baber/WOPTO huggingface dataset:
Patent JP-H09320020-A (JP)
Title: Magnetic head, method for manufacturing and reproducing magnetic head, and magnetic reproducing apparatus
Inventor: MURAMATSU SAYURI
IPC: G11B5/02
Filed: 1996-06-04
Abstract: PROBLEM TO BE SOLVED: To enable reproduction by a magnetic impedance effect of high sensitivity, and simplify the structure, by arranging a conductor penetrating a magnetic core in an insulated manner. SOLUTION: A conductor line 3 is set to penetrate a magnetic core 10 consisting of magnetic layers 1 and 2 at four points, which is capacitive-coupled via an insulating layer 4. An insulating film 7 is formed between the conductor line 3 and the magnetic layers 1, 2 so as to electrically insulate the conductor line 3 from the magnetic layers 1, 2. Electrode terminals 5, 6 are provided at both ends of the conductor line 3. When a constant a.c is fed to the conductor line 3 from the electrode terminals, a voltage value inversely proportional to the amount of an entering magnetic flux is output from a reproduction voltage output circuit. A magnetic head is accordingly reproduced in a manner responsive to the magnetic flux.
Patent JP-S5843546-A (JP)
Title: Semiconductor device
Inventor: HIRAMOTO YOSHI
IPC: H01L23/29
Filed: 1981-09-10
Abstract: PURPOSE:To prevent wire disconnection and to form the alpha rays shielding film which can be sealed with resin by providing the dam around the alpha ray shielding film forming region so that the bonding resin for alpha ray shielding film does not flow into a bonding pad and by forming the alpha ray shielding resin with bonding method. CONSTITUTION:The varnish of polyimide precursor is coated on the entire part of a silicon wafer already forming thereon elements and then a negative photo resist is coated thereon. It is then prebaked and is subjected to irradiation of ultra-violet ray using a photo mask and then the photo resist is developed. After  the polyimide is etched using hydrazine hydra, the photo resist is separated in  order to form a polyimide dam. A chip is cut out from the wafer and it is fixed  to a lead frame and is then subjected to wire bonding. The combined N-methyl pyrolidone solution of the poly-imide precursor is dropped into the dam and the ray shielding film is formed by the curing for 30min at each temperature of 150 deg.C, 250 deg.C and 350 deg.C. Thereafter, it is sealed by resin 8. Since the bonding wire 2 is not covered with the alpha ray shielding film 33, it did not show any disconnection.
Patent JP-H06349728-A (JP)
Title: Formation of resist pattern
Inventor: MICHIHASHI SHINJI
IPC: H01L21/027
Filed: 1993-06-14
Abstract: PURPOSE:To precisely form the pattern of the upper-layer resist of a multilayered resist. CONSTITUTION:When the surfaces of the exposed sections 12A of a lower-layer negative resist and substrate 11 are changed to hydrophilic surfaces by performing light etching, exposed sections 13B in the gaps of a fine pattern can be surely removed and a precise pattern can be formed, since surfaces of the exposed sections 12 and substrate 11 well get wet with the developing solution of the positive resist 13 in an upper layer.
Patent JP-S62298047-A (JP)
Title: Magneto-optical head
Inventor: OKADA MITSUYA
IPC: G11B11/105
Filed: 1986-06-17
Abstract: PURPOSE:To eliminate the influence of the double refraction of a substrate on a reproduction signal by providing an optical system which receives the light from a beam splitter and control system which compensates the double refraction of a recording medium by adjusting the optical system to a magneto- optical signal detection part. CONSTITUTION:The change of the plane of polarization of the incident light on the magneto-optical signal detecting part 26 is the fluctuation of the quantity of the light detected by a photodiode 29 although said laser light corresponds to the double refraction of the substrate of a magneto-optical disk if said substrate has the double refraction. The magnitude of the double refraction of such substrate is detected by the photodiode 29 and the detection signal is fed back to the optical system 33, by which the polarization state of the laser light past the optical system 33 is compensated to the state in which said polarization is not influenced by the double refraction of the substrate.
