Film deposition by plasma techniques
By: Mitsuharu Konuma.
Contributors: Konuma, Mitsuharu, 1950-
Series: Springer series on atoms + plasmas ;; 10
Publisher: Springer-Verlag
Published: 1992
Place of publication: Berlin; New York
Language: eng
Number of pages: 224
Subjects: Thin films.; Plasma-enhanced chemical vapor deposition.
Notes: Includes bibliographical references (p. 216-220) and index.
Based on: Purazuma to seimaku no kiso / Mitsuharu Konuma.  Cf. Pref.