baber/WOPTO huggingface dataset:
Patent JP-S63225136-A (JP)
Title: Computing apparatus of optical constant of evaporation film
Inventor: KAWASAKI SHUNSUI
IPC: G01N21/41
Filed: 1987-03-16
Abstract: PURPOSE:To enable the automatic, accurate and rapid computation of a complex refractive index and a film thickness of one evaporation film on the inner-layer side, by using the measured values of transmittivity and surface reflectivity of evaporation films of two layers. CONSTITUTION:A transmittivity T and a surface reflectivity Rf corresponding to sweep parameters, a refractive index (n), an absorption coefficient K and a film thickness D, are calculated from these parameters at a prescribed optical wavelength lambdaby a transmittivity-reflectivity converting means 600. Next, with the sweep parameters (k) and D varied, a film thickness D of a first-layer film at which the differences between the respective calculated values and measured values (T0, Rf0, respectively) of T and Rf, X=T-T0 and Y=Rf-Rf0, are smaller, is determined at a specified wavelength by a film thickness approximating means 400. Then, with the sweep parameters (n) and (k) varied, such values of (n) and (k) as satisfy the conditions of convergence are calculated further with regard to each wavelength by a refractive index-absorption coefficient approximating means 500. By this method, a complex refractive index and a film thickness of one evaporation film on the inner-layer side can be computed automatically, accurately and rapidly.
Patent JP-H09248568-A (JP)
Title: Production of purified water and purified water reduction device used therefore
Inventor: SAKAGUCHI MOROHEI
IPC: C02F1/42
Filed: 1996-03-18
Abstract: PROBLEM TO BE SOLVED: To prevent deterioration of water quality of purified water when water level control for maintaining the purified water level in a purified water tank in a constant range is performed. SOLUTION: When raw water supplied from a raw water tank 1 is made into purified water with a water purifying tower 2 and the purified water is stored in the purified water tank 3 the purified water 18 produced with the water purifying tower 2 is circulate to the raw water tank 1 during a period that the water level of the purified water 18 stored in the purified water tank 3 reaches an upper limit, value and then the water level decreases to a prescribed value.
Patent JP-H0671801-A (JP)
Title: Reinforcing material and its manufacture
Inventor: OKADA SHINICHIRO
IPC: B32B5/28
Filed: 1993-02-24
Abstract: PURPOSE:To manufacture reinforcing material efficiently by a simple operation by a method wherein warps and wefts do not intersect at right angles and intervals of mesh and angles of fiber bundle can be freely adjusted. CONSTITUTION:A bundle of fiber 1 having 5-30 turns per meter is impregnated with thermosetting resin to form a resin-impregnated fiber bundle 5, which bundle 5 is wound around a rotary drum 7, wherein the bundle 5 is wound around the drum 7 in a mesh-like manner, while the bundle 5 is moved by a traverse roller 6 which moves forward and backward in the axial direction of the drum 7. By adjusting reciprocating speed of the roller 6 and rotational speed of the drum 7 relatively, intervals of mesh and angles of fiber in a reinforcing material can be controlled. If winding angle theta with respect to the drum 7 is set at 45 deg.<theta<=85 deg., a plurality of warps and a plurality of wefts intersect in different locations at an intersecting angle 8, where 90 deg.<theta<=170 deg..
Patent JP-H01234324-A (JP)
Title: Production of oxide superconducting material
Inventor: KAWASHIMA SHUNICHIRO
IPC: C01G3/00
Filed: 1988-03-15
Abstract: PURPOSE:To easily obtain a filmlike or wiry oxide superconducting material having low ductility by coating metallic copper with a soln. contg. Ba and a rare earth element and carrying out heat treatment. CONSTITUTION:Sheetlike or wiry metallic copper is immersed in a soln. contg. Ba and at least one kind of rare earth element selected among Y, La, Nd, Sm, Eu, Gd, Dy, Ho, Er, Tm, Yb and Lu. The copper is then pulled up, dried and heat-treated. After these immersing, drying and heat treating stages are repeated twice or more, heat treatment is carried out at a higher temp. than said heat treatment.
