Personal Area - Protected Area About LPE Products R&D Contacts News Events Certifications LPE | Rev. 1.3 | admin | site policy | cookie policy | legal info | copyright 2017 Blueproject - info@blueproject.it Epitaxial Technology Center Catania Latest news Milan 08/06/2016 SEMICON WEST 2016 LPE will attend to the next SEMICON WEST 2016 --> more Milan 30/05/2016 SEMICON Russia 2016 LPE will attend to the next SEMICON Russia 2016 --> more Milan 03/09/2015 300mm technologies for Power devices applications LPE is proud to participate to the ECSEL-R2POWER300 ... --> more

Personal Area - Protected Area About LPE Products PE106 PE2061 PE3061 Bubbler R&D Contacts News Events Certifications PE2061 Millions of epitaxial wafers are, with well over 100 reactor chambers, are produced each year using the PE 2061 S reactor. This reactor has been specially designed for severe applications such as PowerMos, Discrete, IGBT and special devices of up to 250 microns per 200 Ohm x cm. For this reason the PE 2061 S has become a field proven reactor used by some of the world’s most important semiconductor manufacturing companies. The PE 2061 S is a barrel type reactor with both atmospheric and reduced pressure process capabilities, one pass gas flow low frequency inductive heating (4 kHz) and dual station concept. The reactor does not take up valuable space in the Clean Room thanks to its through the wall mounting configuration. It also boasts a small reactor footprint in the Gray Room. The loading and unloading bay for the wafers is a class 10 environment. Depending on the configuration used, 4’’, 5’’, 6’’ and 8’’ wafers can be loaded. The control software includes: automatic operation of Epi process configuration and diagnostic precision software temperature control GEM SECS interface as option functions The generator is a new generation solid state IGBT and is very small. It is remote controllable and is equipped with two independent power outputs thus cutting out the necessity for a power transfer switch. In conclusion, the PE 2061 S reactor provides: Excellent wafer quality Low per wafer production costs High throughput productivity Unique process characteristic for thick EPI applications. LPE | Rev. 1.3 | admin | site policy | cookie policy | legal info | copyright 2017 Blueproject - info@blueproject.it