Alternative lithographic technologies
Subtitle: 24-26 February 2009, San Jose, California, United States
By: Frank M. Schellenberg, Bruno M. La Fontaine, editors ; sponsored by SPIE ; cooperating organization, SEMATECH Inc
Contributors: SPIE (Society); International SEMATECH
Series: Proceedings of SPIE -- v. 7271; Proceedings of SPIE--the International Society for Optical Engineering -- v. 7271.
Publisher: SPIE
Published: 2009
Place of publication: Bellingham, Wash
Language: eng
ISBN-13: 9780819475244
Other titles: Emerging lithographic technologies.
Notes: Previous conference proceedings entitled: Emerging lithographic technologies.

Includes bibliographical references and author index.