Microlithographic techniques in integrated circuit fabrication II
Subtitle: 28-30 November 2000, Singapore
By: Chris A. Mack, Xiaocong Yuan, chairs/editors ; sponsored by Nanyang Technological University (Singapore) [and] SPIE--the International Society for Optical Engineering ; cooperating organizations, Institute of Physics (Singapore) ... [et al.].
Contributors: Mack, Chris A.; Yuan, Xiaocong.; Society of Photo-optical Instrumentation Engineers.; Nanyang Technological University.; Institute of Physics, Singapore.
Series: SPIE proceedings series ;; v. 4226; Proceedings of SPIE--the International Society for Optical Engineering ;; v. 4226.
Publisher: SPIE
Published: 2000
Place of publication: Bellingham, Wash., USA
Language: eng
Number of pages: 194
Subjects: Microlithography -- Industrial applications -- Congresses.; Integrated circuits -- Design and construction -- Congresses.; Integrated circuits -- Inspection -- Congresses.; Process control -- Congresses.
Genres: Congresses.
Notes: Includes bibliographical references and index.