Chemical Vapor Deposition Polymerization
Subtitle: The Growth and Properties of Parylene Thin Films
By: by Jeffrey B. Fortin, Toh-Ming Lu
Contributors: Lu, Toh-Ming
Publisher: Springer US
Published: 2004
Place of publication: Boston, MA
Language: eng
Format: [electronic resource] :
Number of pages: 102
ISBN-13: 9781441954138; 9781475739015
Subjects: Surfaces (Physics)
Description: Chemical Vapor Deposition Polymerization - The Growth and Properties of Parylene Thin Films is intended to be valuable to both users and researchers of parylene thin films. It should be particularly useful for those setting up and characterizing their first research deposition system. It provides a good picture of the deposition process and equipment, as well as information on system-to-system variations that is important to consider when designing a deposition system or making modifications to an existing one. Also included are methods to characterizae a deposition system's pumping properties as well as monitor the deposition process via mass spectrometry. There are many references that will lead the reader to further information on the topic being discussed. This text should serve as a useful reference source and handbook for scientists and engineers interested in depositing high quality parylene thin films.
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