Angular sensitivity of controlled implanted doping profiles
By: Robert G. Wilson [and others]
Contributors: United States. National Bureau of Standards; United States. Defense Advanced Research Projects Agency
Series: NBS special publication -- 400-49; Semiconductor measurement technology
Publisher: Department of Commerce, National Bureau of Standards : for sale by the Supt. of Docs., U.S. Govt. Print. Off.
Published: 1978
Place of publication: Washington
Language: eng
Number of pages: 54
Subjects: Semiconductor doping; Ion implantation
Notes: Issued Nov. 1978.

CODEN: XNBSAV.

Sponsored by the Defense Advanced Research Projects Agency and the National Bureau of Standards.

Includes bibliographical references.