23rd Annual BACUS Symposium on Photomask Technology
Subtitle: 9-12 September, 2003, Monterey, California, USA
By: Kurt R. Kimmel, Wolfgang Staud, chairs/editors ; sponsored by BACUS--the International Technical Group of SPIE dedicated to the advancement of photomask technology [and] SPIE--the International Society for Optical Engineering.
Contributors: Kimmel, Kurt Rudolf.; Staud, Wolfgang.; BACUS (Technical group); Society of Photo-optical Instrumentation Engineers.
Series: SPIE proceedings series,; v. 5256; Proceedings of SPIE--the International Society for Optical Engineering ;; v. 5256.
Publisher: SPIE
Published: 2003
Place of publication: Bellingham, Wash., USA
Language: eng
Number of pages: 1362
Subjects: Integrated circuits -- Masks -- Congresses.; Microlithography -- Congresses.
Genres: Congresses.
Other titles: Twenty-third Annual BACUS Symposium on Photomask Technology; Annual BACUS Symposium on Photomask Technology; BACUS Symposium on Photomask Technology; Symposium on Photomask Technology; Photomask technology; Symposium on Photomask Technology and Management.
Notes: Includes bibliographical references and index.
Some earlier conferences have title: Symposium on Photomask Technology and Management.