Challenges in process integration and device technology
Subtitle: 18-19 September 2000, Santa Clara, USA
By: David Burnett, Shinʼichiro Kimura, Bhanwar Singh, chairs/editors ; sponsored by SPIE--the International Society for Optical Engineering ; cooperating organizations, SolidState Technology, the Electrochemical Society, [and] AVS--American Vacuum Society (USA).
Contributors: Burnett, David.; Kimura, Shiníchiro.; Singh, Bhanwar.; Society of Photo-optical Instrumentation Engineers.; Solid State Technology (Organization); Electrochemical Society.; American Vacuum Society.
Series: SPIE proceedings series ;; v. 4181; Proceedings of SPIE--the International Society for Optical Engineering ;; v. 4181.
Publisher: SPIE
Published: 2000
Place of publication: Bellingham, Wash., USA
Language: eng
Number of pages: 344
Subjects: Integrated optics -- Congresses.; Microlithography -- Congresses.; Semiconductors -- Congresses.; Optical interconnects -- Congresses.; Microelectronics -- Congresses.
Genres: Congresses.
Notes: Includes bibliographical references and index.