Pulsed and pulsed bias sputtering
Subtitle: principles and applications
By: by Edward V. Barnat, Toh-Ming Lu.
Contributors: Lu, T.-M. 1943-
Publisher: Kluwer Academic
Published: 2003
Place of publication: Boston
Language: eng
Number of pages: 155
Subjects: Cathode sputtering (Plating process); Thin films.
Notes: Includes bibliographical references and index.