Electron-beam, X-ray, and ion-beam submicrometer lithographies for manufacturing III
Subtitle: 1-2 March 1993, San Jose, California
By: David O. Patterson, chair/editor ; sponsored and published by SPIE--the International Society for Optical Engineering.
Contributors: Patterson, David O.; Society of Photo-optical Instrumentation Engineers.
Series: Proceedings / SPIE--the International Society for Optical Engineering ;; v. 1924; Proceedings of SPIE--the International Society for Optical Engineering ;; v. 1924.
Publisher: The Society
Published: 1993
Place of publication: Bellingham, Wash
Language: eng
Number of pages: 470
Subjects: Lithography, Electron beam -- Congresses.; X-ray lithography -- Congresses.; Ion beam lithography -- Congresses.; Semiconductors -- Etching -- Congresses.; Masks (Electronics) -- Congresses.
Genres: Congresses.
Notes: Includes bibliographical references and index.