Title: Silicon Oxycarbide Thin Films by Remote Microwave Hydrogen Plasma CVD Using a Tetramethyldisiloxane Precursor
Authors: A.M. Wrobel, P. Uznanski, A. Walkiewicz-Pietrzykowska, B. Glebocki, and E. Bryszewska
Journal: Chemical Vapor Deposition
Publication type: article
DOI: 10.1002/cvde.201504330