Assertion: ozone | /r/CapableOf | react with wide range of precursor gases
Facets:
value: in the clean semiconductor environment
type: LOCATION
Source sentences:
text: In the clean semiconductor environment, Ozone reacts with a wide range of precursor gases such as Al2O3, ZrO2, HfO2, and La2O3 metal oxides to enable thin film deposition processes like Atomic Layer Deposition (ALD) and Etch (ALE).