Data analysis and modeling for process control II
Subtitle: 3-4 March, 2005, San Jose, California, USA
By: Iraj Emami, chair/editor ; Christopher P. Ausschnitt, Kenneth W. Tobin, Jr., cochair/editors ; sponsored by SPIE--the International Society for Optical Engineering ; cooperating organization, International SEMATECH ; published by SPIE--the International Society for Optical Engineering.
Contributors: Emami, Iraj.; Ausschnitt, Christopher P.; Tobin, Kenneth W.; Society of Photo-optical Instrumentation Engineers.; International SEMATECH.
Series: Proceedings of SPIE -- v. 5755; Proceedings of SPIE--the International Society for Optical Engineering -- v. 5755.
Publisher: SPIE
Published: 2005
Place of publication: Bellingham, Wash
Language: eng
Number of pages: 260
Subjects: Manufacturing processes -- Mathematical models -- Congresses.; Manufacturing processes -- Automatic control -- Congresses.; Intelligent control systems -- Mathematical models -- Congresses.; Process control -- Mathematical models -- Congresses.
Genres: Congresses.
Notes: Includes bibliographical references and author index.