Photomask and X-ray mask technology III
Subtitle: 18-19 April, 1996, Kawasaki City, Kanagawa, Japan
By: Hideo Yoshihara, editor ; sponsored by Photomask Japan, BACUS, SPIE--the International Society for Optical Engineering.
Contributors: Yoshihara, Hideo.; Photomask Japan.; BACUS (Technical group); Society of Photo-optical Instrumentation Engineers. Japan Chapter.
Series: Proceedings / SPIE--the International Society for Optical Engineering ;; v. 2793; Proceedings of SPIE--the International Society for Optical Engineering ;; v. 2793.
Publisher: SPIE
Published: 1996
Place of publication: Bellingham, Wash
Language: eng
Number of pages: 530
Subjects: Masks (Electronics) -- Congresses.; Integrated circuits -- Masks -- Congresses.; X-ray lithography -- Congresses.; Microlithography -- Congresses.
Notes: Includes bibliographic references and index.