Submicron lithography
By: Phillip D. Blais, chairman/editor ; in cooperation with the International Society for Hybrid Microelectronics, the Northern California Microphotomask/Masking Working Group, the Materials Research Society, March 29-30, 1982, Santa Clara, California.
Contributors: Blais, Phillip D.; International Society for Hybrid Microelectronics.; Northern California Microphotomask/Masking Working Group.; Materials Research Society.
Series: Proceedings of SPIE--the International Society for Optical Engineering ;; v. 333
Publisher: International Society for Optical Engineering; The Society of Photo-Optical Instrumentation Engineers
Published: 1982
Place of publication: Bellingham, Wash
Language: eng
Number of pages: 179
Subjects: Photoresists -- Congresses.; Photolithography -- Congresses.
Notes: Includes bibliographical references and indexes.