26th European Mask and Lithography Conference
Subtitle: 18-20 January 2010, Grenoble, France
By: Uwe F.W. Behringer, Wilhelm Maurer, editors ; organized by VDE/VDI GMM--the Society for Microelectronics, Micro- and Precision Engineering (Germany) ; sponsored by CEA-LETI Grenoble, AEPI Grenoble Isere, Ville de Grenoble (France) [and] UBC Microelectronics (Germany) ; cooperating organisations, BACUS ... [et al.].
Contributors: Behringer, Uwe F. W.; Maurer, Wilhelm; VDE/VDI-Gesellschaft für Mikroelektronik, Mikro- und Feinwerktechnik; CEA-Leti-Minatec (Firm); UBC Microelectronics (Firm); SPIE (Society); BACUS (Technical group)
Series: Proceedings of SPIE -- v. 7545; Proceedings of SPIE--the International Society for Optical Engineering -- v. 7545.
Publisher: SPIE
Published: 2010
Place of publication: Bellingham, WA
Language: eng
ISBN-13: 9780819479419
Subjects: Congresses; Integrated circuits; Masks; Microlithography
Other titles: Twenty-sixth European Mask and Lithography Conference; European Mask and Lithography Conference 2010; EMLC 2010
Notes: Includes bibliographical references and author index.