Title: 2-D nanometer thickness mapping applying a reduced bias soft X-ray NEXAFS approach
Authors: Wachulak, P., Fok, T., Janulewicz, K., Kostecki, J., Bartnik, A., Wegrzynski, Ł., Fiedorowicz, H.
Journal: Optics Express
Publication type: article
DOI: 10.1364/OE.397808