Selected papers on resolution enhancement techniques in optical lithography
By: editor, F.M. Schellenberg
Series: SPIE milestone series -- v. MS 178
Publisher: SPIE Press
Published: 2004
Place of publication: Bellingham, Wash
Language: eng
Number of pages: 875
Subjects: Integrated circuits; Design and construction; Microlithography; Photolithography; Semiconductors; Etching
Other titles: Resolution enhancement techniques in optical lithography
Notes: Includes bibliographical references and index.