Transient refractive index in a XeF laser
By: Allen E. Fuhs, James Etchechury, Lonnie Cole, Gregory A. Blaisdell
Contributors: Etchechury, James, joint author; Cole, Lonnie, joint author; Blaisdell, Gregory A., joint author; Naval Postgraduate School (U.S.)
Publisher: Naval Postgraduate School
Published: 1980
Place of publication: Monterey, California
Language: eng
Number of pages: 38
Subjects: Excimer lasers; Refractive index; Photoionization
Description: Transient refractive index was calculated for an e-beam pumped XeF laser having initial concentrations Ne:Xe:NF3::95.5:4.3:0.2. The calculation used Ne in excited states including the transition array 3s yields 4p and all other constituents in ground state. Lines in 3s yields 4p array may be resonant with XeF radiation. To obtain the transient populations for Ne, a modification was made to a Naval Research Laboratory computer code which typically accounts for 180-200 reactions involving 50-60 different species. The modified program included populations in 12 electronic configurations of Ne. Electron beam current was changed 10% at constant voltage to simulate the influence of a hibachi shadow. For a nonresonant laser wavelength, an optical pathlength in the laser, L, less than 35 meters will have distortion delta/lambda less than 0.1; however, for a laser wavelength in resonance with Neon, L of only 0.11 meter will cause delta/lambda = 0.1. The difference in optical pathlength is delta.
Notes: "NPS67-80-012"--Cover.

"September 1980"--Cover.

Title from cover.

"Prepared for: Defense Advanced Research Projects Agency, 1400 Wilson Boulevard, Arlington, VA, 22209."

"Includes bibliographical references (p. 33-37).

"Approved for public release; distribution is unlimited"--Cover.

Technical report; 1980.