baber/WOPTO huggingface dataset:
Patent TW-344062-B (TW)
Title: Inspection method and device using pattern matching
Inventor: SUZUKI YASUYOSHI
IPC: G06T1/00
Filed: 1997-09-12
Granted: 1998-11-01
Abstract: An inspection method using pattern matching, which compares the article under inspection with a reference pattern of the article under inspection and calculates their consistency thereby inspectioning whether the shape of the article under inspection is good according to the calculated consistency, the method comprising: a photographing process of separately photographing a plurality of articles under inspection; a reference pattern setting process of setting one of the photographed plurality of articles under inspection as a reference pattern; a calculation process of examining the picture image of the reference pattern and the picture images of the other articles under inspection, and calculating the non-consistency of brightness data for each pixel corresponding to an identical portion of the articles; a mask pattern setting process of finding the pixels of the portion where the non-consistency of the calculated brightness data exceeds a prescribed threshold, and constituting a mask pattern by setting the thus found pixels; and a process of carrying out a pattern matching by inspectioning the picture image of the reference pattern with the picture images of the other articles under inspection after excluding the pixels constituting the mask pattern.
Patent TW-424079-B (TW)
Title: Method of making bulk high-strengthed and high-densitied graphite material artifacts
Inventor: CHOU HUEI-YU
IPC: C01B31/04
Filed: 1997-10-16
Granted: 2001-03-01
Abstract: The present invention relates to a method of making a high-strengthed and high-densitied graphite material artifact, which is mainly characterized in: adding a suitable ratio of a mesophase carbonized powder in a mesophase powder to increase the mechanical strength and density of the graphite material artifact (diameter or height >= 8cm) and reduce the carbonization rupture thereof. The main process comprises carbonizing a mesophase-carbonized powder in an atmosphere furnace by increasing the temperature to 800 to 1600 DEG C; mixing the mesophase powder with a mesophased carbonized powder at a suitable ratio; compacting the mixture at 500 to 2000 kg/cm<2> into a pot body; placing the blank in the atmosphere furnace; performing a low temperature (500 DEC C +/- 100 DEG C) carbonization treatment in vacuum; selecting a suitable rate of temperature increase to perform a high temperature carbonization treatment depending on the size of the pot body thereby increasing the carbonization density and the carbonization strength and reducing the time required for carbonization treatment and eliminating the problem of carbonization rupture caused by non-homogeneous carbonization shrinking. A high-strengthed and high-densitied graphite material artifact produced according to the present invention can be used on a large high-temperature-resistant and corrosion-resistant structural element, such as a metallurgical crucible, a corrosion-resistant shaft seal, heat-illuminating body, and electrode for electric-discharge processing, etc.
Patent TW-396289-B (TW)
Title: Liquid crystal display device
Inventor: SAKAMOTO MICHIAKI
IPC: G02F1/1343
Filed: 1997-10-28
Granted: 2000-07-01
Abstract: A liquid crystal display device comprises shield means for shielding an electric field generated from a data line. For example, a common electrode is used as the shielding means in an IPS (In-Plane Switching) mode in which an electric field is applied in a horizontal direction for a substrate. Specifically, the common electrode is provided closer to the liquid crystal layer than the data line so that the common electrode covers the data line. As a result, the leak electric field form the data line is shielded by the common electrode. Therefore, the leak electric field does not gives an adverse influence for the liquid crystal layer. Consequently, the light shield area as to the data line is unnecessary. This increase the aperture ration.
Patent TW-368427-B (TW)
Title: Control lever device
Inventor: HIRAOKA TAKAHIRO
IPC: A63F13/245
Filed: 1997-10-30
Granted: 1999-09-01
Abstract: A control lever device suited for use as a hand brake or the like in a driving game machine and capable of achieving a realistic game machine. In the control lever device, a lever is mounted at one end of a shaft so that it turns together with the shaft, and a gear support plate is mounted at the center of the shaft. The gear support plate is provided with a transmitting gear which meshes with a transmitted gear mounted on a rotary shaft of a variable resistor. The turning motion of the lever is transmitted to the rotary shaft of the variable resistor, and the resistance of the variable resistor is changed in accordance with the amount of turn of the lever. Mounted at the other end of the shaft is an urging force applying member having an urging force generating characteristic wherein the generation rate of the urging force relative to the amount of turn of the lever increases with increase in amount of turn of the lever. The gear support plate is provided with another urging force applying member formed of a tension coil spring.
