Country and language: English Website: Kenosistec PVD SOLUTIONS R&D SYSTEMS LARGE AREA COATING SOFTWARE SERVICES COMPANY NEWS AND EVENTS R&D Systems WE DEVELOP new ideas to bring SCIENCE to its full potential. How? UNDERSTANDING and TRANSFORMING the DEPOSITION PROCESS in pioneering solutions, matching RESEARCHERS and INSTITUTIONS needs. Sputtering Systems Sputtering is a LOW TEMPERATURE- HIGH ENERGY PVD process, where the target bombarded by ions, is vaporized and the vapours are deposited on the substrate creating a thin atomic layer. More information Evaporation Systems Evaporation is a LOW ENERGY PVD process and HIGH DEPOSITION rate where the material is heated based on the concept that above any material exists a finite “vapor pressure” . More information Cathodic ARC Equipment Cathodic Arc Plasma deposition is a HIGH ENERGY PVD process with HIGH DEPOSITION rate, mainly with LOW THERMAL conductive metals. More information RIE System R.I.E (Reactive Ion Etching) / IBE ( Ion Beam Etching) is an ION-ASSISTED REACTIVE method based on a combination of chemical and physical etching which allows isotropic and anisotropic (uni-directional) MATERIAL REMOVAL. More information Combined Technologies Systems The PVD technologies can be COMBINED in a POLYVALENT SOLUTION where two or more processes are required on a substrate, always keeping a clean deposition environment. More information Cluster The best SOLUTION to avoid cross contamination in a MULTI PROCESS DEPOSITION-inclusive running at the same time-several chambers . More information PECVD Plasma Enhaced Chemical Vapor Deposition is a technology with MEDIUM ENERGY and HIGH DEPOSITION RATE, that uses precursors on liquid or gaseous stage and its chemical componets are broken and then recombined to be on the substrate surface. More information ALD/PLD System ALD Atomic Layer Deposition is a sequential deposition method, (LAYER by LAYER) on a activated substrate surface that allow to bond them in a continious way using liquid precursors activated by plasma or temperature. PLD Pulsed Laser Deposition uses a HIGH-POWERED PULSED LASER to IRRADIATE the target material, producing a plume of material to be collected on a SUITABLE SUBSTRATE, typically held at high temperature. More information Gas Sensor Test System In a clean chamber, humidity, temperature and gas concentrated atmosphere IS PRODUCED and CONTROLLED, allowing to TEST and CALIBRATE gas sensor devices. More information Components Heaters and Coolers, Manipulators and special mechanical devices can be engineered under request. More information The reference partner for high-performance PVD coating equipment and services. Kenosistec is driven by the desire to provide innovative solutions for the development of its customers’ projects and ideas. SITE INDEX PVD Solutions R&D Systems Large Area Coating Software Services Company News and Events Contacts CONTACTS Kenosistec Viale delle scienze, 23, 20082 Binasco MI Tel +39 02 9055200 Country and language: English P.IVA: 02837890546 | © Kenosistec Sr | All Rights Reserved Credits Privacy policy Cookies policy