in a flip-chip method, and can compensate the variations in bump heights, and to provide a mounting method to which a substrate using the bump is applied.  <P>SOLUTION: The bump has a two-layer structure including a first bump layer which is formed on the substrate and made of a bulk body of first conductive metal which is one of gold, copper and nickel, and a second bump layer which is formed on the first bump layer and made of a sintered body of powder of second conductive metal which is one of gold and silver. The bulk body constituting the first bump layer is formed by one of a plating method, a sputtering method and a CVD method. Here, the sintered body constituting the second bump layer is formed by sintering the metal powder consisting of the second conductive metal which is ≥99.0 wt.% in purity and 0.005 to 1.0 μm in average grain size. The young modulus of the second bump layer is 0.1 to 0.4 time as large as that of the first bump layer.  <P>COPYRIGHT: (C)2010,JPO&INPIT
Patent JP-2010205704-A (JP)
Title: Photoelectric conversion element, its manufacturing method, optical sensor, and solar cell
Inventor: SUGURO MASAHIRO
IPC: H01M14/00
Filed: 2009-03-06
Abstract: <P>PROBLEM TO BE SOLVED: To improve durability by reducing deterioration of a sealing agent caused by iodide ions in a photoelectric conversion element such as a dye-sensitized solar cell.  <P>SOLUTION: In the photoelectric conversion element 100 having a semiconductor electrode 108 including a semiconductor layer 103 and pigment, an electrode couple 109, and an electrolyte layer 104 arranged between the semiconductor electrode 108 and the electrode couple 109, a cyclic nitroxyl radical compound and oxammonium salt are included in the electrolyte layer 104.  <P>COPYRIGHT: (C)2010,JPO&INPIT
Patent JP-2010055054-A (JP)
Title: Photosensitive resin composition, photosensitive resin transfer material, photospacer, method of manufacturing the same, substrate for display device and display device
Inventor: YOSHINARI SHINICHI
IPC: G03F7/004
Filed: 2009-03-09
Abstract: <P>PROBLEM TO BE SOLVED: To provide a photosensitive resin composition capable of forming a coating film having uniform film thickness, and a photosensitive resin transfer material hardly causing failure in releasing a cover film, to provide a photospacer using these materials and a method of manufacturing the same, and to provide a substrate for a display device capable of displaying an image of high image quality by preventing display unevenness and a display device using it.  <P>SOLUTION: The photosensitive resin composition contains fluorine-contained compound including a repeating unit expressed by general formula (A). The photosensitive resin transfer material is formed using the photosensitive resin composition. The photospacer uses these materials. The method of manufacturing the photospacer uses these materials. The substrate for a display device includes the photospacer, and the display device includes the substrate. In the general formula (A), R<SB>1</SB>-R<SB>3</SB>indicates a hydrogen atom or a methyl group, L<SB>1</SB>-L<SB>3</SB>indicates -O- or -NH-, n and m indicates integral numbers of 1 to 10 (m≠n), l indicates an integral number of 1 to 15, X, Y and Z indicate the mass ratio of each repeating unit, X+Y=20-80, Z=80-20, and X and Y are not 0 at the same time.  <P>COPYRIGHT: (C)2010,JPO&INPIT
Patent JP-2010209864-A (JP)
Title: Vehicle control device
Inventor: SENDA TAKASHI
IPC: F02D45/00
Filed: 2009-03-12
Abstract: <P>PROBLEM TO BE SOLVED: To suppress repeated execution of automatic stopping and automatic restarting of an engine.  <P>SOLUTION: An ECU 40 automatically stops the engine 10 when a vehicle is decelerating and a prescribed stopping condition is satisfied during operation of the engine 10, and automatically restarts the engine 10 before stopping of the vehicle and when a prescribed restarting condition is satisfied during the automatic stopping of the engine 10. The ECU 40 sets a vehicle speed determination value for allowing the next automatic stop of the engine after restarting of the engine 10 based on the restarting vehicle speed detected when the prescribed restarting condition is satisfied. Further, the ECU 40 permits the next automatic stop of the engine when the vehicle speed detected after the restart of the engine 10 is the vehicle speed determination value or higher.  <P>COPYRIGHT: (C)2010,JPO&INPIT
Patent JP-2009273877-A (JP)
Title: Electric bending operation device and medical treatment system
Inventor: OKAMOTO YASUHIRO
IPC: A61B1/00
Filed: 2009-03-12
