Predictive Simulation of Semiconductor Processing
Subtitle: Status and Challenges
By: edited by Jarek Dabrowski, Eicke R. Weber
Contributors: Weber, Eicke R.
Series: Springer Series in MATERIALS SCIENCE -- 72; Springer Series in MATERIALS SCIENCE -- 72
Publisher: Springer Berlin Heidelberg
Published: 2004
Place of publication: Berlin, Heidelberg
Language: eng
Format: [electronic resource] :
Number of pages: 490
ISBN-13: 9783642058042; 9783662094327
Subjects: Surfaces (Physics); Mathematical physics; Structural control (Engineering); Engineering; Nanotechnology
Description: Predictive simulation of semiconductor processing enables researchers and developers to extend the scaling range of semiconductor devices beyond the parameter range of empirical research. It requires a thorough understanding of the basic mechanisms employed in device fabrication, such as diffusion, ion implantation, epitaxy, defect formation and annealing, and contamination. This book presents an in-depth discussion of our current understanding of key processes and identifies areas that require further work in order to achieve the goal of a comprehensive, predictive process simulation tool.
Notes: Online full text is restricted to subscribers.

Also available in print.

Mode of access: World Wide Web.
Table of contents: title: Transistors and Atoms; title: Atomistic Simulations of Processes at Surfaces; title: Atomistic Simulations in Materials Processing; title: Atomistic Simulation of Decanano MOSFETs; title: Modeling and Simulation of Heterojunction Bipolar Transistors; title: Gate Oxide Reliability: Physical and Computational Models; title: High-K Dielectrics: The Example of Pr2O3; title: Atomistic Simulation of Si3N4 CVD from Dichlorosilane and NH3; title: Interconnects and Propagation of High Frequency Signals; title: Modeling of Electromigration in Interconnects; title: Predictive Modeling of Transition Metal Gathering: Applications and Materials Science Challenges.