Title: Low Pressure Plasmas and Microstructuring Technology
Subjects: Surfaces (Physics), Molecular structure, Materials, Electronics, Optical materials, Plasma (ionized gases), Engineering, Plasma etching, Plasma (Ionized gases), Industrial applications, Plasma engineering, Ionenstrahlbearbeitung, Niederdruckplasma, Hochfrequenzentladung, PECVD-Verfahren, Sputtern, Plasmaätzen, Plasmadiagnostik