14th annual Symposium on Photomask Technology and Management
Subtitle: proceedings : 14-16 September 1994, Santa Clara, California
By: William L. Brodsky, Gilbert V. Sheldon, chairs/editors ; sponsored by BACUS--the International Technical Group of SPIE dedicated to the advancement of photomask technology.
Contributors: Brodsky, William L.; Shelden, Gilbert V.; BACUS (Technical group)
Series: SPIE proceedings series ;; v. 2322; Proceedings of SPIE--the International Society for Optical Engineering ;; v. 2322.
Publisher: SPIE
Published: 1994
Place of publication: Bellingham, Wash., USA
Language: eng
Number of pages: 454
Subjects: Integrated circuits -- Masks -- Congresses.; Microlithography -- Congresses.
Other titles: Fourteenth Annual Symposium on Photomask Technology and Management
Notes: Includes bibliographical references and index.