The Physics and chemistry of SiO₂ and the Si-SiO₂ interface 2
By: edited by C. Robert Helms and Bruce E. Deal.
Contributors: Helms, C. Robert.; Deal, Bruce E.; Electrochemical Society. Electronics Division.; Electrochemical Society. Dielectric Science and Technology Division.; Symposium on the Physics and Chemistry of the SiO₂ and Si-SiO₂ Interface (2nd : 1992 : St. Louis, Mo.)
Publisher: Plenum Press
Published: 1993
Place of publication: New York
Language: eng
Number of pages: 503
Subjects: Silica -- Surfaces -- Congresses; Dielectrics -- Surfaces -- Congresses; Silicon dioxide films -- Congresses; Surface chemistry -- Congresses; Surfaces (Technology) -- Congresses
Notes: Includes bibliographical references and indexes.
Proceedings of the Second Symposium on the Physics and Chemistry of the SiO₂ and Si-SiO₂ Interface, held May 18-21, 1992, in St. Louis, Missouri, sponsored by the Electronics Division and the Dielectric Science and Technology Division of the Electrochemical Society.