Patent JP-S54152874-A (JP)
Title: Semiconductor device and its manufacture
Inventor: KAMEI TATSUYA
IPC: H01L29/861
Filed: 1978-05-24
Abstract: PURPOSE:To increase the forward dielectric strength up to the same level as the reverse dielectric strength for the semiconductor device featuring the negative bevel at the periphery of the PN junction by setting previously the impurity density near the negative bevel surface lower than the internal impurity density at that region. CONSTITUTION:Region 4a featuring a low acceptor density is provided near the bevel surface of P-type base region 4 which constitutes the thyristor. Thus, N-type Si substrate 3 to be N-type base layer is cacuum-enclosed into the quartz capsule along with Ga which is the diffusion source, and then Ga is diffused into substrate 3 through the heat treatment. After this, substrate 3 is taken out of the capsule to be heated up in the oxygen atmosphere in order to form P-type emitter layer 2 and base layer 4 on both surfaces of substrate 3. Then the negative bevel is formed at the both edges from layer 4 through substrate 3, and the entire surface is covered with the SiO2 film with the window drilled. Thus, N-type emitter region 5 is formed by diffusion within layer 4. In this case, an out-diffusion is given with Ga simultaneously to cause region 4 featuring a lower impurity density than region 4a on the bevel surface.
Patent JP-S54153460-A (JP)
Title: Reference speed pattern generator for elevator
Inventor: HARADA YUTAKA
IPC: B66B1/52
Filed: 1978-05-24
Abstract: PURPOSE: To efficiently run a gondola and shorten its moving time, by attaching a preceding brush to a synchronizing member to automatically determine an appropriate reference maximum speed pattern for short run despite the difference in the height between floors.  
     CONSTITUTION: The preceding brush 17 is attached to the synchronizing member 19 of a floor selector so that the brush is located at a prescribed distance So ahead of the synchronizing member. When a starting instruction SI applied to the gondola, an initial value Co corresponding to the distance So is entered into a counter 11. When the gondola is moving, the output of a pulse generator PG is added to the initial value Co in the counter. The output of the counter 11 is applied to an amplifier 13 through a D-A converter 12. The output of the amplifier 13 is supplied to a sample hold circuit 15 through a route generator 14. When the brush 17 has come into contact with a floor member 18, the output of the route generator 14 is held. If the output of the generator 14 is not higher than a prescirbed value, the output is supplied as a reference speed pattern from a limit circuit 16. 
     COPYRIGHT: (C)1979,JPO&Japio
Patent JP-2000256635-A (JP)
Title: Substrate with adhesive layer using acrylic resin and adhesive film
Inventor: SUMIYA KEIJI
IPC: C09J163/00
Filed: 1999-03-09
Abstract: PROBLEM TO BE SOLVED: To provide substrates with an adhesive layer stable in adhesive strength which are different in adhesive strength at both sides and have heat resistance, resistance to galvanic corrosion and moisture resistance necessary for mounting semiconductor chips large in the difference in coefficient of thermal expansion on various types of high density printed-wiring boards of glass epoxy substrates, flexible substrates and the like, and adhesive films. SOLUTION: A substrate with an adhesive layer using an acrylic resin is obtained by forming an adhesive layer comprising an acrylic resin composed of (A) 1-10 wt.% structural units derived from a (meth)acrylate monomer having an epoxy group, (B) 10-50 wt.% structural units derived from acrylonitrile, and (C) 40-89 wt.% structural units derived from another copolymerizable monomer and having a weight average molecular weight of 500,000-1,500,000 and a glass transition temperature of -50 to 0 deg.C; an epoxy resin; and an epoxy resin curing agent on a substrate having no same tendency in hydrophobicity or hydrophilicity as the acrylic resin. An adhesive film is obtained by removing the substrate from this substrate with an adhesive resin.
Patent JP-H11335138-A (JP)
Title: Photosensitive paste, plasma display, and plasma address liquid crystal display and their production
Inventor: MORIYA TAKESHI
IPC: H01J11/22
Filed: 1999-03-09
Abstract: PROBLEM TO BE SOLVED: To obtain a photosensitive paste having good coatability, giving coating film surfaces having excellent smoothness and hardly irregularly reflecting irradiated light on the surfaces by compounding an inorganic powder having a specific tap density, a specific average particle diameter, a specific maximum particle diameter and a specific average refractive index. SOLUTION: An inorganic powder has a tap density of >=0.6 g/cm<3> , an average particle diameter of 1-7 μm, the maximum particle diameter of 5-40 μm and an average refractive index of 1.5-1.7. The photosensitive paste comprises an inorganic powder, a photosensitive organic component and an organic solvent. The inorganic powder and the photosensitive organic component are compounded in a weight ratio of 60:40 to 85:15. A difference between the refractive index of the photosensitive organic component and the average refractive index of the inorganic powder is <=0.1. The inorganic powder contains glass powder containing lithium oxide, sodium oxide, potassium oxide, etc. The photosensitive organic component contains a photosensitive monomer and a photosensitive oligomer (polymer) as main components, and further contains a photopolymerization initiator and a UV light absorbent.