Patent JP-H10330853-A (JP)
Title: Method for sintering non-ferrous smelting raw material and apparatus therefor
Inventor: SUMIYA HIROKI
IPC: C22B1/20
Filed: 1997-05-30
Abstract: PROBLEM TO BE SOLVED: To provide an operating method which can treat slurry state raw material, such as lead-containing raw material without obstructing the ventilation in an ore layer, at the time of sinter-treating the slurry-state raw material with a Dwight Lloyd sintering machine. SOLUTION: At the time of sinter-treating by forming the ore layer of non-ferrous metallic smelting raw material on a bed in the Dwight Lloyd type sintering machine 10 in the sintering method of the non-ferrous metallic smelting raw material, the slurry-state raw material is charged on the surface of the layer in a hood 14 of the Dwight Lloyd sintering machine and oxidize-sintered. Then, the temp. of the ore layer at the position charging the slurry-state lead- containing raw material is requlated to 1300-1500 deg.C. At this time, the position of a supplying tube 22 in the sintering part is desirable to be the outlet side in comparison with the center part. Further, at the time of screening the sinter- treated raw material, since the one oxidize-sintered from the slurry-state raw material becomes minus-sieve, the minus-sieve raw material is returned back to the sintering treatment.
Patent JP-H10334403-A (JP)
Title: Recording equalizer and magnetic recording/reproducing device using the same
Inventor: IGARASHI KAZUSUKATSU
IPC: G11B20/14
Filed: 1997-05-30
Abstract: PROBLEM TO BE SOLVED: To reduce the disturbance of a magnetization inverting position so as to realize high density recording by increasing the accuracy of recording correction. SOLUTION: When the recording correction amount A of a first dibit transfer A (3) for recording being away from a previous transfer by at least 3 bits or more and from a succeeding transfer by at least 2 bits or more is set as A, the recording correction amount of a second transfer A (4) is set as B and the recording correction amount of an independent bit A (0) for recording being away from a previous transfer by at least 3 bits or more and from a succeeding transfer by at least 2 bits or more is set as C, a value (A-C) is set in the range of -5% to -60% of a value (B-C) and C is selected such that A takes a positive value.
Patent JP-H082660-A (JP)
Title: Work transferring device
Inventor: FUJIMOTO TAKANORI
IPC: B23Q41/02
Filed: 1994-06-23
Abstract: PURPOSE:To carry work in and out of each working device efficiently in a simple constitution. CONSTITUTION:At the front and rear parts of three working devices 1, 2, and 3 arranged in series, the front side transfer passages (feeding/delivery transfer passages) 4, 5, and 6 each of which consists of a roller conveyor and a chain conveyor for transferring works towards the downstream side (working devices 3 side) from the upstream side (working device 1 side) and the rear side transfer passage (detour transfer passages) 7, 8 and 9 are formed. along the arrangement direction of the working device. On the left and right sides of each working device 1-3, connection transfer passages 11-14 for transferring the work between the front side transfer passages 4-6 and the rear side transfer passages 7-9 are formed.
Patent JP-S6123789-A (JP)
Title: Method for plating stainless steel with noble metal
Inventor: SHIGA SHOJI
IPC: C25D5/10
Filed: 1984-07-09
Abstract: PURPOSE:To plate a stainless steel material with a noble metal of high quality by carrying out electrolysis using the steel material as a cathode in an aqueous soln. contg. Ni and free hydrochloric acid each at a specified concn., electroplating the steel material with Ni to a specified thickness, and plating the pretreated steel material. CONSTITUTION:Electrolysis is carried out using a stainless steel material as a cathode in an aqueous soln. contg. 0.1-10g/l Ni and >=30g/l free hydrochloric acid at about 1-100A/dm<2> current density for about 1-180sec. The steel material is washed and electroplated with Ni or an Ni alloy such as Ni-Co to 0.05- 0.5mum thickness in a weakly acidic plating bath such as an NiSO4 bath of about 2-4pH. The pretreated steel material is plated with a noble metal. Noble metallic plating of high quality suitable for a precision machine or an electronic machine can be formed.
