Patent application 13546672 (US), filed 2012-07-11
Publication number: US20140014965A1
Title: Chemical vapor deposition system with in situ, spatially separated plasma
CPC codes: H10P  14/24
H10P  14/36
H10P  14/2926
H10P  14/2905
H10P  14/3216
H10P  14/3416
C23C  16/303
C23C  16/305
C23C  16/45527
C23C  16/45542
C23C  16/45551
C23C  16/4584
C23C  16/52
C23C  16/56
Office action: rejection, dated 2015-10-15
Rejection reasons: obviousness_103
indefiniteness_112
Prior art cited: ref_id: 20070218702
ref_type: patent
severity: obviousness
ref_id: 20030194493
ref_type: patent
severity: obviousness
ref_id: 20100087016
ref_type: patent
severity: obviousness
ref_id: 6319553
ref_type: patent
severity: obviousness
ref_id: 20040187784
ref_type: patent
severity: obviousness
Final disposition: rejected (2015-10-15)