Fizicheskie osnovy submikronnoĭ litografii v mikro-ėlektronike
By: K.A. Valiev, A.V. Rakov.
Contributors: Rakov, A. V.
Publisher: "Radio i svi͡a︡zʹ"
Published: 1984
Place of publication: Moskva
Language: rus
Number of pages: 349
Subjects: Integrated circuits -- Design and construction.; Lithography.
Notes: Bibliography: p. 338-[347]