Fluoride-laser microfabrication of diffractive optical elements.
Published: 2004
Language: eng
Number of pages: 69
Description: The 157nm F2-laser drives strong and precisely controllable interactions with fused silica, the most widely used material for bulk optics, optical fibers, and planar optical circuits. A Diffractive Optical Element (DOE) changes wavefronts by redirecting segmented beamlets through phase control. DOE applications include optical computing, laser machining, optical communications, and biological sensors. Precise excisions of 10--30 nm depth are available for the generation of efficient DOEs for the visible and ultraviolet spectrum. F2-laser radiation was applied with beam homogenization optics and high-precision computer-controlled motion stages to shape up to 16-level 256 x 256 pixels DOE devices in bulk glasses, with distinguishable level-to-level spacing of &sim;100 nm and surface roughness of &sim;3 nm. The 1 st order diffraction efficiency was &sim;36--42%. The farfield pattern when illuminated with a HeNe laser agreed well with iterative Fourier Transform algorithm simulations. Future improvements in the laser micromachining process and possible directions are also offered.
Notes: Adviser:  Peter R. Herman.

Thesis (M.A.Sc.)--University of Toronto, 2004.

Electronic version licensed for access by U. of T. users.

Source: Masters Abstracts International, Volume: 43-03, page: 0941.

MICR copy on microfiche (1 microfiche).