Doble exposición
Subtitle: Double exposure
By: Miguel Trillo ; Juan Albarrán (ed.) ; José Manuel Costa [and four others]
Contributors: Centro de Arte Dos de Mayo (Madrid, Spain)
Publisher: CA2M Centro de Arte Dos de Mayo, Comunidad de Madrid
Published: 2017
Place of publication: Móstoles, Madrid
Language: spa
Number of pages: 347
ISBN-13: 9788445136379
Subjects: Exhibitions; Artistic Photography; Photography
Other titles: Double exposure
Notes: Catalog of an exhibition held at the CA2M, Centro de Arte Dos de Mayo, Móstoles, Spain, June 30-Oct. 22, 2017.

Includes bibliographical references.

Text in Spanish and English.