Patent application 14158068 (US), filed 2014-01-17
Publication number: US20150205194A1
Title: Lithography Mask
CPC codes: G03F   1/48
Office action: rejection, dated 2015-10-13
Rejection reasons: obviousness_103
Prior art cited: ref_id: 20090130569
ref_type: patent
severity: obviousness
ref_id: 20070292772
ref_type: patent
severity: obviousness
Final disposition: granted (2015-10-13)