Self-Terminating Confinement Approach for Large-Area Uniform Monolayer Graphene Directly over Si/SiOx by Chemical Vapor Deposition
Authors: J. Pang, R. G. Mendes, P. S. Wrobel, M. D. Wlodarski, H. Quang Ta, L. Zhao, L. Giebeler, B. Trzebicka, T. Gemming, L. Fu, Z. Liu, J. Eckert, A. Bachmatiuk, M. H. Rummeli
Published in: ASC Nano
Publication type: article
Subject areas: Engineering; Materials Science; Physics and Astronomy
SJR best quartile: Q1