極端紫外線リソグラフィ
↑ IMEC Makes 22 nm SRAM Cells With EUV Lithography
↑ J. J. Biafore et al., SPIE Lithography Asia 2009, Proc. SPIE 7520, 75201P (2009).
↑ KLA-Tencor brings stochastic modeling to EUV
↑ T. I. Wallow et al., Proc. SPIE 7273, 72733T (2009).
↑ EUVA: 2nd EUVL Symposium at Antwerp, Belgium (2003)
↑ "Intel's extreme ultraviolet dream still somewhere over the rainbow."
↑ High-Power EUV lithography lightsources come of age,http://www.electroiq.com/index/display/semiconductors-article-display/368295/articles/solid-state-technology/volume-52/issue-9/features/cover-article/high-power-euv-lithography-lightsources-come-of-age.html
↑ Taking Semiconductor Manufacturing to the extreme, http://www.photonics.com/Article.aspx?AID=40103
↑ SanDisk, 2/26/2010 Investor Day.
↑ T. Matsuyama et al., 2006 IEEE/SEMI Advanced Semiconductor Manufacturing Conference, 50-56 (2006).
↑ J. Cobb et al., "Flare compensation in EUV Lithography," 2003 EUV Symposium, Antwerp.
↑ ASML, 2009 Lithography Workshop.
↑ ASML, Mask TWG, EUVL Symposium, 2008.
↑ K. Murakami et al., Proc. SPIE 8322, 832215 (2012).
↑ Y. Sekine et al., 1st International EUVL Symposium, 2002.
↑ M. A. Golub and A. A. Friesem, J. Opt. Soc. Am. A, 24, 687 (2007).
↑ Louis, E.; et al. (2011). “Nanometer interface and materials control for multilayer EUV-optical applications”. Prog. Surf. Sci. 86 (11--12): 255--294. doi:10.1016/j.progsurf.2011.08.001.
↑ H. Yang et al., Proceedings of the 1st IEEE Intl. Conf. on Nano/Micro Engineered and Molecular Systems, pp.
Yamazaki et al., Jap. J. Appl. Phys. 36, 7552-7556 (1997).
↑ V. V. Ivin et al., Micr. Eng. 61-62, 343-349 (2002).
↑ R. Renoud et al., J. Phys. Cond. Matt. 10, 5821-5832 (1998).
↑ K. Wilder et al., J. Vac. Sci. Tech. B 16, 3864 (1998).
↑ V. W. Ballarotto et al., JVST B 20, 2514-2518 (2002).
↑ M. Kotera et al., Microprocesses and Nanotechnology, 2007 Digest of Papers, pp. 94--95 (2007).
↑ M. Kotera et al., Jap. J. Appl. Phys. vol. 47, pp. 4944--4949 (2008).
↑ A. Ritucci et al., "Damage and ablation of large band gap dielectrics induced by a 46.9 nm laser beam," March 9, 2006 report UCRL-JRNL-219656 (Lawrence Livermore National Laboratory).
↑ T. Kozawa et al., Appl. Phys. Exp. 1, 027001 (2008).
↑ T. Watanabe and H. Kinoshita, J. Photopolymer Sci.