X-ray lithography and applications of soft x-rays to technology
By: Alan D. Wilson, chairman/editor, cosponsors: National Synchrotron Light Source, Brookhaven National Laboratory, SPIE--The International Society for Optical Engineering.
Contributors: Wilson, Alan D.; Society of Photo-optical Instrumentation Engineers.
Series: Proceedings of SPIE--the International Society for Optical Engineering -- v. 448
Publisher: SPIE--The International Society for Optical Engineering; SPIE
Published: 1984
Place of publication: Bellingham, Wash
Language: eng
Number of pages: 140
Subjects: Microelectronics -- Congresses; X-ray spectroscopy -- Congresses; Lithography, Electron beam -- Congresses
Notes: "October 19-20, 1983, Upton, New York."

Includes bibliographies.