Evaluation of a procedure for the measurement of thin film thickness by X-ray reflectivity
By: Jeannette Benavides.
Contributors: Goddard Space Flight Center.
Series: NASA technical paper -- 3697.
Publisher: National Aeronautics and Space Administration, Goddard Space Flight Center; National Technical Information Service, distributor]
Published: 1997
Place of publication: Greenbelt, Md; [Springfield, Va
Language: eng
Format: Microform
Subjects: Thin films.; Film thickness.; Silicon dioxide.; Solid state devices.; Measuring instruments.; X rays.; Reflectance.; X ray diffraction.
Notes: Shipping list no.: 99-0723-M.

Microfiche. [Washington, D.C. : National Aeronautics and Space Administration, 1998] 1 microfiche .