Accurate linewidth measurements on integrated-circuit photomasks
By: John M. Jerke, editor, Electron Devices Division, Center for Electronics and Electrical Engineering, National Engineering Laboratory, National Bureau of Standards
Contributors: Center for Electronics and Electrical Engineering (U.S.). Electron Devices Division; United States. Defense Advanced Research Projects Agency; United States. National Bureau of Standards
Series: Semiconductor measurement technology; NBS special publication -- 400-43
Publisher: Department of Commerce, National Bureau of Standards : for sale by the Supt. of Docs., U.S. Govt. Print. Off.
Published: 1980
Place of publication: Washington
Language: eng
Number of pages: 154
Subjects: Integrated circuits; Masks; Optical measurements
Notes: This activity was supported by the Defense Advanced Research Projects Agency and the National Bureau of Standards.

Issued Feb. 1980.

CODEN: XNBSAV.

Includes bibliographical references.