2002 7th International Symposium on Plasma- and Process-Induced Damage
Subtitle: June 5-7, 2002, Maui, Hawaii, USA
By: Terence Hook, Koji Eriguchi, and Calvin T. Gabriel, editors ; technical co-sponsors, AVS, IEEE/Electron Devices Society, Japanese Society of Applied Physics.
Contributors: Hook, Terence.; Eriguchi, Koji.; Gabriel, Calvin T.; American Vacuum Society.; IEEE Electron Devices Society.; Ōyō Butsuri Gakkai.
Publisher: AVS
Published: 2002
Place of publication: Santa Clara, California
Language: eng
Number of pages: 177
Subjects: Semiconductor wafers -- Congresses.; Semiconductors -- Effect of radiation on -- Congresses.; Plasma radiation -- Congresses.
Genres: Congresses.
Other titles: P²ID; Plasma- and process-induced damage; Plasma process induced-damage
Notes: Includes bibliographic references and author index.
Some previous Symposia entitled: International Symposium on Plasma Induced-Damage.
"P²ID"--Cover.
"IEEE Catalog Number (softbound) 02TH8582 ; IEEE Catalog Number (CD-ROM) 02TH8582C"--verso of T.p.