Advances in resist technology and processing XV
Subtitle: 23-25 February, 1998, Santa Clara, California
By: Will Conley, chair/editor ; sponsored by SPIE--the International Society for Optical Engineering ; cooperating organizations, SEMI--Semiconductor Equipment and Materials International, SEMATECH.
Contributors: Conley, Willard.; Society of Photo-optical Instrumentation Engineers.; Semiconductor Equipment and Materials International.; SEMATECH (Organization)
Series: Proceedings SPIE--the International Society for Optical Engineering -- v. 3333.; Proceedings of SPIE--the International Society for Optical Engineering -- v. 3333.
Publisher: SPIE
Published: 1998
Place of publication: Bellingham, Washington
Language: eng
Number of pages: 1464
ISBN-13: 9780819427786
Subjects: Photoresists -- Congresses
Genres: Congresses.
Notes: Includes bibliographical references and author index.