Patent SG-11201807113Q-A (SG)
Title: Chemical vapor deposition process to build 3d foam-like structures
Inventor: LOEBLEIN MANUELA
IPC: C23C16/34
Filed: 2017-03-09
Abstract: INTERNATIONAL APPLICATION PUBLISHED UNDER THE PATENT COOPERATION TREATY (PCT) (19) World Intellectual Property -, Organization 11111111011110111010101111101011111011101111011100111111011101111101111011111 International Bureau 0.. .... .. (10) International Publication Number (43) International Publication Date ..... ..or::,,, 14 September 2017 (14.09.2017) WIP0 I PCT WO 2017/155468 Al (51) International Patent Classification: (74) Agent: VIERING, JENTSCHURA & PARTNER LLP; C23C 16/26 (2006.01) C23C 16/01 (2006.01) P.O Box 1088, Rochor Post Office, Rochor Road, Singa- C23C 16/34 (2006.01) CO1B 32/182 (2017.01) pore 911833 (SG). (21) International Application Number: (81) Designated States (unless otherwise indicated, for every PCT/SG2017/050113 kind AO, of national protection available): AE, AG, AL, AM, AT, AU, AZ, BA, BB, BG, BH, BN, BR, BW, BY, (22) International Filing Date: BZ, 9 March 2017 (09.03.2017) DO, CA, CH, CL, CN, CO, CR, CU, CZ, DE, DJ, DK, DM, DZ, EC, EE, EG, ES, FI, GB, GD, GE, GH, GM, GT, (25) Filing Language: English HN, KP, HR, HU, ID, IL, IN, IR, IS, JP, KE, KG, KH, KN, KR, KW, KZ, LA, LC, LK, LR, LS, LU, LY, MA, (26) Publication Language: English MD, ME, MG, MK, MN, MW, MX, MY, MZ, NA, NG, (30) Priority Data: NI, 10201601834U 9 March 2016 (09.03.2016) SG RU, TH, NO, NZ, OM, PA, PE, PG, PH, PL, PT, QA, RO, RS, RW, SA, SC, SD, SE, SG, SK, SL, SM, ST, SV, SY, TJ, TM, TN, TR, TT, TZ, UA, UG, US, UZ, VC, VN, (71) Applicant: NANYANG TECHNOLOGICAL UNIVER- ZA, ZM, ZW. SITY [SG/SG]; 50 Nanyang Avenue, Singapore 639798 (SG). (84) Designated States (unless otherwise indicated, for every kind of regional protection available): ARIPO (BW, GH, (72) Inventors: LOEBLEIN, Manuela; c/o Nanyang Techno- GM, logical University, 50 Nanyang Avenue, Singapore 639798 TZ, KE, LR, LS, MW, MZ, NA, RW, SD, SL, ST, SZ, UG, ZM, ZW), Eurasian (AM, AZ, BY, KG, KZ, RU, (SG). TSANG, Siu Hon; c/o Nanyang Technological Uni- TJ, versity, 50 Nanyang Avenue, Singapore 639798 (SG). DK, TEO, Hang Tong Edwin; c/o Nanyang Technological LV, University, 50 Nanyang Avenue, Singapore 639798 (SG). SM, TM), European (AL, AT, BE, BG, CH, CY, CZ, DE, EE, ES, FI, FR, GB, GR, HR, HU, IE, IS, IT, LT, LU, MC, MK, MT, NL, NO, PL, PT, RO, RS, SE, SI, SK, TR), OAPI (BF, BJ, CF, CG, CI, CM, GA, GN, GQ, = = — GW, KM, ML, MR, NE, SN, TD, TG). [Continued on next page] = Title: CHEMICAL VAPOR DEPOSITION PROCESS TO BUILD 3D FOAM-LIKE STRUCTURES (54) = — (57) : There is provided a chemical vapor depos- = Fig 1 ition process comprising heating a porous metal template at CVD growth a temperature range of 500 to 2000 °C; passing a gas mix- a carrier gas carrying along a vapor of an or- tune comprising - — _ = ganometallic compound and at least one of a carbon precurs - = or gas and a boron nitride precursor gas through the heated = metal template, wherein the heating temperature causes the decomposition of the organometallic compound vapor into = Gas N i G Oir metal particles, the carbon precursor gas into graphene do - Ar u mains, and/or the boron nitride precursor gas into hexagon- = = Pr oz.., al-boron nitride domains, further wherein the graphene do- mains and/or the hexagonal-boron nitride domains nucleate = and grow on the metal particles and the metal template to form a three-dimensional interconnected porous network of [ ,,IF(..k; graphene and/or the hexagonal-boron nitride. There is also 900 O)T provided a foam-like structure produced by a process as de- scribed above. There is also provided a foam-like structure _ = — as described above for use in electrochemistry, solar cells, filler, thermal interface material, sensing or biological ap - I-1 plications. . 4 GC ii- kin kin ,—, IN ,—, © ei O WO 2017/155468 Al MIDEDIM01101DERMEMOMOVEM100111111111110111110110111111 Published: — with international search report (Art. 21(3))