Electron-beam, X-ray, and ion-beam submicrometer lithographies for manufacturing II
Subtitle: 8-9 March 1992, San Jose, California
By: Martin Peckerar, chair/editor ; sponsored and published by SPIE--the International Society for Optical Engineering.
Contributors: Peckerar, Martin Charles, 1946-; Society of Photo-optical Instrumentation Engineers.
Series: Proceedings / SPIE--the International Society for Optical Engineering ;; v. 1671; Proceedings of SPIE--the International Society for Optical Engineering ;; v. 1671.
Publisher: SPIE
Published: 1992
Place of publication: Bellingham, Wash
Language: eng
Number of pages: 488
Subjects: Lithography, Electron beam -- Congresses.; X-ray lithography -- Congresses.; Ion beam lithography -- Congresses.; Semiconductors -- Etching -- Congresses.; Masks (Electronics) -- Congresses.
Notes: Includes bibliographical references and index.