Patent TW-358725-B (TW)
Title: Soft tissue closure systems
Inventor: LI SHU-TUNG
IPC: A61B19/00
Filed: 1997-11-03
Granted: 1999-05-21
Abstract: Disclosed in an implant delivery system, e.g., an implant delivery device which includes a detector having a probe positioned at the distal end of a cannula to detect the presence of body fluid flowing in the lumen, and thereby locate the implant member at the wall of the lumen. The implant member further includes a retaining member slidably positioned within the cannula to maintain the implant member at the wall of the lumen when the cannula is withdrawn over the implant member.
Patent TW-389949-B (TW)
Title: Method and apparatus for coating and development of the photo-resist solution
Inventor: YOSHIOKA KAZUTOSHI
IPC: G03F7/38
Filed: 1998-01-26
Granted: 2000-05-11
Abstract: The invention relates to a method and apparatus for coating the surface of a substrate such as a semiconductor wafer or an LCD (liquid crystal display) substrate with a desired resist pattern and developing the coated resist pattern. The resist coating-developing method comprises: (a) steps for setting a target value and its tolerance range thereof in respect of each of a pattern line width and a thickness of a resist film which is to be formed on a substrate, (b) a resist-coating step for coating a surface of the substrate with a photoresist solution, (c) a pre-baking step for baking a photoresist film formed on the surface of the substrate, (d) a first cooling step for cooling the baked substrate, (e) a light-exposure step for selectively exposing the photoresist coating film in a predetermined pattern, (f) a line width measuring step for measuring a line width of a latent image formed on the resist coating film selectively exposed in advance to light, (g) a post-baking step for baking the resist coating film selectively exposed to light in advance to form a pattern, (h) a second cooling step for cooling the baked substrate, (I) a developing step for developing the resist coating film selectively exposed to light in advance to form a pattern by applying a developing solution to the substrate, (j) a judging step for judging whether or not the value of the line width of the latent image measured in the step (f) of measuring the latent image line width falls within the allowable range of the target value, (k) a calculating step for calculating a difference between the measured value of the latent image line width and the target value, when the measured value of the latent image line width fails to fall within the allowable range of the target value, so as to determine a correcting amount in the process conditions in the steps falling within a range of between the resist coating step (b) and the developing step (I), and (l) a correcting step for correcting the process condition in at least one step selected from the group consisting of the resist coating step (b), light exposure step (e), post-baking step (g) and developing step (I).
Patent TW-363206-B (TW)
Title: Integrated wafer pod-load/unload and mass-transfer system
Inventor: RUSH JOHN M
IPC: H01L21/67
Filed: 1998-03-16
Granted: 1999-07-01
Abstract: A system includes an interface for receiving a pod having a carrier that receives wafers, and that is initially enclosed within a base and a pod cover. The system also includes a mechanism that transfers an exposed carrier between the interface and a platform of a mass-transfer machine included in the system. The machine includes a gantry arm for transferring the carrier between the platform and a transfer station. A retainer assembly is positionable over the carrier at the transfer station, and over a process carrier that is used in a processing tool. Moveable retainers of the assembly receive and hold wafers. The machine includes an elevator that moves between the transfer station and the process carrier. The elevator extends and retracts for transferring wafers between the retainers and either the carrier or the process carrier. A turntable, that receives the process carrier, permits automatically reorienting wafers.
