Metrology, inspection, and process control for microlithography XX
Subtitle: 20-23 February, 2006, San Jose, California, USA
By: Chas N. Archie, chair/editor ; sponsored and published by SPIE--the International Society for Optical Engineering ; cooperating organization, SEMATECH, Inc.
Contributors: Archie, Chas N.; Society of Photo-optical Instrumentation Engineers.; SEMATECH, Inc.
Series: Proceedings of SPIE -- v. 6152; Proceedings of SPIE--the International Society for Optical Engineering -- v. 6152.
Publisher: SPIE
Published: 2006
Place of publication: Bellingham, Wash
Language: eng
ISBN-13: 9780819461957
Subjects: Integrated circuits -- Inspection -- Congresses.; Integrated circuits -- Measurement -- Congresses.; Microlithography -- Congresses.; Process control -- Congresses.
Genres: Congresses.
Notes: Includes bibliographical references and author index.