15th Annual Symposium on Photomask Technology and Management
Subtitle: 20-22 September 1995, Santa Clara, California
By: Gilbert Shelden, James N. Wiley, chairs/editors.
Contributors: Shelden, Gilbert V.; Wiley, James N.
Series: SPIE proceedings series ;; v. 2621; Proceedings of SPIE--the International Society for Optical Engineering ;; v. 2621.
Publisher: SPIE
Published: 1996
Place of publication: Bellingham, WA
Language: eng
Number of pages: 636
Subjects: Integrated circuits -- Masks -- Congresses.; Microlithography -- Congresses.; Photoresists -- Congresses.
Notes: Includes bibliographical references.