白崎博公
SPIE, 7971, 79711T1-79711T7 (2011).
Hirokimi Shirasaki,"Scatterometry simulator development with GPU, real-coded GA and RCWA" Proc. SPIE 8681, Metrology, Inspection, and Process Control for Microlithography XXVII, 86811B1-86811B7 (April 10, 2013)
Hirokimi Shirasaki,"Isolation mounts scatterometry with RCWA and PML",Proc. SPIE 9050, Metrology, Inspection, and Process Control for Microlithography XXVIII, 90502K (April 2, 2014)
Hirokimi Shirasaki,“ 3D isolation mounts scatterometry with RCWA and PML”, *Hirokimi Shirasaki, Proceedings of SPIE, 9424, 9424211-9424217 (2015).