Film Deposition by Plasma Techniques
By: by Mitsuharu Konuma
Series: Springer Series on Atoms+Plasmas -- 10; Springer Series on Atoms+Plasmas -- 10.
Publisher: Springer Berlin Heidelberg
Published: 1992
Place of publication: Berlin, Heidelberg
Language: eng
Format: [electronic resource] /
Number of pages: 224
ISBN-13: 9783642845130; 9783642845116
Subjects: Engineering; Physics
Description: This book describes the technology and applications of thin-film deposition by plasma techniques. The properties of thin films depend strongly on the deposition technique and the conditions that are used, with films produced by plasma techniques being superior to those produced by traditional methods in many ways. Plasma techniques have already been applied in the manufacture of semiconductors and electronic components, and the range of applications is expanding rapidly. The first half of this book deals with the foundations of plasma science, while the second half treats specific techniques: sputter deposition, ion plating, plasma enhanced chemical vapor deposition, plasma polymerization and plasma surface treatments. This text is an introduction to the subject but also includes details of the latest techniques and new results.
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