Patent application 13788042 (US), filed 2013-03-07
Publication number: US20130182264A1
Title: Projection Exposure Tool for Microlithography and Method for Microlithographic Exposure
CPC codes: G03F   7/70133
G03F   7/70608
G03F   7/70733
G03F   9/7003
G03F   9/7034
G03F   9/7049
Office action: rejection, dated 2015-10-16
Rejection reasons: anticipation_102
obviousness_103
Prior art cited: ref_id: 20020167651
ref_type: patent
severity: novelty_destroying
ref_id: Kurt EP 1 452 851 A1
ref_type: patent
severity: novelty_destroying
ref_id: 6249351
ref_type: patent
severity: novelty_destroying
ref_id: 20020167651
ref_type: patent
severity: novelty_destroying
ref_id: 20050179880
ref_type: patent
severity: novelty_destroying
Final disposition: pending (2015-10-16)