Photomask technology 2006
Subtitle: 19-22 September, 2006, Monterey, California, USA
By: Patrick M. Martin, Robert J. Naber, chairs/editors ; sponsored by BACUS--the International Technical Group of SPIE dedicated to the advancement of photomask technology [and] SPIE--the International Society for Optical Engineering.
Contributors: Martin, Patrick M.; Naber, Robert J.; BACUS (Technical group); Society of Photo-optical Instrumentation Engineers.
Series: Proceedings of SPIE -- v. 6349; Proceedings of SPIE--the International Society for Optical Engineering -- v. 6349.
Publisher: SPIE
Published: 2006
Place of publication: Bellingham, Wash
Language: eng
Format: Electronic resource
Subjects: Integrated circuits -- Masks -- Congresses.; Microlithography -- Congresses.
Genres: Congresses.
Other titles: Symposium on Photomask Technology.
Notes: Some earlier conferences have title: Symposium on Photomask Technology.

Includes bibliographical references and author index.

Licensed for access by U. of T. users.

Electronic reproduction. Bellingham, Wash. : SPIE--the International Society for Optical Engineering, 2006. Mode of access: World Wide Web. Access restricted to SPIE Digital Library subscribers.