Plasma techniques for film deposition
By: Mitsuharu Konuma.
Contributors: Konuma, Mitsuharu, 1950-
Publisher: Alpha Science International
Published: 2005
Place of publication: Harrow, U.K
Language: eng
Number of pages: 337
Subjects: Plasma-enhanced chemical vapor deposition.; Thin films.
Notes: "[Originally published in 1992 as] Film deposition by plasma techniques, Springer-Verlag ... Some of the contents, especially the first half ... is based upon the old book ... however, many parts of the text and figures have been completely updated and revised"--Pref.

Includes bibliographical references (p. 273-323) and index.