Advances in resist technology and processing XIII
Subtitle: 11-13 March 1996, Santa Clara, California
By: Roderick R. Kunz, chair/editor ; sponsored by SPIE--the International Society for Optical Engineering ; cooperating organizations, SEMI--Semiconductor Equipment and Materials International, SEMATECH.
Contributors: Kunz, Roderick R.; Society of Photo-optical Instrumentation Engineers.; Semiconductor Equipment and Materials International.; SEMATECH (Organization)
Series: Proceedings SPIE--the International Society for Optical Engineering -- v. 2724; Proceedings of SPIE--the International Society for Optical Engineering -- v. 2724.
Publisher: International Society for Optical Engineering
Published: 1996
Place of publication: Bellingham, Wash., USA
Language: eng
Number of pages: 774
Subjects: Photoresists -- Congresses.
Other titles: Advances in resist technology and processing 13; Advances in resist technology and processing thirteen
Notes: Includes bibliographical references and index.