Photomask and X-ray mask technology IV
Subtitle: 17-18 April, 1997, Kawasaki, Japan
By: Naoaki Aizaki, editor ; sponsored by Photomask Japan, BACUS, SPIE--the International Society for Optical Engineering ; supporting societies, the Japan Society of Applied Physics ... [et al.] ; published by SPIE--the International Society for Optical Engineering.
Contributors: Aizaki, Naoaki.; Photomask Japan.; BACUS (Technical group); Ōyō Butsuri Gakkai.; Society of Photo-optical Instrumentation Engineers. Japan Chapter.
Series: Proceedings / SPIE--the International Society for Optical Engineering ;; v. 3096; Proceedings of SPIE--the International Society for Optical Engineering ;; v. 3096.
Publisher: SPIE
Published: 1997
Place of publication: Bellingham, Washington
Language: eng
Number of pages: 504
Subjects: Masks (Electronics) -- Congresses.; Integrated circuits -- Masks -- Congresses.; X-ray lithography -- Congresses.; Microlithography -- Congresses.
Other titles: Photomask and X-ray mask technology 4; Photomask and X-ray mask technology four
Notes: Includes bibliographic references and author index.