Patent JP-H03263001-A (JP)
Title: Production of microlens for focusing infrared ray and infrared ray sensor with microlens
Inventor: MORI TAKETOSHI
IPC: A61B5/00
Filed: 1990-03-14
Abstract: PURPOSE:To allow simultaneous mass production of microlenses for focusing IR rays without requiring a polishing stage by etching a substrate with a mask film having the prescribed patterns formed on the substrate as an etching mask and thereby forming the lens parts on this substrate. CONSTITUTION:The lenses are produced by utilizing the photolithographic technique and etching technique used for production of semiconductors. Namely, the lens substrate 1 consisting of a material, such as silicon or germanium, which allows the transmission of IR rays, is prepd. and the etching mask 8 is formed on this lens substrate 1 by using the photolithographic technique. The etching mask 8 in the case of formation of convex lenses 20 is formed as the double structures consisting of an underlying film having the solubility in the etching soln. used for etching of the lens substrate 1 and photoresist film deposited on this underlying film. The many microlens parts 20 are simultaneously formed on one sheet of the lens substrate 1 in this way.
Patent JP-H09260519-A (JP)
Title: Semiconductor integrated circuit and its manufacture
Inventor: ITAGAKI SHIN
IPC: H01L21/8222
Filed: 1996-03-18
Abstract: PROBLEM TO BE SOLVED: To provide a semiconductor integrated circuit which can prevent the deterioration of β (grounded emitter current amplification gain). SOLUTION: This circuit is constituted by incorporating a parasitic and lateral-type bipolar transistor by using a first n<+> diffusion layer 4 and a second n<+> diffusion layer 5, which are generated at the time of forming the source or drain of a MOS field effect transistor, and the circuit has two layer polysilicon capacity 21 constituted of a lower layer polysilicon 21a, an oxide film (dielectric layer) 21b and an upper layer polysilicon 21c. In such a case, the lower layer polysilicon 21a is formed at a part of the collector area of the bipolar transistor being the second n<+> diffusion layer 5, and a deep collector junction is formed in the collector area below the polysilicon 21a.
Patent JP-H02239776-A (JP)
Title: Data transmitting device
Inventor: SHIROTA NORIHISA
IPC: H04N1/415
Filed: 1989-03-14
Abstract: PURPOSE:To attain buffering with feedforward control by dividing sequentially an AC component of a coefficient value data obtained by conversion coding so as to obtain M, S and P blocks, sending flags Fm, Fs, Fp representing transmission patterns and sending only a significant data. CONSTITUTION:An input digital picture signal is fed to a block processing circuit 2, in which the signal is converted from the scanning sequence into block sequence. Then a cosine transformation circuit 3 applies 2-dimension cosine transformation and a fixed weight coefficient is multiplied with a weighting circuit 4. The L block is divided into M block and a flag Fm is decided. Then the block is divided into the S block to decide the flag Fs. Thus, a controlled weight coefficient is multiplied with a coefficient data in the weight circuit provided for buffering processing for samples divided into four so that the transmission data quantity per field does not an object prescribed value.
Patent JP-S55154402-A (JP)
Title: Shape measuring apparatus
Inventor: TAKABAYASHI HITOSHI
IPC: G01B11/24
Filed: 1979-05-21
Abstract: PURPOSE: To make the measurement of the shapes of objects possible at a high speed in the absence of any contact with the objects and without moving the same by forming a light spot on the object to be measured through scanning of a light beam and detecting the output showing the displacement of the image of this light spot.  
     CONSTITUTION: Light from a light source 1 is passed through a reflecting morror 3, rotary mirror 4, etc. to image a light spot on an object M. This light spot is imaged on a photo detector 8 by a condenser lens 6, and its position is determined by the unevenness of the object M. From the photo detector 8, the output S proportional to the image position of the light spot on a photo detecting surface is obtained. However, the output S and the change component of the displacement of the object M are not proportional and therefore they are made to become proportional by a correcting circuit 10. The intensity distribution of the image is made identical by letting the locus of the image of the light spot and photo detecting surface coincide. If these error factors are eliminated, the signal proportional to the unevenness of the object M may be output from the circuit 10 by scanning the spot position by the rotary mirror 4. 
