Nanoimprint Lithography: An Enabling Process for Nanofabrication
By: by Weimin Zhou
Contributors: SpringerLink (Online service)
Publisher: Springer Berlin Heidelberg; Imprint: Springer
Published: 2013
Place of publication: Berlin, Heidelberg
Language: eng
Format: [electronic resource] /
Number of pages: 256
ISBN-13: 9783642344282
Subjects: Engineering; Nanotechnology and Microengineering; Nanochemistry; Nanotechnology; Optical and Electronic Materials; Optical materials
Description: Nanoimprint Lithography: An enabling process for nanofabrication presents a comprehensive description of nanotechnology that is one of the most promising low-cost, high-throughput technologies for manufacturing nanostructures, and an emerging lithography candidates for 22, 16 and 11 nm nodes. It provides the exciting, multidisciplinary field, offering a wide range of topics covering: principles, process, material and application. <br>This book would be of specific interest for researchers and graduate students in the field of nanoscience, nanotechnology and nanofabrication, material, physical, chemical, electric engineering and biology. <br>Dr. Weimin Zhou is an associate professor at Shanghai Nanotechnology Promotion Center, China.
Table of contents: title: Principles and statues of nanoimprint lithography; title: Stamp Fabrication; title: stamp surface treatment; title: Nanoimprint lithography resists; title: Nanoimprint lithography process; title: Modeling and Simulation of NIL; title: Application of NIL in Light emitting Diodes; title: Application of NIL in memory devices; title: Application of NIL in solar cell.