Dusty Plasmas
Subtitle: Physics, Chemistry, and Technological Impact in Plasma Processing
Publisher: Wiley
Published: September 29, 1999
Language: eng
Format: Hardcover
Number of pages: 418
ISBN-13: 9780471973867
Subjects: Chemistry; Plasma Physics; Technology: General Issues; Technology; Plasma (Ionized gases; Chemical Engineering Operations; Technology & Industrial Arts; Science/Mathematics; Plasma engineering; Engineering - Chemical & Biochemical; Mechanics - Dynamics - Thermodynamics; Physics; Plasma (Ionized gases); Plasma-enhanced chemical vapor deposition; Science / Thermodynamics; Science-Mechanics - Dynamics - Thermodynamics; Science-Physics; Technology / Engineering / Chemical & Biochemical; Dusty plasmas; Industrial applications; Plasma chemistry
First sentence: In the first three sections of this chapter we consider the ideal case of an isolated dust particle, i.e. we assume that the plasma properties (electron and ion temperatures, plasma density) are in practice not affected by the presence of dust particles a few Debye lengths away from it.'