Hydrogenated amorphous silicon alloy deposition processes
By: Werner Luft, Y. Simon Tsuo.
Contributors: Tsuo, Y. Simon.
Series: Applied physics ;; 1; Applied physics series (Marcel Dekker, Inc.) ;; 1.
Publisher: M. Dekker
Published: 1993
Place of publication: New York
Language: eng
Number of pages: 327
Subjects: Thin film devices -- Design and construction.; Silicon alloys.; Plasma-enhanced chemical vapor deposition.; Thin films -- Optical properties.; Thin films -- Electric properties.
Notes: Includes bibliographical references (p. 243-316) and index.