Optimization of reactive ion etching process of AlGaN/GaN heteterostructures used for electronic devices
Authors: J. Gryglewicz, W. Macherzyński, A. Stafiniak, M. Wośko, B. Paszkiewicz, R. Paszkiewicz, M.Tłaczała
Published in: 10th Interregional Workshop between Saxonia, Silesia and Czech Advanced Nanomaterials - Synthesis, Properties, Characterization
Publication type: conference