Diazonaphthoquinone-based resists
By: Ralph Dammel.
Series: Tutorial texts in optical engineering ;; v. TT 11
Publisher: SPIE Optical Engineering Press
Published: 1993
Place of publication: Bellingham, Wash., USA
Language: eng
Number of pages: 203
Subjects: Photoresists.; Masks (Electronics)
Notes: Includes bibliographical references and index.