Optical microlithography III
Subtitle: technology for the next decade : March 14-15, 1984, Santa Clara, California
By: Harry L. Stover, chairman/editor.
Contributors: Stover, Harry L.; Society of Photo-optical Instrumentation Engineers.
Series: Proceedings of SPIE--the International Society for Optical Engineering ;; v. 470
Publisher: SPIE--the International Society for Optical Engineering
Published: 1984
Place of publication: Bellingham, Wash., USA
Language: eng
Number of pages: 269
Subjects: Microlithography -- Congresses.; Integrated circuits -- Very large scale integration -- Congresses.
Other titles: Optical microlithography 3.; Optical microlithography three.
Notes: Includes bibliographies and index.