Metrology, inspection, and process control for microlithography XXIV
Subtitle: 22-25 February 2010, San Jose, California, United States
By: Christopher J. Raymond, editor ; sponsored by SPIE ; cosponsored by Nova Measuring Instruments Ltd. (Israel) ; cooperating organization, SEMATECH Inc. (United States)
Contributors: SPIE (Society); Nova Measuring Instruments (Firm); SEMATECH (Organization)
Series: Proceedings of SPIE -- v. 7638
Publisher: SPIE, $c c2010.
Published: 2010
Place of publication: Bellingham, Wash
Language: eng
ISBN-13: 9780819480521
Notes: Includes bibliographical references.