Patent JP-S6044491-A (JP)
Inventor: REIMONDO DEIBIIDO GOORUDO
IPC: B25J19/00
Filed: 1983-08-04
Abstract: (57)【要約】本公報は電子出願前の出願データであるた め要約のデータは記録されません。
Patent JP-S622130-A (JP)
Title: Stress detector
Inventor: KATAGIRI MASAYUKI
IPC: G01J4/00
Filed: 1985-06-27
Abstract: PURPOSE:To prevent the lowering of the detection accuracy due to an internals stress, by bonding one end of a photoelastic material on one support surface of a pedestal with the other end thereof made free. CONSTITUTION:A photoelastic element is made up of a photoelastic material 1, a pedestal 8 and a pressing element 9 and one end of the photoelastic material 1 is bonded on one support surface of the pedestal 8 with a bond 10 while the other end thereof C is left open without being bonded. Thus, there is no internal stress left during the hardening of the bond and owing to expansion difference in the change of temperature, eliminating variations in the characteristic. This can prevent the lowering of the detection accuracy due to the residual internal stress thereby enabling accurate measurement by a double refraction solely depending on external force.
Patent JP-H09326374-A (JP)
Title: Wafer peeling off method and device
Inventor: KIMURA SHIGERU
IPC: H01L21/304
Filed: 1996-06-04
Abstract: PROBLEM TO BE SOLVED: To peel off a wafer without affecting the wafer with small force by rotating the wafer in the face direction, with the end point at the bonding section between the wafer and the fixing member as a fulcrum, and future, sifting the wafer in the face direction, and shifting the wafer out of the region of wafers in a row. SOLUTION: The adhesive section between each wafer and a fixing member 1 is soaked in a sifting vessel 31 kept at about 90 deg.C by a heater, and it is fixed with a cylinder 31b for fixing and a frame 31c for fixing. Next, a pressure member 35 out in advance in a retreat position 35B is shifted to a pressure position 35A, and one sheet of wager positioned at the end of the row of wafers is sucked with a wafer suction board 32. Then, the wafer is shifter in the face direction by a rotary actuator 33, with the end point of the bonding section between the wafer and a fixing member as a fulcrum. At this time, an air current is jetted from an air nozzle 37. Hereby, the wafer can be peeled off gradually from the side of the end point 30a at the bonding section of the wafer.
Patent JP-H037747-A (JP)
Title: Styrene based resin composition
Inventor: YOSHIZAKI HARUHIKO
IPC: C08L45/00
Filed: 1989-06-06
Abstract: PURPOSE:To obtain a styrene based resin composition improved in impact resistance, hinge characteristics, weld strength, etc., without impairing excellent characteristics of styrene based resin by blending a rubber modified styrene based resin with a hydrogenated aromatic oligomer resin. CONSTITUTION:The aimed composition obtained by blending (A) 100 pts.wt. rubber modified styrene based resin (e.g. impact resistant polystyrene, ABS resin or MBS resin) with (B) 0.5-30 pts.wt., preferably 1-20 pts.wt. hydrogenated aromatic oligomer resin obtained by hydrogenating a (co)oligomer containing an aromatic hydrocarbon olefin (e.g. indene or styrene), heterocyclic aromatic olefin (e.g. cumarone or vinylpyridine), phenols, etc., as a constituent monomer in the presence of a metal (oxide) catalyst and having >=80%, preferably >=95% hydrogenation ratio, 70-160 deg.C, preferably 90-140 deg.C softening point and preferably 200-2000 molecular weight.
