Thin film deposition and patterning (AVS monograph series)
Subtitle: M-18
Contributors: H. G. Tompkins, Monograh Editor
Edition: 1st edition
Series: American Vacuum Society Monograph Series
Publisher: American Vacuum Society (www.avs.org)
Published: 1998
Place of publication: New York, N.Y.
Language: eng
Format: Paperback
Number of pages: 218
ISBN-13: 9781563968723
Subjects: Thin films; Vapor-plating
Genres: Vacuum Deposition
First sentence: Thin films are ubiquitous.
Description: An introduction to the methods used to vapor deposit and pattern thin films. Such films are used on microcircuits, surface finishes, packaging materials, windows, optical products, windows, compact discs, computer discs, lasers, solar cells, television and computer displays and more. Suitable for undergraduate college or university courses and as a reference.
Notes: Available for sale at the AVS web site: www.avs.org
Table of contents: pagenum: 1
label: 1
class: section
title: Introduction; pagenum: 5
title: The Vacuum Environment
class: part
label: 2; pagenum: 15
title: Film Deposition by Vacuum Evaporation
class: part
label: 3; pagenum: 45
label: 4
class: part
title: The Glow Discharge; pagenum: 57
label: 5
class: part
title: Sputtering Processes; pagenum: 97
title: Chemical Vapor Deposition
class: part
label: 6; pagenum: 127
title: Film Structure and Stress
class: part
label: 7; pagenum: 141
label: 8
class: part
title: Pattern Formation; pagenum: 157
label: 9
class: part
title: Plasma-Assisted Etching; pagenum: 191
label: 10
class: part
title: Deposition Control and Film Characterization; pagenum: 209
title: Bibliography
class: part
label: 11