Abstract: <P>PROBLEM TO BE SOLVED: To provide an electric bending operation device with excellent operability, allowing an operator to accurately bend a bending part when the operator twists an insertion part, and to smoothly insert the insertion part to a deep region.  <P>SOLUTION: The electric bending operation device 5 includes: an insertion part attaching mechanism part 50 having a pawl member 53 integrally mounted in a rotary cylinder 52 for holding the insertion part 11 by pressing the insertion part, and capable of switching the state of the pawl part 53 to an integrated state in which the rotary cylinder 52 is integrated with the insertion part 11 or to a state in which the insertion part 11 advances/retreats relative to the rotary cylinder 52 by pressing the pawl member 53 on the insertion part 11; a rotation mechanism part 70 disposed in the insertion part attaching mechanism part 50 for rotating the insertion part 11 around the axis of the insertion part by rotating the rotary cylinder 52 when the rotary cylinder 52 is integrated with the insertion part 11; an insertion part operating part 30 having a twisting operation part 35 for rotating bending operation parts 21 and 22 for bending an electric bending part 15 of the insertion part 11 and the rotary cylinder 52; and a support 37 for integrating the insertion part operating part 30 and the insertion part attaching mechanism part 50.  <P>COPYRIGHT: (C)2010,JPO&INPIT
Patent JP-2009260298-A (JP)
Title: Crystallinity evaluation method of single-crystal semiconductor film and manufacturing method of semiconductor substrate
Inventor: SHIMOMURA AKIHISA
IPC: H01L21/336
Filed: 2009-03-16
Abstract: <P>PROBLEM TO BE SOLVED: To provide a semiconductor substrate capable of forming a semiconductor element having favorable crystallinity and high performance.  <P>SOLUTION: A single-crystal semiconductor substrate having a brittle layer is bonded to a base substrate via an insulating layer; the single-crystal semiconductor substrate is separated with the brittle layer as a boundary by heat treatment; a single-crystal semiconductor layer is fixed on the base substrate; and laser beams are applied to the single-crystal semiconductor layer for turning the single-crystal semiconductor layer into a partially melted state for recrystallization and recovering crystal defects. In concentration distribution in the depth direction of the single-crystal semiconductor layer after the recrystallization, a carbon concentration has the local maximum.  <P>COPYRIGHT: (C)2010,JPO&INPIT
Patent JP-2010216703-A (JP)
Title: Method of controlling input amount of waste in waste heat-treating furnace
Inventor: TANABE MINORU
IPC: F23G5/50
Filed: 2009-03-16
Abstract: <P>PROBLEM TO BE SOLVED: To provide a method of controlling an input amount of waste in a waste heat-treating furnace, developed in terms of the observance of regulation values and notification values of a waste treatment amount and capable of appropriately maintaining combustion and gasification while observing the regulation values and notification values of the waste treatment amount.  <P>SOLUTION: When an actual input amount instantaneous value is different from a target input amount instantaneous value, an upper limit value and a lower limit value of an input amount instantaneous value are calculated by dividing waste weight obtained by subtracting an actual input amount integrated value from each of an upper limit value and a lower limit value in an allowable range of a target treatment amount by a time until a predetermined time passes after the actual input amount instantaneous value and the actual input amount integrated value are led out. The control of the waste input amount is performed by adjusting dust supply speed so that the actual input amount instantaneous value falls within a range between the upper limit value and the lower limit value and the actual input amount instantaneous value approaches the target input amount instantaneous value.  <P>COPYRIGHT: (C)2010,JPO&INPIT
Patent JP-2010222596-A (JP)
Title: Method and apparatus for forming optical thin film
Inventor: TAKAHARA HIROSHIGE
IPC: G02B5/28
Filed: 2009-03-19
Abstract: <P>PROBLEM TO BE SOLVED: To consistently manufacture an optical element for which the severe specification is requested by controlling the refractive index to the high accuracy while controlling the optical film thickness without using any iterative calculation to make the control complicated, and without being affected by the fluctuation or the like in the film deposition rate which is possible with the vacuum vapor deposition.  <P>SOLUTION: Firstly, target light quantity change of the monitor light to the physical thickness of a thin film to be formed is preset (S1). Secondly, forming of the thin film is started (S2), and the physical thickness of the thin film in the middle of the film formation is detected (S3). At the same time, the light quantity of the monitor light with the physical thickness detected in S3 is detected (S4). Thus, the thin film is formed while changing the film formation condition based on the difference between the detected light quantity of the monitor light in S4 in the physical thickness detected in S3 and the target light quantity in its physical thickness preset in S1 so that the change in the light quantity of the monitor light to the subsequent physical thickness follows the preset target light quantity change (S5).  <P>COPYRIGHT: (C)2011,JPO&INPIT
