International Contact Career Semiconductor Manufacturing Technology Products & Solutions Markets & Partners Support & Service News & Events SMT Magazine About us Home Products & Solutions Photomask Solutions Mask Repair PHOTOMASK REPAIR SOLUTIONS Photomasks featuring zero printable defects with ZEISS MeRiT systems Scaling trends towards smaller technology nodes and feature sizes are continuing and EUV technology is becoming increasingly important in the semiconductor industry. Associated complexity in mask manufacturing raises significantly and with them the necessity to repair defective high-end photomasks. With MeRiT® photomask repair systems ZEISS offers optimized solutions based on leading edge technology for the repair of high-end photomasks enabling the repair of smallest new generation defects on every type of photomask. MeRiT® LE Video MeRiT® neXT Digital Solutions Brochures Contact High precision e-beam mask repair ZEISS MeRiT systems represent the state-of-the-art tools for repair of high-end photomask based on focused electron beam induced processing. The systems enable the repair of ultra-small defects by high-end electron beam columns optimized for lowest energies. Transparent and opaque defects of many different geometries on binary, phase-shift nanoimprint templates and EUV masks can be repaired. The modular software of the system in conjunction with the pattern copy feature delivers highest degree of automation. The recipe based operation provides a high flexibility and allows user specific extensions for upcoming mask types. Down below you find the variety of the current MeRiT® systems: Low energy technology for ultra-small defects MeRiT® LE State-of-the art e-beam photomask repair MeRiT® neXT MeRiT® LE Low energy technology for ultra-small defects ZEISS MeRiT LE represents the next generation repair tool for high-end photomasks, particularly focusing on EUV repairs. It features a decreased minimum repair size and improved edge placement accuracy to address the increased number and complexity of pattern defects on high-end photomasks. The re-designed tool platform is based on focused electron beam induced processing and provides highest repair resolution. It is equipped with a new electron beam column optimized for lowest electron energies and improved serviceability. How to repair high-end EUV photomasks Watch the new video about ZEISS MeRiT LE MeRiT® neXT State-of-the art e-beam photomask repair ZEISS MeRiT neXT tool is the industry standard for high-end photomask repairs. By using ZEISS electron beam columns it enables the repair of smallest defects on many different types of photomasks. Clear and opaque defects can be repaired based on exposure with focused electron beams and adsorption of precursor molecules. Digital Solutions Running on the computational engine FAVOR® The FAVOR® platform enables productivity and reliability enhancement through intelligent automation. ZEISS offers several automation applications. All listed solutions are supported by the MeRiT® technology. SEM AutoAnalysis (SAA) Advanced Repair Center (ARC) See all Digital Solutions Brochures Send a request ZEISS MeRiT Product Family pages: 9 file size: 3,121 kB Request PDF Future Photomask Repair pages: 4 file size: 0,396 kB Request PDF ZEISS International ZEISS Global Career Global Press and Media Global Publisher Legal Notice Data Protection Tracking preferences