baber/WOPTO huggingface dataset:
Patent TW-I243822-B (TW)
Title: Improved process for preparing N-phosphonomethyl iminodiacetic acid
Inventor: PARKER BRIAN
IPC: C07F9/38
Filed: 1999-07-07
Granted: 2005-11-21
Abstract: The present invention relates to an energy and effluent saving process for the production of N-phosphonomethyl-iminodiacetic acid (PMIDA), an intermediate in the preparation of glyphosate. An alkali metal salt of iminodiacetic acid is reacted with phosphorous acid and a strong mineral acid, or a source thereof to form iminodiacetic phosphite and the alkaline metal salt of the strong mineral acid. After removal- of the latter salt, the iminodiacetic phosphate is converted to PMIDA by reaction with formaldehyde. PMIDA is recovered and the solution remaining can be recycled in the process.
Patent TW-427019-B (TW)
Title: Structure of flash memory cell and its manufacturing method
Inventor: SHIU YAU-KAI
IPC: H01L27/115
Filed: 1999-07-13
Granted: 2001-03-21
Abstract: A structure of flash memory cell and its manufacturing method l are disclosed. The method comprises: after forming stripe type first oxide and first conductive layers, covering a mask layer on one side of the first conductive layer and extending the same substantially to the top surface of thefirst conductive layer and the substrate surface; then forming the second oxide layer on the surfaces of the substrate and the first conductive layer via oxidation reaction and the second oxide layer is formed to be bird's beak type on the corner of the other side of the first conductive layer near the substrate; stripping the mask layer and part of the second layer and then forming strip type doped area on the substrate next to the first conductive layer; sequentially forming the dielectric layer and the second conductive layer and patterning the dielectric layer, the second and the first conductive layers, wherein the dielectric layer and the second conductive layer are continuous stripped and almost perpendicular to the doped area.
Patent TW-429691-B (TW)
Title: Micro remote transceiver
Inventor: TSAI RON-HWA
IPC: H04B1/00
Filed: 1999-07-14
Granted: 2001-04-11
Abstract: The present invention relates to a micro remote transceiver and, more particularly, to a transceiver capable of receiving and transmitting signals by itself, and coupling by telecommunication to a remote transceiver, so as to detect an object moving in a high speed. The invention uses a ring antenna made by part of the printed circuit, that forms the oscillator circuit, as a media for transmitting carrier produced by the oscillator circuit and receiving reflected waves. The carrier includes a detecting signal for determining whether the received reflected wave is true or not, and analyzes the environment status. When the transceiver couples to a remote transceiver, according to the field formed by the ring antenna, the transceiver can distribute the signal and receive the command efficiently without always keeping the transceiver ahead of the remote one.
Patent TW-424397-B (TW)
Title: Digital camera field lens
Inventor: STAVELEY DONALD J
IPC: G02B13/00
Filed: 1999-07-31
Granted: 2001-03-01
Abstract: An optical system 416 & 480 for detecting image light in a digital camera 102 comprising an electronic sensor 416 having an area array of pixels e.g. 126 & 127 for detecting said image light. A field lens 482 is positioned adjacent said electronic sensor 416 so as to be substantially in the path of said image light for directing said image light onto said area array of pixels e.g. 126 & 127. The field lens 482 straightens the image light so that the straightened image light rays are substantially parallel to an optical axis 108 of the digital camera 102.
Patent TW-469303-B (TW)
Title: Contact element
Inventor: LANGHEINRICH PETER DR
IPC: C25D17/00
Filed: 1999-08-02
Granted: 2001-12-21
Abstract: It is difficult to transmit large processing current on the surfaces of printed circuit boards L using clamp-type contact organs 6, 7. In order to solve said problem, contact elements 15, 16 having one or more contact surfaces 26 are disposed on the contact organs 6, 7. The shape of the contact surfaces 26 are configured in such a way that no damages occur in the areas of the conductive surfaces adjacent to the contact surfaces 26 when large currents are transmitted from the contact elements 15, 16 printed on the electrically conductive surface of printed board material L on the contact surfaces to the conductive surface.
