Photomask and next-generation lithography mask technology XI
Subtitle: 14-16 April, 2004, Yokohama, Japan
By: Hiroyoshi Tanabe, editor ; sponsored by PMJ--Photomask Japan, BACUS--the international technical group of SPIE dedicated to the advancement of photomask technology, [and] SPIE--The International Society for Optical Engineering ; cooperating organizations, the Institute of Electrical Engineers of Japan ... (et al.) ; co-organized by Yokohama City (Japan) ; published by SPIE--The International Society for Optical Engineering.
Contributors: Photomask Japan.; BACUS (Technical group); Institute of Electrical and Electronics Engineers. Japan Section.; Semiconductor Equipment and Materials International (Japan); Society of Photo-optical Instrumentation Engineers.
Series: SPIE proceedings series,; v. 5446; Proceedings of SPIE--the International Society for Optical Engineering ;; v. 5446.
Publisher: SPIE
Published: 2004
Place of publication: Bellingham, Wash
Language: eng
Number of pages: 984
Subjects: Masks (Electronics) -- Congresses.; Integrated circuits -- Masks -- Congresses.; X-ray lithography -- Congresses.; Microlithography -- Congresses.; Optoelectronic devices -- Design and construction -- Congresses.
Genres: Congresses.
Other titles: Photomask and X-ray mask technology
Notes: Includes bibliographical references and author index.
Some earlier proceedings have title: Photomask and X-ray mask technology.