Microlithography fundamentals in semiconductor devices and fabrication technology
By: Saburo Nonogaki, Takumi Ueno, Toshio Ito.
Contributors: Ueno, Takumi, 1951-; Ito, Toshio, 1952-
Publisher: Marcel Dekker
Published: 1998
Place of publication: New York
Language: eng
Number of pages: 327
Subjects: Semiconductors -- Design and construction.; Microlithography -- Industrial applications.; Manufacturing processes.; Photoresists.
Description: Ranging from the basic principles to the forefront of microlithography, this unique volume explores the science and technology of lithographic processes and resist materials and summarizes the most recent innovations in semiconductor manufacturing.
Notes: Includes bibliographical references and index.