Patent TW-464815-B (TW)
Title: System and method for managing ATP data in a distributed supply chain planning environment
Inventor: KENNEDY BRIAN M
IPC: G06Q10/00
Filed: 1999-10-11
Granted: 2001-11-21
Abstract: A fulfillment server (16) managing ATP data in a distributed supply chain planning environment receives an ATP request (30) from one of multiple clients (12). The ATP request (30) includes multiple request line-items that each correspond to a desired product. The fulfillment server (16) then generates one or more component ATP requests (32) based on the request line-items and communicates component ATP requests (32) to at least one of multiple local fulfillment managers (14). In response, the fulfillment server (16) receives component quotations (34) from the local fulfillment managers (14), each corresponding to a component ATP request (32) and each including product availability information for the corresponding desired product. The fulfillment server (16) generates a quotation (36) that includes product availability information for all desired products, according to the component quotations (34), and communicates the quotation (36) to the client (12).
Patent TW-451197-B (TW)
Title: Ferro-electric memory-arrangement
Inventor: ROEHR THOMAS
IPC: G11C14/00
Filed: 1999-11-08
Granted: 2001-08-21
Abstract: This invention relates to a memory-arrangement composed of many memory-cells, which have respectively at least one ferro-electric memory-capacitor (Cferro) and one selection transistor (TG) and are controlled through word-lines (WL) and bit-line pairs (BL0, bBL0; BL1, bBL1), whereby in a read-amplifier (SA01) a reference-signal, which is obtained through a bit-line pair from a reference-cell pair (R), can be compared with a read-signal from a memory-cell (L). Two bit-line pairs are arranged to the read-amplifier (SA01), said bit-line pairs should be connected so that through the 1st bit-line pair the reference-signal is applied to the read-amplifier (SA01), and at the same time the read-signal is applied to the read-amplifier (SA01) through the 2nd bit-line pair.
Patent TW-571001-B (TW)
Title: Method for residue-free anisotropic etching of aluminum and its alloys
Inventor: WEBB TIMOTHY R
IPC: H01L21/302
Filed: 1999-11-16
Granted: 2004-01-11
Abstract: The present invention is a method for essentially residue-free anisotropic etching of aluminum or aluminum alloys using a plasma generated from a source gas which includes a chlorine-comprising gas and a hydracarbon-comprising gas. Etching takes place in a processing apparatus which provides separate power control for the plasma generation source and for a substrate biasing means. Etching is performed using a high density plasma (at least 10<11> e/cm<3>) and a low substrate bias (less than about -200 V). The method of the invention provides an acceptable etch rate and good etch profile, while prolonging the lifetime of the masking layer. The method of the invention is particularly useful for etching aluminum alloys having high (i.e., greater than about 0.5%) alloy content. The method of the invention is also especially useful for essentially residue-free etching of aluminum or aluminum alloy layers deposited on substrates having large open areas (i.e., where open areas comprise greater than about 65% of the surface area of the wafer).
Patent TW-464694-B (TW)
Title: Production of reduced iron and apparatus thereof
Inventor: KAMIKAWA SUSUMU
IPC: C22B5/10
Filed: 1999-12-20
Granted: 2001-11-21
Abstract: This invention relates to the production of reduced iron and the apparatus to eliminate the defective movement in post-process for the bulky pellet and to prevent the lowering of a production efficiency. The solution is: during high-temperatured production of reduced iron from granulated pellets of mixture powder of raw iron material and reductant, the temperature of the reduced granulated pellet is ≥ 900 DEG C; the oxide quantity of the pellet is regulated to ≥ 11% while the basicity of the pellet is made to ≥ 0.5.
Patent TW-462190-B (TW)
Title: Seamless decoding method for decoding image streams containing a plurality of different frame streams, and apparatus therefor
Inventor: GOTO SHOICHI
IPC: H04N7/24
Filed: 2000-03-30
Granted: 2001-11-01
Abstract: The present invention relates to a decoding device (VDA) which decodes in predetermined decoding timing (Vmc) and seamlessly reproduces a video stream (STv) consisting of multiple streams (interlacing system and progressive system) having different frame rates is equipped with a stream analyzer (Ddv, 2) which extracts frame rates before the streams (IS, PS) are decoded and a video decoding control part (CDV) 6 which decodes slice layers (SL) of the video stream(STv) according to the extracted frames. The video stream (STv) can be decoded in the determined timing (Vmc) and seamlessly reproduced even when one stream is switched to streams (IS, PS) having different frame rates in the video stream (STv).