Patent JP-H04366831-A (JP)
Title: Image forming device
Inventor: OHIRA HIDEAKI
IPC: G03D13/00
Filed: 1991-06-13
Abstract: PURPOSE:To provide an image forming device by which an original does not fade because of the light of a light source, a photosensitive drum is easily manufactured and light quantity for exposing a capsule sheet does not become insufficient. CONSTITUTION:A half mirror 12 is irradiated with reflected light from the original 1 and the light is split to the main exposure light 13 and the detection light 14. The main exposure light 13 exposes the capsule sheet 4. The detection light 14 is made incident on a monochromatic CCD 19. Besides, the image information thereof is binarized and temporarily sent to a memory 21. Then, the sheet 4 is exposed by opening and closing an LCD shutter 18 when the part of the sheet 4 which is exposed by the light 13 when the detection light is made incident on the CCD 19 arrives at a position where it is irradiated with the sub-exposure light 17.
Patent JP-S62298326-A (JP)
Inventor: SUO KAZUMA
IPC: A47L9/00
Filed: 1986-06-17
Abstract: (57)【要約】本公報は電子出願前の出願データであるた め要約のデータは記録されません。
Patent JP-S5845861-A (JP)
Title: Surface processing polisher
Inventor: NAKAMURA TAKAO
IPC: B24B37/20
Filed: 1981-09-09
Abstract: PURPOSE:To reduce a peripheral sag during a polishing process by binding a soft foaming material and non woven fabric with thicknesses of specific values respecitvely by means of an adhesive so as to form a two layer structure with an overall thickness of a specific value as a surface processing polisher. CONSTITUTION:A soft foaming material 2 (e.g., polyurethane foaming material) with a thickness of 0.3-0.4mm. and provided with hollow sections of, e.g., 5- 30mum in diameter at the opening and 50-150mum in diameter at the center is used as the abrading surface of a polisher. A two layer structure with an overall thickness of 0.8mm. or less formed by binding the soft foaming material 2 and non woven fabric 3 (e.g., polyester non woven fabric) with a thickness of 0.5mm. or less by means of an adhesive is used as the polisher. The peripheral sag width around a work due to the polishing process is reduced as the thickness of the polisher is decreased.
Patent JP-2000330198-A (JP)
Title: Illuminator and liquid crystal projector
Inventor: YAMAUCHI YOSHITOSHI
IPC: G02F1/13
Filed: 1999-05-21
Abstract: PROBLEM TO BE SOLVED: To make luminous flux from a light emitting source possible to be incident on a lens array after being efficiently converged toward a 2nd focal point and to improve the optical characteristics by setting a spheroidal mirror as a reflection mirror, disposing the light emitting source in the vicinity of the 1st focal point of the mirror, and disposing a convex lens on the outside from the 2nd focal point. SOLUTION: The spheroidal mirror 4 has the 1st focal point F1 and the 2nd focal point F2, and is formed to be open in the middle of the 1st and the 2nd focal points F1 and F2, and condenses light from the light emitting source 3 disposed in the vicinity of the 1st focal point F1 onto the 2nd focal point F2. Here, the convex lens 5 is disposed on the outside from the 2nd focal point F2. The lens 5 turnes the luminous flux condensed onto the 2nd focal point F2 and diverging again to parallel beams. An integrator optical system 6 at the poststage of the lens 5 is formed of a lens array 8 whose shape is nearly similar to the shape of a liquid crystal panel 1, which is formed in rectangular shape whose ratio is 4:3 and where plural lens elements 7 are two-dimensionally arrayed.
