Titanium (IV) isopropoxide as a source of titanium and oxygen atoms in carbon based coatings deposited by Radio Frequency Plasma Enhanced Chemical Vapour Deposition method
Authors: Anna Jedrzejczak, Damian Batory, Milena Prowizor, Magdalena Dominik, Mateusz Smietana, Michal Cichomski, Aneta Kisielewska, Witold Szymanski, Witold Kozlowski, Mariusz Dudek
Published in: Thin Solid Films
Publication type: article
Subject areas: Materials Science; Physics and Astronomy
SJR best quartile: Q2