The physics and chemistry of SiO₂ and the Si-SiO₂ interface-3, 1996
Subtitle: proceedings of the Third International Symposium on the Physics and Chemistry of SiO₂ and the Si-SiO₂ Interface
By: editors, Hisham Z. Massoud, Edward H. Poindexter, C. Robert Helms.
Contributors: Massoud, Hisham Z.; Poindexter, Edward H.; Helms, C. Robert.
Series: Proceedings / Electrochemical Society ;; v. 96-1; Proceedings (Electrochemical Society) ;; v. 96-1.
Publisher: Electrochemical Society
Published: 1996
Place of publication: Pennington, NJ
Language: eng
Number of pages: 780
Subjects: Silica -- Surfaces -- Congresses.; Dielectrics -- Surfaces -- Congresses.; Silicon dioxide films -- Congresses.; Surface chemistry -- Congresses.; Surfaces (Technology) -- Congresses.
Notes: Includes bibliographical references and indexes.