Title: Loop nucleation and stress effects in ion-implanted silicon
Description: <a href="http://uf.catalog.fcla.edu/uf.jsp?st=UF002850921&ix=pm&I=0&V=D&pm=1" rel="nofollow">http://uf.catalog.fcla.edu/uf.jsp?st=UF002850921&ix=pm&I=0&V=D&pm=1</a>
Subjects: Ion implantation, Semiconductors--Defects, Semiconductor doping.