Title: a-SiC:H Films by Remote Hydrogen Microwave Plasma CVD From Ethylsilane Precursors
Authors: Aleksander M. Wrobel, Agnieszka Walkiewicz-Pietrzykowska, Pawel Uznanski, Bartosz Glebocki
Journal: Chemical Vapor Deposition
Publication type: article
DOI: 10.1002/cvde.201207046