Some aspects of dose measurement for accurate ion implantation
By: Douglas M. Jamba.
Contributors: United States. National Bureau of Standards.
Series: Semiconductor measurement technology; National Bureau of Standards special publication ; 400-39; NBS special publication ;; 400-39.
Publisher: U.S. Dept. of Commerce, National Bureau of Standards : for sale by the Supt. of Docs., U.S. Govt. Print. Off.
Published: 1977
Place of publication: Washington
Language: eng
Number of pages: 36
Subjects: Radiation dosimetry.; Ion implantation.
Notes: Bibliography: p. 36.