Optical microlithography XVII
Subtitle: 24-27 February 2004, Santa Clara, California, USA
By: Bruce W. Smith, chair/editor ; sponsored ... by SPIE--the International Society for Optical Engineering ; cooperating organizations, SEMI--Semiconductor Equipment and Materials International [and] International SEMATECH.
Contributors: Smith, Bruce W., 1959-; Society of Photo-optical Instrumentation Engineers.; Semiconductor Equipment and Materials International.; International SEMATECH.
Series: SPIE proceedings series ;; v. 5377; Proceedings of SPIE--the International Society for Optical Engineering ;; v. 5377.
Publisher: SPIE
Published: 2004
Place of publication: Bellingham, Wash., USA
Language: eng
Number of pages: 2008
Subjects: Integrated circuits -- Masks -- Congresses.; Microlithography -- Congresses.; X-ray lithography -- Congresses.; Manufacturing processes -- Congresses.
Genres: Congresses.
Other titles: Optical microlithography 17; Optical microlithography seventeen
Notes: Includes bibliographical references and index.