Flow through porous media for a novel CVD reactor
By: by Elias C. Stassinos
Published: 1989
Language: eng
Number of pages: 82
Subjects: Vapor-plating; Chemical reactors; Integrated circuits; Mathematical models
Notes: Typescript.

Vita.

Thesis (Ph. D.)--University of Florida, 1989.

Includes bibliographical references (leaves 80-81)