Patent application 14237577 (US), filed 2014-05-14
Publication number: US20150086715A1
Title: METHOD AND APPARATUS FOR DEPOSITING ATOMIC LAYERS ON A SUBSTRATE
CPC codes: C23C  16/45589
C23C  16/4401
C23C  16/4409
C23C  16/45517
C23C  16/45525
C23C  16/45536
C23C  16/45551
C23C  16/45578
C23C  16/45587
C23C  16/4586
C23C  16/4588
C23C  16/52
C23C  16/545
Office action: rejection, dated 2015-10-15
Rejection reasons: obviousness_103
indefiniteness_112
Prior art cited: ref_id: 2011076421
ref_type: patent
severity: obviousness
ref_id: 20110076421
ref_type: patent
severity: obviousness
Final disposition: granted (2015-10-15)