Metrology, inspection, and process control for microlithography XXV
Subtitle: 28 February-3 March 2011, San Jose, [California], United States
By: Christopher J. Raymond, editor ; sponsored and published by SPIE ; cosponsored by Nova Measuring Instruments Ltd. (Israel)
Contributors: SPIE (Society); Nova Measuring Instruments Ltd
Series: Proceedings of SPIE -- v. 7971; Proceedings of SPIE--the International Society for Optical Engineering -- v. 7971.
Publisher: SPIE
Published: 2011
Place of publication: Bellingham, Wash
Language: eng
ISBN-13: 9780819485304
Subjects: Congresses; Measurement; Process control; Inspection; Microlithography; Integrated circuits
Notes: Includes bibliographical references and index.