Monday, August 15, 2016 Poster Session I A-105 Tracking Nanoparticles in the Aquatic Environments in Taiwan Wen-Che Hou, Department of Environmental Engineering, National Cheng Kung University Hui-Ying Tsai, Department of Environmental Engineering, National Cheng Kung University To enable environmental risk assessment of nanoscale pollutants, the information regarding the nanoparticle concentrations across environmental compartments is urgently needed. In Taiwan, the semiconductor manufacturing industry is the major driver in the regional economy. Chemical mechanical planarization (CMP) process involved in semiconductor manufacturing uses a large amount of nanoparticle (NP) slurries usually containing SiO2, CeO2, and/or Al2O3 NPs that are discharged into the waste treatment systems after use before releasing into the receiving waters. The polishing process could also produce nanoscale fragments from the wafers. In this project, we aimed to survey a range of nanoparticles relevant to industrial and consumer usages such as CeO2, Al2O3, ZnO, TiO2, Au, and Ag across industrial and municipal wastewater treatment plants in Taiwan using single-particle ICP-MS (spICP-MS). We hypothesize that industrially relevant NPs such as CeO2 are more abundant in wastewater samples from industrial parks than those in municipal wastewater samples. Our preliminary result indicates that CeO2 NPs were detected in the CMP wastewater effluents with a size between 20 to 25 nm and particle number concentration at ~3000 particles/mL. In this talk, the changes in sizes and particle number concentrations across the treatment trains will also be presented.
Tuesday, August 16, 2016 Poster Session II R-202 Nanosilver Conductive Ink: A Case Study for Evaluating the Potential Risk of Nanotechnology under Hypothetical Use Scenarios David Martin, US Army Engineer Research and Development Center Drs. Aimee Poda, Alan Kennedy, Mark Chappell, and Anthony Bednar, all of ERDC Engineered nanomaterials (ENMs) are being incorporated into a variety of consumer products due to unique properties that offer a variety of advantages over bulk materials. Understanding of the nano-specific risk associated with nano-enabled technologies, however, continues to lag behind research and development, registration with regulators, and commercialization. One example of a nano-enabled technology is nanosilver ink, which can be used in commercial ink-jet printers for the development of low-cost printable electronics. This investigation utilizes a tiered EHS framework to evaluate the potential release, exposure and hazard associated with typical use of both nanosilver ink and printed circuits. The framework guides determination of the potential for ENM release from both forms of the technology in simulated use scenarios, including spilling of the ink, aqueous release (washing) from the circuits and UV light exposure. The as-supplied ink merits nano-specific consideration based on the presence of nanoparticles and their persistence in environmentally-relevant media. The material released from the printed circuits upon aqueous exposure was characterized by a number of analysis techniques, including ultracentrifugation and single particle ICP-MS, and the results suggest that a vast majority of the material is ionic in nature and nano-specific regulatory scrutiny may be less relevant.
Addo Ntim Susana 104 Fairbrother Howard 14 Afshinnia Kamelia 44 Felix Lindsey 169 Alabresm Amjed 164 Fernandes Teresa 123 Alsaleh Nasser 145 Fryer Benjamin 21 Annamalai Asaikkutti 97 Furberg Anna 61 Avila-Arias Helena 150 Gao Xiaoyu 63 Azodi Mehrnoosh 8 Gao Xiaoyu 87 Barber Angela 24 Ghoshal Subhasis 107 Benedetti Marc 59 Gondikas Andreas 118 Bi Xiangyu 16 Grassian Vicki 31 Bi Yuqiang 93 Gray Evan 100 Bisesi Joseph 129 Gregory Kelvin 68 Borovinskaya Olga 33 Guo Yang 176 Bossa Nathan 105 Hadioui Madjid 32 Bourget Jared 41 Richard 152 Bozich Jared 157 Hanna Shannon 136 Buchman Joseph 143 Haynes Vena 149 Butz Shelby 166 Haynes Vena 174 Cambre Melissa 173 Hemart Matthieu 78 Castellon Benjamin 90 Hou Wen-Che 23 Caudill Emily 43 Yue-Wern 132 Challis Katie 120 Hüffer Thorsten 83 Chen Chun 163 Hurt Robert 52 Clar Justin 92 Inurria Adam 116 Colman Benjamin 13 Jämting Åsa 3 Cooper Jane 26 John Melanie 99 Coral Jason 74 Jordan Juliette 146 Crandon Lauren 42 K Akhil 95 Curtis Becky 158 Kah Melanie 81 Cuss Chad 39 Kananizadeh 114 Dale James 67 Karimi Sarah 155 Deline Alyssa 5 Karuppaiya Vimala 98 Donard Ariane 35 Kashiwada Shosaku 154 Dudefoi William 17 Kaul Gautam 89 Dudefoi William 36 Kaul Gautam 142 Dudefoi William 72 Keller Arturo 128 Dudefoi William 141 Kennedy Alan 56 DuToit Marielle 53 Kidd Justin 117 Dutschke Florian 7 Kim Rosa 160 Last Name First Name Page # Last Name Name Page # Klaper Rebecca 125 Pontona Dominic 138 Koch Charles 109 Pourhoseini Sahar 168 Labille Jerome 58 Praetorius Antonia 9
Lankone Ronald 60 Raghavendra Achyut 122 Laudadio Elizabeth 112 Rahimi Anahita 84 Li Jieran 124 Rahman Mohammad 85 Lim Jin-Hee 45 Reed Robert 94 Lin Nicholas 170 Rico Cyren 175 Linard Erica 76 Robinson Margaret 19 Liu Yanju 115 Rod Kenton 113 Stacey 6 Sahle-Demessie Endalkachew 69 Gregory 126 Salieri Beatrice 66 Samuel 134 Selvaraj Ambika 34 Luxton Todd 57 Sepúlveda Pamela 82 Mackevica Aiga 64 Shaw Phil 46 Mahoney Sharlee 137 Sikder Mithun 40 Mahoney Sharlee 148 Slomberg Danielle 10 Majumdar Sanghamitra 171 Smith William 49 Malysheva Anzhela 144 Stephan Chady 27 Martin David 91 Stephan 70 Masion Armand 28 Stephan Chady 162 Masion Armand 30 Story S. Drew 4 Masion Armand 131 Supiandi Izyan 12 Maxwell Tyler 73 Surette Mark 38 Mensch Arielle 20 Tangaa 77 Merrifield Ruth 127 Trojanowski Rebecca 96 Merrifield Ruth 151 Ur Rehman Atta 37 Metreveli George 79 Vaseashta 110 Mines Paul 106 Velimirovic Milica 22 Mirshahghassemi Seyyedali 108 Wamucho Anye 159 Mitrano Denise 54 Wang Jingjing 103 Montano Manuel 65 Ward J. Evan 88 Montoro Bustos Antonio 47 Ward J. Evan 153 Navratilova Jana 119 Westerhoff Paul 62 Newman 11 Wilke Carolyn 140 Nguyen Chi 135 Wormington Alexis 165 Ortega Van 133 Wronko Elizabeth 75 Parker 102 Zaib Qammer 29 Pereira Susana 156 Zeng Chao 147 Perreault Francois 130 ***Invited speakers listed alphabetically (by last name) on 178 to 184.