Patent application 14616672 (US), filed 2015-02-07
Publication number: US20150228497A1
Title: PLASMA METHOD FOR REDUCING POST-LITHOGRAPHY LINE WIDTH ROUGHNESS
CPC codes: H10P  76/204
H10P  50/695
Office action: rejection, dated 2015-10-13
Rejection reasons: obviousness_103
Prior art cited: ref_id: 8298958
ref_type: patent
severity: obviousness
ref_id: 20150118863
ref_type: patent
severity: obviousness
Final disposition: granted (2015-10-13)