1999 International Conference on Simulation of Semiconductor Processes and Devices
Subtitle: SISPAD '99, September 6-8, 1999, Kyoto Research Park, Kyoto, Japan
By: co-sponsored by Japan Society of Applied Physics, IEEE Electron Devices Society ; in cooperation with the Institute of Electronics, Information and Communication Engineers, IEEE Electron Devices Tokyo Chapter.
Contributors: Denshi Jōhō Tsūshin Gakkai (Japan); IEEE Electron Devices Society. Tokyo Chapter .; IEEE Electron Devices Society.; Ōyō Butsuri Gakkai.
Publisher: Japan Society of Applied Physics; Copies available from IEEE Service Center
Published: 1999
Place of publication: Tokyo, Japan; Piscataway, N.J
Language: eng
Number of pages: 256
Subjects: Semiconductors -- Mathematical models -- Congresses.
Genres: Congresses.
Other titles: SISPAD '99
Notes: "IEEE catalog number 99TH8387"--T.p. verso.

"JSAP catalog number AP991232"--T.p. verso.

Includes bibliographical references and index.