Interferometric metrology
Subtitle: 20-21 August 1987, San Diego, California
By: N.A. Massie, editor ; sponsored by SPIE, the International Society for Optical Engineering ; cooperating organizations, Applied Optics Laboratory/New Mexico State University ... [et al.].
Contributors: Massie, N. A.; Society of Photo-optical Instrumentation Engineers.; International Technical Symposium on Optical & Optoelectronic Applied Science & Engineering (31st : 1987 : San Diego, Calif.)
Series: Critical reviews of optical science and technology; SPIE ;; v. 816; Proceedings of SPIE--the International Society for Optical Engineering) ;; v. 816.
Publisher: SPIE
Published: 1988
Place of publication: Bellingham, Wash., USA
Language: eng
Number of pages: 239
Subjects: Holographic interferometry -- Congresses.
Notes: Includes bibliographies.
"Conference 816, Interferometric metrology, was part of a four-conference program on Precision Instrument Design held at SPIE's 31st annual International Technical Symposium on Optical & Optoelectronic Applied Science & Engineering"--P. v.