2-D nanometer thickness mapping applying a reduced bias soft X-ray NEXAFS approach
Authors: Wachulak, P., Fok, T., Janulewicz, K., Kostecki, J., Bartnik, A., Wegrzynski, Ł., Fiedorowicz, H.
Published in: Optics Express
Publication type: article
Subject areas: Physics and Astronomy
SJR best quartile: Q1