21st Annual BACUS Symposium on Photomask Technology
Subtitle: 3-5 October 2001, Monterey, [California] USA
By: Giang T. Dao, Brian J. Grenon, chairs/editors ; sponsored by BACUS--the International Technical Group of SPIE dedicated to the advancement of photomask technology, SPIE--the International Society for Optical Engineering ; published by SPIE--the International Society for Optical Engineering.
Contributors: Dao, Giang T.; Grenon, Brian J.; BACUS (Technical group); Society of Photo-optical Instrumentation Engineers.
Series: SPIE proceedings series ;; v. 4562; Proceedings of SPIE--the International Society for Optical Engineering ;; v. 4562.
Publisher: SPIE
Published: 2002
Place of publication: Bellingham, Wash
Language: eng
Subjects: Integrated circuits -- Masks -- Congresses.; Microlithography -- Congresses.
Genres: Congresses.
Other titles: BACUS Symposium on Photomask Technology; Symposium on Photomask Technology and Management; Photomask technology
Notes: Includes bibliographical references and author index.