Plasma processes for semiconductor fabrication
By: W.N.G. Hitchon.
Series: Cambridge studies in semiconductor physics and microelectronic engineering ;; 8
Publisher: Cambridge University Press
Published: 1999
Place of publication: Cambridge; New York
Language: eng
Number of pages: 221
Subjects: Semiconductors -- Etching.; Plasma etching.
Notes: Includes bibliographical references (p. 205-211) and index.