Plasma-Surface Interactions and Processing of Materials
By: edited by Orlando Auciello, Alberto Gras-Marti, Jose Antonia Valles-Abarca, Daniel L. Flamm
Contributors: Gras-Marti, Alberto; Valles-Abarca, Jose Antonia; Flamm, Daniel L.
Series: NATO ASI Series, Series E: Applied Sciences, 0168-132X -- 176; NATO ASI series -- 176.
Publisher: Springer Netherlands
Published: 1990
Place of publication: Dordrecht
Language: eng
Format: [electronic resource] /
Number of pages: 576
ISBN-13: 9789400919464
Subjects: Physical organic chemistry; Nuclear physics; Surfaces (Physics)
Other titles: Proceedings of the NATO Advanced Study Institute, Alicante, Spain, September 4-16, 1988
Description: An understanding of the processes involved in the basic and applied physics and chemistry of the interaction of plasmas with materials is vital to the evolution of technologies such as those relevant to microelectronics, fusion and space. <br/> The subjects dealt with in the book include: the physics and chemistry of plasmas, plasma diagnostics, physical sputtering and chemical etching, plasma assisted deposition of thin films, ion and electron bombardment, and plasma processing of inorganic and polymeric materials. <br/> The book represents a concentration of a substantial amount of knowledge acquired in this area - knowledge which was hitherto widely scattered throughout the literature - and thus establishes a baseline reference work for both established and tyro research workers.