Emerging lithographic technologies III
Subtitle: 15-17 March, 1999, Santa Clara, California
By: Yuli Vladimirsky, chair/editor ; sponsored and published by SPIE--the International Society for Optical Engineering ; cooperating organization, SEMI--Semiconductor Equipment and Materials International.
Contributors: Vladimirsky, Yuli.; Society of Photo-optical Instrumentation Engineers.; Semiconductor Equipment and Materials International
Series: Proceedings of SPIE ;; v. 3676; Proceedings of SPIE--the International Society for Optical Engineering ;; v. 3676.
Publisher: SPIE
Published: 1999
Place of publication: Bellingham, Wash
Language: eng
Number of pages: 864
Subjects: Lithography, Electron beam -- Congresses.; Microlithography -- Industrial applications -- Congresses.; X-ray lithography -- Congresses.; X-rays -- Industrial applications -- Congresses.; Masks (Electronics) -- Congresses.
Genres: Congresses.
Notes: Includes bibliographical references and author index.