The effect of post-process annealing on opitcal and electrical properties of mixed HfO2-TiO2 thin film coatings
Authors: Agata Obstarczyk, Danuta Kaczmarek, Michał Mazur, Damian Wojcieszak, Jarosław Domaradzki, Tomasz Kotwica, Jerzy Morgiel
Published in: Journal of Materials Science: Materials in Electronics
Publication type: article
Subject areas: Biochemistry, Genetics and Molecular Biology; Chemical Engineering; Engineering; Materials Science; Physics and Astronomy
SJR best quartile: Q2