Nonmelt laser annealing of boron implanted silicon
Publisher: Gainesville, FL
Published: 2002
Language: eng
Number of pages: 177
Subjects: Semiconductor doping; Silicon-on-insulator technology; Metal oxide semiconductors, Complementary--Design and constrution.
Description: <a href="http://uf.catalog.fcla.edu/uf.jsp?st=UF028811515&ix=pm&I=0&V=D&pm=1" rel="nofollow">http://uf.catalog.fcla.edu/uf.jsp?st=UF028811515&ix=pm&I=0&V=D&pm=1</a>