Patent JP-H01310296-A (JP)
Title: Heat exchanger and air-conditioning machine incorporating said heat exchanger
Inventor: ISHIKAWA ATSUYUMI
IPC: F24F1/00
Filed: 1988-06-09
Abstract: PURPOSE:To permit the heat exchanging efficiency at the upper part of a heat exchanger even when the speed of airflow is restricted in the degree of not generating noise by a method wherein the size of length of a divided small piece at an outside row most distant from the center line of the row of heat transfer tubes, the size of space between mutual divided small pieces and the size of the length of the divided small piece in an inside row arranged at the side of the center line than said divided small piece are designed so as to be same substantially. CONSTITUTION:The size l2 of the length of divided small pieces 18-3, 18-4, 18-9, 18-10 in an outside row most distant from respective center lines (x1), (y1) between respective tube stages, the size l3 of a space between said mutual divided small pieces and the size l4 of the length of the divided small pieces 18-5, 18-6, 18-7, 18-8 in an inside row arranged at the side of the center lines (x1), (y1) over said divided small pieces are designed so as to be same substantially. Accordingly, main airflow, passing through the upper part A of a heat exchanger 7 downward obliquely, flows along a straight line substantially and a part of the main airflow does not flow through the small pieces having a high ventilation resistance but flows through the base plate of fins between the divided small pieces of the outside row and inside row, which is provided with a low ventilating resistance, whereby the ventilat ing resistance of the upper part A of a heat exchanger becomes lower compared with the central part B of the same.
Patent JP-H07324837-A (JP)
Title: Corrosion inhibitor for absorbing solution of absorption heat pump and water solution composition
Inventor: KAMITARI KATSUHIDE
IPC: F25B15/00
Filed: 1994-05-31
Abstract: PURPOSE:To largely improve corrosion resistance by preparing corrosion inhibitor for absorbing solution to be used for an absorption heat pump such as an absorption refrigerator, etc., from 2-mercaptobenzimidazole. CONSTITUTION:An absorption heat pump has a regenerator, a condenser, an evaporator, an absorber and tubes for coupling them, and the units, the tubes are formed of copper material, etc., such as cupro-nickel, etc. Corrosion inhibitor for suppressing or entirely eliminating the pressure rise of such a heat pump and the corrosions for a long period is prepared from 2-mercaptobenzimidazole. As absorbing solution, the solution containing iodide and nitrate and reducing agent is used, and as the agent, sodium hydrogensulfite is used. The agent suppresses or entirely eliminates the liberation and generation of iodine and effectively prevents the corrosion of the copper material, etc., to be used for the pump together with the operation of the inhibitor.
Patent JP-H07323122-A (JP)
Title: Pachinko game machine
Inventor: UGAWA SHOHACHI
IPC: A63F7/02
Filed: 1994-05-31
Abstract: PURPOSE:To provide a pachinko game machine equipped with a variable display device provided with plural ready-to-winning modes and capable of freely setting the generating ratio of each ready-to-winning mode by providing the machine with a fluctuation control means which controls by fluctuating the variable display part with plural kinds of modes and a control mode selection means which selects arbitrary one of the plural kinds of fluctuation control modes. CONSTITUTION:A pattern display device 30 decides whether or not a stop display result should be set as the combination of a bit hit pattern by a WC-RND 1, and also, the big hit pattern decided by a WC-RND-LINE is stop-displayed on a liquid crystal unit 32. While, when it is decided as a failure pattern, left, middle and right failure patterns decided by WC-RND-ZU 1 to 3 are stop- displayed on the liquid crystal unit 32 as the failure patterns. Also, the pattern display device 30 performs the fluctuation control by selecting the arbitrary finishing mode from a random number when it is possible to establish the combination of the big hit in the display state of each of the left, middle and right patterns decided by the WC-RND-LINE or WC-RND-ZU1-3.
Patent JP-H04228419-A (JP)
Title: Refining of ammonium sulfate solution
Inventor: HANSUUHERUMUUTO SHIYUBARUTSU
IPC: C01C1/24
Filed: 1991-05-20
Abstract: PURPOSE: To remove impurities by adding a reducer and then an oxidant to a (NH 4 ) 2 SO 4  solution by specific amounts under pressure and then thermally treating it at specific temperature.  