     COPYRIGHT: (C)1980,JPO&Japio
Patent JP-S5942499-A (JP)
Inventor: NISHIZAWA MINORU
IPC: G21F9/36
Filed: 1983-04-07
Abstract: (57)【要約】本公報は電子出願前の出願データであるた め要約のデータは記録されません。
Patent JP-H06248695-A (JP)
Title: Frame construction method of cross girder and built-up member thereof
Inventor: KOJIMA EIJI
IPC: E04B1/18
Filed: 1993-02-26
Abstract: PURPOSE:To increase vertical rigidity of a floor slab without loading girders and, increase horizontal rigidity of a frame and enhance the execution efficiency. CONSTITUTION:A plurality of columns 1 are erected each in X direction and in Y direction of a building. Girders 2 are framed as a unit respectively between the columns 1 adjacent in X direction and in Y direction each other, and rigid frame construction can be obtained as a whole. In constitution constituted of two columns 1 adjacent in X direction, another two columns 1 adjacent respectively in Y direction from those two columns 1 and a total of four girders 2 constructed respectively in X direction and in Y direction among those four columns 1, cross girders 3 are constructed as a unit between two columns 1 in relative positions diagonal to each other. There are still two pairs of two columns in the relative positions diagonal to each other, so that two cross girders 3 can be constructed. Two cross girders 3 are cross each other in the intermediate section as a unit.
Patent JP-H04300145-A (JP)
Title: Tool blade control system
Inventor: YAMATANI SHIGERU
IPC: B23Q17/09
Filed: 1991-03-26
Abstract: PURPOSE:To perform control of a tool blade suitably and rationally by constructing a system in such a manner that a use limitation time of each tool blade is compared with a use accumulation time thereof; as well as the use hysteresis of the tool blade is controlled and polishing time of each blade and an exchange time thereof are printed out on a slip or displayed on a screen. CONSTITUTION:Data from an input device 1 (the kind of a processed steel or an use time of a tool, and the like) are read out from a memory 4, taken out through a circuit 6, and added to the appropriate tool blade data in a calculation circuit 5. Also, a tool balde is controlled per tool number, and a use hysteresis per tool blade may include an use accumulation time per kind of steel, and an evaluated use accumulation time T1 when the tool blade is converted to a specified processed steel for the purpose of a synthetic decision thereof is calculated for assessment. And then the evaluated use accumulation time T1 is compared with an evaluated use limitation time T2 of the appropriate tool blade; and a tool blade number which requires polishing is outputted on a slip form 9 or a video terminal 10 through an editing circuit 7 and a printing circuit 8 when T1>T2 condition is satisfied.
Patent JP-S52144386-A (JP)
Title: Production of blue fluorescent substance
Inventor: TAKAHASHI KOUICHI
IPC: C09K11/08
Filed: 1976-05-27
Abstract: PURPOSE: To produce a divalent Eu-activated blue fluorescent substance with high radiation efficiency and high luminance under excitation using ultraviolet-, cathode-, or X-rays by mixing precursors of MgO, Al 2 O 3 , and Eu 2 O 3  which can be converted into these oxides at high temperature and Ba halide in a specified ratio and calcining the mixture in two steps. 
     COPYRIGHT: (C)1977,JPO&Japio
Patent JP-2000075835-A (JP)
Title: Plasma display panel driving method
Inventor: SETOGUCHI NORIAKI
IPC: G09G3/291
Filed: 1999-03-09
Abstract: PROBLEM TO BE SOLVED: To realize stable address discharge by surely executing a reset discharge and an erase discharge by suppressing the reduction of contrast caused by the reset discharge. SOLUTION: This plasma display panel driving method, wherein a plurality of a 1st and a 2nd electrodes are arranged in parallel adjacently to each other, a plurality of 3rd electrodes are arranged so as to intersect both electrodes, specified electrical discharge cells are arranged in matrix at the intersection areas of each electrode, comprises a reset period to uniform wall charge distribution of electrical discharge cells, an address period to form the wall charge according to a display data, and a maintenance discharge period to carry out maintenance electrical discharge.  In the reset period, a 1st pulse Vwy varying in the impressed voltage as time passes is impressed across the 1st and 2nd electrodes to generate a 1st discharge; and then, a 2nd pulse Vey varying in the impressed voltage as time passes is impressed across the 1st and 2nd electrode to generate a 2nd discharge as an erase discharge.
