Fine line lithography
By: edited by Roger Newman.
Contributors: Newman, Roger.
Series: Materials processing, theory and practices ;; v. 1
Publisher: North-Holland Pub. Co.; sole distributor for the USA and Canada, Elsevier North-Holland
Published: 1980
Place of publication: Amsterdam; New York; New York
Language: eng
Number of pages: 481
Subjects: Integrated circuits -- Large scale integration.; Lithography.
Notes: Includes bibliographies and index.