Optical microlithography XVI
Subtitle: 25-28 February 2003, Santa Clara, California, USA
By: Anthony Yen, chair/editor ; sponsored and published by SPIE--the International Society for Optical Engineering ; cooperating organizations, SEMI--Semiconductor Equipment and Materials International, International SEMATECH.
Contributors: Yen, Anthony.; Society of Photo-optical Instrumentation Engineers.; Semiconductor Equipment and Materials International.; International SEMATECH.
Series: SPIE proceedings series,; v. 5040; Proceedings of SPIE--the International Society for Optical Engineering ;; v. 5040.
Publisher: SPIE
Published: 2003
Place of publication: Bellingham, Wash., USA
Language: eng
Number of pages: 1764
Subjects: Integrated circuits -- Masks -- Congresses.; Microlithography -- Congresses.; X-ray lithography -- Congresses.; Manufacturing processes -- Congresses.
Genres: Congresses.
Other titles: Optical microlithography sixteen; Optical Microlithography 16
Notes: Includes bibliographical references and index.