Title: Nonmelt laser annealing of boron implanted silicon
Description: <a href="http://uf.catalog.fcla.edu/uf.jsp?st=UF028811515&ix=pm&I=0&V=D&pm=1" rel="nofollow">http://uf.catalog.fcla.edu/uf.jsp?st=UF028811515&ix=pm&I=0&V=D&pm=1</a>
Subjects: Semiconductor doping, Silicon-on-insulator technology, Metal oxide semiconductors, Complementary--Design and constrution.