Effect of Disorder and Defects in Ion-Implanted Semiconductors
Subtitle: Electrical and Physiochemical Characterization, Volume 45 (Semiconductors and Semimetals)
Contributors: Constantinos Christofides (Editor); Gerard Ghibaudo (Editor); Robert K. Willardson (Series Editor); Eicke R. Weber (Series Editor)
Publisher: Academic Press
Published: April 22, 1997
Language: eng
Format: Hardcover
Number of pages: 300
ISBN-13: 9780127521459
Subjects: Condensed matter physics (liquids & solids); Electricity, magnetism & electromagnetism; Semiconductors; Technology; Science; Science/Mathematics; Electronics - Semiconductors; Engineering - Electrical & Electronic; Physics; Technology / Material Science
First sentence: Ion implantation was first used in manufacturing integrated circuits in the early 1970s.