Atomic layer deposition of rare-Earth oxides and aluminum catalyzed silica
By: by Philippe Pierre Marie de Rouffignac
Published: 2006
Language: eng
Number of pages: 164
Subjects: Thin film devices; Design and construction; Rare earth metal compounds; Silica; Oxides
Notes: Thesis advisor: Prof. Roy. G. Gordon.

Thesis (Ph.D., Dept. of Chemistry and Chemical Biology)--Harvard University, 2006.

Includes bibliographical references.