Patent TW-495687-B (TW)
Title: System and method for integrated circuit design
Inventor: DOLE HARRY
IPC: G06F17/50
Filed: 2000-06-08
Granted: 2002-07-21
Abstract: The invention is a software suite supporting a methodologies-based approach for the development of large scale integrated circuits. Platforms are configured as web servers so that they may be easily assessed by designers in widely-varying physical locations and with widely-varying computer workstation capabilities. A suite of methodologies is defined for each block of an integrated circuit. This suite is defined by expert designers, through the use of an interface, who enter information regarding the steps and tools to be used during design of the blocks. The expert designer provides whatever documentation deemed appropriate to aid in completion of the steps. For each block within an integrated circuit, an expert designer attaches a methodology or set of methodologies in an ordered fashion to a block. These methodologies are then used by block designers to design and implement the block. The invention provides extensive reporting capability regarding the status of development of each block, as well as metrics pertaining to the implementation of the design. These metrics include, for example, information pertaining to the run time of various tools, the time taken to accomplish each methodology, as well as each step in that methodology. The invention also includes a common software interface (CSI). The CSI defines a number of functions which are to be supported by each tool used within the system. The functions allow other tools within the system to access data or information from other tools.
Patent TW-530279-B (TW)
Title: Liquid crystal display device
Inventor: MIYAZAWA TOSHIO
IPC: G09G3/20
Filed: 2000-05-20
Granted: 2003-05-01
Abstract: The present invention provides a liquid crystal display device capable of increasing the display quality of a display screen of a liquid crystal display element. The liquid crystal display device includes plural video signal input parts which supply pixel drive voltages to the respective video signal lines of a liquid crystal display device, and each of the video signal input parts includes: a field-effect transistor; a first part which sets a voltage value of a control electrode of the field-effect transistor to a voltage value obtained by correcting a common pixel drive voltage by a threshold voltage of the field-effect transistor; a second part which sets the voltage value of the control electrode of the field-effect transistor to a voltage obtained by adding a video signal voltage to the voltage value corrected by the first part; and a third part which supplies a voltage obtained by adding the video signal voltage to the common pixel drive voltage, to the video signal line as well as to the field-effect transistor, the voltage value of whose control electrode is set by the second part to the voltage obtained by adding the video signal voltage to the voltage value corrected by the first part.
Patent TW-451337-B (TW)
Title: Method using supercritical liquid to wash semiconductor chip and its apparatus
Inventor: LIAO CHUN-HSIUNG
IPC: H01L21/304
Filed: 2000-06-14
Granted: 2001-08-21
Abstract: There is provided a method using supercritical liquid to wash semiconductor chip, which is used to remove at least the etch residue on the surface or in the gap of a semiconductor chip. The method comprises placing the semiconductor chip into a cleaning chamber; and applying a liquid into the cleaning chamber. The pressure of the cleaning chamber is larger than the critical pressure of the liquid, and the temperature of the cleaning chamber is higher than the critical temperature of the liquid, so as to make the liquid to be a supercritical liquid with co-existed vapor and liquid states for washing the surface of the semiconductor chip. The liquid can be carbon dioxide, water, or nitrogen monoxide. Additionally, the method can apply chemical liquid together with the above liquid to the cleaning chamber to enhance the effect of removing the pollution on the surface of the semiconductor chip.
Patent TW-457340-B (TW)
Title: Shaft lock device
Inventor: KITAMURA YOSHIHARU
IPC: G06F1/16
Filed: 2000-06-15
Granted: 2001-10-01
Abstract: A shaft lock device, comprising a rotated member (2) having a pivot shaft (1) passing therethrough in the state of free rotation and elastic pressing members (3, 4) having the pivot shaft (1) passing therethrough in the state of restricted rotation and holding a relative angle between the rotated member (2) and the pivot shaft (1) at any angle by the application of a pressure to the rotated member (2), wherein an inclination angle between the pivot shaft and the rotated member can be adjusted with a stable frictional torque, and a structure thereof can be simplified.
