Assertion: hydrogen bromide | /r/HasProperty | mixed with argon
Facets:
Source sentences:
text: exposing said silicon-bearing layer to a plasma formed in an atmosphere of hydrogen bromide alone or hydrogen bromide mixed with an inert gas such as helium, argon or nitrogen, to selectively etch said silicon-bearing layer relative to photoresist and silicon oxide.
text: In relation to the question of novelty of claim 1, the crucial issue is whether or not D1 also discloses exposing said silicon-bearing layer to "a plasma formed in an atmosphere of hydrogen bromide alone or hydrogen bromide mixed with an inert gas such as helium, argon or nitrogen ..."; that is, does D1 disclose the use of a plasma in which hydrogen bromide is the only active etchant gas?
text: This problem is solved by using a plasma for selectively etching the silicon-bearing layer relative to photoresist and silicon oxide which is "formed in an atmosphere of hydrogen bromide alone or hydrogen bromide mixed with an inert gas such as helium, argon or nitrogen".