Process and device modeling
By: edited by W.L. Engl.
Contributors: Engl, Walter L.
Series: Advances in CAD for VLSI ;; v. 1
Publisher: North-Holland; Sole distributors for the U.S.A. and Canada, Elsevier Science Pub. Co.
Published: 1986
Place of publication: Amsterdam; New York; New York, N.Y., U.S.A
Language: eng
Number of pages: 461
Subjects: Semiconductors -- Mathematical models.; Integrated circuits -- Mathematical models.
Notes: Includes bibliographies and index.