Proceedings of the Symposium on Inorganic Resist Systems
By: edited by Daryl Ann Doane, Adam Heller ; [cosponsored by] Dielectrics and Insulation and Electronics Divisions and New Technology Subcommittee.
Contributors: Doane, Daryl Ann.; Heller, Adam.; Electrochemical Society. Dielectrics and Insulation Division.; Electrochemical Society. Electronics Division.; Electrochemical Society. New Technology Subcommittee.
Series: Proceedings / Electrochemical Society ;; v. 82-9; Proceedings (Electrochemical Society) ;; v. 82-9.
Publisher: Electrochemical Society
Published: 1982
Place of publication: Pennington, NJ (10 South Main St., Pennington 08534)
Language: eng
Number of pages: 310
Subjects: Photoresists -- Congresses.; Photolithography -- Congresses.
Other titles: Inorganic resist systems.
Notes: Includes bibliographical references and indexes.
Title on spine: Inorganic resist systems.