High aspect ratio GaN nanorods fabricated by means of UV photolithography and ICP etching
Authors: Marek Ekielski, Marek Wzorek, Michał A. Borysiewicz, Alina Domanowska, Tomasz Wojtowicz, Anna Piotrowska and Eliana Kamińska
Published in: International Microprocesses and Nanotechnology Conference (MNC 2016)
Publication type: conference