Emerging lithographic technologies
Subtitle: 10-11 March 1997, Santa Clara, California
By: David E. Seeger, chair/editor ; sponsored and published by SPIE--the International Society for Optical Engineering ; cooperating organizations, SEMI--Semiconductor Equipment and Materials International, SEMATECH.
Contributors: Seeger, David E.; Society of Photo-optical Instrumentation Engineers.
Series: Proceedings of SPIE ;; v. 3048; Proceedings of SPIE--the International Society for Optical Engineering ;; v. 3048.
Publisher: SPIE
Published: 1997
Place of publication: Bellingham, Wash
Language: eng
Number of pages: 412
Subjects: Lithography, Electron beam -- Congresses.; Electron beams -- Industrial applications -- Congresses.; X-ray lithography -- Congresses.; X-rays -- Industrial applications -- Congresses.; Masks (Electronics) -- Congresses.
Notes: Includes bibliographical references and index.