Assertion: germanium's use | /r/CapableOf | reduce substrate wafer stress
Facets:
Source sentences:
text: The use of germanium silicate region 22 for trench isolation has several advantages over conventional technology such as: (1) reduced or eliminated trench and substrate wafer stress; (2) no possibility for adverse doping penetration (which occurs for BPSG); (3) better planarization properties than conventional techniques; and (4) better narrow trench coverage than conventional technology.