Plasma Sources for Thin Film Deposition and Etching (Physics of Thin Films Volume 18)
Contributors: Maurice H. Francombe (Series Editor); John L. Vossen (Series Editor)
Edition: 1st edition
Publisher: Academic Press
Published: January 15, 1994
Language: eng
Format: Hardcover
Number of pages: 328
ISBN-13: 9780125330183
Subjects: Condensed matter physics (liquids & solids); Particle & high-energy physics; Plasma physics; Thin Films Physics; Science; Science/Mathematics; Chemistry - Industrial & Technical; Optics; Physics; Technology / Optics