Patent application 13721323 (US), filed 2012-12-20
Publication number: US20140060434A1
Title: GAS INJECTOR FOR HIGH VOLUME, LOW COST SYSTEM FOR EPITAXIAL SILICON DEPOSITON
CPC codes: H10P  72/70
C30B  25/14
H10P  72/0456
H10P  72/0402
H10P  72/3206
H10P  72/3314
H10P  72/0436
H10P  72/0406
B05B   1/005
C30B  25/08
C30B  29/06
E05F   1/00
Office action: rejection, dated 2015-10-19
Rejection reasons: anticipation_102
obviousness_103
Prior art cited: ref_id: 20040255855
ref_type: patent
severity: novelty_destroying
ref_id: 5452801
ref_type: patent
severity: novelty_destroying
ref_id: 20030000924
ref_type: patent
severity: novelty_destroying
ref_id: 20040255855
ref_type: patent
severity: novelty_destroying
ref_id: 20100263587
ref_type: patent
severity: novelty_destroying
ref_id: 20090304924
ref_type: patent
severity: novelty_destroying
Final disposition: rejected (2015-10-19)