13th Annual Symposium on Photomask Technology and Management
Subtitle: proceedings : 22-23 September 1993, Santa Clara, California
By: sponsored by BACUS--the International Technical Group of SPIE.
Contributors: BACUS (Technical group)
Series: SPIE proceedings series ;; v. 2087; Proceedings of SPIE--the International Society for Optical Engineering ;; v. 2087.
Publisher: SPIE--the International Society for Optical Engineering
Published: 1994
Place of publication: Bellingham, Wash
Language: eng
Number of pages: 422
Subjects: Integrated circuits -- Masks -- Congresses.; Microlithography -- Congresses.
Other titles: Thirteenth Annual Symposium on Photomask Technology and Management.
Notes: Includes bibliographical references and index.