Ion implantation and beam processing
By: edited by J.S. Williams, J.M. Poate.
Contributors: Williams, James S. 1948-; Poate, J. M.
Publisher: Academic Press
Published: 1984
Place of publication: Sydney; New York
Language: eng
Number of pages: 419
Subjects: Ion implantation.; Ion bombardment.; Semiconductor doping.; Electron beams.
Notes: Includes bibliographical references and index.