Photomask and next-generation lithography mask technology XVIII
Subtitle: 13-15 April 2011
By: Toshio Konishi, editor ; sponsored by PMJ Photomask Japan, BACUS, [and], SPIE
Contributors: SPIE (Society); Photomask Japan; BACUS (Technical group)
Series: Proceedings of SPIE -- v. 8081; Proceedings of SPIE--the International Society for Optical Engineering -- v. 8081.
Publisher: SPIE
Published: 2011
Place of publication: Bellingham
Language: eng
ISBN-13: 9780819486738
Subjects: X-ray lithography; Masks (Electronics); Masks; Optoelectronic devices; Congresses; Design and construction; Microlithography; Integrated circuits
Other titles: Photomask and next-generation lithography mask technology 18; Photomask and next-generation lithography mask technology eighteen
Notes: "This conference was canceled due to the earthquake off the northeast coast of Japan in March 2011. This volume includes some of the papers that were scheduled to be presented at the conference."

Includes bibliographical references and index.