Patent TW-396377-B (TW)
Title: Joint for fluid controller
Inventor: OHMI TADAHIRO
IPC: F17D1/02
Filed: 1998-05-06
Granted: 2000-07-01
Abstract: The joint is formed with a holding member having a section of u-shape and passage forming member held therein. On the upper wall of the holding member is bored a hole for installing the fluid controller thereon. Passage forming member comprises a main body having passages inside and inserted between the upper and lower walls, a tubular upper projection which communicates with the main body passage and the upper part is inserted into the throughhole disposed on the upper wall of the holding member and communicates with the downward passage of the fluid controller, and a tubular side projection communicating with the main body inner passage and extending to the side. An outward flange mounted on the upper end of passage forming member, and an inward flange to catch said flange is disposed in the throughhole on the upper wall of the holding member.
Patent TW-394912-B (TW)
Title: Method and apparatus for driving a capacitive display device
Inventor: PAGONES ANDREW J
IPC: G09G3/30
Filed: 1998-05-06
Granted: 2000-06-21
Abstract: An apparatus (110) for driving a capacitive display device (120) includes a pull-up transistor (180) having a source connected to a high voltage input node (184), a push-down transistor (182) having a source connected to a low voltage input node (186) and a drain connected to the drain of the pull-up transistor (180), a pull-up voltage level shifter (132) connected to the gate of the pull-up transistor (180), and a push-down voltage level shifter (134) connected to the gate of the push-down transistor (182), the drain of the pull-up transistor (180) connected to the drain of the push-down transistor (182) at a driver output node (170). A method for driving a capacitive display device (120) includes driving the capacitive display device (120) with a drive voltage signal (172) having a bandwidth substantially within the bandwidth of the capacitive display device (120).
Patent TW-406295-B (TW)
Title: Substrate conveying device and substrate conveying method
Inventor: TATEYAMA KIYOHISA
IPC: B25J15/06
Filed: 1998-05-11
Granted: 2000-09-21
Abstract: According to the present invention, there is provided a substrate conveying device for loading/unloading a substrate to/from a processing section, including an arm for holding the substrate, an arm drive mechanism for driving the arm such as to load/unload the substrate to/from the processing section, a first suction pad provided on the arm, for suctioning the substrate, a second suction pad provided on the arm at a position adjacent to that of the first suction pad, for suctioning the substrate, and a projecting member provided between the first and second suction pads of the arm, so as to control a posture of the substrate to be suctioned by one of the first and second suction pads as the projecting member abuts the lower surface of the substrate.
Patent TW-426666-B (TW)
Title: Sulfonamide compounds and pharmaceutical use thereof
Inventor: KAYAKIRI HIROSHI
IPC: A61K/
Filed: 1998-06-25
Granted: 2001-03-21
Abstract: A sulfonamide compound of the formula (I): R1-SO2NHCO-A-X-R2, wherein R1 is alkyl, alkenyl, alkynyl and the like; A is an optionally substituted heteropolycyclic group except benzimidazolyl, indolyl, 4,7-dihydrobenzimidazolyl and 2,3-dihydrobenzoxazinyl; X is alkylene, oxa, oxa(lower)alkylene and the like; and R2 is optionally substituted aryl, substituted biphenylyl and the like, a salt thereof and a pharmaceutical composition comprising the same. The sulfonamide compound is effective for the diseases treatable based on their blood sugar level-depressing activity, cGMP-PDE (especially PDE-V)-inhibiting activity, smooth muscle relaxing activity, bronchodilating activity, vasodilating activity, smooth muscle cell suppressing activity, and antiallergic activity.
Patent TW-I228074-B (TW)
Title: Continuous preparation of aminoplastics and/or phenolics
Inventor: BERBNER HEINZ
IPC: B29C48/38
Filed: 1998-07-17
Granted: 2005-02-21
Abstract: The invention relates to a continuous process for preparing aminoplastics and/or phenolics, in which a precondensate solution is prepared in a first extruder (14), the precondensate solution is continuously fed, with addition of additives, to a second extruder (20) with partial filling in the feed section (E) and devolatilization section (G), devolatilized in the second extruder (20) and then formed to give a molding composition or an end product. The process is particularly suitable for preparing melamine resins, in particular melamine-formaldehyde resins, as well as for preparing urea-formaldehyde resins.
