Occupation: Semiconductor Processors
Task: Align photo mask pattern on photoresist layer, expose pattern to ultraviolet light, and develop pattern, using specialized equipment.

Scale: Frequency of Task (Categories 1-7)
Category: 1
Value: 0.1 (N=40)
Source: Incumbent, 12/2006

Scale: Frequency of Task (Categories 1-7)
Category: 2
Value: 7.65 (N=40)
Source: Incumbent, 12/2006

Scale: Frequency of Task (Categories 1-7)
Category: 3
Value: 9.42 (N=40)
Source: Incumbent, 12/2006

Scale: Frequency of Task (Categories 1-7)
Category: 4
Value: 0.16 (N=40)
Source: Incumbent, 12/2006

Scale: Frequency of Task (Categories 1-7)
Category: 5
Value: 40.7 (N=40)
Source: Incumbent, 12/2006

Scale: Frequency of Task (Categories 1-7)
Category: 6
Value: 9.93 (N=40)
Source: Incumbent, 12/2006

Scale: Frequency of Task (Categories 1-7)
Category: 7
Value: 32.04 (N=40)
Source: Incumbent, 12/2006

Scale: Importance
Value: 4.1 (N=42)
Source: Incumbent, 12/2006

Scale: Relevance of Task
Value: 44.67 (N=90)
Source: Incumbent, 12/2006