Defect and diffusion study in boron implanted silicon
Publisher: Gainesville, FL
Published: 1996
Language: eng
Number of pages: 178
Description: <a href="http://uf.catalog.fcla.edu/uf.jsp?st=UF002212574&ix=pm&I=0&V=D&pm=1" rel="nofollow">http://uf.catalog.fcla.edu/uf.jsp?st=UF002212574&ix=pm&I=0&V=D&pm=1</a>