Advanced Technologies Based on Wave and Beam Generated Plasmas
By: edited by H. Schlüter, A. Shivarova
Contributors: Shivarova, A.
Series: NATO ASI Series, 3. High Technology -- 67; NATO ASI Series, 3. High Technology -- 67.
Publisher: Springer Netherlands; Imprint: Springer
Published: 1999
Place of publication: Dordrecht
Language: eng
Format: [electronic resource] /
Number of pages: 569
ISBN-13: 9789401706339
Subjects: Nuclear physics; Nuclear Physics, Heavy Ions, Hadrons; Thin Films Surfaces and Interfaces; Spectroscopy and Microscopy; Surfaces (Physics); Physics; Solid State Physics
Other titles: Proceedings of the NATO Advanced Study Institute, Sozopol. Bulgaria, May 22-June 1, 1998
Description: This book draws together three areas of work on plasma technologies: advanced efforts based on wave generated, high frequency plasmas, plasma assisted ion implantation, and electron beam generated plasma. It encompasses all the links in the progress from fundamentals to applications: the description and modelling of different plasma sources to technological use; from general diagnostics to methods related to technological control and operation of plasma reactors. The book lays a foundation for the application of sources in industry (in high-tech electronics, microelectronics, IC fabrication, plasma chemistry, lighting, new materials, optics, the biomedical industry, aerospace, etc.), and in astrophysics, atomic physics, laser physics, accelerator physics and microwave devices.