Handbook of plasma processing technology
Subtitle: fundamentals, etching, deposition, and surface interactions
By: edited by Stephen M. Rossnagel, Jerome J. Cuomo, William D. Westwood.
Contributors: Rossnagel, Stephen M.; Cuomo, J. J.; Westwood, William D. 1937-
Series: Materials science and process technology series
Publisher: Noyes Publications
Published: 1990
Place of publication: Park Ridge, N.J., U.S.A
Language: eng
Number of pages: 523
Subjects: Plasma engineering.; Semiconductors -- Etching.; Plasma etching.
Notes: Includes bibliographical references.