Models and simulation of deposition processes with CVD apparatus
Subtitle: theory and applications
By: author, Juergen Geiser.
Publisher: Nova Science Publishers
Published: 2009
Place of publication: Hauppauge, N.Y. , USA
Language: eng
ISBN-13: 9781606923252
Subjects: Chemical vapor deposition -- Mathematical models; Chemical vapor deposition -- Computer simulation
Notes: Includes index.