Extreme ultraviolet (EUV) lithography II
Subtitle: 28 February-3 March 2011, San Jose, California, United States
By: Bruno M. La Fontaine, Patrick P. Naulleau, editors ; sponsored by SPIE ; cosponsored by Clymer, Inc..
Contributors: SPIE (Society)
Series: Proceedings of SPIE -- v. 7969; Proceedings of SPIE--the International Society for Optical Engineering -- v. 7969.
Publisher: SPIE
Published: 2011
Place of publication: Bellingham, Wash
Language: eng
ISBN-13: 9780819485281
Subjects: Ultraviolet radiation; Congresses; Photolithography; Lasers; Extreme ultraviolet lithography; Optical coatings; Industrial applications
Notes: "SPIE advanced lithography" --Cover.

Includes bibliographical references and author index.