Plasma processing of semiconductors
By: edited by P.F. Williams.
Contributors: Williams, P. F.
Series: NATO ASI series. Series E, Applied sciences -- vol. 336; NATO ASI series -- no. 336.
Publisher: Kluwer
Published: 1997
Place of publication: Boston
Language: eng
Number of pages: 613
Subjects: Plasma chemistry -- Industrial applications.; Plasma engineering.; Plasma etching -- Industrial applications.; Semiconductors -- Etching.
Notes: Includes index.