4th International Symposium on Plasma Chemistry
Subtitle: Topical Meeting on Interactions of Low Pressure Plasmas with Solid Surfaces : Round Table on Thermal Plasma Processing : conference proceedings, August 27 through September 1, 1979
By: edited by S. Vepřek and J. Hertz.
Contributors: Vepřek, S.; Hertz, J.; International Union of Pure and Applied Chemistry.; Topical Meeting on Interactions of Low Pressure Plasmas with Solid Surfaces (1979 : Zurich, Switzerland); Round Table on Thermal Plasma Processing (1979 : Zurich, Switzerland)
Publisher: University of Zurich
Published: 1979
Place of publication: Zurich, Switzerland
Language: eng
Subjects: Plasma chemistry -- Congresses.
Notes: Includes bibliographical references and indexes.
At head of title: ISPC-4; International Union of Pure and Applied Chemistry.