Patent TW-468282-B (TW)
Title: Stucture and process of high gain single crystal silicon carbide electro-optic crystal operating at high temperature
Inventor: FANG YAN-KUEN
IPC: H01L31/0248
Filed: 1998-07-29
Granted: 2001-12-11
Abstract: A structure and a process of high gain single crystal silicon carbide electro-optic crystal operating at high temperature are disclosed. Since the optical gain and operating temperature of traditional n-p-n type silicon carbide electro-optic crystal are pretty low, the present invention adopts an invented n-I-p-I structure to enhance the optical gain of device at room temperature and high temperature, so that the electro-optic crystal can operate at high temperature and the output optical gain can be raised, so as to be used in the photodetector requiring high temperature operation.
Patent TW-380064-B (TW)
Title: Funnel geometric shape of ingot mold for continuous metal casting
Inventor: SUCKER JUERGEN
IPC: B22D11/04
Filed: 1998-12-03
Granted: 2000-01-21
Abstract: A kind of ingot mold for continuous metal casting which comprises a casting area having cooled wide and narrow side walls as a funnel shape narrower toward the casting direction as the casted strip format. In the funnel shape area of inner profile of wide side wall, there are at least one recession and one raised portion designed from top to bottom along the casting direction on a straight line from the top edge of ingot mold to the bottom of ingot mold. And, this mold can also be made with another method that in the funnel shape area of inner profile of wide side wall along a straight line connecting from the top edge of ingot mold to the starting location at the bottom of wide side wall, there are at least one recession and one raised portion designed from the top to the bottom.
Patent TW-483865-B (TW)
Title: Yarn winding apparatus with spindle support and yarn winding method
Inventor: WOLF KLAUS
IPC: B65H54/54
Filed: 1999-01-07
Granted: 2002-04-21
Abstract: A yarn winding apparatus for winding each of a plurality of continuously advancing yarns to a package. The packages are wound on a winding spindle rotatably mounted in cantilever fashion on a movable spindle support. A stationary holding device is provided which is adapted for engaging the free end of the winding spindle, so as to support the winding spindle at its free end with a holding force during the winding of the packages. Also, the winding spindle and the holding device can be joined to each other by two coupling elements without impeding the movement of the winding spindle which occurs during the winding operation to accommodate the build of the package.
Patent TW-396496-B (TW)
Title: A process of capacitor between conductor layers
Inventor: CHEN JIA-SHIANG
IPC: H01L21/70
Filed: 1999-01-11
Granted: 2000-07-01
Abstract: The present invention is a process for capacitor between conductor layers. Depositing the first conductor layer on the semiconductor substrate and etching it, we will get the first lead and the bottom electrode of capacitor. Second, form the first oxide layer and a thin layer of silicon nitride on said oxide layer. Then SOG layer and the second oxide layer are formed in turn. Etch the second oxide layer to form the recess. And deposit the second conductor layer, which will be on the forenamed recess, and etch it, we will get the upper electrode of capacitor just located above the bottom electrode, and the conductive jamb surrounding the upper electrode at the sidewall of the forenamed recess. With the conductive jamb ground connected, the noise is erased and the function of device is improved.
Patent TW-391122-B (TW)
Title: Echo and distortion cancellation arrangement
Inventor: BARKAROE STEFAN
IPC: H04M1/74
Filed: 1999-01-22
Granted: 2000-05-21
Abstract: With long transmission lines (10), at the output of a line driver (1, 2, 3, 4,), the re-ceived signal is only a fraction of the signal transmitted by the line driver, To mini-mize the transmitted signal with its distortion and noise in the receive path in the line driver, an additional driver (5, 6, 7) with the same voltages and currents in the signal path, is added. The added driver drives an additional load (9). The signal transmitted to the line (10) with its superimposed received signal, is subtracted from the signal from the added driver, which is not superimposed on any received signal. The difference is then a signal reduced from transmitted signal, transmitted distor-tion and transmited noise. To minimize die size and power consumption, the added driver is scaled but the distortion remains unchanged compared to the ""normal"" line driver.
