Title: Influence of atomic layer deposition temperature on the electrical properties of Al/ZrO2/SiO2/4H-SiC metal-oxide-semiconductor structures
Authors: Krystian Król, Mariusz Sochacki, Andrzej Taube, Norbert Kwietniewski, Sylwia Gierałtowska, Łukasz Wachnicki, Marek Godlewski, Jan Szmidt
Journal: physica status solidi (a)
Publication type: article
DOI: 10.1002/pssa.201700882