Search query: semiconductor industry   and water

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abstract: Abstract The high tech semiconductor manufacturing sector is integral to the international electronics industry and was valued at over $400 billion USD in 2017. Intensive water use by this industry is well documented and this work provides a spatially explicitly assessment of water use impacts by nearly 100% of global semiconductor manufacturing capacity. Both direct manufacturing water use and water use from electricity were considered as part of a facility's total withdrawal. Manufacturing water withdrawals were estimated by using technology specific water and electricity use data, reported at the semiconductor chip or wafer level from the life cycle literature and industry estimates. Electricity water use intensity (WUI) factors were gleaned from the literature and regional electricity WUI factors were derived for China and the U.S. Geolocation of semiconductor manufacturing facilities allowed for summation of water withdrawals at various spatial extents (i.e. watershed, country, and globally) This data was combined with calculated regional or country level electricity water use factors to estimate total water withdrawals by a facility. Geolocation of data also allowed for calculation of watershed specific scarcity weighted withdrawals. Scarcity weighted withdrawals were ascertained by multiplying facility water withdrawal data by the AWaRE water scarcity characterization factor available for each of 202 watersheds associated with semiconductor manufacturing facilities. These data were used to identify and map hotspots of industry water use, which is especially important for areas of industry growth such as China. This analysis is useful as a benchmark for global semiconductor industry water withdrawals and may assist OEMs in decisions about supply chain sourcing. This could also guide semiconductor manufacturers in prioritizing locations and time periods to implement water saving technologies or employ less water intensive electricity sources. Additionally, the spatially explicit water use data for the semiconductor sector can be used to improve existing databases of national and regional sector specific water use coefficients that are often applied in LCA input output studies.
author_names: Kali Frost

Inez Hua
title: "Quantifying spatiotemporal impacts of the interaction of water scarcity and water use by the global semiconductor manufacturing industry"
year: 2019

abstract: The semiconductor industry utilizes vast freshwater resources for its high tech manufacturing processes. This work will enumerate the impact of the global semiconductor manufacturing industry on water resources. A global inventory of semiconductor manufacturing capacity, in combination with an approximation of water use required to manufacture an individual semiconductor chip, will be used to estimate water consumption by each semiconductor fabrication facility and globally. A simplified water stress assessment will be conducted by multiplying facility water use data by a water scarcity factor. Maps of the scarcity weighted water use will be used to identify watersheds that may be disproportionately impacted by semiconductor manufacturing water use. This may be especially important for regions of growth in the semiconductor industry such as China and Southeast Asia. Once these areas have been identified a detailed water footprint for the facilities located in the subwatershed of interest can be conducted.
author_names: Kali Frost

Inez Hua
title: A spatially explicit assessment of water use by the global semiconductor industry
venue: 2017 IEEE Conference on Technologies for Sustainability (SusTech)
year: 2017

abstract: The objective of this study was to establish a demo scale plant with 1,000 cubic metres per day (CMD) capacity to recycle industrial wastewater from a semiconductor industry. In this study, two wastewater streams from continuous electrodeionization (CEDI) and local scrubber (LS)/controlled decomposition and oxidation (CDO) with flow rate of 1,335 CMD and 1,012 CMD respectively were chosen to be recycled. For the CEDI reject reclaim system, boron selective resin (BSR) and activated carbon filter (ACF) were utilized to remove boron and total organic carbon (TOC) respectively. The water quality was good enough to be used as ultrapure water (UPW) supply. For the CDO reclaim system, the combination of ACF ultrafiltration (UF) reverse osmosis (RO) under high pH condition was implemented to recycle the local scrubber wastewater (LSW) for cooling tower top up. Product water from both treatment systems was able to meet the target water specifications. The average cost saving was S$0.91/m3 of reclaimed water produced.
author_names: Chin Yee Eng

