Spreadsheet: 848807d1699452646-how-to-filter-select-specific-strings-from-a-big-database-if-and-or-search-left-example-for-forum-gk-6-nov-additions-jan
Sheet: Forum (3)

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Apparatus for controlling a flow of molten source material | Apparatus for controlling something different | A method for controlling a flow |  |  |  |  |  | Method |  | A * according to claim |  | comprising
A method of improving a measurement of a parameter of interest | A method of improving a measurement of a parameter of interest | A method as claimed in claim 1 |  |  |  |  |  | A method |  | An * according to claim |  | including
A lithographic apparatus | A lithographic apparatus comprising: [NAME] and the processing arrangement of claim XXX. | Exposure apparatus |  |  |  |  |  | The method |  | A * as claimed |  | using
An apparatus to perform the method of any of claims 1 to 14. | An apparatus | An apparatus, comprising a component |  |  |  |  |  |  |  | An * as claimed
Method for control a flow | Method for controlling a flow according to claim 1 | The method for controlling a flow according to claim 1 or 2 |  |  |  |  |  |  |  | A * according to any of the preceding claims
An apparatus according to claim 1 | An optical arrangement as claimed in claim 1 | An apparatus according to any of the preceding claims |  |  |  |  |  |  |  | An * according to any of the preceding claims
An EUV radiation source comprising a vessel according to any preceding claim. | A lithographic system comprising an EUV radiation source according to claim 16 and a lithographic apparatus. | A radiation source or a metrology tool including an aperture according to any of claims 1 to 18. |  |  |  |  |  |  |  | A * as in claim
A lithographic apparatus including an aperture according to any of claims 1 to 18 or radiation source according to claim 19. | An apparatus for supplying a target material to a radiation source, comprising a reservoir system, and XXXs further comprises a valve system according to any of claims 1-8. | A method for regulating a flow of solid or liquid target material using a valve system according to any of claims 1-8 |  |  |  |  |  |  |  | An * as in claim
A radiation source for a lithographic tool comprising a fuel emitter according to claim 14, wherein the radiation source is configured to output EUV radiation. | A lithographic apparatus comprising a radiation source according to claim 15. | A system for determining the charging induced distortion of a SEM image, the system comprising the computer readable medium according to claim 1. |  |  |  |  |  |  |  | A * according to any preceding claim
A lithographic apparatus comprising a stage apparatus according to any one of claims 13 - 23. |  |  |  |  |  |  |  |  |  | An * according to any preceding claim
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 |  |  |  |  |  |  |  |  |  | A * using the method of any of claims
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