Precursor chemistry of advanced materials
Subtitle: CVD, ALD and nanoparticles
By: volume editor, Roland A. Fischer ; with contributions by M.D. Allendorf ... [et al.].
Series: Topics in organometallic chemistry -- 9; Topics in organometallic chemistry -- 9.
Publisher: Springer
Published: 2010
Place of publication: Berlin; [London]
Language: eng
Number of pages: 213
ISBN-13: 9783642056888
Subjects: CVD-Verfahren; Ausgangsmaterial; Nanopartikel; Atomschichtepitaxie; Metallorganische Verbindungen; Chemical vapor deposition; Organometallic chemistry; Epitaxie
Notes: Includes bibliographical references and index.
Table of contents: title: Gas-phase thermochemistry and mechanism of organometallic tin oxide CVD precursors / M.D. Allendorf ... [et al.]; title: Materials chemistry of group 13 nitrides / A. Devi ... [et al.]; title: Single-source-precursor CVD: Alkoxy and siloxy aluminum hydrides / M. Veith; title: CVD deposition of binary AlSb and GaSb material films; title: a single-source approach / S. Schulz; title: Organometallic precursors for atomic layer deposition / M. Putkonen ... [et al.]; title: Surface reactivity of transition metal CVD precursors: Towards the control of the nucleation step / P. Serp ... [et al.]; title: Organometallic and metallo-organic precursors for nanoparticles / M.A. Malik ... [et al.].