Title: Damage accumulation in thin ruthenium films induced by repetitive exposure to femtosecond XUV pulses below the single-shot ablation threshold
Authors: Igor A. Makhotkin, Igor Milov, Jaromir Chalupský, Kai Tiedtke, Hartmut Enkisch, Gosse de Vries, Frank Scholze, Frank Siewert, Jacobus M. Sturm, Konstantin V. Nikolaev, Robbert W. E. van de Kruijs, Mark A. Smithers, Henk A. G. M. van Wolferen, Enrico G. Keim, Eric Louis, Iwanna Jacyna, Marek Jurek, Dorota Klinger, Jerzy B. Pelka, Libor Juha, Věra Hájková, Vojtěch Vozda, Tomáš Burian, Karel Saksl, Bart Faatz, Barbara Keitel, Elke Plönjes, Siegfried Schreiber, Sven Toleikis, Rolf Loch, Martin Hermann, Sebastian Strobel, Rilpho Donker, Tobias Mey, and Ryszard Sobierajski
Journal: Journal of the Optical Society of America B
Publication type: article
DOI: 10.1364/JOSAB.35.002799