Emerging lithographic technologies XI
Subtitle: 27 February- 1 March 2007, San Jose, California, USA
By: Michael J. Lercel, editor ; sponsored and published by SPIE--the International Society for Optical Engineering ; cooperating organization, SEMATECH, Inc (USA).
Contributors: Lercel, Michael J. 1969-; Society of Photo-optical Instrumentation Engineers.; SEMATECH (Organization)
Series: Proceedings of SPIE -- v. 6517; Proceedings of SPIE--the International Society for Optical Engineering -- v. 6517.
Publisher: SPIE
Published: 2007
Place of publication: Bellingham, Wash
Language: eng
ISBN-13: 9780819466365
Subjects: Lithography, Electron beam -- Congresses; Microlithography -- Industrial applications -- Congresses; X-ray lithography -- Congresses; X-rays -- Industrial applications -- Congresses; Masks (Electronics) -- Congresses
Genres: Congresses
Notes: Includes bibliographical references and author index.