1999 4th International Symposium on Plasma Process-Induced Damage
Contributors: Thuy Dao (Editor); M. Koyanagi (Editor); Terence Hook (Editor)
Publisher: IEEE Standards Office
Published: November 1999
Language: eng
Format: Paperback
Number of pages: 224
ISBN-13: 9780965157735
Subjects: Plasma physics; Semi-conductors & super-conductors; Science; Science/Mathematics; Electronics - Semiconductors; Technology & Industrial Arts; Chemistry - Physical & Theoretical; Physics