17th Annual Symposium on Photomask Technology and Management
Subtitle: [proceedings] : 17-19 September, 1997, Redwood City, California
By: James A Reynolds, Brian J. Grenon, chairs/editors ; sponsored by BACUS--the International Technical Group of SPIE dedicated to the advancement of photomask technology.
Contributors: Reynolds, James A., 1930-; Grenon, Brian J.; BACUS (Technical group); Society of Photo-optical Instrumentation Engineers.
Series: SPIE proceedings series ;; v. 3236; Proceedings of SPIE--the International Society for Optical Engineering ;; v. 3236.
Publisher: SPIE
Published: 1998
Place of publication: Bellingham, Washington
Language: eng
Number of pages: 554
Subjects: Integrated circuits -- Masks -- Congresses.; Microlithography -- Congresses.
Notes: Includes bibliographical references and index.