Languages MENU Vapor Release Etch for Photonics Home Markets Photonics Vapor Release Etch For Photonics Vapor Release Etch for Photonics Dry, vapor phase etch utlizing anhydrous HF of XeF2 is used for the isotropic etching of sacrificial silicon or oxide layers with high selectivity and without stiction. These technologies provide controlled, residue-free etching across a wide range of etch rates. Key applications for vapor release technology include micromirror arrays and other optical MEMS devices, waveguides, and µLEDs. Benefits of SPTS Vapor HF Etch for Photonics Dry process, which eliminates stiction and corrosion Eliminates the need for critical point drying Repeatable, stable performance with a wide process window Compatible with a wide range of device materials including metals, especially unprotected aluminium (Al) mirrors and bond pads Reduced pressure operation keeps etch by-products in the gas phase ensuring maximum feature penetration and no condensation Benefits of SPTS XeF2 Etch for Photonics Isotropic etching Si, Ge, Mo & SiGe with an extremely high selectivity, compared to most other mask and device materials Allows long undercuts and no damage to very thin device structures Enables the use of low-cost photoresist masks Can be used to release MEMS structures after dicing and packaging Dry process - eliminates stiction and the need for critical point drying Repeatable, stable performance with a wide process window Gas phase processing ensures maximum feature penetration through small holes and spaces Related Product Information Intro to HF Release Etch HF etching is a dry vapor (plasma-less) etch process to remove sacrificial oxide layers, primarily used to release silicon MEMS structures. DOWNLOAD XeF2 for MEMS Release XeF2 vapor etching is a highly selective isotropic etch for removing sacrificial layers of Si, Mo or Ge to release MEMS miccrostructures. DOWNLOAD Markets Advanced Packaging MEMS Photonics Etch PECVD PVD LPCVD Vapor Release Etch Power Devices RF-IC Silicon Semi Contact General Inquiries SPTS Contacts Social Media Quick Links Legal Forward-Looking Statements Coronavirus Supplier Policy Privacy Policy Cookies Policy Modern Slavery Statement Gender Pay Report Tax Strategy Statement Sitemap Company SPTS Technologies Ltd. Ringland Way, Newport, NP18 2TA Tel: +44 (0)1633 414000 Email: enquiries@spts.com SPTS Technologies Ltd is a company registered in England and Wales. Registered number 07037852. VAT number GB 945 7792 67. Cookie settings Copyright © 2021 SPTS Technologies Ltd. Information on this site contains forward looking information — for more information click here This website uses cookies Please click okay to accept use of cookies. If you do not want cookies to be set, please use the show details button to see options and de-select to opt-out. Show details Okay