Patent UA-89007-C2 (UA)
Title: Process for the preparation of nanosized metal oxides and/or metalloids
Inventor: KARTEL MYKOLA TYMOFIIOVYCH
IPC: C01B33/00
Filed: 2008-12-26
Abstract: The invention relates to chemical technology for the preparation of nanosized oxides by hydrolysis of halogen-containing compounds of metals and/or metalloids, primary in the flame of air-hydrogen burner, and can be used for the preparation of high-temperature heat insulation materials, intensive fillers of polymer systems, thixotropic thickeners of liquid-phase mediums, active components of drill fluids, catalysts, etc. The process comprises process step for the preparation of chlorine-containing compounds of elements and their homogenizing with fuel and oxidant, firing of mixture in burner flame, coagulation of the obtained particles of oxides and products, treatment of oxide surface, regeneration of hydrogen chloride to chlorine and hydrogen and their return into closed technology cycle. Homogeneous mixture of primary components is prepared before the inlet into the burner by separate at least two streams in mixers, in one of which chlorine-containing compounds of elements are homogenated primary with air, obtained in high temperature process and immediately directed from reactor for their preparation to the mixer, and in another mixer primary combustion gases are homogenated mainly with aqueous vapor, joining the streams of the mixtures, prepared at various temperatures at the outlet of burner with their further firing. The mixture of chlorine-containing compounds, mainly with air, is prepared at temperature lower the decomposition temperature of chlorine-containing compounds, mainly at 500-600 °С, maintaining the desired temperature by heat exchanger and/or by introduction of cooled components. As chlorine-containing compounds the inorganic, mainly silicon tetrachloride and organoelemental chlorides are used. Inorganic chlorides are prepared by chlorination and/or hydrochlorination of elements and/or chlorination of compounds in the presence of reducing agents and catalysts. Chlorination processes can be carried out on the surface of lump silicon and/or ground silicon, and/or silicon melt and/or silicon in melt of chloride salts. During the process for the preparation of inorganic chlorides chlorine can be used, obtained from hydrogen chloride by its catalytic oxidation or by electrolysis of concentrated hydrochloric acid. In burner hydrogen or organic, or organoelemental compounds, or carbon oxide, or their mixtures in the stream of air or oxygen, or their mixture are burned. Chlorine-containing compounds of the elements in fixed ratio are given to the mixer for the preparation of complex oxides of various elements. During the treatment process of oxide surface inorganic compounds are used, mainly inorganic chlorides, and/or organoelemental, and/or organic compounds in inert medium. Processes for the treatment of oxide surface by aqueous vapour are carried out primary in the medium of air and/or combustion products of flame. For the increasing of oxide purity the preliminary treatment of primary components is possible. Processes are carried out in reactors, primary made of metals and/or ceramic materials. Technical result: simplified synthesis process of nanosized metal oxides and metalloids, decreased energy demands, decreased production cost of the base product, expanded raw material base and range of the obtained oxides.