Patent SG-11201407782Q-A (SG)
Title: Photon source, metrology apparatus, lithographic system and device manufacturing method
Inventor: PELLEMANS HENRICUS
IPC: H05H1/24
Filed: 2013-05-23
Abstract: (12) INTERNATIONAL APPLICATION PUBLISHED UNDER THE PATENT COOPERATION TREATY (PCT) (19) World Intellectual Property Organization International Bureau (43) International Publication Date 3 January 2014 (03.01.2014) WIPOIPCT (10) International Publication Number WO 2014/000998 A1 (51) International Patent Classification: G03F 7/20 (2006.01) H01J 61/02 (2006.01) H05G 2/00 (2006.01) H01J 61/54 (2006.01) G01N21/956 (2006.01) H05B 41/38 (2006.01) H01J 65/04 (2006.01) (21) International Application Number: (22) International Filing Date: (25) Filing Language: (26) Publication Language: PCT/EP2013/060664 23 May 2013 (23.05.2013) English English (30) Priority Data: 61/658,654 12 June 2012 (12.06.2012) US (71) Applicant: ASML NETHERLANDS B.V. [NL/NL]; P.O. Box 324, NL-5500 AH Veldhoven (NL). (72) Inventors: PELLEMANS, Henricus; De Pruikenmaker 20, NL-5506 CT Veldhoven (NL). VAN DER ZOUW, Gerbrand; Bandalaan 31, NL-5641GG Eindhoven (NL). SMEETS, Ralph; Pegbroekenlaan 21, NL-5504 MP Veld­ hoven (NL). DE WIT, Johannes; De Plaetse 28, NL-5708 ZJ Helmond (NL). ANTSIFEROV, Pavel; Jubileynaja 4 app. 6, Troitsk, 142190 (RU). KRIVTSUN, Vladimir; Okyabrsky pr. 23-85, Troitsk, 142190 (RU). (74) Agent: BROEKEN, Petrus; De Run 6501, NL-5504 DR Veldhoven (NL). (81) Designated States (unless otherwise indicated, for every kind of national protection available)'. AE, AG, AL, AM, AO, AT, AU, AZ, BA, BB, BG, BH, BN, BR, BW, BY, BZ, CA, CH, CL, CN, CO, CR, CU, CZ, DE, DK, DM, DO, DZ, EC, EE, EG, ES, FI, GB, GD, GE, GH, GM, GT, HN, HR, HU, ID, IL, IN, IS, JP, KE, KG, KM, KN, KP, KR, KZ, LA, LC, LK, LR, LS, LT, LU, LY, MA, MD, ME, MG, MK, MN, MW, MX, MY, MZ, NA, NG, NI, NO, NZ, OM, PA, PE, PG, PH, PL, PT, QA, RO, RS, RU, RW, SC, SD, SE, SG, SK, SL, SM, ST, SV, SY, TH, TJ, TM, TN, TR, TT, TZ, UA, UG, US, UZ, VC, VN, ZA, ZM, ZW. (84) Designated States (unless otherwise indicated, for every kind of regional protection available)'. ARIPO (BW, GH, GM, KE, LR, LS, MW, MZ, NA, RW, SD, SL, SZ, TZ, UG, ZM, ZW), Eurasian (AM, AZ, BY, KG, KZ, RU, TJ, TM), European (AL, AT, BE, BG, CH, CY, CZ, DE, DK, EE, ES, FI, FR, GB, GR, HR, HU, IE, IS, IT, LT, LU, LV, MC, MK, MT, NL, NO, PL, PT, RO, RS, SE, SI, SK, SM, TR), OAPI (BF, BJ, CF, CG, CI, CM, GA, GN, GQ, GW, ML, MR, NE, SN, TD, TG). Published: — with international search report (Art. 21(3)) (54) Title: PHOTON SOURCE, METHOD METROLOGY APPARATUS, LITHOGRAPHIC SYSTEM AND DEVICE MANUFACTURING 00 0\ o\ © o o o CJ o & Fig. 4 (57) Abstract: A laser driven light source comprises laser (52) and focusing optics (54). These produce beam of a radiation focused on a plasma forming zone within a container (40) containing a gas (e.g., Xe). Collection optics (44) collects photons emitted by a plasma (42) maintained by the laser radiation to form beam a of output radiation (46). The plasma has an elongate form (L > d) and the collecting optics is configured to collect photons emerging in the longitudinal direction from the plasma. The brightness of the plasma is increased compared with sources which collect radiation emerging transversely from the plasma. A metrology apparatus using the light source can achieve greater accuracy and/or throughput as a result of the increased brightness. Back reflectors may be provided. Microwave radiation may be used instead of laser radiation form to the plasma.