Title: Influence of phosphorus implantation on electrical properties of Al/SiO2/4H-SiC MOS structure
Authors: Krystian Król, Mariusz Sochacki, Marcin Turek, Jerzy Żuk, Paweł Borowicz, Dominika Teklińska, Piotr Konarski, Maciej Miśnik, Alina Domanowska, Anna Michalewicz, Jan Szmidt
Journal: Materials Science Forum
Publication type: article
DOI: 10.4028/www.scentific.net/MSF.821-823.496