High energy ion implantation for IC processing
By: Sicco Oosterhoff
Contributors: Technische Hogeschool Twente
Publisher: [s.n.]
Published: 1986
Place of publication: [s.l.]
Language: eng
Number of pages: 167
Notes: Thesis (doctoral)--Technische Hogeschool Twente, 1986.

Met lit. opg. - Met samenvatting in het Nederlands.