In-line methods and monitors for process and yield improvement
Subtitle: 22-23 September 1999, Santa Clara, California
By: Sergio Ajuria, Jerome F. Jakubczak, chairs/editors ; sponsored by SPIE--the International Society for Optical Engineering ; cooperating organizations, the Electrochemical Society ... [et al.].
Contributors: Ajuria, Sergio.; Jakubczak, Jerome Florian.; Society of Photo-optical Instrumentation Engineers.; Electrochemical Society.
Series: SPIE proceedings series ;; v. 3884; Proceedings of SPIE--the International Society for Optical Engineering ;; v. 3884.
Publisher: SPIE
Published: 1999
Place of publication: Bellingham, Wash., USA
Language: eng
Number of pages: 334
Subjects: Semiconductors -- Design and construction -- Congresses.; Integrated circuits -- Design and construction -- Congresses.; Optical pattern recognition -- Industrial applications -- Congresses.; Manufacturing processes -- Congresses.
Genres: Congresses.
Notes: Includes bibliographical references and index.