Principles of Chemical Vapor Deposition
Edition: 1 edition
Publisher: Springer
Published: April 1, 2003
Language: eng
Format: Hardcover
Number of pages: 288
ISBN-13: 9781402012488
Subjects: Engineering: general; Metals technology / metallurgy; Vapor-plating; Refractory coating; Engineering - Industrial; Science; Technology & Industrial Arts; Science/Mathematics; Technical & Manufacturing Trades; Physics; Technology / Material Science; Technology / Technical & Manufacturing Industries & Trades; Chemistry - General; Material Science
First sentence: Inside most any semiconductor fabrication facility in the world at any given moment, there are operators and engineers standing in front of machines with shiny stainless steel facades, loading and unloading cassettes of wafers with complex patterns of dopants, defects, and films on their surfaces.