Title: Characterization of the interactions of hydrogen, nitrogen and oxygen with silicon and III-V semiconductor surfaces
Description: <a href="http://uf.catalog.fcla.edu/uf.jsp?st=UF001046277&ix=nu&I=0&V=D" rel="nofollow">http://uf.catalog.fcla.edu/uf.jsp?st=UF001046277&ix=nu&I=0&V=D</a>
Subjects: Electron-stimulated desorption, Thermal desorption, Silicon, Gases.