Contamination effects on EUV optics
By: J. Tveekrem.
Contributors: George C. Marshall Space Flight Center.
Series: NASA/TP -- 1999-209264.; NASA technical paper -- 209264.
Publisher: National Aeronautics and Space Administration, Marshall Space Flight Center; National Technical Information Service, distributor
Published: 1999
Place of publication: [Marshall Space Flight Center], Ala; [Springfield, Va
Language: eng
Format: Microform
Subjects: Contamination.; Extreme ultraviolet radiation.; Optical properties.; Physical optics.; Aerospace environments.; Design analysis.
Notes: Shipping list no.: 2000-0278-M.

Microfiche. [Washington, D.C. : National Aeronautics and Space Administration, 1999] 1 microfiche.