Advances in resist technology and processing IX
Subtitle: 9-10 March 1992, San Jose, California
By: Anthony E. Novembre, chair/editor : sponsored and published by SPIE--the International Society for Optical Engineering.
Contributors: Novembre, Anthony E.; Society of Photo-optical Instrumentation Engineers.; SPIE Symposium on Microlithography (1992 : San Jose, Calif.)
Series: SPIE proceedings series -- v. 1672.; Proceedings of SPIE--the International Society for Optical Engineering -- v. 1672.
Publisher: SPIE--the International Society for Optical Engineering
Published: 1992
Place of publication: Bellingham, Wash., USA
Language: eng
Number of pages: 684
ISBN-13: 9780819408273
Subjects: Photoresists -- Congresses
Genres: Congresses.
Notes: "The papers ... presented at the ninth conference on Advances in Resist Technology and Processing, held as part of the 1922 SPIE Symposium on Microlithography"--Introd.

Includes bibliographical references and index.