Patent TW-483137-B (TW)
Title: Reduced electromigration and stressed induced migration of Cu wires by surface coating
Inventor: HU CHAO-KUN
IPC: H01L21/768
Filed: 2000-07-29
Granted: 2002-04-11
Abstract: The idea of the invention is to coat the free surface of patterned Cu conducting lines in on-chip interconnections (BEOL) wiring by a 1-20 nm thick metal layer prior to deposition of the interlevel dielectric. This coating is sufficiently thin so as to obviate the need for additional planarization by polishing, while providing protection against oxidation and surface, or interface, diffusion of Cu which has been identified by the inventors as the leading contributor to metal line failure by electromigration and thermal stress voiding. Also, the metal layer increases the adhesion strength between the Cu and dielectric so as to further increase lifetime and facilitate process yield. The free surface is a direct result of the CMP (chemical mechanical polishing) in a damascene process or in a dry etching process by which Cu wiring is patterned. It is proposed that the metal capping layer be deposited by a selective process onto the Cu to minimize further processing. We have used electroless metal coatings, such as CoWP, CoSnP and Pd, to illustrate significant reliability benefits, although chemical vapor deposition (CVD) of metals or metal forming compounds can be employed.
Patent TW-498348-B (TW)
Title: Method for relaxing stress corrosion cracking of structural member of nuclear reactor plant
Inventor: WADA YOICHI
IPC: G21C19/28
Filed: 2000-08-28
Granted: 2002-08-11
Abstract: A Pt compound, a Rh compound and a Pd compound are injected into the furnace water in a reactor pressure vessel. The Pd compound is injected into the reactor furnace water so that the Pd mole number and the individual Pt and Rh mole numbers are smaller. The injection of each compound is carried out in a state where the BWR plant is not operating and the temperature of the reactor furnace water is decreased from 150 DEG C to 80 DEG C. The Pt, Rh, and Pd, in an ionized state in the reactor furnace water, will deposit on the surface of the components of the nuclear reactor plant. The ECP of the components of the nuclear reactor plant will conspicuously decreased as a result.
Patent TW-492101-B (TW)
Title: Plasma processing system and method of processing a substrate with the same
Inventor: KENNEDY WILLIAM S
IPC: H01L21/00
Filed: 2000-09-18
Granted: 2002-06-21
Abstract: A plasma processing chamber including a ceramic liner heated by radiant heating. The liner can be a series of tiles or a continuous cylindrical liner. The liner and other parts such as a gas distribution plate and a plasma screen can be made of SiC which advantageously confines the plasma and provides temperature control of the inner surfaces of the chamber. To remove excess heat from the liner, the ceramic liner can be supported on a resilient aluminum support frame which conducts heat from the liner to a temperature controlled member such as a top plate of the chamber. The support frame can include a continuous upper portion and a segmented lower portion which allows thermal stresses to be accommodated during processing of semiconductor substrates in the plasma chamber.
Patent TW-543123-B (TW)
Title: Method of forming copper oxide film, method of etching copper film, and method of fabricating semiconductor device
Inventor: UOZUMI YOSHIHIRO
IPC: H01L21/288
Filed: 2000-11-18
Granted: 2003-07-21
Abstract: This invention provides a method of copper film etching and a manufacturing method of semiconductor. The method is to oxidize a copper film and then to remove the oxide by acid or alkali so that a copper film with better smoothness can be obtained using less engineering time of etching treatment. A barrier metal 2 is buried into the wiring trench on the insulation film 1 and a mixed solution of aqueous ammonia and aqueous hydrogen peroxide, which has been adjusted to have pH of 8 to 10, to contact a surface of a copper wiring imbedded by the barrier metal 2 to form a copper oxide film 5 containing an ammonia complex. A selective etching is performed on the copper oxide film 5 using weak oxidizing acid like diluted hydrochloric acid or weak oxidizing alkali like ammonia and then a barrier metal 4 is formed on the surface. Therefore, the method enables better surface smoothness from copper etching compared with the conventional etching. A stable barrier metal is thus formed using safe and cost effective reagent for oxidation and etching in a short time.
