Emerging lithographic technologies II
Subtitle: 23-25 February 1998, Santa Clara, California
By: Yuli Vladimirsky, chair/editor ; sponsored and published by SPIE--the International Society for Optical Engineering ; cooperating organizations, SEMI--Semiconductor Equipment and Materials International, SEMATECH.
Contributors: Vladimirsky, Yuli.; Society of Photo-optical Instrumentation Engineers.; Semiconductor Equipment and Materials International; SEMATECH (Organization)
Series: Proceedings of SPIE,; v. 3331; Proceedings of SPIE--the International Society for Optical Engineering ;; v. 3331.
Publisher: SPIE
Published: 1998
Place of publication: Bellingham, Wash
Language: eng
Number of pages: 702
Subjects: Lithography, Electron beam -- Congresses.; Microlithography -- Industrial applications -- Congresses.; X-ray lithography -- Congresses.; X-rays -- Industrial applications -- Congresses.; Masks (Electronics) -- Congresses.
Other titles: Emerging lithographic technologies 2; Emerging lithographic technologies two
Notes: Includes bibliographical references and index.