Assertion: ion | /r/CapableOf | impinge on target
Facets:
value: at high energy
type: OTHER
Source sentences:
text: Ion implantation equipment typically consists of an ion source, where ions of the desired element are produced, an accelerator, where the ions are electrostatically accelerated to a high energy, and a target chamber, where the ions impinge on a target, which is the material to be implanted.
text: Ion implantation also causes chemical and physical changes when the ions impinge on the target at high energy.