Dongning Yan

Nipuna Withanage

Qiyi Liang

Yue Zhou
title: Wastewater treatment and recycle from a semiconductor industry: A demo plant study
venue: Water Practice and Technology
year: 2019

abstract: The reduction of particles in ultrapure water (UPW) systems is driven primarily by the semiconductor industry. Particles that can produce defects in chip manufacturing and potentially reduce yield, are now identified to be 10 nm and smaller. Isolating and collecting particles in this size range using the classical filtration technique of sieving is limited, time consuming and in many cases, ineffective. Additionally, locating 10 nm particles on a 25 mm filter with a total surface area of more than 500 mm (500,000,000 nm) is highly labor intensive. Focused Aerosol Deposition (FAD) is a technique that combines extraction of nanoparticles from UPW via aerosolization with focused droplet deposition on an SEMready stub. This provides an extremely localized collection of particles as small as 5 nm. Improvements in aerosol focusing, evaporation management and direct deposition on scanning electron microscope ready media has resulted in a focal point as small as 0.04 mm with repeatable positioning. By maintaining a tight collection area, the time required to collect sufficient particles for analysis is reduced 50 to 90% compared to traditional filtration methods and provides improved sizing analysis via Scanning Electron Microscopy (SEM) and elemental analysis using Energy Dispersive X ray Spectroscopy (EDS) This paper will review the enabling technologies associated with FAD, provide SEM/EDS analysis of collected UPW samples, and discuss the potential of the technology for particle characterization and identification, and risk mitigation in UPW systems.
author_names: Patricia B Keady

Derek R Oberreit

Gary Van Schooneveld
title: The Use of Focused Aerosol Deposition in the Collection and Analysis of Nanoparticles from Ultrapure Water Systems Used in Semiconductor and Pharmaceutical Industry
year: 2019

abstract: This research work focused on the simultaneous recovery of gold (40.5mg/dm 3 and iodine (748mg/dm 3 from the waste rinse water of the semiconductor industry using activated carbon. A batch study was conducted to optimize process parameters, such as contact time and carbon dose, for the recovery of gold and iodine from the waste water. The loading capacity of the activated carbon for adsorption of gold and iodine was found to be 33.5mg Au/g carbon and 835mg I2/g carbon, respectively. Gold was found to exist on the activated charcoal surface in two forms: ionic gold and elemental gold. Aqua regia was used to convert metallic gold to its ionic form, and the iodine and the small amount of ionic gold were removed from the activated carbon by elution with aqua regia. Gold was recovered from the eluate by reduction with hydrazine. Iodine from the diluted aqua regia was then precipitated by adding sodium hydrosulfite (Na2S2O4) A complete process flow sheet was developed to recover both gold and iodine from the waste water of the semiconductor industry, which conserves the resources while meeting environmental pollution requirements. [doi:10.2320/matertrans.M2012009]
author_names: Nghiem Nguyen

Jinki Jeong

Doyun Shin

Byung-Su Kim

Jae-chun Lee

Banshi Dhar Pandey
title: Simultaneous Recovery of Gold and Iodine from the Waste Rinse Water of the Semiconductor Industry Using Activated Carbon
year: 2012

abstract: The invention relates to a water treatment technique, and discloses a treatment method of grinding waste water in a semiconductor industry. The treatment method is used for solving the problems of electric energy waste and relatively high treatment cost in grinding waste water treatment in the prior art. The method comprises the following steps: firstly, adding an alkali solution with the mass concentration of 3 20% into the grinding waste water with the SS concentration of more than 50mg/l, adjusting the PH value to be 10.5 11, then adding a high molecular coagulant with the mass concentration of 3 10% to adjust the electrical conductivity to be 150 300 microseconds/centimeter, and adding an inorganic salt coagulant with the mass concentration of 3 10% to adjust the PH value to be 7 8.5; and finally, performing settling separation on the grinding waste water to obtain waste water with the SS concentration of less than 50mg/l. Therefore, because the method disclosed by the invention does not need a filter screen, the electric energy consumption and treatment cost can be reduced, and the treatment efficiency also can be improved.
title: Treatment method of grinding waste water in semiconductor industry
year: 2013

