自己整合ゲート
Bower, RW and Dill, RG (1966). "Insulated gate field effect transistors fabricated using the gate as source-drain mask". IEEE International Electron Devices Meeting, 1966
Faggin, F., Klein, T., and Vadasz, L.: "Insulated Gate Field Effect Transistor Integrated Circuits With Silicon Gates". IEEE International Electron Devices Meeting, Washington D.C, 1968
US 3475234, Kerwin, R. E.; Klein, D. L. & Sarace, J. C., "Method for Making MIS Structure", issued 28-10-1969
Federico Faggin and Thomas Klein.