Advances in Research and Development, Volume 23
Subtitle: Modeling of Film Deposition for Microelectronic Applications (Thin Films)
Contributors: Maurice H. Francombe (Series Editor); John L. Vossen (Series Editor)
Publisher: Academic Press
Published: September 29, 1997
Language: eng
Format: Hardcover
Number of pages: 311
ISBN-13: 9780125330237
Subjects: Condensed matter physics (liquids & solids); Materials science; Science; Thin Films Physics; Technology & Industrial Arts; Science/Mathematics; Chemistry - Inorganic; Chemistry - Organic; Chemistry - Physical & Theoretical; Infrared detectors; Science / Chemistry / Organic; Science-Chemistry - Inorganic; Science-Chemistry - Physical & Theoretical; Semiconductors; Physics; Electronics - Semiconductors