Metod ionnoĭ implantat͡sii v tekhnologii priborov i integralʹnykh skhem na arsenide gallii͡a
By: A.V. Cherni͡aev.
Publisher: "Radio i svi͡azʹ"
Published: 1990
Place of publication: Moskva
Language: rus
Number of pages: 85
Subjects: Semiconductors.; Integrated circuits.; Ion implantation.; Gallium arsenide.
Notes: Includes bibliographical references (p. 83-[86]).
"Nauchnoe izdanie"--Colophon.