Reactive ion etching of polyimide films using a radio frequency discharge
By: James G. Fagan.
Contributors: Rochester Institute of Technology. Materials Science and Engineering
Publisher: Rochester Institute of Technology, Materials Science and Engineering
Published: 1987
Place of publication: Rochester N. Y
Number of pages: 108
Subjects: Polyimide films; Radio frequency discharge; Reactive ion etching
Notes: Thesis (M.Sc.)-Rochester Institute of Technology, 1987.

Includes bibliographical references: p. 106-108.