Laser interferometry, quantitative analysis of interferograms
Subtitle: third in a series : 7-9 August 1989, San Diego, California
By: Ryszard J. Pryputniewicz, chair/editor ; sponsored by SPIE--the International Society for Optical Engineering ; cooperating organizations, Applied Optics Laboratory/New Mexico State University ... [et al.].
Contributors: Pryputniewicz, Ryszard J.; Society of Photo-optical Instrumentation Engineers.; New Mexico State University. Applied Optics Laboratory.; International Symposium on Optical and Optoelectronic Applied Sciences and Engineering (33rd : 1989 : San Diego, Calif.)
Series: Proceedings / SPIE--the International Society for Optical Engineering ;; v. 1162; Proceedings of SPIE--the International Society for Optical Engineering ;; v. 1162.
Publisher: SPIE
Published: 1990
Place of publication: Bellingham, Wash., USA
Language: eng
Number of pages: 468
Subjects: Lasers -- Industrial applications -- Congresses.; Laser interferometers -- Industrial applications -- Congresses.
Notes: Includes bibliographical references and index.
"Part of a four-conference program o n Interferometry, Microscopy, and Testing held at SPIE's 33rd Annual International Symposium on Optical & Optoelectronic Applied Science & Engineering, 6-11-August 1989, in San Diego, California"--P. vii.