Mechanisms of growth of nanocrystalline silicon deposited by hot-wire chemical vapor deposition
By: H.R. Moutinho ... [et al.].
Contributors: National Renewable Energy Laboratory (U.S.)
Series: Conference paper -- NREL/CP-520-37345; Conference paper (National Renewable Energy Laboratory (U.S.)) -- NREL/CP-520-37345.
Publisher: National Renewable Energy Laboratory
Published: 2005
Place of publication: Golden, Colo
Language: eng
Format: [electronic resource] /
Subjects: Thin films; Chemical vapor deposition
Notes: Title from title screen (viewed on Apr. 20, 2006).

"February 2005."

Includes bibliographical references.

Mode of access: Internet from the NREL web site. Address as of 4/20/06: http://www.nrel.gov/docs/fy05osti/37345.pdf; current access available via PURL.