Patent JP-2010038900-A (JP)
Title: Method of manufacturing mems probe available for probe card to reusable substrate
Inventor: HSU TSENG-YANG
IPC: H01L21/66
Filed: 2009-03-19
Abstract: <P>PROBLEM TO BE SOLVED: To provide a probe manufacturing process which improves yield of MEMS probes to reduce lead time and cost.  <P>SOLUTION: The Micro Electro Mechanic System (MEMS) probe is produced on the substrate in order to be used for probe cards. The probe has a mating surface for being attached to application platform of the probe card, and the above mating surface is formed on the surface perpendicular to the substrate surface. To remove the probe from the substrate, undercut 73 is formed under the probe 51.  <P>COPYRIGHT: (C)2010,JPO&INPIT
Patent JP-2009277648-A (JP)
Title: Inspection device and inspection method
Inventor: HAYAKAWA KOICHI
IPC: H01J37/147
Filed: 2009-03-24
Abstract: <P>PROBLEM TO BE SOLVED: To provide an inspection device and an inspection method can prevent irradiation of an electron beam to non-inspection zones even if a sample has mixed non-inspection zones during inspection of patterns of a semiconductor wafer and inspect desired inspection zones.  <P>SOLUTION: The inspection device includes a scanning deflector for scanning an electron beam over the sample wherein the electron beam has irradiation energy for imaging an irradiating zone of the sample, a blanking deflector for blanking the electron beam to prevent it from irradiating the sample during scanning, a stage for continuously moving the sample during scanning of the electron beam, and a control device for transmitting a deflection demand to the blanking deflector to blank the electron beam over non-irradiation zones of the sample according to selection of irradiation zones of the sample.  <P>COPYRIGHT: (C)2010,JPO&INPIT
Patent JP-2010220835-A (JP)
Title: Light incontinence pad for male
Inventor: SUGIYAMA KATSUHIKO
IPC: A61F13/49
Filed: 2009-03-24
Abstract: <P>PROBLEM TO BE SOLVED: To provide a light incontinence pad for males which enables excretion by taking out male genitalia from an open front site of trousers or underwear while wearing the light incontinence pad for males inside the underwear.  <P>SOLUTION: The light incontinence pad 1a for males has an absorbent body 14 a part of which is divided into the right and left from an upper end 14x to a center part 14z of the absorbent body 14. An opening part 42 of an open front for exposing the end of the male genitalia of a wearer from the absorbent body 14 is formed of an inner side inner surface part 15 constituted of a side edge part which is closer to a dividing region of one absorbent body 14a out of the divided, right and left absorbent bodies 14a, 14b and an outer side inner surface part 16 which is constituted of a side edge part closer to a dividing region of the other absorbent body 14b and is arranged to overlap with the reverse side of the inner side inner surface part 15.  <P>COPYRIGHT: (C)2011,JPO&INPIT
Patent JP-2010221370-A (JP)
Title: Method of manufacturing substrate for mask blank, method of manufacturing mask blank, and method of manufacturing mask
Inventor: KOIKE KESAHIRO
IPC: B24B37/08
Filed: 2009-03-25
Abstract: <P>PROBLEM TO BE SOLVED: To make the shape of the main surface of a substrate further approximate an ideal shape by using a double-side polishing device.  <P>SOLUTION: This method of manufacturing the substrate for a mask blank includes a polishing step of polishing both main surfaces of the substrate 22 while supplying polishing liquid from a plurality of supply holes provided in at least one of both polishing faces of both upper and lower surface plates of the double-side polishing device. In the polishing step, both upper and lower surface plates are rotated at their concentric rotational axes, a carrier 20 holding one substrate 22 is arranged on the polishing surface at a position deviating from the rotational axis of the surface plate, the substrate 22 is relatively revolved around the rotational axis of the surface plate on the polishing surface, and the carrier 20 is rotated with the center of the main surface of the substrate as a rotational axis to rotate the substrate 22 on the polishing surface, thereby polishing both main surfaces of the substrate. A control means controls the supply amount of the polishing liquid to be supplied from the supply holes depending on the position of the substrate 22 on the polishing surface.  <P>COPYRIGHT: (C)2011,JPO&INPIT