Sub-Half-Micron Lithography for ULSIs
Contributors: Katsumi Suzuki (Editor); Shinji Matsui (Editor); Yukinori Ochiai (Editor)
Edition: New Ed edition
Publisher: Cambridge University Press
Published: November 10, 2005
Language: eng
Format: Paperback
Number of pages: 341
ISBN-13: 9780521022347
Subjects: General Theory of Computing; Optics; Electronics - Microelectronics; Technology; Technology & Industrial Arts; Science/Mathematics; Electronics - Circuits - Printed; Engineering - Electrical & Electronic; Integrated circuits--Ultra large scale integr; Integrated circuits--Ultra large scale integration--Design and construction; Technology / Engineering / Electrical; Technology-Electronics - Circuits - Printed; Technology-Electronics - Microelectronics
First sentence: The first commercial 0.25- m technology was distributed to users in 1997, and is now widely used in advanced ULSIs (e.g. 64-Mb and 256-Mb DRAMs, high-end microprocessors, and ASICs).