Menü ausklappen HomeMarketsSemiconductorInspection & Metrology CD SEM AMC and Particles Monitoring in FOUP AMC Monitoring in Clean Room Inspection & Metrology As semiconductor device manufacturing become more and more complex with increased number of steps, wafer inspection and metrology are more critical than ever. Besides vacuum solutions for traditional inspection & metrology tools, we provide innovative in-line Airborne Molecular Contamination (AMC) systems for Front Opening Universal Pods (FOUP) and clean room environment analysis. With our AMC systems, wafers are analyzed through the production cycle, contributing to increase manufacturing yield. Applications CD SEM AMC and particles monitoring in FOUP AMC monitoring in clean room On-Demand Webinars Register now! >> Social Networks: Newsletter Sitemap Data Protection Legal Notice General Terms and Conditions Newsletter Literature Ordering Downloads Contact Group Press Investor Relations Careers © 2021 Pfeiffer Vacuum GmbH