Patent JP-H02240759-A (JP)
Title: Dma controller
Inventor: IIDA TOSHIYA
IPC: G06F13/28
Filed: 1989-03-14
Abstract: PURPOSE:To attain the control of various types of DMA transfer without increasing the circuit scale by providing an input signal selection means and an output signal selection means which supplies the answer signal received from a DMA control means to the circuit corresponding to the control information. CONSTITUTION:Various control signals are inputted to an input signal selection means 1 for control of DMA transfer actions. These control signals are selected in accordance with the control information and outputted via a prescribed output terminal. The control signals outputted from the means 1 are sent to the DMA control means FF1 - FFn and processed there. The means FF1 - FFn output the answer signals to those control signals. The answer signals are sent to the circuits corresponding to the control information via an output signal selection means 2. Then the DMA transfer is controlled. Thus various types of DMA transfer can be controlled without increasing the circuit scale.
Patent JP-H10235624-A (JP)
Title: Method and apparatus for preparing ferrite powder
Inventor: MURAI KENICHI
IPC: B28B1/32
Filed: 1997-02-28
Abstract: PROBLEM TO BE SOLVED: To obtain granulated powder with a little variation in particle size distribution and with a required particle diameter by a method wherein a slurry is sprayed and a magnetic field is applied on the sprayed slurry and hot air is fed in a chamber to remove the solvent from the sprayed slurry. SOLUTION: In a countercurrent spray dry type apparatus for preparing ferrite powder, a slurry 7 sprayed from an orifice provided on a pressure nozzle 4 is changed into droplets 8 from a liq. film condition. In addition, the slurry 7 which is sprayed and is to be changed into the droplets is passed through in a magnetic field 3 of 3-5KG generated between air-cored coils 5 provided in facing on both sides of an orifice 6 of the pressure nozzle 4 and is changed into the droplets. The droplets 8 passed through this magnetic field are changed into spheres caused by surface tension after aggregation and fall down in a chamber 1 and are discharged as granulated powder from a bottom exit 9. In addition, hot air 2 at 300 deg.C 18 fed into the chamber 1.
Patent JP-S58178351-A (JP)
Title: Photosensitive silver halide material
Inventor: KOJIMA TETSUO
IPC: C08F20/00
Filed: 1982-04-14
Abstract: PURPOSE:To obtain the titled material preventing the formation of a static mark due to ultraviolet rays, the deterioration of the color reproducibility and the fading and discoloration of the resulting color image due to light, by incorporating specified ultraviolet-ray absorbing polymer latex into a photosensitive silver halide material. CONSTITUTION:The titled material having >=1 photosensitive silver halide emulsion layer and >=1 nonphotosensitiv layer on a support contains ultraviolet-ray absorbing (co)polymer latex having repreating units derived from a monomer represented by formula I [where R is H, 1-4C alkyl or Cl; X is formula II, formula III or phenylene; A is 1-20C alkylene or 6-20C arylene; Y is O, SO2, formula II, formula IV or the like; each of m and n is 0 or 1; and Q is an ultraviolet-ray absorbing group represented by formula V (where each of R1 and R2 is H, 1-20C alkyl or 6-20C aryl, both of them are not H, they may bond to each other; R3 is cyano, formula VI or the like; R4 is cyano, formula VIIor the like; each of R5 and R6 is 1-20C alkyl or 6-20C alkyl, R5 and R6 may bond to each other; at least one of R1-R4 bonds to the vinyl group through a combining group)].
Patent JP-H06275928-A (JP)
Title: Polyamide acid composition and metal leaf laminate using the same
Inventor: SATO YUZO
IPC: B32B15/08
Filed: 1993-03-22
Abstract: PURPOSE:To obtain a polyimide film being free from a curl in the form of a laminate with a metal leaf by using a polyamide acid giving polyimide of which the thermal deformation starting temperature and thermal expansion coefficient are specific after setting and tertiary amine having a specific standard boiling point, as requisite components. CONSTITUTION:The requisite components of this polyamide acid composition are a polyamide acid giving polyimide of which the thermal deformation starting temperature is 200 to 400 deg.C and the thermal expansion coefficient 0.8 to 2.5X10<-5> deg.C<-1> after setting and tertiary amine having a standard boiling point not so much lower as 50 deg.C than the thermal deformation starting temperature of the polyimide. By applying this polyamide acid composition on a metal leaf and setting it by heating, a polyimide film free from a curl in a state of a metal leaf laminate and also in a state of the metal leaf being removed, and excellent in an alkali etching property and adhesion to the metal leaf, can be obtained.