abstract: Deionized water is generally used to rinse the integrated circuit (IC) crystal chips in semiconductor manufacturing. Wastewater generated in the semiconductor manufacturing need to be collected and treated as regulated by Department of Environment (DOE) Malaysia. On the other hand, cooling systems are major water consumers in the industry. The treated industry wastewater from semiconductor usually contains less inorganic and has the potential to be reused as make up water in the cooling tower water system. The aim of this study is to determine the critical parameters of the make up water for cooling water tank and create a baseline of recommended water quality for cooling water if reclaimed water from treated semiconductor effluent is used as alternative water source of make up water for cooling water. Comparison of reclaimed water characteristic was reviewed and to evaluate the appropriateness and effectiveness of the reclaimed water to be reused as cooling water. The related mass balance data of used water quantities in the whole plant indicated the reuse and recovery of used water could be appropriately carried out in the plant. A representative semiconductor plant was selected as this case study which this plant has installed a wastewater recycling system that draws over 382 cubic meter/day treated industrial wastewater before discharge to environment. Total amount of collected reclaimed wastewater used in wastewater recycling system for cooling make up water need to have close monitoring and nine critical parameters were identified which affects cooling water systemi? 1/2 s efficiency; pH, conductivity, total hardness, total calcium hardness, total alkalinity, free chlorine, total silica, total iron and total bacteria count. This wastewater recycling system was operated since January 2017 and without any major breakdown. Total reclaimed wastewater has reached 1990 cubic meter/year in the past one year and cost saving reached about RM 202k per year.
author_names: Yan Han Yim
title: Reclamation of industry wastewater as a renewable source for cooling water system: A case study for a semiconductor plant Yim Yan Han
year: 2018

abstract: Comparative studies on the adsorption of gold from waste rinse water (Au 178.3 mg/L and trace Cu, Ni, Zn, Sn, etc) of the semiconductor manufacturing industry have been reported using nonionic Amberlite XAD 7HP, strong base Bonlite BA304, and Purolite A 500. Batch and column studies were carried out to optimize various process parameters such as contact time, acidity of solution, and resin dose for gold adsorption from waste rinse water and elution to get a gold enriched solution. The results showed that Bonlite BA304 and Purolite A 500 resins could exchange gold easily at high acidity whereas Amberlite XAD 7HP adsorbs gold effectively at low acidity (adjusted pH 0) Purolite A 500 was found to be the most suitable resin as it adsorbed 99.6% gold at an A/R ratio of 8.33 and a sorption capacity of 53.6 mg gold/mL resin. The mixture of acetone and hydrochloric acid at a volumetric ratio of 9.0 could elute gold loaded on Purolite A 500 resin to yield 10,497 mg gold/L. The adsorption behavior of gold on Amberlite XAD 7HP and Bonlite BA304 followed both the Langmuir and Freundlich isotherms. In the case of the Purolite A 500 resin, it followed suitably a Langmuir isotherm. Kinetic data for gold adsorption on the three resins followed a second order rate.
author_names: Nghiem Nguyen

Jinki Jeong

Manish Kumar Jha

Jae-chun Lee

Kwadwo Osseo-asare
title: Comparative studies on the adsorption of Au(III) from waste rinse water of semiconductor industry using various resins
year: 2010

author_names: Tadao Komeda
title: High pure water in semiconductor industry and its application.
year: 1985

abstract: The utility model discloses a treatment system for reclaiming grinding waste water into ultrapure water in semiconductor industry, comprising a grinding waste water tank, a membrane bioreactor, an ion exchange system, a clear water tank, an ultrafiltration system, an ultraviolet light disinfection system, a primary reverse osmosis system, a degasser, a secondary reverse osmosis system, an intermediate water tank, a continuous electrodeionization system and a producing water tank which are sequentially connected in series by pipelines, wherein the ion exchange system is connected with a regenerative system, a clear water outlet of the membrane bioreactor is connected with a water inlet of the clear water tank by a water outlet pipeline, a concentrated water outlet of the second reverse osmosis system is connected with a water inlet of the ultrafiltration system by a second concentrated water pipeline, and a water inlet of the intermediate water tank is connected with a water outlet of the degasser by an intermediate water pipeline. By adopting the system, the high quality pure water with resistance reaching up to over 18MOhm cm can be obtained. As for the system, the whole reclaiming efficiency reaches up to 75% and the whole investment cost is lower.
title: Treatment system for reclaiming grinding waste water into ultrapure water in semiconductor industry
year: 2010