Title: Silicon Oxycarbide Films Produced by Remote Microwave Hydrogen Plasma CVD using a Tetramethyldisiloxane Precursor: Growth Kinetics, Structure, Surface Morphology, and Properties
Authors: A. M. Wrobel, P. Uznanski, A. Walkiewicz-Pietrzykowska
Journal: Chem. Vap. Deposition
Publication type: article
DOI: 10.1002/cvde.201507185