Advanced processes for 193-nm immersion lithography
By: Yayi Wei and Robert L. Brainard.
Contributors: Brainard, Robert L.
Publisher: SPIE
Published: 2009
Place of publication: Bellingham, Wash
Language: eng
ISBN-13: 9780819475572
Subjects: Immersion lithography; Semiconductors -- Etching; Integrated circuits -- Design and construction
Notes: Includes bibliographical references and index.