Physics and technology of high-k gate dielectrics I : proceedings of the International Symposium on High Dielectric Constant Materials : Materials Science, Processing, Reliability, and Manufacturing Issues, held in Salt Lake City, Utah, October 20-24, 2002
By: editors,  S. Kar ... [et al.].
Contributors: Kar, S. 1942-; Electrochemical Society. Dielectric Science and Technology Division.; Electrochemical Society. Electronics Division.
Series: Proceedings volume -- 2002-28
Publisher: Electrochemical Society
Published: 2003
Place of publication: Pennington, NJ
Language: eng
Number of pages: 304
Subjects: Gate array circuits -- Congresses; Dielectrics -- Congresses
Genres: Congresses.
Notes: Sponsoring divisions: Dielectric Science and Technology and Electronics.

"PV 2002-28"--Cover.

Includes bibliographical references and index.