Semiconductor microlithography V
By: Jim Dey, editor ; presented by the Society of Photo-optical Instrumentation Engineers in cooperation with the Northern California Microphotomask/Masking Working Group and the International Society for Hybrid Microelectronics, March 17-18, 1980, San Jose, California.
Contributors: Dey, Jim.; Society of Photo-optical Instrumentation Engineers.; Northern California Microphotomask/Masking Working Group.; International Society for Hybrid Microelectronics.
Series: Proceedings of the Society of Photo-optical Instrumentation Engineers ;; v. 221; Proceedings of the Society of Photo-optical Instrumentation Engineers ;; v. 221.
Publisher: SPIE
Published: 1980
Place of publication: Bellingham, Wash
Language: eng
Number of pages: 204
Subjects: Semiconductors -- Congresses.; Microlithography -- Congresses.
Notes: Includes bibliographical references and indexes.