Optical microlithography IX
Subtitle: 13-15 March, 1996, Santa Clara, California
By: Gene E. Fuller, chair/editor ; sponsored and published by SPIE--the International Society for Optical Engineering ; cooperating organizations SEMI--Semiconductor Equipment and Materials International, SEMATECH.
Contributors: Fuller, Gene E.; Society of Photo-optical Instrumentation Engineers.; Semiconductor Equipment and Materials International.; SEMATECH (Organization)
Series: SPIE proceedings series ;; v. 2726; Proceedings of SPIE--the International Society for Optical Engineering ;; v. 2726.
Publisher: SPIE
Published: 1996
Place of publication: Bellingham, Wash., USA
Language: eng
Number of pages: 914
Subjects: Microlithography -- Congresses.; Integrated circuits -- Very large scale integration -- Congresses.
Other titles: Optical microlithography 9; Optical microlithography nine
Notes: Includes bibliographical references and index.