Dusty plasmas
Subtitle: physics, chemistry, and technological impacts in plasma processing
By: edited by André Bouchoule.
Contributors: Bouchoule, André.
Publisher: Wiley
Published: 1999
Place of publication: Chichester; New York
Language: eng
Number of pages: 408
Subjects: Plasma engineering.; Plasma (Ionized gases -- Industrial applications.; Dusty plasmas.; Plasma chemistry.; Plasma-enhanced chemical vapor deposition.
Notes: Includes bibliographical references and indexes.