Photomask technology 2009
Subtitle: 14-17 September 2009, Monterey, California, United States
By: Larry S. Zurbrick, M. Warren Montgomery, editors ; sponsored by BACUS--the international technical group of SPIE dedicated to the advancement of photomask technology [and] SPIE
Contributors: Zurbrick, Larry S.; Montgomery, M. Warren; BACUS (Technical group); SPIE (Society)
Series: Proceedings of SPIE -- v. 7488; Proceedings of SPIE--the International Society for Optical Engineering -- v. 7488.
Publisher: SPIE
Published: 2009
Place of publication: Bellingham, Wash
Language: eng
ISBN-13: 9780819477958
Subjects: Masks (Electronics); Congresses; Integrated circuits; Masks; Microlithography
Other titles: Symposium on Photomask Technology.; Annual BACUS Symposium on Photomask Technology.; BACUS Symposium on Photomask Technology.
Notes: Some earlier conferences have the title: Symposium on Photomask Technology, or the title: Annual BACUS Symposium on Photomask Technology, or the title: BACUS Symposium on Photomask Technology.

Includes bibliographical references and author index.