Electron-beam, x-ray, and ion-beam lithographies VI
Subtitle: [proceedings] 5-6 March 1987, Santa Clara, California
By: Phillip D. Blais, chair/editor ; sponsored by SPIE--the International Society for Optical Engineering.
Contributors: Blais, Phillip D.; Society of Photo-optical Instrumentation Engineers.
Series: Proceedings of SPIE--the International Society for Optical Engineering ;; v. 773
Publisher: The Society
Published: 1987
Place of publication: Bellingham, Wash., USA
Language: eng
Number of pages: 265
Subjects: Lithography, Electron beam -- Congresses.; X-ray lithography -- Congresses.; Ion beam lithography -- Congresses.
Notes: Includes bibliographies and index.