Chemical Mechanical Polishing /Fundamentals and Challenges
Subtitle: Symposium Held April 5-7, 1999, San Francisco, California, U.S.A (Materials Research Society Symposium Proceedings)
Contributors: S. V. Babu (Editor); S. Danyluk (Editor); M. I. Krishnan (Editor); M. Tsujimura (Editor)
Publisher: Materials Research Society
Published: March 2000
Language: eng
Format: Hardcover
Number of pages: 281
ISBN-13: 9781558994737
Subjects: Metal Finishing; Technology; Technology & Industrial Arts; Science/Mathematics; Electronics - Semiconductors; Metallurgy; Chemical mechanical planarization; Congresses; Electrolytic polishing; Grinding and polishing