Title: Handbook of physical vapor deposition (PVD) processing
First published: 1998
Description: This book covers all aspects of Physical Vapor Deposition (PVD) process technology, from the characterization and preparation of the substrate material to post deposition processing. It emphasizes the aspects of the process flow critical to economical deposition of films that can meet the required performance specifications.
Subjects: Handbooks, manuals, Handbooks, manuals, etc, Physical vapor deposition, Vapor-plating, Adhesion, Vapor-liquid equilibrium, Gas chromatography, Galvanoplastia, Manuais
LC classification: TS695 .M38 1998