18th Annual Symposium on Photomask Technology and Management
Subtitle: [proceedings] : 16-18 September, 1998, Redwood City, California
By: Brian J. Grenon, Frank E. Abboud, chairs/editors ; sponsored by BACUS--the International Technical Group of SPIE dedicated to the advancement of photomask technology ; published by SPIE--the International Society for Optical Engineering.
Contributors: Grenon, Brian J.; Abboud, Frank E.; BACUS (Technical group); Society of Photo-optical Instrumentation Engineers.
Series: Proceedings of SPIE ;; v. 3546; Proceedings of SPIE--the International Society for Optical Engineering ;; v. 3546.
Publisher: SPIE
Published: 1998
Place of publication: Bellingham, Washington
Language: eng
Number of pages: 672
Subjects: Integrated circuits -- Masks -- Congresses.; Microlithography -- Congresses.
Genres: Congresses.
Notes: Includes bibliographic references and author index.