Automated photomask inspection
By: Donald B. Novotny and Dino R. Ciarlo.
Contributors: Ciarlo, Dino R., joint author.
Series: Semiconductor measurement technology; NBS special publication ; 400-46; NBS special publication ;; 400-46.
Publisher: U.S. Dept. of Commerce, National Bureau of Standards : for sale by the Supt. of Docs., U.S. Govt. Print. Off.
Published: 1978
Place of publication: Washington
Language: eng
Number of pages: 31
Subjects: Integrated circuits -- Masks -- Testing.; Optical instruments.
Notes: Includes bibliographical references.