Influence of atomic layer deposition temperature on the electrical properties of Al/ZrO2/SiO2/4H-SiC metal-oxide-semiconductor structures
Authors: Krystian Król, Mariusz Sochacki, Andrzej Taube, Norbert Kwietniewski, Sylwia Gierałtowska, Łukasz Wachnicki, Marek Godlewski, Jan Szmidt
Published in: physica status solidi (a)
Publication type: article
Subject areas: Engineering; Materials Science; Physics and Astronomy
SJR best quartile: Q2