Patent application 13146536 (US), filed 2011-07-27
Publication number: US20110277922A1
Title: BASE MATERIAL MANUFACTURING METHOD, NANOIMPRINT LITHOGRAPHY METHOD AND MOLD DUPLICATING METHOD
CPC codes: G03F   7/0002
B82Y  10/00
B82Y  40/00
Office action: rejection, dated 2015-10-16
Rejection reasons: anticipation_102
obviousness_103
indefiniteness_112
Prior art cited: ref_id: JP 2007245702
ref_type: patent
severity: novelty_destroying
ref_id: 6245249
ref_type: patent
severity: novelty_destroying
ref_id: JP 2007245702
ref_type: patent
severity: novelty_destroying
Final disposition: rejected (2015-10-16)