Metrology, inspection, and process control for microlithography XVI
Subtitle: 4-7 March, 2002, Santa Clara, [California] USA
By: Daniel J.C. Herr, chair/editor ; sponsored and published by SPIE--the International Society for Optical Engineering ; cooperating organizations, SEMI--Semiconductor Equipment and Materials International ; International SEMATECH.
Contributors: Herr, Daniel J. C.; Society of Photo-optical Instrumentation Engineers.; Semiconductor Equipment and Materials International.; International SEMATECH.
Series: SPIE proceedings series ;; v. 4689; Proceedings of SPIE--the International Society for Optical Engineering ;; v. 4689.
Publisher: SPIE
Published: 2002
Place of publication: Bellingham, Washington
Language: eng
Number of pages: 1204
Subjects: Integrated circuits -- Inspection -- Congresses.; Integrated circuits -- Measurement -- Congresses.; Microlithography -- Congresses.; Process control -- Congresses.
Genres: Congresses.
Notes: Includes bibliographical references and author index.