Patent TW-412911-B (TW)
Title: Frame converting device
Inventor: INABA KOZO
IPC: H04N5/77
Filed: 1999-03-10
Granted: 2000-11-21
Abstract: A frame converting device wherein the frame converting device is used as incorporated with a VCR device for recording and reproduction, the operation mode can be automatically switched interlocked with the recording operation or the reproduction operation of the VCR device is realized. A frame converting device comprises two operation modes, one mode being a recording mode for producing a record signal recorded in a record medium of a recording/reproduction device based on a plurality of frame signals being multiplexed and an identification signal for identifying the frame signal, and the other mode being a reproduction mode for extracting the individual frame signal and the individual identification signal based on the record signal read from the record medium of the recording/reproduction device. The frame converting device is provided with a mode setting unit (301, 311-315) which monitors the operation mode of the recording/reproduction device and sets the operation mode of the frame converting device to the recording mode or the reproduction mode based on the monitored result. An identification signal generating unit (301, 332, 331) generates the identification signal when the mode setting unit (301, 311-315) performs the setting of the recording mode and stops the generation of the identification signal when the model setting unit (301, 311-315) performs the setting of the reproduction mode.
Patent TW-438726-B (TW)
Title: Treating method for manganese-containing water and its apparatus thereof
Inventor: NOMURA JUNICHI
IPC: C02F1/52
Filed: 1999-03-29
Granted: 2001-06-07
Abstract: The present invention relates to the treating method and apparatus for manganese-containing water. The treating apparatus contains the fluidized bed reactor (1), the inlet (4) of carbonate-containing water (11) at the bottom of the reactor, the outlet of treated water at the top of the reactor, and the inlet (8) of base solution for adjusting the pH of water inside of the reactor, to remove dissolved manganese as crystals from manganese-containing water. Multiple fluidized bed reactors (1, 1') are connected in series with line (12) in this invention. There are the inlet (4) of water and the inlet (8) of base solution at the bottom of each reactor. The pH value in the fluidized bed reactors is controlled between 8 to 10 with the pH adjusting machinery (7, 9), and the pH in the latter stage is higher than the former. Under this conditions, manganese will be removed as manganese carbonate without the formation of manganese hydroxide even the concentration of manganese are very high.
Patent TW-473488-B (TW)
Title: Composite materials, biomedical articles formed thereof and process for their manufacture
Inventor: CHABRECEK PETER
IPC: A61F2/16
Filed: 1999-03-29
Granted: 2002-01-21
Abstract: The invention relates to novel composite materials comprising (a) an inorganic or organic bulk material having covalently bound to its surface initiator moieties for radical polymerization; and (b) a hydrophilic surface coating obtainable by applying one or more different ethylenically unsaturated hydrophilic macromonomers of formula (1) as outlined in the claims to the bulk material surface provided with the initiator radicals and polymerizing said macromonomers. The composite materials of the invention have desirable characteristics regarding adherence to the substrate, durability, hydrophilicity, wettability, biocompatibility and permeability and are thus useful for the manufacture of biomedical articles such as ophthalmic devices.
Patent TW-384394-B (TW)
Title: Method of monitoring the condition of chemical-mechanical polishing process
Inventor: CHEN SHIUE-JUNG
IPC: G01J3/28
Filed: 1999-04-01
Granted: 2000-03-11
Abstract: The present invention provides a method for monitoring the condition of chemical-mechanical polishing during processing of dielectric layer of a semiconductor chip, by which a light source of fixed wavelength is projected on the dielectric layer of the semiconductor at a predetermined angle. This shall occur within a predetermined time period after the chemical-mechanical polishing is started, and light reflection is generated herewith. The intensity of reflected light is monitored in a prescribed period of time to calculate the pattern of periodical change of the reflected light, basing on the value obtained. Thereafter, it is continuously monitored for the intensity of reflected light, according to the calculated pattern of periodical change, until the predetermined time expires. When irregularity in the intensity of reflected light is detected, which does not correspond with the pattern of periodical change during the testing period, the device will generate a output signal to stop the chemical-mechanical polishing process.