Spreadsheet: 53732d1253647515-streamlining-data-entry-sample3
Sheet: Sheet1

2013-06-14 00:00:00 | SAMPLE #2 | SPUT | 3E-6 mbar | 300K | 20min | 1.0 keV | 10mA | ~2uA | Ar |  | cycle#49,  (RT heating not working)
 | SAMPLE #2 | ANNEAL |  | 5 min | 1.9 A | 4.9V |  | Prep-Man | P<1E-9
 | SAMPLE #2 | SPUT | 3E-6 mbar | 300K | 20min | 1.0 keV | 10mA | ~2uA | Ar |  | cycle#50,  (RT heating not working)
 | SAMPLE #3 | ANNEAL |  | 45 min | 0.9 A | 4.9V |  | Prep-Man | P<1E-9
 | SAMPLE #2 | ANNEAL |  | 5 min | 1.9 A | 4.9V |  | Prep-Man | P<1E-9
 | SAMPLE #2 | SPUT | 3E-6 mbar | 300K | 20min | 1.0 keV | 10mA | ~2uA | Ar |  | cycle#51,  (RT heating not working)
 | SAMPLE #2 | ANNEAL |  | 5 min | 1.9 A | 4.9V |  | Prep-Man | P<1E-9
 | SAMPLE #3 | ANNEAL |  | 40 min | 1.9 A | 4.9V |  | Prep-Man | P<1E-9
 | SAMPLE #2 | SPUT | 3E-6 mbar | 700K | 20min | 1.0 keV | 10mA | ~2uA | Ar |  | cycle#52,  4V, 0.7A
 | SAMPLE #2 | ANNEAL |  | 5 min | 1.9 A | 4.9V |  | Prep-Man | P<1E-9
2013-06-15 00:00:00 | SAMPLE #2 | SPUT | 3E-6 mbar | 700K | 20min | 1.0 keV | 10mA | ~2uA | Ar |  | cycle#53,  4V, 0.7A
 | SAMPLE #2 | ANNEAL |  | 5 min | 1.9 A | 4.9V |  | Prep-Man | P<1E-9
 | SAMPLE #2 | SPUT | 3E-6 mbar | 700K | 20min | 1.0 keV | 10mA | ~2uA | Ar |  | cycle#54,  4V, 0.7A
 | SAMPLE #2 | ANNEAL |  | 5 min | 1.9 A | 4.9V |  | Prep-Man | P<1E-9
 | SAMPLE #2 | STM | 1.8V | 0.17nA | 100x100nm^2 | 600nm/s | 0.02 | 300K | W etched | 1111
 | SAMPLE #2 | STM | 2.0V | 0.13nA | 200x200nm^2 | 1200nm/s | 0.04 | 300K | W etched | 1112
 | SAMPLE #2 | STM | 2.0V | 0.13nA | 100x100nm^2 | 600nm/s | 0.04 | 300K | W etched | 1113
 | SAMPLE #2 | STM | 1.8V | 0.22nA | 50x50nm^2 | 250nm/s | 0.04 | 300K | W etched | 1114 | turned off turbos
 | SAMPLE #2 | STM | 1.8V | 0.22nA | 40x40nm^2 | 200nm/s | 0.04 | 300K | W etched | 1115
2013-06-16 00:00:00 | SAMPLE #2 | SPUT | 3E-6 mbar | 700K | 20min | 1.0 keV | 10mA | ~2uA | Ar |  | cycle#55,  4V, 0.7A
 | SAMPLE #2 | ANNEAL |  | 5 min | 1.9 A | 4.9V |  | Prep-Man | P<1E-9
 | SAMPLE #2 | STM | 1.9V | 1.9nA | 50x50nm^2 | 300nm/s | 0.033 | 52K | W etched | 1116
 | SAMPLE #2 | STM | 2V | 0.22nA | 200x200nm^2 | 1200nm/s | 0.02 | 52K | W etched | 1117
 | SAMPLE #2 | STM | 2V | 0.22nA | 100x100nm^2 | 600nm/s | 0.02 | 52K | W etched | 1118
 | SAMPLE #2 | STM | 2V | 0.16nA | 40x40nm^2 | 240nm/s | 0.02 | 52K | W etched | 1119
 | SAMPLE #2 | STM | 2.2V | 0.27nA | 500x500nm^2 | 5000nm/s | 0.056 | 62K | W etched | 1120 | Started up turbo on HP 1/3 of way through
2013-06-17 00:00:00 | SAMPLE #2 | ANNEAL |  | 20 min | 0.3A |  |  | Stage | P<1E-9
 | SAMPLE #2 | STM | 2.1V | 0.15nA | 200x200nm^2 | 1971nm/s | 0.0182 | 300K | W etched | 1121
 | SAMPLE #2 | STM | 2.1V | 0.15nA | 90x90nm^2 | 887nm/s | 0.0182 | 300K | W etched | 1122
 | SAMPLE #2 | STM | 2.0V | 0.176nA | 200x200nm^2 | 1971nm/s | 0.04 | 300K | W etched | 1123
 | SAMPLE #2 | STM | 2.0V | 0.176nA | 112x112nm^2 | 1000nm/s | 0.04 | 300K | W etched | 1124
 | SAMPLE #2 | STM | 2.0V | 0.176nA | 112x112nm^2 | 2000nm/s | 0.04 | 300K | W etched | 1125
 | SAMPLE #2 | STM | 2.0V | 0.12nA | 50x50nm^2 | 893nm/s | 0.04 | 300K | W etched | 1126
 | SAMPLE #2 | STM | 2.0V | 0.12nA | 14.7x14.7nm^2 | 263nm/s | 0.04 | 300K | W etched | 1127
 | SAMPLE #2 | STM | 2.0V | 0.12nA | 14.7x14.7nm^2 | 263nm/s | 0.04 | 300K | W etched | 1128
 | SAMPLE #2 | STM | 2.0V | 0.12nA | 14.7x14.7nm^2 | 263nm/s | 0.04 | 300K | W etched | 1129 | tip state change
 | SAMPLE #2 | STM | 2.0V | 0.12nA | 50x50nm^2 | 893nm/s | 0.04 | 300K | W etched | 1130 | tip state change
 | SAMPLE #3 | DOSE |  | O2 | 1E-6mbar | 1.6E-10mbar | 400s | 300K
 | SAMPLE #3 | STM | 2V | .1nA | 500x500nm^2 | 2525nm/s | 0.031 | 300K | W etched | 1210
 | SAMPLE #3 | STM | 2.18V | .14nA | 200x200nm^2 | 1961nm/s | 0.031 | 300K | W etched | 1211
 | SAMPLE #3 | STM | 2.18V | .14nA | 32.5x32.5nm^2 | 319nm/s | 0.031 | 300K | W etched | 1212
 | SAMPLE #3 | STM | 2.18V | .14nA | 32.5x32.5nm^2 | 319nm/s | 0.031 | 300K | W etched | 1213
 | SAMPLE #3 | STM | 2.4V | .49nA | 50x50nm^2 | 490nm/s | 0.031 | 300K | W etched | 1214
 | SAMPLE #3 | STM | 2.4V | .49nA | 50x50nm^2 | 490nm/s | 0.031 | 300K | W etched | 1215
 | SAMPLE #3 | DOSE |  | [NAME] | 2.5E-10mbar | 1.6E-10mbar | 180s | 300K