Modification of various properties of HfO2 thin films obtained by changing magnetron sputtering conditions
Authors: Michal Mazur, Torsten Howind, Des Gibson, Danuta Kaczmarek, Jerzy Morgiel, Damian Wojcieszak, Wenzhong Zhu, Piotr Mazur
Published in: Surface & Coatings Technology
Publication type: article
Subject areas: Chemistry; Materials Science; Physics and Astronomy
SJR best quartile: Q1