Workshop on Photometric Modeling for Computer Vision and Graphics
Subtitle: June 22, 1999, Fort Collins, Colorado
By: sponsored by IEEE Computer Society on Pattern Analysis and Machine Vision.
Contributors: IEEE Computer Society on Pattern Analysis and Machine Vision.
Publisher: IEEE Computer Society
Published: 1999
Place of publication: Los Alamitos, CA
Language: eng
Number of pages: 73
Subjects: Computer graphics -- Congresses.; Computer vision -- Congresses.
Genres: Congresses.
Notes: IEEE Order Plan Catalog Number PR00271.

IEEE Computer Society Order Number PR00271.

Includes bibliographical references and index.