     CONSTITUTION: The (NH 4 ) 2 SO 4  solution produced as mother liquor in a crystallizing process of (NH 4 ) 2 SO 4  contains 20-35 wt.% (NH 4 ) 2 SO 4 , 5-15 wt.% NH 4 NO 3 , and 1-8 wt.% organic impurities. This solution is charged in an autoclave, a reducing agent such as 0.1-5 mol methanol is added to 1 mol NH 4 NO 3  in an N 2  atmosphere, and a heat treatment is carried out at 200-350°C to decompose and remove NH 4 NO 3 . Further, NH 4 NO 3  can be decomposed even when a soluble metal salt catalyst such as ferric sulfate is used and H 2  is added as a reducing agent. Then air, O 2  or nitric acid is added to this solution and organic impurities are oxidized and removed by a heat treatment of 200 to 350°C, thereby obtaining a purified (NH 4 ) 2 SO 4  solution. 
     COPYRIGHT: (C)1992,JPO
Patent JP-H11333437-A (JP)
Title: Method and apparatus for recycling textile goods
Inventor: NAKAMURA MAKOTO
IPC: D01G11/04
Filed: 1998-05-25
Abstract: PROBLEM TO BE SOLVED: To automate recycling of textile goods by a method wherein fixtures such as buttons, fasteners or the like which are fitted to the goods are separated from a fabric by crushing the texile goods, and the fabric is opened with an opening device to prepare a cotton-like fibrous bulky raw material property. SOLUTION: A crusher 2 is composed of a coarse crusher 6 and a crushers and grinding mill 7, the crushers and grinding mill 7 is equipped with a screen 21, and foreign matter such as a fine cloth piece, and a button, or the like which have passed the screen 21 is fed to a foreign matter selection removal mechanism 3 with a suction fan 22. The fabrics and foreign matters, and conveying air blast transferring them are separated by pneumatic separation 25 of the selection removal mechanism 3, and separated by using a weight ratio of the conveying air blast and the separated cloth piece and foreign matter with a wind separator 26.  Then, the separated fabrics are fed to a distributing feeder 5, many fibrillating devices 4 are provided via a distributing mechanism 34 to the distributing feeder 5, and the fabrics are opened with those opening devices 4 to prepare a cotton-like fibrous bulky raw material.
Patent JP-S5476732-A (JP)
Title: Distributor of internal combustion engine
Inventor: SAWADA HIROTSUGU
IPC: F02P7/02
Filed: 1977-11-30
Abstract: PURPOSE:To inhibit noises due to an electromagnetic wave over wide zones, by varying a material of an electrode at the discharge side. CONSTITUTION:High tension generated by the working of an ignition coil is transmitted to a central electrode portion 2a of a rotary electrode 2 mounted to a rotor 1, and transmitted to an electrode 2b at the discharge side of the rotary electrode 2 through a resistor or an inductance element 3. The electrode 2b at the discharge side is provided with a plurality of fixed electrodes mounted through minute gaps, air in the minute gaps are dielectrically broken and distributed to a fixed terminal, and an ignition plug of an internal combustion engine is fed. Aluminum or aluminum alloy is used for the electrode 2b at the discharge side arranging the minute gaps of  the rotor electrode 1.
Patent JP-2000337272-A (JP)
Title: Oldham's ring of scroll compressor
Inventor: MURAI YOICHI
IPC: F04C29/00
Filed: 1999-05-24
Abstract: PROBLEM TO BE SOLVED: To prevent seizure and abrasion by forming the most suitable oil film between a click and a groove of an Oldham's ring on the Oldham's ring of a scroll compressor. SOLUTION: It is possible to provide a scroll compressor high in compression performance and in reliability by restraining one side contact of a click 62 of an Oldham's ring 6 of the scroll compressor and a groove by providing a mechanism to rotate the click 62 of the Oldham's ring 6 and solving tribology of oil shortage, abrasion, etc., by providing the most suitable angle between the click and the groove.