Patent application 14359775 (US), filed 2014-05-21
Publication number: US20140335267A1
Title: ATOMIC LAYER DEPOSITION REACTOR FOR PROCESSING A BATCH OF SUBSTRATES AND METHOD THEREOF
CPC codes: C23C  16/45546
C23C  30/00
Y02P  70/50
H10F  71/137
C23C  16/56
Y02E  10/50
Office action: rejection, dated 2015-10-15
Rejection reasons: obviousness_103
Prior art cited: ref_id: 20090291209
ref_type: patent
severity: obviousness
ref_id: 20100098851
ref_type: patent
severity: obviousness
ref_id: 20100190343
ref_type: patent
severity: obviousness
ref_id: 20100083900
ref_type: patent
severity: obviousness
ref_id: 20050000427
ref_type: patent
severity: obviousness
Final disposition: rejected (2015-10-15)