CMOS gate-stack scaling-- materials, interfaces and reliability implications
Subtitle: symposium held April 14-16, 2009, San Francisco, california, U.S.A.
By: editors, Alexander A. Demkov ... [et al.].
Contributors: Materials Research Society. Meeting; Symposium C, "CMOS Gate-Stack Scaling-- Materials, Interfaces and Reliability Implications" (2009 : San Francisco, Calif.)
Series: MRS proceedings -- v. 1155; Materials Research Society symposia proceedings -- v. 1155.
Publisher: Materials Research Society
Published: 2009
Place of publication: Warrendale, Pa
Language: eng
Number of pages: 179
ISBN-13: 9781605111285
Subjects: Complementary Metal oxide semiconductors; Materials; Congresses; Silicides; Metal oxide semiconductors; Gate array circuits
Notes: " ... Symposium C, 'CMOS Gate-Stack Scaling-- Materials, Interfaces and Reliability Implications,' held April 14-16 at the 2009 MRS Spring Meeting in San Francisco, California" -- preface.

Includes bibliographical references and indexes.