Patent TW-475297-B (TW)
Title: Nonaqueous electrolyte battery
Inventor: HATAZAWA TSUYONOBU
IPC: H01M50/122
Filed: 2000-11-21
Granted: 2002-02-01
Abstract: Disclosed is a nonaqueous electrolyte battery including a battery element contained in an outer covering member composed of a laminated film and sealed therein by heat seal, and a gas absorbable material interposed between the outermost layer of the outer covering member and the battery element. Such a battery is advantageous in that even if gas occurs in the battery element, the laminated film as the outer covering member is prevented from being swelled.
Patent TW-I255206-B (TW)
Title: Apparatus for treating surfaces of substrates of organic or inorganic materials by ultraviolet radiation and method for the treatment
Inventor: ROTH-FOLSCH ANGELIKA
IPC: H01L21/306
Filed: 2001-01-19
Granted: 2006-05-21
Abstract: For the treatment of surfaces of substrates of organic or inorganic materials, reactive fragments-especially radicals or ions-are produced by ultraviolet radiation; the ultraviolet radiation is performed by at least one ultraviolet radiator disposed at a given distance, with a gas-filled, elongated discharge chamber whose walls are formed by a dielectric, which is provided on the side facing away from the discharge chamber with at least one electrode; during the irradiation a translational and/or rotatory relative movement is performed between the substrate and the ultraviolet radiator at a comparatively slight distance between radiator and substrate surface, in order to achieve, in a simple manner, an intense and uniform illumination of the surface being irradiated. The treatment is directed especially to silicon substrates or glass substrates. (a) For the cleaning of substrate surfaces-as for example the removal of photoresists or of aerosol-or for the modification of the molecular surface structure by superficial oxidation of the substrate with ozone and oxygen radicals under ultraviolet radiation (photons break up the surface structure). (b) For the coating (or building up of layers) on substrate surfaces by reactive fragments from the gas phase (between radiator and substrate surface) which settle on the surface and thus build up the coating.
Patent TW-536678-B (TW)
Title: Device and method for automatically generating test programs of test mechanism
Inventor: CHENG YI-JEN
IPC: G01R31/317
Filed: 2000-11-28
Granted: 2003-06-11
Abstract: The present invention provides a device for automatically generating test programs of test mechanism, which includes: a test mechanism program bank including test program modules of a plurality of test mechanism, the test program modules being generated by a test strategy of the test mechanism; and an operating platform for automatically converting and generating a test program of the test mechanism corresponding to a test requirement of one test mechanism and based on the test strategy of the test mechanism program bank.
Patent TW-513648-B (TW)
Title: Web shopping method and system therefor
Inventor: WU YAU-TZUNG
Filed: 2000-12-20
Granted: 2002-12-11
Abstract: There are provided a web shopping method and a system therefor. At first, the user is connected to web shopping system via the web browser, allowing the user to enter a shopping website to do merchandise order processing. Among them, the web shopping system includes a shopping website processing module, an input processing module, a data processing module and a result output module. When the shopping website processing module determines that the input processing module has input message, the shopping website processing module is hyperlinked to a data inquiry module, enabling the user to input the product name, the estimated product amount and total budget amount to be ordered. After completing data input and picking inquiry function input option, it is determined whether the corresponding product database has a product name identical to the product name inputted by user, and whether the corresponding product amount is less than the estimated amount. If matching, it is further determined whether the total transaction amount from purchasing the product exceeds the total budget amount and forward the inquiry result is forwarded to the user via the result output module so as to adequately inform user whether the total budget amount is exceeded. The invention helps the web shopping user to limit the excess of shopping budget so as to quickly and economically finish web shopping without having to search the product to be ordered one-by-one from the product directory.
Patent TW-465064-B (TW)
Title: Bonding process and the structure thereof
Inventor: LI JIUN-JE
IPC: B23K20/00
Filed: 2000-12-22
Granted: 2001-11-21
Abstract: A bonding process is disclosed, which comprises: provide a chip which has at least plural bonding pads, provide a carrier which has plural contacts. Form two stacked bumps on each bonding pad by a wire-bonder, then proceed a reverse-bonding process by this wire-bonder to electrically connect the bumps and the corresponding contacts respectively, i.e. connect a conduction wire to one of said contacts in the way of ball-bonding, then connect the conduction wire to one of the corresponding bumps in the way of stitch-bonding.