Assertion: germanium's number | /r/CapableOf | fabricate useful germanium films
Facets:
value: during the past decade
type: TEMPORAL
value: by pulsed-laser deposition
type: MANNER
value: by electron-beam evaporation
type: MANNER
value: by chemical-vapor deposition
type: CAUSE
value: by molecular beam epitaxy
type: MANNER
Source sentences:
text: High-quality germanium growth on silicon is challenging due to a large lattice mismatch (∼4%), but during the past decade, a number of researchers have fabricated useful germanium films by electron-beam evaporation, chemical-vapor deposition, pulsed-laser deposition, and molecular beam epitaxy.