Chemical-Mechanical Polishing 2000-Fundamentals and Materials Issues
Subtitle: Symposium Held Spril 26-27, 2000, San Francisco, California, U.S.A. (Materials Research Society Symposia Proceedings, V. 613.)
Contributors: R. K. Singh (Editor); Rajeev Bajaj (Editor); Mansour Moinpour (Editor); Marc Meuris (Editor)
Publisher: Materials Research Society
Published: May 2001
Language: eng
Format: Hardcover
Number of pages: 161
ISBN-13: 9781558995215
Subjects: Technology; Technology & Industrial Arts; Science/Mathematics; Technical & Manufacturing Industries & Trades; Engineering - Chemical & Biochemical; Engineering - Mechanical; Chemical mechanical planarization; Congresses; Electrolytic polishing; Grinding and polishing