Advances in resist technology and processing XIX
Subtitle: 4-6 March, 2002, Santa Clara, [California] USA
By: Theodore H. Fedynyshyn, chair/editor ; sponsored and published by SPIE--the International Society for Optical Engineering ; cooperating organizations, SEMI--Semiconductor Equipment and Materials International, International SEMATECH.
Contributors: Fedynyshyn, Theodore H., 1952-; Society of Photo-optical Instrumentation Engineers.; Semiconductor Equipment and Materials International.; International SEMATECH.
Series: SPIE proceedings series ;; v. 4690; Proceedings of SPIE--the International Society for Optical Engineering ;; v. 4690.
Publisher: SPIE
Published: 2002
Place of publication: Bellingham, Washington
Language: eng
Subjects: Photoresists -- Congresses.; Microlithography -- Congresses.
Genres: Congresses.
Notes: Includes bibliographic references and author index.